A slotted multi-size nail table adaptive magnetron sputtering instrument sample table

Abstract

The utility model relates to sample stage technical field especially is a kind of grooving formula multi-size nail table adaptive magnetron sputtering instrument sample stage, including substrate structure, combination positioning structure is provided on the substrate structure, the combination positioning structure includes the positioning groove structure being opened on substrate structure, the slot width of positioning groove structure is W, nail table is placed in positioning groove structure, the utility model is through the combination design of U-shaped groove and round hole, nail table can be compactly arranged, effectively improve the effective working area of sample stage, to improve space utilization, U-shaped groove structure allows nail table to freely slide in groove, realizes the continuous adjustment of sample spacing, satisfies the spatial distribution demand of different shape size sample or special station, and continuous adjustment function reduces manual adjustment time, and the arrangement efficiency of special-shaped sample station is improved, to improve production efficiency.

Description

Technical Field

[0001] This utility model relates to the field of sample stage technology, specifically a slotted multi-size nail stage adapted to a magnetron sputtering instrument sample stage. Background Technology

[0002] In magnetron sputtering, the design of the sample stage is crucial for precise sample positioning and efficient processing. Existing magnetron sputtering sample stages mostly employ a substrate-perforated structure, where a discrete array of circular positioning holes is set on the substrate, and the stud stage engages with these holes via positioning posts at its bottom. However, this perforated structure has some significant drawbacks, limiting its effectiveness and flexibility in practical applications.

[0003] The open-hole structure suffers from low space utilization. Because an isolation zone needs to be reserved around the circular holes, the effective working area is reduced, failing to fully utilize the sample stage space. Secondly, layout flexibility is limited. The nail stage must be precisely aligned with the pre-set hole positions, making continuous position adjustment impossible. This can lead to positioning blind spots when densely arranging samples of special sizes. Furthermore, this structure lacks compatibility. The spacing parameters between discrete holes determine the maximum diameter of the nail stage surface that can be accommodated. When using nail stages with a diameter exceeding the hole spacing, the entire substrate needs to be replaced, increasing both operational complexity and cost.

[0004] Therefore, a slotted, multi-size nail stage is needed to adapt to the sample stage of a magnetron sputtering instrument to improve the above-mentioned problems. Utility Model Content

[0005] The purpose of this invention is to provide a slotted multi-size nail stage adapted to a magnetron sputtering sample stage, so as to solve the problems mentioned in the background art.

[0006] To achieve the above objectives, this utility model provides the following technical solution:

[0007] A slotted multi-size nail stage adapted to a magnetron sputtering sample stage includes a substrate structure. The substrate structure is provided with a combined positioning structure. The combined positioning structure includes a positioning groove structure formed on the substrate structure. The groove width of the positioning groove structure is W. The nail stage is placed in the positioning groove structure.

[0008] As a preferred embodiment of this utility model, the groove width W = D + Δ, where D is the nominal diameter of the positioning post at the bottom of the nail station, and Δ is the gap compensation amount.

[0009] As a preferred embodiment of this utility model, the value range of the gap compensation amount is 0.1≤Δ≤0.5.

[0010] As a preferred embodiment of this utility model, the substrate structure is made of aluminum alloy or stainless steel.

[0011] As a preferred embodiment of this utility model, the substrate structure includes a substrate a, and the positioning groove structure includes three sets of U-shaped annular grooves a formed on the substrate a. The three sets of U-shaped annular grooves a are arranged in a circular array with the center point of the substrate a as the center point. Each U-shaped annular groove a includes several annular grooves a arranged in a coaxial array. The length of the several annular grooves a increases sequentially from the inside to the outside, and the central angle of each annular groove a is 90°. Several circular holes a are also provided between the several U-shaped annular grooves a as needed.

[0012] As a preferred embodiment of this utility model, the substrate structure includes a substrate b, and the positioning groove structure includes four sets of U-shaped annular grooves b formed on the substrate a. The four sets of U-shaped annular grooves b are arranged in a circular array with the center point of the substrate a as the center point. Each U-shaped annular groove b includes several annular grooves b arranged in a coaxial array. The length of the several annular grooves b increases sequentially from the inside to the outside, and the central angle of each annular groove b is 60°. Several circular holes b are also provided between adjacent U-shaped annular groove groups b as needed.

[0013] The substrate structure includes a substrate a, and the positioning groove structure includes a plurality of annular grooves c arranged sequentially from the inside to the outside, with an included angle of 60° between the ends of adjacent annular grooves c.

