Method for manufacturing a color conversion optoelectronic device, comprising a step of optically forming surface potential patterns in an electret layer

Abstract

The invention relates to a method for manufacturing an optoelectronic device comprising a matrix of diodes (10) and photoluminescent pads arranged opposite at least one diode, comprising the following steps: producing an electret layer (E1) on the matrix of diodes (10), by localized polarization or depolarization, optically, so as to form surface potential patterns (M1); producing the photoluminescent pads (P1), by bringing the electret layer (E1) into contact with a colloidal solution containing photoluminescent particles (p1), which are then deposited on the upper face (F1) of the electret layer (E1) opposite the predefined surface potential patterns (M1), thus forming the photoluminescent pads (P1). Abstract figure: Fig. 1D

Description

Title of the invention: Method for manufacturing a color conversion optoelectronic device, comprising a step of optically forming surface potential patterns in an electret layer Technical field

[0001] The field of the invention is that of methods for manufacturing optoelectronic devices comprising a matrix of diodes for emitting or detecting electroluminescent radiation, associated with a color conversion structure with photoluminescent pads. The invention finds application in particular in display screens and image projectors. STATE OF THE PRIOR ART

[0002] There are optoelectronic devices comprising a matrix of identical light-emitting diodes covered at least in part by photoluminescent pads ensuring color conversion. Such optoelectronic devices can form display screens or image projection systems comprising a matrix of luminous pixels of different colors.

[0003] In such an optoelectronic device, each light pixel comprises one or more light-emitting diodes associated with a photoluminescent pad. In order to obtain light pixels adapted to emit light radiation of different colors, for example blue, green or red, the light-emitting diodes may be adapted to emit all of the same light, for example blue, and the green and red pixels comprise photoluminescent pads adapted to absorb at least part of the incident blue light emitted by the light-emitting diodes, and to emit in response green light or red light.

[0004] The light-emitting diodes are therefore preferably identical to each other, and emit light radiation of substantially the same wavelength. They may be formed from a semiconductor material comprising elements from column III and column V of the periodic table, such as a III-V compound, in particular gallium nitride (GaN), indium gallium nitride (InGaN) or aluminum gallium nitride (AlGaN). They are arranged so as to form a matrix of light-emitting diodes having a front face through which the generated light radiation is transmitted. They may also be organic light-emitting diodes.

[0005] The photoluminescent pads may be formed from a binder matrix comprising particles of a photoluminescent material such as yttrium aluminum garnet (YAG) activated by the cerium ion YAG:Ce. Photoluminescent particles can also be quantum dots, i.e., in the form of semiconductor nanocrystals whose quantum confinement is substantially three-dimensional. They can also be, in particular, InP, perovskite or CdSe crystals.

[0006] The manufacturing method may comprise the deposition and then the structuring of a photoluminescent layer to form first photoluminescent pads, for example adapted to convert blue into green. These steps are carried out again to form second photoluminescent pads, for example adapted to convert blue into red. However, this method has the disadvantage of being poorly suited to diode matrices with a small pixel pitch, for example of the order of 5 μm, since problems of alignment or overlapping of the photoluminescent pads with each other may be present.

[0007] Document WO2014 / 136023 describes another manufacturing method, which uses an electret layer covering the diode matrix. The method firstly comprises a step of writing electrical charge patterns on the upper face of a dielectric layer to obtain the electret layer. For this, a polarized AFM tip is used to locally inject the electrical charges. Then, a step of localized deposition of colloidal nanocrystals is carried out on the electrical charge patterns. For this, the electret layer is brought into contact with a colloidal solution containing the nanocrystals, which are naturally deposited on the electrical charge patterns under the effect of a dielectrophoretic force. However, this method has the particular disadvantage of having to inject the electrical charges sequentially, by moving the AFM point on the surface of the upper face to form the electrical charge patterns there.

[0008] Document WO2021 / 023656 describes a similar method, where the electrical charge patterns are defined by a stamping technique, i.e. by bringing an electrically polarized pad into contact with a dielectric layer intended to form the electret layer. The lower face of the pad is structured to form polarized teeth, which come into contact with the dielectric layer. This produces the electret layer, the upper face of which has the electrical charge patterns. The electret layer is then brought into contact with a colloidal solution, the nanocrystals present then being deposited on the electrical charge patterns by dielectrophoresis. However, this method has the particular disadvantage of having to precisely position the pad with respect to the diode matrix.However, the uncertainty of positioning the buffer with respect to the diode matrix can become problematic, in particular for diode matrices with small pixel pitch, for example . the order of 5 pm. Indeed, this positioning uncertainty can lead to poor positioning of the photoluminescent pads with respect to the diodes, and therefore to a degradation of the performance of the optoelectronic device. Statement of the invention

[0009] The invention aims to remedy at least in part the drawbacks of the prior art, and more particularly to propose a method for manufacturing an optoelectronic device, where the formation of the electrical charge patterns, which will be called here surface potential patterns, is carried out in an electret layer optically, either by localized polarization of the electret layer, or by localized depolarization of the electret layer. This step makes it possible to simultaneously produce all the surface potential patterns in the electret layer, without requiring the use of an AFM tip or a buffer as described previously, and therefore to produce photoluminescent pads which have good positioning with respect to the diode matrix.

[0010] For this, the subject of the invention is a method of manufacturing an optoelectronic device comprising: a matrix of diodes, adapted to emit or receive light radiation; and a color conversion structure, at least partially covering the matrix of diodes, and containing photoluminescent pads each arranged opposite at least one diode.

[0011] The manufacturing process comprises the following steps: • A / provide the diode matrix; • B / produce an electret layer, covering the diode matrix, and of which an upper face, opposite the diode matrix, has predefined surface potential patterns where the surface potential is non-zero; • C / produce the photoluminescent pads, by bringing the electret layer into contact with a colloidal solution containing photoluminescent particles, which are then deposited on the upper face of the electret layer opposite the predefined surface potential patterns, thus forming the photoluminescent pads.

