Photoresist production process particle concentration on-line monitoring device and photoresist production system
An online monitoring device combining a light scattering sensor and a dynamic pressure sensor with a data processing module solves the problem of low efficiency in manual sampling and testing during photoresist production. It enables real-time online dynamic non-destructive monitoring of the photoresist production process, improving monitoring accuracy and efficiency and meeting the needs of high-speed production lines.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- FUJIAN HONGGUANG SEMICON MATERIALS CO LTD
- Filing Date
- 2025-03-28
- Publication Date
- 2026-07-03
AI Technical Summary
In the existing photoresist production process, manual sampling and testing is inefficient, prone to errors, and highly dependent on the environment, resulting in long testing times and a high scrap rate of finished products, making it difficult to meet the needs of high-speed production lines.
A light scattering sensor and a dynamic pressure sensor are used to monitor the concentration of photoresist particles and the flow pressure in real time. Combined with a data processing module and an adaptive feedback control module, online dynamic non-destructive monitoring is achieved. The filtration time and flow rate are adjusted by the actuator to achieve multi-parameter correlation analysis.
It enables real-time online monitoring of the photoresist production process, improving monitoring accuracy and efficiency, reducing finished product scrap, and meeting the needs of high-speed production lines.
Smart Images
Figure CN224456503U_ABST
Abstract
Description
Technical Field
[0001] This disclosure relates to the field of online particulate matter concentration monitoring technology, and in particular to an online particulate matter concentration monitoring device and a photoresist production system in the photoresist production process. Background Technology
[0002] In semiconductor manufacturing, the particle concentration of photoresist directly affects the precision and quality of the photolithography process. Traditionally, photoresist production involves manual sampling to test particle concentration, viscosity, and moisture content. Only after these parameters meet standards can the photoresist be filled. With other factors remaining constant, particle concentration and moisture content are affected by filtration time and sealing. Currently, the determination of the filtration time relies solely on operator experience, leading to situations where resampling and testing are necessary if the filtration time is too long or too short, resulting in wasted time. Furthermore, particle concentration and moisture content testing requires stringent environmental cleanliness standards, making it difficult to adapt to high-speed production lines.
[0003] In existing technologies, manual sampling and testing are inefficient, prone to human error, highly dependent on the environment, and can lead to the scrapping of 1% to 2% of finished products, thus resulting in destructive testing.
[0004] To address this, an online particle concentration monitoring device and a photoresist production system are provided for the photoresist production process. Utility Model Content
[0005] The purpose of this disclosure is to overcome the shortcomings of the prior art and provide an online monitoring device for particle concentration in the photoresist production process and a photoresist production system, so as to realize real-time online dynamic non-destructive monitoring, realize multi-parameter correlation analysis, and improve monitoring accuracy and efficiency.
[0006] To achieve the aforementioned objectives of this utility model, the present disclosure adopts the following technical solution:
[0007] An online monitoring device for particle concentration in a photoresist production process, the device comprising a chassis;
[0008] A light scattering sensor is installed at the inlet end of the chassis, a dynamic pressure sensor is installed at the outlet end of the chassis, a data processing module and an adaptive feedback control module are installed inside the chassis, and an actuator is installed on the chassis for adjusting the inlet and outlet ends of the chassis.
[0009] The data processing module is electrically connected to the light scattering sensor, the dynamic pressure sensor, and the adaptive feedback control module, respectively, and the adaptive feedback control module is electrically connected to the actuator.
[0010] In one exemplary embodiment of this disclosure, the inlet end of the chassis is connected to a feed pipe, and the outlet end of the chassis is connected to a discharge pipe;
[0011] The chassis is located on one side of the main pipeline, and the chassis is connected to the main pipeline through the feed pipe and the discharge pipe.
[0012] In one exemplary embodiment of this disclosure, the light scattering sensor is disposed on the feed pipe, and the dynamic pressure sensor is disposed on the discharge pipe.
[0013] In one exemplary embodiment of this disclosure, the actuator includes:
[0014] A first electric valve is provided on the feed pipe, and the first electric valve is located on the side of the light scattering sensor closer to the main pipe;
[0015] A second electric valve is installed on the discharge pipe, and the second electric valve is located on the side of the dynamic pressure sensor closer to the main pipe.
[0016] In one exemplary embodiment of this disclosure, the actuator further includes a circulating pump;
[0017] The circulating pump is installed on the main pipeline, and the circulating pump is located between the feed pipe and the discharge pipe.
[0018] In one exemplary embodiment of this disclosure, an ultrasonic sensor is provided on the main pipeline, and the ultrasonic sensor is electrically connected to the data processing module.
[0019] In one exemplary embodiment of this disclosure, the device further includes an environmental monitoring module, which includes a temperature sensor and a humidity sensor, and the data processing module is electrically connected to the temperature sensor and the humidity sensor respectively.
