Flow guide assembly and rapid annealing furnace

Abstract

The utility model discloses a flow guide assembly and a rapid annealing furnace, and belongs to the technical field of semiconductor processing. The flow guide assembly is arranged in a reaction cavity of the rapid annealing furnace, and a gas inlet and a gas outlet are formed in the reaction cavity in the first direction. The flow guide assembly comprises a partition plate assembly and a supporting needle, the partition plate assembly comprises a first partition plate and a second partition plate which are arranged at an interval in the vertical direction and respectively support the reaction cavity, a gap is formed between the first partition plate and the second partition plate, and two ends of the gap in the first direction are respectively communicated with the air inlet and the air outlet; the heating assemblies are arranged on the two sides of the partition plate assembly in the vertical direction and are arranged outside the gap, and an included angle is formed between the first direction and the vertical direction; the supporting needles are arranged on the second partition plate and arranged in the gaps, the supporting needles are used for supporting the products, the uniformity of product process result data can be ensured, the structure is simple, and the machining, assembling and maintaining difficulty can be lowered.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor processing technology, and in particular to a flow guiding component and a rapid annealing furnace. Background Technology

[0002] A rapid thermal processing (RTP) furnace is a device used for processing semiconductor materials. It heats products to high temperatures, typically 400°C-1300°C, in a very short time, and then cools them rapidly, such as when the product is a wafer.

[0003] Ensuring the uniformity of product process data in rapid annealing furnaces is one of the key design challenges and difficulties. Relevant process factors include temperature and atmosphere. Existing technology uses a separate, integrated cooling chamber made of quartz material to guide airflow and support the product, ensuring uniform cooling and thus guaranteeing the uniformity of process data. However, this cooling chamber design is complex, and its processing, assembly, and maintenance are also challenging. Utility Model Content

[0004] The purpose of this invention is to provide a flow guiding component and a rapid annealing furnace, which can ensure the uniformity of product process result data, has a simple structure, and can reduce the difficulty of processing, assembly and maintenance.

[0005] To achieve this objective, the present invention adopts the following technical solution:

[0006] A flow guiding assembly is disposed in the reaction chamber of a rapid annealing furnace, the reaction chamber having an inlet and an outlet along a first direction; the flow guiding assembly includes:

[0007] The partition assembly includes a first partition and a second partition, which are spaced apart along the vertical direction and respectively supported on the reaction chamber. A gap is formed between the first partition and the second partition, and the two ends of the gap along the first direction are respectively connected to the air inlet and the air outlet. The heating assembly is disposed on both sides of the partition assembly along the vertical direction and outside the gap. The first direction and the vertical direction are arranged at an angle.

[0008] A support pin is disposed on the second partition and within the gap, and the support pin is used to support the product.

[0009] In some possible implementations, the air outlet has a rectangular cross-section; the first baffle is flush with the upper surface of the air outlet, and / or the second baffle is not higher than the lower surface of the air outlet.

[0010] In some possible implementations, the second partition has multiple sets of mounting portions corresponding to the concentric pitch circles. The mounting portions are used to mount the support pins. The multiple sets of mounting portions correspond to products of various sizes. The support pins can be selectively mounted on one of the multiple sets of mounting portions to support the products of the corresponding sizes.

[0011] In some possible implementations, the flow guiding assembly further includes a first air intake plate and a second air intake plate disposed on the side of the partition assembly facing the air inlet and spaced apart along a first direction. The first air intake plate has a uniformly arranged first air intake hole, and the second air intake plate has a uniformly arranged second air intake hole. The first air intake hole and the second air intake hole are staggered, and the air inlet, the first air intake hole, the second air intake hole and the gap are connected.

[0012] In some possible implementations, the flow guiding assembly further includes a partition and a pin passing through the partition, the second air intake plate having a lug passing through the side of the first partition plate opposite to the second partition plate, the pin passing through the lug and abutting against the first partition plate, so that the second air intake plate is mounted on the first partition plate, the partition plate being disposed between the first air intake plate and the second air intake plate; and / or, the first air intake plate being supported between the reaction chamber and the first partition plate.

