A cleaning device

Abstract

The cleaning device of this utility model includes a robotic arm assembly, a first motor assembly, a brush assembly, a second motor assembly, and an infusion tube. When cleaning the object to be cleaned, the first end of the robotic arm assembly is positioned above the object. The first motor assembly is communicatively connected to the robotic arm assembly to control the rotation and / or movement of the robotic arm assembly. The brush assembly is located at the first end of the robotic arm assembly and includes a housing, a brush, and a second motor assembly. The housing includes a top surface, an open end parallel to the top surface, and a sidewall extending axially from the edge of the top surface to the open end. The top surface, the open end, and the sidewall together form an open cleaning chamber. When cleaning the object, the open end is located on a fixed base where the object is located, and the object to be cleaned is located within the cleaning chamber. The brush is fixed to the top surface of the housing and located within the cleaning chamber. The second motor assembly is communicatively connected to the brush to control the rotation and / or movement of the brush. One end of the infusion tube communicates with the cleaning chamber, and the other end communicates with a cleaning tank containing cleaning fluid. An infusion pump is installed on the infusion tube. This device enables precise cleaning of the object to be cleaned.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor processing technology, and more specifically, to a cleaning device. Background Technology

[0002] In semiconductor chip manufacturing, the cleanliness of the wafer surface is crucial to chip performance and yield. Even the smallest particles, metal ions, or organic contaminants can lead to chip defects or even render the chip unusable. Therefore, wafer cleaning is one of the most critical steps in semiconductor manufacturing. Currently, wafer cleaning technologies mainly include wet cleaning, dry cleaning, and ultrasonic cleaning. Wet cleaning uses chemical solutions (such as hydrofluoric acid, sulfuric acid, and hydrogen peroxide) to immerse or spray the wafer surface to effectively remove particle, metal ion, and organic contaminants. Dry cleaning uses dry processes such as plasma and ozone to remove contaminants. Ultrasonic or megasonic cleaning utilizes high-frequency sound waves to generate cavitation effects in liquids, effectively removing tiny particle contaminants from the wafer surface. During wafer cleaning, etching, and deposition processes, specialized clamping mechanisms are typically used to hold the wafer in place to ensure its stability and precision during the process.

[0003] However, in actual semiconductor manufacturing processes, such as after long-term operation of wafer clamping mechanisms, significant technical problems arise. First, wafer edges typically have metal layers. During cleaning, these metal layers may generate metal particles or residues that gradually adhere to the surface of the wafer clamping mechanism, causing metal contamination. Second, because the wafer clamping mechanism itself lacks automatic cleaning capabilities, manual disassembly and cleaning are necessary when contamination accumulates to a certain level. Manual cleaning is not only time-consuming and labor-intensive, but also requires equipment recalibration and a complex rework process after cleaning, severely impacting equipment capacity and production efficiency. Furthermore, manual cleaning may introduce new contamination risks, further reducing product yield. Utility Model Content

[0004] In view of the problems existing in the prior art described above, this application provides a cleaning device that can achieve precise cleaning of the object to be cleaned.

[0005] To achieve the above and other related objectives, this utility model provides a cleaning device, comprising:

[0006] The robotic arm assembly is positioned with its first end above the object being cleaned during the cleaning process.

[0007] The first motor assembly is communicatively connected to the robotic arm assembly to control the rotation and / or movement of the robotic arm assembly;

[0008] A brush assembly, disposed at the first end of the robotic arm assembly, includes a housing, a brush, and a second motor assembly. The housing includes a top surface, an open end parallel to the top surface, and a sidewall extending axially from the edge of the top surface to the open end. The top surface, the open end, and the sidewall together form an open cleaning chamber. When cleaning the object to be cleaned, the open end is located on the fixed base where the object to be cleaned is located, and the object to be cleaned is located inside the cleaning chamber. The brush is fixed to the top surface of the housing and located inside the cleaning chamber. The second motor assembly is communicatively connected to the brush to control the rotation and / or movement of the brush.

[0009] The infusion tube is connected at one end to the cleaning chamber and at the other end to the cleaning tank containing the cleaning solution. An infusion pump is installed on the infusion tube.

[0010] Optionally, the cleaning device also includes:

[0011] A ring-shaped oscillator is arranged around the outer side wall of the casing;

[0012] An ultrasonic generator is electrically connected to a ring vibrator.

[0013] Optionally, the brush assembly also includes a sealing ring surrounding the edge of the opening end of the housing.

[0014] Optionally, the cover is a cylindrical structure with one end open.

