Fluorene nylaminoketone photoinitiator, manufacturing process therefor and UV light-curable composition thereof

Description

TECHNICAL FIELD

[0001] The present invention relates to the technical field of novel UV-light radiation radical polymerizable material, and particularly to a fluorenylaminoketone photoinitiator, a preparation method thereof, and a UV photocurable composition containing same.BACKGROUND ART

[0002] Alpha-aminoalkylphenone photoinitiators are a kind of photoinitiators having very high reactivities. Here, commercial photoinitiators include 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)butanone and 2-(4-methylbenzyl)-2-dimethylamino-1-(4-morpholinophenyl)butanone, which are alpha-aminoalkylphenone photoinitiators produced by Ciba Co., Ltd., under trade names of "Irgacure 369" and "Irgacure 379", respectively, which structures are as follows:

[0003] This kind of photoinitiator is usually used in combination with thioxanthone photoinitiators in photocuring of colored systems, and exhibit excellent photoinitiator properties. For example, this kind of photoinitiator is widely used in ceramic inkjet technology. However, these photoinitiators are poorly compatible with matrix resins, and a large amount of organic solvent is often needed to be added, which is disadvantageous to the health of the production operator and results in certain environmental pollution at the meanwhile. Furthermore, with the addition of solvent, ink will easily diffuse and patterns become unclear, and decorative effects of high resolution and high precision cannot be achieved. On the other hand, due to use in colored systems, there are disadvantages of low curing speed, difficulty in complete curing of deep parts, and limited thickness of coating layers in terms of properties, and the applications thereof are thereby limited.

[0004] In 2001, Patent document JP2001348412A discloses a liquid curable resin composition using 2-methyl-1-[4-(methylthio)phenyl]-2-(4-morpholinyl)-1-acetone (trade name: Irgacure 907) as a photoinitiator component. However, a methylthio group is contained in an aromatic ring system in the structure of this compound, and there will be inevitably problems of generation of bad odor after decomposition by light irradiation and serious yellowing of cured products. This cannot be used in the fields of food packages, varnish coatings, white ink, and the like.

[0005] With respect to the deficiencies described above, there are related reports about researches on substitutes for Irgacure 907 photoinitiator in recent years. For example, Patent Application No.CN101724099 discloses a series of alpha-aminoketone compounds as biphenyl derivatives, wherein 1-([1,1-biphenyl]-4-yl)-2-methyl-2-morpholinylpropan-1-one is an effective substitute for Irgacure 907. This compound does not contain sulfur element, and exhibits excellent yellowing resistance and will not generate any bad odor after decomposition by light irradiation when used in a UV radical photopolymerizable curing system. However, it is found in practical applications that this photoinitiator has poor solubility and will easily sublimate, leading to pollution of production facilities and light sources, and thus it is not a perfect substitute.

[0006] These problems have attracted considerable attention in the industry, and applications of UV coatings and UV inks in various fields such as furniture, appliances, automobile interiors, cigarettes, foods, medicines, cosmetics, and the like are greatly limited due to problems of odor, yellowing, toxicity, and the like of photoinitiators. It is currently one of important topics encountered in the field of this industry to develop a photocurable composition, which can effectively solve the problems described above and is advantageous in terms of economy and environmental friendliness.

[0007] JP2009029859A describes a polymerizable composition comprising an α-aminoketone-based photopolymerization initiator. KR1020140144809A describes a photoinitiator with a fluorene structure. EP3392232A1 describes a fluorene polyfunctional photoinitiator.SUMMARY OF THE INVENTION

[0008] The present invention aims to provide a fluorenylaminoketone photoinitiator, a preparation method thereof, and a UV photocurable composition containing same, so as to improve the solubility of traditional photoinitiators and reduce the use of micromolecular active diluents.

[0009] In order to achieve the object described above, according to an aspect of the present invention, there is provided a fluorenylaminoketone photoinitiator, as further defined in the claims.

[0010] According to another aspect of the present invention, there is provided a UV photocurable composition containing a fluorenylaminoketone photoinitiator. The UV photocurable composition comprises: an olefinically unsaturated photopolymerizable compound and a photoinitiator; wherein the photoinitiator is the fluorenylaminoketone photoinitiator of any one described above.

[0011] Furthermore, the olefinically unsaturated photopolymerizable compound is a compound comprising one carbon-carbon double bond, and preferably an acrylate compound or a methacrylate compound; or the olefinically unsaturated photopolymerizable compound is a compound comprising two or more carbon-carbon double bonds, and preferably an acrylate or methacrylate of an alkylene glycol or polyol, an acrylate of a polyester polyol, a polyether polyol, an epoxy polyol, or a polyurethane polyol, a vinyl ether, and an unsaturated polyester of an unsaturated dicarboxylic acid and a polyol.

[0012] Furthermore, when the UV photocurable composition is used as a UV etching resist ink or a UV solder resist ink, at least one compound of the olefinically unsaturated photopolymerizable compounds used contains an alkali-soluble group, preferably wherein the at least one compound of the olefinically unsaturated photopolymerizable compounds used is a carboxyl-containing resin.

[0013] Furthermore, the carboxyl-containing resin is a (meth)acrylate, an ethylenically unsaturated carboxylic acid, or a (meth)acrylate-based polymer; preferably, the (meth)acrylate is one or more selected from the group consisting of methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, cyclohexyl (meth)acrylate, benzyl (meth)acrylate, diethylaminoethyl (meth)acrylate, dimethylaminoethyl (meth)acrylate, hydroxyethyl (meth)acrylate, hydroxypropyl (meth)acrylate, furfuryl (meth)acrylate, and glycidyl (meth)acrylate; preferably, the ethylenically unsaturated carboxylic acid is one or more selected from the group consisting of acrylic acid, methacrylic acid, vinylbenzoic acid, maleic acid, alkyl maleate, fumaric acid, itaconic acid, butenic acid, cinnamic acid, an acrylic acid dimer, an addition product of a monomer having a hydroxy group and a cyclic acid anhydride, and an ω-carboxyl-polycaprolactone-(meth)acrylate, and more preferably (meth)acrylic acid; preferably, the (meth)acrylate-based polymer is one or more selected from the group consisting of (meth)acrylamide, n-butyl (meth)acrylate, styrene, vinylnaphthalene, (meth)acrylonitrile, vinyl acetate, and vinylcyclohexane.

[0014] Furthermore, the UV photocurable composition further comprises another photoinitiator, and preferably, the another photoinitiator is one or more selected from the group consisting of benzophenone, benzildimethyl ketal, 2-hydroxy-2-methyl-1-phenyl-acetone, 1-hydroxy-cyclohexyl-phenyl-one, isopropylthioxanthene, (2,4,6-trimethyl-benzoyl) diphenylphosphine oxide, and bis(2,4,6-trimethyl benzoyl)-phenylphosphine oxide.

[0015] Furthermore, the UV photocurable composition further comprises a sensitizer; preferably, the sensitizer is a pyrazoline compound, an acridine compound, an anthracene compound, a coumarin compound, or a tertiary amine compound.

[0016] Furthermore, the UV photocurable composition further comprises a colorant, which is an inorganic pigment or an organic pigment.

[0017] Furthermore, the UV photocurable composition further comprises an additive, which includes one or more of a surfactant, a wetting agent, a dispersant, a rheology modifier, a defoamer, and a storage enhancer.

[0018] According to still another aspect of the present invention, there is provided a preparation method of the fluorenylaminoketone photoinitiator described above, comprising steps of: (1) subjecting a raw material a and a raw material b to Friedel-Crafts reaction to generate an intermediate a with a reaction formula as follows: (2) subjecting the intermediate a to substitution reaction to generate an intermediate b: (3) subjecting the intermediate b is to substitution reaction to generate an intermediate c: (4) subjecting the intermediate c to Stevens rearrangement reaction to generate an intermediate d: (5) if a product in which A = H is expected to be obtained, then B = H in the raw material a, and the intermediate d is a compound of general formula (I); if a product in which A = is expected to be obtained, then B = F in the raw material a, subjecting the intermediate d to substitution reaction to generate a compound having general formula (I) as follows; if a product in which A = -COR 6 is expected to be obtained, then B = H in the raw material a, subjecting the intermediate d to Friedel-Crafts reaction to generate a compound having general formula (I) as follows;

[0019] Furthermore, in step (1), the intermediate a and the raw material are subjected to Friedel-Crafts reaction under a catalytic condition to generate an intermediate b, wherein the raw material b is

[0020] Furthermore, in step (2), the intermediate a and raw material c are subjected to substitution reaction in an organic solvent to generate an intermediate b, wherein the raw material c is thionyl chloride or liquid bromine.

[0021] Furthermore, in step (3), the intermediate b and raw material d are subjected to substitution reaction in an organic solvent to generate an intermediate c, wherein the raw material d is HX.

[0022] Furthermore, in step (4), the intermediate c and raw material e are subjected to Stevens rearrangement reaction in an organic solvent under a basic condition to generate an intermediate d, wherein the raw material e is R 3 -Br.

[0023] Furthermore, in step (5), if a product in which A = H is expected to be obtained, then B = H in the raw material a, and the intermediate d is a compound of general formula (I); if a product in which A = is expected to be obtained, then B = F in the raw material a, and the intermediate d and raw material f are subjected to substitution reaction in an organic solvent under a basic condition to generate a compound represented by general formula (I), wherein the raw material f is HA; if a product in which A = -COR 6 is expected to be obtained, then B = H in the raw material a, and the intermediate d and raw material g are subjected to Friedel-Crafts reaction under a catalytic condition to generate a compound represented by general formula (I), wherein the raw material g is ACl or ABr.

