Nanometer material preparation and dispersion system

Abstract

The utility model belongs to the technical field of nano material preparation, and particularly relates to a nano material preparation and dispersion system, which comprises a covered kettle cover and a reaction kettle body, and a dispersion mechanism for aeration dispersion is further arranged at the bottom of the reaction kettle body. The dispersing mechanism comprises an inert gas supply pipe and a plurality of aeration branch pipes mounted at one end of the inert gas supply pipe in a communicating manner, one end of each aeration branch pipe extends into the reaction kettle body from the bottom of the reaction kettle body, a stirring mechanism for stirring is further arranged in the reaction kettle body, and the stirring mechanism comprises a mounting frame and rotating fan blades; the mounting frame is mounted on the inner wall of the reaction kettle body, and inert gas is introduced into the reaction kettle body through the additionally arranged dispersing mechanism and a plurality of aeration branch pipes in the dispersing mechanism, so that the mixing degree of a nano material solution and an eluate is increased through explosion of gas in liquid, and the dispersing effect of equipment is improved.

Description

Technical Field

[0001] This invention belongs to the field of nanomaterial preparation technology, specifically relating to a nanomaterial preparation and dispersion system. Background Technology

[0002] Nanomaterials are composed of nanoscale crystalline or amorphous ultraparticles as basic structural units. The preparation of nanomaterials requires a reaction vessel, in which the dissolved nanomaterial solution is fused with the precipitate. Uniform and stable nanoparticles are obtained by means of the shearing action of stirring and the dispersing effect of the dispersant in the precipitate. Stirring is generally carried out by rotating a stirring rod, which has low stirring efficiency and poor effect, making it difficult to control the size and uniformity of the prepared nanomaterials. Utility Model Content

[0003] The purpose of this invention is to provide a nanomaterial preparation and dispersion system to solve the problems mentioned in the background art.

[0004] To achieve the above objectives, the present invention provides the following technical solution: a nanomaterial preparation and dispersion system, comprising: a covered vessel lid and a reaction vessel body, wherein the bottom of the reaction vessel body is further provided with a dispersion mechanism for aeration dispersion, the dispersion mechanism comprising an inert gas supply pipe and a plurality of aeration branch pipes connected to one end of the inert gas supply pipe, one end of each of the plurality of aeration branch pipes extending from the bottom of the reaction vessel body into the interior.

[0005] Preferably, the reactor body is further provided with a stirring mechanism for stirring. The stirring mechanism includes a mounting frame and a rotating fan blade. The mounting frame is installed on the inner wall of the reactor body. A rotating chamber is formed in the mounting frame to accommodate the rotation of the rotating fan blade. A through hole is provided through the rotating chamber from top to bottom on the mounting frame. An inert gas supply pipe is connected to the rotating chamber and a gas supply branch pipe is provided. One end of the gas supply branch pipe is located in the tangential direction on the outer side of the rotating fan blade.

[0006] Preferably, the top and bottom ends of the through hole are provided with mounting brackets, and a rotating shaft is installed at the axis between the two mounting brackets, and the rotating fan blade is rotatably mounted on the rotating shaft.

[0007] Preferably, the reactor body is also provided with an exhaust pipe for depressurization, and the exhaust pipe is provided with an electrically connected solenoid valve and a pressure gauge from the outside to the inside.

[0008] Preferably, one end of the inert gas supply pipe is also provided with a backflow check valve, and the gas supply branch pipe is located on the side of the check valve near the reactor body.

[0009] Preferably, the multiple aeration branch pipes are distributed in a multi-layered ring array from the outside to the inside of the reactor body.

[0010] Compared with the prior art, this utility model has the following advantages:

[0011] (1) This utility model adds a dispersion mechanism, in which multiple aeration branch pipes in the dispersion mechanism introduce inert gas into the reaction vessel body, thereby increasing the mixing degree of nanomaterial solution and precipitate through gas explosion in liquid, and improving the dispersion effect of the equipment.

[0012] (2) By adding a stirring mechanism, the rotating fan blades in the stirring mechanism are driven by inert gas to reduce energy consumption and increase the degree of liquid mixing in the equipment, thereby further improving the dispersion effect of the equipment. Attached Figure Description

[0013] Figure 1 This is a schematic diagram of the structure of this utility model;

[0014] Figure 2 This is a top view of the aeration branch pipe and the reactor body of this utility model;

[0015] Figure 3 This is a top view of the stirring mechanism and the reactor body of this utility model;

[0016] In the diagram: 1. Check valve; 2. Inert gas supply pipe; 3. Aeration branch pipe; 4. Rotary chamber; 5. Rotary fan blade; 6. Through hole; 7. Gas supply branch pipe; 8. Mounting frame; 9. Reactor body; 10. Mounting bracket; 11. Rotating shaft; 12. Pressure gauge; 13. Solenoid valve; 14. Exhaust pipe; 15. Reactor cover. Detailed Implementation

[0017] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0018] refer to Figure 1-2 As shown, the present invention provides a nanomaterial preparation and dispersion system, comprising: a covered lid 15 and a reaction vessel body 9. The bottom of the reaction vessel body 9 is also provided with a dispersion mechanism for aeration dispersion. The dispersion mechanism includes an inert gas supply pipe 2 and multiple aeration branch pipes 3 connected to one end of the inert gas supply pipe 2. One end of each of the multiple aeration branch pipes 3 extends from the bottom of the reaction vessel body 9 into the interior.

[0019] Combination Figure 1As shown, the reactor body 9 is also provided with an exhaust pipe 14 for depressurization. The exhaust pipe 14 is provided with an electrically connected solenoid valve 13 and a pressure gauge 12 from the outside to the inside.

