Cleaning device

Abstract

The utility model discloses a kind of cleaning devices for cleaning silicon wafer, and cleaning device includes: tank, for containing cleaning fluid and silicon wafer, tank is provided with liquid inlet and liquid outlet;Circulation pipeline, circulation pipeline includes liquid inlet pipeline and liquid outlet pipeline, liquid inlet pipeline is communicated in liquid inlet, liquid outlet pipeline is communicated in liquid outlet, and liquid outlet pipeline is communicated with liquid inlet pipeline;Filtering assembly, filtering assembly is set to liquid outlet pipeline, and filtering assembly is used to filter the cleaning fluid in liquid outlet pipeline.This application embodiment provides the cleaning device by the collaborative work of tank, circulation pipeline and filtering assembly, filter the foreign matter such as silicon wafer fragment in tank, prevent foreign matter from blocking circulation pipeline, realize the efficient circulation and filtration of cleaning fluid, improve the cleaning quality and efficiency of silicon wafer.

Description

Technical Field

[0001] This application relates to the field of battery production equipment technology, and in particular to a cleaning device. Background Technology

[0002] Cleaning equipment is widely used in many industrial fields such as semiconductors and photovoltaics. In the silicon wafer manufacturing process of the photovoltaic industry, cleaning equipment is widely used in a series of key processes such as cleaning and etching of silicon wafers. By reacting chemical solutions with the surface of silicon wafers, impurities and defects are removed, thereby improving the performance of silicon wafers. It is an important part of the entire silicon wafer manufacturing process.

[0003] However, during the operation of the cleaning unit's circulation system, the lack of an effective filtration device allows debris and foreign matter to easily enter the system. This debris and foreign matter can clog the circulation pipes, hindering liquid flow and affecting circulation efficiency. These problems not only lead to poor process quality and reduced product quality but also shorten the lifespan of the cleaning unit, increase the risk of shutdown, and cause numerous adverse effects on production. Utility Model Content

[0004] This utility model discloses a cleaning device that can filter foreign objects such as silicon wafer fragments in the cleaning tank, prevent foreign objects from clogging the circulation pipeline, and ensure the stability of the cleaning fluid circulation.

[0005] To achieve the above objectives, this utility model discloses a cleaning device for cleaning silicon wafers, the cleaning device comprising:

[0006] A tank for containing cleaning fluid and the silicon wafer, the tank being provided with an inlet and an outlet;

[0007] A circulation pipeline, comprising an inlet pipeline and an outlet pipeline, wherein the inlet pipeline is connected to the inlet port, the outlet pipeline is connected to the outlet port, and the outlet pipeline is connected to the inlet pipeline;

[0008] A filter assembly is disposed in the liquid outlet pipeline and is used to filter the cleaning liquid in the liquid outlet pipeline.

[0009] As an optional implementation, the filtration assembly includes: a connecting pipe communicating with the outlet pipe, the connecting pipe having an outlet section and an inlet section; a filter pipe, a first end of which is communicating with the outlet section, and a second end of which extends outward from the connecting pipe and is inclined relative to the connecting pipe, the sidewall of which is communicating with the inlet section; and a filter element disposed in the filter pipe so that the cleaning fluid passes through the filter element from the inlet section and is discharged from the outlet section, the filter element having filter holes for filtering the cleaning fluid.

[0010] As an optional implementation, the filter element is a cylindrical structure to form a filter cavity with open ends; the circumferential wall of the filter element is provided with a plurality of filter holes, which are arranged at intervals along the circumferential and length directions of the filter element; one end of the filter element is connected to the liquid outlet section, and the side wall of the filter element faces the liquid inlet section.

[0011] As an optional implementation, the filter hole is a polygonal hole with outwardly protruding sharp corners.

[0012] As an optional implementation, the filter element has an internal filter section disposed within the filter cavity; the internal filter section is a hollow conical structure with open ends, and the cross-sectional area of ​​the internal filter section gradually decreases along the direction from the liquid inlet end to the liquid outlet end of the filter pipeline, and the circumferential wall surface of the internal filter section is provided with a plurality of filter holes arranged in an array.

[0013] As an optional implementation, there are multiple internal filter sections, which are spaced apart within the filter chamber along the extension direction of the filter pipeline.

