Gas inlet device and wafer processing device

Abstract

The application discloses an air inlet device and a wafer processing device, and belongs to the technical field of semiconductor equipment. The air inlet device comprises a nozzle main body, an air inlet guide pipe, a flow guide piece and a driving piece. The air inlet guide pipe is connected with the air outlet end of the nozzle main body. The air inlet guide pipe has an air inlet channel and an air outlet port which are connected in communication. The air inlet channel is arranged along a transverse direction. The air outlet port is located on the side of the air inlet guide pipe which is away from the nozzle main body. The flow guide piece is arranged in the air inlet channel. The flow guide piece has a first end and a second end. The first end is arranged close to the air outlet end of the nozzle main body and is pivotally connected with one side of the air inlet guide pipe in the vertical direction. The second end is arranged close to the air outlet port. The flow guide piece and the air inlet guide pipe enclose a flow guide channel. The driving piece is used for driving the flow guide piece to move so as to adjust the flow cross section of the outlet of the flow guide channel. The initial flow rate of the process gas entering the reaction cavity is controlled, the gas concentration of each region above the susceptor tends to be consistent, and the uniformity and consistency of film formation are improved.

Description

Technical Field

[0001] This application relates to the field of semiconductor equipment technology, and in particular to an air intake device and a wafer processing device. Background Technology

[0002] The air intake device includes an air intake nozzle and an air intake duct, which are used to transfer process gas into the reaction chamber so that the process gas participates in the reaction uniformly on the base.

[0003] However, when the process gas enters the reaction chamber in the lateral direction, it will cause excessive consumption of process gas on the upstream side of the reaction chamber, and insufficient process gas can be obtained on the downstream side of the reaction chamber. This will result in uneven distribution of process gas participating in the reaction above the substrate, affecting the film formation quality. Utility Model Content

[0004] This application provides an air intake device to solve the technical problem of uneven distribution of process gases participating in the reaction above the base; this application also provides a wafer processing device.

[0005] Technical solution: This application provides an air intake device, including:

[0006] The nozzle body has an air outlet end;

[0007] An air intake duct is connected to the air outlet end of the nozzle body. The air intake duct has a connected air intake channel and an air outlet. The air intake channel extends in a transverse direction, and the air outlet is located on the side of the air intake duct away from the nozzle body.

[0008] A flow guide is disposed within the air intake channel. The flow guide has a first end and a second end. The first end is disposed near the air outlet of the nozzle body and is pivotally connected to one side of the air intake duct in the vertical direction. The second end is disposed near the air outlet. The flow guide and the air intake duct form a flow guide channel.

[0009] A driving component is used to drive the flow guide to move in order to adjust the flow cross section of the flow guide channel outlet.

[0010] In some embodiments, the driving member can drive the flow guide to move from a first position to a second position;

[0011] When the guide is located in the first position, the extension direction of the guide is parallel to the lateral direction;

[0012] When the guide member is in the second position, the flow cross-section of the guide channel outlet is smaller than the flow cross-section of the guide channel inlet.

[0013] In some embodiments, when the guide member is located in the second position, the flow cross-section of the guide channel gradually decreases in the direction from the first end to the second end.

[0014] In some embodiments, the air intake duct includes a first wall, a second wall, and a pair of sidewalls located between the first wall and the second wall. The first wall and the second wall are arranged at intervals along the vertical direction, and the first wall, the second wall, and the pair of sidewalls together form the air intake channel.

[0015] The first end is pivotally connected to the first wall, and the driving component extends through the first wall into the air intake duct and contacts the second end of the guide component to drive the guide component to move.

[0016] In some embodiments, the air intake device further includes a shield, which is disposed at the second end of the air guide or on the drive member;

[0017] When the guide is in the second position, a vacant area is formed between the guide and the first wall, the vacant area including an opening facing the air outlet, and the shielding member closes the opening at the second end.

