A particle trap maintenance device based on an ald atomic layer deposition apparatus

Abstract

The utility model provides a kind of based on ALD atomic layer deposition equipment particle catcher free maintenance device, it is related to ALD atomic layer deposition technical field, including process reaction tank;The left and right sides position of the process reaction tank is all provided with connecting pipe, and the left side connecting pipe of process reaction tank is connected with the rear end position of main particle catcher inlet butterfly valve.Switching between main auxiliary particle catcher and auxiliary particle catcher, when main particle catcher needs maintenance, it can be switched to auxiliary particle catcher pipeline immediately without shutdown, single maintenance originally needs to be stopped for 2-3 hours, this part of downtime is completely saved after using the device, greatly improve the effective operation time of equipment, significantly improve production capacity.Solve the problem that the existing equipment particle catcher maintenance mode must be stopped operation, leading to long equipment downtime, serious production capacity loss, and frequent start-stop equipment may increase process fluctuation risk.

Description

Technical Field

[0001] This utility model belongs to the field of ALD atomic layer deposition technology, and more specifically, it relates to a maintenance-free device for particle trapping based on ALD atomic layer deposition equipment. Background Technology

[0002] ALD (Atomic Layer Deposition) is a key process in the manufacturing of photovoltaic TOPCon cells. It requires a particle trap to filter particulate matter in the process gas to ensure the uniformity of the deposited film. During the operation of the micro-guided ALD atomic layer deposition equipment, the particle trap gradually becomes clogged due to long-term capture of particulate matter in the process gas, requiring regular monthly shutdowns for disassembly and cleaning.

[0003] Regarding the current application of particle traps in ALD atomic layer deposition equipment, the following shortcomings exist:

[0004] Existing maintenance methods require shutdown operations, resulting in long equipment downtime, significant capacity loss, and frequent equipment start-ups and shutdowns may increase the risk of process fluctuations. Utility Model Content

[0005] To address the aforementioned technical problems, this utility model provides a maintenance-free device for particle traps in ALD atomic layer deposition equipment. This solves the problem that existing particle trap maintenance methods require shutdown operations, resulting in long downtime, significant capacity loss, and the potential for increased process fluctuation risks due to frequent equipment start-ups and shutdowns.

[0006] The technical solution adopted in this utility model is as follows:

[0007] A maintenance-free device for a particle trap in an ALD atomic layer deposition system includes a process reaction vessel. Connectors are installed on both the left and right sides of the process reaction vessel. The left-side connector is connected to the rear end of the main particle trap inlet butterfly valve. The other end of the main particle trap inlet butterfly valve is fixedly connected to the rear of the main particle trap body. The front end of the main particle trap body is fixedly connected to the rear of the main particle trap outlet butterfly valve. The other end of the main particle trap outlet butterfly valve is fixedly connected to the left side of a vacuum pump.

[0008] According to one embodiment of the present invention, the main particle catcher inlet butterfly valve and the main particle catcher outlet butterfly valve are controlled by a single controller.

[0009] According to one embodiment of the present invention, the right-side connecting pipe of the process reaction vessel is connected to the rear end of the inlet butterfly valve of the auxiliary particle catcher.

[0010] According to one embodiment of the present invention, the other end of the auxiliary particle catcher inlet butterfly valve is fixedly connected to the rear of the auxiliary particle catcher body.

[0011] According to one embodiment of the present invention, the front end of the auxiliary particle catcher body is fixedly connected to the rear end of the auxiliary particle catcher outlet butterfly valve, and the other end of the auxiliary particle catcher outlet butterfly valve is fixedly connected to the right side of the vacuum pump.

[0012] According to one embodiment of the present invention, the auxiliary particle catcher inlet butterfly valve and the auxiliary particle catcher outlet butterfly valve are controlled by a single controller.

[0013] Compared with the prior art, the present invention has the following beneficial effects:

[0014] 1. By switching between the main and auxiliary particle traps, when the main particle trap requires maintenance, the system can immediately switch to the auxiliary particle trap pipeline without stopping the machine. A single maintenance session that originally required a 2-3 hour downtime is completely saved with this device, significantly increasing the effective operating time of the equipment, greatly improving production capacity, and avoiding temperature and pressure fluctuations in the process reaction tank caused by frequent equipment start-ups and shutdowns due to maintenance. The stable temperature and pressure environment can effectively ensure the uniformity of the deposited film during the ALD atomic layer deposition process and improve product quality.

