Measuring system with position and orientation tracking using patterns of light rays

Abstract

A measurement system is provided for use with a motion system that moves an end tool. The measurement system includes a sensor configuration, a light beam source configuration, and a processing section. The light beam source configuration directs a first pattern of light beams and a second pattern of light beams onto light beam sensors to indicate a position and orientation of the light beam source configuration. The first pattern of light beams has a lower density of light beams compared to the second pattern of light beams. Measurement signals from the light beam sensors are processed to determine a position and orientation of the light beam source configuration. The light beams of the first pattern and the light beams of the second pattern have at least one different characteristic (e.g., wavelength, polarity, timing, etc.).) which makes it possible to distinguish light rays of the first pattern from the light rays of the second pattern.

Description

STATE OF THE ART

[0001] The present disclosure relates to measurement and motion systems, in particular to a measurement system that can be used with a motion system, such as a robot, for tracking position and orientation. Description of related technology

[0002] Manufacturing, workpiece inspection, and other processes often utilize mechanical motion systems to perform certain functions. For example, robotic systems or other motion systems may be used to move an end-tool to perform certain operations (e.g., related to workpiece inspection, manufacturing, etc.). Various types of robots may be used for certain applications, including articulated robots, SCARA (Selective Compliance Articulated Robot Arm) robots, Cartesian robots, cylindrical robots, spherical robots, etc. As an example of components that may be included in a robot, a SCARA robot system (which may, for example, be a type of articulated robot system) may typically include a base with a first arm portion rotationally coupled to the base and a second arm portion rotationally coupled to one end of the first arm portion.In various configurations, an end tool may be coupled to one end of the second arm section (e.g., to perform certain work and / or inspection operations). Such systems may include position sensors (e.g., rotary encoders) used to determine / control the positioning of the arm sections and, accordingly, the positioning of the end tool. In various implementations, such systems may have a positioning accuracy of approximately 100 micrometers, which is limited by certain factors (e.g., the rotary encoder performance combined with the mechanical stability of the robot system, etc.).

[0003] U.S. Patent No. 4,725,965 (referred to herein as the '965 patent), which is incorporated by reference herein, discloses certain calibration techniques for improving the accuracy of a SCARA system. To calibrate a kinematic model, as described in the '965 patent, arm sections are placed in a first configuration to position an end tool over a fixed reference point. The arm sections are then placed in a second angular configuration to reposition the end tool in register with the reference point. The error in the kinematic model is calculated from the displacement of the end tool position from the reference point when the arm sections are switched from the first to the second angular configuration. The kinematic model is then compensated according to the calculated error. The steps are repeated until the error reaches zero, at which time the kinematic model of the SCARA robot is considered calibrated.As further described in the '965 patent, the calibration technique may involve the use of certain cameras.

[0004] While techniques such as those described in the '965 patent can be used to calibrate a robot system, in certain applications, it may be less desirable to use such techniques (e.g., they require significant time and / or may not provide a desired level of accuracy for all possible orientations of a robot during certain operations, etc.). A system that can provide improvements regarding such issues (e.g., to increase reliability, repeatability, speed, etc., position and orientation determination for processes such as workpiece measurements, manufacturing, etc.) would be desirable. SUMMARY

[0005] This Summary is provided to introduce, in a simplified form, a selection of concepts that are further described below in the Detailed Description. This Summary is neither intended to identify key features of the claimed subject matter nor to be used as an aid in determining the scope of the claimed subject matter.

[0006] According to one aspect, a measurement system is provided for use with a motion system that moves an end tool. The motion system includes a moveable configuration and a motion control system. The moveable configuration includes an end tool mounting configuration in which an end tool is configured to be mounted thereto. The motion control system is configured to control an end tool position and orientation based at least in part on control of the moveable configuration to move at least a portion of an end tool mounted to the end tool mounting configuration within a motion volume.

[0007] The measurement system includes a sensor configuration, a light beam source configuration, and a processing section. The sensor configuration includes a plurality of light beam sensors located at fixed positions, including at least a first light beam sensor at a first position and a second light beam sensor at a second position. The light beam source configuration is configured to direct a first pattern of light beams and a second pattern of light beams onto light beam sensors of the sensor configuration to indicate a position and orientation of the light beam source configuration.

[0008] The light beam source configuration is configured to be coupled to at least one of the end tools or the end tool mounting configuration. At least a portion of the light beams directed toward and received by the light beam sensors is configured to create measurement spots at positions on the light beam sensors, causing the light beam sensors to generate corresponding measurement signals. The first pattern of light beams has a lower density of light beams of the first pattern relative to the second pattern of light beams, which has a higher density of light beams of the second pattern. The processing section is configured to process the measurement signals from the light beam sensors of the sensor configuration to determine a position and orientation of the light beam source configuration.

[0009] The measurement system is configured such that for at least a first position of the light beam source configuration, which is a first distance from the first light beam sensor and a second distance from the second light beam sensor, the second distance being greater than the first distance: one or more light beams of the first pattern directed towards the first light beam sensor are used to cause the first light beam sensor to generate measurement signals for processing by the processing section, and light beams of the second pattern directed towards the first light beam sensor are not used to cause the first light beam sensor to generate measurement signals for processing by the processing section (e.g.wherein, in various implementations, the light beams of the second pattern and / or signals generated thereby have at least one of the following characteristics: blocked, filtered, unselected, or otherwise unused; and one or more light beams of the second pattern directed toward the second light beam sensor are used to cause the second light beam sensor to generate measurement signals for processing by the processing section. In various implementations, the light beams of the first pattern and the light beams of the second pattern have at least one different characteristic (e.g., wavelength, polarity, timing, etc.) that allows the light beams of the first pattern to be distinguished from the light beams of the second pattern.

[0010] According to another aspect, a method for operating the measurement system including the light beam source configuration is provided. The method includes operating the light beam source configuration to direct a first pattern of light beams and a second pattern of light beams onto light beam sensors of a sensor configuration to indicate a position and orientation of the light beam source configuration. The first pattern of light beams has a lower density of light beams of the first pattern relative to the second pattern of light beams, which has a higher density of light beams of the second pattern.The method further includes processing measurement signals from the light beam sensors of the sensor configuration to determine a position and orientation of the light beam source configuration, wherein: for at least a first position of the light beam source configuration, which is a first distance from the first light beam sensor and a second distance from the second light beam sensor, the second distance being greater than the first distance: one or more light beams of the first pattern directed toward the first light beam sensor are used to cause the first light beam sensor to generate measurement signals for processing to determine the position and orientation, and light beams of the second pattern directed toward the first light beam sensor are not used to cause the first light beam sensor to generate measurement signals for processing to determine the position and orientation (e.g.wherein, in various implementations, the light beams of the second pattern and / or signals generated thereby have at least one of the following properties: blocked, filtered, unselected, or otherwise unused); and one or more light beams of the second pattern directed toward the second light beam sensor are used to cause the second light beam sensor to generate measurement signals for processing to determine position and orientation.

[0011] In various implementations, the method further includes receiving position information from the motion system that moves the end tool, the position information from the motion system indicating, with motion system accuracy, a first distance of the light beam source configuration from the first light beam sensor, and based at least in part on the first distance as indicated by position information from the motion system, the light beams of the second pattern directed toward the first light beam sensor are not used to cause the first light beam sensor to generate measurement signals for processing to determine the position and orientation. BRIEF DESCRIPTION OF THE DIFFERENT VIEWS OF THE DRAWINGS Fig. 1 is a block diagram of a first exemplary implementation of a motion and measurement system; Fig. Figure 2 is a block diagram of the control and processing sections of the system of Fig. 1; Fig. 3 is a diagram of a first exemplary implementation of a light beam source portion of a light beam source configuration as used in the system of Fig. 1 can be used; Fig. 4A and Fig. 4B are diagrams of respective motion volumes surrounded by respective measurement frame volumes defined at least in part by respective sensor configurations; Fig. 5A-5H are diagrams illustrating four example light beams of a light beam source configuration and corresponding measurement spots on four sensors of a sensor configuration for different positions and orientations of the light beam source configuration; Fig. 6A-6C are diagrams illustrating twelve exemplary light beams of a light beam source configuration and corresponding measurement spots on four sensors of a sensor configuration for different positions and orientations of the light beam source configuration; Fig. 7A and Fig. 7B are diagrams illustrating a first arrangement of measurement spots formed on a sensor having a light beam source configuration at first and second distances from the sensor, respectively; Fig. 8A and Fig. 8B are diagrams illustrating a second arrangement of measurement spots as formed on a sensor having a light beam source configuration at first and second distances from the sensor, respectively; Fig. 9A and Fig. 9B are diagrams illustrating a light beam source configuration at a first distance and a second distance, respectively, from a light beam sensor and providing a first pattern of light beams; Fig. 10A and Fig. 10B are diagrams illustrating a light beam source configuration at a first distance and a second distance, respectively, from a light beam sensor and providing a second pattern of light beams; Fig. 11A and Fig. 11B are diagrams illustrating a light beam source configuration at a first and second distance from first and second light beam sensors and providing first and second patterns of light beams; Fig. 12 is a diagram of a first exemplary implementation of a light beam source portion of a light beam source configuration as may be used to provide a first and second pattern of light beams; Fig. Figure 13 is a diagram of a color filter arrangement such as may be used to filter patterns of light rays; Fig. 14 is a diagram of a second exemplary implementation of a light beam source portion of a light beam source configuration as may be used to provide first and second patterns of light beams; Fig. 15 is a diagram of a third exemplary implementation of a light beam source portion of a light beam source configuration as may be used to provide a first and second pattern of light beams; and Fig. 16 is a flowchart illustrating an example implementation of a routine for operating a measurement system. DETAILED DESCRIPTION

[0012] Fig. 1 shows a block diagram of a first exemplary implementation of a motion and measurement system 100, which includes a motion system 110 and a measurement system 150. The motion system 110 (e.g., an articulated robot) includes a movable configuration MAC (e.g., a movable arm configuration) and a motion control and processing system 140. The measurement system 150 includes a sensor configuration 160, a light beam source configuration LC, and a position and orientation processing section 190 of the measurement system. In the configuration of Fig. 1, the light beam source configuration LC (e.g., illustrated as directing the arrowed light beams in various directions, including toward the light beam sensors S1 and S2) is coupled to the end tool ETL. As described in more detail below, the measurement system 150 can be used to track a position and orientation (e.g., of the end tool ETL moved by the motion system 110).

[0013] In the example of Fig. 1, the movable configuration MAC includes a lower base section BSE, arm sections 121-125, movement mechanisms 131-135, position sensors SEN1-SEN5, and an end tool mounting configuration ETMC. In various implementations, some or all of the arm sections 121-125 may be mounted to respective movement mechanisms 131-135 at respective proximal ends of the respective arm sections 121-125. In the example of Fig. 1, some or all of the movement mechanisms 131-135 (e.g., rotary joints with corresponding motors) may enable movement (e.g., rotation) of the respective arm sections 121-125 (e.g., about respective rotation axes RA1-RA5). In various implementations, the position sensors SEN1-SEN5 (e.g., rotary encoders) may be used to determine the positions (e.g., angular orientations) of the respective arm sections 121-125.

[0014] In various implementations, the movable configuration MAC may include a portion referred to as an end portion (e.g., the fifth arm portion 125). In the example configuration of the Fig. 1, the end tool mounting configuration ETMC is located near (e.g., at) the distal end of the fifth arm portion 125 (e.g., referred to as an end portion), which corresponds to a distal end of the movable configuration MAC. In various alternative implementations, an end portion of a movable configuration may be a member (e.g., a rotatable member, etc.) that is not an arm portion, but at least a portion of the end portion corresponds to a distal end of the movable configuration at which the end tool mounting configuration ETMC is located.

[0015] In various implementations, the end-tool mounting configuration ETMC may include various elements for coupling and retaining the end-tool ETL proximate the distal end of the movable configuration MAC. For example, in various implementations, the end-tool mounting configuration ETMC may include an auto-hinge connection, a magnetic coupling portion, and / or other coupling elements as are known in the art for mounting an end-tool ETL to a corresponding element. The end-tool mounting configuration ETMC may also include electrical connections (e.g., a power connector, one or more signal lines, etc.) for providing power to and / or sending signals to and from at least a portion of the end-tool ETL (e.g., to and from the end-tool sensing portion ETSN).

[0016] In various implementations, the end tool ETL may include the end tool sensing section ETSN and an end tool stylus ETST having a contact point CP (e.g., for contacting a surface of a workpiece WP). The fifth motion mechanism 135 is located near the distal end of the fourth arm section 124. In various implementations, the fifth motion mechanism 135 (e.g., a rotary joint with a corresponding motor) may be configured to rotate the fifth arm section 125 about a rotation axis RA5. In some implementations, the fifth motion mechanism 135 may also or alternatively include another motion mechanism (e.g., a linear actuator) configured to move the fifth arm section 125 linearly (e.g., up and down). In any case, the end tool ETL is mounted to the end tool mounting configuration ETMC (e.g.,coupled) and has a corresponding end tool position ETP with corresponding coordinates (e.g., x, y, and z coordinates). In various implementations, the end tool position ETP may correspond to or be near the position of the end tool mounting configuration ETMC (e.g., at or near the distal end DE5 of the fifth arm section 125, which may correspond to the distal end of the movable configuration MAC).

[0017] Fig. 2 is a block diagram of control and processing sections 200 of the system of Fig. 1, which include a motion control system 140 (which may also be, for example, a processing system) and which include at least portions of an external control system (ECS). The motion control and processing system 140 is configured to control the end tool position ETP of the end tool ETL with an accuracy defined as a motion system accuracy. More specifically, the motion control and processing system 140 is generally configured to control the coordinates (e.g., x, y, and z coordinates) of the end tool position ETP with the motion system accuracy based at least in part on the use of the motion mechanisms 131-135 and position sensors SEN1-SEN5 to detect and control the positions of the arm sections 121-125.In various implementations, the motion control and processing system 140 may include motion mechanism control and sensing sections 141-145, each of which may receive signals from the respective position sensors SEN1-SEN5 to sense the positions (e.g., angular positions, linear positions, etc.) of the respective arm sections 121-125, and / or provide control signals to the respective motion mechanisms 131-135 (e.g., including motors, linear actuators, etc.) to move the respective arm sections 121-125.

