Film vapor deposition device for flange machining

Abstract

The utility model relates to the technical field of film vapor deposition, in particular to a film vapor deposition device for flange processing, which comprises a supporting seat, a reaction tank is arranged at the top of the supporting seat, a plurality of layers of horizontally arranged placing plates are arranged in the reaction tank, and a sealing rotating plate is rotatably mounted on the front side of the reaction tank through a rotating shaft. A motor is mounted at the top of the reaction tank; an output shaft of the motor is connected with a rotating shaft of the sealing rotating plate through a coupling. By integrating an automatic waste gas emission mechanism, a gas concentration detection system and an intelligent control system, the residual harmful gas is ensured to be effectively exhausted before the equipment is started, and the reaction tank is allowed to be started only when the gas concentration in the cavity reaches the safety standard, so that the safety of operators is ensured.

Description

Technical Field

[0001] This utility model relates to the field of thin film vapor deposition technology, and in particular to a thin film vapor deposition apparatus for flange processing. Background Technology

[0002] Thin film vapor deposition (CVD) is one of the important processes in modern industry for forming one or more thin films on the surface of a substrate. It is widely used in semiconductor manufacturing, optical coating, anti-corrosion treatment, and performance enhancement of mechanical parts. For industrial components such as flanges, forming protective or functional films on their surfaces through CVD can significantly improve their corrosion resistance, wear resistance, and other physicochemical properties.

[0003] Patent CN209685911U discloses a high-temperature heated deposition stage for chemical vapor deposition. This patent mainly addresses two problems with traditional chemical vapor deposition equipment: First, traditional equipment may not be able to provide the high-temperature conditions required for certain specific reactions, limiting its application range; second, during the chemical reaction process, temperature and reaction time usually rely on manual recording, which is not only inefficient but also prone to errors, hindering precise control and real-time monitoring. However, although this patent solves the above problems to some extent, it still has shortcomings in actual operation. After the thin film vapor deposition operation is completed, harmful gases may remain inside the tank. If the operator directly opens the tank lid to remove the workpiece, these incompletely expelled gases may be inhaled, causing health risks such as respiratory diseases.

[0004] Therefore, there is an urgent need to provide a thin film vapor deposition apparatus for flange processing that enables safe material handling operations. Utility Model Content

[0005] In order to overcome the shortcomings of existing patents, which leave harmful gases inside the tank after thin film vapor deposition, causing workers to inhale these incompletely expelled gases when retrieving materials, thus leading to health risks such as respiratory diseases, this utility model provides a thin film vapor deposition device for flange processing that enables safe material retrieval operations.

[0006] To address the aforementioned issues, this utility model employs the following technical solution: a thin-film vapor deposition apparatus for flange processing, comprising a support base, a reaction vessel mounted on top of the support base, multiple horizontally arranged placement plates inside the reaction vessel, a sealing rotating plate rotatably mounted on the front of the reaction vessel via a rotating shaft, a motor mounted on top of the reaction vessel, the output shaft of the motor connected to the rotating shaft of the sealing rotating plate via a coupling, an inlet pipe connected to and communicating with the top of the reaction vessel, the inlet pipe being connected to an external gas storage system, a first solenoid valve mounted on the inlet pipe, an exhaust pipe connected to and communicating with the bottom of the reaction vessel, the exhaust pipe being connected to an external gas recovery system, a second solenoid valve mounted on the exhaust pipe, an electric heating tube mounted at the bottom of the reaction vessel, heat-conducting plates mounted on the inner surface of the reaction vessel and the inner side of the sealing rotating plate, a gas detector mounted on the reaction vessel, the detection probe of the gas detector extending into the interior of the reaction vessel, and a controller mounted on the support base, the controller being electrically connected to the electric heating tube, the first solenoid valve, the gas detector, and the motor.

[0007] Optionally, one end of the air intake pipe is connected to a telescopic hose, and the other end of the telescopic hose is equipped with a connector, which is provided with a handle.

