diaphragm valve
By designing inclined baffles, chamfered surfaces, and residue-proof sections in the diaphragm valve, combined with a fluoropolymer lining, the problem of cleaning fluid residue is solved, ensuring the cleaning effect of semiconductor equipment.
CN224414415UActive Publication Date: 2026-06-26K2N CO LTD
View PDF 0 Cites 0 Cited by
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- K2N CO LTD
- Filing Date
- 2025-06-12
- Publication Date
- 2026-06-26
Smart Images
Figure CN224414415U_ABST
Abstract
The diaphragm valve can include a valve body formed from one side to the other side, a flow path through which a liquid can move, and a partition that traverses the flow path in a central region of the flow path, an upper surface of the valve body being open to expose the partition; and a diaphragm provided on the open upper surface of the valve body, changing shape in an up-and-down direction to adhere to or be spaced apart from the partition to open and close the flow path, an upper surface of the partition being inclined downward toward a central portion of the upper surface of the partition, and a chamfered surface being provided at each of a side corner and the other side corner of the central portion of the upper surface of the partition to prevent the liquid from remaining on the upper surface of the partition.
Need to check novelty before this filing date? Find Prior Art