[0018] In some embodiments, the guide member has an arc-shaped groove on the side facing the first wall, and the drive member has a protrusion that slides in conjunction with the arc-shaped groove.

[0019] In some embodiments, the flow guide includes a first flow guide portion and a second flow guide portion. The first flow guide portion is located on the side of the second flow guide portion closer to the nozzle body and is movably connected to the second flow guide portion. The first end is configured as the end of the first flow guide portion closer to the nozzle body, and the second end is configured as the end of the second flow guide portion.

[0020] The flow channel includes a first flow area formed by the first flow guide and the air intake duct, and a second flow area formed by the second flow guide and the air intake duct;

[0021] When the guide member is in the second position, the flow cross-section of the first guide region gradually decreases in the direction from the first end to the second end, and the extension direction of the second guide part is parallel to the lateral direction.

[0022] In some embodiments, the second guide portion is provided with a support portion connected to the first guide portion. When the driving member drives the second guide portion to rise and fall, the support portion can drive the first guide portion to rotate around the first end.

[0023] In some embodiments, the flow guide is a plate-shaped structure, the flow guide is made of quartz material, or the flow guide is a composite material, including a quartz plate facing into the flow guide channel and a stainless steel plate located outside the flow guide channel.

[0024] This application also discloses a wafer processing apparatus, comprising:

[0025] The housing has a connected reaction chamber and an air inlet, the air inlet being located on one side of the housing in the lateral direction, and a base is provided inside the housing, the base having a bearing surface facing the reaction chamber, the bearing surface being parallel to the lateral direction;

[0026] As described in the above embodiments, the air intake device is connected to the side of the housing that has the air inlet, and the air outlet communicates with the air inlet.

[0027] Beneficial Effects: The air intake device in this embodiment includes a nozzle body, an air intake duct, a flow guide, and a driving component. The nozzle body has an outlet end, and the air intake duct is connected to the outlet end of the nozzle body. The air intake duct has a connected air intake channel and an outlet. The air intake channel extends laterally, and the outlet is located on the side of the air intake duct away from the nozzle body. The flow guide is disposed within the air intake channel and has a first end and a second end. The first end is disposed near the outlet end of the nozzle body and is pivotally connected to one side of the air intake duct in the vertical direction. The second end is disposed near the outlet. The flow guide and the air intake duct form a flow guide channel. The driving component drives the flow guide to move, thereby adjusting the flow cross-section at the outlet of the flow guide channel. By changing the size of the flow cross-section, the initial flow rate of the process gas entering the reaction chamber is adjusted, and the concentration depletion curve of the process gas is adjusted, so that the base can be located in the linear change segment of the concentration depletion curve of the process gas. In the actual process, this can improve the uniformity and consistency of film formation.

[0028] The wafer processing apparatus of this application includes the air intake device as described in the above embodiments. Therefore, it can have all the technical features and effects of the above-described air intake device, which will not be repeated here. Attached Figure Description

[0029] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0030] Figure 1 This is a cross-sectional view of the air intake device according to an embodiment of this application, with the guide element in the first position.

[0031] Figure 2 This is a cross-sectional view of the air intake device according to an embodiment of this application, in which the guide element is located at the second position;

[0032] Figure 3 This is a cross-sectional view of an air intake device according to another embodiment of this application, in which the air guide is in the first position;

[0033] Figure 4 This is a cross-sectional view of an air intake device according to another embodiment of this application, in which the air guide is located in the second position;

[0034] Figure 5 This is a schematic diagram of the structure of the wafer processing apparatus according to an embodiment of this application.

