A kind of air supplement device of single-stage octagonal magnetron sputtering machine

Abstract

The utility model provides a kind of air supplementing device of single-stage octagonal magnetron sputtering machine, including external air pipe, gas disperser and metal sealing joint, external air pipe gas inlet end is divided into fast filling branch and slow filling branch, the first diaphragm valve and the second diaphragm valve are respectively arranged in fast filling branch and slow filling branch, for independent control branch on-off, gas control knob is located in the input end of second diaphragm valve, for accurately setting left branch gas flow, external air pipe output end is sealed into cavity, gas disperser is arranged in external air pipe output end, dense small gas holes are arranged in the input end of gas disperser, for evenly diffusing gas and preventing cavity bottom particles from lifting and damaging wafer, the device can accurately supplement air to balance air pressure inside and outside cavity, facilitate safe opening valve, and air supplementing can effectively protect wafer.

Description

Technical Field

[0001] This utility model relates to the field of air conditioning control technology, and more specifically, to an air conditioning soft-start control system. Background Technology

[0002] After the magnetron sputtering machine has finished its operation, gas needs to be added to the vacuum chamber to achieve pressure balance between the inside and outside, so that the chamber valves can be opened safely.

[0003] However, existing technologies, such as patent CN217026061U, propose a process gas distribution system for magnetron sputtering: including a gas pipe fixing groove, an auxiliary gas supply square pipe, and a main gas supply square pipe; the main gas supply square pipe has a main gas supply round pipe inside, and the main gas supply round pipe has multiple gas outlet holes. Although it can compensate for the uneven pressure distribution in the vacuum chamber, it still cannot achieve precise control of the supplementary gas flow to achieve internal and external gas pressure balance and safe opening of the chamber.

[0004] Therefore, there is an urgent need for a gas replenishment device for a single-stage octagonal magnetron sputtering machine that can inflate the cavity and precisely control the gas flow rate, in order to achieve internal and external gas pressure balance and solve the problem of safe cavity opening of the equipment. Utility Model Content

[0005] The purpose of this invention is to provide a gas replenishment device for a single-stage octagonal magnetron sputtering machine, comprising an external gas pipe 1, a gas disperser 2, and a metal sealing connector 3. The inlet end of the external gas pipe 1 is divided into a fast-charging branch 11 and a slow-charging branch 12. The fast-charging branch 11 and the slow-charging branch 12 are respectively equipped with a first diaphragm valve 4 and a second diaphragm valve 5 for independently controlling the on / off state of the branch. A gas control knob 6 is located at the input end of the second diaphragm valve 5 for precisely setting the gas flow rate of the left branch. The output end of the external gas pipe 1 is sealed and connected to the cavity. The gas disperser 2 is located at the output end of the external gas pipe 1, and its input end is provided with dense and fine air holes for uniformly diffusing gas and preventing particles at the bottom of the cavity from rising and damaging the wafer. This device can accurately replenish gas to balance the internal and external gas pressure of the cavity, facilitate safe valve opening, and effectively protect the wafer while replenishing gas.

[0006] A gas replenishment device for a single-stage octagonal magnetron sputtering machine includes an external gas pipe 1, a gas disperser 2, and a metal-sealed connector 3. The external gas pipe 1 includes a fast-charging branch 11 and a slow-charging branch 12, which are connected in parallel. The fast-charging branch 11 is used for rapid, large-volume gas replenishment, while the slow-charging branch 12 is used for precise gas replenishment. The output end of the external gas pipe 1 is sealed and connected to a cavity to replenish gas into the cavity, achieving internal and external pressure balance and facilitating safe opening of the cavity valve. The gas disperser 2 is located at the output end of the external gas pipe 1 to diffuse the gas and prevent particles at the bottom of the cavity from rising and damaging the wafer. The fast-charging branch 11 is provided with a first metal-sealed connector 31, a first diaphragm valve 4, and a second metal-sealed connector 32 from top to bottom. Connector 31 and the second metal-sealed connector 32 are sealed to the first diaphragm valve 4 on the fast charging branch 11. The first diaphragm valve 4 is used to control the on / off state of the fast charging branch 11. The slow charging branch 12 is provided with a third metal-sealed connector 33, a second diaphragm valve 5, a fourth metal-sealed connector 34, a fifth metal-sealed connector 35 and a gas control knob 6 from top to bottom. The third metal-sealed connector 33 and the fourth metal-sealed connector 34 are sealed to the second diaphragm valve 5 on the slow charging branch 12. The fourth metal-sealed connector 34 and the fifth metal-sealed connector 35 are sealed to the gas control knob 6 on the slow charging branch 12. The second diaphragm valve 5 is used to control the on / off state of the slow charging branch 12. The gas control knob 6 is used to precisely control the gas supply flow rate.