[0018] The motion control and processing system 140 may also receive signals from the end tool sensing section ETSN. In various implementations, the end tool sensing section ETSN may include circuitry and / or configurations related to the operations of the end tool ETL (e.g., for sensing a workpiece WP, etc.). As described in more detail below, in various implementations, the end tool ETL (e.g., a touch probe, a scanning probe, a camera, etc.) may be used to contact or otherwise sense surface locations / positions / points on a workpiece WP, and various corresponding signals may be received, determined, and / or processed by the end tool sensing section ETSN, which may provide corresponding signals to the motion control and processing system 140.In various implementations, the motion control and processing system 140 may include an end-tool control and sensing section 146 that may provide control signals to and / or receive sensor signals from the end-tool sensing section ETSN. In various implementations, the end-tool control and sensing section 146 and the end-tool sensing section ETSN may be merged and / or indistinguishable.In various implementations, the motion mechanism control and sensing sections 141-145 and the end tool control and sensing section 146 may each provide outputs to and / or receive control signals from a position and orientation processing section 147 of the motion system, which may control and / or determine the overall positioning and orientation of the movable configuration MAC of the motion system 110 and the corresponding position and orientation of the end tool ETL as part of the motion control and processing system 140. In various implementations, the position of the end tool ETL may be referred to as the end tool position ETP.In general, the motion control system 140 is configured to control an end tool position and orientation based at least in part on the control of the movable configuration MAC to move at least a portion of the end tool ETL mounted to the end tool mounting configuration ETMC within a movement volume MV.

[0019] In various implementations, the measuring system 150 may be included in or otherwise added to a motion system 110 (e.g., as part of a retrofit configuration to complement an existing motion system 110, etc.). In general, the measuring system 150 may be used to provide a determination of the position and orientation of the end tool ETL (e.g., with improved accuracy relative to the accuracy of the motion system 110). More specifically, as described in more detail below, the measuring system 150 may be used to determine a relative position indicative of the measurement position coordinates of the end tool position ETP and an orientation of the end tool ETL with a level of accuracy better than the motion system accuracy.

[0020] In various implementations, the sensor configuration 160 of the measuring system includes 150 light beam sensors S1-S4. Fig. 1, the light beam sensors S1 and S2 are shown on the far left and right sides of the illustrated cross-sectional view, respectively, and the general positions of the light beam sensors S3 and S4 (which would be located, for example, outside and inside the side, respectively) are indicated by dashed lines. As will be described in more detail below, Fig. 4A is a three-dimensional view of a sensor configuration 160-4A with four light beam sensors and a similar structure to the sensor configuration 160 of Fig. 1.

[0021] The light beam sensors S1-S4 are located at fixed positions (e.g., they may each be located on a frame, a wall, or other structure, etc.) that at least partially define a measurement frame volume MFV. The measurement frame volume MFV is configured to be arranged around at least a portion of the movement volume MV (e.g., in which the at least a portion of the end tool ETL is moved by the movement system 110). The light beam source configuration LC is configured to be operated (e.g., by a control section 192 of the light beam source configuration) to direct light beams onto the light beam sensors S1-S4 of the sensor configuration 160 (e.g., to indicate a position and orientation of the light beam source configuration LC).

[0022] The light beam source configuration LC is configured to be coupled to at least one of the end tool ETL or the end tool mounting configuration ETMC. It will be understood that when the end tool ETL is coupled to the end tool mounting configuration ETMC, the light beam source configuration LC is coupled to both the end tool ETL and the end tool mounting configuration ETMC. The position and orientation of the light beam source configuration LC indicate the position and orientation of the end tool ETL. As will be described below with reference to the Fig. 5A-5H, the light beams directed at the light beam sensors S1-S4 are configured to generate measurement spots SP at positions on the light beam sensors, causing the light beam sensors to generate corresponding measurement signals. The position and orientation processing section 190 of the measuring system is configured to process the measurement signals of the light beam sensors S1-S4 of the sensor configuration 160, wherein the measurement signals of the light beam sensors S1-S4 indicate the position and orientation of the light beam source configuration LC and, accordingly, the end tool ETL.

[0023] In various implementations, the movement volume MV consists of a volume in which at least a portion of at least one of the end tool ETL and / or the light beam source configuration LC can be moved. In the example of Fig. 1, the motion volume MV is illustrated as a volume in which the contact point CP of the end tool ETL can be moved during workpiece inspection. As an alternative example, a motion volume may alternatively include a volume in which the light beam source configuration LC can move when the end tool ETL is moved to inspect a workpiece. In various implementations, the motion system 110 is configured to move the movable configuration MAC such that at least a portion of an end tool ETL (e.g., including the contact point CP) mounted on the end tool mounting configuration ETMC is moved along at least two dimensions (e.g., x and y dimensions) in the motion volume MV. In the example of Fig. 1, the portion of the end tool ETL (e.g., the contact point CP) is movable by the motion system 110 along three dimensions (e.g., x, y, and z dimensions).

[0024] In various implementations, a locking section 181 and / or the position and orientation processing section 190 of the measurement system and / or the control section 192 of the light beam source configuration may be included as part of an external control system (ECS) (e.g., as part of an external computer, etc.). The control section 192 of the light beam source configuration may provide power and / or control signals to the light beam source configuration LC and / or parts thereof (e.g., one or more light beam sources of the light beam source configuration LC, etc.). The locking section 181 may be included as part of a control and processing section 180 of the sensor configuration (e.g.,which can provide energy and / or receive measurement signals from and / or provide control signals to the light beam sensors S1-S4 of the sensor configuration 160 and which can provide such signals and / or other signals to and from the position and orientation processing section 190 of the measurement system).

[0025] In various implementations, the locking section 181 is configured to input at least one input signal related to the end tool position ETP and to determine the timing of a trigger signal based on the at least one input signal and to output the trigger signal to at least one position and orientation processing section 190 of the measuring system or the light beam sensors S1-S4 of the sensor configuration 160. In various implementations, the position and orientation processing section 190 of the measuring system and / or the sensor configuration 160 are configured to determine current measurement signals from the light beam sensors S1-S4 (e.g., corresponding to a current position and orientation of the light beam source configuration LC and / or the end tool ETL) in response to receiving the trigger signal.In various implementations, the position and orientation processing section 190 of the measuring system is configured to process the measurement signals according to the timing of the trigger signal to determine a position and orientation of the light beam source configuration LC and / or the end tool ETL at the time of the trigger signal.

[0026] In various implementations, after determining a position and orientation of the light beam source configuration LC, the position and orientation of the end tool can be determined accordingly (e.g., according to known geometric relationships, relative positioning, offsets, etc. between the light beam source configuration LC and the end tool ETL). In various implementations, the light beam source configuration LC can be mounted directly on the end tool ETL or mounted on or very close to the end tool mounting configuration (e.g., such that there is minimal or no distance between the end tool ETL and the light beam source configuration LC). In the implementation of Fig. 1, the light beam source configuration LC is illustrated as being at or at least near the end tool position ETP (e.g., a designated reference position for the end tool ETL). Such configurations can reduce the complexity and / or otherwise improve the accuracy of determining the position and orientation of the end tool ETL as calculated relative to a particular position and orientation of the light beam source configuration LC.

[0027] In various implementations, the determination of the position and orientation of the end tool ETL can further be used to determine certain additional position information (e.g., to determine the position of the contact point CP). As previously mentioned, in various implementations, measurements of a workpiece surface can be determined by touching a contact point CP of an end tool ETL with a workpiece surface. With respect to such measurements, both the position and orientation of the end tool ETL can be determined, which can accordingly indicate the position of the contact point CP.

[0028] In various implementations, different types of end tools ETL may provide different types of outputs that may be used with respect to the locking portion 181. For example, in an implementation where the end tool ETL is a touch probe used to measure a workpiece and that outputs a touch signal when it touches the workpiece (e.g., when the contact point CP touches the workpiece), the locking portion 181 may be configured to input this touch signal or a signal derived therefrom as the at least one input signal based on which the timing of a trigger signal is determined. In various implementations where the end tool ETL is a touch probe, a central axis of the touch probe may correspond to an end tool axis EA.As another example, in an implementation where the end tool ETL is a scanning probe used to measure a workpiece and provides respective workpiece measurement scan data corresponding to a respective scan timing signal, the locking portion 181 may be configured to input the respective scan timing signal or a signal derived therefrom as the at least one input signal. As another example, in an implementation where the end tool ETL is a camera used to provide a respective workpiece measurement image corresponding to a respective workpiece image capture signal, the locking portion 181 may be configured to input this workpiece image capture signal or a signal derived therefrom as the at least one input signal.

[0029] In various implementations, the measurement system 150 may be configured to determine the position and orientation of the light beam source configuration and / or the end tool ETL based on the measurement signals from the light beam sensors S1-S4 of the sensor configuration 160. It will be appreciated that such a system may have certain advantages over various alternative systems. For example, in various implementations, a system as disclosed herein may be smaller and / or less expensive and / or more accurate than certain alternative systems using alternative technologies (e.g., including certain photogrammetric systems, etc.), as may alternatively be used to track motion system positions and orientations.The disclosed system also does not occupy or obscure any part of the movement volume MV like alternative systems that may include a scale or reference mark on the floor or stage or other in the same area (e.g., in the movement volume MV) in which workpieces may otherwise be processed and / or inspected, etc.

[0030] In various implementations, a comparison between a photogrammetry system and the measurement system 150 disclosed herein can be described as follows. A photogrammetry system may use incoherent light sources to determine position, with cameras used to image the light sources. In some cases, position and angle can be calculated from the source positions. The effective "lever arm" for determining the angle is the distances between the sources. This is difficult to increase because it necessarily also increases the opposing lever arm between the source and the lower portion of the end tool (e.g., corresponding to a distance, such as along a direction of the end tool axis EA, between the source and the end tool contact point CP). In other words, photogrammetric configurations that seek to facilitate the measurement of the probe angle also make the end tool position more sensitive to that angle.In such systems, the field of view of the camera can be the entire working volume, corresponding to a low magnification.

[0031] In contrast, coherent light sources can typically be used in the measurement system 150 disclosed herein. For example, the light sources for the light beam source configuration LC can be coherent light sources (e.g., laser light sources), wherein the light beams can be coherent light beams (e.g., laser beams). Diffractive optical elements (as described, for example, below with reference to Fig. 3) can be used to generate many diffracted light beams (which can be scattered, for example, in many directions around the light source configuration LC). In various implementations, a relatively small fraction of the many diffracted or otherwise provided light beams can be directed to or otherwise received by the distributed light beam sensors of the measurement system 150 (e.g., to generate corresponding measurement spots SP on the light beam sensors). The light beam sensors, in various implementations, can be various types of cameras and / or two-dimensional position-sensitive sensors (e.g., lensless cameras, position-sensitive detectors, optical position sensors capable of measuring a position of a light spot in two dimensions on a sensor surface, etc.). In operation, the large lever arms (which can be(partially corresponding to the distances between the light beam source configuration LC and the light beam sensors S) allows for highly accurate measurements / determinations of alignment (e.g., corresponding to an angle of an end tool, etc.). Furthermore, the effective magnifications for such operations can be relatively high.

[0032] In various implementations, measurement signals from the light beam sensors (e.g., corresponding to images and / or indicating two-dimensional positions of measurement points SP formed by the light beams, where a center of gravity of each measurement point can be calculated / determined in XYZ coordinates) can be used in combination with the known features of the light beam source configuration LC (e.g., including laser projection based on the known geometric relationships of the light beams, including the relative three-dimensional angles of each light beam and taking into account any offsets of each light beam at its source, etc.) to calculate / determine the position and orientation (e.g., based on nonlinear least squares and / or other processing / calculation methods). In other words, the known vectors of the light beams can be projected to the known locations (e.g.,in XYZ coordinates) that they intersect on the light beam sensors (e.g., with respect to the positions of the measurement spots SP) to determine the position and orientation of the light beam source configuration LC. In various implementations, the measurement spots SP on the light beam sensors can each be uniquely identified (e.g., using, in part, coarse position information determined from the motion system 110 and / or based on unique or otherwise identifiable properties of the light beams, such as unique pattern information of the light beams, such as a pseudorandom pattern with unique or otherwise identifiable sections, etc.).

[0033] It will be appreciated that the combination of such features and characteristics of the measuring system 150 can result in more accurate position and orientation determinations than those provided by a photogrammetry system such as the one described above. As a particular advantage, the light beams used in the measuring system 150 have corresponding alignment information that is missing in photogrammetry and is more sensitive to alignment (e.g., the light beam source configuration LC and the end tool ETL). This can greatly increase accuracy.

[0034] Fig. Figure 3 shows a diagram of a first exemplary implementation of a light beam source section LP1' of a light beam source configuration LC (which may, for example, be similar to the light beam source configuration LC used in the system of Fig. 1 is used). As in Fig. 3, the light beam source section LP1' includes a light source LS1, a reflective element RE1, beam splitters BS1A, BS1B, BS1C, diffractive optical elements DOE1B, DOE1C, and lenses LNS1B1, LNS1B2, LNS1C1, and LNS1C2. In various implementations, the light source LS1 may be a laser source, wherein at least some or all of the light beams in the following description may be laser beams. The light source LS1 generates a light beam LB1A, which is reflected by a reflective element RE1 to be directed toward the beam splitter BS1A, which splits the light beam into light beams LB1B and LB1C directed toward the diffractive optical elements DOE1B and DOE1C, respectively.

[0035] Light beam LB1B is diffracted by the diffractive optical element DOE1B into diffracted light beams DLB1B, which are split by the beam splitter BS1B into diffracted light beams DLB1B1 and DLB1B2. The diffracted light beams DLB1B1 diverge further after passing through the lens LNS1B1, which has an optical axis OA1B1, and the diffracted light beams DLB1B2 diverge further after passing through the lens LNS1B2, which has an optical axis OA1B2. Similarly, light beam LB1C is diffracted by the diffractive optical element DOE1C into diffracted light beams DLB1C, which are split by the beam splitter BS1C into diffracted light beams DLB1C1 and DLB1C2. The diffracted light rays DLB1C1 diverge further after passing through the lens LNS1C1, which has an optical axis OA1C1, and the diffracted light rays DLB1C2 diverge further after passing through the lens LNS1C2, which has an optical axis OA1C2.

[0036] Orthogonal X, Y, and Z axes are shown (e.g., corresponding to a coordinate system for the light beam portion LP1' and / or the light beam source configuration). The optical axes OA1B1 and OA1C1 are shown parallel to the X axis, and the optical axes OA1B2 and OA1C2 are shown parallel to the Y axis.

[0037] In various implementations, the light beam source section LP1' may be a first light beam source section, wherein the corresponding light beam source configuration may include further light beam source sections. For example, the light beam source configuration may include a second and a third light beam source section (e.g., each partially with identical components as the first light beam source section LP1'). In such a configuration, for the second light beam source section, the respective optical axes may be parallel to the X-axis and the Z-axis, and for the third light beam source section, the respective optical axes may be parallel to the Y-axis and the Z-axis. In such a configuration, there may thus be an approximately equal number of diffracted light beams directed by lenses with optical axes in the X-axis, Y-axis, and Z-axis directions.Such a configuration may result in a relatively uniform distribution of light rays in directions from the light beam source configuration. In one implementation, if such a light beam source configuration has been placed at a center point of a sphere, there may be an approximately uniform scattering of the intersection points around the surface of the sphere where the light rays intersect with the surface of the sphere. In various implementations, it may be desirable for a light beam source configuration LC to provide at least a minimum number of light rays as scattered in the directions surrounding the light beam source configuration LC (e.g., at least 10,000 light rays, or at least 100,000 light rays, etc.).In various implementations, a desired minimum number of light beams may depend on the light beam source configuration (LC) / light beam sensor spacing, the number and size of the light beam sensors, and the range of possible orientations of the light beam source configuration (LC). In various implementations, it may be desirable for some or all of the light beams to have a similar or approximately equal angular spacing relative to each other.