[0035] Explanation of reference numerals in the attached figures:

[0036] 1. Air intake device; 10. Nozzle body; 101. Air outlet; 20. Air intake duct; 200. Air intake channel; 201. Air outlet; X, lateral direction; 30. Flow guide; 301. First end; 302. Second end; Y, vertical direction; 202. Flow guide channel; 203. Outlet; 204. Inlet; 40. Driving component; a. First position; b. Second position; 210. First wall; 220. Second wall; 50. Shielding component; 205. Occupied area; 206. Opening; 303. Arc groove; 41. Protrusion; 310. First flow guide; 320. Second flow guide; 207. First flow guide area; 208. Second flow guide area; 330. Supporting part; 2. Shell; 3. Reaction chamber; 4. Air inlet; 5. Base; 6. Supporting surface. Detailed Implementation

[0037] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of them. All other embodiments obtained by those skilled in the art based on the embodiments of this application without creative effort are within the protection scope of this application.

[0038] In the description of this application, it should be understood that the terms "upper," "lower," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or component referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application. In the description of this application, "multiple" means two or more, and "at least one" can refer to one, two, or more, unless otherwise explicitly specified. The terms "first," "second," and "third," etc., are only for the convenience of description and are used to name parts or embodiments by number, and do not imply any order of importance between the parts or embodiments.

[0039] It should also be noted that in the accompanying drawings of this application, the arrow marked X indicates the horizontal direction X, and the arrow marked Y indicates the vertical direction Y. The introduction of the horizontal direction X and the vertical direction Y in the description of this application is to more clearly define the structure and relative positional relationship of the components in the air intake device 1 and the wafer processing apparatus. In actual implementation, the horizontal direction X is perpendicular to the vertical direction Y to optimize the layout of the air intake device 1 and the wafer processing apparatus. In the description of this application, "vertical" means completely perpendicular to 90° or almost completely perpendicular; for example, an angle between 80° and 100° is considered vertical. "Parallel" means completely parallel or almost completely parallel; for example, a completely parallel angle within 10° is considered parallel.

[0040] As an introduction to this embodiment, the air intake device 1 includes an air intake nozzle and an air intake duct 20, used to transmit process gas into the reaction chamber 3 so that the process gas participates in the reaction uniformly on the base 5. However, the process gas enters the reaction chamber 3 in the lateral direction X. Due to the slow initial velocity of the process gas, too much process gas is consumed on the upstream side of the reaction chamber 3, and insufficient process gas is obtained on the downstream side of the reaction chamber 3, forming a concentration difference. This results in uneven distribution of the process gas participating in the reaction above the base 5, affecting the film formation quality.

[0041] In view of this, the present application provides an air intake device 1, which aims to solve at least one of the above-mentioned technical problems.

[0042] Please see Figure 1As shown, the air intake device 1 in this embodiment includes a nozzle body 10, an air intake duct 20, a flow guide 30, and a drive member 40; the nozzle body 10 has an air outlet end 101, the air intake duct 20 is connected to the air outlet end 101 of the nozzle body 10, the air intake duct 20 has a communicating air intake channel 200 and an air outlet 201, the air intake channel 200 extends in the lateral direction X, and the air outlet 201 is located on the side of the air intake duct 20 away from the nozzle body 10; the flow guide 30... The guide member 30, located within the inlet duct 20, has a first end 301 and a second end 302. The first end 301 is positioned near the outlet end 101 of the nozzle body 10 and is pivotally connected to one side of the inlet duct 20 in the vertical direction Y. The second end 302 is positioned near the outlet 201. The guide member 30 and the inlet duct 20 form a guide channel 202. The drive member 40 is used to drive the guide member 30 to move, thereby adjusting the flow cross-section of the outlet 203 of the guide channel 202. It should be understood that the outlet end 101 of the nozzle body 10 is used to transmit process gas into the inlet duct 20. The inlet channel 200 of the inlet duct 20 is arranged along the transverse direction X, and the outlet 201 is connected to the inlet 4 of the housing 2, for introducing process gas into the reaction chamber 3. The bearing surface 6 of the base 5 is parallel to the transverse direction X, so that the process gas entering the reaction chamber 3 flows along the transverse direction X through the bearing surface 6, achieving parallel inlet of the bearing surface 6.