[0008] Optionally, one end of a ventilation pipe is connected to the upper side of the reaction vessel, a third solenoid valve is installed on the ventilation pipe, and a fan is installed at the other end of the ventilation pipe.

[0009] Optionally, a rubber sealing plate is provided on the side of the sealing rotating plate, and the same rubber sealing plate is provided on the side of the reaction vessel.

[0010] Optionally, a protective cover is fixed to the top of the reaction vessel, and the protective cover shields the location of the motor.

[0011] Optionally, the grip is fitted with an anti-slip sleeve.

[0012] Compared with the prior art, the present invention has the following technical effects: 1. By integrating an automated exhaust gas emission mechanism, a gas concentration detection system and an intelligent control system, it ensures that residual harmful gases are effectively removed before the equipment is turned on, and the reaction tank is only allowed to be turned on when the gas concentration in the chamber reaches the safety standard, thereby ensuring the safety of the operators.

[0013] 2. The air inlet pipe is connected to a flexible hose, the length of which can be adjusted according to actual needs, facilitating connection with external gas storage systems, solving the problem of pipe length mismatch, and increasing the flexibility of equipment use.

[0014] 3. By introducing a ventilation duct design, in conjunction with a third solenoid valve and a fan, cold air can be delivered into the reaction vessel during the exhaust phase, accelerating the discharge of residual gas and promoting rapid cooling of the flange, thereby improving overall work efficiency. Attached Figure Description

[0015] Figure 1 This is a three-dimensional structural diagram of the present invention.

[0016] Figure 2 This is a three-dimensional structural diagram of the reaction vessel, sealing rotating plate, motor, and other components of this utility model.

[0017] Figure 3 This is a three-dimensional sectional view of the reaction vessel, the first solenoid valve, and the placement plate of this utility model.

[0018] Figure 4 This is a three-dimensional sectional view of the electric heating element, exhaust pipe, and second solenoid valve of this utility model.

[0019] Figure 5 This is a three-dimensional structural diagram of the telescopic hose, handle, and connector components of this utility model.

[0020] Figure 6 This is a partial sectional view of the ventilation pipe, the third solenoid valve, and the fan of this utility model.

[0021] The components in the attached diagram are labeled as follows: 1-Support base, 2-Reaction vessel, 201-Placement plate, 3-Rotating shaft, 4-Sealing rotating plate, 5-Motor, 6-Electric heating tube, 7-Inlet pipe, 8-First solenoid valve, 9-Exhaust pipe, 10-Second solenoid valve, 11-Gas detector, 12-Controller, 13-Heat conduction plate, 14-Telescopic hose, 15-Connector, 16-Handle, 17-Ventilation pipe, 18-Third solenoid valve, 19-Fan, 20-Rubber sealing plate, 21-Protective cover, 22-Anti-slip sleeve. Detailed Implementation

