A gallium nitride crystal growth rotating device
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- SHANDONG JINGSHENG ELECTRONIC TECH CO LTD
- Filing Date
- 2026-05-27
- Publication Date
- 2026-07-10
AI Technical Summary
In the prior art, the thickness of crystal material growth equipment is uneven. The vertical surface of the traditional graphite plate and the structure of the rotating device in the prior art crystal material growth equipment result in uneven thickness.
A gallium nitride crystal growth rotating device is used, which solves the problem of uneven thickness in the growth equipment of the crystal material by means of rotation, through the innovative points of the rotating device and the rotation method.
The meshing action of two bevel gears allows the tilted gallium nitride crystal growth device to come into contact with more atmosphere, resulting in a significant improvement in growth speed and thickness.
Smart Images

Figure CN224478175U_ABST