Sample positioning boat for chemical vapor deposition and chemical vapor deposition device
By designing crucible-shaped and substrate-shaped positioning grooves for the sample positioning boat, the problem of unstable placement of reactants and substrates was solved, realizing quantitative control and stability improvement of CVD experiments, which is applicable to a variety of experimental scenarios.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- PEKING UNIV SHENZHEN GRADUATE SCHOOL
- Filing Date
- 2025-01-16
- Publication Date
- 2026-04-14
AI Technical Summary
Existing chemical vapor deposition experiments lack reproducibility and quantitative control, mainly due to the lack of stable quantitative control methods for the placement of reactants and substrates, leading to unstable experimental results.
A sample positioning boat is designed, comprising a crucible-shaped positioning groove and a substrate-shaped positioning groove. By fixing the shape and position, the placement of reactants and substrate is controlled, thereby achieving quantitative control of the spatial distribution of reaction raw materials and the quantitative placement of the substrate. It is made of an inert, high-temperature resistant material.
It improves the stability and repeatability of chemical vapor deposition experiments, enables quantitative control of experimental parameters, is applicable to the exploration of various experimental spaces, and enhances the effectiveness of the CVD process.
Smart Images
Figure CN224119105U_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of chemical vapor deposition technology, specifically to a sample positioning boat and a chemical vapor deposition apparatus for chemical vapor deposition. Background Technology
[0002] Chemical vapor deposition (CVD) is a key technology that uses gaseous or vaporous substances to react at high temperatures at the gas phase or gas-solid interface to obtain solid materials. It plays a crucial role in the research and development of new crystals, the deposition of thin film materials, and the manufacture of semiconductor devices. CVD has also become an important method in the field of inorganic chemical synthesis.
[0003] The basic principle of CVD includes, but is not limited to: introducing gaseous reactants in a specific manner into a reaction chamber, while placing a substrate in the chamber to receive the reactants. The gaseous reactants complete a series of processes such as migration and chemical reaction in the gas phase, and are deposited on the substrate surface, where they undergo further chemical reaction to generate solid products, thereby completing the preparation of specific materials.
[0004] The entire CVD process is a black box; experimental results can only be obtained by controlling all macroscopic parameters in the subsequent experiment. Therefore, quantifying experimental parameters is a key challenge. Key controllable macroscopic parameters in chemical vapor deposition include, but are not limited to: the temperature of the reaction chamber, system pressure, the type and flow rate of the gas used to carry the gaseous reactants, the type of substrate, and the type of reactants.
[0005] However, during the research process, it was found that despite strict control of the above key macroscopic parameters, the reproducibility of CVD experiments was still not ideal. Therefore, how to effectively improve the reproducibility of CVD experiments remains a key research focus in the field of chemical vapor deposition technology. Summary of the Invention
[0006] The purpose of this application is to provide a novel sample positioning boat for chemical vapor deposition, and a chemical vapor deposition apparatus employing the sample positioning boat.
[0007] To achieve the above objectives, this application adopts the following technical solution:
[0008] One aspect of this application discloses a sample positioning boat for chemical vapor deposition, comprising at least one crucible contour positioning groove and several substrate contour positioning grooves; the crucible contour positioning groove is used to place the crucible, and the substrate contour positioning groove is used to place the substrate.
[0009] It should be noted that this study found that the solid state of the reactants significantly affects their transformation into a gaseous state, thus affecting the entire reaction. For powdered raw materials, their surface activity is relatively uncontrollable and affected by the stacking method, resulting in poor reproducibility of scientific experiments. On the other hand, the placement of the substrate also significantly affects the experimental results, as the distribution of reactants in different locations varies, thus affecting the deposition results on the substrate. In existing chemical vapor deposition experiments, the placement of reactant raw materials and substrates is designed by the experimenters based on their experimental experience, lacking a stable quantitative control method. Therefore, this hinders the reproducibility of CVD experiments and the quantitative description of experimental parameters.
[0010] Based on the above research and understanding, this application creatively develops a novel sample positioning boat. Utilizing crucible-shaped and substrate-shaped positioning grooves with fixed shapes and positions, it upgrades the quantitative control of the CVD experimental process. Using this positioning boat, the reaction position of raw materials in the CVD furnace can be quantitatively controlled, thereby controlling the spatial distribution of the reactants in the reaction system. Furthermore, the quantitative placement of the substrate in the reaction chamber can be quantitatively controlled, thereby quantitatively controlling the spatial distribution of reaction sites. Therefore, the sample positioning boat of this application can also be called a spatial positioning boat. The multi-compatibility design of several substrate-shaped positioning grooves broadens the application scenarios of this spatial positioning boat.