[0038] In various implementations, each of the light rays (e.g., each of the diffracted light rays DLB in the example of Fig. 3) a light beam source configuration may have certain known and / or determined features (e.g., relative angular orientations, source origin points, etc.) that spatially relate each light beam to the light beam source configuration. Such features make it possible to determine a position and orientation of the light beam source configuration based at least in part on the light beams directed toward and detected by the light beam sensors of the sensor configuration. Regarding the light beam source section LP1', it should be noted that the diffracted light beams may have certain offsets from one another. For example, the diffracted light beams DLB1B1 may be modeled / considered / labeled as having a source origin point that is offset along the Y-axis direction from a modeled / considered / labeled source origin point for the diffracted light beams DLB1C1 (e.g.,relative to the offset along the Y-axis direction between lenses LNS1B1 and LNS1C1). It will be understood that such offsets may be included and / or otherwise taken into account in position calculations (e.g., including the processing / calculations performed by the position and orientation processing section 190 of the metrology system for processing the measurement signals from the light beam sensors to determine the position and orientation of the light beam source configuration LC and / or the end tool ETL, etc.). After determining a position and orientation of the light beam source configuration LC, known geometric relationships and / or relative positioning / offsets between the light beam source configuration LC and the end tool ETL may also be used to determine the position and orientation of the end tool ETL. As will be described in more detail below, the . Fig. 5A-5H show certain simplified examples regarding light beams B of a light beam source configuration LC as they are directed to sensors of a sensor configuration 160 and as they correspond to certain positions and orientations of a light beam source configuration LC.

[0039] The Fig. 4A and Fig. 4B are diagrams of respective motion volumes MV-4A and MV-4B surrounded by respective measurement frame volumes MFV-4A and MFV-4B, which are at least partially defined by respective sensor configurations 160-4A and 160-4B, each including a different number of light beam sensors. The motion volume MV and the measurement frame volume MFV are each depicted as cubic volumes with the edges and sides parallel to the orthogonal X, Y, Z-axis directions. It will be understood that for simplicity, the volumes and other aspects are depicted with certain relative dimensions; in different implementations, the relative dimensions of the volumes and other aspects may vary (e.g., the illustrated dimensions may not be to scale, and the motion volumes MV may be larger relative to the measurement frame volumes MFV, etc.).

[0040] Fig. Figure 4A shows an implementation with a sensor configuration 160-4A that includes four light beam sensors S1-S4 (e.g., similar to the one shown in Fig. 1 illustrated example implementation as well as with regard to the examples of Fig. 5A-5H, as described in more detail below). The four light beam sensors S1-S4 are arranged at positions that all lie at a common mean Z-height along a Z-axis direction (i.e., all have the same Z-axis coordinate value). The light beam sensors S1 and S2 are arranged on opposite sides of the measuring frame volume and are parallel to a YZ plane. The light beam sensors S3 and S4 are arranged on opposite sides of the measuring frame volume and are parallel to an XZ plane.

[0041] Fig. Figure 4B illustrates an implementation with a sensor configuration 160-4B comprising fourteen light beam sensors S1A-S1D, S2A-S2D, S3A-S3C, and S4A-S4C. With reference to the sensor configuration 160-4A of Fig. 4A, the sensor configuration 160-4B of the Fig. 4B have a higher measurement resolution and / or a higher measurement accuracy along the X-axis direction (e.g., corresponding to the sets of three light beam sensors S3A-S3C and S4A-S4C arranged at different positions along the X-axis direction on each respective side of the measuring frame volume MFV-4B). In addition, the sensor configuration 160-4B of the Fig. 4B in further comparison to the sensor configuration of the Fig. 4A have a higher measurement resolution and / or a higher measurement accuracy along the Y-axis direction (e.g., corresponding to the sets of two light beam sensors S1B and S1D and S2B and S2D arranged at different positions along the Y-axis direction on each respective side of the measuring frame volume MFV-4B, and compared to the configuration of Fig. 4A using the single light beam sensors S1 and S2 on each respective side). Furthermore, the sensor configuration 160-4B of the Fig. 4B also in further comparison to the sensor configuration of the Fig. 4A may also have a higher measurement resolution and / or a higher measurement accuracy along the Z-axis direction (e.g., corresponding to the sets of two light beam sensors S1A and S1C and S2A and S2C arranged at different positions along the Z-axis direction on each respective side of the measuring frame volume MFV-4B, and compared to the configuration of Fig. 4A using the single light beam sensors S1 and S2 on each respective side).

[0042] The Fig. 5A-5H illustrate a light beam source configuration LC' that directs four exemplary light beams B1-B4 onto four light beam sensors S1-S4 of a sensor configuration 160' and generates four corresponding measurement spots SP1 to SP4 for different positions and orientations of the light beam source configuration LC'. In various implementations, the sensor configuration 160' of the Fig. 1 and Fig. 4A (e.g., where the four light beam sensors S1-S4 at least partially define a corresponding cubic measuring frame volume MFV). Fig. 5A-5H illustrate, respectively, top views 510A-510H, cross-sectional front views 520A-520H, cross-sectional side views 530A-530H, and positions of measurement spot views 540A-540H (i.e., corresponding to a front view of the sensor surface of each of the respective light beam sensors S1-S4).

[0043] In different implementations, the examples of Fig. 5A-5H also illustrate operations of sensor configurations with a larger number of light beam sensors, whereby the following described examples can illustrate the operations of four (e.g., the four most central light beam sensors, etc.) of the total number of light beam sensors in the given configurations. The examples of Fig. 5A-5H may also include operations of light beam source configurations with a larger number of light beams (e.g., several tens, hundreds, or thousands, etc. of light beams, as may in some cases be directed in relatively evenly distributed three-dimensional directions, as described above with respect to Fig. 3). With regard to such implementations, the following described examples can illustrate the operation of four (e.g., the four most central light beams and / or the four light beams specifically aligned along the X and Y axis directions, etc.) out of the total number of light beams in the given configurations. In the examples of Fig. 5A-5H, it can also be seen that the relative sizes of the light beam sensors S1-S4 appear exaggerated, the relative distances between the light beam sensors appear reduced, and that, to simplify the illustrated examples, no offsets between the source points for the various light beams B1-B4 are shown.

[0044] In the example of Fig. 5A illustrates the light beam source configuration LC' and the corresponding light beams B1-B4 in a designated "zero" position (e.g., including a corresponding "zero" orientation). Specifically, the light beams B1 and B2 are each parallel to the X-axis direction and are directed toward the centers of the light beam sensors S1 and S2, respectively. Likewise, the light beams B3 and B4 are each parallel to the Y-axis direction and are directed toward the centers of the light beam sensors S3 and S4, respectively. The light beams B1-B4 generate corresponding measurement spots SP1-SP4 at the centers of the respective light beam sensors S1-S4. The light beam sensors S1-S4 may, in various implementations, be different camera types and / or two-dimensional position-sensitive sensors (e.g.,optical position sensors that can measure the position of a measuring spot, such as that formed by a light beam, two-dimensionally on a sensor surface).

[0045] The light beam sensors S1-S4 can output measurement signals indicating that the measurement spots SP1-SP4 are located at the centers of the light beam sensors S1-S4. Given the known geometric relationships between the light beams B1-B4 and the light beam source configuration LC', the measurement signals from the light beam sensors S1-S4 indicate the position and orientation of the light beam source configuration LC' (e.g., corresponding to the position and orientation of the example in Fig. 5A). The measurement signals may be processed (e.g., by a processing section 190), wherein the processing may determine the position and orientation of the light beam source configuration LC' and / or an end tool ETL to which the light beam source configuration LC' is coupled (e.g., see Fig. 1) etc.

[0046] In the example of Fig. 5B (e.g. compared to the example of Fig. 5A), the light beam source configuration LC' is illustrated rotated clockwise in an XY plane. View 510B (i.e., the XY plane) illustrates the clockwise rotation and shows the different positions of the light beams B1-B4 on the light beam sensors S1-S4. View 540B illustrates the positions of the measurement spots SP1-SP4 on the light beam sensors S1-S4, as generated by the light beams B1-B4, respectively. More specifically, the measurement spots SP1-SP4 are shown having each moved to the center right of each of the light beam sensors S1-S4.

[0047] In the example of Fig. 5C (e.g. compared to the example of Fig. 5A), the light beam source configuration LC' is illustrated rotated clockwise in an XZ plane. View 520C (i.e., the XZ plane) illustrates the clockwise rotation and shows the different positions of the light beams B1 and B2 on the light beam sensors S1 and S2. In view 540C, the measurement spots SP1 and SP2 are illustrated as having moved to the top center and bottom center of the light beam sensors S1 and S2, respectively, while the measurement spots SP3 and SP4 have remained at the centers of the light beam sensors S3 and S4, respectively.

[0048] In the example of Fig. 5D (e.g. compared to the example of Fig. 5A), the light beam source configuration LC' is illustrated rotated clockwise in a YZ plane. View 530D (i.e., the YZ plane) illustrates the clockwise rotation and shows the different positions of the light beams B3 and B4 on the light beam sensors S3 and S4. In view 540D, the measurement spots SP1 and SP2 have remained at the centers of the light beam sensors S1 and S2, respectively, while the measurement spots SP3 and SP4 are illustrated as having moved to the top center and bottom center of the light beam sensors S3 and S4, respectively.

[0049] The examples of Fig. 5B-5D each correspond to at least one change in the orientation of the light beam source configuration LC'. In some implementations, the illustrated changes may otherwise not correspond to a position change (e.g., depending on where a reference point is set for the light beam source configuration LC' to which position changes are determined). In the examples of Fig. 5A-5H, in various implementations, a reference point for a light beam source configuration may be referred to as being located at a geometric center or other center point of the light beam source configuration.

[0050] In the example of Fig. 5E (e.g. compared to the example of Fig. 5A), the light beam source configuration LC' is illustrated as having moved in the XY plane toward the light beam sensor S4. View 510E (i.e., the XY plane) illustrates the different positions of the light beams B1 and B2 on the light beam sensors S1 and S2. In view 540E, the measurement spots SP1 and SP2 are illustrated as having moved to the right center and left center of the light beam sensors S1 and S2, respectively, while the measurement spots SP3 and SP4 have remained at the centers of the light beam sensors S3 and S4, respectively.

[0051] In the example of Fig. 5F (e.g. compared to the example of Fig. 5A), the light beam source configuration LC' is illustrated as having moved in the XY plane toward the light beam sensor S1. View 510F (i.e., the XY plane) illustrates the different positions of the light beams B3 and B4 on the light beam sensors S3 and S4. In view 540F, the measurement spots SP1 and SP2 have remained at the centers of the light beam sensors S1 and S2, respectively, while the measurement spots SP3 and SP4 are illustrated as having moved toward the right center and left center of the light beam sensors S3 and S4, respectively.

[0052] In the example of Fig. 5G (e.g. compared to the example of Fig. 5A), the light beam source configuration LC' is illustrated as being moved upward in the Z direction (i.e., parallel to the Z axis). Views 520G and 530G (i.e., the XZ plane and the YZ plane, respectively) illustrate the different positions of the light beams B1 and B2 on the light beam sensors S1 and S2, respectively, and of the light beams B3 and B4 on the light beam sensors S3 and S4, respectively. In view 540G, the measurement spots SP1-SP4 are illustrated as being moved toward the upper center of the light beam sensors S1-S4, respectively.

[0053] In the example of Fig. 5H (e.g. compared to the example of Fig. 5A), the light beam source configuration LC' is illustrated as being rotated clockwise in the XY plane and moved upward in the Z direction (i.e., parallel to the Z axis). View 510H (i.e., the XY plane) illustrates the clockwise rotation and the different positions of the light beams B1-B4 on the light beam sensors S1-S4. Views 520H and 530H (i.e., the XZ plane and the YZ plane, respectively) illustrate the different positions of the light beams B1 and B2 on the light beam sensors S1 and S2, respectively, and of the light beams B3 and B4 on the light beam sensors S3 and S4, respectively. In view 540H, the measurement spots SP1-SP4 are illustrated as being moved to the upper right corner of the light beam sensors S1-S4, respectively.

[0054] As described above, the light beam sensors S1-S4 can output measurement signals indicating the positions of each of the measurement spots SP1-SP4 on the respective light beam sensors S1-S4. Given the known geometric relationships between the light beams B1-B4 and the light beam source configuration LC' (e.g., including the known angular orientations of the light beams B1-B4 as directed through and relative to the light beam source configuration LC' and relative to each other), the positions of the measurement spots SP1-SP4 on the light beam sensors S1-S4 indicate the position and orientation of the light beam source configuration LC' (e.g., as the orientations in the examples of Fig. 5A-5H accordingly). The measurement signals of the light beam sensors S1-S4 can be processed (e.g., by a processing section 190), wherein the processing (e.g., at least partially using the known geometric relationships, etc.) determines the position and orientation of the light beam source configuration LC' and / or an end tool ETL to which the light beam source configuration LC' is coupled (e.g., see Fig. 1), etc.

[0055] Regarding the measurement signals of the light beam sensors S1-S4 indicating the position and orientation of the light beam source configuration LC', it will be understood that the simplified examples of the Fig. 5A-5H are all relative to the light beams B1-B4 directed to the respective light beam sensor S1-S4. More specifically, in each example, light beam B1 is directed to the light beam sensor S1, light beam B2 is directed to the light beam sensor S2, light beam B3 is directed to the light beam sensor S3, and light beam B4 is directed to the light beam sensor S4. In these examples, it will be understood that upon rotation of the light beam source configuration LC' in the XY plane by 90 degrees, 180 degrees, or 270 degrees, similar measurement spots may be generated at similar locations on the light beam sensors S1-S4, and it may be desirable to be able to unambiguously determine (e.g., distinguish between) such possibilities.

[0056] For example, with regard to the Fig. 5A and wherein the light beams B1-B4 are each directed to the respective light beam sensor S1-S4, understand that the measurement signals indicating that the measurement spots SP1-SP4 are each located at the centers of the respective light beam sensors S1-S4 clearly indicate that the light beam source configuration LC' is in the orientation shown in views 510A-530A of Fig. 5A (e.g., corresponding to a "zero" position in the given example). However, if the configuration were rotated 90 degrees clockwise in the XY plane, measurement spots SP would also be created at the centers of the light beam sensors S1-S4 with respect to the top view 510A. More specifically, the light beam B1 would create a measurement spot SP1 at the center of the light beam sensor S4, the light beam B2 would create a measurement spot SP2 at the center of the light beam sensor S3, the light beam B3 would create a measurement spot SP3 at the center of the light beam sensor S1, and the light beam B4 would create a measurement spot SP4 at the center of the light beam sensor S2.It will be understood that for similar clockwise rotations of the configuration in the XY plane by 180 degrees and 270 degrees, relative to the initial orientation illustrated in plan view 510A, similar measurement points may occur at the centers of the light beam sensors S1-S4, as generated by different respective measurement beams.