[0043] It is also important to understand that by setting a guide member 30 within the air inlet channel 200, its first end 301 is pivotally connected to the side wall of the air inlet duct 20 in the vertical Y direction via a rotating shaft, and its second end 302 extends towards the side where the air outlet 201 is located, it guides the process gas within the air inlet channel 200 towards the air outlet 201. The guide member 30 and the inner wall of the air inlet duct 20 form a guide channel 202. The guide member 30 is controlled by the drive member 40 to rotate relative to the air inlet duct 20 by a certain angle, thereby changing the cross-sectional area of ​​the outlet 203 of the guide channel 202. This adjusts the initial flow rate of the process gas entering the reaction chamber 3, and consequently adjusts the concentration depletion curve of the process gas, ensuring that the base 5 is located in the linear variation segment of the concentration depletion curve. In the actual process, since the base 5 is continuously rotating, if the base 5 is located in the linear variation segment of the concentration depletion curve, the uniformity and consistency of the film formation can be improved.

[0044] Please see Figure 1 and Figure 2As shown, in some embodiments, the driving member 40 can drive the flow guide 30 from a first position a to a second position b. When the flow guide 30 is in the first position a, its extension direction is parallel to the lateral direction X. When the flow guide 30 is in the second position b, the flow cross-section of the outlet 203 of the flow guide channel 202 is smaller than the flow cross-section of the inlet 204 of the flow guide channel 202. It should be understood that when the flow guide 30 is in the first position a, its extension direction is parallel to the lateral direction X, that is, the flow guide surface of the flow guide 30 in contact with the process gas is parallel to the lateral direction X. At this time, the flow guide 30 is supported on the side of the inlet duct 20 and its pivotal connection, and the flow cross-sections of the inlet 204 and outlet 203 of the flow guide channel 202 are basically the same, allowing the process gas to flow smoothly along the lateral direction X. Driven by the driving component 40, the guide component 30 rotates around the pivot connection point. The guide surface of the guide component 30, which is in contact with the process gas, moves towards the other side of the inlet duct 20 in the vertical direction Y (the non-pivot connection side), causing the guide component 30 to tilt. The cross-section of the inlet 204 of the guide channel 202 remains unchanged, while the cross-section of the outlet 203 of the guide channel 202 decreases, forming a contracting channel with a wide inlet 204 and a narrow outlet 203. When the cross-section of the outlet 203 of the guide channel 202 decreases, the initial velocity of the process gas entering the reaction chamber 3 increases. The process gas gains greater kinetic energy and diffuses downstream of the reaction chamber 3, ensuring a sufficient concentration of process gas participating in the reaction downstream of the base 5, balancing the upstream and downstream process gas concentrations in the reaction chamber 3, and improving the uniformity and consistency of film formation. In addition, as the initial velocity of the process gas entering the reaction chamber 3 increases, the peak value of the concentration depletion curve of the process gas in the reaction chamber 3 will shift to the downstream side. By changing this initial velocity, the concentration depletion curve in the reaction chamber 3 can be effectively adjusted. That is, the concentration depletion curve in the reaction chamber 3 can be directly adjusted without changing the reactant flow rate, thereby adjusting the uniformity and consistency of film formation in the substrate 5 region.

[0045] Please see Figure 2As shown, in some embodiments, when the guide member 30 is located at the second position b, the flow cross-section of the guide channel 202 gradually decreases from the first end 301 to the second end 302. It should be understood that the guide member 30 can be an integrally formed plate structure. When the driving member 40 rotates the guide member 30 around the pivot point to the second position b, the flow cross-section of the guide channel 202 shows a continuous decreasing trend. That is, the cross-section of the guide channel 202 inlet 204 is the largest, gradually narrowing along the transverse direction X until the guide channel 202 outlet 203 reaches the smallest cross-section. Through the above arrangement, the flow velocity is ensured to increase uniformly during gas flow, weakening the influence of turbulence or eddies caused by sudden acceleration of the gas flow, allowing the process gas to flow into the reaction chamber 3 at a more stable high speed, reducing energy loss. The continuous pressure difference formed by the gradually changing cross-section can also promote more uniform diffusion of the process gas upstream and downstream of the base 5. The gas upstream of reaction chamber 3 maintains high kinetic energy due to the increasing flow rate, reducing excessive consumption caused by the decay of the initial velocity; while the downstream side obtains sufficient gas supply due to the continuous propulsion of the high-speed airflow, balancing the concentration difference between the upstream and downstream sides.