[0014] The substrate structure includes a substrate a, and the positioning groove structure includes three sets of U-shaped annular groove groups c and three sets of U-shaped annular groove groups d. The three sets of U-shaped annular groove groups c and d are arranged in a circular array with the center point of substrate a as the center point. Each U-shaped annular groove group c includes several annular grooves d arranged in a coaxial array, and each U-shaped annular groove group d includes several annular grooves g arranged in a coaxial array. The annular grooves g and annular grooves d are spaced apart, and the central angle between each annular groove d and annular groove g is 80°. Several circular holes c are opened between adjacent U-shaped annular groove groups c.

[0015] The substrate structure includes a substrate a, and the positioning groove structure includes three sets of U-shaped annular grooves e. The three sets of U-shaped annular grooves e are arranged in a circular array with the center point of the substrate a as the center point. Each U-shaped annular groove e includes several annular grooves g arranged in a coaxial array. The central angle of each annular groove g is 100 degrees. Several circular holes d are opened between adjacent U-shaped annular grooves e.

[0016] The substrate structure includes a substrate a, and the positioning groove structure includes a set of U-shaped annular grooves f and a set of U-shaped annular grooves g. The U-shaped annular grooves f include several annular grooves f arranged in a coaxial array, and the U-shaped annular grooves g include several annular grooves e arranged in a coaxial array. The central angle subtended by each annular groove f is 240 degrees, and the central angle subtended by each annular groove e is 50 degrees. A circular hole e is provided between the ends of the annular groove e and the annular groove f.

[0017] Compared with the prior art, the beneficial effects of this utility model are:

[0018] 1. This utility model uses a combination of U-shaped grooves and round holes to allow the nail stations to be arranged compactly, effectively increasing the effective working area of ​​the sample stage and thus improving space utilization. The U-shaped groove structure allows the nail stations to slide freely in the groove, realizing continuous adjustment of the sample spacing, meeting the spatial distribution requirements of samples of different shapes and sizes or special workstations. The continuous adjustment function reduces manual adjustment time, improves the efficiency of irregular sample workstation layout, and thus improves production efficiency.

[0019] 2. The single sample stage substrate of this utility model can be adapted to nailing stations of different specifications, avoiding the problem of substrate replacement due to differences in nailing station size, improving the versatility of the equipment, reducing the variety of substrate specifications, and eliminating the need for users to purchase special substrates for different nailing stations, thereby reducing equipment procurement costs. Attached Figure Description

[0020] Figure 1 This is a schematic diagram of existing technology;

[0021] Figure 2 This is a schematic diagram of the structure of Embodiment 1 of the present utility model;

[0022] Figure 3 This is a schematic diagram of the structure of Embodiment 2 of the present invention;

[0023] Figure 4 This is a schematic diagram of the structure of Embodiment 3 of this utility model;

[0024] Figure 5 This is a schematic diagram of the structure of Embodiment 4 of this utility model;

[0025] Figure 6 This is a structural schematic diagram of Embodiment 5 of the present utility model;

[0026] Figure 7 This is a schematic diagram of the structure of Embodiment Six of this utility model;

[0027] Figure 8 This is a structural schematic diagram of Embodiment Seven of the present invention;

[0028] Figure 9 This is a structural schematic diagram of Embodiment 8 of the present utility model.

[0029] In the figure: substrate a1, annular groove a2, circular hole a3, nail stage 4, substrate b5, annular groove b6, circular hole b7, annular groove c8, annular groove d9, annular groove e10, annular groove f11, annular groove g12, annular groove h13. Detailed Implementation

[0030] The technical solutions of the present utility model will be clearly and completely described below with reference to the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of the present utility model without creative effort are within the protection scope of the present utility model.

[0031] To facilitate understanding of this utility model, a more comprehensive description of it will be provided below with reference to relevant embodiments. Several embodiments of this utility model are given. However, this utility model can be implemented in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided so that the disclosure of this utility model will be more thorough and complete.

[0032] It should be noted that when a component is said to be "fixed to" another component, it can be directly on the other component or there may be an intervening component. When a component is said to be "connected to" another component, it can be directly connected to the other component or there may be an intervening component. The terms "vertical," "horizontal," "left," "right," and similar expressions used in this document are for illustrative purposes only.

[0033] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.

[0034] Please see Figures 2-8 This utility model provides a technical solution:

[0035] Example 1, please refer to Figures 2-8 A slotted multi-size nail stage adapter for a magnetron sputtering sample stage includes a substrate structure with a combined positioning structure. The combined positioning structure includes a positioning groove structure on the substrate structure, the groove width of which is W. A nail stage 4 is placed in the positioning groove structure. The groove width W = D + Δ, where D is the nominal diameter of the positioning post at the bottom of the adapter nail stage, and Δ is the gap compensation amount. The gap compensation amount ranges from 0.1 ≤ Δ ≤ 0.5. The substrate structure is made of aluminum alloy or stainless steel. The substrate structure includes a substrate a1. The positioning groove structure includes three sets of U-shaped annular grooves a on the substrate a1. The three sets of U-shaped annular grooves a are arranged in a circular array with the center point of the substrate a1 as the center point. Each U-shaped annular groove a includes several coaxially arranged annular grooves a2. The length of the annular grooves a2 increases sequentially from the inside to the outside, and the central angle of each annular groove a2 is 90°.

