Processing procedure search image

JP1810392SActive Publication Date: 2025-10-09APPLIED MATERIALS INC
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Patent Information

Application Number
JP2025009467D
Authority / Receiving Office
JP · JP
Patent Type
Designs
Current Assignee / Owner
Priority Date
2024-11-14
Filing Date
2025-05-14
Publication Date
2025-10-09
Estimated Expiration
2050-05-14

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    Figure 0001810392000002
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    Figure 0001810392000003
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Abstract

The image of the present design is an image for searching processing procedures for wafers, etc. For example, as shown in Reference Image Figure 2, by operating the search button (7), a search is performed based on the search criteria selected in association with the search icon (3) indicating the search item, and the search results are displayed in the search result display field (6) and the search result count field (11). The search criteria may be, for example, the type of wafer chamber, the ratio of etching rates for two materials, the etching rate, or processing procedure parameters. To add search criteria for a search item, for example, click icon (4A) corresponding to the search icon (3) indicating the search item to display search option block (1), select search option (9), and click add search criteria button (8). Click icon (4B) to close search option block (1). To delete search criteria for a search item, for example, click icon (2). In search option block (1), for example, select the minimum and maximum search option values ​​by clicking slider bar (5).
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