A CVD machine frame
By designing the transmission components and frame structure of the CVD rack, the problem of low space utilization in existing equipment has been solved, enabling modular assembly and independent control, thereby improving the space utilization and ease of maintenance of the equipment.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- SUZHOU SAISEN ELECTRONICS TECH
- Filing Date
- 2025-08-08
- Publication Date
- 2026-07-24
AI Technical Summary
Existing CVD equipment suffers from low rack space utilization, resulting in excessive size, unclear connection divisions, and difficulty in modular expansion and maintenance.
A CVD rack was designed, comprising a transmission assembly, a frame, a sealed chamber, and a special gas cabinet. The process chambers are mounted in seven mounting positions, enabling modular assembly and independent control, and enhancing the compatibility of the process chambers.
It improves space utilization, supports independent control and maintenance of various process chambers, facilitates modular upgrades, reduces equipment maintenance costs, and extends service life.
Smart Images
Figure CN224548540U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of CVD equipment technology, and in particular to a CVD rack. Background Technology
[0002] Chemical vapor deposition (CVD) is a technology that uses gaseous compounds or mixtures of compounds to react chemically on a heated substrate surface, creating a non-volatile coating. In CVD and etching equipment, the frame, as the core load-bearing structure, directly impacts the equipment's operating efficiency and ease of maintenance due to the compatibility of its process chambers, its modularity, and the stability of its electrical system.
[0003] However, in the existing technology, because its interfaces and pipelines are centrally installed, the interface area is crowded. In order to accommodate complex connection relationships, the rack has to increase the overall frame size, resulting in unclear connection division of various functional modules in the CVD rack, low rack space utilization, and problems such as excessive size and difficulty in modification and expansion.
[0004] Therefore, a new CVD rack is needed to solve the problem of low rack space utilization in existing CVD equipment. Utility Model Content
[0005] The purpose of this application is to provide a new CVD rack that can solve the problem of low rack space utilization in existing CVD equipment.
[0006] To achieve the above objectives, the embodiments of this application adopt the following technical solutions:
[0007] The system includes: a frame containing a transmission assembly; the transmission assembly includes a housing with a transmission cavity in the middle, an opening at the top, and a drive device at the bottom; seven mounting positions on each side of the housing, each mounting position having a connecting plate with an insertion slot, five of which have process chambers; a rocker arm within the transmission cavity, with a support arm for rotation, and a positioning plate at the end of the support arm; the drive device drives the rocker arm to rotate, causing the positioning plate to pass through the insertion slot, the positioning plate being used to place a wafer; two sealed chambers on the left side of the frame, each containing a sealed chamber, which communicates with the corresponding connecting plate and mounting position; a special gas cabinet surrounding the top right side of the frame, connected to the mounting positions via connecting pipes; and five of the seven mounting positions of the transmission assembly for mounting the process chambers.
[0008] Furthermore, the frame includes several beams, columns, and bases, which are connected and fixed to the bases by bolts or welding.
[0009] Furthermore, the frame includes a base plate, a left frame, and a right frame; a low-voltage electrical control cabinet is located on one side of the right frame, and a high-voltage electrical control cabinet is located on the other side, with the low-voltage electrical control cabinet and the high-voltage electrical control cabinet arranged separately on the left and right sides.
[0010] Furthermore, the base plate is provided with several crossbeams; a support component one is provided in the middle of the base plate, which consists of four columns and is used to support the transmission component; two sets of support components two are provided on the left side of the base plate, each set of support components two includes three columns and is used to support the sealed chamber; a support frame one is also provided on the base plate, which consists of several columns and crossbeams, the height of its columns is one-third of the height of the columns of the previous support component two, and some of the crossbeams are in contact with the columns of support component two, for auxiliary support of the transmission component.
[0011] Furthermore, there are five special gas cabinets, three of which are located on the crossbeam at the top right end of the frame, and the other two are located at the front right and rear right ends of the top of the frame, respectively.
[0012] Furthermore, a robotic arm hoisting module is provided at the top of the frame, and a second support frame is provided at the top of the frame. The second support frame is used to support the robotic arm hoisting module and position it in the middle of the transmission assembly.
