A drying and polishing device

By achieving continuous drying and polishing of hot melt adhesive granules within the same device, utilizing a rotating drum and internal conveying structure, the problems of complex equipment and high cost in existing technologies are solved, thereby improving production efficiency and product quality.

CN224470647UActive Publication Date: 2026-07-07GUANGDONG DINGLI HIGH HOT MELT ADHESIVE CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
GUANGDONG DINGLI HIGH HOT MELT ADHESIVE CO LTD
Filing Date
2025-08-14
Publication Date
2026-07-07

AI Technical Summary

Technical Problem

In existing technologies, the drying and polishing of hot melt adhesive particles need to be carried out separately, which results in complex equipment structures and high costs. Furthermore, the drying process is prone to temperature control issues, affecting production efficiency.

Method used

Design a drying and polishing device that achieves continuous drying and polishing of hot melt adhesive particles within the same device. Utilize a rotating drum and internal conveying structure to tumble and transport the particles. Combine non-sealed hot air drying and polishing functions to ensure rapid moisture evaporation and temperature control, simplifying the equipment structure.

Benefits of technology

It enables continuous processing of hot melt adhesive granules, simplifies equipment structure, improves production efficiency, reduces equipment costs, and ensures product quality.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model relates to hot melt adhesive equipment technical field, specifically disclose a kind of drying polishing device. Wherein: wall is around its axis of rotation of the drum of the ability of being distributed with dense hole and is arranged in the conveying structure of the drum, the conveying structure can make material particle continuously in the drum and from the feeding end side of the drum is conveyed to the discharge end side of the drum, the drum includes the drying section in front and the polishing section in rear, and the drying section and the polishing section are spaced apart by preset distance;Drying section is provided with drying mechanism for drying material particle, the polishing section is provided with for putting polishing material into the feeding mechanism of the drum, and the drying mechanism can be sent hot air from the outside of the drum to the inside of the drum. The utility model realizes the continuous processing of hot melt adhesive material particle in the same device drying and polishing, simplifies equipment structure, improves production efficiency.
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Description

Technical Field

[0001] This utility model relates to the field of hot melt adhesive equipment technology, and in particular to a drying and polishing device. Background Technology

[0002] Hot melt adhesive granules are a commonly used adhesive with good bonding properties and thermal stability. In production, hot melt adhesive is often granulated underwater. However, the surface of the granules retains moisture, requiring drying and polishing. Currently, these two processes are usually performed separately, with drying typically completed in a closed space requiring strict temperature control; too high a temperature causes melting, while too low a temperature hinders moisture evaporation. The dried granules then need to be cooled and conveyed before polishing. This separate operation method results in complex equipment structures and high costs. Utility Model Content

[0003] This invention aims to solve at least one of the technical problems existing in the prior art. To this end, this invention proposes a drying and polishing device that enables continuous drying and polishing of hot melt adhesive particles within the same device, simplifying the equipment structure and improving production efficiency.

[0004] To achieve the above objectives, this utility model provides the following technical solution:

[0005] A drying and polishing apparatus includes: a drum with densely packed holes around its periphery that can rotate about its own axis, and a conveying structure disposed within the drum. The conveying structure enables material particles to be continuously tumbled within the drum and transported from the feed end side of the drum to the discharge end side of the drum. The drum includes a drying section at the front and a polishing section at the rear, with a predetermined distance between the drying section and the polishing section. The drying section is provided with a drying mechanism for drying the material particles, and the polishing section is provided with a feeding mechanism for feeding polishing material into the drum.

[0006] According to some embodiments of the present invention, the conveying structure includes a spiral lifting plate arranged in a spiral shape on the inner side wall of the drum, the spiral lifting plate being used to tumble and convey the material particles.

[0007] According to some embodiments of the present invention, the drying mechanism includes a hot air duct arranged around the outside of the drum and a hot air structure for heating gas and blowing the heated gas into the hot air duct. The gas blown out from the hot air duct can pass through the drum and be blown into the drum to dry the material particles.

[0008] According to some embodiments of the present invention, the dispensing mechanism includes a dispensing structure disposed above the drum and a discharge structure disposed below the drum. The dispensing structure can dispense the polishing material into the drum, and the discharge structure is used to guide the polishing material in the drum to be discharged.

[0009] According to some embodiments of the present invention, the dispensing structure includes an openable and closable movable opening disposed on the roller, and the discharging structure includes a hopper disposed below the roller. When the movable opening is upward and open, the polishing material can be poured into the roller from the movable opening. When the movable opening is downward and open, the polishing material can be discharged from the movable opening into the hopper.