[0036] The substrate 1 is made of aluminum alloy (stainless steel and other materials are also optional; stainless steel is easy to clean), with a thickness of 2mm and a diameter of 64mm. The spacing between the positioning grooves ranges from 6.35 to 6.5mm.

[0037] The number of nail stations that can be accommodated in the same area has been increased to 18, compared to the traditional structure (see...). Figure 1 The shape and size of the sample and the nail station are easily affected. If the sample or nail station covers the adjacent round hole, the covered round hole position will be unusable and wasteful. This structure can flexibly adjust the position of the nail station to stagger samples and nail stations of different sizes and shapes to meet the needs of use.

[0038] Example 2, please refer to Figure 3 Several U-shaped annular groove groups a are also provided with several circular holes a3 as needed.

[0039] The difference from Embodiment 1 is that a separate circular hole a3 is provided between the U-shaped annular groove group a, which can be used for the separate placement of the nail platform 4. The number of circular holes a3 can be set as needed.

[0040] Example 3, please refer to Figure 4 The substrate structure includes a substrate b5, and the positioning groove structure includes four sets of U-shaped annular grooves b formed on the substrate a1. The four sets of U-shaped annular grooves b are arranged in a circular array with the center point of the substrate a1 as the center point. Each U-shaped annular groove b includes several annular grooves b6 arranged in a coaxial array. The length of the several annular grooves b6 increases sequentially from the inside to the outside, and the central angle of each annular groove b6 is 60°. Several circular holes b7 are also provided between adjacent U-shaped annular groove groups b as needed.

[0041] Example 4, please refer to Figure 5 The substrate structure includes a substrate a1, and the positioning groove structure includes a plurality of annular grooves c8 arranged sequentially from the inside to the outside, with an included angle of 60° between the ends of adjacent annular grooves c8.

[0042] Example 5, please refer to Figure 6 The substrate structure includes a substrate a1, and the positioning groove structure includes three sets of U-shaped annular groove groups c and three sets of U-shaped annular groove groups d. The three sets of U-shaped annular groove groups c and d are arranged in a circular array with the center point of the substrate a1 as the center point. Each U-shaped annular groove group c includes several annular grooves d9 arranged in a coaxial array, and each U-shaped annular groove group d includes several annular grooves g arranged in a coaxial array. The annular grooves g and annular grooves d9 are spaced apart, and the central angle between each annular groove d9 and annular groove g is 80°. Several circular holes c are opened between adjacent U-shaped annular groove groups c.

[0043] Example 6, please refer to Figure 7The substrate structure includes a substrate a1, and the positioning groove structure includes three sets of U-shaped annular grooves e. The three sets of U-shaped annular grooves e are arranged in a circular array with the center point of the substrate a1 as the center point. Each U-shaped annular groove e includes several annular grooves g12 arranged in a coaxial array. The central angle of each annular groove g12 is 100 degrees. Several circular holes d are opened between adjacent U-shaped annular grooves e.

[0044] Example 7, please refer to Figure 8 The substrate structure includes a substrate a1, and the positioning groove structure includes a set of U-shaped annular grooves f and a set of U-shaped annular grooves g. The U-shaped annular grooves f include several annular grooves f11 arranged in a coaxial array, and the U-shaped annular grooves g include several annular grooves e10 arranged in a coaxial array. The central angle of each annular groove f11 is 240 degrees, and the central angle of each annular groove e10 is 50 degrees. A circular hole e is provided between the ends of the annular groove e10 and the annular groove f11.

[0045] Example 8, please refer to Figure 9 The substrate structure includes a substrate a1, and the positioning groove structure includes a set of symmetrically arranged annular grooves h. The annular grooves h include several annular grooves h13 arranged in a coaxial array, and the central angle opposite to each annular groove h13 is 165°.

[0046] Detailed operating steps

[0047] 1. Nail platform installation:

[0048] The sample is fixed to the surface of the nail station using conductive adhesive or other methods;

[0049] Insert the positioning post at the bottom of the nail station into the U-shaped groove or round hole of the substrate.

[0050] 2. Spacing adjustment:

[0051] The nail stage can be slid along the direction of the U-shaped groove to achieve stepless adjustment of the spacing between adjacent samples.

