Surface cleaning device of feed gas buffer tank

Abstract

The utility model provides a surface cleaning device for a feed gas buffer tank, which relates to the technical field of buffer tanks and comprises a cleaning ring made of flexible materials and a cleaning component, the cleaning component comprises a mounting ring, the cleaning ring is arranged on the mounting ring, and both the mounting ring and the cleaning ring are provided with openings. According to the surface cleaning device of the raw material gas buffer tank, the cleaning ring is attached to the buffer tank, the surface of the buffer tank can be cleaned through vertical movement of the cleaning ring, when a cleaning plate moves to the position of a flange connector, due to the fact that the cleaning plate abuts against the flange connector, a torsional spring on a positioning plate can deform, and the surface of the buffer tank is cleaned. The positioning plate and the cleaning plate can rotate with the rotating shaft as the circle center until the cleaning ring moves to the position below the flange connector, at the moment, the positioning plate can drive the cleaning plate to reset under the action of the elastic force of the torsional spring, and when the device is used for cleaning the buffer tank, the flange connector can be avoided, so that the cleaning range is enlarged, and the cleaning effect is improved.

Description

Technical Field

[0001] This utility model relates to a cleaning device, specifically a surface cleaning device for a raw material gas buffer tank, belonging to the field of buffer tank technology. Background Technology

[0002] Buffer tanks are commonly used in various systems to mitigate pressure fluctuations and improve system stability. They primarily rely on compressed air within the tank to achieve the buffering effect. Types include diaphragm and bladder types, and they are widely used in water supply systems and central air conditioning systems. Most existing buffer tanks lack cleaning mechanisms, leading to the accumulation of dust and debris on their exteriors over long-term use. Failure to clean them promptly can cause corrosion, affecting equipment lifespan and operational safety.

[0003] Chinese patent application CN220678868U discloses a surface cleaning device for a raw material gas buffer tank. When it is necessary to clean the surface of the tank, the motor is started, the motor drives the reciprocating screw to rotate, the reciprocating screw drives the moving block to move up and down, the moving block drives the cleaning ring to move up and down, and the cleaning ring cleans the surface of the tank through the cleaning ring, thus achieving the surface cleaning effect.

[0004] The aforementioned patented technical solution uses a lead screw to drive a moving block and a cleaning ring to clean the surface of the tank. However, in practical applications, it has been found that buffer tanks have flange interfaces, and the cleaning ring in the aforementioned technical solution is a fully enclosed annular structure. During movement, it is obstructed by the flange interface on the tank, limiting the cleaning range. Therefore, a surface cleaning device for raw material gas buffer tanks is proposed here. Utility Model Content

[0005] This invention proposes a surface cleaning device for a raw material gas buffer tank, which can avoid flange interfaces, thereby expanding the cleaning range and improving the cleaning effect.

[0006] This utility model is achieved through the following technical solution: a surface cleaning device for a raw material gas buffer tank, including a cleaning ring, which may be made of a flexible material, and a cleaning component, wherein the cleaning component includes a mounting ring, the cleaning ring is disposed on the mounting ring, and both the mounting ring and the cleaning ring have openings.

[0007] The cleaning component also includes a second screw. The mounting ring is connected to the cleaning ring by the second screw. After the second screw is removed, the cleaning ring can be removed and cleaned, which is convenient for subsequent reuse. In addition, the second screw does not penetrate the cleaning ring, so as to avoid damage to the buffer tank.

[0008] A cleaning plate is provided on the mounting ring, and a sponge block is provided on the cleaning plate. The sponge block is positioned between the cleaning ring and the cleaning plate. To ensure that the cleaning plate can rotate, there is a certain gap between the cleaning ring and the cleaning plate. Therefore, there are cleaning dead corners. The sponge block can clean these dead corners.

[0009] The mounting ring has two symmetrical U-shaped plates fixed at its open end. Each U-shaped plate is equipped with a rotating shaft, and a positioning plate is mounted on the rotating shaft via two torsion springs in opposite directions. The two torsion springs in opposite directions can position the positioning plate. When the positioning plate is not subjected to external force, it can remain in a horizontal state. The positioning plate is connected to the cleaning plate. The cleaning component also includes a first screw, which connects the cleaning plate to the positioning plate. The first screw does not penetrate the cleaning plate to avoid damaging the buffer tank. When the cleaning plate moves upward, it will rotate upward under the pressure of the flange interface until it moves above the flange interface. Under the elastic force of the torsion spring, the positioning plate will drive the cleaning plate to rotate to a horizontal state.