[0012] According to the invention, step B of producing the electret layer comprises the following steps: • Bl / produce an electret layer whose upper face has, over its entire surface, a non-zero or zero initial surface potential; then • B2a / in the case where the initial surface potential is non-zero: illuminating areas of the electret layer with so-called depolarization light radiation capable of being absorbed at least in part by the electret layer, said illuminated areas being distinct from unilluminated areas intended to form the patterns surface potential, the absorption of depolarizing light radiation in the illuminated areas causing a cancellation of the local surface potential, the unilluminated areas then defining the surface potential patterns; • B2b / or, in the case where the initial surface potential is zero: illuminating areas of the electret layer with so-called polarization light radiation capable of being absorbed at least in part by the electret layer, the absorption of the polarization light radiation in the illuminated areas causing the formation of a non-zero local surface potential, the illuminated areas then defining the surface potential patterns.

[0013] Some preferred but non-limiting aspects of this method are as follows.

[0014] The method may comprise, prior to step B2a or B2b, a step of dis position of an opaque mask, made of a material opaque to depolarization or depolarization light radiation, extending only over the areas of the electret layer intended to form the surface potential patterns; then, during step B2a or B2b, the depolarization or polarization light radiation can be emitted in the direction of the opaque mask and the electret layer, and is absorbed by the electret layer in the areas not covered by the opaque mask.

[0015] The diodes may be light-emitting diodes. The electret layer may be made of a material suitable for partially absorbing the light radiation emitted by the light-emitting diodes, which causes a cancellation of the local surface potential. In step B2a, diodes may be selectively activated so as to illuminate the electret layer in the areas intended not to form the surface potential patterns, which causes a cancellation of the local surface potential, the unilluminated areas then defining the surface potential patterns. Or, in step B2b, diodes may be selectively activated so as to illuminate the electret layer only in the areas intended to form the surface potential patterns.

[0016] In connection with step B2a, the electret layer can be made of a self-polarized organic dielectric material, so that step B1 can then consist of depositing the electret layer covering the diode matrix, the electret layer then having, over its entire surface, a non-zero initial surface potential.

[0017] In connection with step B2b, the electret layer can be made of a photochromic dielectric material, so that step B1 can then consist of depositing an electret layer, made of the photochromic dielectric material, covering the diode matrix, the electret layer then having, over its entire surface, a zero surface potential.

[0018] In connection with step B2a, the electret layer may be made of a material di electrical, so that step B1 may comprise the following steps: depositing an electret layer, made of the dielectric material, covering the diode matrix, the electret layer then having, over its entire surface, an initial zero surface potential; then subjecting the electret layer to a predefined so-called polarization electric field, causing a formation of a non-zero surface potential over the entire surface of the electret layer.

[0019] The diode matrix may comprise an upper electrode layer covering the diodes and adapted to electrically polarize the diodes. During the step of subjecting the electret layer to the polarization electric field, the electret layer may then be arranged between the upper electrode layer and an attached electrode, between which a predefined potential difference is applied.

[0020] The electret layer produced during step B may be a first electret layer. The photoluminescent pads produced during step C may then be first photoluminescent pads adapted to convert incident light radiation of a first wavelength into light radiation of a second wavelength different from the first wavelength.

[0021] The method can then comprise the following steps, following step C: • D / producing a second electret layer, covering the diode matrix and the first electret layer, and an upper face of which, opposite the diode matrix, has second predefined surface potential patterns where the surface potential is non-zero, said second surface potential patterns being located opposite diodes distinct from those opposite which the first surface potential patterns are located; • E / producing the second photoluminescent pads, by bringing the second electret layer into contact with a colloidal solution containing second photoluminescent particles, different from the first photoluminescent particles of step C, which are then deposited on the upper face of the second electret layer opposite the second predefined surface potential patterns, thus forming the second photoluminescent pads.

[0022] The diodes of the matrix may be light-emitting diodes adapted to emit light radiation at the same wavelength. They may then form, with the first and second photoluminescent pads, a matrix of red, green, blue light pixels.

[0023] The diode matrix may have a dimension, in a plane parallel to the diode matrix (10), greater than or equal to 100 mm.

[0024] The diode matrix may have a periodicity step less than or equal to 10pm, or even 5pm, or even 2pm. Brief description of the drawings

[0025] Other aspects, aims, advantages and characteristics of the invention will appear better on reading the following detailed description of preferred embodiments thereof, given by way of non-limiting example, and made with reference to the appended drawings in which:

[0026] Figures 1A to 1H illustrate different steps of a method of manufacturing an optoelectronic device, where at least one of the electret layers is made of a self-polarized dielectric material;

[0027] Figures 2A to 2C illustrate different steps of a variant of the method of manufacturing an optoelectronic device, where the localized depolarization is carried out by means of diodes, of the diode matrix, selectively activated;

[0028] Figures 3A to 3C illustrate different steps of a variant of the method for manufacturing an optoelectronic device, where the electret layer is made of a photochromic dielectric material which is electrically polarized optically locally;

[0029] Figures 4A to 4F illustrate different steps of a variant of the method for manufacturing an optoelectronic device, where at least one of the electret layers is made of a dielectric material which is electrically polarized electrostatically.

[0030] DETAILED DESCRIPTION OF PARTICULAR EMBODIMENTS

[0031] In the figures and in the remainder of the description, the same references represent identical or similar elements. Furthermore, the different elements are not shown to scale so as to enhance the clarity of the figures. Furthermore, the different embodiments and variants are not mutually exclusive and may be combined with each other. Unless otherwise indicated, the terms "substantially", "approximately", "of the order of" mean to within 10%, and preferably to within 5%. Furthermore, the terms "between ... and ..." and equivalents mean that the limits are included, unless otherwise indicated.

[0032] The invention relates to a method for manufacturing an optoelectronic device comprising a matrix of diodes covered by a color conversion structure with photoluminescent pads. The production of the photoluminescent pads is obtained by the deposition of photoluminescent particles on surface potential patterns of an upper face of an electret layer. As detailed below, the surface potential patterns are defined by locally depolarizing, or by locally polarizing, the electret layer optically. Furthermore, the diodes can be emissive diodes (for example light-emitting diodes) or be photodiodes.