[0052] 3. Fixed position:

[0053] The magnetron sputtering instrument used is a circular target, so a concentric array of positioning slots is used. The sputtering effect of the nail stations arranged on the same diameter is basically the same.

[0054] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A slotted multi-size nail stage adapted for a magnetron sputtering sample stage, comprising a substrate structure, characterized in that: The substrate structure is provided with a combined positioning structure, which includes a positioning groove structure formed on the substrate structure. The groove width of the positioning groove structure is W, and a nail platform (4) is placed inside the positioning groove structure.

2. The slotted multi-size nail stage adapted for magnetron sputtering sample stage according to claim 1, characterized in that: The groove width W = D + Δ, where D is the nominal diameter of the positioning post at the bottom of the mounting base, and Δ is the gap compensation amount.

3. The slotted multi-size nail stage adapted for magnetron sputtering sample stage according to claim 2, characterized in that: The range of the gap compensation value is 0.1≤Δ≤0.

5.

4. The slotted multi-size nail stage adapted for magnetron sputtering instrument sample stage according to any one of claims 1-3, characterized in that: The substrate structure is made of aluminum alloy or stainless steel.

5. The slotted multi-size nail stage adapted for magnetron sputtering sample stage according to claim 4, characterized in that: The substrate structure includes a substrate a (1), and the positioning groove structure includes three sets of U-shaped annular grooves a formed on the substrate a (1). The three sets of U-shaped annular grooves a are arranged in a circular array with the center point of the substrate a (1) as the circle. Each U-shaped annular groove a includes several annular grooves a (2) arranged in a coaxial array. The length of the several annular grooves a (2) increases sequentially from the inside to the outside, and the central angle opposite to each annular groove a (2) is 90°. Several circular holes a (3) are also provided between the U-shaped annular groove groups a as needed.

6. The slotted multi-size nail stage adapted for magnetron sputtering sample stage according to claim 4, characterized in that: The substrate structure includes a substrate b (5), and the positioning groove structure includes four sets of U-shaped annular grooves b formed on the substrate a (1). The four sets of U-shaped annular grooves b are arranged in a circular array with the center point of the substrate a (1) as the circle point. Each U-shaped annular groove b includes several annular grooves b (6) arranged in a coaxial array. The length of the several annular grooves b (6) increases sequentially from the inside to the outside, and the central angle opposite to each annular groove b (6) is 60°. Several circular holes b (7) are also provided between adjacent U-shaped annular groove groups b as needed.

7. The slotted multi-size nail stage adapted for magnetron sputtering sample stage according to claim 4, characterized in that: The substrate structure includes a substrate a (1), and the positioning groove structure includes a plurality of annular grooves c (8) arranged sequentially from the inside to the outside, with an included angle of 60° between the ends of adjacent annular grooves c (8).

8. The slotted multi-size nail stage adapted for magnetron sputtering sample stage according to claim 4, characterized in that: The substrate structure includes a substrate a (1), and the positioning groove structure includes three sets of U-shaped annular grooves c and three sets of U-shaped annular grooves d. The three sets of U-shaped annular grooves c and three sets of U-shaped annular grooves d are arranged in a circular array with the center point of the substrate a (1) as the circle. Each U-shaped annular groove c includes several annular grooves d (9) arranged in a coaxial array. Each U-shaped annular groove d includes several annular grooves g arranged in a coaxial array. The several annular grooves g and the several annular grooves d (9) are spaced apart, and the central angle opposite to each annular groove d (9) and annular groove g is 80°. Several circular holes c are provided between adjacent U-shaped annular groove groups c.

9. The slotted multi-size nail stage adapted for magnetron sputtering sample stage according to claim 4, characterized in that: The substrate structure includes a substrate a (1), and the positioning groove structure includes three sets of U-shaped annular grooves e. The three sets of U-shaped annular grooves e are arranged in a circular array with the center point of the substrate a (1) as the circle point. Each U-shaped annular groove e includes several annular grooves g (12) arranged in a coaxial array. The central angle opposite to each annular groove g (12) is 100 degrees. Several circular holes d are provided between adjacent U-shaped annular groove groups e.

10. The slotted multi-size nail stage adapted for magnetron sputtering sample stage according to claim 4, characterized in that: The substrate structure includes a substrate a (1), and the positioning groove structure includes a set of U-shaped annular grooves f and a set of U-shaped annular grooves g. The U-shaped annular grooves f include several annular grooves f (11) arranged in a coaxial array, and the U-shaped annular grooves g include several annular grooves e (10) arranged in a coaxial array. The central angle of each annular groove f (11) is 240 degrees, and the central angle of each annular groove e (10) is 50 degrees. A circular hole e is provided between the ends of the annular groove e (10) and the annular groove f (11).

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