[0022] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0023] Example 1: Please refer to Figures 1-4A thin-film vapor deposition apparatus for flange processing includes a support base 1, a reaction vessel 2 mounted on top of the support base 1, and multiple horizontally arranged placement plates 201 inside the reaction vessel 2 for layered placement of flanges to improve processing efficiency. A sealing rotating plate 4 is rotatably mounted on the front of the reaction vessel 2 via a rotating shaft 3, and rubber sealing plates 20 are provided on the sides of the sealing rotating plate 4. Identical rubber sealing plates 20 are also provided on the sides of the reaction vessel 2. When the sealing rotating plate 4 is closed, the two rubber sealing plates 20 contact each other, thereby significantly improving sealing performance and preventing... To prevent gas leakage and ensure the stability and consistency of the internal environment of reaction tank 2, a motor 5 is installed on the top of reaction tank 2. The output shaft of the motor 5 is connected to the rotating shaft 3 of the sealing rotating plate 4 via a coupling to drive the sealing rotating plate 4 to rotate, thereby realizing the automatic opening and closing of reaction tank 2. A protective cover 21 is fixed to the top of reaction tank 2. The protective cover 21 shields the location of the motor 5, protecting the motor 5 from the influence of the external environment and increasing the safety of the equipment. An air inlet pipe 7 is connected and communicated with the top of reaction tank 2, and the air inlet pipe 7 is connected to the external gas storage system. The system is connected to the inlet pipe 7, which is used to introduce specific reaction gases into the tank. A first solenoid valve 8 is installed on the inlet pipe 7 to precisely control the gas flow rate entering the reaction tank 2. An exhaust pipe 9 is connected to the bottom of the reaction tank 2 and is connected to an external gas recovery system to facilitate the discharge of residual gases that have not participated in the reaction. A second solenoid valve 10 is installed on the exhaust pipe 9 to control the opening and closing of the discharge process. An electric heating tube 6 is installed at the bottom of the reaction tank 2 to provide the required temperature conditions for the reaction process. A heat-conducting plate 13 is installed on the inner surface of the reaction tank 2 and the inner side of the sealing rotating plate 4 to ensure that the heat generated by the electric heating tube 6 can be evenly distributed to all areas of the reaction tank 2. A gas detector 11 is installed on the reaction tank 2. The detection probe of the gas detector 11 extends into the reaction tank 2 to monitor the gas concentration in real time and ensure the safety of subsequent material handling operations. A controller 12 is installed on the support base 1. The controller 12 is electrically connected to components such as the electric heating tube 6, the first solenoid valve 8, the gas detector 11, and the motor 5 to realize the automated control of the entire system.

[0024] When flange processing is required, firstly, motor 5 is started, driving the sealing rotating plate 4 to open the reaction vessel 2. After the flange is placed on the placement plate 201, the sealing rotating plate 4 is driven in reverse to close. Subsequently, the electric heating tube 6 is adjusted and activated by the controller 12. Heat is evenly distributed throughout the reaction vessel 2 via the heat-conducting plate 13, promoting the formation of chemical reaction conditions. When the internal temperature of the reaction vessel 2 reaches the set temperature, the controller 12 sends a command to open the first solenoid valve 8, introducing the gas to be reacted into the reaction vessel 2 through the inlet pipe 7. Under high temperature conditions, the reaction gas decomposes to produce particles or molecules, which are deposited on the flange surface to form a thin film, achieving the predetermined reaction. After the film thickness is achieved, the first solenoid valve 8 is closed to stop the supply of reaction gas, and the temperature is maintained to keep the environment inside the reaction tank 2 stable. When the environment inside the reaction tank 2 is stable, the controller 12 sends a command to open the second solenoid valve 10, and discharges the residual reaction gas inside the reaction tank 2 to the external recovery system through the exhaust pipe 9. At the same time, the gas detector 11 continuously monitors the gas concentration inside the reaction tank 2. When the gas concentration inside the reaction tank 2 drops to the safe threshold, the controller 12 controls the motor 5 to open the sealing plate 4. At this time, the staff can remove the flange, ensuring the safety of the material handling operation and preventing the staff from inhaling the reaction gas and harming their health.

[0025] Example 2: Based on Example 1, please refer to... Figure 5 One end of the air intake pipe 7 is connected to a telescopic hose 14, and the other end of the telescopic hose 14 is equipped with a connector 15 for docking with the interface of an external gas storage system. The connector 15 is provided with a handle 16 for easy hand operation of the telescopic hose 14. The handle 16 is covered with an anti-slip sleeve 22 to increase the friction of the hand part and reduce the risk of operation error caused by hand slippage.

[0026] During the use of this device, when it is necessary to connect the air inlet pipe 7 to the external gas storage system, the operator can easily complete the docking operation by holding the handle 16 on the connector 15. Furthermore, due to the design of the telescopic hose 14, its length can be flexibly adjusted according to actual needs, ensuring that no matter how far the external gas storage system is from the device, precise docking can be achieved by stretching or retracting the telescopic hose 14. This not only solves the installation difficulties that may be caused by mismatched pipe lengths, but also significantly improves the convenience and accuracy of operation. In addition, the flexibility of the telescopic hose 14 also helps to reduce the restrictions of pipe layout on the device location, increasing the flexibility and adaptability of equipment layout.