[0024] According to yet another aspect of the present invention, there is provided use of the UV photocurable composition described above in UV coatings and UV inks.

[0025] In order to achieve the object described above, according to an aspect of the present invention, there is provided a UV photocurable composition containing a fluorenylaminoketone photoinitiator. The UV photocurable composition comprises: an olefinically unsaturated photopolymerizable compound and a photoinitiator; wherein the photoinitiator comprises a compound having a structure represented by general formula (I), wherein, A represents hydrogen, a halogen, a nitro group, a C 1 -C 20 linear or branched alkyl group, a C 3 -C 10 alkylcycloalkyl group, a cycloalkylalkyl group, -COR 6 , or a - CO-CR 2 R 3 R 4 group, wherein, optionally, -CH 2 - is substituted with O, N, S, or C(=O); R 1 represents hydrogen, a halogen, a C 1 -C 20 linear or branched alkyl group, or a C 4 -C 20 cycloalkylalkyl group; R 2 represents a C 1 -C 20 linear or branched alkyl group, a C 3 -C 20 cycloalkyl group, a C 4 -C 20 cycloalkylalkyl group, or a C 4 -C 20 alkylcycloalkyl group; R 3 represents a C 1 -C 20 linear or branched alkyl group, a C 3 -C 20 cycloalkyl group, a C 4 -C 20 cycloalkylalkyl group, a C 4 -C 20 alkylcycloalkyl group, a C 6 -C 20 aryl group, or a C 6 -C 20 alkylaryl group, wherein one or more hydrogen atoms in these groups may be each independently substituted with an alkyl group, a halogen, a hydroxy group, or a nitro group, and optionally, -CH 2 - in R 2 and R 3 is substituted with O, N, S, or C(=O); R 4 represents a N-piperidinyl group, wherein one or more hydrogen atoms in these groups may be substituted with a halogen or a hydroxy group; R 5 and R 5 ' each independently represent a C 1 -C 20 linear or branched alkyl group, a C 4 -C 20 cycloalkyl group, a C 2 -C 20 alkenyl group, a C 6 -C 20 aryl group, or a C 6 -C 20 alkylaryl group, wherein one or more hydrogen atoms in these groups may be each independently substituted with an alkyl group, a halogen, a hydroxy group, or a nitro group, and optionally, -CH 2 - in these groups may be substituted with -O-; or R 5 and R 5 ' may form a five-membered or six-membered ring by being linked to each other or via -O-, -S-, or -NH-; R 6 represents a phenyl group which is unsubstituted or substituted with one or more of a C 1 -C 20 alkyl group, a halogen, a cyano group, SR 7 , and OR 8 ; R 7 and R 8 each independently represent hydrogen or a C 1 -C 20 linear or branched alkyl group.

[0026] Furthermore, the usage amount of the olefinically unsaturated photopolymerizable compound is 5-95 parts by mass, and the usage amount of the photoinitiator is 0.05-15 parts by mass.

[0027] Furthermore, the usage amount of the olefinically unsaturated photopolymerizable compound is 10-90 parts by mass, and the usage amount of the photoinitiator is 1-10 parts by mass.

[0028] Furthermore, the photoinitiator having a structure represented by general formula (I) is one or more selected from the group consisting of (compounds covered by the claims are those, wherein R 4 represents a N-piperidinyl group, wherein one or more hydrogen atoms in these groups may be substituted with a halogen or a hydroxy group)

[0029] Furthermore, the photoinitiator comprising a photoinitiator having a structure represented by general formula (I).

[0030] Furthermore, the olefinically unsaturated photopolymerizable compound is a monomer compound or an oligomer.

[0031] Furthermore, the olefinically unsaturated photopolymerizable compound is a compound comprising one carbon-carbon double bond, and preferably an acrylate compound or a methacrylate compound; or the olefinically unsaturated photopolymerizable compound is a compound comprising two or more carbon-carbon double bonds, and preferably an acrylate or methacrylate of an alkylene glycol or polyol, an acrylate of a polyester polyol, a polyether polyol, an epoxy polyol, or a polyurethane polyol, a vinyl ether, and an unsaturated polyester of an unsaturated dicarboxylic acid and a polyol.

[0032] Furthermore, when the UV photocurable composition is used as a UV etching resist ink or a UV solder resist ink, at least one compound of the olefinically unsaturated photopolymerizable compounds used contains an alkali-soluble group, preferably wherein the at least one compound of the olefinically unsaturated photopolymerizable compounds used is a carboxyl-containing resin.

[0033] Furthermore, the carboxyl-containing resin is a (meth)acrylate, an ethylenically unsaturated carboxylic acid, or a (meth)acrylate-based polymer; preferably, the (meth)acrylate is one or more selected from the group consisting of methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, cyclohexyl (meth)acrylate, benzyl (meth)acrylate, diethylaminoethyl (meth)acrylate, dimethylaminoethyl (meth)acrylate, hydroxyethyl (meth)acrylate, hydroxypropyl (meth)acrylate, furfuryl (meth)acrylate, and glycidyl (meth)acrylate; preferably, the ethylenically unsaturated carboxylic acid is one or more selected from the group consisting of acrylic acid, methacrylic acid, vinylbenzoic acid, maleic acid, alkyl maleate, fumaric acid, itaconic acid, butenic acid, cinnamic acid, an acrylic acid dimer, an addition product of a monomer having a hydroxy group and a cyclic acid anhydride, and an ω-carboxyl-polycaprolactone-(meth)acrylate, and more preferably (meth)acrylic acid; preferably, the (meth)acrylate-based polymer is one or more selected from the group consisting of (meth)acrylamide, n-butyl (meth)acrylate, styrene, vinylnaphthalene, (meth)acrylonitrile, vinyl acetate, and vinylcyclohexane.

[0034] Furthermore, the UV photocurable composition further comprises another photoinitiator, and preferably, the another photoinitiator is one or more selected from the group consisting of benzophenone, benzildimethyl ketal, 2-hydroxy-2-methyl-1-phenyl-acetone, 1-hydroxy-cyclohexyl-phenyl-one, isopropylthioxanthene, (2,4,6-trimethyl-benzoyl) diphenylphosphine oxide, and bis(2,4,6-trimethyl benzoyl)-phenylphosphine oxide.

[0035] Furthermore, the UV photocurable composition further comprises a sensitizer; preferably, the sensitizer is a pyrazoline compound, an acridine compound, an anthracene compound, a coumarin compound, or a tertiary amine compound. More preferably, the usage amount of the sensitizer is 0-5 parts by mass, and further preferably, the usage amount of the sensitizer is 0-2 parts by mass.

[0036] Furthermore, the UV photocurable composition further comprises a colorant, which is an inorganic pigment or an organic pigment. The usage amount of the colorant is 0-50 parts by mass, and preferably, the usage amount of the colorant is 0-20 parts by mass.

[0037] Furthermore, the UV photocurable composition further comprises an additive, which includes one or more of a surfactant, a wetting agent, a dispersant, a rheology modifier, a defoamer, and a storage enhancer. Preferably, the usage amount of the additive is 0-5 parts by mass, and more preferably, the usage amount of the additive is 0-3 parts by mass.

[0038] According to another aspect of the present invention, there is provided use of any one of the UV photocurable compositions described above in UV coatings and UV inks.

[0039] Furthermore, the UV inks include a UV etching resist ink, a UV solder resist ink, a flexographic printing ink, an offset printing ink, and the like.

[0040] The fluorenylaminoketone photoinitiator provided by the present invention can effectively improve the solubility of traditional photoinitiators and reduce the use of micromolecular active diluents, and also has high sensitivity and good effect of deep curing. It has very good promotion effect on popularization and application of photocurable compositions, particularly colored ink systems, in the field of photocuring.

[0041] Additionally, all of the raw materials used in the preparation method of the present invention are compounds which are known in the prior art, commercially available, or conveniently prepared by known synthetic methods. The preparation method is simple and has a high product purity, and is very suitable for industrial production.

[0042] The UV photocurable composition of the present invention containing a fluorenylaminoketone photoinitiator has advantages of high sensitivity, no residue after development, good pattern integrity, and no or little odor of coating layers after curing, as well as excellent yellowing resistance.DESCRIPTION OF EMBODIMENTS

[0043] It is to be indicated that Examples in this application and features in the Examples may be combined with each other without being conflicted. This invention will be illustrated in detail in conjunction with Examples below.

[0044] With respect to deficiencies in the prior art, the present invention has proposed the following technical solutions.

