EUV driver laser for generating an EUV light beam emitting plasma state, apparatus for exposing a photosensitive coating, use of the EUV driver laser, method for generating an EUV light beam emitting plasma state and method for exposing a photosensitive coating

Abstract

EUV driver laser (10) for generating an EUV light beam (18) emitting plasma state of a target material (68), comprising: a plurality of laser beam sources (22) for generating a plurality of laser beams (24); a combination device (62) for combining the plurality of laser beams (24) into an excitation beam (64) for generating the plasma state; and a focusing device (66) for focusing the excitation beam (64) onto the target material (68) for generating the plasma state. Each laser beam source (22) comprises a mirror (26), an output coupling mirror (28), a laser-active medium (30) arranged between the mirror (26) and the output coupling mirror (28), and a photonic structure (34) configured to determine at least one beam parameter of the laser beam (24). The mirror (26) faces a first broadside (38) of the laser-active medium (30).The output coupling mirror (28) faces a second broadside (40) of the laser-active medium (30).

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