[0013] Furthermore, the robotic lifting module includes T-blocks, support rails, sliders, mounting plates, and fixing plates; there are four T-blocks, located at the four corner edges of the second support frame; there are two support rails, which are connected and fixed to the second support frame by bolts; the sliders are set on the support rails, and the mounting plates are fixed on the sliders; the fixing plates are vertically set on the right side of the mounting plates, with a bent part at the top, which is fixed to the right end face of the mounting plates by bolts, and the bottom of the mounting plates has elastic pins that connect to the second support frame.
[0014] Furthermore, a miniature hoist is provided at the bottom of the mounting plate.
[0015] Furthermore, the opening of the housing is provided with a sealing cap, and the edge of the sealing cap is provided with a handle; the top edge of the housing is provided with a pressure cap assembly, which includes a pressure rod driven by a handwheel.
[0016] Furthermore, the connecting plate has a connecting cavity in the middle, an opening on one end face of the connecting plate, and a first insertion port on the other end face of the connecting plate. The process chamber has a corresponding second insertion port. The bottom of the connecting plate has a connecting hole that communicates with the connecting cavity. A support plate is fixed to the bottom of the connecting plate. A sealing plate connected by a connecting rod is provided on the support plate. The connecting rod passes through the connecting hole, and the sealing plate can move within the connecting cavity to cover the first insertion port.
[0017] The technical effects are as follows:
[0018] The transmission assembly consists of seven mounting positions, five of which can accommodate up to five process chambers, and two sealed chambers serve as loadlock chambers. The process chambers are highly compatible, and different types of CVD chambers or etching chambers can be mounted according to actual needs. Each process chamber can be independently controlled and can be modularly assembled, maintained, and upgraded. Attached Figure Description
[0019] Figure 1 This is a top view of the CVD rack of this utility model.
[0020] Figure 2 This is a schematic diagram of the frame structure of the CVD rack of this utility model.
[0021] Figure 3 This is a schematic diagram of the transmission assembly of the CVD rack of this utility model.
[0022] Figure 4 This is a schematic diagram of the connection plate of the CVD rack of this utility model.
[0023] Figure 5 This is a schematic diagram of the process chamber of the CVD rack of this utility model.
[0024] In the attached diagram: 1. Frame, 2. Transmission assembly, 3. Robotic lifting module, 4. Special gas cabinet, 5. High-voltage control cabinet, 6. Low-voltage control cabinet, 7. Connecting plate;
[0025] 101. Support frame one; 102. Support component one; 103. Support component two; 104. Foot; 105. Support frame two; 201. Shell; 202. Process chamber; 203. Sealed chamber; 204. Sealing cover; 205. Transmission chamber; 206. Drive mechanism; 207. Swing arm.
[0026] 701. Connecting cavity; 702. Insertion port one; 703. Sealing plate; 704. Support plate;
[0027] 2021, Process cavity; 2022, Insertion port two; 2023, Ejector pin;
[0028] 2041, handle;
[0029] 2071. Connecting arm; 2072. Support arm; 2073. Positioning plate. Detailed Implementation
[0030] To make the objectives, technical solutions, and advantages of this utility model clear and complete, the embodiments of this utility model will be further described in detail below with reference to the accompanying drawings. It should be understood that the specific embodiments described herein are only some, not all, embodiments of this utility model, and are merely used to explain the embodiments of this utility model. They are not intended to limit the embodiments of this utility model. All other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this utility model.
[0031] In the description of this utility model, it should be noted that the terms "center," "middle," "upper," "lower," "left," "right," "inner," "outer," "top," "bottom," "side," "vertical," and "horizontal," etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the accompanying drawings and are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model. Furthermore, the terms "a," "first," "second," "third," "fourth," "fifth," and "sixth" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.
[0032] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.
[0033] For purposes of simplicity and illustration, the principles of the embodiments are described primarily by way of example. In the following description, numerous specific details are set forth to provide a thorough understanding of the embodiments. However, it will be apparent to those skilled in the art that these embodiments may not be limited to these specific details in practice. In some instances, well-known methods and structures have not been described in detail to avoid unnecessarily obscuring these embodiments. Furthermore, all embodiments can be used in combination with each other.
