Feed assembly and polycrystalline silicon reduction furnace

Abstract

The embodiment of the present application provides a kind of feed assembly and polycrystalline silicon reduction furnace.Feed assembly includes feed pipe and feed ring pipe, feed pipe is communicated with the air inlet of the bottom disc of polycrystalline silicon reduction furnace;Feed ring pipe is located in the side of feed pipe away from the bottom disc of reduction furnace, and feed pipe is communicated with feed ring pipe;Feed ring pipe is equipped with multiple first discharge port and multiple second discharge port, first discharge port is located in the side of feed ring pipe away from the bottom disc of reduction furnace, and second discharge port is located in the side of feed ring pipe close to the bottom disc of reduction furnace.Feed ring pipe of the embodiment of the present application is installed on the bottom disc of reduction furnace by multiple feed pipes, so that feed ring pipe is limited by multiple feed pipes during installation, to improve the installation precision and stability of feed assembly.Through the first feed port and second discharge port arranged circumferentially on feed ring pipe, the uniformity of feed assembly is improved, which helps to make feed gas can be evenly distributed in the internal space of reduction furnace.

Description

Technical Field

[0001] This application relates to the field of polysilicon reduction furnace technology, and in particular to a feeding assembly and a polysilicon reduction furnace. Background Technology

[0002] The modified Siemens process is the main production process for polysilicon in China. The polysilicon reduction furnace is the core equipment in polysilicon production. Its core function is to convert silicon-containing gas into solid polysilicon through a chemical reaction and deposit it on the polysilicon core to form a silicon rod.

[0003] During the operation of a polycrystalline silicon reduction furnace, a feed gas containing trichlorosilane and hydrogen needs to be introduced into the furnace. The uniformity of the feed gas distribution, the gas residence time, and the flow rate play a crucial role in the growth quality and speed of the polycrystalline silicon rod. In related technologies, a vertical gas inlet pipe is used for feeding, but the uneven distribution of the feed gas ejected through this vertical gas inlet pipe can easily affect the growth morphology of the silicon rod. Utility Model Content

[0004] This application provides a feeding assembly and a polysilicon reduction furnace to improve the feeding uniformity of the polysilicon reduction furnace.

[0005] On one hand, this application provides a feeding assembly, including:

[0006] Multiple feed pipes are connected to the air inlet of the reduction furnace chassis of the polycrystalline silicon reduction furnace;

[0007] A feed ring pipe is provided on the side of the feed pipe away from the reduction furnace chassis, and the feed pipe is connected to the feed ring pipe; the feed ring pipe is provided with a plurality of first discharge ports and a plurality of second discharge ports, the first discharge ports are provided on the side of the feed ring pipe away from the reduction furnace chassis, and the second discharge ports are provided on the side of the feed ring pipe close to the reduction furnace chassis.

[0008] In some optional embodiments, the feeding assembly is provided in two sets, namely a first feeding assembly and a second feeding assembly; wherein,

[0009] The first feeding assembly includes a first feeding pipe and a first feeding ring pipe that are connected to each other;

[0010] The second feeding assembly includes a second feeding pipe and a second feeding ring pipe connected to each other; wherein the first feeding ring pipe and the second feeding ring pipe are arranged coaxially, and the inner diameter of the first feeding ring pipe is smaller than the inner diameter of the second feeding ring pipe, and the length of the first feeding pipe is greater than the length of the second feeding pipe.

[0011] In some optional embodiments, a plurality of first discharge ports are arranged at intervals along the circumference of the feed ring pipe, with an equal interval between adjacent first discharge ports; a plurality of second discharge ports are arranged at intervals along the circumference of the feed ring pipe, with an equal interval between adjacent second discharge ports; and the first discharge ports and second discharge ports are arranged alternately along the circumference of the feed ring pipe.

[0012] In some alternative embodiments, the feed tube includes:

[0013] A first tube body, which is connected to the feed ring tube;

[0014] The second tube is connected to the first tube, and the second tube is connected to the air inlet of the chassis of the polysilicon reduction furnace.

[0015] In some optional embodiments, the first tube and the second tube are detachably connected, and when the first tube and the second tube are separated, the first tube can be connected to the air inlet of the chassis of the polysilicon reduction furnace.