[0014] As an optional implementation, the filter assembly further includes a fastening connector, the fastening connector including a connecting part and a snap-fit ​​part connected to each other, the connecting part being sleeved on the liquid outlet end of the filter pipe and the connecting part being threadedly connected to the filter pipe, the snap-fit ​​part being configured to extend into the filter pipe and the snap-fit ​​part being configured to abut against the filter element so as to position the filter element within the filter pipe.

[0015] As an optional implementation, the portion of the inlet pipe located within the tank body is provided with multiple inlet holes, which are used to allow the cleaning fluid to enter the tank body.

[0016] As an optional implementation, the cleaning device further includes a cleaning connector disposed at one end of the liquid inlet pipe located within the tank body to block the liquid inlet pipe, and the cleaning connector is detachably connected to the liquid inlet pipe.

[0017] As an optional implementation, the outer peripheral surface of the cleaning connector is provided with an external thread, and the inner peripheral surface of the liquid inlet pipe is provided with an internal thread. The cleaning connector is connected to the liquid inlet pipe through the external thread and the internal thread.

[0018] Compared with the prior art, the beneficial effects of this application are:

[0019] The cleaning device provided in this application embodiment uses the coordinated operation of the tank, circulation pipeline and filter components to filter foreign objects such as silicon wafer fragments in the cleaning tank, prevent foreign objects from clogging the circulation pipeline, achieve efficient circulation and filtration of the cleaning solution, ensure the cleanliness and chemical stability of the cleaning solution, and make the cleaning solution act evenly on the silicon wafer surface, effectively remove impurities and defects on the silicon wafer surface, improve the cleaning quality and efficiency of silicon wafers, and thus improve the performance and reliability of silicon wafers. Attached Figure Description

[0020] To more clearly illustrate the technical solutions in the embodiments of this application, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0021] Figure 1 This is a schematic diagram of the cleaning device provided in the embodiments of this application;

[0022] Figure 2 This is a schematic diagram of the structure of the filtering component provided in the embodiments of this application;

[0023] Figure 3 This is a cross-sectional schematic diagram of the filtering component provided in an embodiment of this application;

[0024] Figure 4 This is a schematic diagram of the structure of the filter pipeline and connecting pipeline provided in the embodiments of this application;

[0025] Figure 5 This is an exploded view of the filter assembly provided in an embodiment of this application;

[0026] Figure 6 This is a schematic diagram of the structure of the filter element provided in the embodiments of this application;

[0027] Figure 7 This is a cross-sectional schematic diagram of the filter element provided in the embodiments of this application.

[0028] Explanation of reference numerals in the attached figures:

[0029] 100-Cleaning device; 1-Tank; 2-Circulation pipeline; 21-Inlet pipeline; 22-Outlet pipeline; 3-Filter assembly; 31-Connecting pipeline; 311-Outlet section; 312-Inlet section; 32-Filter pipeline; 33-Filter element; 331-Filter hole; 332-Filter chamber; 333-Inner filter section; 34-Fastening joint; 341-Connecting part; 342-Snap-fit ​​part; 4-Cleaning joint; 5-Circulation pump. Detailed Implementation

[0030] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0031] In this application, the terms "upper," "lower," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. These terms are primarily for the purpose of better describing this application and its embodiments, and are not intended to limit the indicated devices, elements, or components to having a specific orientation, or to be constructed and operated in a specific orientation.

[0032] Furthermore, in addition to indicating location or positional relationship, some of the aforementioned terms may also have other meanings. For example, the term "above" may also be used in some cases to indicate a certain dependency or connection relationship. Those skilled in the art can understand the specific meaning of these terms in this application based on the specific circumstances.

[0033] Furthermore, the terms "setup" and "connection" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral structure; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium, or an internal connection between two devices, components, or parts. Those skilled in the art can understand the specific meaning of these terms in this application based on the specific circumstances.

[0034] Furthermore, the terms "first," "second," etc., are primarily used to distinguish different devices, elements, or components (which may be the same or different in specific type and construction), and are not intended to indicate or imply the relative importance or quantity of the indicated devices, elements, or components. Unless otherwise stated, "a plurality of" means two or more.