[0033] Generally speaking, an electret layer is a dielectric layer containing fixed electric charges or a quasi-permanent dipole polarization. Also, the electret layer has, on its upper face, a non-zero surface potential. This means that the electret layer generates an external electric field in the absence of an applied field. By extension, we will also call 'electret layer' a dielectric layer initially having, over its entire surface, a zero surface potential, and which is intended to form an electret layer having surface potential patterns.

[0034] In the context of the invention, advantage is taken of the fact that an electret layer can be depolarized by the absorption of so-called depolarization light radiation, as explained in the article by Sugi et al. entitled Characterization of light-erasable giant surface potential built up in evaporated Alq3 thin films, Thin Solid Films 464-465 (2004), 412-415, and the article by Tanaka et al. entitled Self-Assembled Electret for Vibration-Based Power Generator, Sci Rep 10, 6648 (2020). Such depolarization then results in a cancellation of the surface potential of the electret layer. Indeed, the absorption of the depolarization light radiation results in the creation of electron-hole pairs which, according to one approach, compensate for the polarization of charges, which results in a cancellation of the surface potential. Furthermore, an electret layer can also be polarized by the absorption of so-called polarization light radiation.

[0035] Thus, as detailed below, according to one embodiment, an electret layer is first produced which initially has, over its entire surface, a non-zero surface potential. Then predefined zones of the electret layer are depolarized, by illuminating them with depolarizing light radiation capable of being absorbed at least in part by the electret layer. The illuminated zones then have a zero surface potential, while the unilluminated zones retain their non-zero surface potential, and thus form the surface potential patterns where the photoluminescent particles will then, during the next step, be deposited in a localized manner by dielectrophoresis. Also, the photoluminescent pads are naturally located opposite (i.e. “perpendicular”) the surface potential patterns, and not outside these predefined patterns.This process then makes it possible to precisely define the surface potential patterns on the upper face of the electret layer, even when the diode matrix has a large dimension (in particular when it is produced using 100 mm or 200 mm wafer technology) and / or the pixel pitch of the diode matrix is ​​small (for example of the order of 5 pm or less, for example 2 pm).

[0036] Furthermore, according to another embodiment, an electret layer is first produced which initially has, over its entire surface, a zero surface potential. Then predefined zones of the electret layer are polarized, by illuminating them with a polarization light radiation capable of being absorbed at least in part by the electret layer. The illuminated areas then have a non-zero surface potential (while the unilluminated areas retain their zero surface potential), and thus form the surface potential patterns where, during the next step, the photoluminescent particles will then be deposited locally by dielectrophoresis. This process makes it possible, as previously, to precisely define the surface potential patterns on the upper face of the electret layer.

[0037] Furthermore, the photoluminescent pads are adapted to convert at least in part incident light radiation of a first wavelength Xi into luminescence light radiation of longer wavelength X2. By way of illustration, they may be adapted to absorb blue light, i.e. light whose wavelength is between approximately 440nm and 490nm, and to emit in the green, i.e. at a wavelength between approximately 495nm and 560nm, or even in the red, i.e. at a wavelength between 600nm and 650nm, or even in the infrared. Wavelength is understood here to mean the wavelength for which the emission spectrum has an intensity peak. For purely illustrative purposes, light-emitting diodes can have an emission spectrum with a peak intensity between 380nm and 490nm.In the case of a matrix of light-emitting diodes, the incident light radiation is the radiation emitted by the diodes, whereas in the case of photodiodes, it is the light radiation coming from an external environment and directed towards the photodiodes.

[0038] The photoluminescent pads are formed from particles of at least one photoluminescent material, and preferably nanoparticles whose maximum dimension is between 0.2nm and 1000nm, for example between 0.2nm and 1000nm, and for example between 1nm and 30nm. The size and / or composition of the photoluminescent particles are chosen according to the desired luminescence wavelength. The shape of the particles can be any, for example spherical, angular, flattened, elongated, etc.

[0039] The photoluminescent particles may be quantum dots, i.e. semiconductor nanocrystals whose quantum confinement is substantially three-dimensional, or even aggregates of quantum dots. The average size of the quantum dots may then be between 0.2 nm and 50 nm, for example between 1 nm and 30 nm. They may also be nanoplatelets, i.e. nanoparticles having an essentially two-dimensional shape. Also, the smallest dimension (thickness) is less than the other two dimensions of length and width, preferably by a ratio of at least 1.5.

[0040] The photoluminescent particles may in particular be formed from at least one semiconductor compound, which may be chosen, for example, from selenide of cadmium (CdSe), indium phosphorus (InP), indium gallium phosphorus (InGaP), cadmium sulfide (CdS), zinc sulfide (ZnS), cadmium (CdO) or zinc oxide (ZnO), cadmium zinc selenide (CdZnSe), zinc selenide (ZnSe) doped with, for example, copper or manganese, graphene or other suitable semiconductor materials. Nanoparticles may also have a core / shell structure, such as CdSe / ZnS, CdSe / CdS, CdSe / CdS / ZnS, PbSe / PbS, CdTe / CdSe, CdSe / ZnTe, InP / ZnS or other.

[0041] Figures 1A to 1H illustrate different steps of a method for manufacturing an optoelectronic device 1 according to one embodiment. In this example, at least one of the electret layers E1, E2, and here both electret layers, are made of a self-polarized dielectric material. In this example, the surface potential patterns are made by localized depolarization, optically, of an electret layer initially having, over its entire surface, a non-zero surface potential.

[0042] Furthermore, the optoelectronic device 1 comprises a matrix of RGB (red, green, blue) type light pixels. Each RGB pixel is formed here from several R, G or B type light sub-pixels, each comprising at least one light-emitting diode (one diode per sub-pixel). In the description, a sub-pixel associated with a given color is called a “pixel”. Alternatively, the optoelectronic device 1 could comprise a matrix of photodiodes.

[0043] Here and for the remainder of the description, a direct three-dimensional orthogonal reference frame XYZ is defined, where the X and Y axes form a main plane in which a support substrate 11 extends, and where the Z axis is oriented along the thickness of the diode matrix 10 in the direction of the front face. The terms 'lower' and 'upper' are defined with respect to an increasing positioning along the +Z direction.

