Vapor deposition system

Abstract

The vapor deposition system comprises a base assembly, a first electromagnetic assembly, a back plate, a second electromagnetic assembly and a power supply assembly, the base assembly comprises a base and a plurality of supporting blocks embedded with iron blocks, the base is provided with a plurality of containing grooves with upward openings, and the supporting blocks are movably arranged in the containing grooves in a one-to-one correspondence mode. The first electromagnetic assemblies are embedded in the base and located below the containing groove, and each first electromagnetic assembly comprises a first iron core and a first coil. The back plate is arranged above the base assembly at intervals; the plurality of second electromagnetic assemblies are embedded in the back plate, and each second electromagnetic assembly comprises a second iron core and a second coil; the second electromagnetic assemblies, the first electromagnetic assemblies and the supporting blocks are in one-to-one correspondence. The first coils and the second coils are electrically connected with the power supply assembly. The iron block enables the supporting block to ascend and descend under the action of magnetic force of the two electromagnetic assemblies and supports the glass substrate in a suspended mode, friction foreign matter is reduced, and the glass substrate supporting device can be suitable for supporting glass substrates of various models.

Description

Technical Field

[0001] This utility model relates to the field of display screen manufacturing technology, and in particular to a vapor deposition system. Background Technology

[0002] In the manufacturing process of displays, a vapor deposition system is typically used to deposit films onto the glass substrate, such as a CVD (Chemical Vapor Deposition) system. In this system, chemical gases are released through a diffuser within the deposition chamber, and these gases are deposited on the glass substrate to form a thin film structure. Figure 1 and Figure 2 As shown, the existing vapor deposition system includes a housing 1', a base 2', multiple support rods 3', a diffuser 4', a backplate 5', and a drive mechanism 6'. The housing 1' defines a deposition chamber 11'. The base 2' is vertically and vertically mounted within the deposition chamber 11' under the drive of the drive mechanism 6', supporting a glass substrate 7'. The diffuser 4' is positioned above the base 2' for diffusing chemical gases. The backplate 5' is spaced above the diffuser 4', providing support for components such as heaters. The support rods 3' include a rod-shaped portion 31' and a support head 32'. The base 2' has a connected guide hole 21' and a receiving groove 22'. The rod-shaped portion 31' slidably passes through the guide hole 21', and the support head 32' can be hidden within the receiving groove 22'. A limit block 8' is provided on the bottom wall of the deposition chamber 11' to stop and limit the support rods 3'.

[0003] The glass substrate 7' is transported into the deposition chamber 11' by a robotic arm. The base 2' descends under the drive of the drive mechanism 6', exposing the support pins 3'. Support heads 32' are spaced above the base 2'. The robotic arm places the glass substrate 7' onto the support heads 32' of the multiple support pins 3' and then exits the deposition chamber 11'. At this point, the multiple support pins 3' support the glass substrate 7'. Subsequently, the base 2' begins to rise relative to the support pins 3' under the drive of the drive mechanism 6'. After the support heads 32' enter the receiving groove 22', the base 2' supports the glass substrate 7'. The base 2' continues to rise, pushing against the bottom surface of the support heads 32' to synchronously raise the support pins 3'. It stops when the distance between the base 2' and the diffuser 4' reaches a set distance, and deposition begins. Figure 3 As shown, the distribution positions of the multiple support pins 3′ correspond to the cutting area 71′ of the glass substrate 7′, preventing damage to the display area 72′ of the glass substrate 7′.

[0004] The existing technology has the following drawbacks: friction during relative sliding between the support pin 3' and the base 2' easily generates foreign matter, thereby contaminating the glass substrate 7'; moreover, multiple support pins 3' simultaneously support the cutting area 71' of the glass substrate 7', and their positions are fixed, as shown in the reference. Figure 3The cutting area 71' of each type of glass substrate 7' is in a different position, and the distribution of the corresponding multiple support pins 3' is also different, which means that the same base 2' cannot be used to support multiple types of glass substrates 7'. Utility Model Content

[0005] The purpose of this invention is to provide a vapor deposition system that can reduce the generation of foreign powder during the support of glass substrates, prevent contamination of the glass substrates, and is applicable to support various types of glass substrates.

[0006] To achieve the above objectives, the present invention adopts the following technical solution:

[0007] A vapor deposition system is provided, comprising:

[0008] A base assembly includes a base and multiple support blocks. The base has multiple receiving slots spaced apart, with the openings of the receiving slots facing upwards. Each support block is correspondingly and movably disposed in each receiving slot, and an iron block is embedded in each support block.