[0057] In order to distinguish between the sets of measurement signals that would result from such orientations (which, for example, might otherwise appear relatively identical), it may be desirable for the system to be configured to determine (e.g., at least approximately) which light beams are generally directed to which light beam sensors. As one approach to solving such problems, position information of the motion system 110 may be used for discrimination. For example, with respect to the measurement system 110, as described above with respect to the Fig. 1 and Fig. 2, the position information determined from the position sensors SEN1-SEN5 (e.g., as received by the position and orientation processing section 147 of the motion system) may be used to determine a rough position and orientation of the end tool ETL and / or the light beam source configuration LC (e.g., with a motion system accuracy). While the motion system accuracy may be less than desired for certain applications, it may be useful for discrimination (e.g., as described in connection with the examples above). More specifically, it is possible that the motion system accuracy may provide rough position information (e.g., the rough position and orientation of the end tool ETL and / or the light beam source configuration LC) that can be used to determine which light beams are generally directed to which light beam sensors.

[0058] To return to the examples above, in a case with the configuration of Fig. 5A, in which the measurement signals of the light beam sensors S1-S4 indicate that the measurement spots are all located at the centers of the light beam sensors, the position and orientation information from the motion system is used to determine the possibilities for the orientation of the light beam source configuration LC' (e.g. between a 0-degree rotation as in Fig. 5A illustrates, or a 90-degree rotation, a 180-degree rotation, or a 270-degree rotation). For example, the position and orientation information of the motion system 110 can be used to determine whether the measurement spot located at the center of the light beam sensor S1 is generated by the light beam B1, B2, B3, or B4. As previously mentioned, although the measurement system accuracy may be relatively low, it can be effectively used by the measurement system to distinguish possibilities such as those described above (according to the coarse position information provided by the motion system), and the measurement system can then effectively provide measurements with higher accuracy according to the methods described herein.

[0059] In various implementations, a general characterization of the relationship between the measurement signals of motion system 110 and the measurement signals of measurement system 150 can be described as follows. The position and orientation information (e.g., including measurements) determined from one or more of the position sensors SEN1-SEN5 of motion system 110 (i.e., with the motion system accuracy) can be characterized as providing relatively coarse scale information (e.g., including coarse scale measurements of position and orientation, etc.). The position and orientation information (e.g., including measurements) determined from measurement system 150 (e.g., based on measurement signals from the light beam sensors) can be characterized as providing relatively fine scale information (e.g., including fine scale measurements of position and orientation, etc.).In various implementations, measurements from the two systems can be combined to provide highly accurate measurements over a relatively large unambiguous range (e.g., micrometer-level accuracy over a cubic meter of motion volume).

[0060] With respect to some specific example values, in one example implementation, the motion system may have a positioning accuracy / potential position error of approximately 100 micrometers (e.g., with a uniqueness range provided over a 1 cubic meter motion / measurement volume as the coarse scale range). In this example, the measurement system may be configured to be able to resolve a potential distance error of the coarse scale measurement, such as with a uniqueness range larger than the potential distance error (e.g., a uniqueness range greater than 100 micrometers in this example, and with micrometer accuracy as the fine scale range). According to these example values, the measurements (e.g., position and orientation information) of the two systems can be combined to provide highly accurate measurements (e.g., with micrometer-level accuracy over the 1 cubic meter motion volume).

[0061] With regard to a measurement system such as the one disclosed here, such principles can also be described generally in terms of identifying / distinguishing which light beams of a light beam source configuration are directed to which light beam sensors (e.g., for a given measurement spot on a light beam sensor). Compared to the example values ​​above, the positioning accuracy / potential position error of approximately 100 micrometers of the motion system (e.g., with a uniqueness range provided over a motion / measurement volume of 1 cubic meter as a coarse scale range) may be sufficient to identify / determine / distinguish which light beams are directed to which light beam sensors. The uniqueness range of the measurement system (which, for example,in the above example is greater than 100 micrometers and with micrometer accuracy as a fine scale range) may correspond to a range over which different positions and orientations of the light beam source configuration can be unambiguously determined (e.g., corresponding to measurement spots moving across the light beam sensors or otherwise being in different respective positions thereon, as illustrated in part by the simplified examples of the . Fig. 5A-5H).

[0062] Alternatively and / or in addition to the above-mentioned implementations (where, for example, position information from a motion system is used for differentiation), the light beams may also or alternatively have certain features that can be used for differentiation (which, for example, enable determining which light beams are directed to which light beam sensors). For example, the light beams may be arranged in a pattern (e.g., with unique sections). In various implementations, the light beams may also or alternatively have different wavelengths (e.g., colors), timing, modulation, structures, and / or other features that can be detected / identified and used to determine which light beams are directed to which light beam sensors (e.g., where the light beam sensors may also have certain corresponding differentiation capabilities, such asincluding various color detectors, etc.) In various implementations, one or more of the features (e.g., timing, modulation, etc.) of the light beams may be controlled by a control portion 192 of the light beam source configuration (see, e.g., . Fig. 2) which can provide associated signals (e.g., timing signals, etc.) to a control and processing section 180 of the sensor configuration and / or a position and orientation processing section 190 of the measurement system (e.g., for use as part of the processing for receiving measurement signals from the light beam sensors and using the measurement signals to determine which light beams are directed to which light beam sensors).

[0063] The Fig. 6A-6C are diagrams illustrating twelve exemplary light beams B of a light beam source configuration LC'' and corresponding measurement spots SP on four sensors S1-S4 of a sensor configuration 160'' for different positions and orientations of the light beam source configuration LC''. More specifically, in various implementations, the light beam source configuration LC'' provides and directs the light beams B1, B2A-B2C, B3A-B3C, and B4A-B4E to form corresponding measurement spots SP1, SP2A-SP2C, SP3A-SP3C, and SP4A-SP4E on the light beam sensors S1-S4. It will be understood that in the examples of Fig. 6A-6C the light rays are arranged in a pattern (which can be seen, for example, in the orientation of the Fig. 6A results in the single light beam B1 being directed at the light beam sensor S1, the three light beams B2A-B2C being directed at the light beam sensor S2, the three light beams B3A-B3C being directed at the light beam sensor S3, and the five light beams B4A-B4E being directed at the light beam sensor S4). It should be noted that such patterns may include different spacing and orientations (e.g., angular spacing and orientations) between the light beams and / or other features that may enable a portion of the pattern to be uniquely identified as directed at a light beam sensor or group of light beam sensors (e.g., for use in determining / distinguishing the orientation and / or position of the light beam sensor configuration, etc.).

[0064] In the example of Fig. 6A (with certain similarities to the one in Fig. 5A), the light beam source configuration LC'' and the corresponding light beams B1, B2A-B2C, B3A-B3C, and B4A-B4E are illustrated in a designated "zero" position (e.g., including a corresponding "zero" orientation). Specifically, the light beam B1 and the central light beam B2B are each parallel to the X-axis direction and are directed toward the centers of the light beam sensors S1 and S2, respectively. Likewise, the central light beams B3B and B4C are each parallel to the Y-axis direction and are directed toward the centers of the light beam sensors S3 and S4, respectively.

[0065] In the Fig. 6A, the light beams B1, B2A-B2C, B3A-B3C, and B4A-B4E create corresponding measurement spots SP1, SP2A-SP2C, SP3A-SP3C, and SP4A-SP4E on the light beam sensors S1-S4, respectively. As illustrated in view 640A, the measurement spots SP1, SP2B, SP3B, and SP4C are all located at the centers of the light beam sensors S1, S2, S3, and S4, respectively. These measurement spot positions are Fig. 5A illustrates similar spot positions. In contrast to Fig. 5A, where only individual measuring spots are generated on each light beam sensor, are Fig. 6A, however, different numbers and / or arrangements of measuring spots are formed on different light beam sensors according to the pattern of the light beams provided and directed by the light beam source configuration LC''.

[0066] For example, while light beam B1 creates only the single measurement spot SP1 at the center of light beam sensor S1, light beams B2AB2C and B3A-B3C each create a series of three measurement spots SP2A-SP2C and SP3A-SP3C across the center of light beam sensors S2 and S3, respectively. In addition, light beams B4A-B4E create a series of five measurement spots SP4A-SP4E across the center of light beam sensor S4. It will be understood that such features may make it possible to determine which light beams are directed to which light beam sensors (e.g., to enable discrimination with respect to the issues described above), and may not require additional position information (e.g., from a motion system) (although in some implementations they may also be used in addition to such patterns or other information).

[0067] The light beam sensors S1-S4 can output measurement signals indicating that the measurement spots SP1, SP2A-SP2C, SP3A-SP3C, and SP4A-SP4E are located in the indicated positions on the light beam sensors S1-S4. Given the known geometric relationships between the light beams B1, B2A-B2C, B3A-B3C, and B4A-B4E and the light beam source configuration LC'', the measurement signals of the light beam sensors S1-S4 indicate the position and orientation of the light beam source configuration LC''. The measurement signals can be processed (e.g., by a processing section 190), wherein the processing determines the position and orientation of the light beam source configuration LC' and / or an end tool ETL to which the light beam source configuration LC' is coupled (e.g., see Fig. 1), etc.

[0068] In the example of Fig. 6B (e.g. compared to the example of Fig. 6A) the light beam source configuration LC' is rotated clockwise in the XY plane and in the Z direction (i.e. parallel to the Z axis, with certain similarities to the example in Fig. 5H) is illustrated. View 610B (i.e., of the XY plane) illustrates the clockwise rotation and top view of the different positions of the light beams B1, B2A-B2B, B3A-B3B, and B4A-B4C on the light beam sensors S1-S4. It is noted that the light beams B2C, B3C, and B4D-B4E are no longer directed at the respective light beam sensors, but are directed at spaces between the light beam sensors of the sensor configuration (e.g., as may typically occur with a few or many light beams in a relatively evenly distributed light beam pattern, when directed at a relatively limited number of light beam sensors, which may have limited sizes and have relatively large distances from the light beam source configuration, etc.). Cross-sectional views 620B and 630B (i.e., of the cross-section of the XZ plane andthe YZ plane) illustrate the different positions of the light beams B1 and B2A on the light beam sensors S1 and S2 respectively and the light beams B3A and B4A on the light beam sensors S3 and S4 respectively.

[0069] In view 640B, measurement spots SP1, SP2A-SP2B, SP3A-SP3B, and SP4A-SP4C are illustrated as having moved upward and shifted to the right on light beam sensors S1-S4, respectively. It is further noted that in view 640B, measurement spots SP2C, SP3C, and SP4D-SP4E are no longer formed on light beam sensors S2-S4 (i.e., the corresponding light beams B2C, B3C, and B4D-B4E are directed to spaces between the light beam sensors). This example illustrates, in part, why it may be desirable to have a sufficient number and / or a relatively uniform distribution of directionally outgoing light beams from a light beam source configuration. More specifically, given the sizes and possible distances of the light beam sensors from the light beam source configuration (e.g.,During measurement operations, it may generally be desirable for a particular implementation that the light beam source configuration provide a sufficient number and density of light beams in directions surrounding the light beam source configuration. Such factors for the light beam source configuration may contribute to at least some or all of the light beam sensors of the sensor configuration having at least some light beams directed toward them (e.g., for all possible orientations of the light beam source configuration during measurement operations) to generate corresponding measurement spots and corresponding measurement signals.

[0070] In the example of Fig. 6C (e.g. compared to the example of Fig. 6A), the light beam source configuration LC' is illustrated as being rotated 90 degrees clockwise in an XY plane. View 610C (i.e., of the XY plane) illustrates the 90-degree clockwise rotation and the top view of the various positions of the light beams B1, B2A-B2C, B3AB3C, and B4A-B4E. Due to the 90-degree rotation, the light beam B1 is illustrated as being directed toward the light beam sensor S4 (e.g., instead of the light beam sensor S1 as in the orientation of the Fig. 5A). The light beams B2A-B2C are illustrated as being directed towards the light beam sensor S3 (e.g., instead of the light beam sensor S2 as in the orientation of the Fig. 5A). The light beams B3A-B3C are illustrated as being directed towards the light beam sensor S1 (e.g., instead of the light beam sensor S3 as in the orientation of the Fig. 5A). The light beams B4A-B4E are illustrated as being directed towards the light beam sensor S2 (e.g., instead of the light beam sensor S4 as in the orientation of the Fig. 5A). The light beam B1 and the central light beam B2B are each parallel to the Y-axis direction and are directed toward the centers of the light beam sensors S4 and S3, respectively. Likewise, the central light beams B3B and B4C are each parallel to the X-axis direction and are directed toward the centers of the light beam sensors S1 and S2, respectively.

[0071] In the Fig. 6C, the light beams B1, B2A-B2C, B3A-B3C, and B4A-B4E create corresponding measurement spots SP1, SP2A-SP2C, SP3A-SP3C, and SP4A-SP4E on the light beam sensors S4, S3, S1, and S2, respectively. As illustrated in view 640C, the measurement spots SP1, SP2B, SP3B, and SP4C are all located at the centers of the light beam sensors S4, S3, S1, and S2, respectively. As previously noted, in contrast to the Fig. 5A-5H, where only individual measuring spots are generated on each light beam sensor, in Fig. 6C, however, different numbers of measuring spots are formed on different light beam sensors according to the pattern of the light beams provided and directed by the light beam source configuration LC''.

[0072] For example, while light beam B1 creates only the single measurement spot SP1 in the center of light beam sensor S4, light beams B2AB2C and B3A-B3C each create a series of three measurement spots SP2A-SP2C and SP3A-SP3C across the center of light beam sensors S3 and S1, respectively. Furthermore, light beams B4A-B4E create a series of five measurement spots SP4A-SP4E across the center of light beam sensor S2. It will be understood that such features may enable a determination of which light beams are directed to which light beam sensors (e.g., to enable discrimination with respect to the issues described above).

[0073] For example, the measurement signal of the light beam sensor S4 indicates the position of the single measurement spot SP1 in the center of the light beam sensor S4, which clearly corresponds to the light beam B1 (e.g. compared to the orientation of the Fig. 6A, where the measurement signal from the light beam sensor S1 clearly indicated the light beam B1 directed onto the light beam sensor S1). The measurement signal(s) from the light beam sensor S4 clearly indicate the positions of the measurement spots SP4A-SP4E in the row in the middle of the light beam sensor S4 as corresponding to the light beams B4A-B4E (e.g., in comparison to the orientation of the Fig. 6A, where the measurement signal(s) from the light beam sensor S4 indicated the light beams B4A-B4E as being uniquely directed at the light beam sensor S4). According to the pattern of light beams from the light beam source configuration LC'' with unique or otherwise differentiated pattern sections, corresponding measurement points of the unique pattern sections can be formed at the respective light beam sensors toward which the pattern sections are directed. Such configurations can make it possible to use the measurement signals from the light beam sensors to determine which light beams are directed at which light beam sensors (e.g., to distinguish and / or otherwise determine a position and orientation of the light beam source configuration LC'' with respect to the light beam sensors S1-S4, etc.).