[0013] In some possible implementations, the second partition is supported in the reaction chamber by a support column.

[0014] In some possible implementations, at least three support columns are provided, and the at least three support columns are spaced apart. The heating assembly includes a heating lamp tube, and the support columns are located on the side of the heating lamp tube.

[0015] In some possible implementations, the reaction chamber is provided with a support platform, and the first partition is supported and installed on the support platform.

[0016] In some possible implementations, the flow guiding component is a quartz structure.

[0017] A rapid annealing furnace includes a reaction chamber and a flow guiding assembly as described in any of the preceding claims disposed within the reaction chamber.

[0018] The beneficial effects of this utility model are:

[0019] This utility model provides a flow guiding component and a rapid annealing furnace. A first partition and a second partition form a gap. The first partition, the second partition, and the reaction chamber, along with the side walls on both sides in a third direction, enclose a receiving space. Process gas flows into the receiving space from the inlet and out from the outlet. The gap between the first and second partitions allows the gas flow to pass through the receiving space in a laminar flow manner. That is, the first and second partitions constrain the gas flow, guiding and limiting the flow direction of the process gas, thereby achieving uniform cooling of the product and ensuring the uniformity of the product's process results data. Heating components are located on both sides of the partition assembly and outside the gap, avoiding occupying the space between the first and second partitions. This helps to reduce the gap distance between the first and second partitions, minimizing the distance between the product (e.g., a wafer) and the partition assembly, further ensuring that the airflow passes through the product in a laminar flow manner, thus further achieving uniform cooling of the product. The first and second partitions are respectively supported in the reaction chamber. The support pin is located on the second partition. The flow guiding components are set separately. The process gas is guided and supported in the product through combination. The structure is simple and easy to process, assemble and maintain. Attached Figure Description

[0020] Figure 1 This is a partial schematic diagram of a rapid annealing furnace provided in a specific embodiment of this utility model;

[0021] Figure 2 yes Figure 1 Enlarged view of point A;

[0022] Figure 3 This is a perspective view of the flow guiding component provided in a specific embodiment of this utility model;

[0023] Figure 4 This is a front view of the flow guiding component provided in a specific embodiment of this utility model;

[0024] Figure 5 This is a schematic diagram of the assembly of the partition and the pin provided in a specific embodiment of this utility model.

[0025] In the picture:

[0026] 100. Reaction chamber; 110. Support platform; 120. Gas outlet; 1201. Upper surface; 1202. Lower surface; 200. Heating lamp; 300. Product;

[0027] 1. Partition assembly; 11. First partition; 111. First gripping part; 12. Second partition; 121. Mounting part; 1211. First mounting hole; 1212. Second mounting hole; 1213. Third mounting hole; 122. Second gripping part;

[0028] 2. Support pin; 3. First air intake plate; 31. First air intake hole; 4. Second air intake plate; 41. Second air intake hole; 42. Lug; 5. Barrier; 6. Pin; 7. Support column. Detailed Implementation

[0029] To make the technical problems solved by this utility model, the technical solutions adopted, and the technical effects achieved clearer, the technical solutions of the embodiments of this utility model will be further described in detail below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, and not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model.

[0030] In the description of this utility model, unless otherwise explicitly specified and limited, the terms "connected," "linked," and "fixed" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0031] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0032] like Figures 1-5As shown, this embodiment provides a rapid annealing furnace, including a reaction chamber 100 and a flow guiding assembly disposed within the reaction chamber 100. The reaction chamber 100 has an air inlet and an air outlet 120 along a first direction. This embodiment also provides a flow guiding assembly, including a partition assembly 1 and a support pin 2. The partition assembly 1 includes a first partition 11 and a second partition 12, which are vertically spaced and supported on the reaction chamber 100, respectively. A gap is formed between the first partition 11 and the second partition 12, and the two ends of the gap along the first direction are respectively connected to the air inlet and the air outlet 120. Heating lamps 200 are disposed on both sides of the partition assembly 1 along a second direction and outside the gap, with the first direction and the second direction forming an angle. The support pin 2 is disposed on the second partition 12 and within the gap, and the support pin 2 is used to support a product 300, such as a wafer.