[0035] Cleaning equipment is widely used in numerous industrial fields such as semiconductors and photovoltaics. In silicon wafer manufacturing, cleaning equipment is integral to a series of key processes, including cleaning and etching. In the cleaning process, the equipment uses a chemical solution to react with the silicon wafer surface, removing impurities, particles, and metallic contaminants. This provides a clean silicon wafer surface for subsequent high-precision processes such as photolithography and etching, ensuring that the wafer's quality and performance meet high standards. In the etching process, the cleaning equipment precisely controls the composition, concentration, temperature, and reaction time of the chemical solution to achieve precise control over the microstructure of the silicon wafer surface. This removes defect layers, improves the crystal structure and optical properties of the silicon wafer, and ultimately enhances its performance in solar cell conversion efficiency.

[0036] However, due to the lack of effective filtration devices in current cleaning equipment, various debris and foreign objects can easily enter the circulation system. These debris may originate from tiny silicon wafer fragments that have detached during silicon wafer processing due to mechanical stress or chemical reactions, or from components inside the cleaning equipment that have aged and detached due to long-term use; while foreign objects may be metal particles, dust particles, etc., that have been accidentally mixed in during silicon wafer manufacturing.

[0037] Once these fragments and foreign objects enter the circulation system, they may clog the circulation pipes, causing poor liquid flow and affecting the normal operation of the entire circulation system. This can prevent the cleaning or etching solution from acting evenly on the silicon wafer surface as required by the predetermined process, leading to process defects and reducing product quality. For example, it can cause incomplete cleaning or uneven etching of the silicon wafer surface, affecting the photoelectric performance and reliability of the silicon wafer.

[0038] Secondly, debris and foreign objects can damage the circulating pump, such as jamming the pump head impeller, reducing the pump's efficiency, increasing energy consumption and operating costs, and even directly damaging the impeller, rendering the pump unable to operate normally and forcing it to shut down for repairs or parts replacement. This affects production schedules, prolongs pump downtime, reduces production efficiency, and shortens the service life of the circulating pump and pipelines in the cleaning system.

[0039] In view of this, this application discloses a cleaning device that can filter foreign objects such as silicon wafer fragments in the cleaning tank, prevent foreign objects from clogging the circulation pipeline, and ensure the stability of the cleaning fluid circulation.

[0040] The technical solution of this application will be further described below with reference to the embodiments and accompanying drawings.

[0041] Please see Figure 1 , Figure 1This is a schematic diagram of the cleaning device 100 provided in the embodiments of this application. The present invention discloses a cleaning device 100 for cleaning silicon wafers. The cleaning device 100 includes: a tank 1 for containing cleaning fluid and silicon wafers, the tank 1 having an inlet and an outlet; a circulation pipeline 2, including an inlet pipeline 21 and an outlet pipeline 22, the inlet pipeline 21 being connected to the inlet, the outlet pipeline 22 being connected to the outlet, and the outlet pipeline 22 being connected to the inlet pipeline 21; and a filter assembly 3, disposed in the outlet pipeline 22, used to filter the cleaning fluid in the outlet pipeline 22.

[0042] The tank 1, as the basic component of the cleaning device 100, provides a closed and suitable cleaning space for the cleaning fluid and silicon wafers, ensuring that the cleaning process is carried out in a controllable environment, avoiding interference from external impurities, and facilitating the effective cleaning of silicon wafers.

[0043] Furthermore, the tank 1 is equipped with an inlet and an outlet, allowing the cleaning fluid to circulate between the tank 1 and the circulation pipeline 2, forming a dynamic cleaning fluid circulation system. This helps maintain the cleanliness and chemical stability of the cleaning fluid, thereby improving the cleaning effect.

[0044] The cleaning solution is transported from the inlet of tank 1 to the outlet pipe 22, realizing the circulation of the cleaning solution and ensuring that the cleaning solution can uniformly contact the silicon wafer surface, improving the uniformity and consistency of cleaning. The cleaning solution is then transported from the outlet of tank 1 to the filter assembly 3 and finally returned to the inlet pipe 21, so that the cleaning solution continuously circulates within the system.