[0074] The Fig. 7A and Fig. 7B are diagrams illustrating a first arrangement of measurement spots SP formed by light beams from a light beam source configuration at a first and second distance from a light beam sensor S1, respectively. In the example of Fig. 7A, the light beam source configuration is located at the first distance, which is a relatively short distance (e.g., 10 cm) from the light beam sensor S1. The light beam source configuration emits a pattern of light beams with an angular spacing / angular dispersion, so that at the relatively short distance of Fig. 7A many measuring spots SP are generated on the light beam sensor S1. In the example of Fig. 7B, the light beam source configuration is located at the second distance, which is a relatively greater distance (e.g., 60 cm) from the light beam sensor S1. Due to the longer distance and the angular spacing / angular dispersion of the light beams, fewer measurement spots are generated on the light beam sensor S1. Furthermore, the corresponding measurement spots SP are in Fig. 7B larger than in Fig. 7A (e.g. with the additional divergence of the light rays over the longer distance to the sensor S1 in Fig. 7B).

[0075] The Fig. 8A and Fig. 8B are diagrams illustrating a second arrangement of measurement spots SP formed by light beams from a light beam source configuration at a first and second distance from a light beam sensor S1, respectively. Fig. 8A and Fig. 8B show examples similar to those of Fig. 7A and Fig. 7B, except that the light beams and the corresponding pattern are more structured. For example, the light beams are arranged to create measurement spots in evenly spaced rows and columns, with the light beams being more collimated or otherwise structured to create measurement spots with larger sizes at shorter intervals and with less size variation at different distances. In some implementations, for some optical sources and a wide range of possible distances between the light source configuration and the light beam sensors, it may generally be desirable to have more collimated beams, such as those of the example of Fig. 8A and Fig. 8B. As in Fig. 8A, the measuring spots SP are illustrated as being located on the light beam sensor S1 in the relatively evenly spaced rows and columns and with larger areas corresponding to those of the Fig. 8B are relatively similar.

[0076] In the example of Fig. 8A, the light beam source configuration is located at a first distance from the light beam sensor S1, which may have a relatively shorter distance (e.g., 500 mm). The light beam source configuration emits the pattern of light beams with an angular spacing / angular dispersion such that at the relatively short distance from Fig. 8A many measuring spots are generated on the light beam sensor S1. In the example of Fig. 8B, the light beam source configuration is located at a second distance from the light beam sensor S1, which may be a relatively longer distance (e.g., 1500 mm). Due to the longer distance in Fig. 8B and the angular spacing / angular dispersion of the light beams, fewer measuring spots are generated on the light beam sensor S1. In the examples of Fig. 8A and Fig. 8B, the light beam sensor S1 comprises an array of pixels (e.g., an array of 3600 pixels x 5400 pixels).

[0077] As a general requirement for the operation of the measurement system 100, it is desirable (e.g., for at least some of the light beam sensors) that at least one measurement spot be generated on each light beam sensor. Furthermore, it is also desirable not to have to generate too many measurement spots on each light beam sensor (e.g., where the measurement spots may overlap or otherwise cause problems, reducing the accuracy of the measured spot position, or making it difficult for the system to distinguish which light beams generated the measurement spots, etc.). Fig. In particular, Figure 8A is an example of how certain implementations may be characterized by having more than a desired number of measurement spots on the light beam sensor S1 (e.g., where it can be seen how measurement spots begin to overlap at such a high density of measurement spots).

[0078] Regarding the Fig. 7B and Fig. 8B, it will be understood that the further distance of the light beam source configuration from the sensor S1 leads to a significantly lower density of measurement spots on the light beam sensor S1 and a correspondingly larger spacing between the measurement spots. With respect to the lower density and the larger spacing between the measurement spots in the Fig. 7B and Fig. 8B, it will be understood that if the light beam source configuration is moved even further away from the sensor S1, the gaps between the measurement spots that would be created at such a distance may become so large that the sensor S1 can fit into these gaps, so that for certain positions and orientations of the light beam source configuration, no measurement spots can be created on the light beam sensor S1.

[0079] As will be described in more detail below, it may generally be desirable for the light beam source configuration to produce a relatively low density of measurement spots at short working distances (i.e., when the light beam source configuration is relatively close to the light beam sensors so as not to produce too many measurement spots at the light beam sensors) and a relatively high density of measurement spots at long working distances (i.e., when the light beam source configuration is relatively far from the light beam sensors so that at least one or more measurement spots are produced at each light beam sensor).As will be described in more detail below, such problems can be solved according to the principles described herein by a configuration in which the light beam source configuration provides both a first pattern of light beams having a lower density of light beams and a second pattern of light beams having a higher density of light beams.

[0080] The Fig. 9A and Fig. 9B are diagrams illustrating a light beam source configuration LC at a first distance D1 and a second distance D2, respectively, from a light beam sensor S1 and providing a first pattern of light beams BP1. As shown in the Fig. 9A and Fig. 9B, the light beam source configuration LC provides the first pattern of light beams BP1 having a relatively low density of light beams BP1LB of the first pattern. As a result, as shown in Fig. 9A, a relatively low density of measuring points is generated when the light beam source configuration LC is located at a distance D1 (e.g., a relatively short distance) from the light beam sensor S1.

[0081] In the simplified examples of Fig. 9A and Fig. 9B, the density of the light rays BP1LB of the first pattern can be specified by the number of light rays contained in a certain angular range, for example, by an angle A1. In a specific numerical example, the angle A1 can be specified as approximately 30 degrees, where in the two-dimensional perspective of the Fig. 9A and Fig. 9B, the light rays BP1LB of the first pattern are illustrated with an angular spacing of approximately 15 degrees, so that three light rays BP1LB of the first pattern are illustrated for the 30-degree range of angle A1. In the example of Fig. 9A shows that the three illustrated light beams BP1LB of the first pattern generate three corresponding measuring spots on the light beam sensor S1.

[0082] In the example of Fig. 9B shows the light beam source configuration LC with the distance D2 (e.g., a longer distance) from the light beam sensor S1. With the angular spacing / angular density of the light beams BP1LB of the first pattern, it can be seen that at the longer distance D2, only one light beam BP1LB of the first pattern is directed onto the light beam sensor S1, creating a corresponding measurement spot there. It is also shown that at the distance D2, the linear spacings of the light beams BP1LB of the first pattern amount to a distance D3. As illustrated, the distance D3 is greater than a corresponding dimension of the light beam sensor S1, so that the light beam sensor S1 can fit between the light beams BP1LB of the first pattern (i.e., which are separated by the spacings D3 at the distance D2). For example, a light beam sensor S1' is in a position falling between the light beams BP1LB of the first pattern (i.e.,at a distance D2) so that no light rays BP1LB of the first pattern are directed onto the light beam sensor S1' and accordingly no measuring spot is generated on the light beam sensor S1'.

[0083] As already mentioned, in various implementations, at least some light beam sensors of the sensor configuration must have received light beams and generated corresponding measurement spots so that the measurement system can make accurate determinations of the position and orientation of the light beam source configuration LC. It may generally be undesirable for the pattern of light beams to exhibit angular spacing / angular dispersion, so that for certain positions and orientations, no measurement spots are generated for an undesirable number of light beam sensors. Regarding these considerations, it should be noted that the first pattern of light beams BP1 generates a desired number of measurement spots on the light beam sensor S1 at a distance D1, as shown in Fig. 9A illustrates, but as in Fig. 9B, has an angular gap / angular spread at the distance D2 such that less than a desired number of measurement spots can be generated on a corresponding light beam sensor (e.g., no measurement spots are formed on the light beam sensor S1').

[0084] The Fig. 10A and Fig. 10B are diagrams illustrating a light beam source configuration LC at a first distance D1 and a second distance D2, respectively, from a light beam sensor S1 and providing a second pattern of light beams BP2. As shown in the Fig. 10A and Fig. 10B, the second pattern of light rays BP2 has a higher density of light rays BP2LB of the second pattern (e.g., compared to the first pattern of light rays BP1 with the relatively lower density of light rays BP1LB of the first pattern of the Fig. 9A and Fig. 9B). In the example of Fig. 10A and Fig. 10B, the angle A1 is indicated as approximately 30 degrees, and the light rays BP2LB of the second pattern are shown with an angular interval of approximately 2.5 degrees, so that in the two-dimensional illustrations of the Fig. 10A and Fig. 10B illustrates thirteen light beams BP2LB of the second pattern for the 30-degree range of angle A1. It should be understood that these exemplary numbers of light beams are chosen for illustrative purposes, and in certain implementations, the number of light beams (e.g., in a typical implementation) generated by the light beam source configuration may be substantially higher (e.g., on the order of 10,000 or more light beams).

[0085] As in Fig. 10A, the light beam source configuration LC is located at a distance D2 from the sensor S1. At the distance D2 and with the angular spacing / angular dispersion corresponding to the higher density of the light beams BP2LB of the second pattern, it is indicated that three of the light beams BP2LB of the second pattern are directed towards the light beam sensor S1 and accordingly generate three measurement spots on the light beam sensor S1 (which is considered here, for example, as an example of a desirable number of measurement spots). As in Fig. As shown in Figure 10B, the light beam source configuration LC is located at a distance D1 from the light beam sensor S1, wherein the angular spacing / angular dispersion of the light beams BP2LB of the second pattern indicates that thirteen light beams BP2LB of the second pattern are directed toward the light beam sensor S1 and, accordingly, form thirteen measurement spots on the light beam sensor S1. In a particular implementation, this can be considered an example of too many measurement spots forming on the light beam sensor S1 (e.g., the measurement spots may overlap and / or make it difficult for the measurement system to determine / distinguish the measurement spots and the corresponding light beams, and / or cause other processing problems, etc.).

[0086] When comparing the Fig. 9A-9B and 10A-10B it is noted that, as in Fig. 9A illustrates that with the light beam source configuration LC at a distance D1 from the light beam sensor S1, the first pattern of light beams BP1 can generate a desired number of measurement spots on the light beam sensor S1. It should also be noted that, as in Fig. 10A illustrates how, with the light beam source configuration LC at a distance D2 from the light beam sensor S1, the second pattern of light beams BP2 can produce a desirable number of measurement spots on the light beam sensor S1. As described in more detail below, in various implementations, according to the principles described herein, a light beam source configuration LC configured to direct both the first pattern of light beams BP1 and the second pattern of light beams BP2 onto light beam sensors of the sensor configuration 160 to indicate a position and orientation of the light beam source configuration LC.

[0087] The Fig. 11A and Fig. 11B are diagrams illustrating a light beam source configuration LC at a first and second distance from first and second light beam sensors S1 and S2 and providing first and second patterns of light beams BP1 and BP2. As in Fig. 11A, the light beam source configuration LC is located at a distance D1 from the light beam sensor S1 and at a distance D2 from the light beam sensor S2. The example is similar to that of Fig. 1 and Fig. 5F, wherein the light beam source configuration LC is illustrated relatively closer to the light beam sensor S1 and relatively farther from the light beam sensor S2 (e.g., and wherein the configuration and techniques described below may be used).

[0088] In the example of Fig. 11A, the first pattern of light beams BP1 forms a desired number of measuring spots (e.g., three measuring spots) on the light beam sensor S1 (e.g., similar to the example of Fig. 9A), and the second pattern of light beams BP2 forms a desired number of measuring spots (e.g., three measuring spots) on the light beam sensor S2 (e.g., similar to the example of Fig. 10A). According to the principles described herein, the first light beams BP1LB of the first pattern and the light beams BP2LB of the second pattern have at least one different feature that allows the light beams BP1LB of the first pattern to be distinguished from the light beams BP2LB of the second pattern. For example, in various implementations, the at least one different feature may be at least one of a different wavelength, a different polarity, a different timing of transmission, etc.

[0089] In various implementations, the measurement system includes one or more light beam selection sections configured to operate based on the at least one different characteristic. For example, as described in more detail below, in various implementations, the one or more selection sections may include one or more light beam filter sections (e.g., wherein a light beam filter section may be present in front of each light beam sensor, such as the light beam filter section in the example of Fig. 11A and Fig. 11B, as described in more detail below. In various implementations, a light beam selection section of the system may include a portion of the processing section 190 or another processing section that selects, filters, and / or blocks signals generated by light beams, such as those that may operate based on at least one different characteristic of the light beams (e.g., based on at least one of a different wavelength, a different polarity, a different timing of transmission, etc.).

[0090] As will be described in more detail below, in various embodiments, the light beam filter sections F1 and F2 may be included as being positioned in front of the light beam sensors S1 and S2, respectively. In various implementations, the light beam filter sections F1 and F2 (e.g., in some implementations with motorized filter wheels configured to be electronically controlled to rotate or otherwise move respective filters in front of the respective sensors, or with other configurations) may include at least one of a wavelength filter or a polarity filter, etc. In the example of Fig. 11A, with the light beam source configuration LC at a distance D1 from the light beam sensor S1, the light beam filter section F1 may include a filter positioned (e.g., rotated, moved, or otherwise used) in front of the first light beam sensor S1 for blocking or otherwise filtering with respect to the light beams BP2LB of the second pattern. In this way, the light beam sensor S1 may be caused to generate and / or provide measurement signals only based on measurement spots generated by light beams BP1LB of the first pattern (e.g., corresponding to the desired number of measurement spots described above with respect to Fig. 9A).

[0091] In various implementations, the light beam filter section F1 may be used (e.g., positioned in front of the light beam sensor S1 or otherwise used) based on a particular position of the light beam source configuration LC (e.g., corresponding to the distance D1 of the light beam source configuration LC from the light beam sensor S1). For example, the motion control system 140 of the motion system 110 may be configured to provide position information indicating (e.g., with motion system accuracy) a distance corresponding to the distance D1 of the light beam source configuration LC from the light beam sensor S1.Based at least in part on the distance indicated by the position information of the motion control system 140, the filtering section F1 and / or other techniques may be used so that the light beams BP2LB of the second pattern directed toward the light beam sensor S1 are not used to cause the first light beam sensor S1 to generate measurement signals for processing by the processing section 190 (e.g., to determine the position and orientation of the light beam source configuration LC).