[0009] The first electromagnetic component is provided in multiple forms and embedded in the base. Each first electromagnetic component includes a first iron core and a first coil wound on the first iron core. The first electromagnetic component is located below the receiving groove.

[0010] A backplate is spaced above the base assembly;

[0011] Multiple second electromagnetic components are provided and embedded in the back plate. Each second electromagnetic component includes a second iron core and a second coil wound on the second iron core. Each second electromagnetic component, each first electromagnetic component and each support block correspond one-to-one.

[0012] The power supply component, wherein each of the first coils and each of the second coils are electrically connected to the power supply component.

[0013] As a preferred embodiment of the vapor deposition system, the support block is able to contact the bottom wall of the receiving tank;

[0014] When the support block contacts the bottom wall of the receiving groove, the top surface of the support block is not higher than the upper surface of the base.

[0015] As a preferred embodiment of the vapor deposition system, the base assembly further includes a buffer layer that covers the bottom wall of the receiving groove and is in contact with the support block.

[0016] When the support block contacts the buffer pad layer, the top surface of the support block is not higher than the upper surface of the base.

[0017] As a preferred embodiment of the vapor deposition system, the base is embedded with a magnet structure for magnetically attracting the iron block. The magnet structure is located below the receiving groove and directly opposite the iron block, and the first electromagnetic component is located below the magnet structure.

[0018] As a preferred embodiment of a vapor deposition system, the support block includes a bottom surface and a plurality of side surfaces connecting the top surface and the bottom surface, wherein the orthographic projection of the bottom surface onto the top surface falls within the area of ​​the top surface;

[0019] The side surface and the top surface are both set at an angle, as are the side surface and the bottom surface.

[0020] As a preferred embodiment of the vapor deposition system, the support block is provided with a plurality of rolling elements on its side, and the plurality of rolling elements roll in cooperation with the wall of the receiving groove.

[0021] As a preferred embodiment of the vapor deposition system, the side of the support block is provided with multiple mounting grooves, and each rolling element is correspondingly disposed in each mounting groove.

[0022] As a preferred embodiment of the vapor deposition system, the rolling element includes a ceramic wheel and a mounting shaft, the mounting shaft being connected to the support block, and the ceramic wheel being rotatably mounted on the mounting shaft;

[0023] Alternatively, the rolling element may include balls.

[0024] As a preferred embodiment of the vapor deposition system, the glass substrate is provided with a cutting area that divides the glass substrate into multiple display areas, and the base is provided with an installation area corresponding to the cutting area, and multiple receiving grooves are provided within the range of the installation area.

[0025] As a preferred embodiment of the vapor deposition system, the base is provided with a first mounting cavity, the first electromagnetic component is detachably disposed in the first mounting cavity, and the base is provided with an openable and closable first cover, the first cover being used to seal the first mounting cavity.

[0026] And / or, the back plate is provided with a second mounting cavity, the second electromagnetic component is detachably disposed in the second mounting cavity, and the back plate is provided with an openable and closable second cover, the second cover being used to seal the second mounting cavity.

[0027] The beneficial effects of this invention are as follows: By embedding an iron block inside the support block and embedding a first electromagnetic component and a second electromagnetic component inside the base and back plate respectively, when the power supply component supplies power to the first and second coils, the first and second iron cores can generate magnetism, thereby generating a magnetic attraction force on the iron block inside the support block. By adjusting the magnitude of the current, the magnitude of the magnetic attraction force of the first and second iron cores on the iron block can be adjusted, thus making the direction of the resultant force on the iron block and the support block upward, downward, or zero. When the direction of the resultant force on the iron block and the support block is upward or downward, the support block can be lifted and lowered. When the direction of the resultant force is zero, the support block can be in a balanced state. When the glass substrate is transferred to the base assembly, the first and second coils are energized respectively, so that the iron block, under the magnetic attraction force of the first and second iron cores, drives the support block to rise to a suspended state. The glass substrate can then be placed on the suspended support block. Since the support block is in a suspended state during the support of the glass substrate and does not contact the base, no friction is generated to form foreign matter, protecting the glass substrate from contamination. Furthermore, since each of the first and second coils is electrically connected to the power supply component, multiple first and second coils can be energized individually, enabling independent control of each support block. Depending on the specific model of the glass substrate entering the deposition chamber, the corresponding support block can be raised and lowered, while other support blocks remain stationary within their respective receiving slots. This allows the deposition system to support various types of glass substrates, making it more practical and effectively reducing production costs. Attached Figure Description

[0028] The present invention will now be described in further detail with reference to the accompanying drawings and embodiments.

[0029] Figure 1 This is a schematic diagram of an existing vapor deposition system.

[0030] Figure 2 This is a schematic diagram of the installation of support pins in an existing vapor deposition system.