[0020] In one exemplary embodiment of this disclosure, an alarm module is provided on the chassis, and the alarm module is electrically connected to the data processing module.
[0021] In one exemplary embodiment of this disclosure, the light scattering sensor employs a multi-wavelength laser light source;
[0022] The dynamic pressure sensor is a piezoelectric sensor.
[0023] A photoresist production system includes an online particle concentration monitoring device for the photoresist production process as described in any of the above embodiments.
[0024] The beneficial effects of this disclosure are:
[0025] (1) This disclosure uses a light scattering sensor to detect the light scattering signal of particles in photoresist, a dynamic pressure sensor to monitor the flow pressure of photoresist, a data processing module to receive and process the light scattering signal and pressure data, and generates real-time monitoring results of particle concentration and particle size distribution. An adaptive feedback control module controls the operation of the actuator based on the real-time monitoring results, and adjusts the inlet and outlet of the device to control the filtration time and flow rate of the photoresist, thereby realizing real-time online dynamic non-destructive monitoring, realizing multi-parameter correlation analysis, improving monitoring accuracy and efficiency, and improving the quality of photoresist production.
[0026] (2) This disclosure realizes airtight detection and non-destructive detection, and enables adaptive compensation and correction of monitoring results to further improve monitoring accuracy. Attached Figure Description
[0027] The accompanying drawings, which are incorporated in and form part of this specification, illustrate embodiments consistent with this disclosure and, together with the description, serve to explain the principles of this disclosure. It is obvious that the drawings described below are merely some embodiments of this disclosure, and those skilled in the art can obtain other drawings based on these drawings without any inventive effort.
[0028] Figure 1 This is a schematic diagram of the structure of an online particle concentration monitoring device in the photoresist production process according to one embodiment of the present disclosure;
[0029] Figure 2 This is a schematic diagram of the structure of the environmental monitoring module in one embodiment of the present disclosure;
[0030] Figure 3 This is a front view of the chassis in one embodiment of the present disclosure.
[0031] Explanation of reference numerals in the attached figures:
[0032] 1. Chassis; 2. Light scattering sensor; 3. Dynamic pressure sensor; 4. Data processing module; 5. Adaptive feedback control module; 6. Actuator; 7. Feed pipe; 8. Discharge pipe; 9. Main pipe; 10. First electric valve; 11. Second electric valve; 12. Circulation pump; 13. Ultrasonic sensor; 14. Environmental monitoring module; 15. Temperature sensor; 16. Humidity sensor; 17. Alarm module; 18. Display screen; 19. Operation panel. Detailed Implementation
[0033] Exemplary embodiments will now be described more fully with reference to the accompanying drawings. However, these exemplary embodiments can be implemented in many forms and should not be construed as limited to the embodiments set forth herein; rather, they are provided so that this disclosure will be thorough and complete, and will fully convey the concept of the exemplary embodiments to those skilled in the art. The same reference numerals in the drawings denote the same or similar structures, and therefore detailed descriptions of them will be omitted. Furthermore, the drawings are merely illustrative of this disclosure and are not necessarily drawn to scale.
[0034] Although relative terms such as "up" and "down" are used in this specification to describe the relative relationship of one component of an icon to another, these terms are used only for convenience, such as according to the orientation of the examples shown in the accompanying drawings. It is understood that if the device of the icon is flipped upside down, the component described as "up" will become the component described as "down." When a structure is "up" of another structure, it may mean that the structure is integrally formed on the other structure, or that the structure is "directly" mounted on the other structure, or that the structure is "indirectly" mounted on the other structure through another structure.
[0035] The terms “a,” “one,” “the,” “the,” and “at least one” are used to indicate the presence of one or more elements / components / etc.; the terms “including” and “having” are used to indicate an open-ended inclusion and to mean that there may be other elements / components / etc. in addition to the listed elements / components / etc.; the terms “first,” “second,” and “third,” etc., are used only as markers and are not a limitation on the number of objects.
[0036] This disclosure provides an online particle concentration monitoring device for photoresist production process, see [link to relevant documentation]. Figure 1 The device includes a chassis 1; a light scattering sensor 2 is installed at the inlet end of the chassis 1, a dynamic pressure sensor 3 is installed at the outlet end of the chassis 1, a data processing module 4 and an adaptive feedback control module 5 are installed inside the chassis 1, and an actuator 6 is installed on the chassis 1. The actuator 6 is used to adjust the inlet and outlet ends of the chassis 1. The data processing module 4 is electrically connected to the light scattering sensor 2, the dynamic pressure sensor 3 and the adaptive feedback control module 5 respectively, and the adaptive feedback control module 5 is electrically connected to the actuator 6.