[0092] As previously mentioned, in various embodiments, the light beam filter portion F1 (e.g., rotated or otherwise moved in front of the first light beam sensor S1) may be used to block the light beams BP2LB of the second pattern. In other implementations (e.g., as described below with reference to Fig. 13), the light beam filter section F1 may comprise a color filter configuration (e.g., a configuration with different filters for different colors, such as an RGB color filter configuration of a light beam sensor). The light beam sensor S1 with the color filter configuration of the light beam filter section F1 may be electronically controlled and / or processed (e.g., to use only the light beams BP1LB of the first pattern at certain times instead of the light beams BP2LB of the second pattern to cause the light beam sensor S1 to generate measurement signals for processing by the processing section 190).For example, in certain implementations, the color filter configuration may include red wavelength filter sections that transmit only red light and blue wavelength filter sections that transmit only blue light, and light beams BP1LB of the first pattern may consist of red light, and light beams BP2LB of the second pattern may consist of blue light. In such implementations, the signals may be processed such that only the red light beams BP1LB of the first pattern are used (e.g., only the signals from the pixels with the red filter sections are used) and the blue light beams BP2LB of the second pattern are not used (e.g., no signals from the pixels with the blue filter sections are used) to cause the light beam sensor S1 to generate measurement signals for processing by the processing section 190 (e.g., to determine the position and orientation of the light beam source configuration LC).

[0093] In certain implementations, light beams BP1LB of the first pattern and the light beams BP2LB of the second pattern may have different transmission timings. For example, the light beams BP1LB of the first pattern may be transmitted at certain odd timing intervals, while the light beam of the second pattern BP2LB may be transmitted at certain even timing intervals. In various implementations, the measurement system 100 may include a light beam selection section (e.g., as part of the processing section 190 or otherwise) configured to use, at certain times, signals from the light beam sensor S1 corresponding to measurement points generated by light beams BP1LB of the first pattern and to not use signals from the light beam sensor S1 corresponding to measurement points generated by the light beams BP2LB of the second pattern.Such filtering may be performed depending on the timing at which the measurement spots are generated on the light beam sensor S1 (i.e., corresponding to the timing of the transmission). As described above, such filtering may be performed such that signals resulting from measurement spots generated by the light beams BP1LB of the first pattern and signals resulting from measurement spots generated by the light beams BP2LB of the second pattern are not used for processing by the processing section 190 (e.g., for determining the position and orientation of the light beam source configuration LC).

[0094] In the example of Fig. 11B is compared to the example of Fig. 11A, the light beam source configuration LC is arranged further away from the light beam sensor S1 and closer to the light beam sensor S2. In particular, the light beam source configuration LC is illustrated at a distance D1' from the light beam sensor S2 and at a distance D2' from the light beam sensor S1. In various embodiments, the distances D1' and D2' may be equal to or equal to the distances D1 and D2 of the Fig. 11A or be different. In the example of Fig. 11B, the measuring system can be configured such that the light beams BP1LB of the first pattern directed toward the light beam sensor S2 are used to generate measurement spots that cause the light beam sensor S2 to generate measurement signals, while the light beams BP2LB of the second pattern directed toward the light beam sensor S2 are not used for processing by the processing section 190 (e.g., to determine the position and orientation of the light beam source configuration LC). Accordingly, the light beams BP2LB of the second pattern directed toward the light beam sensor S1 at a distance D2' can be used to generate measurement points that cause the light beam sensor S1 to generate measurement signals for processing by the processing section 190 (e.g., to determine the position and orientation of the light beam source configuration LC).

[0095] In various implementations, the light beam filter sections F1 and F2 (and / or other filter sections of the system) may also include a section that may be used (e.g., moved in front of a corresponding light beam sensor or otherwise used) to block or otherwise perform filtering with respect to light beams BP1LB of the first pattern. For example, in the configuration of the Fig. 11A, if the light beam source configuration LC is to be located at the distance (D2) from the light beam sensor S2, a portion of the light beam filter portion F2 (e.g., or another filter portion of the system) may be used to prevent light beams BP1LB of the first pattern from forming measurement spots on the light beam sensor S2 and / or to otherwise prevent the use of such measurement signals corresponding to the light beams BP1LB of the first pattern. Such an implementation may, for example, be used in a configuration that functions most effectively when the light beam sensor S2 receives and / or processes only one light beam from the first or the second pattern at a time. In such a configuration, in the example of Fig. 11A, it may be desirable for the light beam sensor S2 to receive and / or process only the light beams BP2LB of the second pattern and not light beams BP1LB of the first pattern (e.g., to process measurement signals resulting from measurement spots generated thereby).

[0096] In other implementations, the system may be configured to operate effectively with the light beam sensor S2 simultaneously receiving (e.g., having measurement spots generated by) both the first and second pattern light beams BP1LB and BP2LB. For example, the first pattern of light beams BP1 and the second pattern of light beams BP2 may be configured so that the light beams do not overlap or otherwise cause problems when providing light beams that are simultaneously received at and generated at measurement points on the corresponding light beam sensor (e.g., the light beam sensor S2). In view of the problem that in Fig. 11A too many measuring spots are generated on the light beam sensor S2, it should be noted that the light beams BP1LB of the first pattern only contribute to such problems to a limited extent, since they have a lower density compared to the higher density of the light beams BP2LB of the second pattern.

[0097] In various cases, as described above with reference to the example of Fig. 11A, the determination of whether the light beams BP2LB of the second pattern directed toward the first light beam sensor S1 are prevented from being used is based at least in part on a specific distance (e.g., corresponding to distance D1) of the light beam source configuration LC from the light beam sensor S1. In various implementations, a threshold distance may be specified, wherein if the specific distance is less than the specified threshold distance, the light beams BP2LB of the second pattern may not be used. In such a configuration, where the specific distance (e.g., corresponding to distance D1) is less than the threshold distance, only measurement signals corresponding to the light beams BP1LB of the first pattern may be used for processing by the processing section 190 (e.g., to determine the position and orientation of the light beam source configuration LC).

[0098] In various implementations, the determination of the distance (e.g., corresponding to distance D1) of the light beam source configuration LC from a light beam sensor (e.g., light beam sensor S1) may be determined at least in part based on position information provided by the motion controller 140 of the motion system. As described herein, the motion control system 140 may provide position information indicating, with motion system accuracy, the position of the light beam source configuration LC (e.g., within a measurement frame volume MFV), which may indicate, with motion system accuracy, a distance of the light beam source configuration LC from a light beam sensor (e.g., light beam sensor S1), and wherein the fixed locations of the light beam sensors relative to the measurement frame volume are known. Alternatively or additionally, other data may be used to determine (e.g., estimation, projection, etc.) a distance (e.g.,corresponding to the distance D1) of the light beam source configuration LC from a light beam sensor (e.g., the light beam sensor S1). For example, last known position data for the light beam source configuration LC, speed data, direction data, etc. (e.g., as determined by the motion control system 140 and / or otherwise by the measurement system 100) may be used to determine (e.g., in combination with current position data of the motion system 140 and / or motion estimates, projections, etc.) a current distance (e.g., corresponding to the distance D1) of the light beam source configuration LC from a light beam sensor (e.g., from the light beam sensor S1). As previously mentioned, in some implementations, the determined distance (e.g., corresponding to the distance D1) may be compared to a predetermined threshold distance and / or otherwise evaluated or used to determine whether light beams of a certain pattern (e.g.,B. light beams BP2LB of the second pattern) and / or corresponding signals relating to the measurement signals to be processed by the processing section 190 (e.g., for determining the position and orientation of the light beam source configuration LC) are used, blocked, or otherwise not used.

[0099] For certain configurations, there may generally be no or only a small time penalty for measuring / making determinations regarding both light beam patterns (e.g., configurations that use time-division multiplexing with different transmission timings, or that use the CFA color filter configuration, etc.). For such configurations or otherwise, in various implementations, the light beam sensor images may be examined to determine which light beam pattern is best used for processing (e.g., to determine the position and orientation of the light beam source configuration). For example, the light beam sensor images may be examined to determine which light beam pattern produces at least one measurement spot, and where the measurement spots are non-overlapping.As a more specific example, for a given light beam sensor, if the images indicate that the measurement spots generated by the second pattern of light beams BP2 overlap and that the first pattern of light beams BP1 generates at least one measurement spot on the light beam sensor, the first pattern of light beams BP1 may be used and the second pattern of light beams BP2 may not be used (e.g., the image with the one or more measurement spots corresponding to the first pattern of light beams BP1 may be used and the image with the measurement spots corresponding to the second pattern of light beams BP2 may not be used).As another example, for the given light beam sensor, if, for example, the images indicate that no measurement spots are generated on the light beam sensor by the first pattern of light beams BP1 and that at least one measurement spot is generated on the light beam sensor by the second pattern of light beams BP2, the second pattern of light beams BP2 may be used (e.g., the image with the one or more measurement spots corresponding to the second pattern of light beams BP2 may be used).

[0100] For certain applications, the sensor configuration 160 may include different numbers of light beam sensors, wherein corresponding distances of the light beam source configuration from the various light beam sensors can be determined (e.g., compared to a threshold distance, etc.). With respect to the example of Fig. 4B, it will be understood that in certain implementations, the sensor configuration 160 may include multiple light beam sensors. In such configurations, if the light beam source configuration is closer to one side (or, for example, a corner) of the measurement frame volume MFV, the light beam source configuration may correspondingly be closer to the light beam sensors on that side (or, for example, corner) of the measurement frame volume, while being farther from the light beam sensors on the opposite side (or, for example, opposite corner) of the measurement frame volume.

[0101] Fig. 12 shows a diagram of a first exemplary implementation of a light beam source section LP1'' of a light beam source configuration as may be used to provide a first and a second pattern of light beams BP1 and BP2. As in Fig. As illustrated in Figure 12, the light beam section LP1'' includes the light sources LS1, LS2A, LS2B, and diffractive optical elements DOE1, DOE2A, and DOE2B. The light source LS1 provides light corresponding to a first wavelength, such as red light in the illustrated example. The diffractive optical element DOE1 receives the light from the light source LS1 and diffracts the light into a first pattern of light beams BP1, which includes light beams BP1LB of the first pattern.

[0102] The light sources LS2A and LS2B provide light corresponding to a second wavelength, such as blue light in the illustrated example. The diffractive optical elements DOE2A and DOE2B receive the light from the light sources LS2A and LS2B, respectively, and diffract the light into second patterns of light beams BP2A and BP2B, respectively. The second patterns of light beams BP2A and BP2B include light beams BP2ALB and BP2BLB, respectively, of the second pattern. The light beams BP2A and BP2B of the second pattern, in combination, may be referred to as a second pattern of light beams BP2. The light beams BP2ALB and BP2BLB of the second pattern may both be characterized as light beams BP2LB of the second pattern.

[0103] Similar to the previous examples, the first pattern of light rays BP1 has a lower density of light rays BP1LB of the first pattern (e.g., with a corresponding larger angular spacing / a corresponding larger angular dispersion) compared to the second pattern of light rays BP2, which has a higher density of light rays BP2LB of the second pattern (e.g., with a corresponding narrower angular spacing / a corresponding narrower angular dispersion). It is understood that the first wavelength (e.g., corresponding to red light) of the light rays BP1LB of the first pattern and the second wavelength (e.g., corresponding to blue light) of the light rays BP2LB of the second pattern correspond to a different feature that allows the light rays BP1LB of the first pattern to be distinguished from the light rays BP2LB of the second pattern. As stated above, in one example, a light beam filter portion (e.g.,a light beam filling section F1 or F2) includes a filter (e.g., a color filter), such as a red color filter, that allows light beams BP1LB of the first pattern to pass through to form measurement spots on a corresponding light beam sensor and / or certain pixels thereof, while blocking light beams BP2LB of the second pattern (e.g., to prevent the light beams BP2LB of the second pattern from forming measurement spots on the light beam sensor and / or certain pixels thereof).

[0104] Fig. Figure 13 shows a diagram of a color filter configuration CFA (such as may be used, for example, to filter patterns of light beams of different colors). In some implementations, the color filter configuration CFA may be an integrated part of the light beam sensors (e.g., which in some cases may be types of color cameras, etc.). In the example of Fig. 13, the color filter array CFA includes three types of pixel filter sections PX1, PX2, and PX3. In various implementations, the pixel filter sections PX1 may correspond to red filter sections, while the pixel filter sections PX2 may correspond to blue filter sections, and the pixel filter sections PX3 may correspond to green filter sections. As described above with respect to Fig. 12, in one implementation, the light beams BP1LB of the first pattern are red and the light beams BP2LB of the second pattern are blue. In such an implementation, a light beam filter section (e.g., light beam filter section F1 or F2) including the color filter configuration CFA of Fig. 13 can be used to determine / control whether light beams of a certain pattern (e.g., light beams BP2LB of the second pattern) are used to generate measurement signals for processing by the processing section 190 (e.g., to determine the position and orientation of the light beam source configuration LC).

[0105] For example, if the light beams BP2LB of the second pattern are not to be used, the light beam sensor with the color filter configuration CFA can be controlled such that the pixels corresponding to the pixel filter sections PX2 (e.g., with the blue filter sections) are not used to provide measurement signals for processing by the processing section 190 (e.g., to determine the position and orientation of the light beam source configuration LC). With such a configuration, the light beam sensor with the color filter configuration CFA can be controlled such that the signals of the pixels corresponding to the pixel filter sections PX1 (e.g., with the red filter sections), which generate measurement signals based on measurement spots formed by light beams PB1LB of the first pattern (e.g., red light beams), are used for processing by the processing section 190 (e.g.,to determine the position and orientation of the light beam source configuration (LC).

[0106] Fig. 14 is a diagram of a second exemplary implementation of a light beam source portion LP1''' of a light beam source configuration as may be used to provide a first and second pattern of light beams BP1 and BP2; in the example of Fig. 14, the light beam section LP1''' includes the light sources LS1, LS2A and LS2B as well as the diffractive optical elements DOE1, DOE2A and DOE2B. In some embodiments, separate polarization elements (not shown) may also be provided. In the example of Fig. 14, the light source LS1 directs light having a first circular polarization onto the diffractive optical element DOE1, which diffracts the light to form the first pattern of light rays BP1, which includes a relatively lower density of light rays BP1LB of the first pattern.

[0107] The light sources LS2A and LS2B direct light with a second circular polarization (i.e., opposite to the first circular polarization of the light directed by the light source LS1), which is received and diffracted by the diffractive optical elements DOE2A and DOE2B to form the second patterns of light rays BP2A and BP2B, which include a relatively higher density of light rays BP2ALB and BP2BLB of the second pattern. In various implementations, the second pattern of light rays BP2 may be characterized to include the second patterns of light rays BP2A and BP2B, and the light rays BP2LB of the second pattern may be characterized to include the light rays of the second pattern BP2ALB and BP2BLB.

[0108] The first circular polarization of the light directed by the first light source is indicated by a first polarization indicator PI1, and the second circular polarization (opposite to the first circular polarization) of the light directed by the light sources LS2A and LS2B is indicated by the polarization indicators (PI2A) and (PI2B). In various implementations, the first circular polarization of the light rays BP1LB of the first pattern and the second circular polarization of the light rays BP2LB of the second pattern correspond to another feature that allows the light rays BP1LB of the first pattern to be distinguished from the light rays BP2LB of the second pattern. For example, in one implementation, a light beam filtering section (e.g., such as the light beam filtering section F1 or F2) may include a polarization filter for filtering certain light rays. The light beam filtering section F1 may, with reference to the example of the Fig. 11A, may include a polarization filter that transmits light rays BP1LB of the first pattern having the first circular polarization (e.g., forming measuring spots on the light beam sensor S1), while blocking the light rays BP2LB of the second pattern having the second circular polarization.