[0031] Figure 3 This is a schematic diagram showing the distribution of support pins on the base of an existing vapor deposition system.

[0032] Figure 4 A schematic diagram of the structure of a vapor deposition system provided for a specific embodiment of this utility model.

[0033] Figure 5 A partial view of a vapor deposition system provided for a specific embodiment of this utility model.

[0034] Figure 6 The circuit diagram showing the connection between the first coil and the second coil and the power supply component is provided for a specific embodiment of this utility model.

[0035] Figure 7 for Figure 5 A magnified view of a portion of point A in the middle.

[0036] Figure 8 A side view of the support block provided for a specific embodiment of this utility model.

[0037] Figure 9 A bottom view of the support block provided for a specific embodiment of this utility model.

[0038] Figure 10 This is a schematic diagram showing the contact between the support block and the bottom wall of the receiving groove, as provided in a specific embodiment of this utility model.

[0039] Figure 11 This is a schematic diagram showing the placement of a glass substrate on a base, as provided in a specific embodiment of the present invention.

[0040] Figure 12 This utility model provides a schematic diagram of the installation area on the base according to a specific embodiment.

[0041] Figures 1 to 3 middle:

[0042] 1′, Shell; 11′, Deposition chamber;

[0043] 2′, base; 21′, guide hole; 22′, receiving groove;

[0044] 3′, Support nail rod; 31′, Rod-shaped part; 32′, Support head;

[0045] 4′, Diffuser; 5′, Backplate; 6′, Drive mechanism; 7′, Glass substrate; 71′, Cutting area; 72′, Display area; 8′, Limiting block.

[0046] Figures 4 to 12 middle:

[0047] 1. Base assembly; 11. Base; 110. Mounting area; 1101. First mounting area; 1102. Second mounting area; 111. Receiving groove; 112. First fitting cavity; 113. First cover; 114. First fastener; 12. Support block; 121. Top surface; 122. Bottom surface; 123. Side surface; 124. Mounting groove; 13. Iron block; 14. Magnet structure; 15. Buffer pad layer; 16. Rolling element; 161. Ceramic wheel body; 162. Mounting shaft;

[0048] 2. First electromagnetic component; 21. First iron core; 22. First coil;

[0049] 3. Back plate; 31. Second mounting cavity; 32. Second cover; 33. Second fastener;

[0050] 4. Second electromagnetic component; 41. Second iron core; 42. Second coil;

[0051] 5. Power supply components;

[0052] 6. Driver components;

[0053] 7. Guide rod;

[0054] 8. Shell; 81. Deposition chamber;

[0055] 9. Diffuser;

[0056] 10. Mounting bracket; 20. Switch;

[0057] 100, Glass substrate; 101, Cutting area; 1011, First cutting section; 1012, Second cutting section; 102, Display area. Detailed Implementation

[0058] The advantages and features of this invention, as well as methods of implementing them, will become apparent from the following detailed description of the embodiments in conjunction with the accompanying drawings. However, this invention is not limited to the embodiments disclosed below, but can be implemented in various different forms. These embodiments are provided merely to complete the disclosure of this invention and to enable those skilled in the art to fully understand its scope, which is defined only by the scope of the claims. The same reference numerals denote the same constituent elements throughout the specification.

[0059] The present invention will now be described in detail with reference to the accompanying drawings.

[0060] like Figure 4 and Figure 5As shown, this embodiment provides a vapor deposition system, including a base assembly 1, a first electromagnetic assembly 2, a backplate 3, a second electromagnetic assembly 4, and a power supply assembly 5. The base assembly 1 includes a base 11 and multiple support blocks 12. Multiple receiving slots 111 are spaced apart on the base 11, with the openings of the receiving slots 111 facing upwards. Each support block 12 is correspondingly and movably disposed within each receiving slot 111; that is, each support block 12 has a corresponding receiving slot 111. An iron block 13 is embedded within each support block 12; the support blocks 12 support a glass substrate 100. Multiple first electromagnetic assemblies 2 are disposed and embedded within the base 11, and the first electromagnetic assemblies 2 are located below the receiving slots 111. Each first electromagnetic assembly 2 includes a first iron core 21 and a first coil 22 wound around the first iron core 21. The back plate 3 is spaced above the base assembly 1; multiple second electromagnetic assemblies 4 are provided and embedded in the back plate 3, each second electromagnetic assembly 4 including a second iron core 41 and a second coil 42 wound on the second iron core 41; each second electromagnetic assembly 4, each first electromagnetic assembly 2, and each support block 12 correspond one-to-one. Each first coil 22 and each second coil 42 are electrically connected to the power supply assembly 5. See details. Figure 6 Each first coil 22 and each second coil 42 are connected in parallel, and the power supply component 5 can supply power to each first coil 22 and each second coil 42 respectively. Furthermore, each first coil 22 and each second coil 42 is provided with a switch in its electrical circuit to control the on / off state of the corresponding electrical circuit. When the switch is closed, the power supply component 5 can supply power to the first coil 22 or each second coil 42 in the corresponding electrical circuit.

