The invention relates to an immersion liquid limiting mechanism. Immersion liquid is limited between a projection objective and a silicon wafer. The immersion liquid limiting mechanism comprises a horizontal liquid supplying passage, a liquid outlet passage, a gas-liquid recovery passage, a gas supplying passage and a vertical liquid supplying passage, wherein the horizontal liquid supplying passage and the liquid outlet passage are horizontally arranged, an outlet of the vertical liquid supplying passage, an outlet of the gas-liquid recovery passage and an outlet of the gas supplying passage are sequentially arranged at the bottom of the immersion liquid limiting mechanism from inside to outside, the horizontal liquid supplying passage and the vertical liquid supplying passage are respectively connected to liquid supplying equipment, the liquid outlet passage and the gas-liquid recovery passage are respectively connected to gas-liquid recovery equipment, the gas supplying passage is connected to gas supplying equipment, and the width of an opening, formed in the bottom of the immersion liquid limiting mechanism, of the gas supplying passage is ten microns. According to the immersion liquid limiting mechanism, the formation of a 'gas knife' structure is avoided through increasing the width of the opening of the gas supplying passage, so that the problem of liquid droplet splashing during edge exposure is solved; through arranging the vertical liquid supplying passage, a repulsive force facing to the bottom of the immersion liquid limiting mechanism is provided at a risk of collision, and thus disturbance is reduced.