[0034] Example 1:
[0035] like Figure 1 , Figure 2 and Figure 3As shown in this embodiment, the problem with current CVD equipment—its precision and complexity, numerous components, difficult installation, and complex wiring and gas pipelines—leads to the following common issues with CVD equipment racks: 1. They are generally large in size, occupying a significant amount of space in cleanrooms; 2. The connections between functional modules are unclear, wiring is messy, and the limited space within the rack is wasted; 3. Equipment maintenance and upgrades are inconvenient, making modular upgrades or expansions difficult. Chemical Vapor Deposition (CVD) technology utilizes gaseous compounds or mixtures of compounds to undergo chemical reactions on the heated surface of a substrate, thereby generating a non-volatile coating. CVD is mainly applied in two directions: 1. Preparing coatings to improve and enhance the surface properties of materials or parts, improving their oxidation resistance, wear resistance, corrosion resistance, and certain electrical, optical, and tribological properties. 2. Developing novel structural materials. Currently, CVD technology is widely used in many fields, including protective films, microelectronics, solar energy utilization, fiber optic communication, superconductivity, and the preparation of new materials. Furthermore, in the preparation of powder materials, utilizing highly efficient and stable catalysts to promote the CVD powder preparation process, or combining it with physical methods, to prepare powder materials under low-temperature, high-vacuum conditions, is becoming a future direction for the development of chemical vapor deposition technology. These CVD equipment all require a reasonable rack layout structure to accommodate different process chambers, which can improve the quality and production efficiency of semiconductor wafer deposition, reduce maintenance costs, and extend equipment lifespan. Based on this, CVD racks with layout structures that address the above issues include:
[0036] A CVD rack for chemical vapor deposition includes a frame 1, within which a transmission assembly 2 is installed. The transmission assembly 2 includes a housing 201, a transmission cavity 205 in the middle of the housing 201, an opening at the top of the housing 201, and a drive device 206 at the bottom of the housing 201. Seven mounting positions are provided on each side of the housing 201, and connecting plates 7 with slots are provided on the sides of each mounting position. Five of the connecting plates 7 have process chambers 2021 202. A rocker arm 207 is installed within the transmission cavity 205, and a support arm 2072 is rotatably mounted on the rocker arm 207. A positioning piece 2073 is positioned at the end of the support arm 2072. The drive device 206 drives the rocker arm 207 to rotate, thereby causing the positioning piece 2073 to pass through the slot. The positioning piece 2073 is used to place a wafer. Two sealed cabinets are located on the left side of the frame 1, each containing a sealed cavity 203, which is connected to the corresponding connecting plate 7 and mounting position. A special gas cabinet 4 is arranged around the top right side of the frame 1, and special gas pipes are connected to the mounting positions via connecting pipelines.
[0037] By setting up the transmission component 2, which consists of seven mounting positions, five of which can mount up to five process chambers 2021 202, and two sealed chambers 203 as loadlock chambers, the mounted process chambers 2021 202 have strong compatibility and can be equipped with different types of CVD chambers or etching chambers according to actual needs, so that each process chamber 2021 202 can be independently controlled and can be modularly assembled, maintained and upgraded.
[0038] Specifically, the bottom of the base plate is provided with feet 104 for support, and the rocker arm 20 and the support arm 2072 are connected by a connecting arm 2071 to ensure that the positioning piece 2073 has sufficient extension distance. Five special gas cabinets 4 are provided on the right side of the top of the frame 1, and three special gas cabinets 4 are provided on the right end crossbeam of the top of the frame 1, and one special gas cabinet 4 is provided on the right side of the front and rear ends of the top of the frame 1, so that they are arranged around the right side of the top of the frame 1, so that each process chamber 2021 202 has a corresponding special gas cabinet 4. Different process gases and pipeline structures are configured according to different process chambers 2021 202.