[0016] In some alternative embodiments, the first tube body includes a first connecting segment, the second tube body includes a second connecting segment, the second connecting segment is sleeved on the outer periphery of the first connecting segment, and the second connecting segment is telescopic relative to the first connecting segment.

[0017] In some optional embodiments, the outer peripheral wall of the first connecting segment is provided with external threads, the inner peripheral wall of the second connecting segment is provided with internal threads, and the second connecting segment is threadedly connected to the first connecting segment.

[0018] In some optional embodiments, the feed ring tube further includes a first plug and a second plug, the first plug being used to block the first outlet and the second plug being used to block the second outlet.

[0019] In some alternative embodiments, the feed ring tube further includes nozzles disposed at the first discharge port and the second discharge port.

[0020] On the other hand, this application provides a polysilicon reduction furnace, including a reduction furnace chassis and the aforementioned feeding assembly, wherein the feeding assembly is disposed on the reduction furnace chassis.

[0021] This application provides a feeding assembly and a polysilicon reduction furnace. The feeding assembly includes a feeding pipe and a feeding ring pipe. The feeding ring pipe is installed on the furnace chassis via multiple feeding pipes, so that the feeding ring pipe is constrained by multiple feeding pipes during installation, thereby improving the installation accuracy and stability of the feeding assembly. By setting a first inlet and a second outlet circumferentially on the feeding ring pipe, and the first inlet and the second outlet being located on the upper and lower sides of the feeding ring pipe, the feeding uniformity of the feeding assembly is improved. This helps to ensure that the feed gas can be evenly distributed in the internal space of the reduction furnace, thereby helping to ensure balanced feeding to different parts of the silicon rod and ensuring that each growth part of the silicon rod receives a sufficient and balanced supply of raw materials. Attached Figure Description

[0022] The accompanying drawings, which are incorporated in and form part of this specification, illustrate embodiments consistent with this application and, together with the description, serve to explain the principles of this application.

[0023] Figure 1 This is a schematic diagram of the feeding assembly provided in an embodiment of this application;

[0024] Figure 2 This is a schematic diagram of the feeding assembly provided in an embodiment of this application from another perspective;

[0025] Figure 3 This is a schematic diagram of the structure of the feeding assembly installed on the chassis of the reduction furnace according to an embodiment of this application;

[0026] Figure 4 for Figure 3 Side view;

[0027] Figure 5 A schematic diagram showing the layout of the first and second outlets of the feed ring pipe provided in an embodiment of this application;

[0028] Figure 6 A schematic diagram showing the connection between the first connecting section and the second connecting section of the feed pipe provided in an embodiment of this application;

[0029] Figure 7 This is a schematic diagram showing the installation of the first and second plugs of the feeding assembly provided in an embodiment of this application.

[0030] Figure label:

[0031] 10-First feeding assembly; 11-First feeding pipe; 12-First feeding ring pipe; 20-Second feeding assembly; 21-Second feeding pipe; 22-Second feeding ring pipe; 30-Chassis;

[0032] 100 - Feed pipe; 110 - First pipe body; 111 - First connecting section; 120 - Second pipe body; 121 - Second connecting section;

[0033] 200 - Feed ring pipe; 210 - First discharge port; 220 - Second discharge port; 230 - First hole plug; 240 - Second hole plug.

[0034] The accompanying drawings illustrate specific embodiments of this application, which will be described in more detail below. These drawings and descriptions are not intended to limit the scope of the concept in any way, but rather to illustrate the concept of this application to those skilled in the art through reference to particular embodiments. Detailed Implementation

[0035] Exemplary embodiments will now be described in detail, examples of which are illustrated in the accompanying drawings. When the following description relates to the drawings, unless otherwise indicated, the same numbers in different drawings denote the same or similar elements. The embodiments described in the following exemplary embodiments do not represent all embodiments consistent with this application. Rather, they are merely examples of apparatuses and methods consistent with some aspects of this application as detailed in the appended claims.

