A series type vacuum drying annealing apparatus

Abstract

The utility model discloses a series connection type vacuum drying annealing equipment, including first vacuum cavity, second vacuum cavity, vacuum drying cavity and vacuum annealing cavity in series connection, first vacuum cavity and second vacuum cavity are communicated through first valve, second vacuum cavity and vacuum drying cavity are communicated through second valve, vacuum drying cavity and vacuum annealing cavity are communicated through third valve, the substrate that has been coated vacuum drying annealing film layer passes first vacuum cavity, second vacuum cavity, vacuum drying cavity and vacuum annealing cavity in proper order, first vacuum cavity and second vacuum cavity are independently connected vacuum source respectively, and first vacuum cavity is low vacuum cavity, and second vacuum cavity is high vacuum cavity, the utility model discloses can improve process beat significantly, improve production line capacity, and the cavity of different vacuum degree facilitates buffer -type feeding, thereby reducing the mura phenomenon of film layer.

Description

Technical Field

[0001] This utility model belongs to the field of vacuum drying technology, specifically relating to a series vacuum drying and annealing device. Background Technology

[0002] The efficiency of perovskite solar cells has been continuously improved in academia, currently exceeding 26%. With the continuous progress of scientific research, the industrialization of perovskite solar cells is also advancing. Currently, leading domestic perovskite companies have achieved square meter-level drying areas, with sizes reaching ultra-large dimensions of 1.2m x 2.4m. This industrialization is placing higher demands on the equipment of perovskite production lines. Common perovskite module manufacturing processes involve two methods for drying the perovskite wet film: air knife drying and vacuum drying (VCD). Air knife drying is difficult to implement due to the challenges of producing uniform air knife equipment over ultra-wide areas, and it's also difficult to develop ultra-large area perovskite module processes specifically designed for air knife drying. Therefore, air knife drying has been gradually phased out, with only a few companies still using it. To address the issue of ultra-large area drying and crystallization, vacuum drying (VCD) has been continuously developed and applied. Because it avoids direct contact with air during the drying process, it can largely protect the perovskite crystal nuclei during drying, greatly benefiting subsequent crystal growth.

[0003] Although VCDs are currently widely used in perovskite module factories, they still face some challenges that require further optimization and solutions. Conventional vacuum drying equipment is mostly single-chamber equipment, which struggles to meet the demands of mass production, and the process cycle time is difficult to match. Furthermore, common VCD equipment falls far short in its process management for incoming and outgoing gases. During rapid vacuuming and devastating, the significant pressure changes result in a very large gas flow rate, which can affect the perovskite wet film surface, easily causing unevenness phenomena such as clouding and water ripples (commonly referred to as mura in the industry). Utility Model Content

[0004] In view of all or part of the deficiencies of the prior art described above, the purpose of this utility model is to provide a series vacuum drying and annealing equipment, which can significantly improve the process cycle time and increase the production line capacity. The chambers with different vacuum levels facilitate buffered feeding, thereby reducing the mura phenomenon of the film layer.

[0005] To achieve the above-mentioned objectives, this utility model provides the following technical solution:

[0006] This invention provides a series-connected vacuum drying and annealing device, comprising a first vacuum chamber, a second vacuum chamber, a vacuum drying chamber, and a vacuum annealing chamber connected in series. The first and second vacuum chambers are connected by a first valve, the second vacuum chamber and the vacuum drying chamber are connected by a second valve, and the vacuum drying chamber and the vacuum annealing chamber are connected by a third valve. A substrate coated with a film layer to be vacuum dried and annealed passes through the first vacuum chamber, the second vacuum chamber, the vacuum drying chamber, and the vacuum annealing chamber in sequence. The first and second vacuum chambers are independently connected to vacuum sources, with the first vacuum chamber being a low-vacuum chamber and the second vacuum chamber being a high-vacuum chamber.

[0007] By designing a series-connected VCD vacuum drying equipment, it can be more efficiently integrated into production line applications, increasing production capacity. Simultaneously, the design of low-vacuum and high-vacuum chambers, along with different buffer chambers, allows the feed film to be fed in a step-by-step, buffered manner from atmospheric pressure to low vacuum and then to high vacuum, significantly reducing the mura phenomenon on the film surface caused by drastic pressure changes. Combined with a vacuum annealing chamber after VCD, this ensures that no water or oxygen from the air participates in the film during the entire drying, annealing, and crystallization process, greatly improving film quality through moisture isolation.

