Photoetching machine with mask cleaning function

Abstract

The utility model belongs to the technical field of semiconductor manufacturing, and discloses a photoetching machine with a mask cleaning function. The photoetching machine with the mask cleaning function comprises an online detection system and a cleaning system which are in communication connection. The cleaning system is installed on one side of the online detection system or installed in the online detection system, the online detection system is used for detecting whether foreign matter particles exist on the surface of the mask, the cleaning system is used for conducting blowing and spraying cleaning treatment on the surface of the mask, and the cleaning system comprises an air spraying piece and an air exhaust piece; the air shower part and the air exhaust part are both installed at a mask plate inlet of the online detection system, an air shower opening of the air shower part is located above a mask plate and arranged opposite to the surface of the mask plate, a suction opening of the air exhaust part is located below the mask plate and arranged opposite to the air shower opening, and the air exhaust part is used for collecting foreign matter particles blown by the air shower opening. The photoetching machine with the mask cleaning function can effectively improve the cleaning accuracy and optimize the cleaning effect of foreign matter particles.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of semiconductor manufacturing, especially to a photoetching machine with mask plate cleaning function. BACKGROUND

[0002] Photoetching technology is the core process in semiconductor manufacturing, which uses optical exposure and chemical etching to accurately transfer the integrated circuit pattern designed on the mask plate to the surface of the silicon wafer covered with photoresist, thereby forming a nanoscale microstructure. It is a key step in manufacturing integrated circuits (such as CPU, GPU, memory, etc.), which determines the process precision and performance of the chip. The photoetching process has high cleanliness requirements for the mask plate, because foreign particles on the mask plate can have a serious impact on the transfer of the photoetching pattern, thereby affecting the yield and performance of the chip.

[0003] In the prior art, there is no special cleaning system inside the photoetching machine for removing foreign particles from the surface of the mask plate. When the detection system detects the presence of foreign matter on the surface of the mask plate, the mask plate needs to be sent out of the photoetching machine for cleaning outside the machine. After cleaning is completed, the mask plate is sent back to the inside of the photoetching machine. This approach not only affects the production efficiency of the photoetching machine, but also may introduce new sources of pollution during the transmission of the mask plate, reducing the cleanliness of the mask plate. SUMMARY

[0004] The utility model aims at providing a photoetching machine with mask plate cleaning function, which solves the problem of reducing production efficiency and use fluency of the photoetching machine when cleaning the mask plate in the prior art. The photoetching machine with mask plate cleaning function can clean the mask plate inside the photoetching machine without sending it out of the photoetching machine, improving the production efficiency and use fluency of the photoetching machine, reducing manual intervention and avoiding secondary pollution of the mask plate.

[0005] To achieve this purpose, the utility model adopts the following technical solutions:

[0006] The photoetching machine with mask plate cleaning function comprises an online detection system and a cleaning system connected in communication, the cleaning system is installed on one side of the online detection system or inside the online detection system, the online detection system is used for detecting whether there are foreign particles on the surface of the mask plate and determining the relative position coordinates of the foreign particles, and the cleaning system is used for blow cleaning treatment on the surface of the mask plate;

[0007] The cleaning system comprises a wind curtain member and an air suction member, both of which are installed at the entrance of the reticle of the online detection system, the wind curtain mouth of the wind curtain member is located above the reticle and is arranged opposite to the surface of the reticle, the suction mouth of the air suction member is located below the reticle and is arranged opposite to the wind curtain mouth, and the air suction member is used to collect the foreign particles swept by the wind curtain mouth.

[0008] In some possible embodiments, the cleaning system further comprises a medium injection port connected with the wind curtain member, and the medium enters the wind curtain member through the medium injection port and is transmitted to the surface of the reticle, the medium being gas or electromagnetic energy.

[0009] In some possible embodiments, when the medium is gas, the gas is nitrogen or argon.

[0010] In some possible embodiments, when the medium is gas, one end of the medium injection port is connected with a blowing system, the other end of the medium injection port is connected with the wind curtain member, the wind curtain member comprises a plurality of parallel blowing pipes, and the end of the blowing pipe has the wind curtain mouth facing the surface of the reticle.