[0036] The terms “first,” “second,” “third,” “fourth,” etc. (if present) in the specification, claims, and accompanying drawings of this application are used to distinguish similar objects and are not necessarily used to describe a particular order or sequence. It should be understood that such data can be interchanged where appropriate so that the embodiments of this application described herein can be implemented, for example, in a sequence other than those illustrated or described herein.

[0037] In this application, the terms "exemplary" or "for example" are used to indicate examples, illustrations, or descriptions. Any embodiment or design described as "exemplary" or "for example" in this application should not be construed as being more preferred or advantageous than other embodiments or designs. Specifically, the use of terms such as "exemplary" or "for example" is intended to present the relevant concepts in a specific manner.

[0038] In the polysilicon production process, the reduction furnace is the core equipment for polysilicon deposition, and its internal feed nozzle has a crucial impact on production efficiency. Currently, in related technologies, polysilicon reduction furnaces use vertical air inlet pipes with single-hole nozzles to transport raw materials.

[0039] However, during actual installation, the vertical inlet pipe is prone to inconsistent installation angles and heights at its outlet due to factors such as installation precision. These installation deviations directly lead to uneven raw material feeding within the furnace, thereby disrupting the uniformity of the reaction gas field. This uneven reaction gas field results in differences in the growth environment between the middle and bottom of the silicon rod, causing inconsistent growth conditions, specifically manifested as bending or significant differences in surface morphology.

[0040] Based on this, this application provides a feeding assembly and a polysilicon reduction furnace, aiming to solve the above-mentioned technical problems of the prior art.

[0041] The technical solution of this application and how the technical solution of this application solves the above-mentioned technical problems are described in detail below with specific embodiments. These specific embodiments can be combined with each other, and the same or similar concepts or processes may not be described again in some embodiments. The embodiments of this application will now be described with reference to the accompanying drawings.

[0042] Please see Figures 1 to 4 This application provides a feeding assembly for a polysilicon reduction furnace. The feeding assembly includes multiple feed pipes 100 and a feed ring pipe 200, with the feed pipes 100 connected to the air inlet of the reduction furnace chassis 30 of the polysilicon reduction furnace.

[0043] The reduction furnace chassis 30 serves to support the furnace components and transport raw materials. The size and position of the air inlet of the reduction furnace chassis 30 match the feed pipe 100 of the feeding assembly, allowing the feed pipe 100 to be inserted and installed at the air inlet. Specifically, the feed pipe 100 can be threaded into the air inlet for further secure connection. The reduction furnace chassis 30 also includes an electrode interface for connecting the electrodes required for silicon rod growth.

[0044] The feed pipe 100 serves to connect and fix the feed ring pipe 200 to the reduction furnace chassis 30. Simultaneously, the feed pipe 100 acts as the main channel for raw material transportation; one end connects to the air inlet of the reduction furnace chassis 30, and the other end connects to the feed ring pipe 200, allowing raw materials to enter the feed pipe 100 through the air inlet of the reduction furnace chassis 30, providing a basic channel for subsequent dispersed transportation of raw materials. It should be noted that the feed gas is the raw material itself, and the raw material is in a gaseous state.

[0045] The feed ring pipe 200 is located on the side of the feed pipe 100 away from the reduction furnace chassis 30, and the feed pipe 100 is connected to the feed ring pipe 200. The feed ring pipe 200 is provided with a plurality of first discharge ports 210 and a plurality of second discharge ports 220. The first discharge ports 210 are located on the side of the feed ring pipe 200 away from the reduction furnace chassis 30, and the second discharge ports 220 are located on the side of the feed ring pipe 200 close to the reduction furnace chassis 30.

[0046] The feed ring pipe 200 has a ring structure. Through its first discharge port 210 and second discharge port 220 in the circumferential direction, the raw material can be effectively distributed around the inside of the reduction furnace. Compared with the single-point feeding through a single nozzle in the traditional vertical air inlet pipe, it helps to disperse the raw material gas and improve the uniformity of air intake.