[0015] Optionally, the cleaning device may also include a level gauge, at least partially located within the cleaning chamber.

[0016] Optionally, the brush assembly also includes a housing surrounding the outer side of the sidewall of the housing.

[0017] Optionally, the brush assembly further includes: a second motor assembly protective cover disposed on the top surface of the cover, wherein the second motor assembly is located inside the second motor assembly protective cover.

[0018] Optionally, the cleaning device further includes a control unit, which is communicatively connected to the first motor assembly and the second motor assembly.

[0019] Optionally, the top surface of the cover is provided with a plurality of evenly distributed through holes.

[0020] Optionally, the brush is detachably connected to the top surface of the housing.

[0021] As described above, the cleaning device provided by this utility model has at least the following beneficial technical effects:

[0022] The cleaning device of this utility model includes a robotic arm assembly, a first motor assembly, a brush assembly, a second motor assembly, and an infusion tube. When cleaning the object to be cleaned, the first end of the robotic arm assembly is positioned above the object. The first motor assembly is communicatively connected to the robotic arm assembly to control the rotation and / or movement of the robotic arm assembly. The brush assembly is located at the first end of the robotic arm assembly and includes a housing, a brush, and a second motor assembly. The housing includes a top surface, an open end parallel to the top surface, and a sidewall extending axially from the edge of the top surface to the open end. The top surface, the open end, and the sidewall together form an open cleaning chamber. When cleaning the object, the open end is located on a fixed base where the object is located, and the object to be cleaned is located within the cleaning chamber. The brush is fixed to the top surface of the housing and located within the cleaning chamber. The second motor assembly is communicatively connected to the brush to control the rotation and / or movement of the brush. One end of the infusion tube communicates with the cleaning chamber, and the other end communicates with a cleaning tank containing cleaning fluid. An infusion pump is installed on the infusion tube.

[0023] This invention's cleaning device, through the coordinated operation of a robotic arm assembly, a first motor assembly, a brush assembly, a second motor assembly, and an infusion tube, achieves precise cleaning of the object to be cleaned, significantly improving cleaning efficiency and stability. Driven by the first motor assembly, the robotic arm assembly can precisely adjust the position of the brush assembly, ensuring cleaning accuracy. The brush assembly's housing forms a cleaning chamber, which, together with the cleaning fluid delivered by the infusion tube, allows the object to be cleaned to be thoroughly cleaned within a closed space, effectively removing contaminants and improving cleaning quality. The second motor assembly drives the brush to rotate or move, further enhancing the cleaning effect. Attached Figure Description

[0024] Figure 1 The diagram shown is a schematic representation of the overall structure of the cleaning device provided in an embodiment of this utility model.

[0025] Figure 2 The diagram shown is a structural schematic of the brush assembly provided in an embodiment of this utility model.

[0026] Figure 3 Displayed as Figure 2 A cross-sectional view from the perspective of AA.

[0027] Figure Labels

[0028] 1. Fixed base; 11. Wafer clamping mechanism; 2. Cleaning device; 21. Robotic arm assembly; 211. First end; 22. First motor assembly; 23. Brush assembly; 231. Cover; 2311. Top surface; 23111. Through hole; 2312. Open end; 2313. Side wall; 2314. Cleaning chamber; 232. Brush; 233. Ring vibrator; 234. Outer shell; 235. Sealing ring; 236. Second motor assembly; 237. Second motor assembly protective cover; 24. Ultrasonic generator; 25. Infusion tube; 251. Infusion pump; 26. Level gauge; 3. Cleaning tank. Detailed Implementation

[0029] The following specific examples illustrate the implementation of this utility model. Those skilled in the art can easily understand other advantages and effects of this utility model from the content disclosed in this specification. This utility model can also be implemented or applied through other different specific embodiments, and various details in this specification can also be modified or changed based on different viewpoints and applications without departing from the spirit of this utility model.

[0030] It should be noted that the illustrations provided in this embodiment are only schematic representations of the basic concept of this utility model. Although the illustrations only show components related to this utility model and are not drawn according to the actual number, shape and size of the components, the shape, quantity, positional relationship and proportion of each component can be arbitrarily changed under the premise of realizing the technical solution of this utility model, and the layout of the components may also be more complex.

[0031] This embodiment provides a cleaning device 2, as shown in the following figure. Figures 1 to 3 It includes a robotic arm assembly 21, a first motor assembly 22, a brush assembly 23, a second motor assembly 236, and an infusion tube 25.

