Processing procedure search image

Abstract

The image of the present design is an image for searching wafer processing procedures. For example, as shown in Reference Image Figure 2, by operating the search button (7), a search is performed based on the search criteria selected in association with the search icon (3) indicating the search item, and the search results are displayed in the search result display section (6) and the search result count section (11). The search criteria may be, for example, the type of wafer chamber, the ratio of etching rates for two materials, the etching rate, or the processing procedure parameters. To add search criteria for a search item, for example, click icon (4A) corresponding to the search icon (3) indicating the search item to display the search options block (1), select the desired search option (9), and click the add search criteria button (8). The search options block (1) may be closed by clicking icon (4B). To delete search criteria for a search item, for example, click icon (2). In the search options block (1), for example, the minimum and maximum values ​​of the search options are selected by clicking the slider bar (5) or by clicking the fine-tuning edit label (10) that appears above the slider bar.

Images