[0007] Furthermore, the input end of the gas diffuser 2 is connected to the output end of the external gas pipe 1, and its input end is provided with densely distributed fine air holes for uniformly diffusing the input gas.

[0008] Furthermore, the first metal sealing joint 31, the second metal sealing joint 32, the third metal sealing joint 33, the fourth metal sealing joint 34, and the fifth metal sealing joint 35 all adopt VCR joints for easy installation.

[0009] Furthermore, the first metal sealing joint 31, the second metal sealing joint 32, the third metal sealing joint 33, the fourth metal sealing joint 34, and the fifth metal sealing joint 35 have the same structure. The first metal sealing joint 31 includes an external thread nut 311, an internal thread nut 312, and a metal washer 313. The metal washer 313 is disposed between the internal thread nut 312 and the external thread nut 311. A seal is achieved by tightening the internal thread nut 312 and the external thread nut 311 to compress the metal washer 313.

[0010] Furthermore, the input and output ends of the first diaphragm valve 4 and the second diaphragm valve 5 are both provided with the internally threaded nut 312.

[0011] Furthermore, both the first diaphragm valve 4 and the second diaphragm valve 5 are manually driven diaphragm valves, and each valve body is equipped with a detachable handle 7 for independently controlling the on / off state of the corresponding branch.

[0012] Furthermore, the detachable handle 7 is made of stainless steel, which is not easily deformed.

[0013] Furthermore, the output end of the gas control knob 6 is provided with an external thread, which is connected to the internal thread nut 312 provided at the input end of the second diaphragm valve 5, for precise control of gas flow.

[0014] The beneficial effects of this utility model are as follows: This utility model proposes a gas replenishment device for a single-stage octagonal magnetron sputtering machine, including an external gas pipe 1, a gas disperser 2, and a metal sealing joint 3. The fast charging branch 11 and the slow charging branch 12 are connected in parallel. The fast charging branch 11 is used for rapid and large-volume gas replenishment, and the slow charging branch is used for precise gas replenishment. The output end of the external gas pipe 1 is sealed and connected to the cavity for replenishing gas into the cavity. The gas disperser 2 is located at the output end of the external gas pipe 1 to diffuse the gas and prevent particles at the bottom of the cavity from rising and damaging the wafer. The first diaphragm valve 4 is used to control the on / off state of the fast charging branch 11, and the second diaphragm valve 5 is used to control the on / off state of the slow charging branch 12. The detachable handle 7 allows for convenient manual control of the first and second diaphragm valves at any time. The metal sealing joint can seal the connection of the gas pipe. The gas control knob 6 can precisely control the gas flow rate, further achieving internal and external gas pressure balance and safe cavity opening. Attached Figure Description

[0015] Figure 1 This is a front structural schematic diagram of the gas replenishment device for a single-stage octagonal magnetron sputtering machine according to the present invention.

[0016] Figure 2 This is a side sectional view of the gas supply device for a single-stage octagonal magnetron sputtering machine according to the present invention.

[0017] Figure 3 This is a partial structural schematic diagram of the gas replenishment device for a single-stage octagonal magnetron sputtering machine according to the present invention.

[0018] Figure 4 This is a partial structural schematic diagram of the gas replenishment device for a single-stage octagonal magnetron sputtering machine according to the present invention.

[0019] Figure 5 This is a partial structural schematic diagram of the gas replenishment device for a single-stage octagonal magnetron sputtering machine according to the present invention.

[0020] Explanation of main component symbols

[0021] 1. External air tube; 2. Gas disperser; 3. Metal sealing joint; 4. First diaphragm valve; 5. Second diaphragm valve; 6. Gas control knob; 11. Fast charging branch; 12. Slow charging branch; 31. First metal sealing joint; 32. Second metal sealing joint; 33. Third metal sealing joint; 34. Fourth metal sealing joint; 35. Fifth metal sealing joint; 312. Internal thread nut; 311. External thread nut; 313. Metal washer; 7. Detachable handle.

[0022] The following detailed description, in conjunction with the accompanying drawings, will further illustrate this utility model. Detailed Implementation

[0023] The following embodiments are described to aid in understanding this application. These embodiments are not, and should not be, construed in any way as limiting the scope of protection of this application.

[0024] In the following description, those skilled in the art will recognize that throughout this discussion, components may be described as individual functional units (which may include subunits), but those skilled in the art will recognize that various components or portions thereof may be divided into individual components or may be integrated together (including integrated within a single system or component).