[0061] In this embodiment, by embedding an iron block 13 inside the support block 12, and embedding a first electromagnetic component 2 and a second electromagnetic component 4 inside the base 11 and the back plate 3 respectively, when the power supply component 5 supplies power to the first coil 22 and the second coil 42, the first iron core 21 and the second iron core 41 can generate magnetism, thereby generating a magnetic attraction force on the iron block 13 inside the support block 12. By adjusting the magnitude of the current, the magnitude of the magnetic attraction force of the first iron core 21 and the second iron core 41 on the iron block 13 can be adjusted, so that the direction of the resultant force on the iron block 13 and the support block 12 is upward or downward or the resultant force is zero. When the direction of the resultant force on the iron block 13 and the support block 12 is upward or downward, the support block 12 can be lifted and lowered. When the direction of the resultant force is zero, the support block 12 can be in a balanced state.

[0062] It should be noted that, in this embodiment, when multiple support blocks 12 are arranged on the base 11, the multiple support blocks 12 are distributed on the base 11 according to the positions corresponding to the different models of glass substrates 100. For example, if the base assembly 1 can support five different models of glass substrates 100, then for each model of glass substrate 100, a support block 12 for supporting the glass substrate 100 is provided on the base 11. Therefore, according to the specific model of the glass substrate 100, controlling the support block 12 corresponding to the model of the glass substrate 100 to rise can support the glass substrate 100.

[0063] When the glass substrate 100 is transferred to the base assembly 1, the first coil 22 and the second coil 42 are energized respectively, so that the iron block 13, under the magnetic attraction of the first iron core 21 and the second iron core 41, drives the support block 12 to rise to a suspended state. The glass substrate 100 can then be placed on the suspended support block 12. Since the support block 12 is in a suspended state during the process of supporting the glass substrate 100 and does not contact the base 11, no friction will be generated to form foreign matter, thus protecting the glass substrate 100 from contamination.

[0064] Furthermore, since each of the first coils 22 and the second coils 42 is electrically connected to the power supply component 5, multiple first coils 22 and multiple second coils 42 can be energized individually to achieve independent control of each support block 12. Depending on the specific model of the glass substrate 100 entering the deposition chamber 81, the support block 12 at the corresponding position can be controlled to rise and fall. Other support blocks 12 can remain stationary within the corresponding receiving groove 111, making the deposition system applicable to supporting various models of glass substrates 100, thus enhancing its practicality, effectively reducing production costs, and improving production efficiency.

[0065] In this embodiment, the power supply component 5 includes a power source for supplying power to each of the first coil 22 and the second coil 42 respectively.

[0066] In this embodiment, the X, Y, and Z directions are introduced for explanation. The X direction is the length direction of the base 11, the Y direction is the width direction of the base 11, and the Z direction is the height direction. The X, Y, and Z directions are perpendicular to each other. In this embodiment, the corresponding first electromagnetic component 2, support block 12, and second electromagnetic component 4 are distributed along the Z direction (i.e., vertically).

[0067] Optionally, during the process of supporting the glass substrate 100, some of the support blocks 12 are raised under the magnetic attraction of the corresponding first electromagnetic component 2 and second electromagnetic component 4, while others do not need to be raised. At this time, the first coil 22 directly below the support block 12 that does not need to be raised can be energized so that the first iron core 21 magnetically attracts the corresponding iron block 13, so that the support block 12 is stably held in the receiving groove 111 and will not rise due to the magnetic attraction of the adjacent second electromagnetic component 4.

[0068] Specifically, see Figure 4 The vapor deposition system also includes a housing 8, which defines a deposition chamber 81. The base assembly 1 and the back plate 3 are both disposed within the deposition chamber 81. A diffuser 9 is also disposed within the deposition chamber 81, located between the back plate 3 and the base 11, for diffusing chemical gases into the deposition chamber 81 to achieve chemical deposition coating and form a film layer on the glass substrate 100. Furthermore, the vapor deposition system also includes a drive assembly 6 for driving the lifting and lowering movement of the base 11. The output end of the drive assembly 6 is connected to a mounting base 10, which is connected to the base 11, so that the drive assembly 6 drives the base 11 to lift and lower via the mounting base 10. To improve the lifting accuracy and stability of the base 11, guide rods 7 are provided at both ends of the mounting base 10 for guidance. The guide rods 7 extend vertically, and the mounting base 10 and the guide rods 7 slide vertically together.