[0037] In this embodiment, the online particle concentration monitoring device for the photoresist production process comprises a chassis 1, a light scattering sensor 2, a dynamic pressure sensor 3, a data processing module 4, an adaptive feedback control module 5, and an actuator 6. The data processing module 4 is electrically connected to the light scattering sensor 2, the dynamic pressure sensor 3, and the adaptive feedback control module 5, respectively. The adaptive feedback control module 5 is electrically connected to the actuator 6. The light scattering sensor 2 detects the light scattering signal of particles in the photoresist entering the device, and the dynamic pressure sensor 3 monitors the flow pressure of the photoresist discharged from the device. The data processing module 4 receives and processes the light scattering signal and pressure data to generate real-time monitoring results of particle concentration and particle size distribution. The adaptive feedback control module 5 controls the operation of the actuator 6 based on the real-time monitoring results, adjusting the inlet and outlet ends of the chassis 1 to control the filtration time and flow rate of the photoresist.
[0038] Compared to existing manual sampling and testing, this online particle concentration monitoring device for the photoresist production process enables real-time online dynamic non-destructive monitoring, achieves multi-parameter correlation analysis, improves monitoring accuracy and efficiency, and enhances the quality of photoresist production.
[0039] In one embodiment of this disclosure, see Figure 1 The inlet end of the casing 1 is connected to the feed pipe 7, and the outlet end of the casing 1 is connected to the discharge pipe 8. The casing 1 is located on one side of the main pipeline 9, and the casing 1 is connected to the main pipeline 9 through the feed pipe 7 and the discharge pipe 8 respectively. In this way, the monitoring device can be connected to the main pipeline 9, which facilitates the introduction of colloid into the monitoring device for real-time monitoring, and realizes real-time non-destructive monitoring.
[0040] It is understandable that main pipe 9 is a photoresist delivery pipe.
[0041] In one embodiment of this disclosure, see Figure 1 The light scattering sensor 2 is installed on the feed pipe 7, and the dynamic pressure sensor 3 is installed on the discharge pipe 8. This allows for real-time monitoring of the colloid entering the monitoring device.
[0042] In one embodiment of this disclosure, see Figure 1 The actuator 6 includes: a first electric valve 10, located on the feed pipe 7, near the main pipe 9 on the side of the light scattering sensor 2; and a second electric valve 11, located on the discharge pipe 8, near the main pipe 9 on the side of the dynamic pressure sensor 3. This allows for the adjustment of the state at the inlet and outlet of the detection device, ensuring stable operation of the monitoring device.
[0043] In one embodiment of this disclosure, see Figure 1The actuator 6 also includes a circulation pump 12; the circulation pump 12 is installed on the main pipeline 9, located between the inlet pipe 7 and the outlet pipe 8. This allows it to cooperate with the first electric valve 10 and the second electric valve 11 to form a closed-loop control system, thereby controlling the filtration time and flow rate of the photoresist and improving monitoring accuracy.
[0044] In one embodiment of this disclosure, see Figure 1 An ultrasonic sensor 13 is installed on the main pipe 9, and the ultrasonic sensor 13 is electrically connected to the data processing module 4. This allows for real-time monitoring of the colloid's viscosity and moisture content, enabling multi-parameter correlation analysis of the colloid.
[0045] Alternatively, the ultrasonic sensor 13 can also be installed on the feed pipe 7 or the discharge pipe 8.
[0046] In one embodiment of this disclosure, see Figure 2 The device also includes an environmental monitoring module 14, which comprises a temperature sensor 15 and a humidity sensor 16. The data processing module 4 is electrically connected to the temperature sensor 15 and the humidity sensor 16, respectively. This allows for real-time monitoring of the temperature and humidity of the external environment, enabling compensation and correction of the monitoring results based on the external environmental conditions, thereby improving monitoring accuracy.
[0047] Optionally, the temperature sensor 15 and the humidity sensor 16 are mounted on the outer wall of the main pipe 9.
[0048] Optionally, the temperature sensor 15 and the humidity sensor 16 are mounted on the outer wall of the feed pipe 7 or the discharge pipe 8.
[0049] In one embodiment of this disclosure, see Figure 3 An alarm module 17 is installed on the chassis 1, and the alarm module 17 is electrically connected to the data processing module 4. In this way, when the concentration of photoresist particles is detected to exceed a preset threshold, an alarm is triggered, thereby stopping production.
[0050] Optionally, the alarm module 17 is an audible and visual alarm.
[0051] In one embodiment of this disclosure, see Figure 3 A display screen 18 and an operation panel 19 are installed on one outer wall of the chassis 1. The display screen 18 and the operation panel 19 are electrically connected to the data processing module 4. In this way, the monitoring status and monitoring results of the monitoring device can be displayed in real time, which is convenient for staff to view and operate. This enables the monitoring of photoresist.
