A cleaning solution preparation device for semiconductor processing
By combining the inclined perforated plate and multi-angle blade design with internal and external heating components, the problems of material accumulation and uneven mixing are solved, achieving efficient and uniform mixing of the cleaning solution and temperature uniformity, thus improving the preparation quality.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- ZHEJIANG JINGBANG PHOTOELECTRIC TECH CO LTD
- Filing Date
- 2025-09-05
- Publication Date
- 2026-08-04
AI Technical Summary
In existing semiconductor processing cleaning fluid preparation devices, materials tend to accumulate, leading to uneven mixing. Furthermore, the traditional feed inlet design results in low mixing efficiency, failing to meet the requirements for uniformity of cleaning fluid components and temperature.
The design employs a combination of inclined perforated plates, multi-angled upper and lower blades, and internal and external heating components to achieve uniform material distribution and temperature uniformity. The inclined perforated plates initially disperse the materials, while the multi-angled blade stirring components improve mixing efficiency, and internal and external heating eliminates temperature deviations.
This method achieves uniform mixing of the cleaning solution components, improves stirring efficiency, avoids local concentration differences and temperature inconsistencies, and ensures the high-efficiency preparation quality of the cleaning solution.
Smart Images
Figure CN224585792U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of cleaning fluid preparation, and specifically to a cleaning fluid preparation apparatus for semiconductor processing. Background Technology
[0002] In semiconductor chip manufacturing, cleaning fluid is a crucial auxiliary material. Its core function is to remove contaminants such as photoresist, metal ions, and particulate impurities remaining on the wafer surface after photolithography, etching, and deposition processes. This directly determines the cleanliness of the wafer, which in turn affects the circuit precision, conductivity, and final product yield of subsequent chips. Cleaning fluids are often multi-component complex systems (containing solvents, chelating agents, surfactants, etc.). If the stirring is uneven during preparation, it can lead to large local concentration differences among the components, reducing the cleaning fluid's impurity removal capacity. Furthermore, traditional cleaning fluid preparation devices often have a direct-fall inlet design, causing materials to accumulate on one side of the tank due to gravity after entering, preventing even dispersion inside the tank. This necessitates more time and energy for the stirring components to disperse the accumulated material, reducing stirring efficiency. Utility Model Content
[0003] This invention provides a device for preparing cleaning fluid for semiconductor processing to address the problems of existing technologies.
[0004] The objective of this utility model can be achieved through the following technical solution: A semiconductor processing cleaning fluid preparation device includes: a tank, a top cover, a stirring assembly, and a heating assembly. The top cover is located at the upper end of the tank, and the upper end of the top cover has a feed inlet. The bottom of the tank has a discharge outlet. The stirring assembly includes a motor, a stirring shaft, an upper blade, and a lower blade. The motor is located at the upper end of the top cover, and the stirring shaft is connected to the output end of the motor. The upper blades are fixed at intervals on the stirring shaft, and each set of upper blades has a different inclination angle. The lower blade is fixed to the bottom end of the stirring shaft. The heating assembly includes an outer tank and an inner coil. The outer tank is arranged around the outside of the tank. The two ends of the inner coil are located outside the outer tank. The inner coil is arranged in an S-shape inside the tank. An inclined perforated plate is provided inside the tank below the feed inlet. A channel is provided between the lower end of the inclined perforated plate and the right side of the tank interior.
[0005] In a further improvement, the upper right side of the outer tank is provided with a liquid inlet, and the lower left side of the outer tank is provided with a liquid outlet. The beginning and end of the inner coil pass through the tank and the outer tank in sequence to the outside. The beginning of the inner coil is connected to a second liquid inlet, and the end of the inner coil is connected to a second liquid outlet. The upper blade and the lower blade are located in the middle of the inner coil inside the tank.
[0006] As a further improvement, a sampling port that passes through the outer tank is provided on the bottom left side of the tank body.
[0007] In a further improvement, the upper blades are provided in three sets, with the inclination angles of the three sets of upper blades increasing sequentially from top to bottom, and the lower blade has a U-shaped cross-section.
[0008] In a further improvement, the upper and lower blades are fitted onto the stirring shaft and fixedly connected by bolts.
