Low-boiling distillation device for silicone processing

Abstract

The utility model relates to the technical field of organic silicon rectification, and disclose a low distillation device is removed with organic silicon processing, tank body one side is provided with the box, is provided with rectification mechanism on the tank body, and rectification mechanism includes the delivery pump, and the delivery pump fixedly connected in the tank body top portion. The utility model discloses the design of rectification mechanism, and the delivery pump falls even to the space in the position of the discharge frame position of raw material to the different baffle, and then the steam generated when heating the raw material after the low of heating tank further enters the raw material in the receiving hopper and heats the raw material in the receiving hopper, and the small space is uniformly divided by the baffle and is heated separately, compared with the general accumulation heating, since the volume of each space after segmentation is relatively smaller, so it can reach the boiling point faster, thereby properly improving the rectification efficiency, compared with the heating of the atomized material, the material loss can also be avoided.

Description

Technical Field

[0001] This utility model relates to the field of organosilicon distillation technology, and in particular to a de-lowering distillation apparatus for organosilicon processing. Background Technology

[0002] Organosilicon, or organosilicon compounds, refers to compounds containing Si-C bonds and at least one organic group directly bonded to a silicon atom. It is a stable electrical insulating material and is widely used in the electronics and electrical industries.

[0003] Patent publication number CN221713608U discloses an organosilicon oligomer removal distillation device, including a vessel body with a distillation outlet at the top and a discharge outlet at the bottom. The vessel body contains a heat-releasing mechanism and a feed inlet at the top. It also includes a spray pipe, one end of which is connected to the feed inlet, and the other end extending spirally downwards along the vessel body's axis. An atomizer is mounted on the spray pipe facing the heating mechanism. The spray pipe sprays atomized liquid that mixes evenly with the heat released by the heat-releasing mechanism. The heat-releasing mechanism continuously releases heat, thus continuously heating and vaporizing the sprayed organosilicon oligomers. The vaporized organosilicon oligomers then flow out through the steam outlet, preventing the vaporized oligomers from re-binding with organosilicon and improving work efficiency.

[0004] In the above-mentioned apparatus for de-lowering distillation of organosilicon, the raw material is atomized and sprayed out, and then heated by hot gas flow to achieve the distillation purpose. Although this method has the advantage of making the material more uniformly heated, the corresponding problem is that the vaporized organosilicon oligomers need to be extracted after heating. Consequently, some atomized material near the exhaust position may be extracted before it is heated and vaporized, resulting in material waste. Therefore, this apparatus for de-lowering distillation of organosilicon is proposed to solve the above problems. Utility Model Content

[0005] To address the aforementioned problems, this invention provides a de-lowering distillation apparatus for organosilicon processing.

[0006] The present invention provides a distillation apparatus for removing low-carbon residues in organosilicon processing, comprising a tank body, a housing on one side of the tank body, and a distillation mechanism on the tank body; the distillation mechanism includes a transfer pump, which is fixedly connected to the top of the tank body; a first pipe is fixedly connected to the input end of the transfer pump, the first pipe extending into the housing and fixedly connected to the housing; a second pipe is fixedly connected to the output end of the transfer pump, the second pipe extending into the tank and fixedly connected to the tank; a discharge frame is provided inside the tank body; the second pipe... One end of the two tubes is fixedly connected to the top of the discharge frame. The bottom of the tank is integrally formed with a first discharge pipe. A heating tank is fixedly connected to the bottom of the first discharge pipe. An electric heating tube is fixedly connected inside the heating tank. A receiving hopper is fixedly connected inside the tank. A partition is fixedly connected inside the receiving hopper. An induced draft fan is provided on one side of the heating tank. An extraction pipe is fixedly connected to the input end of the induced draft fan. A discharge pipe is fixedly connected to the output end of the induced draft fan. The discharge pipe extends sequentially into the tank and the receiving hopper. The discharge pipe is fixedly connected to the tank and the receiving hopper respectively. A discharge outlet is opened on the discharge pipe.

[0007] By adopting the above technical solution, the box contains organosilicon raw materials. After the delivery pump pushes the raw materials to the discharge frame, they fall evenly downwards into the space separated by different partitions. Then, the steam generated when the heating tank heats the de-calcified raw materials is further introduced into the receiving hopper to heat the raw materials in the receiving hopper. Individual heating is carried out by dividing the material into small spaces evenly by partitions. Compared with general stacking heating, the volume of each space after division is relatively smaller, so the boiling point can be reached more quickly, thereby improving the distillation efficiency. Compared with heating the atomized material, it can also avoid material loss.