[0045] It is understood that the circulation pipeline 2 can be connected to the circulation pump 5. The cleaning solution enters the circulation pump 5 from the outlet pipeline 22, and then the circulation pump 5 feeds the cleaning solution into the tank 1 from the inlet pipeline 21 for the cleaning process of the silicon wafers. The circulation pump 5, as the power source for the cleaning solution circulation, can stably provide the necessary pressure and flow rate for the cleaning solution in the pipeline, ensuring that the cleaning solution can circulate efficiently between the tank 1, the circulation pipeline 2, and the filter assembly 3 according to the predetermined process requirements. This helps maintain the dynamic balance of the entire cleaning system, allowing the cleaning solution to continuously contact the silicon wafer surface, improving cleaning efficiency and effectiveness.

[0046] The filter assembly 3 installed in the liquid outlet pipe 22 can effectively filter impurities such as fragments, particles, and metal ions in the cleaning liquid, preventing impurities from re-entering the tank 1 and contacting the silicon wafer, thereby avoiding damage such as scratches and contamination to the surface of the silicon wafer, improving the cleaning quality and purity of the silicon wafer, and helping to improve the performance and reliability of the silicon wafer.

[0047] The filter assembly 3 can also intercept larger foreign objects and debris, preventing them from entering the internal parts of the circulating pump 5 and other equipment. This avoids damage to the circulating pump 5 due to foreign objects jamming the pump head impeller, extends the service life of the circulating pump 5 and other equipment, reduces the maintenance cost and failure risk of the circulating pump 5, and improves the operational stability and reliability of the entire cleaning device 100.

[0048] It is understandable that the filter assembly 3 effectively protects equipment such as the circulation pump 5, preventing damage to the circulation pump 5 due to foreign objects entering, and reducing the failure rate and maintenance costs of the cleaning device 100. At the same time, the reasonable design of the circulation pipeline 2 also helps reduce the scouring and corrosion of the pipeline and circulation pump 5 by the liquid, further extending the service life of the entire cleaning device 100, improving the operational stability and reliability of the cleaning device 100, reducing production downtime caused by cleaning device 100 failures, and improving production efficiency.

[0049] The cleaning device 100 provided in this application embodiment, through the coordinated operation of the tank 1, the circulation pipeline 2 and the filter assembly 3, filters out foreign objects such as silicon wafer fragments in the cleaning tank 1, prevents foreign objects from clogging the circulation pipeline 2, realizes efficient circulation and filtration of the cleaning solution, ensures the cleanliness and chemical stability of the cleaning solution, and makes the cleaning solution act evenly on the silicon wafer surface, effectively removes impurities and defects on the silicon wafer surface, improves the cleaning quality and efficiency of the silicon wafer, and thus improves the performance and reliability of the silicon wafer.

[0050] Please see Figure 2 , Figure 3 and Figure 4 , Figure 2 This is a schematic diagram of the structure of the filter component 3 provided in the embodiments of this application. Figure 3 This is a cross-sectional schematic diagram of the filter component 3 provided in the embodiments of this application. Figure 4 This is a schematic diagram of the structure of the filter pipe 32 and the connecting pipe 31 provided in an embodiment of this application. In some embodiments, the filter assembly 3 includes: a connecting pipe 31, which is connected to the outlet pipe 22 and has an outlet section 311 and an inlet section 312; a filter pipe 32, the first end of which is connected to the outlet section 311 and the second end of which extends outward from the connecting pipe 31 and is inclined relative to the connecting pipe 31, the sidewall of which is connected to the inlet section 312; and a filter element 33, which is disposed in the filter pipe 32 so that the cleaning liquid passes through the inlet section 312 and is discharged from the outlet section 311, the filter element 33 having filter holes 331 for filtering the cleaning liquid.

[0051] The outlet section 311 serves as the discharge channel for the filtered cleaning solution, ensuring that the filtered cleaning solution can smoothly return to the circulation system after passing through the circulation pump 5, continuing to participate in the cleaning process and maintaining the cleanliness and circulation efficiency of the cleaning solution. The inlet section 312 is mainly responsible for guiding the unfiltered cleaning solution into the filter assembly 3, providing a stable fluid input for subsequent filtration operations and ensuring the orderly progress of the entire filtration process.