[0009] Compared with the prior art, the advantages of this invention's semiconductor processing cleaning solution preparation apparatus are as follows: The inclined perforated plate completely solves the problem of material accumulation. After the material enters the tank, it can be quickly dispersed to the upper and lower areas. The upper blades and the lower blades at different angles are arranged in layers. The stirring force of different flow fields is adapted to the material in different areas, which greatly improves the uniformity of component mixing and avoids local concentration differences. The internal and external synergistic heating eliminates the temperature deviation of the material in the tank, so that each component can fully dissolve and react at a suitable temperature, improving the overall stirring and mixing efficiency. Attached Figure Description
[0010] Figure 1 This is a structural schematic diagram of the present invention. In the diagram, 1-tank body, 11-outlet, 12-inclined perforated plate, 121-channel, 13-sampling port, 2-top cover, 21-inlet, 3-stirring assembly, 31-motor, 32-stirring shaft, 33-upper blade, 34-lower blade, 4-heating assembly, 41-outer tank body, 411-inlet one, 412-outlet one, 42-inner coil, 421-inlet two, 422-outlet two. Detailed Implementation
[0011] In the description of this utility model, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the accompanying drawings and are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model; unless otherwise expressly specified and limited, the terms "installed," "connected," and "joined" should be interpreted broadly, for example, they can refer to fixed connections or detachable connections, etc. For those skilled in the art, the specific meaning of the above terms in this utility model can be understood according to the specific circumstances.
[0012] The following is a description of the embodiments and appendices. Figure 1 The technical solution of this utility model will be further described below.
[0013] Example 1 A semiconductor processing cleaning fluid preparation apparatus includes: a tank 1, a top cover 2, a stirring assembly 3, and a heating assembly 4. The top cover 2 is disposed at the upper end of the tank 1, and has a feed inlet 21 at its upper end. The tank 1 has a discharge outlet 11 at its bottom. The stirring assembly 3 includes a motor 31, a stirring shaft 32, upper blades 33, and lower blades 34. The motor 31 is disposed at the upper end of the top cover 2, and the stirring shaft 32 is connected to the output end of the motor 31. The upper blades 33 are fixed at intervals on the stirring shaft 32. The upper blades 33 have different tilt angles, and the lower blades 34 are fixed to the bottom end of the stirring shaft 32. The heating assembly 4 includes an outer tank 41 and an inner coil 42. The outer tank 41 is arranged around the outside of the tank 1. The two ends of the inner coil 42 are located outside the outer tank 41. The inner coil 42 is arranged in an S-shape inside the tank 1. The tank 1 is provided with an inclined mesh plate 12 located below the feed inlet 21. A channel 121 is provided between the lower end of the inclined mesh plate 12 and the right side of the inside of the tank 1.
[0014] like Figure 1 As shown, the working principle of this utility model is as follows: An inclined perforated plate is positioned directly below the feed inlet. After material falls from the inlet, it first contacts the surface of the inclined perforated plate. Some material falls directly through the mesh into the middle area of the tank, while the rest slides downwards along the inclined surface of the plate, eventually entering the lower part of the tank through the channel between the lower end of the perforated plate and the inner wall of the tank. This eliminates the accumulation problem associated with traditional direct-fall feeding, achieving a preliminary uniform distribution of material across the upper and lower areas of the tank.
[0015] The motor drives the stirring shaft to rotate at high speed, causing the upper and lower blades to move synchronously. The upper blades are fixed at different heights on the stirring shaft, and each set of upper blades has a different tilt angle. Blades at different heights can cover different spaces from the top to the middle of the tank, and different tilt angles can generate stirring flow fields in different directions. The lower blades are fixed at the bottom of the stirring shaft and can directly stir materials that are prone to deposit at the bottom of the tank (such as dense chelating agent particles), reducing material agglomeration at the bottom of the tank.
[0016] The heating assembly consists of an outer tank and an inner coil, both circulated with a heat transfer medium (such as water or heat transfer oil) for heating. The outer tank encloses the interior of the main tank, forming a jacketed heating space. As the heat transfer medium flows within the jacket, it heats the material inside the tank from the outside. The inner coil is arranged in an S-shape inside the main tank, covering most of the interior area. As the heat transfer medium flows within the coil, it directly contacts the material inside the tank for heat exchange, compensating for the temperature difference caused by external heating. This dual heating system ensures a uniform temperature rise for the material inside the tank, meeting the process requirements where some cleaning fluid components need to be dissolved and compounded at specific temperatures.