[0044] With reference to [Fig. 1A], a matrix of light-emitting diodes 10 is provided. In this example, the diodes are divided into three types denoted D1, D2, D3, depending on whether they are intended to form pixels P1, P2, P3 of different colors. The diodes rest here on a support substrate 11, and are electrically polarized here by a lower electrode layer 12 and by an upper electrode layer 13. Other configurations are possible, in particular in the case where the support substrate 11 is electrically conductive.

[0045] The diodes D1, D2, D3 are produced here in a conventional manner, for example by epitaxy of semiconductor layers. Each diode D1, D2, D3 is formed from a stack of a lower semiconductor portion doped with a first type of conductivity, for example p-type, an active zone where the light radiation of the light-emitting diode is emitted, and an upper semiconductor portion doped with a second type of conductivity, for example n-type. The diodes D1, D2, D3 can be produced from the same semiconductor compound, for example base of a III-V compound such as GaN, InGaN, AlGaN among others.

[0046] Preferably, the diodes D1, D2, D3 are structurally identical, so that the light radiation emitted is substantially identical from one diode to another in terms of wavelength. In this example, the diodes D1, D2, D3 are adapted to emit light radiation in the blue, that is to say whose emission spectrum has an intensity peak at a wavelength between approximately 440nm and 490nm.

[0047] A front face of the diode matrix 10 is a substantially planar face, with the possible presence of surface micro-structurings making it possible to improve the extraction of light. It is formed here from the upper face of the upper electrode layer 13 adapted to electrically polarize the diodes. It can also be formed by a thin passivation layer (not shown) which covers the diodes and the upper electrode layer.

[0048] With reference to [Fig.lB] and IC, a first electret layer El is then produced, which at least partially covers the diode matrix 10, and the upper face F1 of which has first surface potential patterns M1 where the surface potential is non-zero. These patterns M1 are surrounded, at least in part, by areas of the upper face F1 where the surface potential is zero. As indicated previously, an electret layer has a non-zero surface potential at its upper face due to the presence of electrical charges or a dipole polarization (vertical orientation of the dipoles). Here, the surface potential of the upper face F1 is non-zero only in predefined patterns M1, called surface potential patterns, while it is substantially zero outside these patterns M1. It can have a value of approximately 10V.The electrical potential patterns Ml are therefore the surfaces of the upper face where the electrical potential is non-zero. They extend opposite at least one diode, and are intended to form the surfaces where photoluminescent particles will be deposited during the production of the photoluminescent pads.

[0049] With reference to [Fig. 1B], an electret layer El is deposited which at least partially covers the diode matrix 10. In this example, the electret layer El is made of a self-polarized dielectric material, i.e. it was not necessary to polarize the dielectric layer by a dedicated step. It therefore forms an electret layer whose upper face Fl has, over its entire surface, a non-zero initial surface potential. By over its entire surface, we mean at least over the entire surface of the upper face of the electret layer which is opposite the diode matrix. In this example, the electret layer El covers all of the diodes D1, D2 and D3 but could only cover part of the diodes, for example only those intended to form the red pixels and the green pixels. Its upper face has several zones Fl. 1, Fl. 2 and Fl. 3, located respectively opposite the diodes D1, D2 and D3.

[0050] Furthermore, the material of the electret layer El is chosen to be at least partly absorbent at the wavelength of a depolarizing light radiation (for example in the ultraviolet), and at least partly transparent at the wavelength of the light radiation emitted by the diodes (for example in the blue). By "at least partly absorbent", it is meant that the absorption rate is at least 20% (or even less, for example at least 10%), or even at least 50%, at the wavelength of the depolarizing light radiation. And by "at least partly transparent", it is meant that the transmission rate is at least 50% at the wavelength of the light radiation emitted by the diodes. The electret layer may have a thickness of a few tens to hundreds of nanometers, and preferably at most equal to 2 pm.

[0051] For example, the self-polarized dielectric material may be an organic material selected from BCPO (bis-4-(N-carbazolyl)phenyl)phenylphosphine oxide), DPEPO (bis[2-(diphenylphosphino)phenyl]ether oxide), mCBP-CN (3,3'-di(carbazol-9-yl)-5-cyano-1,1'-biphenyl) and PO9 (3,6-bis(diphenylphosphoryl)-9-phenylcarbazole).

[0052] It may also be an organic material chosen from: TPBi (2,2',2"-(l,3,5-Benzinetriyl)-tris(l-phenyl-lH-benzimidazole)), o-ethyl-TPB, m-ethyl-TPBi, p-ethyl-TPBi, Alq3 (tris(8-hydroxyquinolinato)aluminum), Al(7-Prq)3 (tris(7-propyl-8-hydroxyquinolinolato) aluminum(III)), Al(q-Cl)3 (tris(5-chloro-8-hydroxyquinolinato)aluminum), OXD-7 (2,2'-(1,3-phenylene)-bis[5-(4-tert-butylphenyl)-1,3,4-oxadiazole]), BCP (2,9-dimethyl-4,7-diphenyl-l,10-phenanthroline), Gaq3 (tris(8-hydroxyquinoline) gallium), Balq (bis(2-methyl-8-quinolinate)4-phenylphenolate), Ir(ppy)3 (tris(2-phenylpyridine)iridium(III)), Ir(ppy)2acac (bis(2-phenylpyridine)iridium(III) acetylacetonate), Ir(ppy)2tmd (bis(2-phenylpyridine)iridium(III)(2,2,6,6-tetramethylheptane-3,5-diketonate)), Bpy-OXD (l,3-Bis[2-(2,2'-bipyridine-6-yl)-l,3,4-oxadiazo-5-yl]benzene), 2CzPN (4,5-di (9H-carbazol-9-yl) phthalonitrile), the l,2,3,5-tetrakis(carbazol-9-yl)-4,6-dicyanobenzene,le 4CzPN (3,4,5,6-tetrakis (carbazol-9-yl)-l,2-dicyanobenzene), le DCJTB (4-(dicyanomethylene)-2-t-butyl-6-(l,l,7,7-tetramethyljulolidyl-9-enyl)-4H-pyran), le DACT-II (9-[4-(4,6-diphenyl-l,3,5-triazin-2-yl)phenyl]-N,N,N',N'-tetraphenyl-9H-carbazole-3,6 -diamine), le mCP (l,3-Bis(N-carbazolyl)benzene), le a-NPD (N,N'-bis( 1 -naphthyl)-N,N'-diphenyl-1,1 '-biphenyl-4,4'-diamine), le Znq2 (bis(8-hydroxyquinoline)zinc), et le B3PyMPM (bis-4,6-(3,5- di- , 3-pyridylphenyl)-2-methylpyrimidine).