[0046] Please see Figure 1 and Figure 3 As shown, in some embodiments, the intake duct 20 includes a first wall 210, a second wall 220, and a pair of sidewalls (not shown) located between the first wall 210 and the second wall 220. The first wall 210 and the second wall 220 are arranged at intervals along the vertical direction Y, and the first wall 210, the second wall 220, and the pair of sidewalls together form an intake channel 200. The first end 301 is pivotally connected to the first wall 210, and the driving member 40 partially passes through the first wall 210 into the intake duct 20 and contacts the second end 302 of the guide member 30 to drive the guide member 30 to move. It should be understood that the intake duct 20 is a rectangular pipe. After passing through the first wall 210, the driving member 40 directly acts on the second end 302 of the guide member 30, which is a reliable and labor-saving driving method, reduces energy loss in the transmission link, and has a faster driving response speed. The guide member 30 uses the first wall 210 as a pivot point, and the driving member 40 acts on the distal second end 302, forming a stable rotation fulcrum. This structure prevents the guide member 30 from swaying under gas pressure, ensuring the stability of the cross-section of the guide channel 202 during adjustment. The drive member 40 is located on the side of the first wall 210 away from the second wall 220, and penetrates the first wall 210 to directly contact the second end 302 of the guide member 30. It does not occupy the internal space of the guide channel 202, reducing interference with gas flow. It should be noted that when the drive member 40 penetrates the first wall 210, process gas leakage can be prevented by sealing structures such as sealing rings and bellows.

[0047] Please see Figure 3 and Figure 4As shown, in some embodiments, the air intake device 1 further includes a shielding member 50, which is disposed at the second end 302 of the guide member 30. When the guide member 30 is in the second position b, an empty area 205 is formed between the guide member 30 and the first wall 210. The empty area 205 includes an opening 206 facing the air outlet 201, and the shielding member 50 closes the opening 206 at the second end 302. It should be understood that the shielding member 50 can move synchronously with the guide member 30. In some embodiments, the shielding member 50 is disposed on the drive member 40, and the shielding member 50 can move synchronously with the drive member 40. In some embodiments, the shielding member 50 may be a plate-shaped, sheet-shaped, or flexible seal, the size of which matches the opening 206 formed by the guide member 30 and the first wall 210 to ensure complete coverage of the opening 206. When the guide member 30 is in the second position b (tilted state), a gap is created between the guide member 30 and the first wall 210 (pivot connection side) due to the tilt, forming an empty area 205. This area has an opening 206 facing the gas outlet 201. The opening 206 is completely sealed by the shielding member 50 to reduce the risk of process gas leakage or turbulence near the opening 206, ensuring that the kinetic energy of all process gas is concentrated for acceleration through the guide channel 202, making the gas flow entering the reaction chamber 3 more penetrating, especially forming a more uniform gas coverage on the downstream base 5 surface, reducing the area of ​​insufficient reaction caused by kinetic energy dispersion.

[0048] It should be noted that if the shielding member 50 is installed on the driving member 40, it can simultaneously form a secondary seal on the part of the driving member 40 that passes through the first wall 210 during its movement.

[0049] It should be noted that in some embodiments, the flow guide 30 has a width direction (not shown) perpendicular to the lateral direction X. In the width direction, the width of the flow guide 30 is equal to or slightly less than the distance between a pair of sidewalls of the air inlet duct 20, so as to restrict the gas to enter the reaction chamber 3 only through or mostly through the flow guide channel 202.