[0008] As a further optimization, a baffle is provided inside the tank, which fits against the bottom of the receiving hopper. A through groove is opened on the baffle. A limit rod is fixedly connected inside the tank, and an electric push rod is fixedly connected inside the tank. The limit rod passes through the baffle. An auxiliary plate is fixedly connected to the bottom of the baffle, and one end of the electric push rod is fixedly connected to the auxiliary plate.

[0009] By adopting the above technical solution, the electric push rod can push and pull the baffle after it is in operation.

[0010] As a further optimization, a discharge port is provided at the bottom of the discharge frame, and the discharge ports are arranged at equal intervals at the bottom of the discharge frame. The discharge pipe passes through the partition and is fixedly connected to the partition. A water injection pipe is fixedly connected to the top of the heating tank, and a sealing cap is threadedly connected to the top of the water injection pipe.

[0011] By adopting the above technical solution, the material entering the discharge frame is dispersed and discharged through different discharge ports.

[0012] As a further optimization, a fixing rod is fixedly connected to the top of the discharge frame, and one end of the fixing rod is fixedly connected to the inner wall of the tank.

[0013] By adopting the above technical solution, the fixing rod fixes the discharge frame.

[0014] As a further optimization, a feed hopper is fixedly connected to the top of the box, and an exhaust pipe is fixedly connected to the top of the tank.

[0015] By adopting the above technical solution, the material inside the box is injected and replenished through the feeding hopper.

[0016] As a further optimization, the bottom of the heating tank is integrally formed with a second discharge pipe, and a solenoid valve is installed on the second discharge pipe.

[0017] By adopting the above technical solution, the organosilicon material in the heating tank can be discharged through the second discharge pipe.

[0018] As a further optimization, an annular plate is fixedly connected to the outside of the tank, a support rod is fixedly connected to the bottom of the annular plate, a support plate is fixedly connected to one side of the heating tank, the induced draft fan is fixedly connected to the top of the support plate, and a one-way valve is provided on the discharge pipe.

[0019] By adopting the above technical solution, the induced draft fan can guide and discharge the steam generated in the heating tank.

[0020] In summary, this utility model has the following beneficial technical effects:

[0021] 1. Through the design of the distillation mechanism, the feed pump delivers the raw material to the discharge frame and then drops it evenly downwards into the space separated by different partitions. Subsequently, the steam generated when the heating tank heats the de-calcified raw material is further introduced into the receiving hopper to heat the raw material in the receiving hopper. Individual heating is achieved by dividing the material into small spaces evenly by partitions. Compared with general heating, the volume of each space is relatively smaller after division, so the boiling point can be reached more quickly, thereby effectively improving the distillation efficiency. Compared with heating the atomized material, it can also avoid material loss.

[0022] 2. While achieving efficient descaling of organosilicon, its structural design is simple and requires little manual intervention during operation, saving manpower. At the same time, the simple structural design is also conducive to production and manufacturing and controlling usage costs. Attached Figure Description

[0023] Figure 1 This is a schematic diagram of the structure of this utility model;

[0024] Figure 2This is a cross-sectional view of the structure of this utility model;

[0025] Figure 3 for Figure 2 Enlarged view of point A in the image;

[0026] Figure 4 This is a bottom sectional view of the tank body in this utility model;

[0027] Figure 5 This is a cross-sectional view of the material receiving hopper in this utility model.

[0028] Explanation of reference numerals in the attached drawings: 1. Tank body; 2. Box body; 3. Distillation mechanism; 31. Transfer pump; 32. First pipe body; 33. Second pipe body; 34. Discharge frame; 35. First discharge pipe; 36. Heating tank; 37. Electric heating element; 38. Receiving hopper; 39. Baffle; 391. Exhaust fan; 392. Extraction pipe; 393. Discharge pipe; 394. Discharge port; 395. Baffle; 396. Through groove; 397. Electric push rod; 398. Discharge port; 399. Water injection pipe; 381. Fixing rod; 382. Feed hopper; 383. Exhaust pipe; 384. Second discharge pipe; 385. Annular plate; 386. Support rod; 387. Check valve; 388. Solenoid valve. Detailed Implementation

[0029] The following combination Figures 1 to 5 The present invention will be described in further detail below.

[0030] A distillation apparatus for removing low-temperature residues in organosilicon processing includes a tank 1, a box 2 on one side of the tank 1, a distillation mechanism 3 on the tank 1, and a transfer pump 31 fixedly connected to the top of the tank 1. A first pipe 32 is fixedly connected to the input end of the transfer pump 31, and the first pipe 32 extends into the box 2 and is fixedly connected to the box 2.