[0109] Fig. 15 is a diagram of a third exemplary implementation of a light beam source portion LP1'''' of a light beam source configuration as may be used to provide a first and second pattern of light beams. In the example of Fig. 15, the light beam source section LP''' includes a light source LS1, a waveplate WP, a reflective element RE1, a beam splitter BS, and diffractive optical elements DOE1 and DOE2A. The light from the light source LS1 is indicated linearly polarized by a polarization indicator PI-L and provided to a waveplate WP (e.g., a quarter-wave plate) and reflected by the reflection surface RE1 toward the beam splitter BS. In various implementations, the reflection of the near-normal beam splitter BS changes a sign of circular polarization of the light and can thus reduce a required number of quarter-wave plates (e.g., the illustrated configuration includes only the single quarter-wave plate WP). In some implementations, a circular polarizer can be used as an alternative to a waveplate.The light transmitted through the beam splitter BS is indicated by a polarization indicator PI1 with a first circular polarization, and the light reflected by the beam splitter BS is indicated by a second polarization indicator PI2 with a second circular polarization (opposite to the first circular polarization).

[0110] The light with the first circular polarization is diffracted by the first diffractive optical element DOE1 to form the first pattern of light rays BP1, which includes the light rays BP1LB of the first pattern with the relatively lower density and which has the first circular polarization. The light with the second circular polarization is diffracted by the diffractive optical element DOE2A to form the second pattern of light rays BP2A, which includes the light rays of the second pattern BP2ALB with the relatively higher density and which has the second circular polarization. In various implementations, the second pattern of light rays BP2A and the light rays of the second pattern BP2BLB may correspond to the second pattern of light rays BP2 and the light rays BP2LB of the second pattern (e.g., similar to those in Fig. 14). The first polarization of the light rays BP1LB of the first pattern and the second polarization (which is, for example, opposite to the first polarization) of the light rays BP2LB of the second pattern correspond to another feature that makes it possible to distinguish light rays BP1LB of the first pattern from the light rays BP2LB of the second pattern, similar to that described above with respect to Fig. Example described in 14.

[0111] Referring to the examples of Fig. 12, Fig. 14 and Fig. 15, in various implementations, the diffractive optical elements DOE for generating the different patterns of light beams may have different characteristics (e.g., with respect to the corresponding scattering angles and / or for operation with respect to the different characteristics of the first and second patterns of light beams, etc.). In certain implementations, other configurations may also be used as part of the light beam source configuration for providing the first and second patterns of light beams. For example, certain types of variable projectors (e.g., a variable projector chip) may be used, which may be configured to generate and switch between different patterns of light beams with a single device. In one implementation of such a configuration, the first and second patterns of light beams may be provided with different transmission timings.In various implementations, metasurfaces and / or metamaterials may also or alternatively be used to generate the patterns of light beams with the different features. For example, a configuration employing such metasurfaces and / or metamaterials may use only a single light source from which different wavelengths can be generated for the first and second patterns of light beams, or alternatively, different light sources may be used that provide different wavelengths but are directed toward a common configuration employing metasurfaces and / or metamaterials (e.g., functioning similarly to a common diffractive optical element or array of such elements) to provide the first and second patterns of light beams.

[0112] Fig. 16 is a flowchart illustrating an exemplary implementation of a routine 1600 for operating a metrology system. At a block 1610, a light beam source configuration (i.e., of the metrology system) is operated to direct a first pattern of light beams BP1 and a second pattern of light beams BP2 onto light beam sensors of a sensor configuration (i.e., of the metrology system) to indicate a position and orientation of the light beam source configuration. In various implementations, the light beam source configuration is coupled to an end tool and / or an end tool mounting configuration of a motion system that moves the end tool. The position and orientation of the light beam source configuration are indicative of a position and orientation of the end tool.The sensor configuration comprises a plurality of light beam sensors located at fixed positions, including at least a first light beam sensor at a first position and a second light beam sensor at a second position. At least a portion of the light beams directed toward and received by the light beam sensors generate measurement spots at positions on the light beam sensors, causing the light beam sensors to generate corresponding measurement signals. The first pattern of light beams BP1 has a lower density of light beams BP1LB of the first pattern relative to the second pattern of light beams BP2, which has a higher density of light beams BP2LB of the second pattern.

[0113] At a block 1620, the measurement signals from the light beam sensors of the sensor configuration are processed to determine a position and orientation of the light beam source configuration. For at least a first position of the light beam source configuration having a first distance from the first light beam sensor and a second distance from the second light beam sensor, the second distance being greater than the first distance, one or more light beams BP1LB of the first pattern directed toward the first light beam sensor are used to cause the first light beam sensor to generate measurement signals for processing to determine the position and orientation, and light beams BP2LB of the second pattern directed toward the first light beam sensor are not used to cause the first light beam sensor to generate measurement signals for processing to determine the position and orientation.In addition, one or more light beams BP2LB of the second pattern directed toward the second light beam sensor are used to cause the second light beam sensor to generate measurement signals for processing to determine position and orientation.

[0114] In various implementations, routine 1600 may further include receiving position information from the motion system 110 that moves the end tool ETL, wherein the position information from the motion system 110 indicates, with motion system accuracy, a first distance of the light beam source configuration LC from the first light beam sensor, and based at least in part on the first distance as indicated by position information from the motion system 110, the light beams BP2LB of the second pattern directed toward the first light beam sensor are not used to cause the first light beam sensor to generate measurement signals for processing to determine the position and orientation.

[0115] In various implementations, for at least a second position of the light beam source configuration LC, which is a third distance from the first light beam sensor and a fourth distance from the second light beam sensor, the third distance being greater than the fourth distance: one or more light beams BP1LB of the first pattern directed towards the second light beam sensor are used to cause the second light beam sensor to generate measurement signals for processing to determine the position and orientation, and light beams BP2LB of the second pattern directed towards the second light beam sensor are not used to cause the second light beam sensor to generate measurement signals for processing to determine the position and orientation;and one or more light beams BP2LB of the second pattern directed toward the first light beam sensor are used to cause the first light beam sensor to generate measurement signals for processing to determine position and orientation.;

[0116] In the following, various embodiments of the present disclosure are described with various features and elements that are consistent with the Fig. 1-16. It is understood that the reference numerals are added to identify embodiments and that the features and elements do not apply to the Fig. 1-16 are limited to the particular embodiments illustrated.

[0117] As described herein, a measurement system 100 is provided for use with a motion system 110 that moves an end tool ETL. The motion system 110 includes a movable configuration MAC and a motion control system 140. The movable configuration MAC includes an end tool mounting configuration ETMC to which an end tool ETL can be mounted. The motion control system 140 is configured to control an end tool position and orientation based at least in part on control of the movable configuration MAC to move at least a portion of an end tool ETL mounted to the end tool mounting configuration ETMC within a motion volume MV.

[0118] The measurement system 100 includes a sensor configuration 160, a light beam source configuration LC, and a processing section 190. The sensor configuration 160 includes a plurality of fixed-position light beam sensors S1-S4, including at least a first light beam sensor at a first position and a second light beam sensor at a second position. The light beam source configuration LC is configured to direct a first pattern of light beams BP1 and a second pattern of light beams BP2 onto light beam sensors (e.g., including light beam sensors S1-S4) of the sensor configuration 160 to indicate a position and orientation of the light beam source configuration LC.

[0119] The light beam source configuration LC is configured to be coupled to at least one of the end tools ETL or the end tool assembly configuration ETMC. At least a portion of the light beams directed toward and received by the light beam sensors is configured to generate measurement spots at positions on the light beam sensors, causing the light beam sensors to generate corresponding measurement signals. The first pattern of light beams BP1 has a lower density of light beams BP1LB of the first pattern relative to the second pattern of light beams BP2, which has a higher density of light beams BP2LB of the second pattern.

[0120] The processing section 190 is configured to process the measurement signals from the light beam sensors of the sensor configuration 160 to determine a position and orientation of the light beam source configuration LC. The measurement system 100 is configured such that for at least a first position of the light beam source configuration LC, which is a first distance from the first light beam sensor and a second distance from the second light beam sensor, wherein the second distance is greater than the first distance: one or more light beams BP1LB of the first pattern directed towards the first light beam sensor are used to cause the first light beam sensor to generate measurement signals for processing by the processing section 190, and light beams BP2LB of the second pattern directed towards the first light beam sensor are not used to causethat the first light beam sensor generates measurement signals for processing by the processing section 190; and one or more light beams BP2LB of the second pattern directed toward the second light beam sensor are used to cause the second light beam sensor to generate measurement signals for processing by the processing section 190.

[0121] In various implementations, the light beams BP1LB of the first pattern and the light beams BP2LB of the second pattern have at least one different feature that allows light beams BP1LB of the first pattern to be distinguished from the light beams BP2LB of the second pattern. In various implementations, the at least one different feature is at least one of: a different wavelength; a different polarity; or a different timing of transmission. In various implementations, the measurement system further comprises at least one first light beam selection section configured to operate based on the at least one different feature. In various implementations, the selection section may comprise a light beam filtering section (e.g.,wherein multiple light beam filter sections may be present, such as including a light beam filter section in front of each light beam sensor, as in the example of . Fig. 11A and Fig. 11B) and / or may include a portion of the processing section 190 or another processing section that selects, filters, and / or blocks signals generated by light beams, as may operate based on features such as different timings of transmission of the light beams, etc.

[0122] In various implementations based at least in part on an indication of the first distance of the light beam source configuration LC from the first light beam sensor, the first light beam selection section is configured to prevent the light beams BP2LB of the second pattern directed toward the first light beam sensor from being used to cause the first light beam sensor to generate measurement signals for processing by the processing section 190 (e.g., to determine the position and orientation of the light beam source configuration LC).In various implementations, the first light beam selection section is configured to be used to perform at least one of blocking the light beams BP2LB of the second pattern from reaching the first light beam sensor or preventing measurement signals resulting from the light beams BP2LB of the second pattern at the first light beam sensor from being processed by the processing section 190. As an example of such features, with reference to the illustration of FIG. Fig. 11A, which is based at least in part on an indication of the first distance D1 of the light beam source configuration LC from the first light beam sensor S1, the first light beam selection section (e.g., the light beam filter section F1) is configured to prevent the light beams BP2LB of the second pattern directed toward the first light beam sensor S1 from being used to cause the first light beam sensor S1 to generate measurement signals for processing by the processing section 190 (e.g., the light beam filter section F1 blocks the light beams BP2LB of the second pattern from reaching the first light beam sensor S1).

[0123] In various implementations, the at least one different feature between the light beams BP2LB of the first and second patterns is at least one of a different wavelength or a different polarity (e.g., as indicated by the different configurations in the Fig. 12, Fig. 14 and Fig. 15), and the first light beam selection section comprises a first light beam filter section (e.g., the light beam filter section F1) comprising at least one of a wavelength filter or a polarity filter configured to be moved in front of the first light beam sensor to block the light beams BP2LB of the second pattern. In various implementations, the measurement system 100 further comprises at least one second light beam selection section configured to operate based on the at least one different feature and comprising a second light beam filter section (e.g., light beam filter section F2) comprising at least one of a wavelength filter or a polarity filter, and wherein the first and second light beam filter sections are configured to be used to perform filtering for the first and second light beam sensors, respectively (e.g.,as in the examples of . Fig. 11A and Fig. 11B).

[0124] In various implementations, the measuring system 100 is configured such that for at least a second position of the light beam source configuration LC (e.g., the second position as in Fig. 11B illustrates in comparison to the first position in Fig. 11A), which is a third distance (e.g., distance D2') from the first light beam sensor and a fourth distance from the second light beam sensor, the third distance being greater than the fourth distance: one or more light beams BP1LB of the first pattern directed toward the second light beam sensor are used to cause the second light beam sensor to generate measurement signals for processing by the processing section 190, and light beams BP2LB of the second pattern directed toward the second light beam sensor are not used to cause the second light beam sensor to generate measurement signals for processing by the processing section 190; and one or more light beams BP2LB of the second pattern directed toward the first light beam sensor are used to cause the first light beam sensor to generate measurement signals for processing by the processing section 190.

[0125] In various implementations, the light beam source configuration LC is configured to simultaneously direct the first pattern of light beams BP1 and the second pattern of light beams BP2 onto the light beam sensors of the sensor configuration 160. In various implementations, the motion control system 140 is configured to provide position information that, with the motion system accuracy, determines a first distance (e.g., the distance D1 from Fig. 11A) of the light beam source configuration LC from the first light beam sensor, and based at least in part on the first distance as indicated by the position information from the motion control system 140, the light beams BP2LB of the second pattern directed toward the first light beam sensor are not used to cause the first light beam sensor to generate measurement signals for processing by the processing section 190. In various implementations, the measurement system includes at least a first light beam selection section (e.g., the light beam filter section F1 and / or a portion of the processing section 190, etc.).), wherein the first light beam selection section is configured to prevent the light beams BP2LB of the second pattern directed toward the first light beam sensor from being used to cause the first light beam sensor to generate measurement signals for processing by the processing section 190 based at least in part on the first distance as indicated by position information from the motion control system 140.

[0126] For example, based on the determined distance D1, the light beam filter section F1 may be positioned in front of the first light beam sensor S1 to prevent the light beams BP2LB of the second pattern from reaching the detection range of the first light beam sensor S1, for example, in a configuration in which the light beam filter section F1 is a rotatable light beam filter section with a filter that is operated to be rotated in front of the first light beam sensor S1. As another example, the light beam filter section F1 may have a color filter configuration CFA (e.g., as shown in Fig. 13) and / or another component or mechanism that operates similarly (e.g., partially without requiring movement) to filter light beams BP1LB of the first pattern and / or the signals generated thereby from light beams BP2LB of the second pattern and / or the signals generated thereby. In another example, at least a portion of processing section 190 (or another processing section) may be characterized as a light beam selection section configured to select signals of first light beam sensor S1 resulting from light beams BP1LB of the first pattern, but not to select signals of first light beam sensor S1 resulting from light beams BP2LB of the second pattern (e.g., when the light beams of the first and second patterns are first and second, respectively).second timings of transmission, only the signals corresponding to the first timing of transmission can be selected and / or otherwise processed by the processing section, e.g. to determine the position and orientation of the light beam source configuration LC).

[0127] In various embodiments, each of the light beam sensors (e.g., including light beam sensors S1-S4) comprises a two-dimensional position-sensitive sensor, wherein the measurement signals of the light beam sensors indicate the two-dimensional positions of measurement spots SP on the light beam sensors S1-S4 generated by light beams. In various implementations, a measurement frame volume MFV is defined at least partially by the plurality of light beam sensors located at the fixed positions, wherein the measurement frame volume MFV is configured to surround at least a portion of the movement volume MV, and the first and second light beam sensors S1 and S2 are arranged on opposite sides of the measurement frame volume MFV. In various implementations, the light beam source configuration LC comprises one or more diffractive optical elements DOE (such as the diffractive optical elements of the Fig. 3, Fig. 12, Fig. 14 and / or 15) and at least a part of the light rays from the light beam source configuration LC are diffracted light rays.