[0045] According to a typical embodiment of the present invention, there is provided a fluorenylaminoketone photoinitiator. The photoinitiator comprises a compound having a structure represented by general formula (I), wherein, A represents hydrogen, a halogen, a nitro group, a C 1 -C 20 linear or branched alkyl group, a C 3 -C 10 alkylcycloalkyl group, a cycloalkylalkyl group, -COR 6 , or a - CO-CR 2 R 3 R 4 group, wherein, optionally, -CH 2 - is substituted with O, N, S, or C(=O); R 1 represents hydrogen, a halogen, a C 1 -C 20 linear or branched alkyl group, or a C 4 -C 20 cycloalkylalkyl group; R 2 represents a C 1 -C 20 linear or branched alkyl group, a C 3 -C 20 cycloalkyl group, a C 4 -C 20 cycloalkylalkyl group, or a C 4 -C 20 alkylcycloalkyl group; R 3 represents a C 1 -C 20 linear or branched alkyl group, a C 3 -C 20 cycloalkyl group, a C 4 -C 20 cycloalkylalkyl group, a C 4 -C 20 alkylcycloalkyl group, a C 6 -C 20 aryl group, or a C 6 -C 20 alkylaryl group, wherein one or more hydrogen atoms in these groups may be each independently substituted with an alkyl group, a halogen, a hydroxy group, or a nitro group, and optionally, -CH 2 - in R 2 and R 3 is substituted with O, N, S, or C(=O); R 4 represents a N-piperidinyl group, wherein one or more hydrogen atoms in these groups may be substituted with a halogen or a hydroxy group; R 5 and R 5 ' each independently represent a C 1 -C 20 linear or branched alkyl group, a C 4 -C 20 cycloalkyl group, a C 2 -C 20 alkenyl group, a C 6 -C 20 aryl group, or a C 6 -C 20 alkylaryl group, wherein one or more hydrogen atoms in these groups may be each independently substituted with an alkyl group, a halogen, a hydroxy group, or a nitro group, and optionally, -CH 2 - in these groups may be substituted with -O-; or R 5 and R 5 ' may form a five-membered or six-membered ring by being linked to each other or via -O-, -S-, or -NH-; R 6 represents a C 1 -C 20 linear or branched alkyl group, a C 4 -C 20 cycloalkyl group, a C 4 -C 20 alkylcycloalkyl group, a C 2 -C 20 alkenyl group, a C 6 -C 20 aryl group, or a C 6 -C 20 alkylaryl group, wherein -CH 2 - in these groups may be substituted with -O- or -S-, and one or more hydrogen atoms in these groups may be independently substituted with a group selected from an alkyl group, a halogen, a nitro group, a cyano group, SR 7 , and OR 8 ; R 7 and R 8 each independently represent hydrogen or a C 1 -C 20 linear or branched alkyl group.

[0046] The fluorenylaminoketone photoinitiator provided by the present invention can effectively improve the solubility of traditional photoinitiators and reduce the use of micromolecular active diluents, and also has high sensitivity and good effect of deep curing. It has very good promotion effect on popularization and application of photocurable compositions, particularly colored ink systems, in the field of photocuring.

[0047] In some cases, it is advantageous to use a mixture of two or more of the initiators described above.

[0048] Of course, the photoinitiator having a structure represented by general formula (I) may also be mixed and used with any other known photoinitiator.

[0049] According to a typical embodiment of the present invention, there is provided a preparation method of the fluorenylaminoketone photoinitiator described above. The preparation method comprises steps of: (1) subjecting a raw material a and a raw material b to Friedel-Crafts reaction to generate an intermediate a with a reaction formula as follows: (2) subjecting the intermediate a to substitution reaction to generate an intermediate b: (3) subjecting the intermediate b to substitution reaction to generate an intermediate c: (4) subjecting the intermediate c to Stevens rearrangement reaction to generate an intermediate d: (5) if a product in which A = H is expected to be obtained, then B = H in the raw material a, and the intermediate d is a compound of general formula (I); if a product in which A = is expected to be obtained, then B = F in the raw material a, subjecting the intermediate d to substitution reaction to generate a compound having general formula (I) as follows; if a product in which A = -COR 6 is expected to be obtained, then B = H in the raw material a, subjecting the intermediate d to Friedel-Crafts reaction to generate a compound having general formula (I) as follows;

[0050] Preferably, in step (1), the intermediate a and the raw material are subjected to Friedel-Crafts reaction under a catalytic condition to generate an intermediate b, wherein the raw material b is

[0051] Preferably, in step (2), the intermediate a and raw material c are subjected to substitution reaction in an organic solvent to generate an intermediate b, wherein the raw material c is thionyl chloride or liquid bromine.

[0052] Preferably, in step (3), the intermediate b and raw material d are subjected to substitution reaction in an organic solvent to generate an intermediate c, wherein the raw material d is HX.

[0053] Preferably, in step (4), the intermediate c and raw material e are subjected to Stevens rearrangement reaction in an organic solvent under a basic condition to generate an intermediate d, wherein the raw material e is R 3 -Br.

[0054] Preferably, in step (5), if a product in which A = H is expected to be obtained, then B = H in the raw material a, and the intermediate d is a compound of general formula (I); if a product in which A = is expected to be obtained, then B = F in the raw material a, and the intermediate d and raw material f are subjected to substitution reaction in an organic solvent under a basic condition to generate a compound represented by general formula (I), wherein the raw material f is HA; if a product in which A = -COR 6 is expected to be obtained, then B = H in the raw material a, and the intermediate d and raw material g are subjected to Friedel-Crafts reaction under a catalytic condition to generate a compound represented by general formula (I), wherein the raw material g is ACl or ABr.

[0055] All of the raw materials used in the preparation method of the present invention are compounds which are known in the prior art, commercially available, or conveniently prepared by known synthetic methods. Reactions involved in steps (1) to (5) are all traditional reactions for synthesizing similar compounds in the art. On the basis of knowing the idea of synthesis disclosed in the present invention, specific reaction conditions will be easily determined with respect to the person skilled in the art. The preparation method of the present invention is simple and has a high product purity, and is suitable for industrial production.

[0056] According to yet another aspect of the present invention, there is provided use of the UV photocurable composition described above in UV coatings and UV inks.

[0057] According to a typical embodiment of the present invention, there is provided a UV photocurable composition containing a fluorenylaminoketone photoinitiator. The UV photocurable composition comprises: an olefinically unsaturated photopolymerizable compound and a photoinitiator; wherein the photoinitiator comprises a compound having a structure represented by general formula (I), wherein, A represents hydrogen, a halogen, a nitro group, a C 1 -C 20 linear or branched alkyl group, a C 3 -C 10 alkylcycloalkyl group, a cycloalkylalkyl group, -COR 6 , or a - CO-CR 2 R 3 R 4 group, wherein, optionally, -CH 2 - is substituted with O, N, S, or C(=O); R 1 represents hydrogen, a halogen, a C 1 -C 20 linear or branched alkyl group, or a C 4 -C 20 cycloalkylalkyl group; R 2 represents a C 1 -C 20 linear or branched alkyl group, a C 3 -C 20 cycloalkyl group, a C 4 -C 20 cycloalkylalkyl group, or a C 4 -C 20 alkylcycloalkyl group; R 3 represents a C 1 -C 20 linear or branched alkyl group, a C 3 -C 20 cycloalkyl group, a C 4 -C 20 cycloalkylalkyl group, a C 4 -C 20 alkylcycloalkyl group, a C 6 -C 20 aryl group, or a C 6 -C 20 alkylaryl group, wherein one or more hydrogen atoms in these groups may be each independently substituted with an alkyl group, a halogen, a hydroxy group, or a nitro group, and optionally, -CH 2 - in R 2 and R 3 is substituted with O, N, S, or C(=O); R 4 represents a N-piperidinyl group, wherein one or more hydrogen atoms in these groups may be substituted with a halogen or a hydroxy group; R 5 and R 5 ' each independently represent a C 1 -C 20 linear or branched alkyl group, a C 4 -C 20 cycloalkyl group, a C 2 -C 20 alkenyl group, a C 6 -C 20 aryl group, or a C 6 -C 20 alkylaryl group, wherein one or more hydrogen atoms in these groups may be each independently substituted with an alkyl group, a halogen, a hydroxy group, or a nitro group, and optionally, -CH 2 - in these groups may be substituted with -O-; or R 5 and R 5 ' may form a five-membered or six-membered ring by being linked to each other or via -O-, -S-, or -NH-; R 6 represents a C 1 -C 20 linear or branched alkyl group, a C 4 -C 20 cycloalkyl group, a C 4 -C 20 alkylcycloalkyl group, a C 2 -C 20 alkenyl group, a C 6 -C 20 aryl group, or a C 6 -C 20 alkylaryl group, wherein -CH 2 - in these groups may be substituted with -O- or -S-, and one or more hydrogen atoms in these groups may be independently substituted with a group selected from an alkyl group, a halogen, a nitro group, a cyano group, SR 7 , and OR 8 ; R 7 and R 8 each independently represent hydrogen or a C 1 -C 20 linear or branched alkyl group.

[0058] The UV photocurable composition of the present invention containing a fluorenylaminoketone photoinitiator has advantages of high sensitivity, no residue after development, good pattern integrity, and no or little odor of coating layers after curing, as well as excellent yellowing resistance.

[0059] The preparation process of the UV photocurable composition of the present invention is simple. According to a typical embodiment of the present invention, the components described above may be uniformly stirred and mixed either in a dark room or in a yellow light lamp environment.

[0060] According to a typical embodiment of the present invention, the UV photocurable composition further comprises another photoinitiator, and preferably, the another photoinitiator is one or more selected from the group consisting of benzophenone, benzildimethyl ketal, 2-hydroxy-2-methyl-1-phenyl-acetone, 1-hydroxy-cyclohexyl-phenyl-one, isopropylthioxanthene, (2,4,6-trimethyl-benzoyl) diphenylphosphine oxide, and bis(2,4,6-trimethyl benzoyl)-phenylphosphine oxide.

[0061] According to a typical embodiment of the present invention, the UV photocurable composition further comprises a colorant, which is an inorganic pigment or an organic pigment. The usage amount of the colorant is 0-50 parts by mass, and preferably, the usage amount of the colorant is 0-20 parts by mass.