[0010] According to some embodiments of the present invention, the spiral lifting plate in the feeding mechanism has a plurality of isolation holes, the diameter of which is smaller than the diameter of the material particle and larger than the diameter of the polishing material.

[0011] According to some embodiments of the present invention, the dispensing mechanism includes an annular stop for confining the polishing material within the polishing section.

[0012] According to some embodiments of the present invention, the feeding mechanism includes a non-perforated liner disposed inside the drum, a spiral lifting plate with the isolation hole disposed inside the non-perforated liner, and an annular stop block disposed at the left and right ends of the non-perforated liner.

[0013] According to some embodiments of the present invention, the discharge end of the roller is provided with a downwardly inclined first pipe and a separation structure disposed on the first pipe for separating the material particles and the polishing material.

[0014] According to some embodiments of the present invention, the separation structure includes a screen disposed at the bottom of the first pipe and a second pipe disposed below the screen. The screen has a plurality of screen holes, the diameter of which is smaller than the diameter of the material particles and larger than the diameter of the polishing material.

[0015] This utility model has at least the following beneficial effects:

[0016] The dense perforations of the drum allow hot air from the drying mechanism to penetrate from the outside in. The drying mechanism is not sealed, allowing moisture on the tumbling, conveyed particles to evaporate quickly through the drum's perforations. A preset distance separates the drying and polishing sections. After drying and cooling, the particles can directly enter the polishing section for tumbling and polishing. Drying and polishing functions are integrated into the same device. The rotation of the drum and the internal conveying structure enable continuous processing of hot melt adhesive particles, simplifying the equipment structure and improving production efficiency. Attached Figure Description

[0017] Figure 1 This is a schematic diagram of the structure of one embodiment of the present utility model;

[0018] Figure 2 This is a cross-sectional view of one embodiment of the present utility model;

[0019] Figure 3 This is one embodiment of the present utility model. Figure 2 Enlarged view of the area marked A in the middle;

[0020] Figure 4 This is one embodiment of the present utility model. Figure 2 Enlarged view of the area marked B in the middle. Detailed Implementation

[0021] This invention provides the following description with reference to the accompanying drawings to aid in a comprehensive understanding of the various embodiments of the invention as defined by the claims and their equivalents. The description includes various specific details to aid understanding, but these details should be considered exemplary only. Therefore, those skilled in the art will recognize that various changes and modifications can be made to the various embodiments described herein without departing from the scope and spirit of the invention.

[0022] In the description of this utility model, the orientation descriptions, such as up, down, front, back, left, right, etc., are based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.

[0023] It should be understood that when one element (e.g., the first element) is “connected” to another element (e.g., the second element), the element may be directly connected to the other element, or there may be an intervening element (e.g., the third element) between the element and the other element.

[0024] An embodiment of this utility model provides a drying and polishing device, such as... Figure 1-4 As shown, it includes: a roller 1 with dense holes around its periphery that can rotate around its own axis and a conveying structure 2 disposed inside the roller 1. The conveying structure 2 can continuously tumble the material particles 5 inside the roller 1 and transport them from the feed end side of the roller 1 to the discharge end side of the roller 1. The roller 1 includes a drying section 101 located at the front and a polishing section 102 located at the rear, with a preset distance between the drying section 101 and the polishing section 102. A drying mechanism 3 for drying the material particles 5 is provided at the drying section 101, and a feeding mechanism 4 for feeding polishing material 401 into the roller 1 is provided at the polishing section 102.

[0025] The drum 1 has a dense network of holes around its perimeter and rotates around its own axis. Moisture-laden particles 5 enter the drying section 101 inside the drum 1 from the feed end. The particles 5 are continuously tumbled by the conveying structure 2 inside the drum 1, preventing particle accumulation and ensuring uniform drying during tumbling. The drying mechanism 3 blows hot air from the outside of the drum 1 to the inside. The dense holes in the drum 1 allow the hot air from the drying mechanism 3 to penetrate from the outside in, drying the moisture adhering to the particles 5. The separate design of the drying mechanism 3 and the drum 1 allows for independent adjustment and setting, offering high flexibility. The non-sealed drying mechanism 3 allows moisture to evaporate directly through the dense holes of the drum 1. The hot air drying method is gentle and easily adjustable, preventing the hot melt adhesive particles 5 from melting easily, while the air also efficiently removes moisture. Similarly, the drying mechanism 3 can also be a heat pipe, allowing for convenient tumbling and drying between the drum 1 and the heat pipe. The conveying structure 2 can be a flipping plate or a spiral plate fixed on the inner wall of the drum 1. It can rotate and flip the material particles 5 as the drum 1 rotates. When the material particles 5 fall, they can reach the flipping plate or spiral plate on the rear side, so as to gradually transport them from the feed end side of the drum 1 to the discharge end side of the drum 1.