[0053] With reference to [Fig. 1C], the electret layer El is locally depolarized optically so as to define the first surface potential patterns Ml. For this, an opaque layer is deposited here on the electret layer El, which is then structured by photolithography and etching to obtain an opaque mask 2 which here only extends opposite the diodes Dl, i.e. only over the zones Fl.l. It therefore does not extend opposite the diodes D2 and D3. The opaque mask 2 can be made of a photosensitive resin opaque to the depolarization light radiation, here to ultraviolet. Alternatively, the opaque mask 2 can be the photolithography mask at the stepper.

[0054] Next, the electret layer El is subjected to depolarization light radiation, of wavelength X.dp, which is then absorbed by the electret layer El only in the zones F1.2 and Fl.3 (not covered by the opaque mask 2), and not in the zones Fl.l. Also, the absorption of the depolarization light radiation causes a localized depolarization in the zones F1.2 and Fl.3 of the upper face Fl of the electret layer El. The zones Fl.l of the upper face Fl of the electret layer El therefore form the surface potential patterns ML. For example, the depolarization light radiation can be in the ultraviolet, that is to say at a main wavelength between 100 and 380 nm. Following this step, the resin 2 is removed here.

[0055] With reference to [Fig.lD], the first photoluminescent pads PI are then produced by localized deposition of first photoluminescent particles pl on the electret layer El opposite the first surface potential patterns ML. For this, the procedure is similar to that described in documents WO2014 / 136023 and WO2021 / 023656. Thus, a colloidal solution containing the first photoluminescent particles pl is placed in contact with the upper face Fl of the electret layer EL. The entire stack can thus be immersed in the colloidal solution, or a drop of such a solution can be deposited on the electret layer EL. Due to the non-zero surface potential located in the surface potential patterns Ml, a non-uniform electric field is generated which causes localized deposition of the photoluminescent particles pl by dielectrophoresis.Also, the photoluminescent particles pl are deposited essentially opposite the first patterns Ml, and substantially not outside the patterns Ml (i.e. not opposite the zones F1.2 and F1.3). The contact time of the colloidal solution on the electret layer El depends in particular on the quantity of photoluminescent particles pl to be deposited, the particle concentration, their size, the surface potential, etc. For example, the thickness of the photoluminescent spots Pl can be of the order of a few hundred nanometers, for example equal to approximately 400nm. The colloidal solution is then removed and the . electret layer El. Note that the surface potential of the Ml patterns has become substantially zero. Indeed, the photoluminescent particles pl are grafted onto the surface of the electret layer El at the level of the Ml patterns, until the potential of the Ml patterns is substantially completely attenuated.

[0056] With reference to [Fig.lE] and 1F, a second electret layer E2 is then produced, which at least partially covers the diode matrix 10, and the upper face F2 of which also has second surface potential patterns M2 where the surface potential is non-zero. The second surface potential patterns M2 are not here located opposite the first photoluminescent pads P1, so that the second photoluminescent pads P2 are opposite diodes different from the diodes D1, to thus form luminous pixels of another color.

[0057] For this, with reference to [Fig. 1E], the second electret layer E2 is deposited, here also made of a self-polarized dielectric material, so as to cover the first electret layer El as well as the first photoluminescent pads Pl. Its upper face F2 therefore has, over its entire surface, a non-zero surface potential. This second electret layer E2 can be made of a material identical to that of the first electret layer El. It is also chosen to be at least partly absorbent at the wavelength of depolarizing light radiation (here in the ultraviolet), and at least partly transparent to the wavelength of the light radiation emitted by the diodes (here in the blue). The electret layer E2 can have a thickness of the order of a few tens to hundreds of nanometers, and preferably at most equal to 2 pm.

[0058] With reference to [Fig. 1F], the second electret layer E2 is locally depolarized optically so as to define the second surface potential patterns M2 defined in its upper face F2. For this, an opaque layer is deposited on the second electret layer E2, which is then structured by photolithography and etching to obtain an optical mask 2 which here only extends opposite the diodes D3. It therefore does not extend opposite the diodes D1 and D2. Alternatively, as indicated previously, the mask 2 may be the photolithography mask at the stepper.

[0059] Then, the second electret layer E2 is subjected to depolarizing light radiation, which is then absorbed by the second electret layer E2 only in the areas F2.1 and F2.2 (not covered by the opaque mask 2), and not in the areas F2.3. Also, the absorption of the depolarizing light radiation causes a localized depolarization in the areas F2.1 and F2.2 of the upper face F2 of the electret layer E2. The areas F2.3 of the upper face F2 of the electret layer E2 therefore form the second surface potential patterns M2.

[0060] Preferably, if the potential of the patterns Ml is not completely zero, a part of the depolarizing light radiation is transmitted by the second electret layer E2, then by the photoluminescent pads PI to then be absorbed by the first electret layer El, which locally depolarizes the first surface potential patterns Ml. This further limits the risk of second photoluminescent particles p2 subsequently being deposited opposite the first photoluminescent pads PI.