[0008] The bottom of the first vacuum chamber, the second vacuum chamber, the vacuum drying chamber, and the vacuum annealing chamber are all equipped with several transfer rollers, which are used for transferring the substrate. These transfer rollers are particularly suitable for transferring planar substrates, and when the chambers are directly connected in series as a whole, the transfer rollers can be used to directly transfer the substrate from one chamber to another, improving the automation level of the equipment and meeting mass production requirements.

[0009] A first vacuum detector is installed in the first vacuum chamber, a second vacuum detector is installed in the second vacuum chamber, a third vacuum detector is installed in the vacuum drying chamber, and a fourth vacuum detector is installed in the vacuum annealing chamber. The vacuum detectors are used to measure the pressure within each chamber. The first vacuum detector is a low-vacuum detector, while the second, third, and fourth vacuum detectors are high-vacuum detectors.

[0010] It also includes vacuum pipes and vacuum valves mounted on the vacuum pipes. The vacuum source is connected to the first vacuum chamber and the second vacuum chamber through the vacuum pipes, and the vacuum valves are used to control the opening and closing of the vacuum pipes. Each chamber is independently equipped with a corresponding vacuum pipe and vacuum valve.

[0011] The vacuum drying chamber is equipped with a vacuum extraction protective cover, one end of which is connected to the vacuum source via the vacuum pipe. The vacuum extraction protective cover addresses the issue of insufficient vacuum pipe size by providing a larger extraction port, effectively reducing uneven airflow during extraction and improving the uniformity of vacuum extraction for the VCD player.

[0012] The vacuum annealing chamber is equipped with a first heating plate and a second heating plate, and the substrate is placed between the first heating plate and the second heating plate. This is used for annealing the film layer after VCD drying; the annealing purpose is achieved by controlling the temperature of the upper and lower heating plates.

[0013] It also includes a discharge chamber, the vacuum annealing chamber and the discharge chamber are connected by a fourth valve, and the first vacuum chamber serves as the inlet chamber; a fifth vacuum detector is provided in the discharge chamber, and several transfer rollers are provided at the bottom of the discharge chamber for transferring the substrate. The fifth vacuum detector is a low vacuum detector.

[0014] It also includes a first control module, which adjusts the pressure of the second vacuum chamber based on the pressure of the first vacuum chamber, adjusts the pressure of the vacuum drying chamber based on the pressure of the second vacuum chamber, and adjusts the pressure of the vacuum annealing chamber based on the pressure of the vacuum drying chamber. When substrate transfer is required between different chambers, balancing the pressure of adjacent chambers to the same level can prevent the mura phenomenon caused by excessive pressure fluctuations when transferring from one chamber to an adjacent chamber.

[0015] It also includes a second control module, which opens the first valve when the pressure in the second vacuum chamber and the first vacuum chamber reaches the same level, opens the second valve when the pressure in the vacuum drying chamber and the second vacuum chamber reaches the same level, and opens the third valve when the pressure in the vacuum annealing chamber and the vacuum drying chamber reaches the same level. The different chambers are connected by valves; opening the valves allows the substrate to be transferred from one chamber to another.

[0016] The substrate is a glass substrate coated with a perovskite solution wet film. During vacuum drying, the perovskite wet film is prone to unevenness such as clouding and water ripples due to large pressure changes. Therefore, the series-connected vacuum drying and annealing equipment provided in this solution is particularly suitable for drying and annealing perovskite solution wet films. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in the specific embodiments of this utility model, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0018] Figure 1 This is a schematic diagram of a series vacuum drying and annealing equipment provided in Example 1;

[0019] Figure 2 This is a schematic diagram of the structure of the first vacuum cavity in Example 1;

[0020] Figure 3 This is a schematic diagram of the structure of the second vacuum cavity in Example 1;

[0021] Figure 4 This is a schematic diagram of the vacuum drying chamber in Example 1;

[0022] Figure 5 This is a schematic diagram of the vacuum annealing chamber in Example 1;

[0023] Figure 6 This is a schematic diagram of the discharge chamber in Example 1.