[0011] In some possible embodiments, the air suction member is in communication with a vacuum pump, the air suction member has a plurality of air suction pipes, the end of the air suction pipe has the suction mouth, the suction mouth has a funnel structure, the large end of the funnel structure is arranged close to the reticle, and the small end of the funnel structure is arranged away from the reticle.

[0012] In some possible embodiments, the online detection system comprises an inspection assembly and a positioning assembly, the inspection assembly is used to determine whether the surface of the reticle has the foreign particles, the positioning assembly is used to determine the relative position coordinates of the foreign particles, when the inspection assembly determines that the surface of the reticle has the foreign particles, the positioning assembly can determine the relative position coordinates of the foreign particles on the reticle and transmit the position information to the cleaning system.

[0013] In some possible embodiments, the distance between the wind curtain mouth and the surface of the reticle is 15-45 cm.

[0014] In some possible implementation manners, the photolithography machine with the mask plate cleaning function further comprises a conveying system in communication connection with the online detection system, the conveying system comprises a support platform and a gripper, the gripper is arranged on the support platform and is used for clamping and conveying the mask plate, the support platform is installed on one side of the online detection system or inside the online detection system, the air shower is installed on one side of the online detection system or inside the online detection system and is spaced above the gripper, and the air extractor is installed on one side of the online detection system or inside the online detection system and is located at the bottom of the support platform.

[0015] In some possible implementation manners, the photolithography machine with the mask plate cleaning function further comprises a monitoring assembly in electrical connection with the air supply system, the monitoring assembly is used for monitoring output parameters of the air supply system in real time, and the monitoring assembly is further used for controlling the air supply system to stop working when the output parameters of the air supply system are greater than preset parameter values.

[0016] In some possible implementation manners, the photolithography machine with the mask plate cleaning function further comprises a distance measuring assembly, the distance measuring assembly is used for measuring the distance between the air shower port and the surface of the mask plate.

[0017] The photolithography machine with the mask plate cleaning function has the following beneficial effects: the photolithography machine with the mask plate cleaning function provided by the utility model can clean the surface of the mask plate by the cleaning system arranged in the photolithography machine, without the need of sending the mask plate out of the photolithography machine, so that the production efficiency of the photolithography machine is improved; the air shower port is arranged opposite to the surface of the mask plate, and the suction port is arranged below the mask plate and opposite to the air shower port, so that the cleaning accuracy is effectively improved, and the cleaning effect of foreign particles is optimized. BRIEF DESCRIPTION OF DRAWINGS

[0018] Figure 1 is a structural schematic view of the photolithography machine with the mask plate cleaning function provided by the utility model embodiment;

[0019] Figure 2 is Figure 1 is a sectional view in the A-A direction of the photolithography machine with the mask plate cleaning function;

[0020] Figure 3 is Figure 1 is a sectional view in the B-B direction of the photolithography machine with the mask plate cleaning function;

[0021] Figure 4 is a flow chart of the mask plate cleaning method provided by the utility model embodiment.

[0022] in the drawings:

[0023] 100, online detection system; 210, air shower; 220, air extraction member; 221, suction port; 310, support platform; 320, gripper. DETAILED DESCRIPTION

[0024] The utility model will be described in further detail below in combination with the drawings and embodiments. It can be understood that the specific embodiments described herein are only used to explain the utility model, and not limit the utility model. In addition, it should be noted that, in order to facilitate the description, only the part related to the utility model is shown in the drawings, not all structures.

[0025] In the description of the utility model, unless otherwise explicitly specified and limited, the terms "connected", "connected", "fixed" should be understood broadly, for example, it can be fixedly connected, or detachably connected, or integrated, it can be mechanically connected, or electrically connected, it can be directly connected, or indirectly connected through intermediate medium, it can be the internal communication of two elements or the interaction relationship of two elements. For ordinary skilled in the art, the specific meaning of the above terms in the utility model can be understood according to the specific circumstances.