[0062] According to a typical embodiment of the present invention, the UV photocurable composition further comprises an additive, which includes one or more of a surfactant, a wetting agent, a dispersant, a rheology modifier, a defoamer, and a storage enhancer.

[0063] Respective components of the UV photocurable composition of the present invention will be illustrated in more detail below.1) Olefinically unsaturated photopolymerizable compound

[0064] The olefinically unsaturated photopolymerizable compound: a compound having a radical polymerizable olefinically unsaturated bond, which may be a monomer compound (low molecular weight) or an oligomer (relatively high molecular weight).

[0065] A compound comprising one carbon-carbon double bond is preferably an acrylate compound or a methacrylate compound, for example, acrylates or methacrylates of monoalcohols such as methyl acrylate, butyl acrylate, 2-ethylhexyl acrylate, cyclohexyl acrylate, isobornyl acrylate, hydroxyethyl acrylate, and methyl methacrylate, acrylonitrile, N-dialkylacrylamide, N-vinylpyrrolidone, vinylbenzene, vinyl acetate, and vinyl ether.

[0066] A compound comprising two or more carbon-carbon double bonds includes an acrylate or methacrylate of an alkylene glycol or polyol, an acrylate of a polyester polyol, a polyether polyol, an epoxy polyol, or a polyurethane polyol, a vinyl ether, and an unsaturated polyester of an unsaturated dicarboxylic acid and a polyol, for example, polyethylene glycol diacrylate, neopentyl glycol diacrylate, trimethylolpropane triacrylate, multi-ethoxylated trimethylolpropane triacrylate, pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, a polyester oligomer acrylate, a polyurethane oligomer acrylate, an aromatic epoxy resin acrylate, and polyethylene glycol maleate. when the UV photocurable composition is used as a UV etching resist ink or a UV solder resist ink, at least one compound of the olefinically unsaturated photopolymerizable compounds used contains an alkali-soluble group. In addition to initiation of crosslinking polymerization, this type of compound should be soluble for a developing solution (a common alkali developer) used in the procedure of development treatment when an image pattern is formed, preferably carboxyl-containing resin, particularly a (meth)acrylate-based polymer formed by copolymerization of a (meth)acrylate, an ethylenically unsaturated carboxylic acid, and a further copolymerizable monomer. The (meth)acrylate may be methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, cyclohexyl (meth)acrylate, benzyl (meth)acrylate, diethylaminoethyl (meth)acrylate, dimethylaminoethyl (meth)acrylate, hydroxyethyl (meth)acrylate, hydroxypropyl (meth)acrylate, furfuryl (meth)acrylate, or glycidyl (meth)acrylate. As for these (meth)acrylates, one kind may be used alone, or two or more kinds may be used in combination. The ethylenically unsaturated carboxylic acid is preferably acrylic acid, methacrylic acid, vinylbenzoic acid, maleic acid, alkyl maleate, fumaric acid, itaconic acid, butenic acid, cinnamic acid, an acrylic acid dimer, an addition product of a monomer having a hydroxy group (for example, 2-hydroxyethyl (meth)acrylate, etc.) and a cyclic acid anhydride (for example, maleic anhydride, phthalic anhydride, and cyclohexenedicarboxylic anhydride), or an ω-carboxyl-polycaprolactone-(meth)acrylate. In view of copolymerizability, cost, and solubility, (meth)acrylic acids are particularly preferably. As for these ethylenically unsaturated carboxylic acids, one kind may be used alone, or two or more kinds may be used in combination. The further copolymerizable monomer is preferably (meth)acrylamide, n-butyl (meth)acrylate, styrene, vinylnaphthalene, (meth)acrylonitrile, vinyl acetate, or vinylcyclohexane. As for these monomers, one kind may be used alone, or two or more kinds may be used in combination.

[0067] As for these carbon-carbon double bond compounds, one kind may be used alone, two or more kinds may be used in combination, or pre-copolymerization may be performed on a mixture to form a oligomer for formulating a composition for use. The usage amount of radical polymerizable resin present in the photocurable composition is 5-95 parts by mass, preferably about 10-90 parts by mass.2) Photoinitiator having structure represented by general formula (I)

[0068] The photoinitiator used in the photocurable composition of the present invention at least includes one of compounds having a fluorene-based compound represented by general formula (I) as a main structure: wherein, A represents hydrogen, a halogen, a nitro group, a C 1 -C 20 linear or branched alkyl group, a C 3 -C 10 alkylcycloalkyl group, a cycloalkylalkyl group, -COR 6 , or a - CO-CR 2 R 3 R 4 group, wherein, optionally, -CH 2 - is substituted with O, N, S, or C(=O); R 1 represents hydrogen, a halogen, a C 1 -C 20 linear or branched alkyl group, or a C 4 -C 20 cycloalkylalkyl group; R 2 represents a C 1 -C 20 linear or branched alkyl group, a C 3 -C 20 cycloalkyl group, a C 4 -C 20 cycloalkylalkyl group, or a C 4 -C 20 alkylcycloalkyl group; R 3 represents a C 1 -C 20 linear or branched alkyl group, a C 3 -C 20 cycloalkyl group, a C 4 -C 20 cycloalkylalkyl group, a C 4 -C 20 alkylcycloalkyl group, a C 6 -C 20 aryl group, or a C 6 -C 20 alkylaryl group, wherein one or more hydrogen atoms in these groups may be each independently substituted with an alkyl group, a halogen, a hydroxy group, or a nitro group, and optionally, -CH 2 - in R 2 and R 3 is substituted with O, N, S, or C(=O); R 4 represents a N-piperidinyl group, wherein one or more hydrogen atoms in these groups may be substituted with a halogen or a hydroxy group; R 5 and R 5 ' each independently represent a C 1 -C 20 linear or branched alkyl group, a C 4 -C 20 cycloalkyl group, a C 2 -C 20 alkenyl group, a C 6 -C 20 aryl group, or a C 6 -C 20 alkylaryl group, wherein one or more hydrogen atoms in these groups may be each independently substituted with an alkyl group, a halogen, a hydroxy group, or a nitro group, and optionally, -CH 2 - in these groups may be substituted with -O-; or R 5 and R 5 ' may form a five-membered or six-membered ring by being linked to each other or via -O-, -S-, or -NH-; R 6 represents a C 1 -C 20 linear or branched alkyl group, a C 4 -C 20 cycloalkyl group, a C 4 -C 20 alkylcycloalkyl group, a C 2 -C 20 alkenyl group, a C 6 -C 20 aryl group, or a C 6 -C 20 alkylaryl group, wherein -CH 2 - in these groups may be substituted with -O- or -S-, and one or more hydrogen atoms in these groups may be independently substituted with a group selected from an alkyl group, a halogen, a nitro group, a cyano group, SR 7 , and OR 8 ; R 7 and R 8 each independently represent hydrogen or a C 1 -C 20 linear or branched alkyl group.

[0069] Examples of fluorenylaminoketone compounds represented by formula (I) include compounds represented by the following structures (compounds covered by the claims are those, wherein R 4 represents a N-piperidinyl group, wherein one or more hydrogen atoms in these groups may be substituted with a halogen or a hydroxy group):

[0070] In some cases, it is advantageous to use a mixture of two or more of the initiators described above.

[0071] Of course, the photoinitiator having a structure represented by general formula (I) may also be mixed and used with any other known photoinitiator.3) Another photoinitiator

[0072] Examples include camphorquinone; benzophenone (BP); benzophenone derivatives, for example 2,4,6-trimethylbenzophenone, 2-methylbenzophenone, 2-methylbenzophenone, 3-methylbenzophenone, 4-methylbenzophenone, 2-methylcarbonylbenzophenone, 4,4'-bis(chloromethyl)benzophenone, 4-chlorobenzophenone, 4-phenylbenzophenone, 3,3'-dimethyl-4-methoxy-benzophenone, [4-(4-methylphenylthio)phenyl]-phenyl methanone, methyl 2-benzoylbenzoate, 3-methyl-4'-phenylbenzophenone, 2,4,6-trimethyl-4'-phenylbenzophenone, 4,4'-bis(dimethylamino)benzophenone, and 4,4'-bis(diethylamino)benzophenone; ketal compounds, for example benzildimethyl ketal (651); acetophenone; acetophenone derivatives, for example alpha-hydroxycycloalkyl phenyl ketone, such as 2-hydroxy-2-methyl-1-phenyl-acetone (1173), 1-hydroxy-cyclohexyl-phenyl-one (184), 1-[4-(2-hydroxyethoxy)-phenyl]-2-hydroxy-2-methyl-1-propan-1-one (2959), 2-hydroxy-1-{4-[4-(2-hydroxy-2-methyl-propionyl)-benzyl]-phenyl}-2-methyl-propan-1-one (127), and 2-hydroxy-1-{4-[4-(2-hydroxy-2-methyl-propionyl)-phenoxy]-yl}-2-methyl- propan-1-one; dialkoxyacetophenone; alpha-hydroxyacetophenone or alpha-aminoacetophenone, for example (4-methylthiobenzoyl)-1-methyl-1-morpholinoethane (907), (4-morpholinobenzoyl)-1-benzyl-1-dimethylaminopropane (369), (4-morpholinobenzoyl)-1-(4-methylbenzyl)-1-dimethylaminopropane (379), (4-(2-hydroxyethyl)amino benzoyl)-1-benzyl-1-dimethylaminopropane), and 2-benzyl-2-dimethylamino-1-(3,4-dimethoxyphenyl)-1-butanone; thioxanthone and derivatives thereof, for example isopropylthioxanthene (ITX), 2-chlorothioxanthone (CTX), 1-chloro-4-propoxythioxanthone (CPTX), and 2,4-diethylthioxanthone (DETX); benzoin alkyl ethers and benzil ketals; phenyl glyoxylate and derivatives thereof, for example 2-(2-hydroxy-ethoxy)-ethyl oxo-phenyl-acetate; dimerized phenyl glyoxylate, for example 1-methyl-2-[2-(2-oxo-phenylacetoxy)-propoxy]-ethyl oxo-phenyl-acetate (754); other oxime esters, for example 1,2-octanedione-1-[4-(phenylthio)phenyl]-2-(4-benzoyloxime) (OXE01), ethanone-1-[9-ethyl-6-(2-methyl benzoyl)-9H-carbazol -3-yl]-1-(4-acetyloxime) (OXE02), and 9H-thioxanthene -2-carboxaldehyde-9-oxo-2-(O-acetyloxime); monoacylphosphine oxide, for example (2,4,6-trimethyl-benzoyl)diphenylphosphine oxide (TPO); diacylphosphine oxide, for example bis-(2,6-dimethoxy-benzoyl)-(2,4,4-trimethyl-pentyl)phosphine oxide, bis(2,4,6-trimethylbenzoyl)-phenylphosphine oxide (819), and bis(2,4,6-trimethylbenzoyl)-2,4-dipentoxyphenyl-phosphine oxide; hexaaryl bisimidazole / coinitiator systems, for example o-chlorohexaphenylbisimidazole in combination with 2-mercaptobenzothiazole, etc.

