A rack for ALD process

Abstract

The utility model provides a kind of for ALD process's rack, it is related to the field of semiconductor technology. Including: upper fixed plate, lower fixed plate and the four vertical arrangement's rack that is surrounded in the upper fixed plate with lower fixed plate perimeter side;Wherein: each rack includes vertically extending support main body, the support main body is spaced apart with multiple layers of support portion extending towards the interior of rack along height direction, to be carried substrate by the support portion of four rack same height together, and positioning step is set on each support portion top surface to be used to realize substrate self-positioning. By the scheme, the rack is more lightweight, and more suitable for mechanical hand handling and more conducive to realizing the uniformity of gas.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor equipment technology, and more specifically, to a material rack for use in ALD processes that is adapted for handling by robotic arms. Background Technology

[0002] In semiconductor and new energy thin film deposition processes, atomic layer deposition (ALD) technology is widely used due to its excellent film uniformity and step coverage capabilities. In ALD processes, the substrate holder, as a key device for carrying the substrate, directly affects process efficiency and product quality. Existing substrate holders typically employ a single-layer, manually stacked configuration, consisting of multiple carrier disks and spacers, with each layer of spacers connected to the carrier disks in series via a mandrel to form an integrated structure. While this design meets basic substrate carrying requirements, it has several shortcomings in practical applications. For example, the complex structure and limited airflow channels of traditional substrate holders can significantly obstruct the flow of process gases, leading to airflow turbulence and affecting the uniformity of film deposition. Furthermore, traditional substrate holders rely on manual operation for substrate loading and unloading, making them unsuitable for the robotic handling requirements of modern automated production lines, thus limiting production efficiency. Simultaneously, during robotic operation, the lack of effective positioning and anti-escape designs makes substrates prone to displacement or slippage, further increasing the risk of process failure. Utility Model Content

[0003] This utility model discloses a material rack for the ALD process, which aims to solve the problems mentioned above.

[0004] The present invention adopts the following solution:

[0005] A rack for ALD (Alternating Discharge) process includes: an upper fixed plate, a lower fixed plate, and four vertically arranged racks surrounding the upper and lower fixed plates; wherein each rack includes a vertically extending support body, the support body having multiple layers of support portions extending toward the interior of the rack at intervals along the height direction, the support portions at the same height on the four racks jointly supporting the substrate, and a positioning step is provided on the top surface of each support portion for self-positioning of the substrate.

[0006] Furthermore, the positioning step includes a positioning protrusion, and the positioning protrusion has a downwardly inclined side on the side facing the inside of the material rack for auxiliary positioning.

[0007] Furthermore, the inclination angle of the hypotenuse is 55° to 65°.

[0008] Furthermore, a preset spacing is formed between two adjacent support layers, and a hollow section is formed between the support body and the positioning step.

[0009] Furthermore, the width of the supporting body is less than 8mm.

[0010] Furthermore, the width of the support portion of the rack is less than 5 mm.

[0011] Furthermore, the rack is made of titanium alloy.

[0012] Furthermore, the upper and lower ends of the four racks are connected to the upper and lower fixing plates by welding.

[0013] Furthermore, two racks of the four racks are symmetrically arranged on each of the left and right sides of the material rack, and the angular distance between two adjacent racks on the left and right sides is greater than the angular distance between two racks on the same side, so that the robot arm can be adapted to extend between two adjacent racks on the left and right sides.

[0014] Beneficial effects:

[0015] This design employs four vertically arranged racks with multiple layers of support sections. These four supports, at the same height, support the substrate, and positioning protrusions are incorporated into the supports to prevent the substrate from shifting to the side when placed on them. The arrangement of the four racks forms a multi-layered material rack, providing space for a robotic arm while eliminating the need for multiple layers of carrier trays, resulting in a simpler and lighter structure. Furthermore, the perforated sections allow for better airflow without turbulence, ensuring a stable and uniform flow of process gases. Attached Figure Description

[0016] Figure 1 This is a schematic diagram of the structure of a material rack for the ALD process according to an embodiment of the present invention;

[0017] Figure 2 This is a top view schematic diagram of a material rack used in the ALD process according to an embodiment of this utility model;

[0018] Figure 3 This is an enlarged structural diagram of the support part of a material rack for ALD process according to an embodiment of this utility model;

[0019] Reference numerals: Upper fixing plate 1, Lower fixing plate 2, Rack 3, Support body 31, Support part 32, Positioning protrusion 33, Inclined surface 331, Hollowed-out part 34, Base plate 4. Detailed Implementation

[0020] Combination Figures 1 to 3As shown, this embodiment provides a material rack for the ALD process, including: an upper fixed plate 1, a lower fixed plate 2, and four vertically arranged racks 3 surrounding the upper fixed plate 1 and the lower fixed plate 2; wherein, each rack 3 includes a vertically extending support body 31, and the support body 31 is provided with multiple layers of support parts 32 extending toward the inside of the material rack at intervals along the height direction, and the support parts 32 at the same height of the four racks 3 jointly support the substrate 4, and a positioning step is provided on the top surface of each support part 32 to realize the self-positioning of the substrate 4.