[0031] A second pipe 33 is fixedly connected to the output end of the conveying pump 31. The second pipe 33 extends into the tank 1 and is fixedly connected to the tank 1. A discharge frame 34 is provided inside the tank 1. One end of the second pipe 33 is fixedly connected to the top of the discharge frame 34. A first discharge pipe 35 is integrally formed at the bottom of the tank 1. A heating tank 36 is fixedly connected to the bottom of the first discharge pipe 35. An electric heating tube 37 is fixedly connected inside the heating tank 36. A receiving hopper 38 is fixedly connected inside the tank 1. A partition 39 is fixedly connected inside the receiving hopper 38. An induced draft fan 391 is provided on one side of the heating tank 36. An extraction pipe 392 is fixedly connected to the input end of the induced draft fan 391.

[0032] The output end of the induced draft fan 391 is fixedly connected to the discharge pipe 393, which extends sequentially into the tank 1 and the receiving hopper 38. The discharge pipe 393 is fixedly connected to the tank 1 and the receiving hopper 38 respectively. The discharge pipe 393 has a discharge outlet 394. The box 2 stores organosilicon raw materials. After the conveying pump 31 pushes the raw materials to the discharge frame 34, they fall evenly downwards into the space separated by different partitions 39. Then, the steam generated when the heating tank 36 heats the de-calcified raw materials further enters the receiving hopper 38 to heat the raw materials in the receiving hopper 38. Individual heating is carried out by dividing the small spaces evenly by the partitions 39. Compared with general stacking heating, since the volume of each space after division is relatively smaller, the boiling point can be reached more quickly, thereby improving the distillation efficiency. Compared with heating the atomized material, it can also avoid material loss.

[0033] A baffle 395 is provided inside the tank body 1. The baffle 395 fits against the bottom of the receiving hopper 38. A through groove 396 is provided on the baffle 395. A limit rod is fixedly connected inside the tank body 1. An electric push rod 397 is fixedly connected inside the tank body 1. The limit rod passes through the baffle 395. An auxiliary plate is fixedly connected to the bottom of the baffle 395. One end of the electric push rod 397 is fixedly connected to the auxiliary plate. After the electric push rod 397 is working, it can push and pull the baffle 395. A discharge port 398 is provided at the bottom of the discharge frame 34. The discharge ports 398 are arranged at equal intervals at the bottom of the discharge frame 34. A discharge pipe 393 passes through the partition 39 and is fixedly connected to the partition 39. A water injection pipe 399 is fixedly connected to the top of the heating tank 36. A sealing cap is connected to the top of the water injection pipe 399 by a thread. The material entering the discharge frame 34 is dispersed and discharged through different discharge ports 398.

[0034] A fixing rod 381 is fixedly connected to the top of the discharge frame 34. One end of the fixing rod 381 is fixedly connected to the inner wall of the tank 1. The fixing rod 381 fixes the discharge frame 34. A feeding hopper 382 is fixedly connected to the top of the box 2. An exhaust pipe 383 is fixedly connected to the top of the tank 1. The material inside the box 2 is injected and replenished through the feeding hopper 382. A second discharge pipe 384 is integrally formed at the bottom of the heating tank 36. A solenoid valve 388 is installed on the second discharge pipe 384. The organosilicon material inside the heating tank 36 can be discharged through the second discharge pipe 384. An annular plate 385 is fixedly connected to the outside of the tank 1. A support rod 386 is fixedly connected to the bottom of the annular plate 385. A support plate is fixedly connected to one side of the heating tank 36. An induced draft fan 391 is fixedly connected to the top of the support plate. A one-way valve 387 is installed on the discharge pipe 393. The induced draft fan 391 can guide and discharge the steam generated by heating inside the heating tank 36.

[0035] In actual operation, the device is first connected to the power supply. Organosilicon raw material is injected into the box 2 through the feed hopper 382. During distillation, the delivery pump 31 works to extract the raw material in the box 2 and deliver it to the discharge frame 34. Then, it is dispersed and falls into individual small spaces separated by different partitions 39 through the discharge port 398 at the bottom of the discharge frame 34. In the early stage, water can be added to the heating tank 36 to generate steam for heating. After the blower 391 works, the steam is guided to the discharge pipe 393 and discharged through the discharge port 394 on the discharge pipe 393. This allows the organosilicon in the spaces separated by different partitions 39 to be heated individually. Since the volume of each space is relatively smaller after division, it can reach the boiling point more quickly, thereby improving the distillation efficiency. Compared with heating the atomized material, it can also avoid material loss.