[0052] The first end of the filter pipe 32 is connected to the outlet section 311, ensuring the smooth discharge of the cleaning solution after filtration. The second end of the filter pipe 32 extends outward from the connecting pipe 31 and is inclined. This inclined layout utilizes the principles of gravity and fluid dynamics, making it less likely for impurities to accumulate in the pipe during filtration, facilitating impurity collection and subsequent cleaning. At the same time, the inclined filter pipe 32 also helps prevent filtered impurities from re-entering the cleaning solution due to fluid backflow or pressure changes, improving the stability and reliability of filtration.

[0053] Please see Figure 5 and Figure 6 , Figure 5 This is an exploded view of the filter component 3 provided in the embodiments of this application. Figure 6 This is a schematic diagram of the structure of the filter element 33 provided in the embodiments of this application. In some embodiments, the filter element 33 is a cylindrical structure to form a filter cavity 332 with open ends; the circumferential wall of the filter element 33 is provided with a plurality of filter holes 331, which are arranged at intervals along the circumferential and length directions of the filter element 33; one end of the filter element 33 is connected to the liquid outlet section 311, and the side wall of the filter element 33 faces the liquid inlet section 312.

[0054] The filter element 33 adopts a cylindrical structure, thus forming a filter chamber 332 open at both ends. This open-end design allows the liquid to flow smoothly within the filter element 33, and during filtration, the liquid is evenly distributed throughout the circumference and length of the filter element 33. The open-end design helps reduce liquid accumulation and pressure changes within the filter element 33, ensuring the continuity and efficiency of the filtration process. Simultaneously, the cylindrical structure of the filter element 33 facilitates installation and fixation within the filter pipeline 32, improving the assembly efficiency and stability of the entire filter assembly 3.

[0055] The filter element 33 has multiple filter holes 331 on its circumferential wall surface, and these filter holes 331 are evenly spaced along the circumferential and length directions of the filter element 33. The uniform distribution of the multiple filter holes 331 in the circumferential and length directions allows the cleaning fluid to enter the filter chamber 332 from the opening connecting the filter element 33 and the liquid inlet section 312, and to pass through the filter element 33 evenly in all directions from the filter chamber 332. This avoids the problem of overload or blockage of local filter holes 331, and improves the uniformity of filtration and the overall filtration efficiency.

[0056] In addition, the uniform distribution of multiple filter holes 331 in the circumferential and length directions increases the effective filtration area of ​​the filter element 33, enhances the filtration capacity, and can more effectively filter out impurities in the cleaning solution, ensuring that the cleanliness of the cleaning solution meets the requirements for silicon wafer cleaning.

[0057] Please see Figure 6 In some embodiments, the filter orifice 331 is a polygonal orifice with outwardly protruding sharp corners. The special geometry of the polygonal orifice gives the filter orifice 331 a larger relative filtration area. Compared with conventional circular orifices, the corners of the polygonal orifice can provide more tiny filtration channels, increasing the contact area between the cleaning fluid and the filter orifice 331, thereby improving filtration efficiency.

[0058] The outward-protruding sharp-angled structure can more effectively intercept and capture irregularly shaped impurities, such as broken silicon wafers, screws, and other foreign objects. The sharp-angled structure can penetrate to the edge of the impurities, preventing fragments and impurities from passing through the filter pores 331, thus improving filtration accuracy. At the same time, the complex structure of the polygonal pores makes it more difficult for impurities to form a clogging layer during the filtration process, reducing the possibility of the filter pores 331 being completely blocked and extending the service life of the filter element 33.

[0059] When filter element 33 needs cleaning or regeneration, the pointed structure of the polygonal pores helps to more easily remove trapped impurities during rinsing or other cleaning processes. The adhesion of impurities at the pointed corners is relatively weak, and cleaning can more effectively remove impurities from the filter pores 331, restoring the filtration performance of filter element 33, reducing the replacement frequency of filter element 33, and saving maintenance costs.