[0011] In summary, this application achieves multi-compatibility and quantitative experimental parameters, improves experimental stability and reproducibility, ensures further quantitative control of the CVD process and exploration of various experimental spaces, and is applicable to various CVD processes. Therefore, using the multi-compatibility spatial positioning boat of this application for quantitative experiments can improve the effectiveness of CVD experiments and has strong practicality.
[0012] In one implementation of this application, the crucible contour positioning groove is located upstream of the substrate contour positioning groove; during use, the airflow direction from upstream to downstream is the positive direction.
[0013] In one implementation of this application, the sample positioning boat further includes a matching crucible for placing the sample.
[0014] In one implementation of this application, the sample positioning boat further includes a matching substrate.
[0015] In one implementation of this application, the substrate includes at least one of silicon wafer, sapphire, and magnesium oxide.
[0016] In one implementation of this application, the sample positioning boat is an integrally formed structure.
[0017] In one implementation of this application, the sample positioning boat is made of an inert, high-temperature resistant solid material.
[0018] In one implementation of this application, the sample positioning boat is made of quartz glass, corundum, or silicon carbide.
[0019] Another aspect of this application discloses a chemical vapor deposition apparatus employing the sample positioning boat of this application.
[0020] In one implementation of this application, the chemical vapor deposition apparatus includes a sample rod, the end of which is designed with an interface for connecting to the sample positioning boat of this application.
[0021] Due to the adoption of the above technical solutions, the beneficial effects of this application are as follows:
[0022] The sample positioning boat of this application can quantitatively control the spatial position of the sample, control the spatial distribution of reaction raw materials and reaction sites in the reaction system, thereby improving the stability and repeatability of chemical vapor deposition experiments. The sample positioning boat of this application ensures further quantitative control of the chemical vapor deposition experimental process, can be used for exploration and research in various experimental spaces, is applicable to various chemical vapor deposition experimental processes and devices, and has strong practicality. Attached Figure Description
[0023] Figure 1 This is a schematic diagram of the sample positioning boat in an embodiment of this application. Detailed Implementation
[0024] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.
[0025] In the description of this application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.
[0026] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this application, "multiple" means two or more, unless otherwise explicitly specified.
[0027] Example
[0028] In this example, the sample positioning boat, such as... Figure 1 As shown, the sample positioning boat 1 includes at least one crucible contour positioning groove 2 and several substrate contour positioning grooves 3; the crucible contour positioning groove 2 is used to place the crucible, and the substrate contour positioning groove 3 is used to place the substrate.
[0029] In this example, the crucible contour positioning groove 2 is located upstream of the substrate contour positioning groove 3. In this example, the direction of airflow from upstream to downstream is defined as the positive direction. After placing the crucible 4 on the positioning boat, there are several substrate contour positioning grooves 3 downstream of the crucible, and the substrate 5 can be placed in different positions according to experimental requirements.
[0030] For ease of use, this example includes a crucible 4, whose shape and size match the crucible contour positioning groove 2, allowing for accurate placement. Furthermore, a substrate 5 is also provided. All substrate contour positioning grooves 3 can accommodate substrates with matching shapes and sizes. The type of substrate is determined by the substrate itself, and specific substrate types include, but are not limited to, silicon wafers, sapphire, and magnesium oxide. The number of substrates placed in the substrate contour positioning grooves downstream of the crucible can be multiple; that is, multiple substrates can be placed in multiple substrate contour positioning grooves.
[0031] The sample positioning boat in this example is a one-piece molded structure. In order to meet the requirements of chemical vapor deposition reaction, the sample positioning boat is made of inert high-temperature resistant solid materials, including but not limited to quartz glass, corundum or silicon carbide.
[0032] This example uses the synthesis of MoS2 two-dimensional material to illustrate the use of the positioning boat. The specific preparation method of MoS2 two-dimensional material includes: placing MoO3 powder in a crucible and pressing the crucible containing the MoO3 powder to ensure that the surface area of the powder in the crucible is under control; placing the crucible containing the pressed powder in a conformal positioning groove. Assuming the airflow direction from upstream to downstream is positive, after placing the crucible on the positioning boat, several substrate conformal positioning grooves exist downstream of the crucible. All conformal positioning grooves can accommodate substrates of the same size. The type of substrate is determined by the substrate itself. Substrate types include, but are not limited to, silicon wafers, sapphire, and magnesium oxide. The number of substrates placed in the substrate conformal positioning grooves downstream of the crucible can be multiple; that is, multiple substrates can be placed in multiple substrate conformal positioning grooves.
