Rotatable spray glass substrate polisher

Abstract

The application provides a rotatable spraying glass substrate grinder, which comprises a rack assembly, a conveying assembly installed on the rack assembly, a transfer assembly installed on the rack assembly and located above the conveying assembly, a grinding assembly installed on the rack assembly and located above the transfer assembly and used for grinding the glass substrate transferred from the conveying assembly by the transfer assembly, and a spraying assembly installed on the rack assembly and located above the grinding space of the grinding assembly, wherein the spraying assembly comprises a rotating shaft and a spraying arm, and an angle-adjustable atomizing nozzle is installed on the spraying arm; the spraying arm is rotatably installed on the rack assembly through the rotating shaft, and the surface of the glass substrate can be rotatably sprayed and washed by the atomizing nozzle. The application designs the rotatable spraying assembly, the washing range is larger, the spraying angle is more variable, the better washing effect can be achieved, the grinding quality of the glass substrate is improved, and the grinding assembly is protected.

Description

Technical Field

[0001] This application relates to the field of glass substrate polishing equipment technology, and more specifically, to a glass substrate polishing machine with a rotating spray function. Background Technology

[0002] Grinding is required during the production of glass substrates. During the grinding process, debris and dust generated by the grinding machine adhere to the surface of the glass substrate, affecting grinding precision and quality, and potentially accelerating wear on grinding components and shortening their lifespan. Most existing grinding machines use fixed nozzles to rinse the ground substrate surface, resulting in a limited rinsing range and difficulty in achieving comprehensive and uniform rinsing, leading to poor rinsing effects. For example, Chinese patent CN202111245912.1 discloses a cleaning process for wafer grinding pads and a grinding pad cleaning nozzle, which uses a fixed cleaning nozzle for the cleaning steps. To improve the cleaning effect, a gas pressurization device is added to increase water pressure and rinsing efficiency, making the nozzle structure overly complex. Furthermore, the fixed nozzle rinsing method is relatively simple and cannot be flexibly adjusted according to different stages of the grinding process and actual needs, failing to adapt well to complex and changing grinding conditions. Therefore, a more flexible spraying method for rinsing glass substrates is needed. Utility Model Content

[0003] This application provides a glass substrate polishing machine with rotatable spray to solve the problem that the polishing mechanism in the prior art uses a fixed nozzle, resulting in a limited spray rinsing range and poor rinsing effect.

[0004] A glass substrate polishing machine with a rotatable spray function according to this application includes:

[0005] Rack components;

[0006] The transfer component is mounted on the rack assembly;

[0007] The transfer assembly is mounted on the rack assembly and located above the transfer assembly;

[0008] The grinding assembly, mounted on the rack assembly and positioned above the transfer assembly, is used to grind the glass substrate transferred from the conveyor assembly by the transfer assembly.

[0009] The spray assembly, mounted on the frame assembly and located above the grinding space of the grinding assembly, includes a rotating shaft and a spray arm, on which an angle-adjustable atomizing nozzle is mounted; the spray arm is rotatably mounted on the frame assembly via the rotating shaft, and performs rotating spray rinsing on the surface of the glass substrate through the atomizing nozzle.

[0010] In some embodiments, multiple sets of atomizing nozzles are uniformly arranged on the spray arm, and each atomizing nozzle is connected to a liquid channel inside the spray arm; the atomizing nozzles drive the spray arm to rotate horizontally by spraying spray liquid.

[0011] In some embodiments, the atomizing nozzle is an angle-adjustable fan-shaped atomizing nozzle, and is detachably and uniformly installed on the spray arm.

[0012] In some embodiments, the grinding components are provided in two opposing sets, with a square frame beam between the two sets of grinding components; the spraying component further includes a spraying bracket; one end of the spraying bracket is connected to the square frame beam, and the other end is rotatably mounted with a rotating shaft.

[0013] In some embodiments, multiple sets of spray components are provided, and the multiple sets of spray components are evenly distributed on the frame beam.

[0014] In some embodiments, it further includes: a liquid circulation assembly; the liquid circulation assembly is connected to a liquid channel within the spray arm to provide spray liquid to the atomizing nozzle.