[0027] Please see Figure 6The upper side of the reaction vessel 2 is connected to one end of a ventilation pipe 17 for guiding air circulation. A third solenoid valve 18 is installed on the ventilation pipe 17 and is electrically connected to the controller 12. The valve can control the opening or closing of the ventilation pipe 17 under the command of the controller 12. A fan 19 is installed at the other end of the ventilation pipe 17 to provide forced airflow. Its operation is controlled by the controller 12 and can be started or stopped as needed.

[0028] During flange processing, especially in the venting stage, when it is necessary to accelerate the discharge of residual gas inside the reaction tank 2 and speed up flange cooling, the controller 12 will send a command to open the third solenoid valve 18 and start the fan 19. At this time, the fan 19 delivers cold air into the ventilation pipe 17. This cold air is introduced into the reaction tank 2 through the ventilation pipe 17, which significantly increases the internal air circulation speed, helps to quickly replace the residual gas in the tank, and can effectively reduce the temperature of the flange and its surrounding environment, thereby accelerating the cooling process, reducing waiting time, and further improving the working efficiency of the entire process.

[0029] Although this disclosure has been shown and described with reference to specific exemplary embodiments thereof, those skilled in the art will understand that various changes in form and detail may be made to this disclosure without departing from the spirit and scope of the disclosure as defined by the appended claims and their equivalents. Therefore, the scope of this disclosure should not be limited to the above embodiments, but should be defined not only by the appended claims, but also by their equivalents.

Claims

1. A thin film vapor deposition apparatus for flange processing, comprising a support base (1), a reaction vessel (2) disposed on the top of the support base (1), and multiple horizontally arranged placement plates (201) disposed inside the reaction vessel (2), characterized in that: The front of the reaction vessel (2) is rotatably mounted with a sealing rotating plate (4) via a rotating shaft (3). A motor (5) is mounted on the top of the reaction vessel (2). The output shaft of the motor (5) is connected to the rotating shaft (3) of the sealing rotating plate (4) via a coupling. An air inlet pipe (7) is connected and communicated with the top of the reaction vessel (2). The air inlet pipe (7) is connected to an external gas storage system. A first solenoid valve (8) is mounted on the air inlet pipe (7). An exhaust pipe (9) is connected and communicated with the bottom of the reaction vessel (2). The exhaust pipe (9) is connected to an external gas recovery system. A second solenoid valve (10) is installed on the tube (9). An electric heating tube (6) is provided at the bottom of the reaction vessel (2). A heat-conducting plate (13) is provided on the inner surface of the reaction vessel (2) and the inner side of the sealing rotating plate (4). A gas detector (11) is installed on the reaction vessel (2). The detection probe of the gas detector (11) extends into the interior of the reaction vessel (2). A controller (12) is installed on the support base (1). The controller (12) is electrically connected to the electric heating tube (6), the first solenoid valve (8), the gas detector (11), and the motor (5).

2. A thin film vapor deposition apparatus for flange processing according to claim 1, characterized in that: One end of the air intake pipe (7) is connected to a telescopic hose (14), and the other end of the telescopic hose (14) is equipped with a connector (15), and a handle (16) is provided on the connector (15).

3. A thin film vapor deposition apparatus for flange processing according to claim 2, characterized in that: The upper side of the reaction vessel (2) is connected to one end of a ventilation pipe (17), a third solenoid valve (18) is installed on the ventilation pipe (17), and a fan (19) is installed on the other end of the ventilation pipe (17).

4. A thin film vapor deposition apparatus for flange processing according to claim 3, characterized in that: The sealing plate (4) is provided with a rubber sealing plate (20) on its side, and the reaction vessel (2) is provided with the same rubber sealing plate (20) on its side.

5. A thin film vapor deposition apparatus for flange processing according to claim 4, characterized in that: The top of the reaction vessel (2) is fixed with a protective cover (21), which covers the location of the motor (5).

6. A thin film vapor deposition apparatus for flange processing according to claim 5, characterized in that: The grip (16) is fitted with an anti-slip sleeve (22).

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