[0069] For example, the drive component 6 can be a cylinder, hydraulic cylinder, or electric push rod, as long as it can drive the base 11 to move up and down.

[0070] In a vapor deposition system, a robotic arm is typically used to pick up and transfer the glass substrate 100 into the deposition chamber 81. When the robotic arm picks up the glass substrate 100 and transfers it into the deposition chamber 81, the support block 12 rises from the receiving groove 111 under the action of the first electromagnetic component 2 and the second electromagnetic component 4, and is in a suspended state. At this time, the top surface 121 of the support block 12 (see...) Figure 7 The top surface 121 is higher than the upper surface of the base 11, and the distance between the top surface 121 and the upper surface of the base 11 should be greater than the dimension of the robot in the height direction (i.e., the Z direction) to avoid the bottom of the robot contacting the upper surface of the base 11. The robot then places the glass substrate 100 on the support block 12, so that the top surface 121 of the support block 12 supports the glass substrate 100.

[0071] Optionally, after the glass substrate 100 is placed on the support block 12, the magnitude of the current in the first coil 22 and the second coil 42 can be adjusted to drive the support block 12 to slowly descend until it completely falls into the receiving groove 111, so that the lower surface of the glass substrate 100 is in contact with the upper surface of the base 11, and the upper surface of the base 11 supports the glass substrate 100. Then, the driving component 6 drives the base 11 to lift the glass substrate 100 until the distance between it and the diffuser 9 reaches a set distance (e.g., 1.5 cm), and then stops, after which the deposition coating process can be performed.

[0072] It is understandable that when the glass substrate 100 is placed on the support block 12, the weight of the glass substrate 100 will cause the support block 12 to lose balance due to a downward net force. Therefore, at this time, the magnetic attraction force of the second iron core 41 on the iron block 13 needs to be increased simultaneously to allow the support block 12 to instantly return to a balanced state and prevent the glass substrate 100 from tilting or leaning. Specifically, while the glass substrate 100 is placed on the support block 12, the current in the second coil 42 of the second electromagnetic component 4 corresponding to the support block 12 is increased, thereby increasing the magnetic attraction force of the second iron core 41 on the iron block 13. The magnitude of the increased magnetic attraction force is consistent with the weight of the glass substrate 100, so that the support block 12 can maintain balance after the glass substrate 100 is placed. Further, the current in the second coil 42 is adjusted by the power supply component 5. It should be noted that the support block 12, which controls the levitation state, is always in a balanced state under dynamic load, which is well known to those skilled in the art. For details, please refer to the dynamic adjustment mechanism of the magnetic levitation train in the prior art.

[0073] In this embodiment, since the support block 12 is disposed within the receiving groove 111, its height is smaller compared to the support nail rods that penetrate the base 11 in the prior art. Therefore, it is unlikely to accidentally collide with other parts during the lifting and lowering process of the base 11. Furthermore, the support block 12 is driven to rise by the magnetic attraction of the first electromagnetic component 2 and the second electromagnetic component 4 to support the glass substrate 100. This process eliminates the need to drive the base 11 to rise or fall. Compared to the prior art method of driving the base to fall to expose the support nail rods, this reduces the step of driving the base 11 to fall, thereby reducing the lifting and lowering frequency of the drive component 6 and extending its service life.

[0074] In this embodiment, the support block 12 is made of the same material as the base 11. When the upper surface of the base 11 supports the glass substrate 100, the support block 12 is located below the glass substrate 100. Since the support block 12 and the base 11 are made of the same material, their temperature rise rates are consistent. During the deposition coating stage, their temperatures are almost the same, and there will be no problem of poor coating uniformity due to uneven temperature.

[0075] In some embodiments, the support block 12 and the base 11 are both made of aluminum or aluminum alloy.

[0076] In some embodiments, reference is made to Figure 5The base 11 is embedded with a magnet structure 14 for magnetically attracting the iron block 13. The magnet structure 14 is located below the receiving groove 111 and directly opposite the iron block 13. The first electromagnetic component 2 is located below the magnet structure 14. That is, the magnet structure 14 is closer to the support block 12 than the first electromagnetic component 2, and can magnetically attract the iron block 13 at any time, so that the iron block 13 is subjected to a downward force. During transportation and installation, it can keep the support block 12 firmly in the receiving groove 111 and prevent it from falling out. Compared with the ceramic support rods in the prior art, the support block 12 will not be fragile during transportation.