[0050] Please see Figure 1 and Figure 2As shown, in some embodiments, the flow guide 30 has an arc-shaped groove 303 on the side facing the first wall 210, and the drive member 40 has a protrusion 41, which slides in conjunction with the arc-shaped groove 303. It should be noted that the protrusion 41 of the drive member 40 and the arc-shaped groove 303 on the flow guide 30 form a sliding pair. When the drive member 40 extends or retracts, the protrusion 41 slides within the arc-shaped groove 303, pushing the flow guide 30 to rotate around a pivot point. During this process, the protrusion 41 and the inner wall surface of the arc-shaped groove 303 remain in contact to ensure complete isolation between the flow guide channel 202 and the airspace, reducing the risk of gas leakage through the airspace. Simultaneously, the curvature of the arc-shaped groove 303 restricts the movement trajectory of the protrusion 41, ensuring that the flow guide 30 can only rotate around the pivot point, preventing translation or swaying of the flow guide 30 due to the linear movement of the drive member 40. The sliding fit between the protrusion 41 and the arc groove 303 uses rolling friction, which reduces frictional resistance, decreases wear rate, and extends the service life of the component.

[0051] Please see Figure 3 and Figure 4 As shown, in some embodiments, the flow guide 30 includes a first flow guide portion 310 and a second flow guide portion 320. The first flow guide portion 310 is located on the side of the second flow guide portion 320 near the nozzle body 10 and is movably connected to the second flow guide portion 320. The first end 301 is configured as the end of the first flow guide portion 310 near the nozzle body 10, and the second end 302 is configured as the end of the second flow guide portion 320. The flow guide channel 202 includes a first flow guide region 207 formed by the first flow guide portion 310 and the air intake duct 20, and a second flow guide region 208 formed by the second flow guide portion 320 and the air intake duct 20. When the flow guide 30 is located in the second position b, the flow cross section of the first flow guide region 207 gradually decreases from the first end 301 to the second end 302, and the extension direction of the second flow guide portion 320 is parallel to the lateral direction X. It is important to understand that the flow guide 30 is a split structure. The first flow guide 310 is pivotally connected to the first wall 210 of the intake duct 20, and the second flow guide 320 is movably connected to the first flow guide 310. That is, the first flow guide 310 and the second flow guide 320 can rotate or slide relative to each other, allowing them to independently adjust their angles during the overall movement of the flow guide 30, forming differentiated flow channel 202 cross-sections. The first flow guide 310, together with the second wall 220 and sidewalls of the intake duct 20, forms the first flow guide region 207, and the second flow guide 320, together with the second wall 220 and sidewalls of the intake duct 20, forms the second flow guide region 208. At the second position b, the flow cross-section of the first flow guide region 207 gradually decreases from the first end 301 to the second end 302, forming a tapered channel. The extension direction of the second flow guide 320 is parallel to the transverse (horizontal) direction, and its corresponding flow channel 202 cross-section remains uniform, forming a cylindrical channel.

[0052] It's important to understand that the tapered design allows the gas velocity to gradually increase within the first region (based on Bernoulli's principle), converting pressure energy into kinetic energy and providing initial acceleration for the downstream gas. The gradually changing cross-section in this region avoids turbulence caused by abrupt acceleration, resulting in a smoother airflow. The straight-tube channel maintains a stable gas velocity after acceleration, preventing kinetic energy loss due to secondary contraction. This segmented design of "acceleration followed by stabilization" allows the gas entering reaction chamber 3 to possess both high kinetic energy and a stable flow field, improving the penetration and uniformity of gas distribution downstream.

