Polishing pad trimming and cleaning device
By combining the trimming and cleaning units, the problem of uneven brush cleaning force is solved, achieving uniform cleaning and trimming of the polishing pad and ensuring the cleaning effect of the polishing pad.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-05-14
- Publication Date
- 2026-04-07
AI Technical Summary
In existing finishing and cleaning devices, the compression distribution is uneven when the brush comes into contact with the polishing pad, resulting in uneven cleaning force and affecting the finishing effect of the polishing pad.
The system employs a trimming unit and a cleaning unit. The trimming component moves vertically and contacts the polishing pad to spray water for trimming. Then, the polishing pad rotates vertically for polishing. Finally, the cleaning component of the cleaning unit moves in the X direction and contacts the polishing pad in parallel to spray water mist for cleaning, ensuring uniform cleaning force.
This achieves uniform cleaning of the polishing pad, avoids incomplete cleaning in certain areas, and ensures the finishing effect of the polishing pad.
Smart Images
Figure CN224088783U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of semiconductor equipment technology, and in particular to a polishing pad trimming and cleaning device. Background Technology
[0002] In the semiconductor chip manufacturing process, the chips need to be thinned by grinding to reduce their thickness, and then polished using polishing pads. However, prolonged use of polishing pads reduces their grinding effectiveness; therefore, a dressing and cleaning device is required to dress and clean the polishing pads.
[0003] In existing technologies, most dressing and cleaning devices include a dressing disc, a brush, and a blowing structure. When dressing a polishing pad, the pad is placed above the dressing disc. Driven by a driving mechanism, the pad rotates and comes into frictional contact with the dressing disc, thus polishing the pad. After polishing, the dressing disc is moved downwards away from the pad, and one end of the brush is rotated to approach and clean the pad. Simultaneously, the blowing structure cleans the pad. However, when using this type of dressing and cleaning device to clean the polishing pad, the brush contacts the pad at an angle, resulting in uneven distribution of brush compression. This leads to uneven radial distribution of the cleaning force, resulting in uneven cleaning of the pad. Areas with higher cleaning force are over-cleaned, while areas with lower cleaning force are under-cleaned, affecting the overall dressing effect of the polishing pad. Utility Model Content
[0004] The purpose of this invention is to provide a polishing pad repair and cleaning device that can clean the polishing pad evenly, avoid incomplete cleaning in certain areas, and ensure the repair effect of the polishing pad.
[0005] To achieve the above objectives, the present invention adopts the following technical solution:
[0006] A polishing pad conditioning and cleaning device is provided, comprising:
[0007] A trimming unit includes a first base plate, a trimming assembly, and a water spraying assembly. The trimming assembly is vertically movably disposed on the first base plate and configured to trim a polishing pad. The polishing pad is rotatably disposed above the trimming assembly. The trimming assembly has a trimming state in contact with the polishing pad and a separated state away from the polishing pad. The water spraying assembly includes a receiving tank and a first spraying element that are interconnected. The receiving tank stores cleaning water, and the first spraying element is disposed on the first base plate for spraying water onto the polishing pad.
[0008] The cleaning unit includes a second base plate, a cleaning assembly, and a second spraying component. The second base plate is movably disposed on the first base plate along the X direction. The cleaning assembly is movably disposed on the second base plate along the vertical direction and has a cleaning state in parallel contact with the polishing pad. The second spraying component is disposed on the second base plate and is configured to communicate with an air supply device and the receiving box. The second spraying component is capable of spraying water mist onto the polishing pad.
[0009] Optionally, the cleaning assembly includes a brush and a first drive mechanism. The brush includes a housing and bristles. The housing of the first drive mechanism is disposed on the second base plate. The output end of the first drive mechanism is connected to the housing for driving the housing to move vertically. The bristles are disposed on the side of the housing away from the second base plate for brushing the polishing pad.
[0010] Optionally, the cleaning unit further includes a guide structure, which includes a support frame and a guide rod. The support frame is disposed on the second base plate and has a guide through hole that extends vertically. The guide rod is disposed on the housing and is vertically movably inserted into the guide through hole.
[0011] Optionally, the cleaning unit further includes a second driving mechanism, which is disposed on the first base plate and is used to drive the second base plate to move along the X direction.