[0017] As a further preferred embodiment, the outer tank 41 has a liquid inlet 411 on the upper right side and a liquid outlet 412 on the lower left side. The inner coil 42 passes through the tank 1 and the outer tank 41 to the outside in sequence. The inner coil 42 has a liquid inlet 421 connected to its first end and a liquid outlet 422 connected to its second end. The upper impeller 33 and the lower impeller 34 are located in the middle of the inner coil 42 inside the tank 1. The heat medium enters the jacket from the liquid inlet 411 on the upper right side of the outer tank and flows downward naturally due to gravity, completely filling the jacket space between the outer tank and the outer tank. The inner coil extends from the first end to the second end through the tank body and then through the outer tank body to the outside. The two inlet ports and two outlet ports facilitate the connection of external heat medium supply equipment, enabling independent circulation of the heat medium inside the inner coil. At the same time, the upper and lower blades are confined to the middle area of the inner coil inside the tank body, which can prevent the blades from colliding and interfering with the S-shaped inner coil when rotating, thus ensuring the safe operation of the equipment.
[0018] As a further preferred embodiment, a sampling port 13 is provided on the bottom left side of the tank 1, passing through the outer tank 41. The bottom of the tank is the area where materials are most likely to settle, and the state of the materials therein can directly reflect the overall preparation quality of the cleaning solution in the tank; the sampling port is located at the bottom of the tank, which can obtain the most representative sample and avoid detection deviations caused by taking samples from the upper layer of materials.
[0019] As a further preferred embodiment, the upper blades 33 are provided in three sets, with the inclination angles of the three sets of upper blades 33 increasing sequentially from top to bottom, and the lower blades 34 have a U-shaped cross-section.
[0020] The topmost blade has the smallest angle, stirring the lighter solvent-like materials in the upper layer to create a gentle flow field, preventing excessive stirring and adhesion to the tank wall. The middle blade has a medium angle, stirring the middle layer of mixture, balancing shear force and flow velocity, and promoting the initial fusion of different components. The bottommost blade has the largest angle, generating stronger shear force to break up easily agglomerated materials in the lower layer, preventing the formation of small clumps. The three sets of blades form a layered, progressive stirring pattern, covering the entire space from the top to the middle of the tank. The U-shaped lower blade's arc profile conforms to the arc of the tank bottom, reaching deep into the bottom edge area of the tank, stirring up edge deposits that traditional straight blades cannot reach, preventing materials from sticking to the tank wall or clumping.
[0021] In a further preferred embodiment, the upper blade 33 and the lower blade 34 are sleeved on the stirring shaft 32 and fixedly connected by bolts. Blade replacement is simple, significantly reducing equipment maintenance costs.
[0022] The preferred embodiments of this utility model have been described in detail above. It should be understood that those skilled in the art can make numerous modifications and variations based on the concept of this utility model without creative effort. Therefore, all technical solutions that can be obtained by those skilled in the art based on the concept of this utility model through logical analysis, reasoning, or limited experimentation on the basis of existing technology should be within the scope of protection defined by the claims.
Claims
1. An apparatus for preparing a cleaning solution for semiconductor processing, characterized in that, include: The tank comprises a tank body, a top cover, a stirring assembly, and a heating assembly. The top cover is located at the top of the tank body and has a feed inlet at its upper end. The tank body has a discharge outlet at its bottom. The stirring assembly includes a motor, a stirring shaft, upper blades, and lower blades. The motor is located at the top of the top cover, and the stirring shaft is connected to the output end of the motor. The upper blades are fixed at intervals on the stirring shaft, and each set of upper blades has a different inclination angle. The lower blades are fixed to the bottom end of the stirring shaft. The heating assembly includes an outer tank body and an inner coil. The outer tank body surrounds the outside of the main tank body. The two ends of the inner coil are located outside the outer tank body. The inner coil is arranged in an S-shape inside the tank body. An inclined perforated plate is located below the feed inlet inside the tank body, and a channel is provided between the lower end of the inclined perforated plate and the right side of the tank body.
2. The semiconductor processing cleaning solution preparation apparatus according to claim 1, characterized in that, The outer tank has a liquid inlet on the upper right side and a liquid outlet on the lower left side. The first and second ends of the inner coil pass through the tank and the outer tank to the outside in sequence. The first end of the inner coil is connected to a second liquid inlet, and the second end of the inner coil is connected to a second liquid outlet. The upper and lower blades are located in the middle of the inner coil inside the tank.
3. The semiconductor processing cleaning solution preparation apparatus according to claim 1, characterized in that, The bottom left side of the tank has a sampling port that passes through the outer tank.
4. The semiconductor processing cleaning solution preparation apparatus according to claim 1, characterized in that, The upper blades are provided in three sets, with the tilt angle of the three sets of upper blades increasing sequentially from top to bottom, and the lower blade has a U-shaped cross-section.
5. The semiconductor processing cleaning solution preparation apparatus according to claim 1, characterized in that, The upper and lower blades are fitted onto the stirring shaft and are fixedly connected by bolts.