[0015] In some embodiments, the grinding assembly includes: multiple sets of grinding wheels arranged side by side and evenly distributed, with the grinding wheels and the spraying assembly located on the same side of the frame beam.

[0016] In some embodiments, the conveying assembly includes: a substrate conveyor belt; the substrate conveyor belt is composed of multiple parallel single conveyor belts; the substrate conveyor belt is horizontally arranged and passes between two sets of grinding assemblies.

[0017] In some embodiments, the transfer assembly includes: a transfer lifting platform disposed directly above the substrate conveyor belt; a substrate detection sensor is disposed on the transfer lifting platform and electrically connected to the controller of the transfer lifting platform.

[0018] In some embodiments, the substrate conveyor belt includes two sets arranged in a front-to-back alignment; a transfer lifting platform is disposed between the two sets of substrate conveyor belts; both sets of substrate conveyor belts partially overlap with the transfer lifting platform, so that the glass substrate is transported via the transfer lifting platform.

[0019] According to the technical solution of this application, a rotatable spray glass substrate polishing machine includes: a frame assembly; a conveying assembly mounted on the frame assembly; a transfer assembly mounted on the frame assembly and located above the conveying assembly; a polishing assembly mounted on the frame assembly and located above the transfer assembly, used to polish the glass substrate transferred from the conveying assembly by the transfer assembly; and a spraying assembly mounted on the frame assembly and located above the polishing space of the polishing assembly, including: a rotating shaft and a spraying arm, with an angle-adjustable atomizing nozzle mounted on the spraying arm; the spraying arm is rotatably mounted on the frame assembly via the rotating shaft, enabling it to perform rotatable spray rinsing of the glass substrate surface through the atomizing nozzle. This application designs a rotary spraying assembly, using a rotatable spraying arm to spray rinsing the glass substrate during transfer and polishing. Its rinsing range is larger and the spray angle is more variable, thus achieving better rinsing effect, improving the polishing quality of the glass substrate, protecting the polishing assembly, slowing down wear, and extending its service life. Attached Figure Description

[0020] The accompanying drawings, which are incorporated in and form part of this specification, illustrate embodiments consistent with this application and, together with the description, serve to explain the principles of this application.

[0021] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, for those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0022] Figure 1 A schematic diagram of the isometric structure of a rotatable spray glass substrate polishing machine according to an embodiment of this application is shown.

[0023] Figure 2 This is a front view schematic diagram of a rotatable spray glass substrate polishing machine according to an embodiment of this application;

[0024] Figure 3 A top view of a glass substrate polishing machine with rotatable spray according to an embodiment of this application is shown.

[0025] Figure 4 A side view of a glass substrate polishing machine with rotatable spray according to an embodiment of this application is shown.

[0026] The above figures include the following reference numerals:

[0027] 1. Frame assembly; 11. Square frame beam; 12. Guide mechanism; 2. Conveying assembly; 21. Substrate conveyor belt; 3. Transfer assembly; 31. Transfer lifting platform; 4. Grinding assembly; 41. Grinding wheel; 5. Spraying assembly; 51. Rotating shaft; 52. Spraying arm; 53. Atomizing nozzle; 54. Spraying bracket. Detailed Implementation

[0028] It should be noted that, unless otherwise specified, the embodiments and features described in this application can be combined with each other. This application will now be described in detail with reference to the accompanying drawings and embodiments.

[0029] It should be noted that the following detailed descriptions are illustrative and intended to provide further explanation of this application. Unless otherwise specified, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application pertains.

[0030] For ease of description, spatial relative terms such as "above," "on top of," "on the upper surface of," "above," etc., are used herein to describe the spatial positional relationship of a device or feature as shown in the figures to other devices or features. It should be understood that spatial relative terms are intended to encompass different orientations in use or operation beyond the orientation of the device as described in the figures. For example, if the device in the figures were inverted, a device described as "above" or "on top of" other devices or structures would subsequently be positioned as "below" or "under" other devices or structures. Thus, the exemplary term "above" can include both "above" and "below." The device may also be positioned in other different ways, rotated 90 degrees, or in other orientations, and the spatial relative descriptions used herein will be interpreted accordingly.