[0012] Optionally, the second drive mechanism includes a first motor, a gear, and a rack. A first guide rail extending along the X direction is provided on the first base plate. The rack is disposed on the first base plate and extends along the X direction. The gear is connected to the output end of the first motor and meshes with the rack. The housing of the first motor slides along the X direction with the first guide rail, and the housing of the first motor is connected to the side of the second base plate facing the first base plate.
[0013] Optionally, the second drive mechanism includes a second motor, a lead screw, and a nut. The housing of the second motor is disposed on the first base plate. The lead screw extends along the X direction. The output end of the second motor is connected to the lead screw in a transmission connection. The nut is sleeved on the lead screw and is connected to the side of the second base plate facing the first base plate. The lead screw can rotate under the drive of the second motor to drive the nut to move along the lead screw.
[0014] Optionally, the cleaning unit further includes a plurality of second guide rails, which are spaced apart on the first base plate along the Y direction and extend along the X direction, which is perpendicular to the Y direction. A plurality of sliders are provided on the side of the second base plate facing the first base plate, and the plurality of sliders slide in a one-to-one correspondence with the plurality of second guide rails.
[0015] Optionally, the dressing assembly includes a dressing disc and a third drive mechanism. The housing of the third drive mechanism is disposed on the first base plate, and the output end of the third drive mechanism is connected to the dressing disc for transmission. The third drive mechanism is used to drive the dressing disc to move vertically so that the dressing disc moves closer to or away from the polishing pad.
[0016] Optionally, the second spraying element has a spray nozzle, the length of which is greater than the diameter of the polishing pad.
[0017] Optionally, the second jetting element includes a two-fluid atomizing air knife.
[0018] The beneficial effects of this utility model are:
[0019] This utility model provides a polishing pad trimming and cleaning device, including a trimming unit and a cleaning unit. When the polishing pad needs trimming, the polishing pad is placed above the trimming component. Then, the trimming component is moved vertically to contact the polishing pad. A first spray component sprays water onto the polishing pad to wet its surface. Simultaneously, the polishing pad is controlled to rotate vertically, i.e., the polishing pad and the trimming component rotate relative to each other, thereby achieving trimming and polishing of the polishing pad by the trimming component. After trimming and polishing, the trimming component is controlled to move vertically away from the polishing pad, and the polishing pad is controlled to move above the cleaning unit. Then, the polishing pad is cleaned. A cleaning component is moved vertically to make parallel contact with the surface of the polishing pad. At this time, the cleaning component is in the cleaning state. Then, the second base plate is moved back and forth in the X direction, causing the cleaning component and the second spray component to move back and forth in the X direction. At the same time, the second spray component sprays water mist onto the polishing pad, thereby completing the cleaning of the polishing pad. By moving the cleaning component vertically, it can be made to make parallel contact with the surface of the polishing pad, thereby ensuring that the cleaning force of the cleaning component on the polishing pad is evenly distributed, thus achieving uniform cleaning of the polishing pad, avoiding the phenomenon of incomplete cleaning in some areas, and ensuring the finishing effect of the polishing pad. Attached Figure Description
[0020] Figure 1 This is a schematic diagram of the polishing pad trimming and cleaning device provided in this embodiment of the utility model;
[0021] Figure 2 This is a schematic diagram of the structure of the second injection component provided in this embodiment of the utility model;
[0022] Figure 3 This is a side view of the cleaning component provided in an embodiment of the present invention.
[0023] In the picture:
[0024] 100. Polishing pad;
[0025] 1. Trimming unit; 11. First base plate; 12. Trimming assembly; 121. Trimming disc; 122. Third drive mechanism; 131. First spray component;
[0026] 2. Cleaning unit; 21. Second base plate; 22. Sweeping assembly; 221. Brush; 2211. Housing; 2212. Brush bristles; 222. First drive mechanism; 23. Second spray component; 231. Spray nozzle; 24. Second drive mechanism; 25. Second guide rail; 26. Slider;
[0027] 3. Guide structure; 31. Support frame; 32. Guide rod. Detailed Implementation
[0028] The present invention will now be described in further detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present invention and not intended to limit it. Furthermore, it should be noted that, for ease of description, the accompanying drawings show only the parts relevant to the present invention, not the entire structure.