[0061] With reference to [Fig.lG], the second photoluminescent pads P2 are then produced by localized deposition of second photoluminescent particles p2 on the electret layer E2 opposite the second surface potential patterns M2. For this, the procedure is the same as for the first photoluminescent pads PI, by placing a colloidal solution containing the second photoluminescent particles p2 in contact with the upper face F2 of the second electret layer E2. Due to the non-zero surface potential located in the second patterns M2, a non-uniform electric field is generated which causes localized deposition of the photoluminescent particles p2 by dielectrophoresis. Also, the photoluminescent particles p2 are deposited essentially opposite the second patterns M2, and substantially not outside the patterns M2 (i.e. not opposite the zones F2.1 and F2.2), and the second photoluminescent pads P2 are obtained.Note that the surface potential of the M2 patterns becomes substantially zero, as the photoluminescent particles p2 are grafted. The colloidal solution is then removed and the electret layer can be dried.

[0062] With reference to [Fig. 1H], an optoelectronic device 1 is thus obtained, which comprises a matrix of diodes 10 and a color conversion structure formed of photoluminescent pads PI and P2. In this example, the diodes D2 form blue pixels, the diodes DI associated with the photoluminescent pads PI form, for example, red pixels, and the diodes D3 associated with the photoluminescent pads P2 form green pixels. To form the photoluminescent pads, the method implemented a step of localized depolarization, by optical means, of electret layers E1 and E2 having an initially non-zero surface potential over the entire surface of the upper face. This therefore avoids having to resort to a step of localized injection of electrical charges into an electret layer initially without electrical charges, as in the examples of the prior art mentioned previously.Also, the process is fast and the production of photoluminescent plots is spatially precise, even in the context of a matrix of diodes produced from a large substrate (for example 100 or 200 mm) and / or whose pixel pitch is very small (for example 5 pm or less).

[0063] Figures 2A to 2C illustrate different steps of a method for manufacturing an optoelectronic device according to an alternative embodiment. In this example, the surface potential patterns are produced by localized depolarization, by way optical, of an electret layer initially presenting, over its entire surface, a non-zero surface potential.

[0064] This method differs from that of FIGS. 1A-1H essentially in that the depolarization light radiation corresponds to the light radiation emitted by the diodes. In this case, the diode matrix is ​​adapted to selectively activate the diodes D1, D2 and D3, and for this purpose comprises lower 12 and upper 13 electrodes arranged to allow this selective activation.

[0065] Furthermore, the material of the electret layer El is adapted to absorb only part of the light radiation emitted by the diodes D1, D2, D3, and to transmit the non-absorbed part. Thus, the absorbed part makes it possible to locally depolarize the electret layer, in the areas of the upper face opposite the activated diodes. The areas of the upper face located opposite the non-activated diodes then keep their non-zero surface potential, and then define the surface potential patterns.

[0066] With reference to [Fig.2A], a matrix of diodes 10 is provided, covered by an electret layer El. The upper face Fl of the latter has, over its entire surface, a non-zero surface potential. The electret layer El is then made of a dielectric material suitable for absorbing only part of the light radiation emitted by the diodes, here in the blue (or near blue) range.

[0067] With reference to [Fig.2B], the diodes are activated selectively, that is to say that only a part of them is activated. Here, only diodes D2 and D3 are activated, and not diodes DL. The emitted light radiation is then partly absorbed locally by the electret layer El in the zones F1.2 and F1.3 of the upper face Fl located opposite the diodes D2 and D3, which results in a local depolarization of the electret layer El opposite these diodes. On the other hand, to the extent that the diodes D1 are not activated, the electret layer El remains locally polarized in the zones Fl.l, which then define the first surface potential patterns ML.

[0068] With reference to [Fig.2C], the first photoluminescent pads PI are then produced, in the same way as previously (see [Fig.1D]), by bringing the electret layer El into contact with a colloidal solution containing the photoluminescent particles pi. These are then naturally deposited on the electret layer El in the surface potential patterns Ml, so that the photoluminescent pads PI are positioned opposite the diodes D1 and not opposite the diodes D2 and D3.

[0069] The manufacturing process can be continued in the same way as previously (not shown). Thus, a second electret layer E2 is deposited, which here covers the diode matrix 10 as well as the first PI pads and the electret layer EL. The upper face of the electret layer E2 has a non-zero surface potential over its entire surface. This second electret layer E2 is then locally depolarized by optically, in an identical manner to [Fig.2B]. Thus, diodes DI and D2 are activated only, so as to depolarize areas F2.1 and F2.2 of the upper face F2 of the electret layer E2. On the other hand, diodes D3 are not activated, so that areas F2.3 have a non-zero surface potential, and thus form the second surface potential patterns M2. Note that, as a variant, the optically localized depolarization of the second electret layer E2 can be carried out as in the method of Figures 1A-1H, that is to say by using a dedicated depolarization light radiation, distinct from that emitted by the diodes.

[0070] Thus, in this embodiment variant, the manufacturing method takes advantage of the selective activation of the diodes of the matrix 10 to locally depolarize the electret layer(s) E1, E2, and thus define the surface potential patterns. This makes it possible in particular to simplify the manufacturing method, and in particular the depolarization steps.

[0071] Figures 3A to 3C illustrate different steps of a method of manufacturing an optoelectronic device according to another variant embodiment.

[0072] This method differs from that of Figures 1A-1H essentially in that the electret layer E1 is made from a photochromic dielectric material which is locally polarized optically to form the surface potential patterns, and not by depolarization of an electret layer having an initially non-zero surface potential. In other words, the surface potential patterns are made by localized polarization, optically, of an electret layer initially having a zero surface potential over its entire surface.

[0073] The photochromic material of the electret layer El is then adapted to absorb at least in part a light radiation of predefined polarization, for example between 100nm and 380nm, leading to an electrical polarization of the layer. Finally, it is also at least in part transparent to the light radiation emitted by the diodes, for example in the blue. The photochromic material may be a compound of a matrix material such as Poly(methyl-methacrylate) (PMMA) or polystyrene (PS), containing from 1 to 20% by mass of a photochromic material which may be chosen from Spiropyrans (SP) or 1,3'-dihydrol, 3',3'trimethyl-6-nitrospiro[2H-l-benzopyran-2,2 112 0-(2H)-indole] or N,N'-ditridecylperylene-3,4,9,10-tetracarboxylic diimide (PTCDLC13H27) or 1,2-bis-[2-methyl-5-(p-cyanophenyl)-3-thienyl]perfluorocyclopentene (DTE-CN). The latter material is notably presented in the article by Castagna et al.entitled Photochromy Electret: A New Tool for Light Energy Harvesting, The Journal of Physical Chemistry Letters, 3(1), 51-57, 2012. .