[0077] like Figure 7 , Figure 8 as well as Figure 9 As shown, the support block 12 includes a top surface 121, a bottom surface 122, and multiple side surfaces 123 connecting the top surface 121 and the bottom surface 122. The orthographic projection of the bottom surface 122 onto the top surface 121 falls within the area of ​​the top surface 121; therefore, the area of ​​the bottom surface 122 is smaller than the area of ​​the top surface 121. The side surfaces 123 are set at an acute angle to the top surface 121, and at an obtuse angle to the bottom surface 122. (Refer to...) Figure 8 Each side 123 is inclined along the Z direction. The support block 12 is shaped like a frustum with a larger top and a smaller bottom. Therefore, when the support block 12 rises in the receiving groove 111, it can separate from the groove wall of the receiving groove 111, reducing the friction between the support block 12 and the groove wall of the receiving groove 111, thereby reducing the generation of frictional foreign objects.

[0078] For example, the included angle between the side surface 123 and the top surface 121 can be 45° to 75°, and the included angle between the side surface 123 and the bottom surface 122 can be 105° to 135°, but is not limited to the listed numerical ranges.

[0079] In this embodiment, refer to Figure 9 The top surface 121 and bottom surface 122 of the support block 12 are both rectangular, and four side surfaces 123 connect the top surface 121 and the bottom surface 122.

[0080] like Figure 5 and Figure 7 As shown, in some embodiments, a plurality of rolling elements 16 are mounted on the side 123 of the support block 12. The plurality of rolling elements 16 can roll and cooperate with the groove wall of the receiving groove 111. Compared with sliding friction, this can reduce the generation of frictional foreign matter, effectively reduce the contamination of the glass substrate 100, and ensure excellent coating quality.

[0081] Reference Figure 7 and Figure 8The support block 12 has multiple mounting grooves 124 recessed on its side 123, with each rolling element 16 correspondingly positioned within each mounting groove 124. By placing the rolling elements 16 within the mounting grooves 124, the installation stability of the rolling elements 16 is improved, and the installation space on the support block 12 is better utilized, preventing the support block 12 from occupying too much space after the rolling elements 16 are installed. Specifically, a portion of the rolling element 16 can extend out of the mounting groove 124 to roll into contact with the wall of the receiving groove 111.

[0082] See also Figure 7 and Figure 8 In some embodiments, the rolling element 16 includes a ceramic wheel 161 and a mounting shaft 162. The mounting shaft 162 is connected to the support block 12, and the ceramic wheel 161 is rotatably mounted on the mounting shaft 162. When the ceramic wheel 161 contacts the wall of the receiving groove 111, the ceramic wheel 161 can rotate on the mounting shaft 162 to achieve rolling contact between the ceramic wheel 161 and the wall of the receiving groove 111. Since the ceramic wheel 161 is made of ceramic, when it rolls in contact with the wall of the receiving groove 111, it can reduce the generation of frictional foreign matter. Furthermore, its slow thermal conductivity reduces the heat generated by friction. In addition, the ceramic material has good insulation properties, which reduces the generation of static electricity and prevents it from affecting the coating quality.

[0083] Furthermore, the mounting shaft 162 can also be made of ceramic material. When the ceramic wheel 161 rotates on the mounting shaft 162, it can reduce the possibility of foreign objects being generated between the ceramic wheel 161 and the mounting shaft 162 due to friction.

[0084] Of course, in other embodiments, the rolling element 16 can also be a ball, in which case the mounting groove 124 is a spherical groove that matches the shape of the ball, making it easy for the ball to roll in the mounting groove 124.

[0085] In some embodiments, such as Figure 10 As shown, the bottom surface 122 of the support block 12 can contact the bottom wall of the receiving groove 111. When the bottom surface 122 of the support block 12 contacts the bottom wall of the receiving groove 111, the top surface 121 of the support block 12 is not higher than the upper surface of the base 11, so as to avoid blocking the upper surface of the base 11 from supporting the glass substrate 100.

[0086] In other embodiments, such as Figure 5 and Figure 7 As shown, the base assembly 1 also includes a buffer layer 15, which covers the bottom wall of the receiving groove 111 and can contact the bottom surface 122 of the support block 12. When the bottom surface 122 of the support block 12 contacts the buffer layer 15, the top surface 121 of the support block 12 is not higher than the upper surface of the base 11 to avoid obstructing the upper surface of the base 11 from supporting the glass substrate 100.