[0047] The first discharge port 210 and the second discharge port 220 are positioned opposite each other on both sides of the feed ring pipe 200. That is, when the feed ring pipe 200 is horizontally positioned, the first discharge port 210 can be located on the top side of the feed ring pipe 200, and the second discharge port 220 can be located on the bottom side of the feed ring pipe 200. Thus, the vertical arrangement of the first discharge port 210 and the second discharge port 220 allows the feed gas to be effectively distributed throughout the reduction furnace, thereby helping to ensure balanced feeding to different parts of the silicon rod and guaranteeing a sufficient and balanced supply of raw materials to each growth stage of the silicon rod.

[0048] It is understood that in this embodiment, the feed ring tube 200 is fixed to the chassis 30 of the reduction furnace by multiple feed tubes 100. By fixing the feed ring tube 200 with multiple feed tubes 100, the feed ring tube 200 can be fixed from multiple points, so that the feed ring tube 200 is limited by multiple feed tubes 100 during the installation process, thereby improving the installation accuracy and stability of the feeding assembly.

[0049] Meanwhile, since multiple feed pipes 100 are connected to the air inlet and feed ring pipe 200 of the reduction furnace chassis 30, raw materials can enter the feed ring pipe 200 simultaneously through multiple feed pipes 100, making the distribution of raw materials in the feed ring pipe 200 more balanced and reducing the situation of excessively high or low local raw material concentration in the reduction furnace caused by the conveying of a single feed pipe 100.

[0050] Therefore, in this embodiment, the feed ring pipe 200 is fixedly installed on the reduction furnace chassis 30 by multiple feed pipes 100, so that the feed ring pipe 200 is constrained by multiple feed pipes 100 during installation, thereby improving the installation accuracy and stability of the feeding assembly. By setting a first outlet 210 and a second outlet 220 around the feed ring pipe 200, and the first outlet 210 and the second outlet 220 are located on the upper and lower sides of the feed ring pipe 200, the feeding uniformity of the feeding assembly is improved, which helps the feed gas to be evenly distributed in the internal space of the reduction furnace, thereby helping to ensure that the feeding of different parts of the silicon rod is balanced, and ensuring that each growth part of the silicon rod receives a sufficient and balanced supply of raw materials.

[0051] In one alternative embodiment, please refer to Figure 3 and Figure 4 The feeding assembly is provided in two sets, namely the first feeding assembly 10 and the second feeding assembly 20.

[0052] The first feeding assembly 10 includes a first feeding pipe 11 and a first feeding ring pipe 12 connected to each other, and the second feeding assembly 20 includes a second feeding pipe 21 and a second feeding ring pipe 22 connected to each other. The first feeding ring pipe 12 and the second feeding ring pipe 22 are coaxially arranged, and the inner diameter of the first feeding ring pipe 12 is smaller than the inner diameter of the second feeding ring pipe 22. The length of the first feeding pipe 11 is greater than the length of the second feeding pipe 21.

[0053] It is understood that the connection structure between the first feed pipe 11 and the first feed ring pipe 12, and the connection structure between the second feed pipe 21 and the second feed ring pipe 22 are similar to the connection structure between the feed pipe 100 and the feed ring pipe 200 in the above embodiment. The first feed ring pipe 12 and the second feed ring pipe 22 are both provided with a first discharge port 210 and a second discharge port 220.

[0054] The first feed ring pipe 12 and the second feed ring pipe 22 are arranged on the same axis, so that the spatial distribution of the two sets of feed components in the polysilicon reduction furnace is symmetrical, avoiding local deviations in raw material delivery due to layout offset.

[0055] The first feed pipe 11 is longer than the second feed pipe 21, placing the connected first feed ring pipe 12 at a relatively high position within the furnace. The second feed pipe 21 is shorter, placing the connected second feed ring pipe 22 at a relatively low position. This creates a vertical height difference between the first and second feed ring pipes 12 and 22, allowing for material delivery to different height areas within the furnace. The smaller inner diameter of the first feed ring pipe 12 is suitable for delivering smaller quantities of material, precisely meeting the material requirements for silicon rod growth at higher positions within the furnace. The larger inner diameter of the second feed ring pipe 22 allows for the delivery of more material, adapting to the material needs of silicon rod growth at lower positions within the furnace.