[0024] Reference numerals: 1-First vacuum chamber; 2-Second vacuum chamber; 30-Vacuum drying chamber; 4-Vacuum annealing chamber; 5-Discharge chamber; 101-First valve; 102-Second valve; 103-Third valve; 104-Fourth valve; 105-Fifth valve; 106-Sixth valve; 100-Substrate; 201-First heating plate; 202-Second heating plate; 301-Transfer roller; 401-Vacuum pipe; 402-Vacuum valve; 501-Evacuation protective cover; 601-First vacuum detector; 602-Second vacuum detector; 603-Third vacuum detector; 604-Fourth vacuum detector; 605-Fifth vacuum detector. Detailed Implementation

[0025] The technical solutions in specific embodiments of this utility model will be clearly and completely described below. Obviously, the described embodiments are only a part of the embodiments of this utility model, and not all of them. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model.

[0026] Example 1

[0027] A series vacuum drying and annealing equipment, reference Figure 1The system comprises, in series, a first vacuum chamber 1, a second vacuum chamber 2, a vacuum drying chamber 3 (VCD process chamber), a vacuum annealing chamber 4, and a discharge chamber 5. The first vacuum chamber 1 also serves as the feed chamber. The first vacuum chamber 1 and the second vacuum chamber 2 are connected by a first valve 101; the second vacuum chamber 2 and the vacuum drying chamber 3 are connected by a second valve 102; the vacuum drying chamber 3 and the vacuum annealing chamber 4 are connected by a third valve 103; and the vacuum annealing chamber 4 and the discharge chamber 5 are connected by a fourth valve 104. A fifth valve 105 is provided at the feed inlet of the first vacuum chamber 1, and a sixth valve 106 is provided at the discharge outlet of the discharge chamber 5. (Reference) Figures 1 to 6 A substrate 100 coated with a perovskite film layer (initially a wet film) to be vacuum dried and annealed sequentially passes through a first vacuum chamber 1, a second vacuum chamber 2, a vacuum drying chamber 3, a vacuum annealing chamber 4, and a discharge chamber 5. The valves are chamber connection valves; these valves can be either vacuum gate valves or baffle valves, used to directly connect two adjacent chambers together. The vacuum annealing chamber 4 is equipped with a first heating plate 201 and a second heating plate 202. The substrate is placed between the first heating plate 201 and the second heating plate 202 for annealing the perovskite film layer after VCD drying. By controlling the temperature of the upper and lower heating plates, the purpose of perovskite crystallization annealing is achieved. The substrate 100 is a glass substrate coated with a perovskite solution wet film; in other embodiments, it can also be other types of substrates coated with other wet films, and is not limited thereto.

[0028] The bottom of the first vacuum chamber 1, the second vacuum chamber 2, the vacuum drying chamber 3, the vacuum annealing chamber 4, and the discharge chamber 5 are all equipped with several transfer rollers 301, which are used for transferring the substrate 100. The transfer rollers 301 are particularly suitable for transferring planar substrates 100, and when the chambers are directly connected in series as a whole, the transfer rollers 301 can be used to directly transfer the substrate 100 from one chamber to another, improving the automation level of the equipment and meeting the needs of mass production.

[0029] The first vacuum chamber 1, the second vacuum chamber 2, the vacuum drying chamber 3, the vacuum annealing chamber 4, and the discharge chamber 5 are each independently connected to a vacuum source, such as a vacuum pump. The first vacuum chamber 1 is a low-vacuum chamber, and the second vacuum chamber 2 is a high-vacuum chamber. The system also includes a vacuum pipe 401 and a vacuum valve 402 mounted on the vacuum pipe 401. The vacuum source is connected to the first vacuum chamber 1, the second vacuum chamber 2, the vacuum drying chamber 3, the vacuum annealing chamber 4, and the discharge chamber 5 respectively via the vacuum pipe 401. The vacuum pipe 401 is the evacuation channel, and the vacuum valve 402 is used to control the opening and closing of the vacuum pipe 401. Each chamber is independently equipped with a corresponding vacuum pipe 401 and vacuum valve 402. The vacuum drying chamber 3 is equipped with a vacuum protection cover 501. One end of the vacuum protection cover 501 (the end with the smaller opening) is connected to the vacuum source through the vacuum pipe 401. The vacuum protection cover 501 is used to address the problem of insufficient size of the vacuum pipe 401 by setting a larger area of ​​the vacuum port (the end with the larger opening), which can effectively reduce the problem of uneven airflow during vacuuming and improve the uniformity of vacuuming of the VCD.

