Atomic layer deposition equipment
CN309963627SActive Publication Date: 2026-05-05XIAMEN YUNMAO TECH CO LTD
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- XIAMEN YUNMAO TECH CO LTD
- Filing Date
- 2025-10-16
- Publication Date
- 2026-05-05
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Figure 000006_ABST
Abstract
1. Name of the product in this design: Atomic Layer Deposition Equipment. 2. Application of this design: Used for preparing thin films with atomic precision on substrate surfaces. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: 3D view 1. 5. The bottom surface of this product is a part that is not easily seen or cannot be seen during use, so the bottom view is omitted.
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