[0033] For example, the first direction is the X direction, the second direction is the Y direction, and the third direction is the Z direction. The first direction, the second direction, and the third direction are perpendicular to each other, wherein the second direction is the vertical direction.

[0034] The first partition 11 and the second partition 12 form a gap. The first partition 11, the second partition 12, and the reaction chamber 100 enclose a accommodating space along the side walls on both sides in the third direction. The process gas flows into the accommodating space from the inlet and flows out from the outlet 120. The gap between the first partition 11 and the second partition 12 allows the gas to flow in a laminar manner within the accommodating space. That is, the flow state of the gas is constrained by the first partition 11 and the second partition 12, which guides and limits the flow direction of the process gas, thereby achieving uniform cooling of the product 300 and ensuring the uniformity of the process result data of the product 300. The heating components are located on both sides of the partition assembly 1 and outside the gap, which helps to reduce the gap distance between the first partition 11 and the second partition 12, minimize the distance between the wafer and the partition assembly 1, further ensure that the gas flows through the product 300 in a laminar manner, and thus further achieve uniform cooling of the product 300. The first partition 11 and the second partition 12 are respectively supported on the reaction chamber 100. The support pin 2 is located on the second partition 12. The flow guiding components are set separately. The process gas is guided and supported on the product 300 through combination. The structure is simple and easy to process, assemble and maintain.

[0035] The air outlet 120 has a rectangular cross-section, with an upper surface 1201 and a lower surface 1202 along the vertical direction. The first baffle 11 is flush with the upper surface 1201 of the air outlet 120, thereby achieving a smaller gap distance and further ensuring that the airflow passes through the product 300 in a laminar manner. The second baffle 12 is not higher than the lower surface 1202 of the air outlet 120. For example, the second baffle 12 is flush with the lower surface 1202 of the air outlet 120, thereby achieving a smaller gap distance and further ensuring that the airflow passes through the product 300 in a laminar manner. For example, since the second baffle 12 is provided with a support pin 2, and the second baffle 12 is lower than the lower surface 1202 of the air outlet 120, the length of the support pin 2 is prevented from being too short, that is, the support pin 2 is ensured to have sufficient length, preventing the heat of the product 300 at the support position of the support pin 2 from being carried away by heat conduction through the support pin 2, thereby ensuring the temperature uniformity of the product 300. Specifically, depending on actual needs, the lower surface 1202 of the second partition 12 and the air outlet 120 should be made as flush as possible, and the support pin 2 should be ensured to have sufficient length.

[0036] The heating assembly includes multiple heating lamps 200, which are evenly arranged and divided into two parts, respectively located on the sides of the first partition 11 and the second partition 12 away from each other, thus achieving uniform heating. For example, a total of 16 heating lamps 200 are provided, with 8 lamps located on the side of the first partition 11 and the other 8 on the side of the second partition 12. Specifically, the heating lamps 200 heat through infrared radiation, and the power of the lamps 200 is distributed according to demand to ensure uniform heating.

[0037] Optionally, a support platform 110 is provided inside the reaction chamber 100, and the first partition 11 is supported and installed on the support platform 110. The support platform 110 is a structure that protrudes inward from the side wall of the reaction chamber 100. For example, the two side walls in the first direction are respectively provided with support platforms 110 to ensure the stable installation of the first partition 11, or all four side walls of the reaction chamber 100 are provided with support platforms 110, further improving the installation stability of the first partition 11. Optionally, the cross-sectional area of ​​the second partition 12 is smaller than the cross-sectional area of ​​the first partition 11 to ensure that the second partition 12 can be installed from top to bottom. The second partition 12 is supported on the reaction chamber 100 by support columns 7. Further, at least three support columns 7 are provided, and the at least three support columns 7 are spaced apart and are located on the side of the heating lamp tube 200 to ensure support stability. For example, four support columns 7 are provided, and the second partition 12 is rectangular. The four support columns 7 are arranged one-to-one with the four apex corners of the second partition 12, and the support columns 7 are located on the side of the heating lamp tube 200 to minimize the obstruction of infrared light radiated onto the product 300 by the support columns 7, thereby further ensuring heating uniformity. For example, the support columns 7 are located between two heating lamp tubes 200.