[0032] Specifically, refer to Figure 1 The robotic arm assembly 21 has a first end 211, which is positioned above the object to be cleaned during cleaning. A first motor assembly 22 is communicatively connected to the robotic arm assembly 21 and controls its rotational or linear movement to precisely adjust the position of the brush assembly 23, ensuring the accuracy and stability of the cleaning process. The robotic arm assembly 21 is designed to move and rotate flexibly to adapt to objects at different positions and angles. The first motor assembly 22 can be a servo motor or a stepper motor, driving the robotic arm assembly 21 to achieve high-precision movement through precise control signals. Furthermore, the robotic arm assembly 21 may include multiple joints and links to achieve multi-degree-of-freedom movement. The first motor assembly 22 may include multiple motors, each controlling different joints of the robotic arm assembly 21 to achieve complex motion trajectories.

[0033] Reference Figures 1 to 3 The brush assembly 23 is disposed at the first end 211 of the robotic arm assembly 21, and includes a housing 231, a brush 232, and a second motor assembly 236. The housing 231 includes a top surface 2311, an open end 2312 parallel to the top surface, and a side wall 2313 extending axially from the edge of the top surface 2311 to the open end 2312. The top surface 2311, the open end 2312, and the side wall 2313 together form a cleaning chamber 2314 open at one end. When cleaning the object to be cleaned, the open end 2312 is located on the fixed base 1 where the object to be cleaned is located, and the object to be cleaned is located inside the cleaning chamber 2314. Preferably, in order to improve the sealing performance of the cleaning chamber 2314 and prevent the cleaning fluid from leaking, a sealing ring 235 is provided around the edge of the open end 2312 of the housing 231. The sealing ring 235 is made of perfluoroether rubber material, which has excellent corrosion resistance and sealing performance. In an optional embodiment of this example, the housing 231 is a cylindrical structure with one open end, facilitating manufacturing and installation. The brush 232 is fixed to the top surface 2311 of the housing 231 and located within the cleaning chamber 2314. Optionally, the brush 232 is made of perfluoroalkoxy resin (PFA) or polytetrafluoroethylene (PTFE), possessing excellent corrosion resistance and abrasion resistance, effectively removing contaminants from the surface of the object to be cleaned. The bristles of the brush 232 can be set with different hardness and density to adapt to different cleaning needs. For example, for more stubborn contaminants, harder bristles can be used; for more sensitive surfaces, softer bristles can be used to avoid scratching the surface. In this embodiment, the object to be cleaned is the wafer clamping mechanism 11.

[0034] Reference Figures 1 to 3The brush assembly 23 also includes a housing 234, which surrounds the outer side wall 2313 of the cover 231 to protect the cover 231 and its internal components, preventing external environmental interference with the cleaning process. Optionally, the housing 234 can be made of corrosion-resistant materials such as stainless steel or aluminum alloy to improve its service life. The brush assembly 23 also includes a second motor assembly protective cover 237, which is disposed on the top surface 2311 of the cover 231. The second motor assembly 236 is located inside the second motor assembly protective cover 237 to prevent cleaning fluid or other contaminants from entering the second motor assembly 236, thus extending its service life. The second motor assembly 236 is communicatively connected to the brush 232 and is used to control the brush 232 to perform rotational or linear movement to achieve comprehensive cleaning of the object to be cleaned. The second motor assembly 236 can be a servo motor or a stepper motor, which drives the brush 232 to achieve high-precision movement through precise control signals. The rotation speed of brush 232 can be adjusted according to the degree of contamination of the object to be cleaned. For example, for heavily contaminated areas, the rotation speed of brush 232 can be increased to enhance the cleaning effect. For lightly contaminated areas, the rotation speed of brush 232 can be reduced to avoid unnecessary wear. Furthermore, brush 232 can be configured as a detachable structure for easy periodic replacement or cleaning, ensuring the stability of the cleaning effect. The connection between brush 232 and the top surface 2311 of housing 231 can be achieved through threaded connection, snap-fit ​​connection, or other detachable connection methods for easy maintenance and replacement. Optionally, the connection between brush 232 and the top surface 2311 of housing 231 can be made of polyetheretherketone (PEEK). PEEK is a high-performance engineering plastic with excellent mechanical strength, high-temperature resistance, chemical corrosion resistance, and dimensional stability, enabling it to operate stably for extended periods in the corrosive chemical environments commonly encountered in semiconductor manufacturing processes. Meanwhile, PEEK material also possesses excellent electrical insulation and creep resistance, effectively preventing loosening or deformation of connections due to long-term stress or vibration, thus ensuring a more robust and reliable connection between the brush 232 and the housing 231. Furthermore, the low moisture absorption of PEEK material allows it to maintain good dimensional accuracy and mechanical properties even in high humidity environments, further improving the overall stability and service life of the brush assembly 23.