[0053] Please see Figure 3 and Figure 4 As shown, in some embodiments, the second guide section 320 is provided with a support section 330 connected to the first guide section 310. When the driving member 40 drives the second guide section 320 to rise and fall, the support section 330 can drive the first guide section 310 to rotate around the first end 301. It should be understood that the support section 330 has an inclined support surface 6, and the end of the first guide section 310 away from the first end 301 rests on the support surface 6. During the process of the driving member 40 driving the second guide section 320 to rise and fall, the end of the first guide section 310 away from the first end 301 slides in cooperation with the support surface 6. Through the cooperation between the first guide section 310 and the second guide section 320, mechanical linkage adjustment under a single drive is realized, which improves control efficiency, has fewer connecting parts, high response efficiency, and is convenient to maintain.

[0054] In some embodiments, the flow guide 30 is a plate-like structure, made of quartz, or a composite material comprising a quartz plate facing into the flow channel 202 and a stainless steel plate facing outwards from the flow channel 202. It should be understood that the quartz flow guide 30 combines high structural strength with good corrosion resistance, and is not easily deformed in high-temperature processing environments. The plate-like flow guide 30 is fabricated from a single piece of quartz sheet, with a polished surface to ensure a smooth inner surface of the flow channel, reducing gas turbulence and adsorption. The flow guide 30 employs a layered structure; the side facing into the flow channel 202 is made of high-purity quartz, utilizing its corrosion resistance and high-temperature resistance to protect gas flow, while the side facing outwards from the flow channel 202 is made of corrosion-resistant alloys such as 316L stainless steel, providing structural strength and mechanical support. It should also be noted that the quartz plate and the stainless steel plate are bonded with high-temperature resistant adhesives (such as ceramic adhesives) or mechanically clamped (such as a stainless steel frame wrapping the edge of the quartz plate) to ensure that the two do not fall off under temperature fluctuations.

[0055] Please see Figure 5As shown in the illustration, this application also discloses a wafer processing apparatus, including a housing 2 and an inlet device 1. The housing 2 has a connected reaction chamber 3 and an inlet 4. The inlet 4 is located on one side of the housing 2 in the transverse direction X. A base 5 is provided inside the housing 2, and the base 5 has a bearing surface 6 facing the reaction chamber 3. The bearing surface 6 is parallel to the transverse direction X. The inlet device 1 is connected to the side of the housing 2 with the inlet 4, and the outlet 201 is connected to the inlet 4. It should be understood that this application uses the guide element 30 of the inlet device 1 to adjust the flow rate of the gas, allowing it to enter the reaction chamber 3 at a controllable flow rate and parallel to the bearing surface 6, thereby achieving an adjustable gas concentration depletion curve in the transverse direction (upstream and downstream). The gradually changing cross-section design of the guide channel 202 of the inlet device 1 allows the process gas flow rate to increase smoothly, thereby adjusting the depletion trend of the process gas in the reaction chamber 3.

[0056] In the above embodiments, the descriptions of each embodiment have different focuses. For parts not described in detail in a certain embodiment, please refer to the relevant descriptions of other embodiments.

[0057] The above provides a detailed description of an air intake device and a wafer processing device provided in the embodiments of this application, and uses specific examples to illustrate the principles and implementation methods of this application. The description of the above embodiments is only for the purpose of helping to understand the technical solutions and core ideas of this application. Those skilled in the art should understand that they can still modify the technical solutions described in the foregoing embodiments, or make equivalent substitutions for some of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application.

Claims

1. An air intake device, characterized in that, include: The nozzle body (10) has an air outlet end (101); An air intake duct (20) is connected to the air outlet (101) of the nozzle body (10). The air intake duct (20) has a connected air intake channel (200) and an air outlet (201). The air intake channel (200) extends in the transverse direction (X). The air outlet (201) is located on the side of the air intake duct (20) away from the nozzle body (10). A flow guide (30) is disposed in the air intake channel (200). The flow guide (30) has a first end (301) and a second end (302). The first end (301) is disposed near the air outlet (101) of the nozzle body (10) and is pivotally connected to one side of the air intake duct (20) in the vertical direction (Y). The second end (302) is disposed near the air outlet (201). The flow guide (30) and the air intake duct (20) form a flow guide channel (202). A driving member (40) is used to drive the flow guide (30) to move in order to adjust the flow cross section of the outlet (203) of the flow guide channel (202).