[0031] It should be noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the exemplary embodiments according to this application. As used herein, the singular form is intended to include the plural form as well, unless the context clearly indicates otherwise. Furthermore, it should be understood that when the terms "comprising" and / or "including" are used in this specification, they indicate the presence of features, steps, operations, devices, components, and / or combinations thereof.

[0032] It should be noted that the terms "first," "second," etc., in the specification, claims, and accompanying drawings of this application are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate so that the embodiments of this application described herein can be implemented, for example, in orders other than those illustrated or described herein. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover non-exclusive inclusion; for example, a process, method, system, product, or apparatus that comprises a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to such processes, methods, products, or apparatus.

[0033] Figures 1 to 4 An embodiment of the glass substrate polishing machine with rotatable spraying according to this application is illustrated schematically.

[0034] like Figures 1 to 4 As shown, this application discloses a rotatable spray glass substrate polishing machine, comprising: a frame assembly 1; a conveying assembly 2 mounted on the frame assembly 1; a transfer assembly 3 mounted on the frame assembly 1 and located above the conveying assembly 2; a polishing assembly 4 mounted on the frame assembly 1 and located above the transfer assembly 3, for polishing the glass substrate transferred from the conveying assembly 2 by the transfer assembly 3; and a spraying assembly 5 mounted on the frame assembly 1 and located above the polishing space of the polishing assembly 4. The spraying assembly 5 includes: a rotating shaft 51 and a spraying arm 52, on which an angle-adjustable atomizing nozzle 53 is mounted. The spraying arm 52 is rotatably mounted on the frame assembly 1 via the rotating shaft 51, and can perform rotatable spray rinsing of the glass substrate surface through the atomizing nozzle 53.

[0035] Through the above structural design, this application designs a rotary spray assembly 5, which uses a rotatable spray arm 52 to spray and rinse the glass substrate during the transfer and grinding process. The rinsing range is larger and the spray angle is more varied, thus achieving a better rinsing effect, improving the grinding quality of the glass substrate, protecting the grinding assembly 4, slowing down the wear rate of the grinding assembly 4, and extending its service life.

[0036] In some embodiments of this application, such as Figure 1 and Figure 2As shown, multiple sets of atomizing nozzles 53 are evenly arranged on the spray arm 52. Each atomizing nozzle 53 is connected to a liquid channel within the spray arm 52, thereby forming a uniform spray water curtain to efficiently rinse the glass substrate. The spray liquid can be deionized water, etc., and is pumped in according to the requirements of the glass substrate. The atomizing nozzles 53 drive the spray arm 52 to rotate horizontally by spraying the spray liquid; that is, the atomizing nozzles 53 spray the spray liquid at an angle to the vertical direction. Based on the principle of conservation of momentum, the liquid pressure drives the spray arm 52 to rotate in the opposite direction, thus achieving rotational spraying across the entire circumferential surface of the spray arm 52. This rotation method is automatically achieved using the spray liquid flow, eliminating the need for an additional rotation drive mechanism. It features a simple structure, ease of use, and low production and maintenance costs.

[0037] In some embodiments of this application, the atomizing nozzle 53 is specifically an angle-adjustable (0-90° adjustable) fan-shaped atomizing nozzle 53, and the atomizing nozzle 53 is detachably and uniformly installed on the spray arm 52. Therefore, the atomizing nozzle 53 in the embodiments of this application can flexibly adjust the rinsing angle and the number of nozzles according to the actual situation such as the shape and position of the grinding assembly 4 and the glass substrate, so that the rinsing liquid can accurately impact the parts that need to be rinsed, thereby improving the rinsing effect.

[0038] In some embodiments of this application, such as Figures 1 to 4 As shown, the grinding assembly 4 has two opposing sets, capable of grinding the glass substrate from both the left and right sides. A rectangular crossbeam 11 is positioned between the two sets of grinding assemblies 4. The spray assembly 5 also includes a spray bracket 54. One end of the spray bracket 54 is connected to the rectangular crossbeam 11, and the other end is rotatably mounted with a rotating shaft 51, thereby mounting the entire spray assembly 5 above the grinding space to provide spray cleaning for the glass substrate being transferred and ground.