[0021] In this embodiment, the upper fixing plate 1 and the lower fixing plate 2 can be circular to facilitate the rotation of the material rack, and are respectively welded to the upper and lower ends of the rack 3 to form a stable support. Four racks 3 are provided, arranged around the periphery of the upper fixing plate 1 and the lower fixing plate 2, thus forming the main body of the material rack. Specifically, two racks 3 are symmetrically arranged on each of the left and right sides of the material rack, and the angular distance between two adjacent racks 3 on the left and right sides is greater than the angular distance between two racks 3 on the same side, so that the robot arm can be inserted between two adjacent racks 3 on the left and right sides. By dividing the four racks 3 into two groups and symmetrically arranging them on the left and right sides of the material rack, and setting a relatively large angular distance between the two racks 3 on the left and right sides, a larger insertion space can be provided. At the same time, the angular distance between two adjacent racks 3 on the left and right sides can provide space for the substrate 4 to enter and exit the material rack, preventing the support body 31 of the rack 3 from being too narrow and affecting the entry and exit of the substrate 4 and the robot arm.

[0022] Combination Figures 1 to 3 As shown, in this embodiment, the support portion 32 is provided with multiple layers along the height direction of the support body 31, for example, more than 50 layers. A certain distance is provided between adjacent support portions 32, and the support portion 32 extends a certain length towards the central axis inside the material rack to form a platform for supporting the substrate 4. The four racks 3 at the same height of the support portions 32 are used to jointly form a bearing platform for the substrate 4, to support the area of ​​the substrate 4 near the edge. The positioning step includes a positioning protrusion 33 provided on the platform, and the positioning protrusion 33 has a downwardly inclined edge on the side facing the inside of the material rack for auxiliary positioning. Specifically, the inclination angle of the inclined surface is 55° to 65°, preferably 60°. This inclined surface 331 serves both as a guide for the robotic arm when placing the substrate 4, and also allows the substrate 4 to automatically slide into the support platform 32 at the bottom of the inclined surface if the robotic arm's positioning is slightly off, for example, when placed on the inclined surface. Alternatively, it allows the substrate 4 to slide into the support platform 32 at the bottom of the inclined surface when the material rack vibrates, thus achieving the self-positioning and escape prevention of the substrate 4 mentioned above. The four positioning steps of the four racks 3 can position the substrate 4, preventing lateral displacement.

[0023] In this embodiment, a preset spacing is formed between two adjacent support layers 32, and a hollow portion 34 is formed between the support body 31 and the positioning step. When the robotic arm picks up the substrate, it enters from between the spacing of the two adjacent layers and lifts the substrate 4 to a height higher than the positioning protrusion 33, allowing it to be moved and removed horizontally. It should be noted that the formation of this hollow portion 34 allows for better airflow without generating turbulence, stabilizing the flow direction of the actual process gas and achieving better uniformity. Compared with the existing tray structure, this design saves more material and makes the material rack lighter.

[0024] In a preferred embodiment, the width of the support body 31 is less than 8 mm; the width of the support portion 32 of the rack 3 is less than 5 mm. This smaller width design minimizes airflow obstruction, allowing airflow to pass through the openwork areas without generating turbulence, thus stabilizing the flow direction of the actual process gas and achieving better uniformity. The rack 3 can be made entirely of titanium alloy, which is lightweight while providing strength to accommodate the larger openwork design.

[0025] The solution in this embodiment makes the material rack lighter, more suitable for robotic arm handling, and more conducive to achieving gas uniformity.

[0026] It should be understood that the above are only preferred embodiments of the present utility model, and the protection scope of the present utility model is not limited to the above embodiments. All technical solutions that fall within the scope of the present utility model are protected by the present utility model.

[0027] The accompanying drawings used in the above description of the embodiments only show some embodiments of the present invention and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained from these drawings without creative effort.

Claims

1. A material rack for ALD process, characterized in that, include: An upper fixing plate, a lower fixing plate, and four vertically arranged racks surrounding the upper and lower fixing plates; wherein: Each of the racks includes a vertically extending support body, which has multiple layers of support portions extending toward the inside of the rack at intervals along the height direction. The support portions at the same height on the four racks are used to jointly support the substrate, and a positioning step is provided on the top surface of each support portion to achieve self-positioning of the substrate.

2. The material rack for the ALD process according to claim 1, characterized in that, The positioning step includes a positioning protrusion, and the positioning protrusion has a downwardly inclined side on the side facing the inside of the material rack to assist in positioning.

3. The material rack for the ALD process according to claim 2, characterized in that, The inclination angle of the hypotenuse is 55° to 65°.

4. The material rack for the ALD process according to claim 1, characterized in that, A preset spacing is formed between two adjacent support layers, and a hollow section is formed between the support body and the positioning step.

5. The material rack for the ALD process according to claim 1, characterized in that, The width of the supporting body is less than 8mm.

6. The material rack for the ALD process according to claim 1, characterized in that, The width of the support portion of the rack is less than 5 mm.

7. The material rack for the ALD process according to claim 1, characterized in that, The rack is made of titanium alloy.

8. The material rack for the ALD process according to claim 1, characterized in that, The upper and lower ends of the four racks are connected to the upper and lower fixing plates by welding.

9. The material rack for the ALD process according to claim 1, characterized in that, The four racks are symmetrically arranged in twos on each of the left and right sides of the material rack, and the angular distance between two adjacent racks on the left and right sides is greater than the angular distance between two racks on the same side, so that the robot arm can be adapted to reach between two adjacent racks on the left and right sides.

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