[0039] Specifically, frame 1 includes several crossbeams, columns and bases connected and fixed. The fixing methods include bolt connection and welding to form a stable frame 1 structure. The frame material is a high-strength, corrosion-resistant metal material to ensure its long-term reliability and durability.
[0040] Specifically, frame 1 consists of a base plate, left frame 1 and right frame 1. A low-voltage electrical control cabinet is installed on one side of the right frame 1 and a high-voltage electrical control cabinet is installed on the other side, so that the low-voltage control cabinet 6 and the high-voltage control cabinet 5 are arranged separately on the left and right sides. The structure is compact and reasonable. The separate layout of high-voltage and low-voltage circuits helps to better select and use these devices, and ensures the stability and safety of the electrical system.
[0041] Specifically, the base plate is provided with several crossbeams, and a support component 102 is provided in the middle of the base plate. The support component 102 consists of four columns and is used to support the transmission component 2. A support component 203 is provided on the left side of the base plate. There are two sets of support components 203. Each set of support components 203 consists of three columns and is used to support the Loadlock chamber. The base plate is also provided with a support frame 101. The support frame 101 consists of several columns and crossbeams. The height of its columns is located at one-third of the height of the columns of the support component 203. Some of the crossbeams of the support frame 101 contact the columns of the support component 203 to assist in supporting the transmission component 2.
[0042] Specifically, the left frame 1 has two openings facing the two Loadlock chambers respectively, and the sliding doors of the Loadlock chambers extend out of these openings;
[0043] Specifically, a robotic arm hoisting module 3 is installed at the top of frame 1, and a support frame 2 105 is installed at the top of frame 1 to support the robotic arm hoisting module 3, positioning it in the middle of the transmission assembly 2. The robotic arm hoisting module 3 includes T-blocks, support rails, sliders, mounting plates, and fixing plates. There are four T-blocks, located at the four corner edges of the support frame. There are two support rails, which are fixed to the support frame 2 105 by bolts connected to the T-blocks. Sliders are installed on the support rails, and mounting plates are fixed on the sliders. A fixing plate is installed on the right side of the mounting plate. The fixing plate is vertically positioned and has a bent part at the top, which is fixed to the right end face of the mounting plate by bolts. The bottom of the fixing plate has a spring-loaded pin that connects to the support frame 2 105. A miniature hoist is also installed at the bottom of the mounting frame, allowing the robotic arm to be positioned in the middle of the transmission cavity. During installation or maintenance, the robotic arm can be removed by opening the cover from the top. The mounting plate has a load capacity of 200kg, which can meet the hoisting requirements of various semiconductor robotic arms, making the installation and maintenance of the robotic arm more convenient and stable.
[0044] Specifically, the transmission assembly 2 includes a housing 201 with an opening at the top, a transmission cavity 205 in the middle of the housing 201, a sealing cover 204 at the opening of the housing 201, a wrench at the edge of the sealing cover 204, and a pressure cover assembly at the top edge of the housing 201. The pressure cover assembly includes a pressure rod driven by a handwheel and is located between the mounting positions of the two corresponding Loadlock chambers.
[0045] Specifically, the connecting plate 7 has a connecting cavity 701 in the middle, an opening on one end face and a socket 702 on the other end face, and a connecting hole at the bottom of the connecting plate 7, which communicates with the connecting cavity 701; a support plate 704 is fixedly installed at the bottom of the connecting plate 7, and a sealing plate 703 is provided on the support plate 704 through a connecting rod. The connecting rod passes through the connecting hole, so that the sealing plate 703 is located in the connecting cavity 701, and the sealing plate 703 can be driven to cover the socket 702, thereby sealing the process cavity 2021 chamber 202;
[0046] Specifically, the process chamber 2021 is located in the middle of the chamber 202, and an end cap is located on the top. The process chamber 2021 is equipped with a ejector pin 2023. On one side of the process chamber 2021, there is a second insertion port 2022 corresponding to the insertion port 702 of the connecting plate 7, so that the CVD rack can combine various functional modules to meet the various functional requirements of the vapor deposition equipment and ensure the smooth progress of the vapor deposition process.