[0060] Optionally, the polygonal aperture can be a pentagonal star aperture, a hexagonal star aperture, a heptagonal star aperture, etc. A pentagonal star aperture has five outwardly protruding sharp points, each of which forms a unique filtering channel, effectively trapping debris and other foreign objects; a hexagonal star aperture has six sharp points, and its filtering function is also based on the number of sharp points and structural characteristics. As the number of sides increases, the shape of the polygonal star aperture becomes more complex and the edges become sharper, and the filtering effect and interception capacity also change accordingly.

[0061] Please see Figure 7 , Figure 7This is a cross-sectional schematic diagram of the filter element 33 provided in the embodiments of this application. In some embodiments, the filter element 33 has an inner filter section 333, which is disposed in the filter cavity 332; the inner filter section 333 is a hollow conical structure with open ends, and the cross-sectional area of ​​the inner filter section 333 gradually decreases along the direction from the liquid inlet end to the liquid outlet end of the filter pipe 32, and the circumferential wall surface of the inner filter section 333 is provided with a plurality of arrayed filter holes 331.

[0062] The internal filter section 333 adopts a hollow conical structure with open ends and is located within the filter chamber 332. This allows the internal filter section 333 to effectively guide the flow of the cleaning fluid within the filter chamber 332, while providing an additional filtration stage to further improve filtration efficiency and quality. The cross-sectional area of ​​the conical structure gradually decreases from the inlet end to the outlet end. This gradual decrease in cross-sectional area helps to progressively reduce the size of the filter holes 331 during the filtration process, achieving step-by-step interception of impurities and thus improving filtration accuracy.

[0063] The circumferential wall of the internal filtration section 333 is provided with a plurality of arrayed filter holes 331, which increases the total number of filter holes 331 and the filtration area, allowing more cleaning fluid to pass through the filter holes 331 and improving filtration efficiency. At the same time, the arrayed filter holes 331 can evenly distribute the flow pressure of the cleaning fluid, reduce the risk of overload of local filter holes 331, and extend the service life of the filter element 33.

[0064] Please see Figure 7 In some embodiments, there are multiple internal filter sections 333, which are spaced apart within the filter chamber 332 along the extension direction of the filter conduit 32. The multiple internal filter sections 333 spaced apart along the extension direction of the filter conduit 32 can form a multi-stage filtration system. The cleaning fluid passes through the multiple internal filter sections 333 sequentially, achieving step-by-step interception of impurities, improving filtration accuracy, better removing fragments and other foreign matter from the cleaning fluid, and ensuring the quality of silicon wafer cleaning.

[0065] Meanwhile, the arrangement of multiple internal filter sections 333 increases structural support within the filter chamber 332, improving the stability of the entire filter assembly 3. This allows the filter assembly 3 to maintain stable filtration performance under the impact of cleaning fluid, reducing the risk of deformation or damage to the filter element 33 due to fluid impact. Even if one internal filter section 333 malfunctions or becomes clogged, the other internal filter sections 333 can continue to operate, maintaining the normal operation of the filtration system, thereby improving the reliability and stability of the entire filtration system and reducing the risk of production interruption due to filter assembly 3 malfunction.

[0066] Optionally, the multiple internal filter sections 333 can be designed with different pore sizes or filtration precisions, forming a progressive filtration system from the large pore size at the front end for preliminary filtration to the small pore size at the rear end for fine filtration. This system can more effectively adapt to impurity particles of different sizes and further improve the filtration effect.

[0067] Please see Figure 3 and Figure 5 In some embodiments, the filter assembly 3 further includes a fastening connector 34, which includes a connecting portion 341 and a snap-fit ​​portion 342 connected to each other. The connecting portion 341 is sleeved on the liquid outlet end of the filter pipe 32 and is threadedly connected to the filter pipe 32. The snap-fit ​​portion 342 is configured to extend into the filter pipe 32 and is configured to abut against the filter element 33 so that the filter element 33 is positioned within the filter pipe 32.

[0068] The connecting part 341 of the fastening connector 34 and the liquid outlet end of the filter pipe 32 are connected by a thread. The threaded connection has a tight meshing structure with spiral teeth, which can withstand greater tensile and compressive forces, thereby ensuring the firmness of the connection between the filter assembly 3 and the filter pipe 32. During the operation of the cleaning device 100, the cleaning fluid will generate a certain pressure and impact force when flowing in the pipe. The threaded connection can prevent the filter assembly 3 from loosening or falling off, thus ensuring the stability of the filter assembly 3.