[0056] After the raw material enters the first feed ring pipe 12 through the first feed pipe 11, it is delivered in appropriate amounts to the silicon rods in the higher region of the furnace through the first discharge port 210 and the second discharge port 220. At the same time, the raw material enters the second feed ring pipe 22 through the second feed pipe 21, and is delivered to the silicon rods in the lower region of the furnace through its first discharge port 210 and the second discharge port 222. Since the two sets of feed ring pipes 200 are arranged coaxially, the delivery of raw material in the horizontal direction can be kept uniform. Combined with the height difference and inner diameter difference in the vertical direction, it helps to achieve a precise and balanced supply of raw material in different height regions of the furnace.

[0057] In one alternative embodiment, please refer to Figure 5Multiple first discharge ports 210 are arranged at intervals along the circumference of the feed ring pipe 200, with equal intervals between adjacent first discharge ports 210. Multiple second discharge ports 220 are arranged at intervals along the circumference of the feed ring pipe 200, with equal intervals between adjacent second discharge ports 220. The first discharge ports 210 and second discharge ports 220 are arranged alternately along the circumference of the feed ring pipe 200.

[0058] By arranging the first discharge port 210 and the second discharge port 220 at intervals along the circumference of the feed ring pipe 200, the raw material can form a uniform spray point in the circumference when it is sprayed out from the side of the feed ring pipe 200 away from the chassis 30. This helps to improve the uniformity of feeding in the circumference of the feed ring pipe 200 in the reduction furnace, thereby improving the uniformity of the distribution of raw material gas in the reduction furnace.

[0059] The first discharge port 210 and the second inlet are staggered along the circumference of the feed ring pipe 200. That is, on the circumference of the feed ring pipe 200, the two sides adjacent to the first discharge port 210 are the second inlets, and the two sides adjacent to the second discharge port 220 are the first inlets. This makes the distribution of the first discharge port 210 and the second inlet on the circumference of the feed ring pipe 200 more compact and uniform, which can maximize the utilization of the circumferential space of the feed ring pipe 200 and ensure that every circumferential position is effectively covered by the spray range of the two types of discharge ports.

[0060] In one alternative embodiment, please refer to Figure 1 and Figure 2 The feed pipe 100 includes a first pipe body 110 and a second pipe body 120.

[0061] The first tube 110 is connected to the feed ring pipe 200, the first tube 110 is connected to the second tube 120, and the second tube 120 is connected to the air inlet of the chassis 30 of the polysilicon reduction furnace.

[0062] The first pipe body 110 serves as the direct component connecting the feed pipe 100 and the feed ring pipe 200. One end of it is fixedly connected to a specific position in the feed ring pipe 200, enabling it to precisely guide the raw material it is conveying into the feed ring pipe 200. The second pipe body 120 is connected at one end to the first pipe body 110 and at the other end to the air inlet of the reduction furnace chassis 30, forming a complete raw material conveying channel from the chassis 30 to the feed ring pipe 200. After the raw material enters from the air inlet of the reduction furnace chassis 30, it first flows through the second pipe body 120 and then through the first pipe body 110 into the feed ring pipe 200.

[0063] Meanwhile, the segmented structure of the first tube 110 and the second tube 120 facilitates maintenance and replacement. If the second tube 120 is worn or malfunctions, it can be replaced separately, which helps to reduce maintenance costs.

[0064] In one alternative embodiment, please refer to Figure 6 The first tube 110 and the second tube 120 are detachably connected. When the first tube 110 and the second tube 120 are separated, the first tube 110 can be connected to the air inlet of the chassis 30 of the polysilicon reduction furnace.

[0065] The first tube 110 and the second tube 120 are detachably connected, allowing for easy assembly or separation of the two tubes. When the first tube 110 and the second tube 120 are connected, the length of the feed pipe 100 is the sum of the lengths of the first tube 110 and the second tube 120; when the first tube 110 is connected alone to the air inlet of the polysilicon reduction furnace chassis 30, the length of the feed pipe 100 is the same as the length of the first tube 110.