[0038] The support column 7 and support pin 2 on the second partition 12 are restricted and positioned by means of hole-shaft cooperation. Specifically, the second partition 12 is provided with a limiting groove. The support column 7 and support pin 2 are respectively limited on the second partition 12 through their respective limiting grooves and are connected to the second partition 12 by means of hole-shaft cooperation.

[0039] The first partition 11 is provided with a first gripping part 111, and the second partition 12 is provided with a second gripping part 122. Both the first gripping part 111 and the second gripping part 122 can be a handle or a notch to facilitate gripping and assembly.

[0040] The airflow guiding assembly also includes a first air intake plate 3 and a second air intake plate 4 disposed on the side of the partition assembly 1 facing the air inlet and spaced apart along a first direction. The first air intake plate 3 has evenly arranged first air intake holes 31, and the second air intake plate 4 has evenly arranged second air intake holes 41. The first air intake holes 31 and the second air intake holes 41 are staggered, and the air inlet, the first air intake holes 31, the second air intake holes 41 and the gap are connected. By setting the first air intake plate 3 and the second air intake plate 4, the first air intake holes 31 and the second air intake holes 41 are staggered, achieving a better effect of dispersing the airflow. This allows the airflow entering from the air inlet to be dispersed as evenly as possible, thereby preventing the airflow from directly entering the gap and impacting the product 300.

[0041] The flow guiding assembly also includes a partition 5 and a pin 6 passing through the partition 5. The second air intake plate 4 has a lug 42, which passes through the side of the first partition 11 opposite to the second partition 12. The pin 6 passes through the lug 42 and abuts against the first partition 11, so that the second air intake plate 4 is mounted on the first partition 11. The partition 5 is located between the first air intake plate 3 and the second air intake plate 4; and / or, the first air intake plate 3 is supported between the reaction chamber 100 and the first partition 11. In other embodiments, the first air intake plate 3 can also be suspended on the first partition 11 with reference to the installation method of the second air intake plate 4. Exemplarily, the second air intake plate 4 has two lugs 42 with holes. During assembly, the two lugs 42 pass through the first partition 11 respectively and are fixed to the upper first partition 11 by the pin 6. The second air intake plate 4 can also be supported between the reaction chamber 100 and the first partition 11 with the same installation method as the first air intake plate 3. By setting the partition 5, a certain distance is maintained between the first air intake plate 3 and the second air intake plate 4, preventing them from sticking together and affecting airflow. Optionally, the bottoms of the first air intake plate 3 and the second air intake plate 4 are sealed to prevent gas entering between them from flowing from the bottom to below the second partition 12, which would cause inconsistent thermal radiation environments for the heating lamps 200 on both sides of the first partition 11 and the second partition 12.

[0042] The second partition 12 has multiple sets of mounting portions 121 corresponding to the concentric indexing circles. Each mounting portion 121 is used to mount the support pins 2. Each set of mounting portions 121 corresponds to a product 300 of various sizes. The support pins 2 can be selectively mounted in one set of mounting portions 121 to support the product 300 of the corresponding size. Optionally, the multiple sets of mounting portions 121 are: a first set of mounting portions, a second set of mounting portions, and a third set of mounting portions. The first set of mounting portions consists of three first mounting holes 1211 along the first indexing circle, the second set of mounting portions consists of three second mounting holes 1212 along the second indexing circle, and the third set of mounting portions consists of three third mounting holes 1213 along the third indexing circle. For example, the product 300 is a wafer, and wafers have sizes such as 4-inch, 6-inch, and 8-inch. When the wafer is 8-inch, the three support pins 2 are correspondingly mounted in the three third mounting holes 1213. Specifically, according to the requirements, the three support pins 2 are installed on the corresponding set of mounting parts 121 to adapt to 4-inch, 6-inch, and 8-inch wafers and their carrier box states, respectively, thus achieving compatibility with product 300. This allows the product to meet the needs of customers with different sizes of product 300 and different load requirements without changing the hardware.