2. The air intake device according to claim 1, characterized in that, The driving member (40) is capable of driving the guide member (30) to move from the first position (a) to the second position (b); When the guide (30) is in the first position (a), the extension direction of the guide (30) is parallel to the lateral direction (X); When the guide member (30) is in the second position (b), the flow cross section of the outlet (203) of the guide channel (202) is smaller than the flow cross section of the inlet (204) of the guide channel (202).

3. The air intake device according to claim 2, characterized in that, When the guide member (30) is in the second position (b), the flow cross section of the guide channel (202) gradually decreases in the direction from the first end (301) to the second end (302).

4. The air intake device according to claim 2, characterized in that, The air intake duct (20) includes a first wall (210), a second wall (220), and a pair of side walls located between the first wall (210) and the second wall (220). The first wall (210) and the second wall (220) are arranged at intervals along the vertical direction (Y). The first wall (210), the second wall (220), and the pair of side walls together form the air intake channel (200). The first end (301) is pivotally connected to the first wall (210), and the driving member (40) partially passes through the first wall (210) into the air intake duct (20) and contacts the second end (302) of the guide member (30) to drive the guide member (30) to move.

5. The air intake device according to claim 4, characterized in that, The air intake device (1) further includes a shield (50), which is disposed on the second end (302) of the air guide (30) or on the drive member (40); When the guide (30) is in the second position (b), an empty area (205) is formed between the guide (30) and the first wall (210), the empty area (205) including an opening (206) facing the air outlet (201), and the shield (50) closes the opening (206) at the second end (302).

6. The air intake device according to claim 4, characterized in that, The guide member (30) has an arc-shaped groove (303) on the side facing the first wall (210), and the drive member (40) has a protrusion (41) that slides in cooperation with the arc-shaped groove (303).

7. The air intake device according to claim 3, characterized in that, The flow guide (30) includes a first flow guide (310) and a second flow guide (320). The first flow guide (310) is located on the side of the second flow guide (320) close to the nozzle body (10) and is movably connected to the second flow guide (320). The first end (301) is configured as one end of the first flow guide (310) close to the nozzle body (10), and the second end (302) is configured as one end of the second flow guide (320). The flow channel (202) includes a first flow region (207) formed by the first flow section (310) and the air intake duct (20), and a second flow region (208) formed by the second flow section (320) and the air intake duct (20); When the guide member (30) is in the second position (b), the flow cross section of the first guide region (207) gradually decreases in the direction from the first end (301) to the second end (302), and the extension direction of the second guide part (320) is parallel to the lateral direction (X).

8. The air intake device according to claim 7, characterized in that, The second guide section (320) is provided with a support section (330) connected to the first guide section (310). When the driving member (40) drives the second guide section (320) to rise and fall, the support section (330) can drive the first guide section (310) to rotate around the first end (301).

9. The air intake device according to claim 1, characterized in that, The flow guide (30) is a plate-shaped structure. The flow guide (30) is made of quartz material, or the flow guide (30) is made of composite material, including a quartz plate facing into the flow guide channel (202) and a stainless steel plate located outside the flow guide channel (202).

10. A wafer processing apparatus, characterized in that, include: The housing (2) has a connected reaction chamber (3) and an air inlet (4), the air inlet (4) is located on one side of the housing (2) in the transverse direction (X), and a base (5) is provided inside the housing (2). The base (5) has a bearing surface (6) facing the reaction chamber (3), and the bearing surface (6) is parallel to the transverse direction (X). The air intake device (1) as described in any one of claims 1 to 9 is connected to the side of the housing (2) where the air inlet (4) is provided, and the air outlet (201) is in communication with the air inlet (4).

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