[0066] The height of the feed ring tube 200 within the furnace can be adjusted via the detachable first tube 110 and second tube 120. When the length of the feed tube 100 increases, the height of the feed ring tube 200 rises accordingly, moving it further away from the reduction furnace base 30; conversely, when the length of the feed tube 100 decreases, the height of the feed ring tube 200 decreases, bringing it closer to the base 30. Thus, the adjustment of the feed tube 100 length allows for precise control of the relative distance between the feed ring tube 200 and the silicon rod, based on the growth stage and height of the silicon rod, ensuring that the first outlet 210 and the second outlet 220 consistently deliver raw materials to the critical growth areas of the silicon rod.

[0067] For example, the height of the silicon rod gradually increases during growth, and the required spraying height of the raw materials varies at different growth stages. In the early stages of growth, the silicon rod is relatively low. By shortening the length of the feed pipe 100, the feed ring pipe 200 is brought closer to the chassis 30, allowing the second outlet 220 to be closer to the bottom of the silicon rod, thus meeting the raw material requirements for bottom growth. As the silicon rod grows, the length of the feed pipe 100 is increased by connecting the first pipe body 110 and the second pipe body 120, raising the height of the feed ring pipe 200 so that the first outlet 210 can correspond to the middle and upper regions of the silicon rod, ensuring the accuracy of raw material supply at each growth stage.

[0068] In related technologies, once the feed pipe is installed, its height cannot be adjusted, making it unable to adapt to height changes during silicon rod growth. This leads to a mismatch between the raw material injection position and the silicon rod growth area, resulting in uneven feeding. In this embodiment, however, the detachable structure allows for flexible adjustment of the height of the feed ring pipe 200 by changing the length of the feed pipe 100, which helps ensure feeding uniformity under different growth conditions of the silicon rod.

[0069] For example, the first pipe body 110 and the second pipe body 120 are connected by common detachable structures such as flange connection and threaded connection.

[0070] In one alternative embodiment, please continue to refer to Figure 6The first tube body 110 includes a first connecting section 111, and the second tube body 120 includes a second connecting section 121. The second connecting section 121 is sleeved on the outer periphery of the first connecting section 111, and the second connecting section 121 can extend and retract relative to the first connecting section 111.

[0071] The first connecting segment 111 is part of the first tube body 110, and its outer circumferential dimensions are adapted to the inner circumferential dimensions of the second connecting segment 121, so that the second connecting segment 121 can be stably fitted onto the outside of the first connecting segment 111.

[0072] Since the second connecting section 121 can extend and retract relative to the first connecting section 111, the overall length of the feed tube can be controlled by changing the sleeve length between the second connecting section 121 and the first connecting section 111. When the second connecting section 121 extends and retracts away from other parts of the first tube body 110, the sleeve length between the two is shortened, and the overall length of the feed tube 100 increases. When the second connecting section 121 extends and retracts towards other parts of the first tube body 110, the sleeve length increases, and the overall length of the feed tube 100 is shortened.

[0073] The telescopic sleeve structure of the first tube 110 and the second tube 120 has higher adjustment precision than the segmented length adjustment achieved by disassembly alone. It can more accurately control the height of the feed ring tube 200, thereby improving the accuracy of the height adjustment of the feed ring tube 200. This helps to adapt to subtle changes in the silicon rod growth process and ensures that the raw material is always sprayed evenly and accurately onto the target area.

[0074] For example, a plurality of positioning holes are evenly distributed along the length direction on the outer peripheral wall of the first connecting section 111, and an elastic positioning pin that mates with the positioning holes is provided on the second connecting section 121. When extension or retraction adjustment is required, the elastic positioning pin is pressed to disengage it from the current positioning hole, and then the second connecting section 121 is pushed to move axially along the first connecting section 111. When it moves to the desired position, the elastic positioning pin springs into the corresponding positioning hole, thereby fixing the length. By selecting different positioning holes, multiple adjustment positions of the feed tube 100 can be achieved to meet different production needs.

[0075] In one optional embodiment, the outer peripheral wall of the first connecting segment 111 is provided with external threads, the inner peripheral wall of the second connecting segment 121 is provided with internal threads, and the second connecting segment 121 is threadedly connected to the first connecting segment 111.

[0076] It is understandable that the internal thread of the second connecting segment 121 matches the external thread of the first connecting segment 111. After the threaded connection between the second connecting segment 121 and the first connecting segment 111 is adjusted to the target length, a self-locking effect can be formed by the friction between the threads to ensure the stability of the current length.