[0026] In the utility model, unless otherwise explicitly specified and limited, the first feature is "on" or "below" the second feature, which can include that the first and second features are in direct contact, or the first and second features are not in direct contact but are in contact through another feature between them. Moreover, the first feature "on", "above" and "above" the second feature includes that the first feature is directly above and obliquely above the second feature, or only indicates that the horizontal height of the first feature is higher than that of the second feature. The first feature "below", "below" and "below" the second feature includes that the first feature is directly below and obliquely below the second feature, or only indicates that the horizontal height of the first feature is less than that of the second feature.

[0027] In the description of the embodiment, the terms "up", "down", "right", etc. orientation or position relationship is based on the orientation or position relationship shown in the drawings, only for the convenience of description and simplification operation, and does not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, therefore it cannot be understood as a limitation on the utility model. In addition, the terms "first", "second" are only used to distinguish in the description, and have no special meaning.

[0028] As Figures 1 to 3As shown, the embodiment provides a photolithography machine with a mask plate cleaning function, which comprises a shell, an exposure system, an online detection system 100 and a cleaning system. The exposure system, the online detection system 100 and the cleaning system are all installed in the shell, and the online detection system 100 and the cleaning system are in communication connection. The cleaning system is installed on one side of the online detection system 100 or inside the online detection system 100. The online detection system 100 is used to detect whether there are foreign particles on the surface of the mask plate, and the cleaning system is used to perform shower cleaning treatment on the surface of the mask plate. The foreign particles on the mask plate generally refer to dust particles.

[0029] By setting the cleaning system inside the photolithography machine, when there are foreign particles on the surface of the mask plate, the cleaning system can perform shower cleaning treatment on the surface of the mask plate without the need to send it out of the photolithography machine, thereby improving the production efficiency of the photolithography machine. The exposure system is arranged on one side of the online detection system 100 and close to the cleaning system, or the exposure system can also be arranged inside the online detection system 100 and close to the cleaning system. The exposure system is used to project the pattern on the cleaned mask plate onto a semiconductor wafer. The exposure system and the cleaning system are connected through a conveying device to convey the mask plate. Exemplarily, the conveying device can be a mechanical hand structure.

[0030] The cleaning system comprises a wind shower piece 210 and an air suction piece 220. The wind shower piece 210 and the air suction piece 220 are both installed at the mask plate entrance of the online detection system 100. The wind shower opening of the wind shower piece 210 is located above the mask plate and is arranged opposite to the surface of the mask plate. The suction opening 221 of the air suction piece 220 is located below the mask plate and is arranged opposite to the wind shower opening. The air suction piece 220 is used to collect the foreign particles swept by the wind shower opening. By arranging the wind shower opening opposite to the surface of the mask plate and arranging the suction opening 221 below the mask plate and opposite to the wind shower opening, the cleaning accuracy can be effectively improved, and the cleaning effect of the foreign particles can be optimized.

[0031] Exemplarily, when installed, the cleaning system can be installed at the mask plate entrance on the side of the online detection system 100. After the mask plate enters the entrance of the online detection system 100, or when the mask plate is used for exposure operation in the exposure system, if the online detection system 100 detects that the mask plate surface has foreign particles, the mask plate can be quickly sent to the mask plate entrance for shower cleaning treatment, thereby improving the cleaning treatment efficiency and cleaning accuracy. In another embodiment, the cleaning system can be installed inside the online detection system 100. After the mask plate enters the online detection system 100, or when the mask plate is used for photolithography process in the exposure system, if the online detection system 100 detects that the mask plate surface has foreign particles, the mask plate can be sent to the cleaning system without the need to send it out of the photolithography machine, thereby effectively improving the cleaning efficiency and cleaning accuracy.

[0032] Optionally, the cleaning system further comprises a medium injection port, the medium injection port is connected with the air shower 210, the medium enters the air shower 210 through the medium injection port, and then is transmitted to the reticle surface. In an embodiment, the medium can be a gas, which blows the foreign particle away from the reticle surface. For example, the gas can be high-purity nitrogen, preferably with a purity of 99.999% or above, or can be argon or a mixture of hydrogen and helium, which can be selected according to requirements. In another embodiment, the medium can also be electromagnetic energy, which acts on the foreign particle to cause local evaporation of the foreign particle, thereby removing the contaminants. In implementation, an electromagnetic energy generating device is installed at the medium injection port, and the electromagnetic energy generating device is used to generate an electromagnetic energy beam. In this embodiment, the cleaning system further comprises a vacuum source, which is connected with the air exhaust 220. For example, the vacuum source can be a vacuum pump, which has flexible pumping function.