[0087] By providing a buffer layer 15, the bottom surface 122 of the support block 12 is in flexible contact with the buffer layer 15, which avoids direct rigid contact with the bottom wall of the receiving groove 111 and the generation of foreign powder, thereby preventing foreign powder from contaminating the coating of the glass substrate 100. For example, the buffer layer 15 can be an alumina fiber needle-punched blanket layer (resistant to high temperature of 1500℃), a high silica cloth layer (resistant to high temperature of 1400℃), etc., which can remain stable under the high temperature of the deposition chamber 81 and will not melt.

[0088] That is, regardless of whether the bottom wall of the receiving groove 111 is provided with a buffer pad 15, when the support block 12 is completely placed in the receiving groove 111, its top surface 121 is not higher than the upper surface of the base 11.

[0089] Furthermore, in some specific embodiments, when the support block 12 is completely placed in the receiving groove 111, its top surface 121 is flush with the upper surface of the base 11. At this time, the top surface 121 of the support block 12 can jointly support the glass substrate 100 with the upper surface of the base 11, thereby improving the support stability.

[0090] Making the top surfaces 121 of the multiple support blocks 12 flush with the upper surface of the base 11 is quite difficult. Moreover, even if they can be aligned during initial installation, the top surfaces 121 of the support blocks 12 will inevitably become out of alignment with the upper surface of the base 11 after repeated use. Therefore, in some specific embodiments, when the support blocks 12 are completely within the receiving groove 111, their top surfaces 121 are lower than the upper surface of the base 11. In this case, only the upper surface of the base 11 supports the glass substrate 100. Even if there is a positional error in the support blocks 12 during use, it does not affect the support of the upper surface of the base 11 for the glass substrate 100.

[0091] like Figure 11 As shown, the glass substrate 100 has a cutting area 101, which divides the glass substrate 100 into multiple display areas 102. After the coating process is completed, in subsequent processes, the glass substrate 100 needs to be divided along the cutting area 101 to separate the multiple display areas 102, forming multiple displays. See also Figure 12 The base 11 is provided with an installation area 110 corresponding to the cutting area 101. When the glass substrate 100 is placed on the base assembly 1, the cutting area 101 and the installation area 110 are directly opposite each other, that is, the cutting area 101 and the installation area 110 coincide and correspond. Multiple receiving grooves 111 are provided within the range of the installation area 110. Thus, the support block 12 located in the receiving groove 111 is provided in the installation area 110. When the support block 12 rises, it contacts the cutting area 101 of the glass substrate 100 to support the glass substrate 100, and will not contact the display area 102 to cause scratches on the display area 102, thus avoiding affecting the coating quality of the display area 102.

[0092] Specifically, such as Figure 11 As shown, the glass substrate 100 has two rows of display areas 102 along the Y direction, and each row has multiple display areas 102 arranged along the X direction. The spaces between the two rows of display areas 102, and between adjacent display areas 102 along the X direction, are cutting areas 101. For ease of explanation, Figure 11 The area depicted with cross-sectional lines is the cutting area 101, which includes a first cutting section 1011 extending along the X direction and a second cutting section 1012 extending along the Y direction. The first cutting section 1011 is located between two rows of display areas 102, and the second cutting section 1012 is located between two adjacent display areas 102 along the X direction. Figure 12 As shown, the area depicted by the cross-section is the mounting area 110, which includes a first mounting area 1101 extending along the X direction and a second mounting area 1102 extending along the Y direction. Optionally, a receiving groove 111 is provided in both the first mounting area 1101 and the second mounting area 1102, and a support block 12 is provided in the receiving groove 111 to support... Figure 11 The glass substrate 100 in the middle.

[0093] For some different Figure 11 The medium-sized glass substrate 100 has a first cutting partition 1011 located at the center line along the X direction. At this time, only the support block 12 of the first mounting area 1101 on the base 11 is controlled to rise to support the glass substrate 100 transferred to the deposition chamber 81. The other support blocks 12 can be kept in the receiving groove 111 without rising.

[0094] It should be noted that when the glass substrate 100 is placed on the multiple support blocks 12, a slight vibration may occur, causing friction between the support blocks 12 and the glass substrate 100. However, since the support blocks 12 are in contact with the cutting area 101, even if there is friction, the display area 102 will not be damaged, thus avoiding adverse effects on the coating quality of the display area 102.

[0095] Optionally, see Figure 5 The base 11 has a first mounting cavity 112, and the first electromagnetic component 2 is detachably mounted in the first mounting cavity 112. The base 11 has an openable and closable first cover 113, which seals the first mounting cavity 112. When the first electromagnetic component 2 needs to be repaired or replaced, the first cover 113 can be opened, and the first electromagnetic component 2 can be removed from the first mounting cavity 112 without replacing the entire base assembly 1 in case of failure, thus reducing overall maintenance costs. Furthermore, the first cover 113 is detachably connected to the base 11 via a first fastener 114, enabling the removal and installation of the first cover 113. For example, the first fastener 114 is a screw.