[0020] As described above, using the vessel lid 15, reactor body 9, and dispersion mechanism provided by this utility model, inert gas enters multiple aeration branch pipes 3 through the inert gas supply pipe 2 and is aerated into the reactor body 9 through the multiple aeration branch pipes 3, which facilitates the dispersion of nanomaterials in the precipitate. At this time, the exhaust pipe 14 facilitates the discharge of gas from the reactor body 9, avoiding excessive gas pressure in the reactor body 9. Meanwhile, the pressure gauge 12 and solenoid valve 13 maintain a certain pressure in the reactor body 9, so that the nanomaterials maintain a certain pressure during the reaction.

[0021] Furthermore, to prevent the liquid in the reactor body 9 from flowing back out through the gas supply pipe, refer to Figure 1-2 As shown, one end of the inert gas supply pipe 2 is also equipped with a backflow one-way valve 1, and the gas supply branch pipe 7 is located on the side of the one-way valve 1 near the reactor body 9. The one-way valve 1 prevents liquid in the reactor body 9 from being discharged outward through the inert gas supply pipe 2.

[0022] Furthermore, in order to improve the uniformity of aeration and dispersion in the reactor body 9, reference is made to... Figure 2 As shown, multiple aeration branch pipes 3 are arranged in a multi-layered ring array from the outside to the inside within the reactor body 9. The distribution of the multiple aeration branch pipes 3 allows for uniform aeration of the liquid within the reactor body 9, facilitating the uniform mixing of the nanomaterials and the precipitate.

[0023] In this utility model, combined with Figure 1 and Figure 3 As shown, the reactor body 9 of this embodiment is also provided with a stirring mechanism for stirring. The stirring mechanism includes a mounting frame 8 and a rotating fan blade 5. The mounting frame 8 is installed on the inner wall of the reactor body 9. A rotating chamber 4 is formed in the mounting frame 8 to accommodate the rotation of the rotating fan blade 5. A through hole 6 is provided through the rotating chamber 4 from top to bottom on the mounting frame 8. An inert gas supply pipe 2 is connected to the rotating chamber 4 and a gas supply branch pipe 7 is provided. One end of the gas supply branch pipe 7 is located in the tangential direction on the outside of the rotating fan blade 5.

[0024] As described above, when using the stirring mechanism provided by this utility model, the mounting frame 8 provides an installation position for the rotating fan blade 5 in the reactor body 9. When the gas supply pipe supplies gas, the inert gas enters the rotating chamber 4 through the gas supply branch pipe 7. At the same time, the inert gas impacts the rotating fan blade 5, thereby driving the rotating fan blade 5 to rotate. In turn, the rotating fan blade 5 stirs the liquid, improving the mixing degree between the nanomaterial and the precipitate.

[0025] Furthermore, to facilitate the rotational mounting of the rotating fan blade 5 onto the mounting frame 8, refer to... Figure 1 and Figure 3 As shown, mounting brackets 10 are provided at both the top and bottom of the through hole 6, and a rotating shaft 11 is installed at the axis between the two mounting brackets 10. The rotating fan blade 5 is rotatably mounted on the rotating shaft 11. The rotating shaft 11 is installed in the rotating chamber 4 through the two mounting brackets 10, and the rotating shaft 11 facilitates the rotatable mounting of the rotating fan blade 5 in the rotating chamber 4.

[0026] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A nanomaterial preparation and dispersion system, characterized in that, include: The reactor body (9) is covered with a lid (15) and a reactor body (9). The bottom of the reactor body (9) is also provided with a dispersion mechanism for aeration and dispersion. The dispersion mechanism includes an inert gas supply pipe (2) and multiple aeration branch pipes (3) connected to one end of the inert gas supply pipe (2). One end of each of the multiple aeration branch pipes (3) extends from the bottom of the reactor body (9) into the interior.

2. The nanomaterial preparation and dispersion system of claim 1, wherein: The reactor body (9) is also provided with a stirring mechanism for stirring. The stirring mechanism includes a mounting frame (8) and a rotating fan blade (5). The mounting frame (8) is installed on the inner wall of the reactor body (9). A rotating chamber (4) is formed in the mounting frame (8) to accommodate the rotation of the rotating fan blade (5). A through hole (6) is provided through the rotating chamber (4) from top to bottom on the mounting frame (8). An inert gas supply pipe (2) is connected to the rotating chamber (4) by a gas supply branch pipe (7), and one end of the gas supply branch pipe (7) is located in the tangential direction outside the rotating fan blade (5).

3. The nanomaterial preparation and dispersion system of claim 2, wherein: The top and bottom ends of the through hole (6) are provided with mounting brackets (10), and a rotating shaft (11) is installed at the axis between the two mounting brackets (10). The rotating fan blade (5) is rotatably mounted on the rotating shaft (11).

4. The nanomaterial preparation and dispersion system of claim 1, wherein: The reactor body (9) is also provided with an exhaust pipe (14) for depressurization. The exhaust pipe (14) is provided with an electrically connected solenoid valve (13) and a pressure gauge (12) from the outside to the inside.

5. The nanomaterial preparation and dispersion system of claim 2, wherein: One end of the inert gas supply pipe (2) is also provided with a one-way valve (1) for backflow, and the gas supply branch pipe (7) is located on the side of the one-way valve (1) close to the reactor body (9).

6. The nanomaterial preparation and dispersion system of claim 1, wherein: Multiple aeration branch pipes (3) are arranged in a multi-layered ring array from the outside to the inside in the reactor body (9).

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