[0033] For example, when the medium is a gas, referring to Figure 1 , the medium injection port is in communication with the air supply system, the air shower 210 comprises a plurality of air supply pipes which are parallel to each other, and the end of the air supply pipe away from the medium injection port has an air shower port which faces the reticle surface, Figure 1 the sweeping direction of the air shower 210 is shown in FIG. 6; the air exhaust 220 is in communication with the vacuum pump, and the air exhaust 220 forms a vacuum or negative pressure near the conveying platform of the reticle, so that the gas is forced to flow to the external environment through the air exhaust 220 and the vacuum pump, and the air shower 210 and the air exhaust 220 are used in cooperation; the air exhaust 220 has a plurality of air exhaust pipes, and the end of the air exhaust pipe away from the vacuum pump has a suction port 221 which has a funnel structure, the large end of the funnel structure is arranged close to the reticle, the small end of the funnel structure is arranged away from the reticle, and the suction port 221 is in communication with the guide hole on the conveying platform, Figure 1 the air exhaust direction of the air exhaust 220 is shown in FIG. 7, and the foreign particle can enter the suction port 221 through the guide hole, and the suction efficiency is improved by arranging the suction port 221 in a funnel structure.

[0034] In this embodiment, the photolithography machine with the reticle cleaning function further comprises a monitoring assembly, which is electrically connected with the air supply system, and is used to monitor the output parameter of the air supply system in real time, and is further used to control the air supply system to stop working when the output parameter of the air supply system is greater than a preset parameter value. By arranging the monitoring assembly, it can be avoided that the wind speed of the medium output is too large to cause damage to the surface of the reticle.

[0035] Optionally, the distance between the air shower port and the reticle surface is 15 cm-45 cm, preferably 38 cm. When the medium is a gas, the wind speed of the air shower port is 1000 m / s-1600 m / s, preferably 1030 m / s; the air exhaust flow rate of the suction port 221 of the air exhaust 220 is 1000 m 3 / h-1500m 3 / h, preferably 1030m 3 / h. This arrangement can effectively improve the cleaning effect. In specific implementation, the blowing time of the medium and the duration of the cleaning process depend on the number and contaminated area of the foreign particles on the mask plate. The blowing time can be pre-set, and the blowing time length can be set according to the pollution degree parameters such as the size, number and area of the contaminant particles. The cleaning time length can also be automatically determined through the inspection result of the online detection system 100.

[0036] As a preferred, the photolithography machine with the mask plate cleaning function further comprises a distance measuring assembly for measuring the distance between the air shower and the surface of the mask plate. In this way, the distance between the air shower and the surface of the mask plate can be obtained in real time, the installation position of the air shower piece 210 can be quickly determined, and the installation efficiency of the air shower piece 210 can be improved.

[0037] Optionally, the online detection system 100 further comprises an inspection assembly for determining whether there are foreign particles on the surface of the mask plate and a positioning assembly for determining the relative position coordinates of the foreign particles. When the inspection assembly determines that there are foreign particles on the surface of the mask plate, the positioning assembly can determine the relative position coordinates of the foreign particles on the mask plate and transmit the position information to the cleaning system. The cleaning system is adapted to receive and input the aforementioned position information and guide the cleaning medium so that the cleaning medium is incident on the mask plate at the position indicated by the position information. The online detection system 100 can accurately position the position information of the foreign particles and effectively improve the cleaning efficiency.