[0047] Although the illustrative specific embodiments of this application have been described above to enable those skilled in the art to understand this application, this application is not limited to the scope of the specific embodiments. For those skilled in the art, all applications utilizing the concept of this application are protected as long as various variations are within the spirit and scope of this application as defined and determined by the appended claims.
Claims
1. A CVD rack, characterized in that, include: A frame, within which a transmission assembly is provided; The transmission assembly includes a housing, a transmission cavity in the middle of the housing, an opening at the top of the housing, and a driving device at the bottom of the housing; Each side of the housing is provided with seven mounting positions, and each mounting position is provided with a connecting plate with a socket, wherein five of the connecting plates are provided with process chambers. The transmission cavity is provided with a rocker arm, the rocker arm is rotatably provided with a support arm, and the end of the support arm is provided with a positioning piece. The driving device is used to drive the rocker arm to rotate so that the positioning piece can pass through the first insertion slot. The positioning piece is used to place the wafer. The frame has two sealed chambers on the left side, each containing a sealed cavity, which is connected to the corresponding connecting plate and mounting position respectively. A special gas cabinet is provided around the top right side of the frame, and the special gas cabinet is connected to the installation position through connecting pipes; Of the seven mounting positions of the transmission assembly, five are used to mount the process chamber.
2. The CVD rack according to claim 1, characterized in that, The frame includes several beams, columns, and a base, which are connected to the base by bolts or welds.
3. A CVD rack according to claim 1, characterized in that, The frame includes a base plate, a left frame, and a right frame; a low-voltage electrical control cabinet is provided on one side of the right frame, and a high-voltage electrical control cabinet is provided on the other side, with the low-voltage electrical control cabinet and the high-voltage electrical control cabinet arranged separately on the left and right sides.
4. A CVD rack according to claim 3, characterized in that, The base plate is provided with several crossbeams; a support component one is provided in the middle of the base plate, the support component one consists of four columns, which is used to support the transmission component; two sets of support components two are provided on the left side of the base plate, each set of support components two includes three columns, which is used to support the sealed chamber; a support frame one is also provided on the base plate, the support frame one consists of several columns and crossbeams, the height of its columns is one-third of the height of the columns of the previous support component two, and some of the crossbeams are in contact with the columns of the support component two, which is used to assist in supporting the transmission component.
5. A CVD rack according to claim 3, characterized in that, The number of special gas cabinets is five, three of which are located on the crossbeam at the top right end of the frame, and the other two are located at the front right and rear right ends of the top of the frame, respectively.
6. A CVD rack according to claim 1, characterized in that, The top of the frame is provided with a robotic arm hoisting module, and the top of the frame is provided with a second support frame, which is used to support the robotic arm hoisting module and position it in the middle of the transmission assembly.
7. A CVD rack according to claim 6, characterized in that, The robotic lifting module includes T-blocks, support rails, sliders, mounting plates, and fixing plates. There are four T-blocks, located at the four corner edges of the second support frame. There are two support rails, which are bolted to the T-blocks and fixed to the second support frame. The sliders are mounted on the support rails, and the mounting plates are fixed to the sliders. The fixing plate is vertically positioned on the right side of the mounting plate, with a bent portion at its top, which is bolted to the right end face of the mounting plate. The bottom of the mounting plate has an elastic pin that connects to the second support frame.
8. A CVD rack according to claim 7, characterized in that, The mounting plate has a miniature hoist at its bottom.
9. A CVD rack according to claim 1, characterized in that, The housing has a sealing cover at its opening, and a handle is provided on the edge of the sealing cover; a pressure cap assembly is provided on the top edge of the housing, and the pressure cap assembly includes a pressure rod driven by a handwheel.
10. A CVD rack according to claim 1, characterized in that, The connecting plate has a connecting cavity in the middle, an opening on one end face, and a first insertion port on the other end face. The process chamber has a corresponding second insertion port. The bottom of the connecting plate has a connecting hole that communicates with the connecting cavity. A support plate is fixed to the bottom of the connecting plate. A sealing plate connected by a connecting rod is provided on the support plate. The connecting rod passes through the connecting hole, and the sealing plate can move within the connecting cavity to cover the first insertion port.