[0073] It is to be noted that photoinitiators having structures represented by general formula (I), in addition to the compounds of formula (I), formula (II) (not covered by the claims), and formula (III) (not covered by the claims), are particularly suitable to be used in combination with one or more of BP, 651, 1173, 184, ITX, TPO, 819, etc. The usage amount of the photoinitiator which is the photoinitiator having a structure represented by general formula (I) and another photoinitiator in the photocurable composition is 0.05-15 parts by mass, preferably 1-10 parts by mass.4) Sensitizer

[0074] Furthermore, the photocurable composition of the present invention may also further comprise a sensitizer in order to obtain a higher sensitivity or in order to match an LED light source.

[0075] The type of the sensitizer may be a pyrazoline compound, an acridine compound, an anthracene compound, a coumarin compound, a tertiary amine compound, etc. Specifically, the following may be exemplarily listed: 1-phenyl-3-(4-tert-butylstyryl)-5-(4-t-butylphenyl)pyrazoline, and 1-phenyl-3-biphenyl-5-(4-t-butylphenyl)pyrazoline; 9-phenylacridine, 9-p-methyl phenylacridine, 9-m-methyl phenylacridine, and 9-o-chloro phenylacridine; 2-ethylanthracene-9,10-di(methyl 4-chlorobutyrate), 1,2,3-trimethylanthracene-9,10-dioctyl ester, 2-ethylanthracene-9,10-diethyl ester,, 2-ethylanthracene-9,10-di(3-cyclohexyl propionate); 3,3'-carbonylbis(7-diethylaminocoumarin), 3-benzoyl-7-diethylaminocoumarin, 3,3'-carbonylbis(7-methoxycoumarin), 7-(diethylamino)-4-methylcoumarin; N,N-bis-[4-(2-styryl-1-yl)-phenyl]-N,N-bis(2-ethyl-6 methylphenyl)-1,1-bis phenyl-4,4-diamine, N,N-bis-[4-(2-styryl-1-yl)-4'-methylphenyl]-N,N-bis(2-ethyl-6 methylphenyl)-1,1-bis phenyl-4,4-diamine, etc.

[0076] The usage amount of the sensitizer in the photocurable composition is 0-5 parts by mass, preferably 0-2 parts by mass.5) Colorant

[0077] The UV photocurable composition may comprise one or more pigments as a colorant. The pigment may be of any color, including but not limited to, black, blue, brown, cyan, green, white, purple, magenta, red, orange, and yellow, as well as a spot color of a mixture thereof. The pigment may be an inorganic pigment or an organic pigment.

[0078] The organic pigment present in the UV photocurable composition may be perylene, a phthalocyanine pigment (for example, phthalocyanine green and phthalocyanine blue), a cyanine pigment (Cy3, Cy5, and Cy7), a naphthalocyanine pigment, a nitroso pigment, an azo pigment, an diazo pigment, a diazo condensation pigment, a basic dye pigment, a basic blue pigment, an indigo pigment, a phloxin pigment, a quinacridone pigment, an isoindolinone pigment, a dioxazine pigment, a carbazole dioxazine violet pigment, a alizarin lake pigment, a polyphthalamide pigment, a carmine lake pigment, a tetrachloroisoindolinone pigment, a perynone pigment, an anthraquinone pigment, and a quinophthalone pigment, as well as a mixture of two or more thereof or a derivative thereof.

[0079] The inorganic pigment in the photocurable composition includes, for example, a metal oxide (for example, titanium dioxide, conductive titanium dioxide), an iron oxide (for example, red iron oxide, yellow iron oxide, black iron oxide, and transparent iron oxide), an aluminum oxide, a silicon oxide, a carbon black pigment, a metal sulfide, a metal chloride, and a mixture of two or more thereof.

[0080] The usage amount of the colorant in the photocurable composition is 0-50 parts by mass, preferably 0-20 parts by mass.6) Additive

[0081] According to requirements for various applications various, other components or additives may be optionally present in the photocurable composition to improve properties and performances of coatings or inks. The additive includes but is not limited to one or more of a surfactant, a wetting agent, a dispersant, a rheology modifier, a defoamer, and a storage enhancer.

[0082] The usage amount of the additive in the photocurable composition is 0-5 parts by mass, preferably 0-3 parts by mass.

[0083] The polymer of interest may be obtained by polymerizing the photocurable composition of the present invention in polymerization reaction by giving the energy generated by ultraviolet, visible light, near infrared, electron beams, and the like. As a light source for giving the energy, light sources having the dominant wavelength which emits light in a wavelength region of 250nm to 450nm are preferable. As the light source having the dominant wavelength which emits light in a wavelength region of 250nm to 450nm, various light sources may be exemplified, such as ultrahigh-pressure mercury lamps, highpressure mercury lamps, medium-pressure mercury lamps, mercury-xenon lamps, metal halide lamps, large-power metal halide lamps, xenon lamps, pulse light-emitting xenon lamps, deuterium lamps, Led lamps, fluorescent lamps, Nd-YAG triple wave laser, He-Cd laser, nitrogen laser, Xe-Cl excimer laser, Xe-F excimer laser, semiconductor-excited solid laser, and the like.

[0084] The present invention will be specifically illustrated by Examples, but it is to be understood that the Examples should not be construed to be limitations of the present invention. The person skilled in the art is fully capable of amending the Examples illustrated in the framework of the present invention to obtain the same or similar effect.Reference Example 1(1) Preparation of 9,9-dimethyl-7-fluorofluorene-2-butanone (intermediate 38a)

[0085]

[0086] 80g of anhydrous aluminum trichloride, 106g of 9,9-dimethyl-7-fluorofluorene, and 150ml of a dichloromethane solvent were added to a 500ml four-neck flask, the temperature was controlled at 10°C or less, 53g of n-butanoyl chloride was slowly dropped, and the temperature was increased to 35-45°C after the addition was finished, followed by stirring for 4-6h. The reactant was cooled and then poured into hydrochloric acid-ice water to separate an organic layer, which was washed until it was neutral and dried, and reduced-pressure distillation was performed to obtain 109g of an intermediate 38a, with a yield of 78% and a purity of 99%. MS(m / z): 283(M+1) +< .(2) Preparation of 2-chloro-9,9-dimethyl-7-fluorofluorene-1-butanone (intermediate 38b)

[0087]

[0088] 141g of the intermediate 38a and 100ml of a dichloromethane solvent were added to a four-neck flask, the temperature was controlled at 30-40°C and 59g of thionyl chloride was dropped, nitrogen gas was introduced to remove hydrogen chloride. An organic layer was separated by washing with water and dried, and the solvent was recovered to obtain 147g of an intermediate 38b, with a yield of 93% and a purity of 98%. MS(m / z): 317(M+1) +< .(3) Preparation of 2-dimethylamino-9,9-dimethyl-7-fluorofluorene-1-butanone (intermediate 38c)

[0089]

[0090] An ethyl ether solution containing 75g dimethylamine was added to a four-neck flask and placed in an ice bath, 158g of the intermediate 38b was dropped with stirring, the temperature was controlled at about 0°C, and reaction was performed with stirring. Nitrogen gas was introduced to remove excess of dimethylamine. The reaction liquid was poured into water to separate an organic layer, which was washed with water until it was neutral and dried to distill off ethyl ether, and reduced-pressure distillation was performed to obtain 133g of an intermediate 38c, with a yield of 82% and a purity of 99%. MS(m / z): 326(M+1) +< .(4) Preparation of 2-benzyl-2-dimethylamino-9,9-dimethyl-7-fluorofluorene-1-butanone (intermediate 38d)

[0091]

[0092] 162g of the intermediate 38c and 150ml of a toluene solvent were added to a four-neck flask, and 63g of benzyl chloride was slowly dropped, followed by increasing temperature and stirring for 12h. The solvent was recovered by distillation, water was added and the temperature was increased to 50-70°C, and an alkaline liquor was added to perform reflux reaction for 0.5-1h. After cooling, an organic layer was separated, a yellow viscous substance was obtained by extraction and drying, and recrystallization was performed with ethanol to obtain 193g of an intermediate 38d, with a yield of 93% and a purity of 97%. MS(m / z): 416(M+1) +< .(5) Preparation of 2-benzyl-2-dimethylamino-9,9-dimethyl-1-(7-morpholinofluorenyl)butanone (compound 38)

[0093]

[0094] 103g of the intermediate 38d, 45g of morpholine, 100ml of a DMSO solvent, and 5g of potassium carbonate were sequentially added to a four-neck flask, and the temperature was increased to 120-160°C to perform reaction for 30h. After cooling, a reddish brown paste was obtained by extraction, washing, and drying, and recrystallization was performed with ethanol to obtain 89g of a compound 38 after drying, with a yield of 75% and a purity of 99.5%.