[0038] Referring to Figures 1 to 3The photolithography machine further comprises a conveying system in communication with the online detection system 100, the conveying system comprising a support platform 310 and a gripper 320, the gripper 320 being disposed on the support platform 310 and used for clamping and conveying the reticle. In one embodiment, the support platform 310, the gripper 320, the air shower 210 and the air extractor 220 are all installed on one side of the online detection system 100, the air shower 210 being spaced above the gripper 320, and the air extractor 220 being disposed at the bottom of the support platform 310. Alternatively, in another embodiment, the support platform 310, the gripper 320, the air shower 210 and the air extractor 220 are all installed inside the online detection system 100, the air shower 210 being spaced above the gripper 320, and the air extractor 220 being disposed at the bottom of the support platform 310. After the online detection system 100 detects that there are foreign particles on the surface of the reticle, the gripper 320 can clamp the reticle and drive the reticle to reciprocate, so that the air shower port of the air shower 210 repeatedly cleans the reticle. If the online detection system 100 detects that there are no foreign particles on the surface of the reticle, the gripper 320 clamps the reticle and drives the reticle into the exposure process. During installation, the air extractor 220 can be disposed at the plunger of the gripper 320. Exemplarily, the main structure of the gripper 320 can be configured as a conveying mechanism with the function of adsorbing and fixing the reticle, such as a conveying belt conveying mechanism or a gear conveying mechanism. In order to simplify the overall structure, the conveying system described above can also be applied to the conveying process of the reticle between the exposure system and the cleaning system.

[0039] The embodiment also provides a reticle cleaning method, which is completed by using the photolithography machine with the reticle cleaning function as described above, as shown in the following steps: Figure 4 The reticle cleaning method comprises the steps of:

[0040] S1, controlling the online detection system 100 in the photolithography machine to detect whether there are foreign particles on the surface of the reticle;

[0041] S2, if there are foreign particles on the surface of the reticle, controlling the cleaning system in the photolithography machine to perform air shower cleaning treatment on the surface of the reticle; and returning to S1;

[0042] S3, if there are no foreign particles on the surface of the reticle, controlling the reticle to enter the exposure process.

[0043] The mask plate cleaning method of the embodiment is completed by using the above-mentioned photolithography machine with mask plate cleaning function, the online detection system 100 detects whether there are foreign particles on the surface of the mask plate, if there are foreign particles on the surface of the mask plate, the cleaning system performs shower cleaning treatment on the surface of the mask plate, if there are no foreign particles on the surface of the mask plate, the mask plate enters an exposure process, the online detection system 100 and the mask plate cleaning system are integrated in the photolithography machine, the use fluency of the photolithography machine is improved, manual intervention is reduced, secondary pollution of the mask plate is avoided, the use efficiency of the photolithography machine is effectively improved, and costs are saved.

[0044] Optionally, the online detection system 100 comprises an inspection assembly and a positioning assembly, the inspection assembly is used for determining whether there are foreign particles on the surface of the mask plate, and the positioning assembly is used for determining relative position coordinates of the foreign particles, the photolithography machine with the mask plate cleaning function comprises a cleaning system, the cleaning system comprises a shower member 210 and an air suction member 220, and step S2 comprises the following steps: if there are foreign particles on the surface of the mask plate, the cleaning system receives and inputs the relative position coordinates, and guides the cleaning medium so that the cleaning medium is incident on the mask plate at the position coordinates, that is, the shower member 210 of the cleaning system is controlled to perform shower cleaning treatment on the surface of the mask plate, and the air suction member 220 of the cleaning system is controlled to collect the foreign particles swept by the shower member 210. The shower treatment and the air suction are performed simultaneously, the cleaning efficiency is improved, and the cleaning effect is optimized. Optionally, the wind speed of the shower port of the shower member 210 is 1000 m / s-1600 m / s, and is preferably 1030 m / s; the air suction flow of the suction port 221 of the air suction member 220 is 1000 m 3 / h-1500 m 3 / h, and is preferably 1030 m 3 / h.

[0045] Obviously, the above-mentioned embodiments of the utility model are only examples for clearly explaining the utility model, and are not the limitation on the embodiments of the utility model. For ordinary skilled in the art, various obvious changes, re-adjustment and replacement can be carried out without departing from the protection scope of the utility model. Here, it is not necessary and impossible to enumerate all the embodiments. Any modification, equivalent replacement and improvement made in the spirit and principle of the utility model should be included in the protection scope of the utility model claim.