[0025] Furthermore, the connection between components or systems is not intended to be limited to a direct connection; on the contrary, data between these components may be modified, reformatted, or otherwise altered by intermediate components. Additionally, other or fewer connections may be used. It should also be noted that the terms "connection," "link," or "input" should be understood to include direct connections, indirect connections via one or more intermediate devices, and wireless connections. Example 1:

[0026] like Figure 1 The image shown is a front structural schematic diagram of the gas replenishment device for a single-stage octagonal magnetron sputtering machine according to this utility model; as shown... Figure 2 The image shown is a side cross-sectional view of the gas supply device for a single-stage octagonal magnetron sputtering machine according to this utility model; as shown... Figure 3 The image shown is a partial structural schematic diagram of the gas supply device for a single-stage octagonal magnetron sputtering machine according to this utility model; as shown... Figure 4 The image shown is a partial structural schematic diagram of the gas supply device for a single-stage octagonal magnetron sputtering machine according to this utility model; as shown... Figure 5 The diagram shown is a partial structural schematic of the gas replenishment device for a single-stage octagonal magnetron sputtering machine according to this utility model.

[0027] A gas replenishment device for a single-stage octagonal magnetron sputtering machine includes an external gas pipe 1, a gas disperser 2, and a metal sealing connector 3. The external gas pipe 1 includes a fast-charging branch 11 and a slow-charging branch 12, which are connected in parallel. The fast-charging branch 11 is used for rapid and large-volume gas replenishment, while the slow-charging branch is used for precise gas replenishment. The output end of the external gas pipe 1 is sealed and connected to a cavity to replenish gas into the cavity, achieving internal and external gas pressure balance and facilitating safe opening of the cavity valve. The gas disperser 2 is located at the output end of the external gas pipe 1 to diffuse the gas and prevent particles at the bottom of the cavity from rising and damaging the wafer. The fast-charging branch 11 is provided with a first metal sealing connector 31, a first diaphragm valve 4, and a second metal sealing connector 32 from top to bottom. The head 31 and the second metal sealing joint 32 are sealed to the first diaphragm valve 4 on the fast charging branch 11. The first diaphragm valve 4 is used to control the on / off state of the fast charging branch 11. The slow charging branch 12 is provided with a third metal sealing joint 33, a second diaphragm valve 5, a fourth metal sealing joint 34, a fifth metal sealing joint 35 and a gas control knob 6 from top to bottom. The third metal sealing joint 33 and the fourth metal sealing joint 34 are sealed to the second diaphragm valve 5 on the slow charging branch 12. The fourth metal sealing joint 34 and the fifth metal sealing joint 35 are sealed to the gas control knob 6 on the slow charging branch 12. The second diaphragm valve 5 is used to control the on / off state of the slow charging branch 12. The gas control knob 6 is used to precisely control the gas supply flow rate.

[0028] The input end of the gas diffuser 2 is connected to the output end of the external gas pipe 1. Its input end is provided with densely distributed fine air holes, which are radially distributed with a hole spacing of ≤1mm, so that the gas diffusion angle is ≥120 degrees, which is used to uniformly diffuse the input gas.

[0029] The first metal sealing joint 31, the second metal sealing joint 32, the third metal sealing joint 33, the fourth metal sealing joint 34, and the fifth metal sealing joint 35 all use VCR connectors for easy installation. The first metal sealing joint 31, the second metal sealing joint 32, the third metal sealing joint 33, the fourth metal sealing joint 34, and the fifth metal sealing joint 35 have the same structure. The first metal sealing joint 31 includes an externally threaded nut 311, an internally threaded nut 312, and a metal washer 313. The metal washer 313 is disposed between the internally threaded nut 312 and the externally threaded nut 311. Sealing is achieved by tightening the internally threaded nut 312 and the externally threaded nut 311 to compress the metal washer 313.

[0030] Both the input and output ends of the first diaphragm valve 4 and the second diaphragm valve 5 are equipped with the internally threaded nut 312. Both the first diaphragm valve 4 and the second diaphragm valve 5 are manually operated diaphragm valves, and each has a detachable handle 7 for independently controlling the on / off state of its corresponding branch. The detachable handle 7 is made of stainless steel and is not easily deformed. The output end of the gas control knob 6 has an external thread, which connects to the internally threaded nut 312 at the input end of the second diaphragm valve 5 for precise control of gas flow.