[0026] The preset distance between the drying section 101 and the polishing section 102 is designed to allow the dried granules 5 to cool naturally using the ventilated roller 1 and its tumbling action. This prevents excessively high temperatures during polishing from causing the granules to clump together with the polishing powder and other materials, thus reducing product quality. The distance between them is determined by those skilled in the art based on the cooling effect. Furthermore, a cooling structure, such as a cold air system, can also be installed in this gap. When the granules 5 are tumbled into the polishing section 102 by the conveying structure 2, polishing materials, etc., are introduced into the polishing section 102 by the feeding mechanism 4 to perform tumbling and polishing on the granules 5. Finally, the granules 5 are discharged, completing the process. Integrating drying and polishing functions into the same device, and using the rotation of the roller 1 and the internal conveying structure 2 to achieve continuous processing of the hot melt adhesive granules 5, simplifies the equipment structure and improves production efficiency.

[0027] In some embodiments, such as Figure 1-2 As shown, the conveying structure 2 includes a spiral lifting plate 103 arranged in a spiral shape on the inner side wall of the drum 1. The spiral lifting plate 103 is used to turn over and convey the material particles 5.

[0028] When the drum 1 rotates, the spiral lifting plate 103 can drive the material particles 5 to rotate and be lifted upward along its side wall. Since the spiral lifting plate 103 is spirally arranged, it will also have a lateral displacement relative to the discharge end of the drum 1 during lifting. After being lifted to a certain height, it will be thrown to the bottom of the drum 1 under the action of gravity. Due to the lateral displacement relative to the discharge end of the drum 1, the landing point of the throwing is relatively displaced from the starting point of the lifting. Thus, it can be gradually transported from the feeding end side of the drum 1 to the discharge end side of the drum 1 by multiple spiral lifting plates 103. The lifting and throwing action ensures that the material particles 5 are fully turned over in the drum 1, avoiding the accumulation of material particles 5 in the drum 1, thereby improving the efficiency and uniformity of drying and polishing.

[0029] Furthermore, such as Figure 2 As shown, the drying mechanism 3 includes a hot air duct 301 arranged around the outside of the drum 1 and a hot air structure 302 for heating gas and blowing the heated gas into the hot air duct 301. The gas blown out from the hot air duct 301 can pass through the drum 1 and be blown into the drum 1 to dry the material particles 5.

[0030] The hot air structure 302 can draw in and heat the gas, and then blow the heated gas into the hot air duct 301, and then blow it into the drum 1 with dense holes from the hot air duct 301. This can evenly blow the hot air onto the tumbling material particles 5 inside the drum 1. The temperature and air volume during the drying process can be flexibly adjusted to adapt to the drying needs of different materials. At the same time, the non-sealed hot air drying method is conducive to the rapid evaporation of moisture, preventing the material particles 5 from melting due to high temperature, and ensuring that the material particles 5 remain intact during the drying process.

[0031] Furthermore, such as Figure 2-3 As shown, the dispensing mechanism 4 includes a dispensing structure 402 disposed above the roller 1 and a discharging structure 403 disposed below the roller 1. The dispensing structure 402 can dispense polishing material 401 into the roller 1, and the discharging structure 403 is used to guide the polishing material 401 in the roller 1 to be discharged.

[0032] The feeding mechanism 4 feeds polishing material 401 into the drum 1 through the feeding structure 402. The friction between the polishing material 401 and the material particles 5 during tumbling achieves efficient polishing and improves the surface quality of the material particles 5. The feeding structure 402 can be set above or to the side of the drum 1. It can be an open opening or an insertion pipe structure for feeding, which makes it convenient for operators to add polishing material 401 into the drum 1. The discharge structure 403 is located below the drum 1 and can discharge the polishing material 401 after periodic use to facilitate the replacement of a new batch of polishing material 401.

