Filter for low temperature plasma apparatus
CN224404780UActive Publication Date: 2026-06-26HENAN ZHIREN ENERGY TECHNOLOGY CO LTD
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- HENAN ZHIREN ENERGY TECHNOLOGY CO LTD
- Filing Date
- 2025-07-23
- Publication Date
- 2026-06-26
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Figure CN224404780U_ABST
Abstract
The utility model relates to filter device technical field especially a filter for low temperature plasma equipment, including filter jar, wherein, the lateral wall bottom of filter jar is connected with air inlet pipe, the air inlet pipe is connected with dispersion subassembly in filter jar, make through dispersion subassembly evenly dispersed waste gas is transported to filter jar, the inside wall of filter jar is connected with water spraying subassembly, make through water spraying subassembly can with waste gas transported to filter jar in water and fully contact, realize fully remove the harmful substance of soluble in water in waste gas and melt into water in water, water spraying subassembly is connected with water pump, the bottom of filter jar is connected with drain pipe, the top of filter jar is connected with exhaust pipe, the utility model has realized to the waste gas of low temperature plasma equipment generation carries out filter processing, avoids the environmental pollution that waste gas directly discharged causes, has wide application prospect in filter device technical field.
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