[0039] In some embodiments of this application, such as Figures 1 to 4 As shown, multiple sets of spray components 5 are provided, and these multiple sets of spray components 5 are evenly distributed on the frame beam 11 to ensure comprehensive rinsing of all positions on the glass substrate. In the embodiment shown in the accompanying drawings of this application, two sets of spray components 5 are provided. It is understood that in other embodiments of this application, the number of spray components 5 can be adjusted according to conditions such as the size of the glass substrate. Furthermore, in this application… Figures 1 to 4 In the illustrated embodiment, the spray brackets 54 of the two sets of spray components 5 are of the same length, so that the two sets of spray arms 52 extend out of the frame beam 11 by the same length and are arranged in a straight line. In other embodiments of this application, specifically for grinding large-size glass substrates, the number of spray components 5 is three or more, and spray brackets 54 of different lengths are used, thereby increasing the spray coverage area and improving the rinsing effect by staggering the distribution of spray arms 52.

[0040] In some embodiments of this application, the rotatable spray glass substrate polishing machine further includes a liquid circulation assembly. The liquid circulation assembly is connected to the liquid channel within the spray arm 52, thereby providing a continuous supply of spray liquid to the atomizing nozzle 53. The liquid circulation assembly includes a water storage tank, a circulation pump, a solenoid valve, circulation pipes, and a recovery water tank, etc. Its structure is commonly used by those skilled in the art and poses no difficulty in arrangement; it only needs to provide spray liquid to the spray assembly 5 after installation, and will not be described in detail here.

[0041] In some embodiments of this application, such as Figures 1 to 4 As shown, the polishing assembly 4 includes multiple sets of polishing wheels 41, which are arranged side by side and evenly distributed to provide a sufficiently uniform polishing process to the glass substrate. Figures 1 to 4 As shown, the grinding wheel 41 and the spray assembly 5 are located on the same side of the frame beam 11, that is, both are located on the front side of the frame beam 11. The spray assembly 5 washes the glass substrate with spray, which can remove debris from the glass substrate in a timely manner, improve the grinding quality, reduce the wear rate of the grinding wheel 41, and extend its service life.

[0042] In some embodiments of this application, the grinding assembly 4 further includes a translational drive mechanism and a flipping drive mechanism. Both the translational drive mechanism and the flipping drive mechanism are connected to the grinding frame on which the grinding wheel 41 is mounted, and can respectively drive the grinding frame and the grinding wheel 41 to achieve translational and flipping movements. This allows for changing the amount of grinding on the edge of the glass substrate by adjusting the translation of the grinding wheel 41, and for comprehensively grinding the edge and upper surface of the glass substrate by flipping the grinding wheel 41 from a vertical to a horizontal state. Both the translational drive mechanism and the flipping drive mechanism can be implemented using mechanisms such as servo motors. For example, a servo motor paired with a slide rail can achieve translational drive, and a servo motor paired with a rotating roller can achieve flipping drive; these are well-known and feasible methods for implementation by those skilled in the art, and will not be elaborated upon here.

[0043] In some embodiments of this application, such as Figures 1 to 4 As shown, the conveying assembly 2 includes a substrate conveyor belt 21. The substrate conveyor belt 21 consists of multiple parallel individual conveyor belts to ensure a smooth and safe conveying process of the glass substrate, and to prevent the glass substrate from being damaged by bumps or from being scratched by local pressure and friction. The substrate conveyor belt 21 is horizontally arranged and passes between the two sets of grinding assemblies 4 to realize the transport of the glass substrate through the grinding machine.