[0095] The structure of the product was determined by hydrogen nuclear magnetic resonance spectroscopy and mass spectrometry.

[0096] 1< H-NMR(CDCl 3 , 500MHz): 0.96-1.54 (5H,m), 1.67 (6H, s), 2.27(6H, s), 2.76(2H, s), 2.92(4H, m), 3.67(4H,m), 6.71-7.66(8H, m), 7.92-8.18(3H, m).

[0097] MS(m / z): 483(M+1) +< .Reference Example 2(1) Preparation of 2-allyl-2-dimethylamino-9,9-dimethyl-7-fluorofluorene-1-butanone (intermediate 39d)

[0098]

[0099] With the intermediate 38c in Example 1 as a raw material, 162g of 38c and an appropriate amount of toluene solvent were added to a four-neck flask, and 39g of allyl chloride was slowly dropped, followed by increasing temperature and stirring for 12h. The solvent was recovered by distillation, water was added and the temperature was increased to 50-70°C, and an alkaline liquor was added to perform reflux reaction for 0.5-1h. After cooling, an organic layer was separated, a yellow viscous substance was obtained by extraction and drying, and recrystallization was performed with ethanol to obtain 167g of an intermediate 39d, with a yield of 92% and a purity of 98%. MS(m / z): 366(M+1) +< .(2) Preparation of 2-allyl-2-dimethylamino-9,9-dimethyl-2-(7-piperidinylfluorenyl)butanone (compound 39)

[0100]

[0101] 92g of the intermediate 39d, 45g of piperidine, an appropriate amount of DMSO solvent, and a small amount of potassium carbonate were sequentially added to a four-neck flask, and the temperature was increased to 120-160°C to perform reaction for 30h. After cooling, a reddish brown paste was obtained by extraction, washing, and drying, and recrystallization was performed with ethanol to obtain 83g of a compound 39 after drying, with a yield of 73% and a purity of 99%.

[0102] The structure of the product was determined by hydrogen nuclear magnetic resonance spectroscopy and mass spectrometry.

[0103] 1< H-NMR(CDCl 3 , 500MHz): 0.96-1.54 (11H,m), 1.67 (6H, s), 2.17(2H, s), 2.27(6H, s), 2.72(4H, m), 4.97-5.71(3H,m), 6.71-8.18(6H, m).

[0104] MS(m / z): 431(M+1) +< .Reference Example 3(1) Preparation of 9,9-dibutylfluorene-1-butanone (intermediate 40a)

[0105]

[0106] The method was the same as the preparation method of 38a. MS(m / z): 349(M+1) +< .(2) Preparation of 2-chloro-9,9-dibutylfluorene-1-butanone (intermediate 40b)

[0107]

[0108] The method was the same as the preparation method of 38b. MS(m / z): 383(M+1) +< .(3) Preparation of 2-dimethylamino-9,9-dibutylfluorene-1-butanone (intermediate 40c)

[0109]

[0110] The method was the same as the preparation method of 38c. MS(m / z): 392(M+1) +< .(4) Preparation of 2-benzyl-2-dimethylamino-9,9-dibutylfluorene-1-butanone (compound 40)

[0111]

[0112] The method was the same as the preparation method of 38d.

[0113] The structure of the product was determined by hydrogen nuclear magnetic resonance spectroscopy and mass spectrometry.

[0114] 1< H-NMR(CDCl 3 , 500MHz): 0.96-1.87 (23H,m), 2.27(6H, s), 2.76(2H, s), 7.08-8.18(12H, m).

[0115] MS(m / z): 482(M+1) +< .Reference Example 4(1) Preparation of 2-benzyl-2-dimethylamino-9,9-dibutyl-1-(7-benzoyl)butanone (compound 41)

[0116]

[0117] 80g of anhydrous aluminum trichloride, 240.5 g of a compound 3, and 200ml of a dichloromethane solvent were added to a 1000ml four-neck flask, the temperature was controlled at 10°C or less, 70g of benzoyl chloride was slowly dropped, and the temperature was increased to 35-45°C after the addition was finished, followed by stirring for 4-6h. The reactant was cooled and then poured into hydrochloric acid-ice water to separate an organic layer, which was washed until it was neutral and dried, and reduced-pressure distillation was performed to obtain 237g of an intermediate compound 39, with a yield of 81% and a purity of 98%.

[0118] The structure of the product was determined by hydrogen nuclear magnetic resonance spectroscopy and mass spectrometry.

[0119] 1< H-NMR(CDCl 3 , 500MHz): 0.96-1.87 (23H,m), 2.27(6H, s), 2.76(2H, s), 7.08-8.18(16H, m).

[0120] MS(m / z): 586(M+1) +< .Examples 5-20

[0121] Compounds 42-57 of Examples 5-20 were prepared with reference to the synthesis methods of Examples 1-4. That is, the compound prepared in Example 5 was compound 42, the compound prepared in Example 6 was compound 43, and so on. Compounds of interest and LC-MS data thereof were listed in Table 1. Table 1Compound MS(m / z)R 1 R 2 R 3 R 4 AReference Compound 42-CH 3 -C 2 H 5 -N(CH 3 ) 2 -N(C 4 H 9 ) 2 525Reference Compound 43-CH 2 CH 2 CH 3 -C 2 H 5 -N(CH 3 ) 2 537Compound 44-CH 3 -C 2 H 5 535Reference Compound 45-CH 3 -C 2 H 5 -N(CH 3 ) 2 -N(CH 2 CH 2 OH) 2 501Compound 46-CH 3 -CH 3 509Compound 47-CH 2 CH 2 CH 3 -C 2 H 5 593Compound 48-H-C 2 H 5 530Reference Compound 49-H-C 2 H 5 -N(CH 3 ) 2 469Reference Compound 50 -C 2 H 5 -N(CH 3 ) 2 648Compound 51-CH 3 -C 2 H 5 -CHCH=CH 2 473Reference Compound 52-CH 3 -CHCH=CH 2 -CHCH=CH 2 -N(CH 3 ) 2 445Reference Compound 53-CH 2 CH 2 CH 3 -CH 3 609Compound 54-H-C 2 H 5 -N(CH 2 OCH 2 CH 3 ) 2 555Reference Compound 55-H-C 2 H 5 -H412Reference Compound 56-H-C 2 H 5 516Reference Compound 57-CH 2 CH 2 CH 2 CH 3 -C 2 H 5 628 Evaluation of properties 1. Test of solubility property

[0122] By taking a diluent 1,6-hexanediol diacrylate (HDDA) and an acetone solvent, which were widely used in the art, as examples, solubility properties of the photoinitiator of the present invention and Irgacure 369 and Irgacure 379 as mentioned in the background art were tested, and the largest weight which could be dissolved in 100g of a solvent under a condition of 20°C as an evaluation criterion. Test results were as shown in Table 2. Table 2Example / Comparative ExampleSampleHDDA(g / 100g)Acetone (g / 100g)ExampleCompound 4*>15>30Compound 5*>15>30Compound 9*>15>30Compound 14*>15>30Compound 24*>15>30Compound 34*>15>30Compound 38*>15>30Compound 39*>15>30Compound 40*>15>30Compound 41 *>15>30Compound 42 *>15>30Compound 43*>15>30Compound 44>15>30Compound 45*>15>30Compound 46>15>30Compound 47>15>30Compound 48>15>30Compound 49*>15>30Compound 50*>15>30Compound 51>15>30Compound 52 *>15>30Compound 53*>15>30Compound 54>15>30Compound 55*>15>30Compound 56*>15>30Compound 57*>15>30Comparative ExampleIrgacure 369517Irgacure 3791124* Reference compounds

[0123] As could be seen from Table 2, compared to commercial photoinitiators Irgacure 369 and Irgacure 379, the solubility of the alpha-aminoketone photoinitiator of the present invention containing a fluorene structure was greatly improved, and the use of micromolecular active diluent could be reduced to a very large extent when the photoinitiator of the present invention was used.2. Test of curing property

[0124] The alpha-aminoketone photoinitiator had a very high photoinitiator activity in a photocurable colored system and was particularly suitable for photocurable paints and inks. Therefore, this initiator was used in an ink system to evaluate the curing property.Step 1: The preparation of a color paste, wherein weight percentages of components in the color paste were as shown below:

[0125] CompositionYellowRedBlueBlackPigment componentBenzidine yellowPermanent redPhthalocyanine blueCarbon blackPigment content (%)101010101,6-hexanediol diacrylate (%)40404040trimethylolpropane triacrylate (%)47474747EFKA-4310 dispersant (%)3333

[0126] The raw material components described above were ground with a sitting-type sand mill to a particle size of <1µm, followed by filtration to obtain the color paste.Step 2: The preparation of an ink for UV curing, in which weight proportions of components in the ink were as shown below:

[0127] Urethane acrylate SR901070%Epoxy acrylate E20120%The color paste2%Photoinitiator5%ITX2%Leveling agent0.5%Silane coupling agent0.5%ButanonePresent or absent (adjusted according to the solubility of the initiator)

[0128] The photoinitiator in the components of the ink described above was the photoinitiator of the present invention or commercial photoinitiators Irgacure 369 and Irgacure 907. Since 369 had a relatively poor solubility, about 10% of the butanone solvent was required to be added to the formulation described above to allow it to be completely dissolved.