[0029] In the description of this utility model, unless otherwise explicitly specified and limited, the terms "connected," "linked," and "fixed" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.
[0030] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.
[0031] In the description of this embodiment, the terms "upper," "lower," "left," and "right," etc., refer to the orientation or positional relationship shown in the accompanying drawings. They are used only for ease of description and simplification of operation, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. In addition, the terms "first" and "second" are only used for distinction in description and have no special meaning.
[0032] This embodiment provides a polishing pad conditioning and cleaning device, such as... Figures 1 to 3 As shown, the polishing pad 100 can be cleaned evenly, avoiding incomplete cleaning in certain areas and ensuring the finishing effect of the polishing pad 100.
[0033] like Figures 1 to 3 As shown, the polishing pad dressing and cleaning device includes a dressing unit 1 and a cleaning unit 2. The dressing unit 1 includes a first base plate 11, a dressing assembly 12, and a water spray assembly. The dressing assembly 12 is vertically movably mounted on the first base plate 11 and is configured to dress the polishing pad 100. The polishing pad 100 is rotatably mounted above the dressing assembly 12, and the dressing assembly 12 has a dressing state in contact with the polishing pad 100 and a separated state away from the polishing pad 100. The water spray assembly includes a receptacle and a first spray member 131 connected to each other, the receptacle storing cleaning water. The first spray member 131 is mounted on the first base plate 11 and is used to spray water onto the polishing pad 100. The cleaning unit 2 includes a second base plate 21, a cleaning assembly 22, and a second spray member 23. The second base plate 21 is movably mounted on the first base plate 11 in the X direction. The cleaning assembly 22 is vertically movably mounted on the second base plate 21, and the cleaning assembly 22 is in a cleaning state where it is in parallel contact with the polishing pad 100. The second spraying element 23 is mounted on the second base plate 21 and is configured to communicate with the air supply equipment and the receiving box. The second spraying element 23 is capable of spraying water mist onto the polishing pad 100.
[0034] Therefore, when the polishing pad 100 needs to be trimmed, the polishing pad 100 is positioned above the trimming assembly 12. Then, the trimming assembly 12 is moved vertically to contact the polishing pad 100. Water is sprayed onto the polishing pad 100 by the first spray element 131, wetting the surface of the polishing pad 100. Simultaneously, the polishing pad 100 is controlled to rotate vertically, meaning there is relative rotation between the polishing pad 100 and the trimming assembly 12. This allows the trimming assembly 12 to trim and polish the polishing pad 100. After trimming and polishing are completed, the trimming assembly 12 is controlled vertically... The cleaning unit 2 moves the cleaning component 22 away from the polishing pad 100 and controls the polishing pad 100 to move above the cleaning unit 2. Then, the cleaning pad 100 is cleaned by moving the cleaning component 22 vertically so that it makes parallel contact with the surface of the polishing pad 100. At this time, the cleaning component 22 is in cleaning mode. Then, the second base plate 21 moves back and forth along the X direction, causing the cleaning component 22 and the second spraying component 23 to move back and forth along the X direction. Simultaneously, the second spraying component 23 sprays water mist onto the polishing pad 100, thus completing the cleaning of the polishing pad 100. By moving the cleaning component 22 vertically, it is possible to make parallel contact with the surface of the polishing pad 100, thereby ensuring that the cleaning force of the cleaning component 22 on the polishing pad 100 is evenly distributed, achieving uniform cleaning of the polishing pad 100, avoiding incomplete cleaning in certain areas, and ensuring the finishing effect of the polishing pad 100.
[0035] In this embodiment, the first spraying element 131 includes a nozzle and a connecting pipe. One end of the connecting pipe communicates with the nozzle, and the other end communicates with the inner cavity of the receiving box. The second spraying element 23 includes a two-fluid atomizing air knife.
[0036] Optionally, such as Figures 1 to 3 As shown, the second spraying element 23 has a spray nozzle 231, the length of which is greater than the diameter of the polishing pad 100. By controlling the length of the spray nozzle 231 to be greater than the diameter of the polishing pad 100, the water mist sprayed by the second spraying element 23 can be made to contact the entire polishing pad 100, ensuring that the polishing belt is completely within the rinsing range of the water mist, thereby enhancing cleaning efficiency and improving the cleanliness of the surface of the polishing pad 100.
