A pressure mechanism for planar polishing of optical elements
By designing a planar polishing and pressurizing mechanism for optical components that combines multiple positioning plates, sockets, and plugs, the problem of uneven pressurization for optical components of different sizes was solved, achieving uniform pressurization and pressure regulation, thereby improving the polishing effect and work efficiency.
Patent Information
- Application Number
- CN202522151540.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-10-11
- Publication Date
- 2026-09-11
- Estimated Expiration
- 2035-10-11
AI Technical Summary
In the process of polishing optical components, existing technologies make it difficult to apply uniform pressure to components of different sizes, resulting in uneven pressure and affecting the polishing effect. Furthermore, when processing large-sized components, multiple pressure plates are required, which increases labor costs and processing complexity.
An optical element planar polishing and pressurizing mechanism was designed. It adopts a combination of multiple positioning plates, holes and plugs. Through the adjustable spacing between the weight block and the chassis and the slot structure, uniform pressurization of elements of different sizes can be achieved. The weight block is fixed by the slot to increase the pressure uniformity.
It achieves uniform pressure on optical components of different sizes, improves polishing effect, reduces manpower and processing costs, and increases work efficiency.