[0031] The beneficial effects of this utility model are as follows: This utility model proposes a gas replenishment device for a single-stage octagonal magnetron sputtering machine, including an external gas pipe 1, a gas disperser 2, and a metal sealing joint 3. The fast charging branch 11 and the slow charging branch 12 are connected in parallel. The fast charging branch 11 is used for rapid and large-volume gas replenishment, and the slow charging branch is used for precise gas replenishment. The output end of the external gas pipe 1 is sealed and connected to the cavity for replenishing gas into the cavity. The gas disperser 2 is located at the output end of the external gas pipe 1 to diffuse the gas and prevent particles at the bottom of the cavity from rising and damaging the wafer. The first diaphragm valve 4 is used to control the on / off state of the fast charging branch 11, and the second diaphragm valve 5 is used to control the on / off state of the slow charging branch 12. The detachable handle 7 allows for convenient manual control of the first and second diaphragm valves at any time. The metal sealing joint can seal the connection of the gas pipe. The gas control knob 6 can precisely control the gas flow rate, further achieving internal and external gas pressure balance and safe cavity opening.

[0032] Although this application discloses several aspects and embodiments, other aspects and embodiments will be obvious to those skilled in the art. Various modifications and improvements can be made without departing from the concept of this application, and these all fall within the scope of protection of this application. The various aspects and embodiments disclosed in this application are for illustrative purposes only and are not intended to limit this application. The actual scope of protection of this application is determined by the claims.

Claims

1. A gas supply device for a single-stage octagonal magnetron sputtering machine, comprising an external gas pipe (1), a gas disperser (2), and a metal sealing joint (3), characterized in that: The external air tube (1) includes a fast-charging branch (11) and a slow-charging branch (12), which are connected in parallel. The fast-charging branch (11) is used for rapid and large-volume inflation, and the slow-charging branch (12) is used for precise inflation. The output end of the external air pipe (1) is sealed and connected to the cavity to replenish the cavity with air, thereby achieving pressure balance between the inside and outside and facilitating the safe opening of the cavity valve. The gas diffuser (2) is located at the output end of the external air pipe (1) to diffuse the gas and prevent particles at the bottom of the cavity from rising and damaging the wafer. The fast charging branch (11) is provided with a first metal sealing joint (31), a first diaphragm valve (4), and a second metal sealing joint (32) from top to bottom. The first metal sealing joint (31) and the second metal sealing joint (32) are sealed to the first diaphragm valve (4) on the fast charging branch (11). The first diaphragm valve (4) is used to control the opening and closing of the fast charging branch (11). The slow charging branch (12) is provided with a third metal sealing joint (33), a second diaphragm valve (5), a fourth metal sealing joint (34), a fifth metal sealing joint (35), and a gas control knob (6) from top to bottom. The third metal sealing joint (33) and the fourth metal sealing joint (34) are sealed to the second diaphragm valve (5) on the slow charging branch (12). The fourth metal sealing joint (34) and the fifth metal sealing joint (35) are sealed to the gas control knob (6) on the slow charging branch (12). The second diaphragm valve (5) is used to control the opening and closing of the slow charging branch (12). The gas control knob (6) is used to precisely control the gas supply flow rate.

2. The gas supplementing device of a single-stage octagonal magnetron sputtering system according to claim 1, wherein: The gas diffuser (2) has densely distributed fine pores at its input end for uniformly diffusing the input gas.

3. The gas supply device for a single-stage octagonal magnetron sputtering machine as described in claim 1, characterized in that: The first metal sealing joint (31), the second metal sealing joint (32), the third metal sealing joint (33), the fourth metal sealing joint (34) and the fifth metal sealing joint (35) all adopt VCR joints, which are easy to install.

4. The gas supply device for a single-stage octagonal magnetron sputtering machine as described in claim 3, characterized in that: The first metal sealing joint (31), the second metal sealing joint (32), the third metal sealing joint (33), the fourth metal sealing joint (34), and the fifth metal sealing joint (35) have the same structure. The first metal sealing joint (31) includes an external thread nut (311), an internal thread nut (312), and a metal washer (313). The metal washer (313) is disposed between the internal thread nut (312) and the external thread nut (311). The seal is achieved by tightening the internal thread nut (312) and the external thread nut (311) to compress the metal washer (313).

5. The gas supply device for a single-stage octagonal magnetron sputtering machine as described in claim 4, characterized in that: The first diaphragm valve (4) and the second diaphragm valve (5) are both provided with the internal thread nut (312) at their input and output ends.

6. The gas supply device for a single-stage octagonal magnetron sputtering machine as described in claim 5, characterized in that: The first diaphragm valve (4) and the second diaphragm valve (5) are both manually driven diaphragm valves, and each valve body is provided with a detachable handle (7) for independently controlling the opening and closing of the corresponding branch.

7. The gas supply device for a single-stage octagonal magnetron sputtering machine as described in claim 6, characterized in that: The detachable handle (7) is made of stainless steel and is not easily deformed.

8. The gas supply device for a single-stage octagonal magnetron sputtering machine as described in claim 4, characterized in that: The gas control knob (6) has an external thread at its output end, which is connected to the internal thread nut (312) at the input end of the second diaphragm valve (5) for precise control of gas flow.

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