A super-fast response pressure type mass flow controller
By employing laminar flow elements and dual sensors in the pressure-type mass flow controller, combined with a stacked layout of the mounting base, the problem of slow response speed caused by excessive gas flow channel space is solved, thereby improving flow accuracy and response speed and meeting the high-precision process requirements of semiconductor manufacturing.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- CHANGZHOU GAOKAI ELECTRONICS CO LTD
- Filing Date
- 2025-08-21
- Publication Date
- 2026-07-24
AI Technical Summary
The distributed layout of sensors, laminar flow unit devices, and valve control components in existing pressure-type mass flow controllers results in excessively large gas flow channel space, prolonging the pressure wave transmission time, causing slow system response speed, flow control delay, and making it difficult to meet the stringent requirements for flow stability in high-precision processes such as semiconductor manufacturing.
The system uses laminar flow components to convert the gas into a laminar flow state, and uses dual sensors to monitor the pressure before and after the laminar flow. The components are integrated in a stacked layout of the mounting base, which compresses the flow channel space, shortens the pressure wave transmission path, and improves the system response speed.
It ensures flow accuracy and improves system response speed, meeting the flow stability requirements of high-precision processes such as semiconductor manufacturing, and reducing process debugging time and production capacity loss.
Smart Images

Figure CN224553693U_ABST