[0033] After placing the substrate, the entire positioning boat can be placed in the CVD furnace. The position of the positioning boat in the CVD furnace is determined by the experimenter, and the effect of different placements is related to the temperature zone shape design of the CVD furnace itself. After the positioning boat is placed in the CVD furnace, for the growth of MoS2 two-dimensional materials, sulfur (S) needs to be introduced into the CVD process. The introduction of S can be designed by the experimenter, including but not limited to introducing H2S gas, sublimating solid S, or introducing S-containing organic matter. It should be noted that for the introduction of solid S, the spatial positioning boat can also be used to control the surface area of S sublimation, further controlling the experimental parameters. Specifically, S powder can be placed in a crucible and compacted, and then the crucible containing the compacted powder can be placed in another conformal positioning groove, positioned upstream of the substrate in the furnace. At this time, the positioning boat needs to be designed with two crucible conformal positioning grooves, one for placing the crucible containing MoO3 powder and the other for placing the crucible containing S powder. It can be understood that the crucible conformal positioning grooves are not limited to one or two; multiple grooves can be designed according to the usage requirements.
[0034] After all materials are placed, the positioning boat is placed in the CVD furnace, which is then sealed to ensure isolation from air. An inert gas, including but not limited to argon (Ar), is then introduced into the furnace to purge the atmosphere. Once purging is complete, the furnace is heated to the experimental temperature. At this point, MoO3 in the furnace transforms into a gaseous substance and forms a spatial distribution within the CVD furnace. With the assistance of the positioning boat, two-dimensional MoS2 material is generated on the substrate at specific spatial locations and continues to grow, gradually increasing in size and exhibiting a specific shape. After a period of time, the growth of MoS2 on the substrate is complete. The substrate is then removed, revealing the CVD-grown MoS2 material.
[0035] In the CVD process, the material field distribution is controlled by the position of MoO3 in the CVD furnace, while the growth position of MoS2 is controlled by the substrate placement. This application effectively solves the problem of quantitative spatial control of these positions. Furthermore, it ensures good compatibility with different placement positions, significantly expanding its application scenarios, regarding the impact of different spatial arrangements on experimental results.
[0036] In summary, this application achieves multi-compatibility and quantitative experimental parameters, improves experimental stability, ensures further quantitative control of the CVD process, and facilitates the exploration of multiple experimental spaces, making it fully applicable to various CVD processes. Therefore, using this multi-compatibility spatial positioning boat for quantitative experiments is an important method for improving the effectiveness of CVD experiments and has strong practical value.
[0037] The above examples illustrate the present invention only to aid in understanding it and are not intended to limit the scope of the invention. Those skilled in the art can make various simple deductions, modifications, or substitutions based on the principles of this invention.
Claims
1. A sample positioning boat for chemical vapor deposition, characterized in that: It includes at least one crucible contour positioning groove (2) and several substrate contour positioning grooves (3); the crucible contour positioning groove (2) is used to place the crucible, and the substrate contour positioning groove (3) is used to place the substrate.
2. The sample positioning boat according to claim 1, characterized in that: The crucible contour positioning groove (2) is located upstream of the substrate contour positioning groove (3); when in use, the airflow direction from upstream to downstream is the positive direction.
3. The sample positioning boat according to claim 1, characterized in that: It also includes a matching crucible (4) for placing the sample.
4. The sample positioning boat according to claim 1, characterized in that: It also includes a matching substrate.
5. The sample positioning boat according to claim 4, characterized in that: The substrate includes at least one of silicon wafer, sapphire, and magnesium oxide.
6. The sample positioning boat according to any one of claims 1-5, characterized in that: The sample positioning boat (1) is an integrally molded structure.
7. The sample positioning boat according to any one of claims 1-5, characterized in that: The sample positioning boat (1) is made of an inert, high-temperature resistant solid material.
8. The sample positioning boat according to claim 7, characterized in that: The sample positioning boat (1) is made of quartz glass, corundum or silicon carbide.
9. A chemical vapor deposition apparatus, characterized in that: The sample positioning boat described in any one of claims 1-8 is used.
10. The chemical vapor deposition apparatus according to claim 9, characterized in that: It includes a sample rod, the end of which is designed with an interface for connecting to the sample positioning boat.