[0129] The formulation described above was stirred in a four-neck flask at room temperature under protection from light for 3h, followed by filtration to obtain an ink for curing. The ink was spray coated on a ceramic tile with a spray coating thickness of 60-80µm, and then irradiated with ultraviolet of an ultraviolet light source having a power of 80mw / cm 2< for 50s. The ceramic tile after being ultraviolet cured was then placed at 80°C to sinter for 50min, and the effect of the ink coating layer on the ceramic tile was detected after cooling.

[0130] Here, tests of adherence were performed by using a hundred-grid crosscut method and evaluation was performed according to criteria of 0-5 levels, with reference to GB / T 9286-1998 test standard. The deep-layer curing degree was tested by a finger scratch method, in which a coating layer was scratched with a fingernail and complete curing of the bottom layer was indicated by no phenomenon of peeling-off or exposed bottom. The pattern effect was visually observed, wherein a clear and fine pattern having a smooth edge without burrs was defined as a criterion of a good pattern effect. Specific test results were as shown in Table 3, Table 4, Table 5, and Table 6. Table 3. Test results of yellow inkExample / Comparative ExampleCompoundAdherenceDeep-layer curing degreePattern effectExampleCompound 4*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 5*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 9*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 14*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 24*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 34*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 38*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 39*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 40*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 41*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 43*Level 1The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 45*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 48Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 50*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 52*Level 1The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 55*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 57*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Comparative Example369Level 2The bottom being soft and easily peelable off.The edge of the pattern being unclear and easily peelable off.907Level 2The bottom being soft and easily peelable off.The bottom being incompletely cured.* Reference compound Table 4. Test results of red ink Example / Comparative ExampleCompoundAdherenceDeep-layer curing degreePattern effectExampleCompound 4*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 5*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 9*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 14*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 24*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 34*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 38*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 40*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 41*Level 1The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 43*Level 1The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 45*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 48Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 50*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 52*Level 1The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 53*Level 1The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 55*Level 1The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 57*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Comparative Example369Level 2The bottom being soft and easily peelable off.The edge of the pattern being unclear and easily peelable off.907Level 3The bottom being soft and easily peelable off.The bottom being incompletely cured. * Reference compound Table 5. Test results of blue ink Sample sourceCompoundAdherenceDeep-layer curing degreePattern effectExampleCompound 4*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 5*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 9*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 14*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 24*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 38*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 39*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 40*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 41 *Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 43*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 45*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 48Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 50*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 52*Level 1The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 53*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 55*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Comparative Example369Level 2The bottom being soft and easily peelable off.The edge of the pattern being unclear and easily peelable off.907Level 2The bottom being soft and easily peelable off.The bottom being incompletely cured. * Reference compound Table 6. Test results of black ink Example / Comparative ExampleCompoundAdherenceDeep-layer curing degreePattern effectExampleCompound 4*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 5*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 9*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 14*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 24*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 34*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 38*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 40*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 41*Level 1The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 43*Level 1The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 45*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 48Level 1The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 50*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 52*Level 1The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 54Level 1The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 56*Level 1The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Compound 57*Level 0The bottom coating layer being not peeled off.The pattern being brilliant, clear, fine, and vivid.Comparative Example369Level 3The bottom being soft and easily peelable off.The edge of the pattern being unclear and easily peelable off.907Level 3The bottom being soft and easily peelable off.The bottom being incompletely cured. * Reference compound

[0131] As can be seen from Table 3, Table 4, Table 5, and Table 6, the alpha-aminoketone photoinitiator of the present invention containing a fluorene structure has a higher sensitivity, a better deep curing property in a colored system, and more excellent mechanical properties after a film is formed.

[0132] As can be seen from the description above, the following technical effects are achieved in the Examples of the present invention described above: the fluorenylaminoketone photoinitiator provided by the present invention can effectively improve the solubility of traditional photoinitiators and reduce the use of micromolecular active diluents, and also has high sensitivity and good effect of deep curing. It has very good promotion effect on popularization and application of colored ink systems in the field of photocuring.

[0133] Application systems of the UV photocurable composition containing a fluorenylaminoketone photoinitiator will be further elaborated in conjunction with specific Examples below. Methods and criteria for evaluation were as follows. I. With respect to the developability, a pattern on a substrate was observed with a scanning electron microscope (SEM), wherein no residue was observed in unexposed portions (∘); a small amount of residue was observed in unexposed portions, but the residual amount was acceptable (⊚); and significant residue was observed in unexposed portions (•); and with respect to the pattern integrity, it depended on observation of the presence of defects in a pattern, wherein there was no defect (△); there were a few defects (□); and there were severe defects (▲); II. With respect to the residual odor of a cured film, it was evaluated by smelling with the nose, wherein test results were divided into three levels which were 1 (odorless), 2 (odorous), and 3 (irritatingly odorous). III. With respect to the yellowing, it was evaluated by the value of Δb which was read by full transmission scan with a scan wavelength of 400-700nm by using a colorimeter (X-Rite Color i7, United States), wherein the smaller Δb was, the less significant the yellowing was; and conversely, the greater Δb was, the more severe the yellowing was. IV. With respect to the evaluation of the adhesion, the adhesion of a coating film was evaluated by a crosscut test method with reference to GB9286-88 "Paints and varnishes - Crosscut test for Films". According to the degree of damage, it was divided into 0-5 levels (6 levels in total), wherein level 0 was the best, and there was not any compartment which was peeled off the film surface; and level 5 was extremely bad, badly peeling occurring on the film surface.

[0134] In the discussion described below, the components were calculated in weight percent in the formulation of the UV photocurable composition, and Irgacure 907 and APi-307 were used as referential example compounds under the same conditions.

[0135] Here, structural formulae of 907 and 307 were as shown below: Example 21: UV coating

[0136] Material nameUsage amount (part by mass)Aromatic acrylate hemiester46Low-viscosity aromatic monoacrylate22POEA (phenoxyethyl acrylate)20Carbon black (Raven 450)4.0Photoinitiator4.5ITX0.5BP (benzophenone)2.0Leveling agent1.0

[0137] Coating conditions: with reference to "GB / T 9271-2008 Paints and varnishes - Standards panels for testing", a substrate, which was a tin-plated steel plate, was subjected to pretreatment, and then a formulation, which was uniformly stirred in a dark room, was coated on the tin-plated steel plate with a 25# wire bar, wherein the coating layer had a thickness of approximately 25µm; exposure conditions: a RW-UV.70201 track type exposure machine was used and the radiation wavelength was 250-450nm; aging conditions: after exposure, baking was performed in an oven at 80°C for 24h, and test results were as shown in Table 7 below: Table 7Exposure demand mJ / cm 2< YellowingOdorAdherenceCompound 4*1200.721Level 0Compound 5*1100.741Level 0Compound 9*1300.681Level 0Compound 14*1100.741Level 0Compound 24*1200.771Level 0Compound 26*1100.791Level 0Compound 28*1100.701Level 0Compound 32*1100.681Level 0The present inventionCompound 34*1100.751Level 0Compound 38*1100.681Level 0Compound 45*1200.731Level 0Compound 481100.711Level 0Compound 50*1200.751Level 0Compound 52*1200.691Level 0Compound 57*1100.731Level 0Comparative Example9072002.683Level 13072201.331Level 1* Reference compound Example 22: UV etching resist ink

[0138] Material nameUsage amount (part by mass)Aromatic acid methacrylate hemiester SB40055TMPTA (trimethylolpropane triacrylate)25Photoinitiator3ITX1.5Phthalocyanine blue1Talc powder14Leveling agent0.5

[0139] Printing conditions: a 100T screen was used, and the dry film thickness was 8-10µm; baking conditions: baking was performed at 75°C for 20 minutes; exposure conditions: a RW-UV.70201 track type exposure machine was used and the radiation wavelength was 250-450nm; development conditions: 1% sodium carbonate solution was used, and development was performed at 30±2°C for 40s, and test results were as shown in Table 8 below: Table 8Exposure demand mJ / cm 2< DevelopabilityPattern integrityYellowingOdorCompound 3*110○Δ0.721Compound 5*100○Δ0.661Compound 10*110○Δ0.681Compound 1590○Δ0.651Compound 24*100○Δ0.681Compound 27*110○Δ0.631The present inventionCompound 29*110○Δ0.701Compound 31*100○Δ0.711Compound 35*100○Δ0.751Compound 37*100○Δ0.681Compound 39*110○Δ0.751Compound 42*100○Δ0.721Compound 43*110○Δ0.691Compound 45*110○Δ0.621Compound 53*110○Δ0.651Comparative Example907160○▲2.543307180○▲1.281* Reference compound Example 23: UV solder resist ink

[0140] Materials of composition AUsage amount (part by mass)Epoxy acrylic resin CN14445DPHA (dipentaerythritol hexaacrylate)25Photoinitiator32-Ethylanthracene-9,10-diethyl ester0.5ITX1Phthalocyanine blue1Silica R9721.5Precipitated barium sulfate22Defoamer1Materials of composition BUsage amountEpoxy acrylic resin CN210045DPHA30Silica R9721.5Precipitated barium sulfate23Defoamer0.5