[0037] Optionally, such as Figures 1 to 3As shown, the cleaning assembly 22 includes a brush 221 and a first drive mechanism 222. The brush 221 includes a housing 2211 and bristles 2212. The housing 2211 of the first drive mechanism 222 is mounted on the second base plate 21, and the output end of the first drive mechanism 222 is connected to the housing 2211 for driving the housing 2211 to move vertically. The bristles 2212 are located on the side of the housing 2211 away from the second base plate 21 and are used to brush the polishing pad 100. When the polishing pad 100 needs to be cleaned, the first drive mechanism 222 is activated, causing it to move the brush 221 upwards until the bristles 2212 of the brush 221 contact the surface of the polishing pad 100. At the same time, the polishing pad 100 rotates vertically, that is, the polishing pad 100 and the bristles 2212 rotate relative to each other, and the second base plate 21 drives the brush 221 to reciprocate in the X direction, thereby realizing the cleaning of the polishing pad 100 by the brush 221. By setting the first drive mechanism 222 to drive the brush component 221 to move vertically, the vertical height of the brush component 221 can be flexibly adjusted so that the bristles 2212 of the brush component 221 come into contact with the polishing pad 100. The structure is simple and easy to operate.
[0038] For example, the first drive mechanism 222 includes a pneumatic cylinder or an electric cylinder.
[0039] Optionally, such as Figures 1 to 3 As shown, the cleaning unit also includes a guide structure 3. The guide structure 3 includes a support frame 31 and a guide rod 32. The support frame 31 is mounted on the second base plate 21, and the support frame 31 has a guide through hole extending vertically. The guide rod 32 is mounted on the housing 2211 and is movably inserted into the guide through hole vertically. When the first drive mechanism 222 drives the housing 2211 of the brush component 221 to move vertically, the guide rod 32 will move vertically (i.e., along the axial direction of the guide through hole) within the guide through hole. By setting the guide rod 32 to move in conjunction with the guide through hole, on the one hand, the guide through hole can provide guidance for the guide rod 32, ensuring that the housing 2211 of the brush component 221 moves vertically parallel, preventing it from tilting and causing the bristles 2212 to not be able to make parallel contact with the polishing belt, ensuring that the brush force of the bristles 2212 on the polishing pad 100 is evenly distributed, and on the other hand, it can also increase the overall stability of the structure.
[0040] In this embodiment, a stop is provided at the end of the guide rod 32 away from the housing 2211. The stop can abut against the lower end of the guide through hole, thereby limiting the guide rod 32 vertically and preventing the guide rod 32 from moving out of the guide through hole, thus allowing precise control of the movement range of the brush 221.
[0041] Optionally, such as Figures 1 to 3As shown, the cleaning unit 2 also includes a second drive mechanism 24. The second drive mechanism 24 is disposed on the first base plate 11 and is connected to the second base plate 21 for driving the second base plate 21 to move along the X direction. By setting the second drive mechanism 24, the cleaning component 22 and the second spray component 23 can be driven to reciprocate along the X direction through the second base plate 21, thereby realizing the sweeping and cleaning of the polishing belt. The structure is simple and the operation is convenient.
[0042] In this embodiment, the second drive mechanism 24 includes a pneumatic cylinder or an electric cylinder.
[0043] In some embodiments, the second drive mechanism 24 includes a first motor, a gear, and a rack. A first guide rail extending in the X direction is provided on the first base plate 11. The rack is disposed on the first base plate 11 and extends in the X direction. The gear is connected to the output end of the first motor, and the gear meshes with the rack. The housing 2211 of the first motor slides along the first guide rail in the X direction, and the housing 2211 of the first motor is connected to the side of the second base plate 21 facing the first base plate 11. When it is necessary to clean the polishing pad 100, the first motor drives the gear to rotate. Because the gear meshes with the rack, the gear drives the first motor to move along the X direction on the first guide rail, thereby driving the second base plate 21 to move in the X direction. In turn, the second base plate 21 drives the cleaning assembly 22 and the second spraying component 23 to move in the X direction, thereby realizing the sweeping and cleaning of the polishing pad 100. The structure is simple, the operation is convenient, and it is beneficial for quickly cleaning the polishing pad 100 and improving work efficiency. The sliding fit between the first motor and the first guide rail can improve the accuracy and stability of the first motor's movement and prevent skewed movement.