[0033] Furthermore, such as Figure 2As shown, the feeding structure 402 includes an openable and closable movable opening 404 disposed on the roller 1, and the discharge structure 403 includes a hopper 405 disposed below the roller 1. When the movable opening 404 is upward and open, the polishing material 401 can be poured into the roller 1 from the movable opening 404. When the movable opening 404 is downward and open, the polishing material 401 can be discharged from the movable opening 404 into the hopper 405.

[0034] The dispensing structure 402 facilitates the dispensing of polishing material 401 through an openable and closable movable opening 404 on the roller 1. The movable opening 404 rotates with the roller 1. Specifically, the movable opening 404 is a side-push structure, which allows for easy dispensing and discharging of polishing material 401 over a wide area. The hopper 405 of the discharge structure 403 is located below the roller 1. When discharge is required, the movable opening 404 of the roller 1 is lowered and opened, allowing the polishing material 401 to be discharged from the movable opening 404 and collected by the hopper 405 for centralized processing or recycling. The dispensing structure 402 also has an angle sensor, which can infer the rotation distance and position of the movable opening 404 based on the rotation angle of the roller 1. This allows for controlling the roller 1 to rotate so that the movable opening 404 is in the upward position when dispensing material and to rotate the roller 1 to the downward position when discharging material. In practice, the dispensing structure 402 completely encloses the roller 1, allowing accidentally spilled polishing material 401 to leak into the hopper 405 through the gaps.

[0035] Furthermore, such as Figure 2-3 As shown, the spiral lifting plate 103 in the feeding mechanism 4 has multiple isolation holes 406. The diameter of the isolation holes 406 is smaller than the diameter of the material particles 5 and larger than the diameter of the polishing material 401.

[0036] The isolation hole 406 effectively separates the material particles 5 and the polishing material 401. During the tumbling process of the spiral lifting plate 103, the polishing material 401 can return to the bottom of the drum 1 through the isolation hole 406, while the material particles 5 are carried forward by the spiral lifting plate 103, ensuring that the polishing material 401 and the material particles 5 are in full contact, while preventing the polishing material 401 from being carried out with the material particles 5. Specifically, when the diameter of the polishing material 401 used is larger than the dense holes all over the drum 1, the polishing material can be directly fed into the drum 1; furthermore, the drum 1 can be designed in the feeding mechanism 4 part without dense holes to prevent the use of small-diameter polishing material 401 from being spilled.

[0037] Furthermore, such as Figure 2-3 As shown, the dispensing mechanism 4 includes an annular stop 408 for confining the polishing material 401 within the polishing section 102.

[0038] The annular stop 408 can control the polishing material 401 within a certain range of the drum 1 for polishing, effectively preventing the polishing material 401 from leaking out of the polishing section 102 inside the drum 1. Specifically, the polishing material 401 can only be slightly lifted by the spiral lifting plate 103 with isolation holes 406 and then fall back through the isolation holes 406, while the material particles 5 can be lifted higher than the height of the annular stop 408, so that the material particles 5 can be separated from the feeding mechanism 4 and the polishing material 401 is blocked by the annular stop 408.

[0039] Furthermore, such as Figure 2-3 As shown, the feeding mechanism 4 includes a non-perforated liner 407 disposed inside the drum 1, a spiral lifting plate 103 with isolation holes 406 disposed inside the non-perforated liner 407, and annular blocks 408 disposed at the left and right ends of the non-perforated liner 407.

[0040] The non-perforated sleeve 407 is a sleeve installed inside the roller 1, which can protect the inner wall of the roller 1 from wear by the polishing material 401 and extend the service life of the roller 1. The non-perforated sleeve 407 has an opening communicating with the movable opening 404, which facilitates the insertion of the polishing material 401. The non-perforated sleeve 407 is detachable, and different non-perforated sleeves 407 can be replaced according to different polishing materials 401, which is flexible and versatile. Specifically, the non-perforated sleeve 407 can be fixed inside the roller 1 by means of clips, screws, etc.

[0041] In some embodiments, such as Figure 4 As shown, the discharge end of the roller 1 is provided with a downwardly inclined first pipe 409 and a separation structure 410 provided on the first pipe 409 for separating the material particles 5 and the polishing material 401.

[0042] The polishing material 401 that is accidentally carried away when the material granules 5 are discharged can be guided out through the first pipe 409 under the action of gravity. The separation structure 410 can accurately separate the material granules 5 from the polishing material 401, avoiding the product quality decline and waste of polishing material 401 caused by the two being discharged together, ensuring the purity of the final product, and also facilitating the recycling and reuse of polishing material 401.