[0077] When the length of the feed pipe 100 needs to be adjusted, the second connecting section 121 is rotated. Utilizing the meshing characteristics of the threads, the second connecting section 121 will undergo axial displacement relative to the first connecting section 111, thereby changing the sleeve length between the two. The specific adjustment process is as follows:

[0078] When the length of the feed tube 100 needs to be shortened, the second connecting section 121 is rotated clockwise, moving it closer to the fixed end of the first connecting section 111, thus increasing the sleeve length and shortening the overall length of the feed tube 100. When the length of the feed tube 100 needs to be increased, the second connecting section 121 is rotated counterclockwise, moving it away from the fixed end of the first connecting section 111, causing the sleeve length to shorten and ultimately increasing the overall length of the feed tube 100.

[0079] In one alternative embodiment, please refer to Figure 7 The feed ring pipe 200 also includes a first plug 230 and a second plug 240. The first plug 230 is used to block the first outlet 210, and the second plug 240 is used to block the second outlet 220.

[0080] The dimensions and shapes of the first plug 230 and the second plug 240 are adapted to the first discharge port 210 and the second discharge port 220, respectively, and can be tightly embedded or covered on the corresponding discharge ports to achieve effective sealing of the discharge ports. The plugs can be made of high-temperature resistant and corrosion-resistant materials to adapt to the high-temperature and highly corrosive environment inside the polycrystalline silicon reduction furnace, ensuring the stability and durability of the sealing.

[0081] By sealing parts of the first outlet 210 and the second outlet 220 with the first plug 230 and the second plug 240, the discharge quantity and position of the feed ring 200 can be flexibly adjusted. At different stages of polysilicon production, the demand and distribution requirements for raw materials vary. For example, in the early stages of silicon rod growth, only some outlets may need to operate to meet the raw material supply; as the silicon rod grows, more outlets are opened to increase the raw material delivery rate.

[0082] Therefore, this embodiment enhances the flexibility and adaptability of the feeding assembly through the first hole plug 230 and the second hole plug 240, which can meet the differentiated needs of raw material supply at different growth stages of silicon rods, reduce raw material waste, and improve raw material utilization.

[0083] In an optional embodiment, the feed ring 200 further includes nozzles, not shown in the figure, which are located at the first discharge port 210 and the second discharge port 220.

[0084] It is understood that the nozzle is matched with the first discharge port 210 and the second discharge port 220, and can be fixed to the first discharge port 210 and the second discharge port 220 by means of threaded connection, welding or snap-fit. The outlet end of the nozzle can be designed with a specific shape, such as a conical shape, a flat shape or a structure with a guide groove, so as to effectively control the injection direction, range and flow rate of the raw material.

[0085] Nozzles can improve the flow state of raw materials. For example, conical nozzles can concentrate the raw materials, increase the spray speed, and enable them to reach specific areas on the silicon rod surface more accurately; flat nozzles can expand the spray range of the raw materials, allowing them to be evenly distributed over a larger area. Meanwhile, multiple nozzles can be provided on the outer periphery of the nozzle, allowing the raw materials to be sprayed out in a divergent manner. The shape and position of the nozzles can be specifically set according to actual conditions, and this embodiment does not specifically limit this.

[0086] This application embodiment also provides a polysilicon reduction furnace, including a reduction furnace chassis 30 and the above-mentioned feeding assembly, the feeding assembly being disposed on the reduction furnace chassis 30.

[0087] The reduction furnace chassis 30, as the basic component of the entire reduction furnace, provides mounting support for the feeding assembly. The feeding assembly is connected to the air inlet of the reduction furnace chassis 30 via its feed pipe 100, allowing raw materials to enter the feeding assembly from the outside via the reduction furnace chassis 30 and then be transported into the furnace to participate in the reaction. It is understood that the polycrystalline silicon reduction furnace provided in this embodiment possesses the beneficial effects of the feeding assembly in any of the above embodiments, and therefore will not be elaborated upon here.