[0015] 2. During maintenance, there is no need to wait for the equipment to stop. The offline main particle catcher can be cleaned and maintained directly, which improves the efficiency of maintenance work and reduces the production capacity loss caused by downtime and the equipment wear and tear costs that may be caused by frequent start-ups and shutdowns. Attached Figure Description

[0016] Figure 1 This is a schematic diagram of the main structure of the particle trapping device based on ALD atomic layer deposition equipment that requires no downtime for maintenance.

[0017] Figure 2 This is a top view schematic diagram of the maintenance-free particle trap based on ALD atomic layer deposition equipment according to this utility model.

[0018] Figure 3 This is a left-side structural schematic diagram of the particle trapping device for ALD atomic layer deposition equipment that requires no downtime maintenance according to this utility model.

[0019] Figure 4 This is a side view of the maintenance-free particle trap based on ALD atomic layer deposition equipment according to this utility model.

[0020] In the diagram, the correspondence between component names and drawing numbers is as follows:

[0021] 1. Process reaction vessel; 2. Main particle trap inlet butterfly valve; 3. Main particle trap body; 4. Main particle trap outlet butterfly valve; 5. Auxiliary particle trap inlet butterfly valve; 6. Auxiliary particle trap body; 7. Auxiliary particle trap outlet butterfly valve; 8. Vacuum pump. Detailed Implementation

[0022] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this utility model. All other embodiments obtained by those skilled in the art based on the described embodiments of this utility model without creative effort are within the scope of protection of this utility model.

[0023] Unless otherwise defined, the technical or scientific terms used herein shall have the ordinary meaning understood by one of ordinary skill in the art to which this utility model pertains. The use of terms such as "a," "an," or "the" in this utility model patent application specification and claims does not indicate a quantity limitation, but rather indicates the presence of at least one. Terms such as "comprising" or "including" mean that the element or object preceding the word encompasses the element or object listed following the word and its equivalents. Terms such as "connected" or "linked" are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. Terms such as "upper," "lower," "left," and "right" are used only to indicate relative positional relationships; these relative positional relationships may change accordingly when the absolute position of the described object changes.

[0024] The embodiments of this utility model will be described in further detail below with reference to the accompanying drawings and examples.

[0025] Example:

[0026] As attached Figure 1 To be continued Figure 4 As shown:

[0027] This utility model provides a maintenance-free device for a particle trap in an ALD atomic layer deposition equipment, comprising a process reaction vessel 1; connecting pipes are provided on both the left and right sides of the process reaction vessel 1; the left connecting pipe of the process reaction vessel 1 is connected to the rear end of the main particle trap inlet butterfly valve 2; the other end of the main particle trap inlet butterfly valve 2 is fixedly connected to the rear end of the main particle trap body 3; the front end of the main particle trap body 3 is fixedly connected to the rear end of the main particle trap outlet butterfly valve 4; the other end of the main particle trap outlet butterfly valve 4 is fixedly connected to the left side of a vacuum pump 8; the main particle trap inlet butterfly valve 2 and the main particle trap outlet butterfly valve 4 are controlled by a single controller; the right connecting pipe of the process reaction vessel 1 is connected to the rear end of the auxiliary particle trap inlet butterfly valve 5; the other end of the auxiliary particle trap inlet butterfly valve 5 is fixedly connected to the rear end of the auxiliary particle trap body 6.

[0028] The front end of the auxiliary particle catcher body 6 is fixedly connected to the rear end of the auxiliary particle catcher outlet butterfly valve 7, and the other end of the auxiliary particle catcher outlet butterfly valve 7 is fixedly connected to the right side of the vacuum pump 8. The auxiliary particle catcher inlet butterfly valve 5 and the auxiliary particle catcher outlet butterfly valve 7 are controlled by a controller.