[0043] Furthermore, such as Figure 4 As shown, the separation structure 410 includes a screen 412 disposed at the bottom of the first pipe 409 and a second pipe 411 disposed below the screen 412. The screen 412 has a plurality of screen holes, the diameter of which is smaller than the diameter of the material particles 5 and larger than the diameter of the polishing material 401.

[0044] The mesh size of the screen is smaller than the diameter of the material 5 and larger than the diameter of the polishing material 401. When the mixed particles pass through the screen 412, the polishing material 401 can fall into the second pipe 411, while the material 5 can continue to move downward along the first pipe 409, accurately separating the material 5 and the polishing material 401. At the same time, it is convenient to recycle the polishing material 401 and reduce production costs.

[0045] The terms and words used in the foregoing description and claims are not limited to their literal meaning, but are merely used by the applicant to enable a clear and consistent understanding of the present invention. Therefore, those skilled in the art should understand that the foregoing description of various embodiments of the present invention is for illustrative purposes only, and not intended to limit the present invention as defined by the appended claims and their equivalents.

Claims

1. A drying and polishing apparatus, characterized in that, include: A roller (1) with dense holes around its perimeter that can rotate around its own axis and a conveying structure (2) disposed inside the roller (1) are provided. The conveying structure (2) enables the material particles (5) to be continuously tumbled inside the roller (1) and transported from the feed end side of the roller (1) to the discharge end side of the roller (1). The roller (1) includes a drying section (101) located at the front and a polishing section (102) located at the rear. The drying section (101) and the polishing section (102) are spaced apart by a preset distance. A drying mechanism (3) for drying the material particles (5) is provided at the drying section (101), and a feeding mechanism (4) for feeding polishing material (401) into the roller (1) is provided at the polishing section (102).

2. The drying and polishing apparatus according to claim 1, characterized in that: The conveying structure (2) includes a spiral lifting plate (103) arranged in a spiral shape on the inner side wall of the drum (1), which is used to turn over and convey the material particles (5).

3. The drying and polishing apparatus according to claim 2, characterized in that: The drying mechanism (3) includes a hot air duct (301) arranged around the outside of the drum (1) and a hot air structure (302) for heating gas and blowing the heated gas into the hot air duct (301). The gas blown out from the hot air duct (301) can pass through the drum (1) and be blown into the drum (1) to dry the material particles (5).

4. The drying and polishing apparatus according to claim 2, characterized in that: The dispensing mechanism (4) includes a dispensing structure (402) disposed above the roller (1) and a discharge structure (403) disposed below the roller (1). The dispensing structure (402) can dispense the polishing material (401) into the roller (1), and the discharge structure (403) is used to guide the polishing material (401) in the roller (1) to be discharged.

5. The drying and polishing apparatus according to claim 4, characterized in that: The feeding structure (402) includes an openable and closable movable opening (404) provided on the roller (1), and the discharge structure (403) includes a hopper (405) provided below the roller (1). When the movable opening (404) is upward and open, the polishing material (401) can be poured into the roller (1) from the movable opening (404). When the movable opening (404) is downward and open, the polishing material (401) can be discharged from the movable opening (404) into the hopper (405).

6. The drying and polishing apparatus according to claim 4, characterized in that: The spiral lifting plate (103) in the feeding mechanism (4) has a plurality of isolation holes (406), the diameter of which is smaller than the diameter of the material particle (5) and larger than the diameter of the polishing material (401).

7. The drying and polishing apparatus according to claim 6, characterized in that: The dispensing mechanism (4) includes an annular stop (408) for confining the polishing material (401) within the polishing section (102).

8. The drying and polishing apparatus according to claim 7, characterized in that: The feeding mechanism (4) includes a non-perforated liner (407) disposed in the drum (1), a spiral lifting plate (103) with the isolation hole (406) disposed in the non-perforated liner (407), and an annular block (408) disposed at the left and right ends of the non-perforated liner (407).

9. A drying and polishing apparatus according to any one of claims 4-8, characterized in that: The discharge end of the roller (1) is provided with a downwardly inclined first pipe (409) and a separation structure (410) provided on the first pipe (409) for separating the material particles (5) and the polishing material (401).

10. A drying and polishing apparatus according to claim 9, characterized in that: The separation structure (410) includes a screen (412) disposed at the bottom of the first pipe (409) and a second pipe (411) disposed below the screen (412). The screen (412) has a plurality of screen holes, the diameter of which is smaller than the diameter of the material particles (5) and larger than the diameter of the polishing material (401).