[0074] With reference to [Fig.3A], a diode matrix 10 is provided covered by an electret layer EL. The upper face F1 of the latter has, over its entire surface, a substantially zero surface potential. The electret layer El is then made of a photochromic material.

[0075] With reference to [Fig.3B], the surface potential patterns Ml are then formed by localized polarization of the electret layer El optically. Here, through an opaque mask 2 (a mask deposited on the electret layer, the photolithography mask, etc.) opposite the diodes D2 and D3, here on the zone Fl.2 and Fl.3 of the upper face Fl, a polarization light radiation, of predefined wavelength kp, is subjected, which is absorbed by the electret layer El only in the zone Fl.1, and not in the zones Fl.2 and Fl.3. Thus, the surface potential is not defined in the zones Fl.2 and Fl.3 and remains zero, whereas it is non-zero in the zone Fl.1, which defines the surface potential patterns Ml.

[0076] Note that the localized polarization of the electret layer El can obviously be carried out by the selective activation of the diodes of the matrix 10.

[0077] With reference to [Fig.3C], the first photoluminescent pads PI are then produced, in the same way as previously (see [Fig.2C]), by bringing the electret layer El into contact with a colloidal solution containing the photoluminescent particles pl. These are then naturally deposited on the electret layer El in the surface potential patterns Ml, so that the photoluminescent pads Pl are positioned opposite the diodes DI and not opposite the diodes D2 and D3.

[0078] The manufacturing method can be continued in the same way as previously (not shown), except that it is not necessary to use a second electret layer E2. Thus, a second exposure of the electret layer El is carried out, which has surface potential patterns M2 (located opposite, for example, the diodes D3), and finally the photoluminescent pads P2 are produced, located opposite the surface potential patterns M2. Once all the photoluminescent pads are deposited by dielectrophoresis, exposure in visible light of the entire electret layer El is advantageously carried out in order to improve, if necessary, the transparency of this layer in the visible range of the spectrum.

[0079] Figures 4A to 4F illustrate different steps of a method of manufacturing an optoelectronic device according to another variant embodiment.

[0080] This method differs from the method described in Figures 1A and following essentially in that at least one of the electret layers, and here the two electret layers E1, E2, is made of a dielectric material which is electrically polarized electrostatically. For this, the upper electrode layer 13 is used. In other words, the surface potential patterns are produced by localized depolarization, optically, of an electret layer initially having, over its entire surface, a non-zero surface potential.

[0081] With reference to [Fig.4A], a diode matrix 10 is provided covered by a electret layer El. The upper face Fl of the latter has, over its entire surface, an initial surface potential that is substantially zero. The electret layer El is then made of an inorganic dielectric material such as, for example, a silicon oxide (SixOy), a silicon nitride (SixNy), an aluminum oxide (AlxOy), a titanium oxide (Tix Oy), a tantalum oxide (TaxOy), a halfnium oxide (HfxOy), or even an organic dielectric material (PMMA, etc.).

[0082] With reference to [Fig.4B], a non-zero surface potential is defined over the entire surface of the upper face of the EL electret layer. For this, advantage is taken of the upper electrode layer 13 which extends under the entire surface of the EL electret layer. An additional electrode 14 is also brought in, arranged above the entire EL electret layer, and a potential difference is applied between these two electrodes 13, 14. A non-zero surface potential is then created over the entire surface of the upper face of the EL electret layer. Other techniques for charging the electret layer are possible (plasma, ionic implementation, corona discharge, etc.).

[0083] With reference to [Fig.4C], the surface potential patterns Ml are then defined by localized depolarization of the electret layer El optically, according to one of the ways described previously. Then the first photoluminescent pads PI are produced, in the same way as previously (see [Fig.1D]), by bringing the electret layer El into contact with a colloidal solution containing the photoluminescent particles pi. These are then naturally deposited on the electret layer El in the surface potential patterns Ml, so that the photoluminescent pads PI are positioned opposite the diodes DI and not opposite the diodes D2 and D3. The surface potential of the patterns Ml then becomes substantially zero.

[0084] A second electret layer E2 is then produced having surface potential patterns M2. Here, the electret layer E2 is produced like the electret layer El by electrostatic polarization of a layer having an initial zero electrical potential. Alternatively, the second electret layer can be produced as in the examples described previously with reference to [Fig.lA]-lH, [Fig.2A]-2C and [Fig.3A]-3C.

[0085] With reference to [Fig.4D], an electrode layer 15 is first produced which covers the entire diode matrix 10, and here more precisely the photoluminescent pads PI and the electret layer EL. Then an electret layer E2 is deposited. It extends entirely over the electrode layer 15 and here also ensures the encapsulation of the photoluminescent particles of the pad PL. The upper face of the electret layer E2 has, over its entire surface, an initial surface potential which is substantially zero. The electret layer E2 can be made of a dielectric material identical to that of the electret layer EL.

[0086] With reference to [Fig.4E], a non-zero surface potential is defined over the entire surface of the upper face of the electret layer E2. For this, a potential difference is applied between the electrode layer 15 and an additional electrode 14 arranged above the entire electret layer E2. A non-zero surface potential is then created over the entire surface of the upper face of the electret layer E2. Note that the electrode layer 15 could not be used: a potential difference would then be applied between the electrode 14 and the electrode 13.

[0087] With reference to [Fig.4F], the surface potential patterns M2 are then defined by localized depolarization of the electret layer E2 optically. Then the photoluminescent pads P2 are produced in the same way as previously (see [Fig.1G]), by bringing the electret layer E2 into contact with a colloidal solution containing the photoluminescent particles p2. These are then naturally deposited on the electret layer E2 in the surface potential patterns M2, so that the photoluminescent pads P2 are positioned opposite the diodes D2 and not opposite the diodes DI and D2. The surface potential of the patterns M2 then becomes substantially zero.