[0088] Other embodiments of this application will readily occur to those skilled in the art upon consideration of the specification and practice of the utility models disclosed herein. This application is intended to cover any variations, uses, or adaptations of this application that follow the general principles of this application and include common knowledge or customary techniques in the art not disclosed herein. The specification and examples are to be considered exemplary only, and the true scope and spirit of this application are indicated by the following claims.

[0089] It should be understood that this application is not limited to the precise structure described above and shown in the accompanying drawings, and various modifications and changes can be made without departing from its scope. The scope of this application is limited only by the appended claims.

Claims

1. A feeding assembly for use in a polysilicon reduction furnace, characterized in that, include: Multiple feed pipes (100) are connected to the air inlet of the reduction furnace chassis (30) of the polycrystalline silicon reduction furnace; A feed ring pipe (200) is provided on the side of the feed pipe (100) away from the reduction furnace chassis (30), and the feed pipe (100) is connected to the feed ring pipe (200); the feed ring pipe (200) is provided with a plurality of first discharge ports (210) and a plurality of second discharge ports (220), the first discharge ports (210) are provided on the side of the feed ring pipe (200) away from the reduction furnace chassis (30), and the second discharge ports (220) are provided on the side of the feed ring pipe (200) close to the reduction furnace chassis (30).

2. The feeding assembly according to claim 1, characterized in that, The feeding assembly is provided in two sets, namely a first feeding assembly (10) and a second feeding assembly (20); wherein, The first feeding assembly (10) includes a first feeding pipe (11) and a first feeding ring pipe (12) that are connected to each other. The second feeding assembly (20) includes a second feeding pipe (21) and a second feeding ring pipe (22) connected to each other; wherein the first feeding ring pipe (12) and the second feeding ring pipe (22) are arranged coaxially, and the inner diameter of the first feeding ring pipe (12) is smaller than the inner diameter of the second feeding ring pipe (22), and the length of the first feeding pipe (11) is greater than the length of the second feeding pipe (21).

3. The feeding assembly according to claim 1, characterized in that, Multiple first discharge ports (210) are arranged at intervals along the circumference of the feed ring pipe (200), with equal intervals between adjacent first discharge ports (210). Multiple second discharge ports (220) are arranged at intervals along the circumference of the feed ring pipe (200), with equal intervals between adjacent second discharge ports (220). The first discharge ports (210) and the second discharge ports (220) are arranged alternately along the circumference of the feed ring pipe (200).

4. The feeding assembly according to any one of claims 1 to 3, characterized in that, The feed pipe (100) includes: The first tube (110) is connected to the feed ring tube (200); The second tube (120) is connected to the first tube (110), and the second tube (120) is connected to the air inlet of the chassis (30) of the polysilicon reduction furnace.

5. The feeding assembly according to claim 4, characterized in that, The first tube (110) and the second tube (120) are detachably connected. When the first tube (110) and the second tube (120) are separated, the first tube (110) can be connected to the air inlet of the chassis (30) of the polysilicon reduction furnace.

6. The feeding assembly according to claim 4, characterized in that, The first tube (110) includes a first connecting segment (111), and the second tube (120) includes a second connecting segment (121). The second connecting segment (121) is sleeved on the outer periphery of the first connecting segment (111), and the second connecting segment (121) is telescopic relative to the first connecting segment (111).

7. The feeding assembly according to claim 6, characterized in that, The outer peripheral wall of the first connecting segment (111) is provided with external threads, and the inner peripheral wall of the second connecting segment (121) is provided with internal threads. The second connecting segment (121) is threadedly connected to the first connecting segment (111).

8. The feeding assembly according to claim 3, characterized in that, The feed ring pipe (200) further includes a first plug (230) and a second plug (240), the first plug (230) being used to block the first outlet (210), and the second plug (240) being used to block the second outlet (220).

9. The feeding assembly according to claim 3, characterized in that, The feed ring pipe (200) also includes a nozzle, which is located at the first discharge port (210) and the second discharge port (220).

10. A polycrystalline silicon reduction furnace, characterized in that, It includes the reduction furnace chassis (30) and the feeding assembly according to any one of claims 1 to 9, wherein the feeding assembly is disposed on the reduction furnace chassis (30).

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