[0043] The flow guiding components are made of quartz. Specifically, the first partition 11, the second partition 12, the support column 7, the support pin 2, the first air inlet plate 3, the second air inlet plate 4, the baffle 5, the pin 6, and the support column 7 are all made of quartz. Because quartz can withstand the high temperature of 1200℃ of product 300 and allows for high transmittance of infrared radiation from heating product 300, and because quartz has a low thermal conductivity, it can minimize temperature non-uniformity caused by heat conduction. By using flow guiding components made of quartz, the rapid annealing furnace further ensures the uniformity of the process results data for product 300.

[0044] Obviously, the above embodiments of this utility model are merely examples for clearly illustrating the present utility model, and are not intended to limit the implementation of the present utility model. Those skilled in the art can make other variations or modifications based on the above description. It is neither necessary nor possible to exhaustively list all possible implementations here. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this utility model should be included within the protection scope of the claims of this utility model.

Claims

1. A flow guiding component, characterized in that, The reaction chamber (100) of the rapid annealing furnace is provided with an air inlet and an air outlet (120) along a first direction; the flow guiding assembly includes: The partition assembly (1) includes a first partition (11) and a second partition (12) that are spaced apart along the vertical direction and respectively supported on the reaction chamber (100). A gap is formed between the first partition (11) and the second partition (12). The two ends of the gap along the first direction are respectively connected to the air inlet and the air outlet (120). The heating components are disposed on both sides of the partition assembly (1) along the vertical direction and outside the gap. The first direction and the vertical direction are arranged at an angle. A support pin (2) is disposed on the second partition (12) and within the gap, and the support pin (2) is used to support the product (300).

2. The flow guiding component according to claim 1, characterized in that, The air outlet (120) has a rectangular cross-section; the first partition (11) is flush with the upper surface (1201) of the air outlet (120), and / or the second partition (12) is not higher than the lower surface (1202) of the air outlet (120).

3. The flow guiding component according to claim 1, characterized in that, The second partition (12) has multiple sets of mounting parts (121) corresponding to the multiple concentric indexing circles. The mounting parts (121) are used to install the support pin (2). The multiple sets of mounting parts (121) correspond to the products (300) of various sizes. The support pin (2) can be selectively installed in one of the multiple sets of mounting parts (121) to support the product (300) of the corresponding size.

4. The flow guiding component according to claim 1, characterized in that, The flow guiding assembly further includes a first air intake plate (3) and a second air intake plate (4) disposed on the side of the partition assembly (1) facing the air inlet and spaced apart along a first direction. The first air intake plate (3) has a uniformly arranged first air intake hole (31), and the second air intake plate (4) has a uniformly arranged second air intake hole (41). The first air intake hole (31) and the second air intake hole (41) are staggered. The air inlet, the first air intake hole (31), the second air intake hole (41) and the gap are connected.

5. The flow guiding component according to claim 4, characterized in that, The flow guiding assembly further includes a partition (5) and a pin (6) passing through the partition (5). The second air intake plate (4) is provided with a lug (42). The lug (42) passes through the side of the first partition plate (11) away from the second partition plate (12). The pin (6) passes through the lug (42) and abuts against the first partition plate (11) so that the second air intake plate (4) is mounted on the first partition plate (11). The partition (5) is provided between the first air intake plate (3) and the second air intake plate (4). And / or, the first air intake plate (3) is supported between the reaction chamber (100) and the first partition plate (11).

6. The flow guiding component according to claim 1, characterized in that, The second partition (12) is supported on the reaction chamber (100) by a support column (7).

7. The flow guiding component according to claim 6, characterized in that, The support column (7) is provided in at least three, and the at least three support columns (7) are spaced apart. The heating component includes a heating lamp (200), and the support column (7) is located on the side of the heating lamp (200).

8. The flow guiding component according to claim 1, characterized in that, The reaction chamber (100) is provided with a support platform (110), and the first partition (11) is supported and installed on the support platform (110).

9. The flow guiding component according to any one of claims 1-8, characterized in that, The flow guiding component is a quartz structure.

10. A rapid annealing furnace, characterized in that, It includes a reaction chamber (100) and a flow guiding assembly as described in any one of claims 1-9 disposed in the reaction chamber (100).

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