Ion permeability control plate for plasma processing equipment

JP1742448SActive Publication Date: 2026-04-27TOKYO ELECTRON LTD
View PDF 0 Cites 0 Cited by

Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Designs
Current Assignee / Owner
TOKYO ELECTRON LTD
Filing Date
2022-09-29
Publication Date
2026-04-27

Smart Images

  • Figure 0001742448000001
    Figure 0001742448000001
  • Figure 0001742448000002
    Figure 0001742448000002
  • Figure 0001742448000003
    Figure 0001742448000003
Patent Text Reader

Abstract

This article is an ion transmission control plate for a plasma processing apparatus that controls the amount of plasma ions generated in the plasma generation chamber that are transmitted into the processing chamber where the semiconductor wafer is placed. By increasing the aperture area, this article can increase the amount of radicals that are transmitted into the processing chamber, and as a result, a suitable ashing rate can be obtained.
Need to check novelty before this filing date? Find Prior Art