Semiconductor device and light detection device
The semiconductor device addresses slow charge transfer in solid-state imaging devices by employing a field-effect transistor with a thicker sidewall insulator and multiple gate electrodes, improving performance through reduced parasitic capacitance.
Patent Information
- Authority / Receiving Office
- DE · DE
- Patent Type
- Applications
- Current Assignee / Owner
- SONY SEMICON SOLUTIONS CORP
- Filing Date
- 2024-06-06
- Publication Date
- 2026-06-03
AI Technical Summary
The existing solid-state imaging devices face challenges with slow transfer rates of electrical charge due to parasitic capacitance arising from the floating diffusion, insulator, and extraction electrode, which affects the performance characteristics of the transfer transistor.
The semiconductor device incorporates a field-effect transistor with an insulated gate embedded in a groove's side wall, featuring a thicker sidewall insulator and an electrode electrically coupled to the gate electrode, along with a transfer transistor design that includes multiple gate electrodes and insulating films to enhance charge transfer efficiency.
This configuration improves the transfer rate of electrical charge, enhancing the performance characteristics of the semiconductor device and light detection device by reducing parasitic capacitance and optimizing transistor properties.
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