[0010] It also includes a guide component, on which the mounting ring is disposed. The guide component includes a first fixing plate and a second fixing plate, both of which are provided with guide rods. Bolts are installed between the first fixing plate and the second fixing plate. Guide plates are fixed on both the first fixing plate and the second fixing plate, and the guide plates are connected to the guide rods. The mounting ring is disposed on the guide rods. The cleaning component also includes a guide block, which is fixed on the mounting ring and slidably connected to the guide rods. The mounting ring can slide on the guide rods via the guide block, and the guide rods can guide the mounting ring and the cleaning ring. Furthermore, the guide component can be replaced with a lead screw module, which is used to raise and lower the mounting ring and the cleaning ring.

[0011] This utility model provides a surface cleaning device for a raw material gas buffer tank, which has the following beneficial effects:

[0012] 1. The surface cleaning device of the raw material gas buffer tank has a cleaning ring that fits into the buffer tank. The surface of the buffer tank can be cleaned by the up and down movement of the cleaning ring. When the cleaning plate moves to the flange interface, the torsion spring on the positioning plate will deform because the cleaning plate abuts against the flange interface. The positioning plate and the cleaning plate will rotate around the pivot until the cleaning ring moves below the flange interface. At this time, under the action of the torsion spring, the positioning plate will drive the cleaning plate to return to its original position. When cleaning the buffer tank, this device can avoid the flange interface, thereby expanding the cleaning range and improving the cleaning effect. Attached Figure Description

[0013] Figure 1 This is a three-dimensional structural diagram of the present invention;

[0014] Figure 2 For the present utility model Figure 1 Enlarged schematic diagram of the structure at point A in the middle;

[0015] Figure 3 For the present utility model Figure 1 Enlarged schematic diagram of the structure at point B;

[0016] Figure 4 This is a schematic diagram of the mounting ring and guide block structure of this utility model.

[0017] Explanation of reference numerals in the attached figures

[0018] 1. Cleaning ring;

[0019] 2. Cleaning components; 201. Mounting ring; 202. Guide block; 203. Cleaning plate; 204. U-shaped plate; 205. Rotating shaft; 206. Positioning plate; 207. First screw; 208. Sponge block; 209. Second screw;

[0020] 3. Guide components; 301. First fixing plate; 302. Second fixing plate; 303. Bolt; 304. Guide plate; 305. Guide rod;

[0021] 4. Buffer tank; 5. Flange interface. Detailed Implementation

[0022] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of the embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of this application.

[0023] Please see Figures 1-4 The present invention proposes the following implementation scheme: a surface cleaning device for a raw material gas buffer tank, including a cleaning ring 1, which may be made of a flexible material, and a cleaning component 2, which includes a mounting ring 201. The cleaning ring 1 is disposed on the mounting ring 201, and both the mounting ring 201 and the cleaning ring 1 have openings.

[0024] Please refer to this carefully. Figure 2 and Figure 4 The cleaning component 2 also includes a second screw 209. The mounting ring 201 is connected to the cleaning ring 1 by the second screw 209. After the second screw 209 is removed, the cleaning ring 1 can be removed and then cleaned for easy reuse. In addition, the second screw 209 does not penetrate the cleaning ring 1, thus avoiding damage to the buffer tank 4.

[0025] A cleaning plate 203 is provided on the mounting ring 201, and a sponge block 208 is provided on the cleaning plate 203. The sponge block 208 is located between the cleaning ring 1 and the cleaning plate 203. In order to ensure that the cleaning plate 203 can rotate, there is a certain gap between the cleaning ring 1 and the cleaning plate 203. Therefore, there are cleaning dead corners. The sponge block 208 is provided to clean these dead corners.

[0026] The open end of the mounting ring 201 is fixed with two symmetrical U-shaped plates 204. Each U-shaped plate 204 is provided with a rotating shaft 205. A positioning plate 206 is provided on the rotating shaft 205 through two torsion springs in opposite directions. The positioning plate 206 can be positioned by the two torsion springs in opposite directions. When the positioning plate 206 is not subjected to external force, the positioning plate 206 can maintain a horizontal state. The positioning plate 206 is connected to the cleaning plate 203.

[0027] Please refer to this carefully. Figure 2 The cleaning component 2 also includes a first screw 207. The cleaning plate 203 is connected to the positioning plate 206 by the first screw 207, and the first screw 207 does not penetrate the cleaning plate 203 to avoid damage to the buffer tank 4. When the cleaning plate 203 moves upward, it will rotate upward under the pressure of the flange interface 5 until it moves above the flange interface 5. Under the elastic force of the torsion spring, the positioning plate 206 will drive the cleaning plate 203 to rotate to a horizontal state.