[0030] It also includes a first control module and a second control module. The first control module adjusts the pressure of the second vacuum chamber 2 based on the pressure of the first vacuum chamber 1, adjusts the pressure of the vacuum drying chamber 3 based on the pressure of the second vacuum chamber 2, and adjusts the pressure of the vacuum annealing chamber 4 based on the pressure of the vacuum drying chamber 3. The second control module opens the first valve 101 when the pressures of the second vacuum chamber 2 and the first vacuum chamber 1 reach the same level, opens the second valve 102 when the pressures of the vacuum drying chamber 3 and the second vacuum chamber 2 reach the same level, and opens the third valve 103 when the pressures of the vacuum annealing chamber 4 and the vacuum drying chamber 3 reach the same level.

[0031] A first vacuum detector 601 is installed in the first vacuum chamber 1, a second vacuum detector 602 is installed in the second vacuum chamber 2, a third vacuum detector 603 is installed in the vacuum drying chamber 3, a fourth vacuum detector 604 is installed in the vacuum annealing chamber 4, and a fifth vacuum detector 605 is installed in the discharge chamber 5. The first vacuum detector 601 and the fifth vacuum detector 605 are low-vacuum detectors, while the second vacuum detector 602, the third vacuum detector 603, and the fourth vacuum detector 604 are high-vacuum detectors. The vacuum detectors are used to measure the pressure within each chamber to determine when communication between chambers occurs, i.e., when the valves between adjacent chambers are opened.

[0032] Specifically, this embodiment also provides how to use the above-mentioned series vacuum drying and annealing equipment to dry and anneal perovskite wet films, and the operation steps are as follows:

[0033] S1: The glass substrate coated with the perovskite wet film enters the cavity through the fifth valve 105 of the feed chamber (first vacuum chamber 1). The cavity pressure of the first vacuum chamber 1 is evacuated to 500-1000Pa by the vacuum pump (the cavity pressure is monitored by the low vacuum valve of the first vacuum detector 601).

[0034] S2: Balance the cavity pressure of the second vacuum chamber 2 to make it the same level as the cavity pressure of the first vacuum chamber 1, so as to avoid the film surface mura phenomenon caused by excessive cavity pressure change when the glass substrate is transferred from the first vacuum chamber 1 to the second vacuum chamber 2.

[0035] S3: When the pressure of the second vacuum chamber 2 and the first vacuum chamber 1 is at the same level, i.e., 500-1000Pa, open the intermediate connecting valve, i.e., the first valve 101, to transfer the glass substrate to the second vacuum chamber 2, and use a vacuum pump to evacuate the pressure of the second vacuum chamber 2 to 50-100Pa.

[0036] S4: The pressure in the second vacuum chamber 2 is quickly reduced to a vacuum state by a vacuum pump, with a chamber pressure of 10-50 Pa (the chamber pressure is monitored by the high vacuum valve of the second vacuum detector 602).

[0037] S5: Balance the cavity pressure of vacuum drying chamber 3 to make it the same as the cavity pressure of second vacuum chamber 2, so as to avoid the film surface mura phenomenon caused by excessive cavity pressure change when the glass substrate is transferred from second vacuum chamber 2 to vacuum drying chamber 3.

[0038] S6: Once the pressure in the vacuum drying chamber 3 and the second vacuum chamber 2 is at the same level, i.e., 10-50 Pa, open the intermediate connecting valve, i.e., the second valve 102, to transfer the glass substrate to the vacuum drying chamber 3. Use a vacuum pump to evacuate the pressure in the vacuum drying chamber 3 to 0.1-1 Pa (the pressure in the chamber is monitored by the third vacuum detector 603 high vacuum valve).

[0039] S7: Balance the cavity pressure of the vacuum annealing chamber 4 to make it the same level as the cavity pressure of the vacuum drying chamber 3, so as to avoid the film surface mura phenomenon caused by excessive cavity pressure change when the glass substrate is transferred from the vacuum drying chamber 3 to the vacuum annealing chamber 4.

[0040] S8: When the pressure in the vacuum annealing chamber 4 and the vacuum drying chamber 3 is at the same level, i.e., 0.1-1 Pa, open the intermediate connecting valve, i.e., the third valve 103, to transfer the glass substrate to the vacuum annealing chamber 4, and pre-set the temperatures of the first heating plate 201 and the second heating plate 202 so that the perovskite film layer can be effectively vacuum annealed in the first time.

[0041] S8: After the annealing is completed, balance the pressure of the discharge chamber 5 to make it the same level as the pressure of the vacuum annealing chamber 4, i.e., 0.1-1Pa. Then open the intermediate connecting valve, i.e. the fourth valve 104, to transfer the annealed perovskite film to the discharge chamber 5.