[0035] Reference Figures 1 to 3One end of the infusion tube 25 is connected to the cleaning chamber 2314, and the other end is connected to the cleaning tank 3 containing the cleaning solution, thus forming a complete cleaning solution delivery channel for delivering cleaning solution into the cleaning chamber 2314. During the cleaning process, the cleaning solution in the cleaning tank 3 is stably delivered to the cleaning chamber 2314 through the infusion tube 25 under the drive of the infusion pump 251, so as to achieve a thorough rinsing and cleaning of the object to be cleaned. Specifically, the top surface 2311 of the cover 231 is provided with multiple through holes 23111. The cleaning solution in the infusion tube 25 flows into the cleaning chamber 2314 through the through holes 23111 to achieve rinsing of the object to be cleaned. The cleaning solution in the infusion tube 25 is first delivered to the top surface 2311 of the cover 231, and then flows into the cleaning chamber 2314 in a uniformly dispersed manner through the multiple through holes 23111 evenly distributed on the top surface 2311. This multi-point uniform liquid inlet design effectively avoids localized impacts or splashes of the cleaning fluid within the cleaning chamber 2314, ensuring that the cleaning fluid can smoothly and evenly cover the entire surface of the object to be cleaned, thereby improving the uniformity and thoroughness of the cleaning effect. Furthermore, the number, diameter, and distribution of the through holes 23111 can be optimized according to actual cleaning needs. For example, for objects with a high degree of contamination, the number or diameter of the through holes 23111 can be appropriately increased to improve the flow rate and rinsing force of the cleaning fluid; while for objects with a low degree of contamination or a more sensitive surface, the number or diameter of the through holes 23111 can be appropriately reduced to decrease the flow rate of the cleaning fluid and avoid unnecessary impact or damage to the object. Furthermore, a sealing structure (such as a sealing ring or sealant) can be provided at the connection between the infusion tube 25 and the top surface 2311 of the casing 231 to prevent leakage of the cleaning fluid during delivery, ensuring that the cleaning fluid can completely and effectively enter the cleaning chamber 2314. Meanwhile, the infusion tube 25 itself can also be made of corrosion-resistant materials (such as polytetrafluoroethylene, perfluoroether rubber, etc.) to adapt to the corrosive cleaning solutions such as strong acids and strong alkalis commonly encountered in semiconductor manufacturing processes, extending the service life of the infusion tube 25 and ensuring the long-term stable operation of the cleaning device. In one optional embodiment of this example, there is one cleaning tank 3, and the infusion tube 25 has multiple communication ports with the cleaning tank 3, which can accelerate the transmission efficiency of the cleaning solution. In another optional embodiment of this example, there are multiple cleaning tanks 3, and the infusion tube 25 has at least one communication port with each cleaning tank 3. Each cleaning tank can hold different cleaning solutions, including but not limited to DHF, HNO3, and SCl. Each cleaning tank 3 is connected to the main branch of the infusion tube 25 through an independent branch pipe, and different cleaning solutions are injected sequentially or mixed into the cleaning chamber 2314.

[0036] Reference Figures 1 to 3The cleaning device 2 also includes a ring vibrator 233 and an ultrasonic generator 24. The ring vibrator 233 is arranged around the outside of the side wall 2313 of the housing 231, closely fitting against the housing 231 or maintaining a certain gap to ensure that ultrasonic energy can be effectively transmitted to the cleaning fluid in the cleaning chamber 2314. The ultrasonic generator 24 is electrically connected to the ring vibrator 233 and is used to generate a high-frequency electrical signal to drive the ring vibrator 233 to generate high-frequency mechanical vibration. This high-frequency vibration is transmitted through the side wall 2313 of the housing 231 to the cleaning fluid in the cleaning chamber 2314, causing a large number of microbubbles to be generated in the cleaning fluid. These bubbles form rapidly and burst instantly under the action of sound waves, generating a strong cavitation effect. The cavitation effect can generate local high temperature and high pressure and microjets, effectively stripping and removing microparticles, metal residues, organic matter and other stubborn contaminants from the surface of the object to be cleaned, significantly improving the cleaning effect.