[0088] Particular embodiments have just been described. Different variants and modifications will appear to those skilled in the art.

Claims

Claims

1. Method of manufacturing an optoelectronic device (1) comprising: • a matrix of diodes (10), adapted to emit or receive light radiation; and • a color conversion structure, at least partially covering the diode matrix (10), and containing photoluminescent pads (PI) each arranged opposite at least one diode; • the process comprising the following steps: • A / provide the diode matrix (10); • B / create an electret layer (El), covering the matrix of diodes (10), and of which an upper face (Fl), opposite the diode matrix (10), has predefined surface potential patterns (Ml) where the surface potential is non-zero; • C / produce the photoluminescent pads (PI), by bringing the electret layer (El) into contact with a colloidal solution containing photoluminescent particles (pl), which are then deposited on the upper face (Fl) of the electret layer (El) opposite the predefined surface potential patterns (Ml), thus forming the photoluminescent pads (Pl); • characterized in that step B of producing the electret layer (El) comprises the following steps: • Bl / produce an electret layer (El) whose upper face (Fl) has, over its entire surface, a non-zero or zero initial surface potential; then • B2a / in the case where the initial surface potential is non-zero: illuminating areas of the electret layer (El) with so-called depolarization light radiation capable of being absorbed at least in part by the electret layer (El), said illuminated areas being distinct from unilluminated areas intended to form the surface potential patterns (Ml), the absorption of the depolarization light radiation in the illuminated areas causing a cancellation of the local surface potential, the unilluminated areas then defining the surface potential patterns (Ml); • B2b / or, in the case where the initial surface potential is zero: illuminating areas of the electret layer (El) with so-called polarization light radiation capable of being absorbed at least in part by the electret layer (El), the absorption of the polarization light radiation in the illuminated areas causing the formation of a non-zero local surface potential, the illuminated areas then defining the surface potential patterns (Ml).

2. Manufacturing method according to claim 1, comprising, prior to step B2a or B2b, a step of arranging an opaque mask (2), made of a material opaque to the depolarization or depolarization light radiation, extending only over the areas of the electret layer (El) intended to form the surface potential patterns (Ml); then, during step B2a or B2b, the depolarization or polarization light radiation is emitted in the direction of the opaque mask (2) and the electret layer (El), and is absorbed by the electret layer (El) in the areas not covered by the opaque mask (2).

3. A manufacturing method according to claim 1, wherein: • the diodes are light-emitting diodes; • the electret layer (El) is made of a material suitable for partially absorbing the light radiation emitted by the light-emitting diodes, which causes cancellation of the local surface potential; • during step B2a, diodes are selectively activated so as to illuminate the electret layer in the areas intended not to form the surface potential patterns (Ml), which causes a cancellation of the local surface potential, the unilluminated areas then defining the surface potential patterns (Ml); • or, during step B2b, diodes are selectively activated so as to illuminate the electret layer only in the areas intended to form the surface potential patterns (Ml).

4. Manufacturing method according to any one of claims 1 to 3 in connection with step B2a, in which the electret layer (El) is made of a self-polarized organic dielectric material, so that step B1 consists of depositing the electret layer (El) covering the diode matrix (10), the electret layer (El) then having, over its entire surface, a non-zero initial surface potential.

5. Manufacturing method according to any one of claims 1 to 3 in connection with step B2b, in which the electret layer (El) is made of a photochromic dielectric material, so that step B1 consists of depositing an electret layer (El), made of the photochromic dielectric material, covering the diode matrix (10), the electret layer (El) then having, over its entire surface, a zero surface potential.

6. Manufacturing method according to any one of claims 1 to 3 in connection with step B2a, in which the electret layer (El) is made of a dielectric material, so that step B1 comprises the following steps: • depositing an electret layer (El), made of the dielectric material, covering the diode matrix (10), the electret layer (El) then having, over its entire surface, an initial zero surface potential; then • subjecting the electret layer (El) to a predefined so-called polarization electric field, causing a formation of a non-zero surface potential over the entire surface of the electret layer (El).

7. Manufacturing method according to the preceding claim, in which: • the diode matrix (10) comprises an upper electrode layer (13) covering the diodes and adapted to electrically polarize the diodes, • during the step of subjecting the electret layer (El) to the polarization electric field, the electret layer (El) is then arranged between the upper electrode layer (13) and an attached electrode (14), between which a predefined potential difference is applied.

8. A manufacturing method according to any one of claims 1 to 7, in which: • the electret layer (El) produced during step B is a first electret layer; and the photoluminescent pads (PI) produced during step C are first photoluminescent pads adapted to convert incident light radiation of a first wavelength into light radiation of a second wavelength different from the first wavelength; • the method comprising the following steps, following step C: • D / producing a second electret layer (E2), covering the diode matrix (10) and the first electret layer (El), and of which an upper face (Fl), opposite the diode matrix (10), has second predefined surface potential patterns (M2) where the surface potential is non-zero, said second surface potential patterns (M2) being located opposite diodes distinct from those opposite which the first surface potential patterns (Ml) are located;• E / producing the second photoluminescent pads (P2), by bringing the second electret layer (E2) into contact with a colloidal solution containing second photoluminescent particles (p2), different from the first photoluminescent particles (pl) of step C, which are then deposited on the upper face (F2) of the second electret layer (E2) opposite the second predefined surface potential patterns (M2), thus forming the second photoluminescent pads (P2).;

9. Manufacturing method according to the preceding claim, in which the diodes of the matrix (10) are light-emitting diodes adapted to emit light radiation at the same wavelength; and form with the first and second photoluminescent pads (P1, P2) a matrix of red, green, blue light pixels.

10. A manufacturing method according to any one of claims 1 to 9, wherein the diode matrix (10) has a dimension, in a plane parallel to the diode matrix (10), greater than or equal to 100mm.

11. A manufacturing method according to any one of claims 1 to 12, characterized in that the method comprises: 10, in which the diode matrix (10) has a periodicity step less than or equal to 10pm, or even 5pm, or even 2pm.

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