Claims

1. A photolithography machine having a reticle cleaning function, characterized by, The application relates to an online detection system (100) and a cleaning system connected in communication, wherein the cleaning system is installed on one side of the online detection system (100) or inside the online detection system (100), the online detection system (100) is used for detecting whether foreign particles exist on the surface of a mask plate and determining the relative position coordinates of the foreign particles, and the cleaning system is used for carrying out shower cleaning treatment on the surface of the mask plate. The cleaning system comprises a wind shower piece (210) and an air suction piece (220), the wind shower piece (210) and the air suction piece (220) are both installed at the mask plate entrance of the online detection system (100), the wind shower opening of the wind shower piece (210) is located above the mask plate and is oppositely arranged with the surface of the mask plate, the suction opening (221) of the air suction piece (220) is located below the mask plate and is oppositely arranged with the wind shower opening, and the air suction piece (220) is used for collecting the foreign particles swept by the wind shower opening. The cleaning system further comprises a medium injection opening connected with the wind shower piece (210), medium enters the wind shower piece (210) through the medium injection opening and is transmitted to the surface of the mask plate, and the medium is gas or electromagnetic energy.

2. The photolithography machine having a reticle cleaning function according to claim 1, wherein, When the medium is gas, the gas is nitrogen or argon.

3. The photolithography machine having a reticle cleaning function according to claim 2, wherein, When the medium is gas, one end of the medium injection opening is connected with a blowing system, the other end of the medium injection opening is connected with the wind shower piece (210), the wind shower piece (210) comprises a plurality of parallel blowing pipes, and the end of the blowing pipe away from the medium injection opening is provided with the wind shower opening facing the surface of the mask plate.

4. The photolithography machine having a reticle cleaning function according to claim 2, wherein, The air suction piece (220) is communicated with a vacuum pump, the air suction piece (220) is provided with a plurality of air suction pipelines, the end of the air suction pipeline away from the vacuum pump is provided with the suction opening (221), the suction opening (221) is in a funnel structure, the large end of the funnel structure is arranged close to the mask plate, and the small end of the funnel structure is arranged away from the mask plate.

5. The photolithography machine having a reticle cleaning function according to claim 1, wherein, The online detection system (100) comprises an inspection assembly and a positioning assembly, the inspection assembly is used for determining whether the foreign particles exist on the surface of the mask plate, the positioning assembly is used for determining the relative position coordinates of the foreign particles, when the inspection assembly determines that the foreign particles exist on the surface of the mask plate, the positioning assembly can determine the relative position coordinates of the foreign particles on the mask plate and transmit the position information to the cleaning system.

6. The photolithography machine having a reticle cleaning function according to claim 1, wherein, The distance between the wind shower opening and the surface of the mask plate is 15-45 cm.

7. The photolithography machine having a reticle cleaning function according to claim 1, wherein, ​ 8. The photolithography machine having a reticle cleaning function according to claim 1, wherein, The photolithography machine with the mask plate cleaning function further comprises a conveying system in communication connection with the online detection system (100), the conveying system comprising a support platform (310) and a gripper (320), the gripper (320) being arranged on the support platform (310) and used for clamping and transferring the mask plate, the support platform (310) being installed on one side of the online detection system (100) or inside the online detection system (100), the air shower (210) being correspondingly installed on one side of the online detection system (100) or inside the online detection system (100) and being spaced above the gripper (320), and the air extractor (220) being correspondingly installed on one side of the online detection system (100) or inside the online detection system (100) and being located at the bottom of the support platform (310).

9. The photolithography machine having a reticle cleaning function according to claim 4, wherein, The photolithography machine with the mask plate cleaning function further comprises a monitoring assembly, the monitoring assembly being electrically connected with the air supply system, the monitoring assembly being used for monitoring output parameters of the air supply system in real time, and the monitoring assembly being further used for controlling the air supply system to stop working when the output parameters of the air supply system are greater than preset parameter values.

10. The photolithography machine having a reticle cleaning function according to claim 1, wherein, The photolithography machine with the mask plate cleaning function further comprises a distance measuring assembly, the distance measuring assembly being used for measuring a distance between the air shower and a surface of the mask plate.

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