[0042] S9: After balancing the pressure in the discharge chamber 5 to a low vacuum state (1000-2000Pa), open the sixth valve 106 of the discharge chamber 5 to transfer the prepared perovskite film to the next process and continue the preparation of the component.

[0043] This embodiment provides a series-connected vacuum drying and annealing equipment. Through structural design, the VCD process equipment can be connected in series. The organic connection of various functional chambers improves the process cycle time, further increasing the yield of perovskite modules. Furthermore, by organically connecting different functional chambers, particularly by setting up a first vacuum chamber 1 and a second vacuum chamber 2 as a transition from low to high vacuum, and by controlling the pressure between different chambers, the large-scale gas flow caused by the huge pressure difference effectively controls the mura phenomenon (uniformity of the perovskite wet film) that occurs on the film surface. This improves the crystal uniformity of the perovskite film layer, thereby improving the photoelectric conversion efficiency of the perovskite module. Reducing the mura phenomenon caused by the large-scale airflow during the VCD evacuation and de-cavitation process plays a crucial role in improving the efficiency and yield of the perovskite industry.

[0044] Example 2

[0045] A method for preparing perovskite devices using a series vacuum drying and annealing apparatus as described in Example 1 is also provided:

[0046] Step 1: Weigh the perovskite precursor powder. A perovskite precursor solution needs to be prepared. The molecular formula is as follows (but not limited to this formula; common perovskite molecular formulas are all applicable): Cs 0.05 FA 0.95 Pb(I 0.95 Br 0.05 3. The specific formulation of each component is as follows: at a 1M concentration, each milliliter of solution contains: CsI (19.5 mg); MABr (8.4 mg); FAI (231.69 mg); PbI2 (659.5 mg); PbBr2 (27.5 mg);

[0047] Step 2: Prepare the perovskite precursor solution. Add an appropriate amount of DMF, NMP, and DMSO mixed solvent to the pharmaceutical powder from Step 1 (prepare a 1.0M perovskite solution according to an appropriate ratio). It is worth noting that if the solvent ratio is out of balance, the α-phase perovskite film cannot be directly prepared. More specifically, in this embodiment, the solvent ratio is DMF:DMSO = 400:40. Place the solution on a stirring table and stir at room temperature for 4 hours to ensure complete dissolution.

[0048] Solvent ratios are detailed in Table 1 below:

[0049] Table 1

[0050] Solvent ratio in the example DMF 400 DMSO 40

[0051] Step 3: The perovskite precursor mixture obtained in Step 2 is used to prepare a uniform perovskite solution wet film on a TCO substrate using a blade coating device or a slit coating device.

[0052] Step 4: Transfer the wet film substrate from Step 3 into the series vacuum drying and annealing equipment in Example 1. By rapidly evacuating the vacuum in Step S4 (within 50-100 seconds, the vacuum level is reduced to 10-50 Pa), the solvent is rapidly evaporated, and a perovskite thin film can be prepared.

[0053] Step 5: Evaporate C60, BCP and Cu onto the perovskite substrate prepared above.

[0054] The series vacuum drying and annealing equipment provided in Example 1 can directionally adjust the crystal orientation of perovskite films. It is applicable to, but not limited to, the perovskite components in the specific examples, and also includes other common perovskite formulation systems.

[0055] Existing perovskite vacuum drying (VCD) equipment mostly employs a single-chamber design, which cannot meet mass production requirements and lacks a vacuum buffer chamber. This results in drastic pressure changes within the chamber during the vacuum drying process of the perovskite film, generating a large amount of gas flow. This massive gas flow can cause mura phenomena on the surface of the perovskite wet film, significantly impacting the uniformity of the perovskite. This solution designs a series-connected VCD vacuum drying system, enabling it to be more efficiently integrated into production line applications and increasing capacity. Simultaneously, the design of different buffer chambers allows for distributed, buffered feeding of the perovskite wet film from atmospheric pressure to first-order low vacuum, then to second-order low vacuum, and finally to high vacuum, greatly reducing the mura phenomenon caused by drastic pressure changes. Combined with a vacuum annealing chamber following the VCD, the perovskite is completely free of atmospheric water and oxygen throughout the drying, annealing, and crystallization processes. Water and oxygen can disrupt perovskite crystallization to some extent; this water and oxygen isolation significantly improves the quality of the perovskite, facilitating the preparation of more efficient perovskite modules.