[0044] In other embodiments, the second drive mechanism 24 includes a second motor, a lead screw, and a nut. The housing 2211 of the second motor is disposed on the first base plate 11, the lead screw extends along the X direction, and the output end of the second motor is connected to the lead screw via a transmission connection. The nut is sleeved on the lead screw, and the nut is connected to the side of the second base plate 21 facing the first base plate 11. The lead screw can rotate under the drive of the second motor to drive the nut to move along the lead screw. When it is necessary to clean the polishing pad 100, the second motor drives the lead screw to rotate, causing the nut to move along the lead screw, thereby driving the second base plate 21 to move along the X direction. In turn, the second base plate 21 drives the cleaning assembly 22 and the second spraying component 23 to move along the X direction, realizing the sweeping and cleaning of the polishing pad 100. The structure is simple, the operation is convenient, and it is conducive to quickly cleaning the polishing pad 100 and improving work efficiency.
[0045] Optionally, such as Figures 1 to 3As shown, the cleaning unit 2 also includes multiple second guide rails 25. These second guide rails 25 are spaced apart along the Y direction on the first base plate 11, and extend along the X direction, which is perpendicular to the Y direction. Multiple sliders 26 are provided on the side of the second base plate 21 facing the first base plate 11, and these sliders 26 slide in a one-to-one correspondence with the multiple second guide rails 25. When the polishing pad 100 is brushed, the second drive mechanism 24 drives the second base plate 21 to move along the X direction. During this process, the sliders 26 on the second base plate 21 move along the second guide rails 25. By setting the sliders 26 and the second guide rails 25 to slide in a way that the second guide rails 25 provide guidance for the sliders 26, ensuring the movement accuracy of the sliders 26 and the second base plate 21, preventing them from deviating, and avoiding affecting the brushing effect.
[0046] In this embodiment, two second guide rails 25 are provided. In other embodiments, more than two second guide rails 25 may be provided as needed, and this is not limited here.
[0047] Optionally, such as Figures 1 to 3 As shown, the trimming assembly 12 includes a trimming disc 121 and a third drive mechanism 122. The housing 2211 of the third drive mechanism 122 is disposed on the first base plate 11, and the output end of the third drive mechanism 122 is connected to the trimming disc 121 in a transmission manner. The third drive mechanism 122 is used to drive the trimming disc 121 to move vertically, so that the trimming disc 121 moves closer to or away from the polishing pad 100. When the polishing pad 100 needs to be trimmed, the polishing pad 100 is placed above the trimming disc 121. Then, the third drive mechanism 122 is activated, causing the trimming disc 121 to move and gradually approach the polishing belt until the trimming disc 121 contacts the polishing pad 100. Then, the first spraying element 131 sprays water onto the surface of the polishing pad 100, while the polishing belt rotates vertically, thereby achieving trimming and polishing of the polishing belt by the trimming disc 121. After trimming and polishing is completed, the third drive mechanism 122 drives the trimming disc 121 to move and gradually move away from the polishing pad 100. The structure is simple and easy to operate.
[0048] For example, the third drive mechanism 122 includes a cylinder or an electric cylinder.
[0049] In this embodiment, the trimming disc 121 includes a circular trimming disc 121. In other embodiments, trimming discs 121 of other shapes, such as rectangular ones, can be selected according to actual needs. This is not limited here.
[0050] Obviously, the above embodiments of this utility model are merely examples for clearly illustrating the present utility model, and are not intended to limit the implementation of the present utility model. Those skilled in the art can make various obvious changes, readjustments, and substitutions without departing from the protection scope of this utility model. It is neither necessary nor possible to exhaustively describe all embodiments here. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this utility model should be included within the protection scope of the claims of this utility model.