[0069] Meanwhile, the threaded connection has good sealing performance, which can effectively prevent the cleaning fluid from leaking at the connection, avoid resource waste and environmental pollution caused by liquid leakage, and improve the operating efficiency and safety of the equipment.

[0070] The connecting part 341 is sleeved on the liquid outlet end of the filter pipe 32, and the snap-fit ​​part 342 extends into the filter pipe 32 and abuts against the filter element 33, thus positioning the filter element 33 within the filter pipe 32. During the filtration process, the flow of the cleaning fluid will exert a certain impact force on the filter element 33, and the abutting action of the snap-fit ​​part 342 can effectively prevent the filter element 33 from shifting or shaking within the pipe, ensuring that the filter element 33 is always in the correct working position. This helps to improve the stability and consistency of the filtration effect, and can also reduce problems such as uneven filtration or localized reduction in filtration efficiency that may be caused by the displacement of the filter element 33.

[0071] Please see Figure 1 In some embodiments, the portion of the liquid inlet pipe 21 located inside the tank 1 is provided with multiple liquid inlet holes, which are used to allow the cleaning fluid to enter the tank 1.

[0072] The portion of the liquid inlet pipe 21 located inside the tank 1 is designed with multiple liquid inlet holes. These multiple inlet holes allow the cleaning liquid to be evenly sprayed into the tank 1 in a multi-point distribution manner, effectively avoiding the direct impact of liquid on the silicon wafer surface that may be caused by a single liquid inlet. This prevents the silicon wafer from being displaced or damaged due to the impact of local strong water flow, ensuring that the silicon wafer remains stable during the cleaning process.

[0073] Meanwhile, the multi-point liquid inlet method improves the uniformity of the cleaning solution distribution in the tank 1, enabling the cleaning solution to quickly and evenly fill the entire space of the tank 1, thereby ensuring that each silicon wafer can come into contact with the same flow rate and velocity of the cleaning solution at the same time, thus achieving a consistent cleaning effect and improving the uniformity and efficiency of cleaning.

[0074] Furthermore, multiple inlet holes prevent the formation of localized eddies and stagnant areas in the cleaning solution within tank 1. Eddies can lead to uneven chemical reactions on the silicon wafer surface, and even cause quality problems such as silicon wafer etching, while stagnant areas can cause impurities and contaminants to accumulate, reducing the cleaning effect. Uniformly distributed inlet holes help create a smooth and orderly liquid flow, promoting uniform replenishment of the cleaning solution and ensuring the stability and reliability of the cleaning process.

[0075] Please see Figure 1 In some embodiments, the cleaning device 100 further includes a cleaning connector 4, which is disposed at one end of the liquid inlet pipe 21 located inside the tank 1 to block the liquid inlet pipe 21. The cleaning connector 4 is detachably connected to the liquid inlet pipe 21.

[0076] The cleaning connector 4 is located at the end of the liquid inlet pipe 21 inside the tank 1. It can effectively block the liquid inlet pipe 21, prevent the cleaning liquid from flowing out from this port, and ensure that the liquid enters the tank 1 evenly through multiple designed liquid inlet holes, thereby improving the uniformity of the cleaning liquid distribution.

[0077] Meanwhile, the cleaning connector 4 and the inlet pipe 21 are detachably connected. When cleaning, maintenance, or replacement of the inlet pipe 21 is required, the cleaning connector 4 can be quickly disassembled to directly operate on the inside of the inlet pipe 21, improving maintenance efficiency and reducing downtime. Specifically, the detachable design of the cleaning connector 4 allows maintenance personnel to easily perform internal inspections and cleaning of the inlet pipe 21 regularly or when necessary, promptly identifying and addressing any potential blockages or impurity deposits, ensuring the unobstructed flow of the inlet pipe 21 and the normal operation of the inlet port.

[0078] In some embodiments, the outer peripheral surface of the cleaning connector 4 is provided with an external thread, and the inner peripheral surface of the liquid inlet pipe 21 is provided with an internal thread. The cleaning connector 4 is connected to the liquid inlet pipe 21 through the external thread and the internal thread.