[0056] The above description of the embodiments is only for the purpose of helping to understand the method and core idea of ​​this utility model. It should be noted that for those skilled in the art, several improvements and modifications can be made to this utility model without departing from the principle of this utility model, and these improvements and modifications also fall within the scope of protection of the claims of this utility model.

Claims

1. A series-type vacuum drying and annealing equipment, characterized in that, The system includes a first vacuum chamber (1), a second vacuum chamber (2), a vacuum drying chamber (3), and a vacuum annealing chamber (4) connected in series. The first vacuum chamber (1) and the second vacuum chamber (2) are connected through a first valve (101), the second vacuum chamber (2) and the vacuum drying chamber (3) are connected through a second valve (102), and the vacuum drying chamber (3) and the vacuum annealing chamber (4) are connected through a third valve (103). A substrate (100) coated with a film layer to be vacuum dried and annealed passes through the first vacuum chamber (1), the second vacuum chamber (2), the vacuum drying chamber (3), and the vacuum annealing chamber (4) in sequence. The first vacuum chamber (1) and the second vacuum chamber (2) are independently connected to a vacuum source. The first vacuum chamber (1) is a low vacuum chamber, and the second vacuum chamber (2) is a high vacuum chamber.

2. The series vacuum drying and annealing equipment according to claim 1, characterized in that, The bottom of the first vacuum chamber (1), the second vacuum chamber (2), the vacuum drying chamber (3) and the vacuum annealing chamber (4) are provided with a plurality of transfer rollers (301), which are used for the transfer of the substrate (100).

3. The series vacuum drying and annealing equipment according to claim 1, characterized in that, The first vacuum chamber (1) is equipped with a first vacuum detector (601), the second vacuum chamber (2) is equipped with a second vacuum detector (602), the vacuum drying chamber (3) is equipped with a third vacuum detector (603), and the vacuum annealing chamber (4) is equipped with a fourth vacuum detector (604).

4. The series vacuum drying and annealing equipment according to claim 1, characterized in that, It also includes a vacuum pipe (401) and a vacuum valve (402) disposed on the vacuum pipe (401). The vacuum source is connected to the first vacuum chamber (1) and the second vacuum chamber (2) through the vacuum pipe (401). The vacuum valve (402) is used to control the opening and closing of the vacuum pipe (401).

5. The series vacuum drying and annealing equipment according to claim 4, characterized in that, The vacuum drying chamber (3) is equipped with a vacuum protection cover (501), and one end of the vacuum protection cover (501) is connected to the vacuum source through the vacuum pipe (401).

6. The series vacuum drying and annealing equipment according to claim 1, characterized in that, The vacuum annealing chamber (4) is provided with a first heating plate (201) and a second heating plate (202), and the substrate (100) is placed between the first heating plate (201) and the second heating plate (202).

7. The series vacuum drying and annealing equipment according to claim 1, characterized in that, It also includes a discharge chamber (5), the vacuum annealing chamber (4) and the discharge chamber (5) are connected by a fourth valve (104), the first vacuum chamber (1) serves as the inlet chamber; a fifth vacuum detector (605) is provided in the discharge chamber (5), and a number of transfer rollers (301) are provided at the bottom of the discharge chamber (5), the transfer rollers (301) are used for the transfer of the substrate (100).

8. The series vacuum drying and annealing equipment according to claim 1, characterized in that, It also includes a first control module, which adjusts the pressure of the second vacuum chamber (2) according to the pressure of the first vacuum chamber (1), adjusts the pressure of the vacuum drying chamber (3) according to the pressure of the second vacuum chamber (2), and adjusts the pressure of the vacuum annealing chamber (4) according to the pressure of the vacuum drying chamber (3).

9. The series vacuum drying and annealing equipment according to claim 1, characterized in that, It also includes a second control module, which opens the first valve (101) when the cavity pressure of the second vacuum chamber (2) and the first vacuum chamber (1) reaches the same level, opens the second valve (102) when the cavity pressure of the vacuum drying chamber (3) and the second vacuum chamber (2) reaches the same level, and opens the third valve (103) when the cavity pressure of the vacuum annealing chamber (4) and the vacuum drying chamber (3) reaches the same level.

10. A series vacuum drying and annealing apparatus according to claim 1, characterized in that, The substrate (100) is a glass substrate coated with a perovskite solution wet film.

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