[0096] Optionally, see Figure 5 The back plate 3 has a second mounting cavity 31, and the second electromagnetic component 4 is detachably mounted in the second mounting cavity 31. The back plate 3 also has an openable and closable second cover 32, which seals the second mounting cavity 31. When the second electromagnetic component 4 needs to be repaired or replaced, the second cover 32 can be opened, and the second electromagnetic component 4 can be removed from the second mounting cavity 31 without replacing the entire back plate 3 in case of failure, thus reducing overall maintenance costs. Furthermore, the second cover 32 is detachably connected to the back plate 3 via a second fastener 33, enabling the removal and installation of the second cover 32. For example, the second fastener 33 is a screw.

[0097] It is understandable that the energization and de-energization of the first coil 22 and the second coil 42 in the first electromagnetic component 2 and the second electromagnetic component 4 can be controlled by the program stored on the control board, which is understandable and can be successfully implemented by those skilled in the art.

[0098] Although embodiments of the present invention have been described above with reference to the accompanying drawings, the present invention is not limited to the above embodiments, but can be made in various forms, and those skilled in the art will understand that the present invention can be implemented in other specific forms without changing the technical spirit or essential characteristics of the present invention. Therefore, it should be understood that the above embodiments are exemplary in all respects and not restrictive.

Claims

1. A vapor deposition system, characterized in that, include: A base assembly includes a base and multiple support blocks. The base has multiple receiving slots spaced apart, with the openings of the receiving slots facing upwards. Each support block is correspondingly and movably disposed in each receiving slot, and an iron block is embedded in each support block. The first electromagnetic component is provided in multiple forms and embedded in the base. Each first electromagnetic component includes a first iron core and a first coil wound on the first iron core. The first electromagnetic component is located below the receiving groove. A backplate is spaced above the base assembly; Multiple second electromagnetic components are provided and embedded in the back plate. Each second electromagnetic component includes a second iron core and a second coil wound on the second iron core. Each second electromagnetic component, each first electromagnetic component and each support block correspond one-to-one. The power supply component, wherein each of the first coils and each of the second coils are electrically connected to the power supply component.

2. The vapor deposition system according to claim 1, characterized in that, The support block can contact the bottom wall of the receiving groove; When the support block contacts the bottom wall of the receiving groove, the top surface of the support block is not higher than the upper surface of the base.

3. The vapor deposition system according to claim 1, characterized in that, The base assembly further includes a buffer pad layer, which covers the bottom wall of the receiving groove and can contact the support block; When the support block contacts the buffer pad layer, the top surface of the support block is not higher than the upper surface of the base.

4. The vapor deposition system according to claim 2 or 3, characterized in that, The base is embedded with a magnet structure for magnetically attracting the iron block. The magnet structure is located below the receiving groove and directly opposite the iron block. The first electromagnetic component is located below the magnet structure.

5. The vapor deposition system according to claim 2 or 3, characterized in that, The support block includes a bottom surface and multiple side surfaces connecting the top surface and the bottom surface, wherein the orthographic projection of the bottom surface onto the top surface falls within the area where the top surface is located; The side surface and the top surface are set at an acute angle, and the side surface and the bottom surface are set at an obtuse angle.

6. The vapor deposition system according to claim 2 or 3, characterized in that, Multiple rolling elements are mounted on the side of the support block, and these rolling elements roll in cooperation with the wall of the receiving groove.

7. The vapor deposition system according to claim 6, characterized in that, The side of the support block is recessed with multiple mounting grooves, and each rolling element is correspondingly disposed in each mounting groove.

8. The vapor deposition system according to claim 6, characterized in that, The rolling element includes a ceramic wheel body and a mounting shaft, the mounting shaft is connected to the support block, and the ceramic wheel body is rotatably sleeved on the mounting shaft; Alternatively, the rolling element may include balls.

9. The vapor deposition system according to claim 2 or 3, characterized in that, The glass substrate has a cutting area that divides the glass substrate into multiple display areas. The base has an installation area corresponding to the cutting area, and multiple receiving slots are located within the installation area.

10. The vapor deposition system according to claim 2 or 3, characterized in that, The base is provided with a first mounting cavity, the first electromagnetic component is detachably mounted in the first mounting cavity, and the base is provided with an openable and closable first cover, the first cover being used to seal the first mounting cavity; And / or, the back plate is provided with a second mounting cavity, the second electromagnetic component is detachably disposed in the second mounting cavity, and the back plate is provided with an openable and closable second cover, the second cover being used to seal the second mounting cavity.

Images