Multi-channel etch endpoint detection apparatus
CN309791528SActive Publication Date: 2026-02-13SHANGHAI CHEYITIAN TECH CO LTD
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Patent Information
- Application Number
- CN202530191344.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-10
- Publication Date
- 2026-02-13
- Estimated Expiration
- 2040-04-10
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Figure 000007_ABST
Abstract
1. The name of the design product: multi-channel etching endpoint detection device. 2. The use of the design product: for the detection of multi-channel etching endpoint in semiconductor process. 3. The design points of the design product: in the combination of shape and pattern. 4. The picture or photo that best shows the design points: perspective view.
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