[0079] The outer circumferential surface of the cleaning connector 4 is provided with external threads, and the inner circumferential surface of the liquid inlet pipe 21 is provided with internal threads. The tight connection is achieved through the cooperation of the internal and external threads, ensuring that the cleaning fluid will not leak from the connection and guaranteeing the normal operation of the cleaning device 100. The threaded connection has good self-locking performance, which can ensure that the cleaning connector 4 remains stable during the operation of the cleaning device 100 and will not loosen due to vibration or fluid impact.

[0080] In addition, the detachable threaded connection design facilitates the maintenance and cleaning of the inlet pipe 21. When it is necessary to clean, maintain or replace the inlet pipe 21, simply unscrew the cleaning connector 4 to perform the operation, without having to disassemble the entire inlet pipe 21, which greatly reduces maintenance time and workload.

[0081] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this application, and are not intended to limit them. Although this application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application.

Claims

1. A cleaning apparatus for cleaning silicon wafers, characterized in that, The cleaning device includes: A tank for containing cleaning fluid and the silicon wafer, the tank being provided with an inlet and an outlet; A circulation pipeline, comprising an inlet pipeline and an outlet pipeline, wherein the inlet pipeline is connected to the inlet port, the outlet pipeline is connected to the outlet port, and the outlet pipeline is connected to the inlet pipeline; A filter assembly is disposed in the liquid outlet pipeline and is used to filter the cleaning liquid in the liquid outlet pipeline.

2. The cleaning device according to claim 1, characterized in that, The filtering component includes: A connecting pipeline, which is connected to the liquid outlet pipeline, has a liquid outlet section and a liquid inlet section; The filter pipe has a first end connected to the liquid outlet section and a second end extending outward from the connecting pipe, and the filter pipe is inclined relative to the connecting pipe. The side wall of the filter pipe is connected to the liquid inlet section. A filter element is disposed in the filter pipeline so that the cleaning liquid passes through the filter element from the inlet section and is discharged from the outlet section. The filter element has filter holes for filtering the cleaning liquid.

3. The cleaning device according to claim 2, characterized in that, The filter element is a cylindrical structure to form a filter cavity with open ends; The filter element has a plurality of filter holes on its circumferential wall surface. The plurality of filter holes are arranged at intervals along the circumferential and length directions of the filter element. One end of the filter element is connected to the liquid outlet section, and the side wall of the filter element faces the liquid inlet section.

4. The cleaning device according to claim 3, characterized in that, The filter hole is a polygonal hole with outwardly protruding sharp corners.

5. The cleaning device according to claim 3, characterized in that, The filter element has an internal filtration section, which is disposed within the filter cavity; The internal filter section is a hollow conical structure with open ends. Along the direction from the liquid inlet end to the liquid outlet end of the filter pipe, the cross-sectional area of ​​the internal filter section gradually decreases, and the circumferential wall of the internal filter section is provided with a plurality of filter holes arranged in an array.

6. The cleaning apparatus according to claim 5, characterized in that, The number of internal filter sections is multiple, and the multiple internal filter sections are spaced apart in the filter cavity along the extension direction of the filter pipeline.

7. The cleaning device according to claim 2, characterized in that, The filtering component also includes: A fastening connector includes a connecting part and a snap-fit ​​part that are connected to each other. The connecting part is sleeved on the liquid outlet end of the filter pipe and is threadedly connected to the filter pipe. The snap-fit ​​part is configured to extend into the filter pipe and is configured to abut against the filter element so that the filter element is positioned within the filter pipe.

8. The cleaning apparatus according to any one of claims 1-7, characterized in that, The portion of the liquid inlet pipe located within the tank body is provided with multiple liquid inlet holes, which are used to allow the cleaning fluid to enter the tank body.

9. The cleaning apparatus according to claim 8, characterized in that, The cleaning device also includes a cleaning connector, which is located at one end of the liquid inlet pipe inside the tank to block the liquid inlet pipe. The cleaning connector is detachably connected to the liquid inlet pipe.

10. The cleaning apparatus according to claim 9, characterized in that, The cleaning connector has an external thread on its outer circumferential surface and an internal thread on its inner circumferential surface. The cleaning connector is connected to the inlet pipe through the external thread and the internal thread.

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