Claims
1. A polishing pad conditioning and cleaning device, characterized in that, include: A trimming unit (1) includes a first base plate (11), a trimming assembly (12), and a water spraying assembly. The trimming assembly (12) is vertically movably disposed on the first base plate (11). The trimming assembly (12) is configured to trim a polishing pad (100). The polishing pad (100) is rotatably disposed above the trimming assembly (12) in a vertical direction. The trimming assembly (12) has a trimming state in contact with the polishing pad (100) and a separated state away from the polishing pad (100). The water spraying assembly includes a container and a first spraying element (131) that are interconnected. The container stores cleaning water. The first spraying element (131) is disposed on the first base plate (11) and is used to spray water onto the polishing pad (100). The cleaning unit (2) includes a second base plate (21), a cleaning assembly (22), and a second spraying element (23). The second base plate (21) is movably disposed on the first base plate (11) in the X direction. The cleaning assembly (22) is movably disposed on the second base plate (21) in the vertical direction. The cleaning assembly (22) has a cleaning state in parallel contact with the polishing pad (100). The second spraying element (23) is disposed on the second base plate (21). The second spraying element (23) is configured to communicate with the air supply device and the receiving box. The second spraying element (23) is capable of spraying water mist onto the polishing pad (100).
2. The polishing pad conditioning and cleaning device according to claim 1, characterized in that, The cleaning assembly (22) includes a brush (221) and a first drive mechanism (222). The brush (221) includes a housing (2211) and bristles (2212). The housing (2211) of the first drive mechanism (222) is disposed on the second base plate (21). The output end of the first drive mechanism (222) is connected to the housing (2211) for driving the housing (2211) to move vertically. The bristles (2212) are disposed on the side of the housing (2211) away from the second base plate (21) for brushing the polishing pad (100).
3. The polishing pad conditioning and cleaning device according to claim 2, characterized in that, The cleaning unit (2) further includes a guide structure (3), which includes a support frame (31) and a guide rod (32). The support frame (31) is mounted on the second base plate (21). The support frame (31) has a guide through hole that extends vertically. The guide rod (32) is mounted on the housing (2211) and is vertically movably inserted into the guide through hole.
4. The polishing pad conditioning and cleaning device according to claim 1, characterized in that, The cleaning unit (2) further includes a second driving mechanism (24), which is disposed on the first base plate (11) and is used to drive the second base plate (21) to move along the X direction.
5. The polishing pad conditioning and cleaning device according to claim 4, characterized in that, The second drive mechanism (24) includes a first motor, a gear and a rack. A first guide rail extending along the X direction is provided on the first base plate (11). The rack is provided on the first base plate (11) and extends along the X direction. The gear is connected to the output end of the first motor and meshes with the rack. The housing (2211) of the first motor slides along the X direction with the first guide rail. The housing (2211) of the first motor is connected to the side of the second base plate (21) facing the first base plate (11).
6. The polishing pad conditioning and cleaning device according to claim 4, characterized in that, The second drive mechanism (24) includes a second motor, a lead screw, and a nut. The housing (2211) of the second motor is disposed on the first base plate (11). The lead screw extends along the X direction. The output end of the second motor is connected to the lead screw. The nut is sleeved on the lead screw and is connected to the side of the second base plate (21) facing the first base plate (11). The lead screw can rotate under the drive of the second motor to drive the nut to move along the lead screw.
7. The polishing pad conditioning and cleaning device according to claim 4, characterized in that, The cleaning unit (2) further includes a plurality of second guide rails (25), which are spaced apart on the first base plate (11) along the Y direction and extend along the X direction, which is perpendicular to the Y direction. A plurality of sliders (26) are provided on the side of the second base plate (21) facing the first base plate (11), and the plurality of sliders (26) slide in a one-to-one correspondence with the plurality of second guide rails (25).
8. The polishing pad conditioning and cleaning apparatus according to any one of claims 1-7, characterized in that, The trimming assembly (12) includes a trimming disc (121) and a third drive mechanism (122). The housing (2211) of the third drive mechanism (122) is disposed on the first base plate (11). The output end of the third drive mechanism (122) is connected to the trimming disc (121) for transmission. The third drive mechanism (122) is used to drive the trimming disc (121) to move vertically so that the trimming disc (121) moves closer to or away from the polishing pad (100).
9. The polishing pad conditioning and cleaning apparatus according to any one of claims 1-7, characterized in that, The second spraying element (23) has a spraying port (231), the length of which is greater than the diameter of the polishing pad (100).
10. The polishing pad conditioning and cleaning apparatus according to any one of claims 1-7, characterized in that, The second jetting component (23) includes a two-fluid atomizing air knife.