[0052] In one embodiment of this disclosure, the light scattering sensor 2 employs a multi-wavelength laser light source. This allows for an increase in the detection range of the light scattering sensor 2.
[0053] Optionally, the detection range of the light scattering sensor 2 is from 0.1 μm to 500 μm.
[0054] Optionally, the dynamic pressure sensor 3 is a piezoelectric sensor. This improves the detection accuracy of the dynamic pressure sensor 3.
[0055] Optionally, the detection accuracy of the dynamic pressure sensor 3 is ±0.1 kPa.
[0056] The inventors tested the detection effects of the device and manual sampling, respectively. The test conditions are shown in Table 1, and the test results are shown in Table 2. Based on these test results, it is further clear that the device can achieve real-time online monitoring, improving monitoring accuracy and efficiency.
[0057] Test conditions Particle concentration Viscosity Standard solution (200 ppm) 201.3±3.2 12.5±0.2 Actual production batch 198.7±4.8 12.3±0.3
[0058] Table 1
[0059] Comparison items This device Manual sampling test Minimum detection particle size 0.1μm 0.5μm Maximum detection concentration 500ppm 200ppm Response time ≤5s 120s
[0060] Table 2
[0061] This disclosure provides a photoresist production system, including an online particle concentration monitoring device for the photoresist production process according to any of the above embodiments.
[0062] Other embodiments of this disclosure will readily occur to those skilled in the art upon consideration of the specification and practice of the utility models disclosed herein. This application is intended to cover any variations, uses, or adaptations of this disclosure that follow the general principles of this disclosure and include common knowledge or customary techniques in the art not disclosed herein. The specification and examples are to be considered exemplary only, and the true scope and spirit of this disclosure are indicated by the appended claims.
Claims
1. An apparatus for on-line monitoring of particle concentration in a photoresist production process, characterized by, The device includes a chassis (1); A light scattering sensor (2) is provided at the inlet end of the chassis (1), a dynamic pressure sensor (3) is provided at the outlet end of the chassis (1), a data processing module (4) and an adaptive feedback control module (5) are provided inside the chassis (1), and an actuator (6) is provided on the chassis (1). The actuator (6) is used to adjust the inlet end and the outlet end of the chassis (1). The data processing module (4) is electrically connected to the light scattering sensor (2), the dynamic pressure sensor (3) and the adaptive feedback control module (5), respectively, and the adaptive feedback control module (5) is electrically connected to the actuator (6).
2. The photoresist production process particle concentration on-line monitoring apparatus according to claim 1, wherein The inlet end of the machine box (1) is connected to the feed pipe (7), and the outlet end of the machine box (1) is connected to the discharge pipe (8). The casing (1) is located on one side of the main pipe (9), and the casing (1) is connected to the main pipe (9) through the feed pipe (7) and the discharge pipe (8).
3. The photoresist production process particle concentration on-line monitoring apparatus according to claim 2, wherein The light scattering sensor (2) is installed on the feed pipe (7), and the dynamic pressure sensor (3) is installed on the discharge pipe (8).
4. The photoresist production process particle concentration on-line monitoring apparatus according to claim 2, wherein The actuator (6) includes: A first electric valve (10) is provided on the feed pipe (7), and the first electric valve (10) is located on the side of the light scattering sensor (2) near the main pipe (9); The second electric valve (11) is located on the discharge pipe (8), and the second electric valve (11) is located on the side of the dynamic pressure sensor (3) near the main pipe (9).
5. The photoresist production process particle concentration on-line monitoring apparatus according to claim 4, wherein The actuator (6) also includes a circulating pump (12); The circulating pump (12) is installed on the main pipe (9) and is located between the feed pipe (7) and the discharge pipe (8).
6. The photoresist production process particle concentration on-line monitoring apparatus according to claim 2, wherein An ultrasonic sensor (13) is installed on the main pipe (9), and the ultrasonic sensor (13) is electrically connected to the data processing module (4).
7. The photoresist production process particle concentration on-line monitoring apparatus according to claim 2, wherein The device also includes an environmental monitoring module (14), which includes a temperature sensor (15) and a humidity sensor (16). The data processing module (4) is electrically connected to the temperature sensor (15) and the humidity sensor (16) respectively.
8. The online particle concentration monitoring device for photoresist production process according to claim 1, characterized in that, An alarm module (17) is provided on the chassis (1), and the alarm module (17) is electrically connected to the data processing module (4).
9. The photoresist production process particle concentration on-line monitoring apparatus according to claim 1, wherein The light scattering sensor (2) uses a multi-wavelength laser light source; The dynamic pressure sensor (3) is a piezoelectric sensor.
10. A photoresist production system characterized by comprising: Includes the online particle concentration monitoring device for the photoresist production process as described in any one of claims 1 to 9.