[0044] In some embodiments of this application, such as Figures 1 to 4As shown, the transfer assembly 3 includes a transfer lifting platform 31, which is positioned directly above the substrate conveyor belt 21. The platform is used to lift and transfer the glass substrate from the conveyor belt 21 for grinding by the grinding assembly 4. After grinding, the platform descends to return the ground glass substrate to the conveyor belt 21, thus enabling the glass substrate to be transported out after grinding. Compared to the conveyor belt 21, the transfer lifting platform 31 provides more reliable and precise positioning. Its lifting stroke is precisely set according to the size of the glass substrate and the amount of grinding, ensuring stable support of the glass substrate during grinding for precise grinding. In this embodiment, the transfer lifting platform 31 is also equipped with a substrate detection sensor, which is electrically connected to the controller of the platform. This sensor can trigger the platform to rise and transfer the glass substrate after it has been detected in position, achieving automated operation.

[0045] In some embodiments of this application, such as Figure 4 As shown, the substrate conveyor belt 21 includes two sets arranged front to back. The transfer lifting platform 31 is disposed between the two sets of substrate conveyor belts 21. Both sets of substrate conveyor belts 21 partially overlap with the transfer lifting platform 31, which allows the glass substrate to be transported via the transfer lifting platform 31, facilitating the transfer of the glass substrate to the transfer lifting platform 31 for transfer grinding processing.

[0046] In some embodiments of this application, such as Figures 1 to 4 As shown, the frame assembly 1 is also provided with a guide mechanism 12 located in front of the transfer assembly 3. The guide mechanism 12 is located on both sides of the substrate conveyor belt 21 and is provided with guide wheels. It can guide the glass substrate into and out of the transfer lifting platform 31 to ensure that the glass substrate smoothly transitions from the substrate conveyor belt 21 to the transfer lifting platform 31, thereby improving the safety and accuracy of glass substrate transfer, protecting the glass substrate from damage, and improving grinding accuracy.

[0047] In some embodiments of this application, the spray bracket 54 of the spray assembly 5 may also be provided with a lifting mechanism. Specifically, a lifting cylinder is provided between the spray bracket 54 and the frame beam 11, so as to facilitate the change of spray height by lifting the cylinder, more flexibly adapt to the transfer and spraying requirements of different substrate products, improve the adaptability of the grinding machine of this application, improve the rinsing effect and thus improve the grinding quality.

[0048] Combination Figures 1 to 4 The working principle of this application is explained as follows:

[0049] After the glass substrate is transported to the transfer lifting platform 31 via the front substrate conveyor belt 21, it is detected and stopped at a set position by the substrate detection sensor. Then, the transfer lifting platform 31 starts to lift and move the glass substrate to the set position. Subsequently, the grinding assembly 4 grinds the glass substrate using the grinding wheel 41. At this time, the spray assembly 5 starts, and the spray liquid pumped by the liquid circulation assembly enters the spray arm 52 through the pipe, and is then sprayed out from the atomizing nozzle 53 to spray and rinse the glass substrate. The spray liquid atomizing nozzle 53 sprays out, and due to the liquid pressure, it drives the rotating shaft 51 and the spray arm 52 to rotate, realizing rotational spray cleaning, thereby increasing the spray area and improving the cleaning ability. Furthermore, the atomizing nozzle 53 of the spray assembly 5 can change the spray angle by angle adjustment, so as to flexibly adjust the rinsing angle according to the actual situation such as the shape and position of the grinding assembly 4 and the glass substrate, so that the rinsing liquid can accurately impact the area that needs to be rinsed, resulting in a good rinsing effect.

[0050] In summary, the rotatable spray glass substrate polishing machine of this application includes: a frame assembly 1; a conveying assembly 2 mounted on the frame assembly 1; a transfer assembly 3 mounted on the frame assembly 1 and located above the conveying assembly 2; a polishing assembly 4 mounted on the frame assembly 1 and located above the transfer assembly 3, used to polish the glass substrate transferred from the conveying assembly 2 by the transfer assembly 3; and a spraying assembly 5 mounted on the frame assembly 1 and located above the polishing space of the polishing assembly 4, including: a rotating shaft 51 and a spraying arm 52, wherein an angle-adjustable atomizing nozzle 53 is mounted on the spraying arm 52; the spraying arm 52 is rotatably mounted on the frame assembly 1 via the rotating shaft 51, and can perform rotatable spray rinsing on the surface of the glass substrate through the atomizing nozzle 53. This application designs a rotary spray assembly 5, which uses a rotatable spray arm 52 to spray and rinse the glass substrate during the transfer and grinding process. The rinsing range is larger and the spray angle is more varied, thus achieving a better rinsing effect, improving the grinding quality of the glass substrate, protecting the grinding assembly 4, slowing down the wear rate, and extending its service life.