[0037] Reference Figures 1 to 3 The cleaning device 2 also includes a level gauge 26, which is at least partially located within the cleaning chamber 2314. The level gauge 26 is used to monitor the level of the cleaning fluid in the cleaning chamber 2314 in real time, preventing overflow or insufficient cleaning fluid and ensuring the stability and safety of the cleaning process. Specifically, the level gauge 26 can be of various types, such as a float-type level gauge, ultrasonic level gauge, capacitive level gauge, or photoelectric level gauge, selected according to the actual application scenario and the characteristics of the cleaning fluid. For example, when the cleaning fluid is highly corrosive, the probe or float portion of the level gauge 26 can be made of corrosion-resistant materials (such as polytetrafluoroethylene, perfluoroether rubber, or stainless steel) to ensure the long-term stable operation of the level gauge 26.

[0038] Reference Figures 1 to 3The cleaning device also includes a control unit (not shown in the attached drawings). The control unit is communicatively connected to the first motor assembly 22 and the second motor assembly 236, and is used to control the movement of the robotic arm assembly 21 and the brush 232 to achieve automation and intelligence in the cleaning process. Specifically, the control unit can precisely control the movement trajectory, speed, and position of the robotic arm assembly 21 driven by the first motor assembly 22 according to a preset cleaning program, ensuring that the brush assembly 23 can accurately reach the designated cleaning position of the object to be cleaned. At the same time, the control unit can also control the rotation speed, rotation direction, and up-and-down movement of the brush 232 driven by the second motor assembly 236 to adapt to different levels of contamination and cleaning requirements, further improving the cleaning effect and efficiency. In addition, the control unit is also communicatively connected to the level gauge 26 and the ultrasonic generator 24 to achieve real-time monitoring and adjustment of the cleaning fluid level and ultrasonic vibration. The control unit can receive the level data fed back by the level gauge 26 in real time and automatically adjust the supply of cleaning fluid to ensure that the liquid level in the cleaning chamber 2314 is always kept within a suitable range, avoiding adverse effects on the cleaning effect and equipment safety caused by excessively high or low liquid levels. Meanwhile, the control unit can also adjust the output power and frequency of the ultrasonic generator 24 in real time according to the cleaning requirements, and control the vibration intensity and mode of the ring vibrator 233 to achieve the best ultrasonic cleaning effect.

[0039] The above embodiments are merely illustrative of the principles and effects of this utility model and are not intended to limit the scope of this utility model. Any person skilled in the art can modify or alter the above embodiments without departing from the spirit and scope of this utility model. Therefore, all equivalent modifications or alterations made by those skilled in the art without departing from the spirit and technical concept disclosed in this utility model should still be covered by the claims of this utility model.

Claims

1. A cleaning device, characterized in that, include: The robotic arm assembly is positioned with its first end above the object being cleaned when cleaning it. A first motor assembly is communicatively connected to the robotic arm assembly to control the rotation and / or movement of the robotic arm assembly; A brush assembly, disposed at the first end of the robotic arm assembly, includes a housing, a brush, and a second motor assembly. The housing includes a top surface, an open end parallel to the top surface, and a sidewall extending axially from the edge of the top surface to the open end. The top surface, the open end, and the sidewall together form an open cleaning chamber. When cleaning an object, the open end is located on a fixed base where the object is located, and the object is located within the cleaning chamber. The brush is fixed to the top surface of the housing and located within the cleaning chamber. The second motor assembly is communicatively connected to the brush to control the rotation and / or movement of the brush. An infusion tube is connected at one end to the cleaning chamber and at the other end to a cleaning tank containing the cleaning solution. An infusion pump is installed on the infusion tube.

2. The cleaning apparatus of claim 1, wherein Also includes: A ring-shaped oscillator is arranged around the outside of the side wall of the housing; An ultrasonic generator is electrically connected to the ring vibrator.

3. The cleaning apparatus of claim 1, wherein The brush assembly further includes a sealing ring surrounding the edge of the opening end of the housing.

4. The cleaning apparatus of claim 1, wherein The cover is a cylindrical structure with one end open.

5. The cleaning apparatus of claim 1, wherein Also includes: A level gauge is located at least partially within the cleaning chamber.

6. The cleaning apparatus of claim 1, wherein The brush assembly further includes a housing surrounding the outer side of the sidewall of the housing.

7. The cleaning apparatus of claim 1, wherein The brush assembly further includes: a second motor assembly protective cover disposed on the top surface of the cover, wherein the second motor assembly is located inside the second motor assembly protective cover.

8. The cleaning apparatus of claim 1, wherein Also includes: The control unit is communicatively connected to the first motor assembly and the second motor assembly.

9. The cleaning apparatus of claim 1, wherein The top surface of the cover is provided with a plurality of evenly distributed through holes.

10. The cleaning apparatus of claim 1, wherein The brush is detachably connected to the top surface of the cover.

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