[0128] In various implementations, the motion control system 140 is configured to detect and control a position and orientation of the end tool ETL with an accuracy defined as a motion system accuracy, based at least in part on detecting and controlling the position and orientation of the end tool ETL using a plurality of position sensors SEN included in the movable configuration MAC (e.g., as in Fig. 1). The processing section 190 is operable to determine a position and orientation of the end tool ETL with a level of accuracy better than the motion system accuracy, based at least in part on processing the measurement signals from the light beam sensors (e.g., including light beam sensors S1-S4) to determine a position and orientation of the light beam source configuration LC, and wherein the position and orientation of the light beam source configuration LC are indicative of the position and orientation of the end tool ETL.

[0129] For example, for a first position of the light beam source configuration LC (e.g. as shown in Fig. 11A), the light beams directed by the light beam source configuration LC to the sensor configuration 160 comprise a first pattern light beam BP1LB, and a determination of which light beam sensor the first pattern light beam BP1LB is directed to is based at least in part on a sensed position and orientation of the end tool ETL as determined using the plurality of position sensors included in the movable configuration MAC.In this example, the light beam sensor to which the first pattern light beam is directed is the first light beam sensor S1, and the processing section 190 is operable to determine the position and orientation of the end tool ETL with a level of accuracy better than the motion system accuracy based at least in part on processing a first measurement signal from the first light beam sensor S1, the first measurement signal indicative of a position of a first measurement spot SP1 as formed by the first pattern light beam BP1LB on the first light beam sensor S1 (e.g., examples of measurement spot positions and corresponding position indications / determinations for the light beam source configuration and / or the end tool ETL are described above with respect to FIG. Fig. 5A-5H and 6A-6C).

[0130] As described above, it may generally be desirable for the measurement spots generated on a light beam sensor to not overlap. It may also generally be desirable for at least one measurement spot to be generated on a light beam sensor. Relative to the non-overlapping measurement spots (e.g., particularly when the measurement spots are relatively large), it may be desirable for the light beam source configuration to generate a low density of measurement spots when the light beam source configuration is relatively closer to the light beam sensor. With regard to generating at least one measurement spot on a light beam sensor, it may be desirable for the light beam source configuration to provide a high density of measurement spots when the light beam source configuration is relatively farther from the light beam sensor.

[0131] As described above, in various implementations, a first pattern of light rays BP1 and a second pattern of light rays BP2 may be provided, wherein the first pattern of light rays BP1 may have a lower density of light rays BP1LB of the first pattern compared to the second pattern of light rays BP2, which may have a higher density of light rays BP2LB of the second pattern. In various implementations, the first and second patterns of light rays BP1 and BP2 may be distinguishable from each other by different features (e.g., different wavelengths, different circular polarizations, different timing of transmission, etc.). An implementation with different wavelengths is described above with reference to Fig. 12, and implementations with different circular polarizations are described above with reference to Fig. 14 and Fig. 15 described.

[0132] While preferred implementations of the present disclosure have been illustrated and described, numerous variations of the illustrated and described arrangements of features and operations will be apparent to those skilled in the art based on the present disclosure. Various alternative forms may be used to implement the principles disclosed herein. In addition, the various implementations described above may be combined to form further implementations. All U.S. patents and U.S. patent applications cited in this specification are incorporated herein by reference in their entirety. Aspects of the implementations may be modified to utilize concepts of the various patents and applications, if desired, to provide still further implementations.

[0133] These and other changes may be made to the implementations in light of the detailed description above. In general, the terms used in the following claims should not be construed to limit the claims to the specific implementations disclosed in the description and claims, but should be construed to include all possible implementations, along with the full scope of equivalents to which such claims are entitled. QUOTES CONTAINED IN THE DESCRIPTION

[0000] This list of documents submitted by the applicant was generated automatically and is included solely for the convenience of the reader. This list is not part of the German patent or utility model application. The DPMA assumes no liability for any errors or omissions. Cited patent literature

[0000] US 4,725,965

[0003]

Claims

[1] Measuring system for use with a motion system that moves an end tool, the movement system comprising: a movable configuration including an end tool mounting configuration to which an end tool can be mounted; and a motion control system configured to control an end tool position and orientation based at least in part on the control of the movable configuration to move at least a portion of an end tool mounted to the end tool mounting configuration within a movement volume, the measuring system comprising: a sensor configuration comprising a plurality of light beam sensors located at fixed positions, including at least a first light beam sensor at a first position and a second light beam sensor at a second position; a light beam source configuration configured to direct a first pattern of light beams and a second pattern of light beams onto light beam sensors of the sensor configuration to indicate a position and orientation of the light beam source configuration, wherein: the light beam source configuration is configured to be coupled to at least one of an end tool or the end tool mounting configuration; at least a portion of the light beams directed at and received by the light beam sensors is configured to generate measurement spots at positions on the light beam sensors, causing the light beam sensors to generate corresponding measurement signals; and the first pattern of light rays has a lower density of light rays of the first pattern relative to the second pattern of light rays, which has a higher density of light rays of the second pattern; and a processing section is configured to process the measurement signals from the light beam sensors of the sensor configuration to determine a position and orientation of the light beam source configuration, wherein the measuring system is configured such that for at least a first position of the light beam source configuration, which is a first distance from the first light beam sensor and a second distance from the second light beam sensor, the second distance being greater than the first distance: one or more light beams of the first pattern directed at the first light beam sensor are used to cause the first light beam sensor to generate measurement signals for processing by the processing section, and light beams of the second pattern directed at the first light beam sensor are not used to cause the first light beam sensor to generate measurement signals for processing by the processing section; and one or more light beams of the second pattern directed toward the second light beam sensor are used to cause the second light beam sensor to generate measurement signals for processing by the processing section. [2] The measuring system of claim 1, wherein the light rays of the first pattern and the light rays of the second pattern have at least one different feature that allows light rays of the first pattern to be distinguished from the light rays of the second pattern. [3] The measurement system of claim 2, wherein the at least one different feature is at least one of: a different wavelength, a different polarity, or a different timing of the transmission. [4] The measuring system of claim 2, further comprising at least a first light beam selection section configured to operate based on the at least one different feature. [5] The measurement system of claim 4, wherein, based at least in part on an indication of the first distance of the light beam source configuration from the first light beam sensor, the first light beam selection section is configured to prevent the light beams of the second pattern directed toward the first light beam sensor from being used to cause the first light beam sensor to generate measurement signals for processing by the processing section. [6] The measurement system according to claim 5, wherein the first light beam selecting section is configured to be used to perform at least one of blocking the light beams of the second pattern from reaching the first light beam sensor or preventing measurement signals resulting from the light beams of the second pattern at the first light beam sensor from being processed by the processing section. [7] The measuring system of claim 5, wherein the at least one different feature between the light beams of the first and second patterns is at least one of a different wavelength or a different polarity, and the first light beam selection section comprises a first light beam filter section including at least one of a wavelength filter or a polarity filter configured to be moved in front of the first light beam sensor for blocking the light beams of the second pattern. [8] The measurement system of claim 7, further comprising at least one second light beam selection section configured to operate based on the at least one different feature and comprising a second light beam filtering section including at least one of a wavelength filter or a polarity filter, and wherein the first and second light beam filtering sections are configured to be used to perform filtering for the first and second light beam sensors, respectively. [9] The measuring system of claim 1, wherein the measuring system is configured such that for at least a second position of the light beam source configuration, which is a third distance from the first light beam sensor and a fourth distance from the second light beam sensor, the third distance being greater than the fourth distance: one or more light beams of the first pattern directed at the second light beam sensor are used to cause the second light beam sensor to generate measurement signals for processing by the processing section, and light beams of the second pattern directed at the second light beam sensor are not used to cause the second light beam sensor to generate measurement signals for processing by the processing section; and one or more light beams of the second pattern directed toward the first light beam sensor are used to cause the first light beam sensor to generate measurement signals for processing by the processing section. [10] The measurement system of claim 1, wherein the light beam source configuration is configured to simultaneously direct the first pattern of light beams and the second pattern of light beams onto the light beam sensors of the sensor configuration. [11] The measurement system of claim 1, wherein the motion control system is configured to provide position information indicative of a first distance of the light beam source configuration from the first light beam sensor with the motion system accuracy, and based at least in part on the first distance as indicated by the position information from the motion control system, the light beams of the second pattern directed toward the first light beam sensor are not used to cause the first light beam sensor to generate measurement signals for processing by the processing section. [12] The measurement system of claim 11, further comprising at least a first light beam selecting section, wherein the first light beam selecting section is configured, based at least in part on the first distance as indicated by position information from the motion control system, to prevent the light beams of the second pattern directed toward the first light beam sensor from being used to cause the first light beam sensor to generate measurement signals for processing by the processing section. [13] The measuring system of claim 1, wherein each of the light beam sensors comprises a two-dimensional position-sensitive sensor, wherein the measurement signals of the light beam sensors indicate the two-dimensional positions of measurement spots on the light beam sensors generated by light beams. [14] The measurement system of claim 1, wherein a measurement frame volume is at least partially defined by the plurality of light beam sensors located at the fixed positions, the measurement frame volume configured to surround at least a portion of the moving volume, and the first and second light beam sensors are disposed on opposite sides of the measurement frame volume. [15] The measuring system of claim 1, wherein the light beam source configuration comprises one or more diffractive optical elements and at least a portion of the light beams of the light beam source configuration are diffracted light beams. [16] Measuring system according to claim 1, wherein: the motion control system is configured to detect and control a position and orientation of the end tool with an accuracy defined as a motion system accuracy based at least in part on detecting and controlling the position and orientation of the end tool using a plurality of position sensors included in the movable configuration; and the processing section is operable to determine a position and orientation of the end tool with a level of accuracy better than the motion system accuracy, based at least in part on processing the measurement signals from the light beam sensors to determine a position and orientation of the light beam source configuration, and wherein the position and orientation of the light beam source configuration are indicative of the position and orientation of the end tool. [17] Measuring system according to claim 16, wherein: for the first position of the light beam source configuration, the light beams directed by the light beam source configuration toward the sensor configuration include a light beam of the first pattern, and a determination of which light beam sensor the light beam of the first pattern is directed toward is based at least in part on a sensed position and orientation of the end tool as determined using the plurality of position sensors included in the movable configuration; and the light beam sensor to which the light beam of the first pattern is directed is the first light beam sensor, and the processing section is operable to determine the position and orientation of the end tool with a level of accuracy better than the motion system accuracy based at least in part on processing a first measurement signal from the first light beam sensor, the first measurement signal indicative of a position of a first measurement spot as formed by the light beam of the first pattern on the first light beam sensor. [18] A method for operating a measuring system including a light beam source configuration, the method comprising: Operating the light beam source configuration to direct a first pattern of light beams and a second pattern of light beams onto light beam sensors of a sensor configuration to indicate a position and orientation of the light beam source configuration, wherein: the light beam source configuration is coupled to at least one of an end tool or an end tool mounting configuration of a motion system that moves the end tool; the position and orientation of the light beam source configuration LC indicate the position and orientation of the end tool ETL; the sensor configuration comprises a plurality of light beam sensors located at fixed positions, including at least a first light beam sensor at a first position and a second light beam sensor at a second position; at least a portion of the light beams directed at and received by the light beam sensors generates measurement spots at positions on the light beam sensors, causing the light beam sensors to generate corresponding measurement signals; and the first pattern of light rays has a lower density of light rays of the first pattern relative to the second pattern of light rays, which has a higher density of light rays of the second pattern; and Processing the measurement signals from the light beam sensors of the sensor configuration to determine a position and orientation of the light beam source configuration; wherein: for at least a first position of the light beam source configuration, which is a first distance from the first light beam sensor and a second distance from the second light beam sensor, the second distance being greater than the first distance: one or more light beams of the first pattern directed at the first light beam sensor are used to cause the first light beam sensor to generate measurement signals for processing to determine the position and orientation, and light beams of the second pattern directed at the first light beam sensor are not used to cause the first light beam sensor to generate measurement signals for processing to determine the position and orientation; and one or more light beams of the second pattern directed at the second light beam sensor are used to cause the second light beam sensor to generate measurement signals for processing to determine the position and orientation. [19] The method of claim 18, further comprising receiving position information from the motion system that moves the end tool, wherein the position information from the motion system indicates, with motion system accuracy, a first distance of the light beam source configuration from the first light beam sensor, and based at least in part on the first distance as indicated by position information from the motion system, the light beams of the second pattern directed toward the first light beam sensor are not used to cause the first light beam sensor to generate measurement signals for processing to determine the position and orientation. [20] The method of claim 18, wherein: for at least a second position of the light beam source configuration being a third distance from the first light beam sensor and a fourth distance from the second light beam sensor, the third distance being greater than the fourth distance: one or more light beams of the first pattern directed at the second light beam sensor are used to cause the second light beam sensor to generate measurement signals for processing by the processing section, and light beams of the second pattern directed at the second light beam sensor are not used to cause the second light beam sensor to generate measurement signals for processing by the processing section; and one or more light beams of the second pattern directed at the first light beam sensor are used to cause the first light beam sensor to generate measurement signals for processing to determine the position and orientation. [21] Measuring system comprising: a sensor configuration comprising a plurality of light beam sensors located at fixed positions, including at least a first light beam sensor at a first position and a second light beam sensor at a second position; a light beam source configuration configured to direct a first pattern of light beams and a second pattern of light beams onto the light beam sensors of the sensor configuration to indicate a position and orientation of the light beam source configuration, wherein: the light beam source configuration is configured to be coupled to at least one of an end tool or an end tool mounting configuration of a motion system that moves the end tool; the position and orientation of the light beam source configuration LC indicate the position and orientation of the end tool ETL; at least a portion of the light beams directed at and received by the light beam sensors is configured to generate measurement spots at positions on the light beam sensors, causing the light beam sensors to generate corresponding measurement signals; and the first pattern of light rays has a lower density of light rays of the first pattern relative to the second pattern of light rays, which has a higher density of light rays of the second pattern; and the processing section is configured to process the measurement signals from the light beam sensors of the sensor configuration to determine a position and orientation of the light beam source configuration, wherein the measuring system is configured such that for at least a first position of the light beam source configuration, which is a first distance from the first light beam sensor and a second distance from the second light beam sensor, the second distance being greater than the first distance: one or more light beams of the first pattern directed at the first light beam sensor are used to cause the first light beam sensor to generate measurement signals for processing by the processing section, and light beams of the second pattern directed at the first light beam sensor are not used to cause the first light beam sensor to generate measurement signals for processing by the processing section; and one or more light beams of the second pattern directed toward the second light beam sensor are used to cause the second light beam sensor to generate measurement signals for processing by the processing section.

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