[0036] After heating, the organosilicon oligomers in the receiving hopper 38 are vaporized and discharged to the outside through the exhaust pipe 383. After the organosilicon in the receiving hopper 38 has completed the de-oligomery distillation, the electric push rod 397 operates and pushes the baffle 395, causing the through groove 396 on the baffle 395 to be directly below the receiving hopper 38. The organosilicon material in the receiving hopper 38 can then be discharged downwards through the through groove 396 and enter the heating tank 36. After entering the heating tank 36, it can be reheated and reboiled under the heating action of the electric heating tube 37, thereby further vaporizing and discharging any residual oligomers in the organosilicon. The discharged gas re-enters the receiving hopper 38, which can heat the organosilicon in the receiving hopper 38 and be discharged along with the vaporized oligomers. The distilled organosilicon can be discharged after opening the valve. Based on the above steps, the distillation efficiency and distillation quality are effectively guaranteed.

[0037] The above are all preferred embodiments of this utility model, and are not intended to limit the scope of protection of this utility model. Therefore, all equivalent changes made to the structure, shape and principle of this utility model should be covered within the scope of protection of this utility model.

Claims

1. A distillation apparatus for removing low-temperature residues in organosilicon processing, characterized in that: Includes a tank (1), a box (2) is provided on one side of the tank (1), and a distillation mechanism (3) is provided on the tank (1); The distillation mechanism (3) includes a delivery pump (31), which is fixedly connected to the top of the tank (1). A first pipe (32) is fixedly connected to the input end of the delivery pump (31). The first pipe (32) extends into the interior of the housing (2) and is fixedly connected to the housing (2). A second pipe (33) is fixedly connected to the output end of the delivery pump (31). The second pipe (33) extends into the interior of the tank (1) and is fixedly connected to the tank (1). A discharge frame (34) is provided inside the tank (1). One end of the second pipe (33) is fixedly connected to the top of the discharge frame (34). A first discharge pipe (35) is integrally formed at the bottom of the tank (1). The bottom of the first discharge pipe (35) is fixedly connected to the first discharge pipe (35). A heating tank (36) is fixedly connected to the heating tank (36), and an electric heating tube (37) is fixedly connected inside the heating tank (36). A receiving hopper (38) is fixedly connected inside the tank body (1), and a partition (39) is fixedly connected inside the receiving hopper (38). An induced draft fan (391) is provided on one side of the heating tank (36). An extraction pipe (392) is fixedly connected to the input end of the induced draft fan (391), and a discharge pipe (393) is fixedly connected to the output end of the induced draft fan (391). The discharge pipe (393) extends sequentially into the tank body (1) and the receiving hopper (38). The discharge pipe (393) is fixedly connected to the tank body (1) and the receiving hopper (38) respectively. An outlet (394) is provided on the discharge pipe (393).

2. The organosilicon processing de-lowering distillation apparatus according to claim 1, characterized in that: The tank body (1) is provided with a baffle (395) inside, the baffle (395) is in contact with the bottom of the receiving hopper (38), the baffle (395) is provided with a through groove (396), a limit rod is fixedly connected inside the tank body (1), an electric push rod (397) is fixedly connected inside the tank body (1), the limit rod passes through the baffle (395), an auxiliary plate is fixedly connected to the bottom of the baffle (395), and one end of the electric push rod (397) is fixedly connected to the auxiliary plate.

3. The de-lowering distillation apparatus for organosilicon processing according to claim 1, characterized in that: The discharge frame (34) has a discharge port (398) at the bottom, and the discharge ports (398) are arranged at equal intervals at the bottom of the discharge frame (34). The discharge pipe (393) passes through the partition (39) and is fixedly connected to the partition (39). The top of the heating tank (36) is fixedly connected to a water injection pipe (399), and the top of the water injection pipe (399) is connected to a sealing cap by a thread.

4. The organosilicon processing de-lowering distillation apparatus according to claim 1, characterized in that: The top of the discharge frame (34) is fixedly connected to a fixing rod (381), and one end of the fixing rod (381) is fixedly connected to the inner wall of the tank (1).

5. The organosilicon processing de-lowering distillation apparatus according to claim 1, characterized in that: The top of the box (2) is fixedly connected to a feed hopper (382), and the top of the tank (1) is fixedly connected to an exhaust pipe (383).

6. The organosilicon processing de-lowering distillation apparatus according to claim 1, characterized in that: The bottom of the heating tank (36) is integrally formed with a second discharge pipe (384), and a solenoid valve (388) is provided on the second discharge pipe (384).

7. The organosilicon processing de-lowering distillation apparatus according to claim 1, characterized in that: An annular plate (385) is fixedly connected to the outside of the tank (1), a support rod (386) is fixedly connected to the bottom of the annular plate (385), a support plate is fixedly connected to one side of the heating tank (36), the blower (391) is fixedly connected to the top of the support plate, and a one-way valve (387) is provided on the discharge pipe (393).

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