[0029] When using:

[0030] The controller opens the main particulate filter inlet butterfly valve 2 and the main particulate filter outlet butterfly valve 4, while simultaneously closing the auxiliary particulate filter inlet butterfly valve 5 and the auxiliary particulate filter outlet butterfly valve 7. At this time, the process exhaust gas in the process reaction tank 1 flows sequentially through the main particulate filter inlet butterfly valve 2, the main particulate filter body 3, and the main particulate filter outlet butterfly valve 4, and is finally extracted by the vacuum pump 8. The main particulate filter body 3 captures and filters the particulate matter in the gas.

[0031] When the main particulate filter body 3 needs monthly maintenance and cleaning, operate the controllers that control the auxiliary particulate filter inlet butterfly valve 5 and the auxiliary particulate filter outlet butterfly valve 7 to open these two butterfly valves synchronously; at the same time, operate the controllers that control the main particulate filter inlet butterfly valve 2 and the main particulate filter outlet butterfly valve 4 to close these two synchronous butterfly valves. At this time, the process exhaust gas is switched to flow sequentially through the auxiliary particulate filter inlet butterfly valve 5, the auxiliary particulate filter body 6, and the auxiliary particulate filter outlet butterfly valve 7, and is extracted by the vacuum pump 8. The auxiliary particulate filter body 6 undertakes the task of capturing and filtering particulate matter. During this period, the staff can safely disassemble, clean, and maintain the main particulate filter body 3. The equipment continues to operate normally throughout the process without shutdown.

[0032] After the main particle catcher body 3 is maintained, follow the reverse operation steps to open the main particle catcher inlet butterfly valve 2 and the main particle catcher outlet butterfly valve 4, and close the auxiliary particle catcher inlet butterfly valve 5 and the auxiliary particle catcher outlet butterfly valve 7. The equipment returns to normal operation, and the auxiliary particle catcher body 6 is in standby mode, waiting for the next switchover and to facilitate maintenance of the auxiliary particle catcher body 6.

[0033] Although this application has been described with reference to the foregoing embodiments, those skilled in the art will understand that various changes can be made without departing from the spirit and scope of this application as defined by the appended claims. While this specification contains details of many specific implementations, these should not be construed as limiting the scope of the claims, but rather as descriptions of features specific to particular embodiments. The scope of this application is defined by the appended claims and their equivalents, and is not limited to the embodiments described above.

Claims

1. A maintenance-free particle trap based on ALD atomic layer deposition equipment, characterized in that: The process reaction vessel (1) is provided with connecting pipes on both the left and right sides. The left connecting pipe of the process reaction vessel (1) is connected to the rear end of the inlet butterfly valve (2) of the main particle catcher. The other end of the inlet butterfly valve (2) of the main particle catcher is fixedly connected to the rear end of the main particle catcher body (3). The front end of the main particle catcher body (3) is fixedly connected to the rear end of the outlet butterfly valve (4) of the main particle catcher. The other end of the outlet butterfly valve (4) of the main particle catcher is fixedly connected to the left side of the vacuum pump (8).

2. The maintenance-free particle trap device based on ALD atomic layer deposition equipment as described in claim 1, characterized in that: The main particle catcher inlet butterfly valve (2) and the main particle catcher outlet butterfly valve (4) are controlled by a single controller.

3. The maintenance-free particle trap device based on ALD atomic layer deposition equipment as described in claim 1, characterized in that: The right-side pipe of the process reaction vessel (1) is connected to the rear end of the auxiliary particle catcher inlet butterfly valve (5).

4. The maintenance-free particle trap device based on ALD atomic layer deposition equipment as described in claim 3, characterized in that: The other end of the auxiliary particle catcher inlet butterfly valve (5) is fixedly connected to the rear of the auxiliary particle catcher body (6).

5. The maintenance-free particle trap device based on ALD atomic layer deposition equipment as described in claim 4, characterized in that: The front end of the auxiliary particle catcher body (6) is fixedly connected to the rear end of the auxiliary particle catcher outlet butterfly valve (7), and the other end of the auxiliary particle catcher outlet butterfly valve (7) is fixedly connected to the right side of the vacuum pump (8).

6. The maintenance-free particle trap device based on ALD atomic layer deposition equipment as described in claim 4, characterized in that: The auxiliary particulate trap inlet butterfly valve (5) and the auxiliary particulate trap outlet butterfly valve (7) are controlled by a single controller.

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