[0141] The composition A and the composition B were uniformly mixed at a ratio of 3:1, and placed for half an hour. Printing conditions: 36-43T screen printing was performed, and the dry film thickness was 12-15µm; pre-baking conditions: the first surface was pre-baked for 20 minutes and the second surface was pre-baked for 25 minutes, at 75°C; exposure conditions: a RW-UV.70201 track type exposure machine was used and the radiation wavelength was 250-450nm; development conditions: 0.5% sodium hydroxide solution was used, and development was performed at 30±2°C for 60s, and test results were as shown in Table 9 below: Table 9Exposure demand mJ / cm2DevelopabilityPattern integrityYellowingOdorCompound 4*100○Δ0.781Compound 5*90○Δ0.761Compound 10*100○Δ0.751Compound 1590○Δ0.781Compound 25*100○Δ0.811Compound 26*110○Δ0.791The present inventionCompound 29*100○Δ0.731Compound 30*110○Δ0.761Compound 34*100○Δ0.791Compound 38*100○Δ0.751Compound 42*110○Δ0.721Compound 45*100○Δ0.741Compound 48110○Δ0.731Compound 54*100○Δ0.751Comparative Example907180○▲2.543307190⊚▲1.031* Reference compound Example 24: UV flexographic printing ink

[0142] Material nameUsage amount (part by mass)Polyester acrylic resin EB65710Epoxy acrylic resin53-Propoxylated glycerol triacrylate30TPGDA (tripropylene glycol diacrylate)31Photoinitiator2ITX (isopropythioxanthone)2EDAB3Stabilizer1.5Pigment PY1314Dispersant1.5

[0143] The above raw materials were uniformly mixed in a dark room and applied in a thickness of 5µm onto a white paperboard. Exposure conditions: a RW-UV70201 track type exposure machine was used and the radiation wavelength was 250-450nm; and test results were as shown in Table 10 below: Table 10Exposure demand mJ / cm 2< YellowingOdorAdherenceThe present inventionCompound 3*1000.561Level 0Compound 6*900.621Level 0Compound 10*1000.661Level 0Compound 161100.611Level 0Compound 25*1000.631Level 0Compound 26*1000.591Level 0Compound 29*1000.591Level 0Compound 33*1000.621Level 0Compound 34*900.651Level 0Compound 36*900.621Level 0Compound 42*1000.661Level 0Compound 441100.611Level 0Compound 511000.581Level 0Compound 541100.631Level 0Comparative Example9071702.563Level 13071800.981Level 1* Reference compound Example 25: UV offset printing ink

[0144] Material nameUsage amount (part by mass)Epoxy acrylic resin CN220440Tetrafunctional urethane acrylate CN29416Hexafunctional urethane acrylate CN29312Pigment carbon black18Talc powder4Active amine CN3735Photoinitiator5

[0145] The above raw materials were uniformly mixed in a dark room and applied onto a plastic substrate in a thickness of 2µm. Exposure conditions: a RW-UV.70201 track type exposure machine was used and the radiation wavelength was 250-450nm; and test results were as shown in Table 11 below: Table 11Exposure demand mJ / cm 2< YellowingOdorAdherenceCompound 3*1200.631Level 0Compound 7*1100.581Level 0Compound 9*1100.661Level 0Compound 14*1100.681Level 0Compound 24*1100.581Level 0The present inventionCompound 27*1100.591Level 0Compound 30*1200.681Level 0Compound 33*1100.621Level 0Compound 35*1000.701Level 0Compound 38*1100.651Level 0Compound 41 *1000.641Level 0Compound 43*1100.701Level 0Compound 481000.631Level 0Compound 50*1000.621Level 0Comparative Example9072002.343Level 13692101.081Level 1*Reference compound

[0146] As can be seen from experimental results of Examples 21-25, the photocurable composition of the present invention containing a fluorenylaminoketone photoinitiator is used in photocurable coatings ands, and has advantages of good photocuring property, good yellowing resistance, no residual odor after curing, and excellent overall properties.

Claims

1. A fluorenylaminoketone photoinitiator, characterized in that the photoinitiator comprises a compound having a structure represented by general formula (I), wherein, A represents hydrogen, a halogen, a nitro group, a C1-C20 linear or branched alkyl group, a C3-C10 alkylcycloalkyl group, a cycloalkylalkyl group, -COR6, or a - CO-CR2R3R4 group, wherein, optionally, -CH2- is substituted with O, N, S, or C(=O); R1 represents hydrogen, a halogen, a C1-C20 linear or branched alkyl group, or a C4-C20 cycloalkylalkyl group; R2 represents a C1-C20 linear or branched alkyl group, a C3-C20 cycloalkyl group, a C4-C20 cycloalkylalkyl group, or a C4-C20 alkylcycloalkyl group; R3 represents a C1-C20 linear or branched alkyl group, a C3-C20 cycloalkyl group, a C4-C20 cycloalkylalkyl group, a C4-C20 alkylcycloalkyl group, a C6-C20 aryl group, or a C6-C20 alkylaryl group, wherein one or more hydrogen atoms in these groups may be each independently substituted with an alkyl group, a halogen, a hydroxy group, or a nitro group, and optionally, -CH2- in R2 and R3 is substituted with O, N, S, or C(=O); R4 represents a N-piperidinyl group, wherein one or more hydrogen atoms in these groups may be substituted with a halogen or a hydroxy group; R5 and R5' each independently represent a C1-C20 linear or branched alkyl group, a C4-C20 cycloalkyl group, a C2-C20 alkenyl group, a C6-C20 aryl group, or a C6-C20 alkylaryl group, wherein one or more hydrogen atoms in these groups may be each independently substituted with an alkyl group, a halogen, a hydroxy group, or a nitro group, and optionally, -CH2- in these groups may be substituted with -O-; or R5 and R5' may form a five-membered or six-membered ring by being linked to each other or via -O-, -S-, or -NH-; R6 represents a C1-C20 linear or branched alkyl group, a C4-C20 cycloalkyl group, a C4-C20 alkylcycloalkyl group, a C2-C20 alkenyl group, a C6-C20 aryl group, or a C6-C20 alkylaryl group, wherein -CH2- in these groups may be substituted with -O- or -S-, and one or more hydrogen atoms in these groups may be independently substituted with a group selected from an alkyl group, a halogen, a nitro group, a cyano group, SR7, and OR8; R7 and R8 each independently represent hydrogen or a C1-C20 linear or branched alkyl group.

2. A UV photocurable composition containing a fluorenylaminoketone photoinitiator, characterized by comprising: an olefinically unsaturated photopolymerizable compound and a photoinitiator; wherein the photoinitiator is the fluorenylaminoketone photoinitiator as claimed in claim 1.

3. The UV photocurable composition according to claim 2, characterized in that the photoinitiator comprising a photoinitiator having a structure represented by general formula (I) is a mixture of two or more of the compounds.

4. The UV photocurable composition according to claim 2, characterized in that the olefinically unsaturated photopolymerizable compound is a compound comprising one carbon-carbon double bond; or the olefinically unsaturated photopolymerizable compound is a compound comprising two or more carbon-carbon double bonds.

5. The UV photocurable composition according to claim 2, characterized in that when the UV photocurable composition is used as a UV etching resist ink or a UV solder resist ink, at least one compound of the olefinically unsaturated photopolymerizable compounds used contains an alkali-soluble group.

6. The UV photocurable composition according to claim 5, characterized in that the at least one compound of the olefinically unsaturated photopolymerizable compounds used is a carboxyl-containing resin.

7. The UV photocurable composition according to claim 6, characterized in that the carboxyl-containing resin is a (meth)acrylate, an ethylenically unsaturated carboxylic acid, or a (meth)acrylate-based polymer.

8. The UV photocurable composition according to claim 2, characterized in that the UV photocurable composition further comprises another photoinitiator.

9. The UV photocurable composition according to claim 2, characterized in that the UV photocurable composition further comprises a sensitizer.

10. The UV photocurable composition according to claim 2, characterized in that the UV photocurable composition further comprises a colorant, which is an inorganic pigment or an organic pigment.

11. The UV photocurable composition according to claim 2, characterized in that the UV photocurable composition further comprises an additive, which includes one or more of a surfactant, a wetting agent, a dispersant, a rheology modifier, a defoamer, and a storage enhancer.

12. A preparation method of the fluorenylaminoketone photoinitiator as claimed in claim 1, characterized by comprising steps of: (1) subjecting a raw material a and a raw material b to Friedel-Crafts reaction to generate an intermediate a with a reaction formula as follows: (2) subjecting the intermediate a to substitution reaction to generate an intermediate b: (3) subjecting the intermediate b to substitution reaction to generate an intermediate c: (4) subjecting the intermediate c to Stevens rearrangement reaction to generate an intermediate d: (5) (a) if a product in which A = H is expected to be obtained, then B = H in the raw material a, and the intermediate d is a compound of general formula (I); or (b) if a product in which A = is expected to be obtained, then B = F in the raw material a, subjecting the intermediate d to substitution reaction to generate a compound having general formula (I) as follows; (c) if a product in which A = -COR6 is expected to be obtained, then B = H in the raw material a, subjecting the intermediate d to Friedel-Crafts reaction to generate a compound having general formula (I) as follows; 13. Use of the UV photocurable composition as claimed in any one of claims 2 to 11 in UV coatings and UV inks.