[0051] The above are merely preferred embodiments of this application and are not intended to limit this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A glass substrate grinding machine with a rotating spray function, characterized in that, include: Rack assembly (1); A conveying assembly (2) is mounted on the rack assembly (1); The transfer assembly (3) is mounted on the rack assembly (1) and located above the transfer assembly (2); A grinding assembly (4) is mounted on the frame assembly (1) and positioned above the transfer assembly (3) for grinding the glass substrate transferred by the transfer assembly (3) from the conveying assembly (2). A spray assembly (5) is installed on the frame assembly (1) and located above the grinding space of the grinding assembly (4). It includes a rotating shaft (51) and a spray arm (52). An angle-adjustable atomizing nozzle (53) is installed on the spray arm (52). The spray arm (52) is rotatably installed on the frame assembly (1) via the rotating shaft (51) and performs a rotating spray rinsing on the surface of the glass substrate through the atomizing nozzle (53).

2. The rotatable spray glass substrate grinding machine according to claim 1, characterized in that, Multiple sets of atomizing nozzles (53) are evenly arranged on the spray arm (52), and each atomizing nozzle (53) is connected to the liquid channel inside the spray arm (52); the atomizing nozzle (53) drives the spray arm (52) to rotate horizontally by spraying spray liquid.

3. The rotatable spray glass substrate grinding machine according to claim 2, characterized in that, The atomizing nozzle (53) is an angle-adjustable fan-shaped atomizing nozzle (53), and it can be detachably and uniformly installed on the spray arm (52).

4. The rotatable spray glass substrate grinding machine according to claim 2, characterized in that, The grinding assembly (4) is provided in two opposing sets, and a square frame beam (11) is provided between the two sets of grinding assemblies (4); the spray assembly (5) further includes: a spray bracket (54); one end of the spray bracket (54) is connected to the square frame beam (11), and the other end is rotatably mounted with the rotating shaft (51).

5. The rotatable spray glass substrate grinding machine according to claim 4, characterized in that, The spray assembly (5) is provided in multiple sets, and the multiple sets of spray assemblies (5) are evenly distributed on the crossbeam (11) of the square frame.

6. The rotatable spray glass substrate polishing machine according to claim 2, characterized in that, Also includes: Liquid circulation assembly; the liquid circulation assembly is connected to the liquid channel in the spray arm (52) to provide spray liquid to the atomizing nozzle (53).

7. The rotatable spray glass substrate polishing machine according to claim 4, characterized in that, The grinding assembly (4) includes multiple grinding wheels (41), which are arranged side by side and evenly distributed. The grinding wheels (41) and the spray assembly (5) are located on the same side of the frame beam (11).

8. The rotatable spray glass substrate polishing machine according to claim 7, characterized in that, The conveying assembly (2) includes: a substrate conveyor belt (21); the substrate conveyor belt (21) is composed of multiple parallel single conveyor belts; the substrate conveyor belt (21) is horizontally arranged and passes between the two sets of the grinding assemblies (4).

9. The rotatable spray glass substrate polishing machine according to claim 8, characterized in that, The transfer assembly (3) includes: a transfer lifting platform (31), which is located directly above the substrate conveyor belt (21); a substrate detection sensor is provided on the transfer lifting platform (31), and the substrate detection sensor is electrically connected to the controller of the transfer lifting platform (31).

10. The rotatable spray glass substrate polishing machine according to claim 9, characterized in that, The substrate conveyor belt (21) includes two sets arranged in a front-to-back alignment; the transfer lifting platform (31) is arranged between the two sets of substrate conveyor belts (21); both sets of substrate conveyor belts (21) partially overlap with the transfer lifting platform (31), so that the glass substrate is transported by the transfer lifting platform (31).

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