[0028] Please refer to this carefully. Figure 1 and Figure 3 It also includes a guide component 3, and a mounting ring 201 is disposed on the guide component 3. The guide component 3 includes a first fixing plate 301 and a second fixing plate 302. Guide rods 305 are provided on both the first fixing plate 301 and the second fixing plate 302. Bolts 303 are installed between the first fixing plate 301 and the second fixing plate 302. Guide plates 304 are fixed on both the first fixing plate 301 and the second fixing plate 302. Guide plates 304 are connected to guide rods 305. The mounting ring 201 is disposed on the guide rods 305.

[0029] The cleaning component 2 also includes a guide block 202, which is fixed on the mounting ring 201. The guide block 202 is slidably connected to the guide rod 305. The mounting ring 201 can slide on the guide rod 305 through the guide block 202. The guide rod 305 can guide the mounting ring 201 and the cleaning ring 1. Furthermore, the guide component 3 can be replaced with a lead screw module, which can be used to raise and lower the mounting ring 201 and the cleaning ring 1.

[0030] Working principle: When cleaning the buffer tank 4, the mounting ring 201 is first moved by the guide block 202. The mounting ring 201 will move on the guide rod 305 via the guide block 202. The moving mounting ring 201 will drive the cleaning ring 1 to move on the buffer tank 4. The surface of the buffer tank 4 is cleaned by the cleaning ring 1 which is in contact with the buffer tank 4. When the cleaning plate 203 moves to the position of the flange interface 5, the torsion spring on the positioning plate 206 will deform because the cleaning plate 203 is against the flange interface 5. The positioning plate 206 and the cleaning plate 203 will rotate around the pivot 205 until the cleaning ring 1 moves below the flange interface 5. At this time, under the action of the torsion spring, the positioning plate 206 will drive the cleaning plate 203 to return to its original position. When cleaning the buffer tank 4, this device can avoid the flange interface 5, thereby expanding the cleaning range and improving the cleaning effect.

[0031] The foregoing has shown and described the basic principles, main features, and advantages of this utility model. Those skilled in the art should understand that this utility model is not limited to the above embodiments. The embodiments and descriptions in the specification are merely illustrative of the principles of this utility model. Various changes and modifications can be made to this utility model without departing from its spirit and scope, and all such changes and modifications fall within the scope of the claims. The scope of protection of this utility model is defined by the appended claims and their equivalents.

Claims

1. A surface cleaning device for a raw material gas buffer tank, comprising a cleaning ring (1), characterized in that: It also includes a cleaning component (2), which includes a mounting ring (201), a cleaning ring (1) disposed on the mounting ring (201), both the mounting ring (201) and the cleaning ring (1) having openings, and a cleaning plate (203) disposed on the mounting ring (201); It also includes a guide component (3), and the mounting ring (201) is disposed on the guide component (3). The guide component (3) includes a first fixing plate (301) and a second fixing plate (302). Guide rods (305) are disposed on both the first fixing plate (301) and the second fixing plate (302). The mounting ring (201) is disposed on the guide rods (305).

2. The surface cleaning device for a raw material gas buffer tank according to claim 1, characterized in that: The mounting ring (201) has two symmetrical U-shaped plates (204) fixed at its open end. Each U-shaped plate (204) is provided with a rotating shaft (205). A positioning plate (206) is provided on the rotating shaft (205) through two torsion springs in opposite directions. The positioning plate (206) is connected to the cleaning plate (203).

3. The surface cleaning device for a raw material gas buffer tank according to claim 2, characterized in that: The cleaning component (2) also includes a first screw (207), and the cleaning plate (203) is connected to the positioning plate (206) by the first screw (207).

4. The surface cleaning device for a raw material gas buffer tank according to claim 1, characterized in that: A sponge block (208) is provided on the cleaning plate (203), and the sponge block (208) is disposed between the cleaning ring (1) and the cleaning plate (203).

5. The surface cleaning device for a raw material gas buffer tank according to claim 1, characterized in that: The cleaning component (2) also includes a second screw (209), and the mounting ring (201) is connected to the cleaning ring (1) by the second screw (209).

6. The surface cleaning device for a raw material gas buffer tank according to claim 1, characterized in that: A bolt (303) is installed between the first fixing plate (301) and the second fixing plate (302). A guide plate (304) is fixed on both the first fixing plate (301) and the second fixing plate (302). The guide plate (304) is connected to the guide rod (305).

7. The surface cleaning device for a raw material gas buffer tank according to claim 1, characterized in that: The cleaning component (2) further includes a guide block (202), which is fixed on the mounting ring (201) and is slidably connected to the guide rod (305).

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