Antiglare antireflection member, polarizer equipped with the same, faceplate, picture display unit, and selection method of antiglare antireflection member

JP2025016543A5Active Publication Date: 2025-07-15DAI NIPPON PRINTING CO LTD
View PDF 0 Cites 0 Cited by

Patent Information

Application Number
JP2024185924
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2020-03-09
Filing Date
2024-10-22
Publication Date
2025-07-15
Estimated Expiration
2041-03-09

AI Technical Summary

Benefits of technology

【0010】 本開示の防眩性反射防止部材、並びに、これを備える偏光板、表面板及び画像表示装置は、斜め方向から視認した際の着色を抑制でき、さらには、局所的に輝点が視認されることを抑制することができる。また、本開示の防眩性反射防止部材の選別方法は、斜め方向から視認した際の着色を抑制でき、さらには、局所的に輝点が視認されることを抑制できる防眩性反射防止部材を安定して選別することができる。

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure 00000000_0000_ABST
    Figure 00000000_0000_ABST
Patent Text Reader

Abstract

To provide an antiglare antireflection member capable of preventing a coloration when observed in an oblique direction and further preventing a bright spot from being locally observed.SOLUTION: An antiglare antireflection member includes an antiglare layer and a low refractive index layer on a substrate. In the antiglare antireflection member, an average of Δd is 7.0 nm to 40.0 nm, inclusive, in which a film thickness difference of the low refractive index layer is Δd in a given region 2 mm×2 mm in the antiglare antireflection member.SELECTED DRAWING: Figure 1
Need to check novelty before this filing date? Find Prior Art

Description

[Technical field]

[0001] The present disclosure relates to an antiglare and antireflection member, a polarizing plate, a front plate and an image display device each including the antiglare and antireflection member, and a method for selecting the antiglare and antireflection member. [Background technology]

[0002] It is known that in display devices such as liquid crystal display devices, organic EL display devices, micro LED display devices, mini LED display devices, and displays using quantum dots, as well as showcases, it is common to provide an anti-reflection material on the surface of the display device in order to improve visibility. In recent years, in addition to televisions and the like, touch panel type image display devices that users operate by directly touching the screen with their hands, such as in-vehicle displays for car navigation systems and the like, digital signage displays, tablets, smartphones, etc., have become widespread, and these devices are also provided with anti-reflection members.

[0003] Such antireflection members include those in which a hard coat layer and an antireflection layer are successively formed on a substrate (for example, Patent Documents 1 and 2).

[0004] The anti-reflection members of Patent Documents 1 and 2 can suppress the reflection of external light, but have a problem in that the background is reflected because the surface is smooth.

[0005] For this reason, an antiglare and antireflection film has been proposed in which an antiglare layer and an antireflection layer are successively formed on a substrate (for example, Patent Document 3). [Prior art documents] [Patent documents]

[0006] [Patent Document 1] JP 2016-218179 A [Patent Document 2] JP 2020-8877 A [Patent Document 3] JP 2018-197829 A DISCLOSURE OF THEINVENTION [Problem to be solved by the invention]

[0007] The antiglare and antireflection film of Patent Document 3 can reduce the reflection of the background compared to Patent Documents 1 and 2. However, the antiglare and antireflection film of Patent Document 3 frequently has problems such as being colored when viewed from an oblique direction and having localized bright spots.

[0008] In view of the above-mentioned problems, the present disclosure aims to provide an anti-glare anti-reflection member that suppresses coloration when viewed from an oblique direction and further suppresses the visibility of localized bright spots, as well as a polarizing plate, a front plate, and an image display device that include the same, and a method for selecting anti-glare anti-reflection members. [Means for solving the problem]

[0009] In order to solve the above problems, the present disclosure provides the following [1] to [5]. [1] An antiglare and antireflection member having an antiglare layer and a low refractive index layer on a substrate, The antiglare and antireflection member has an average Δd of 7.0 nm or more and 40.0 nm or less, where Δd is the difference in thickness of the low refractive index layer within any 2 mm×2 mm area of ​​the antiglare and antireflection member. [2] A polarizing plate having a polarizer, a first transparent protective plate arranged on one side of the polarizer, and a second transparent protective plate arranged on the other side of the polarizer, wherein at least one of the first transparent protective plate and the second transparent protective plate is the anti-glare anti-reflection member described in [1] above, and the anti-glare anti-reflection member is arranged so that the surface on the low refractive index layer side faces the opposite side to the polarizer. [3] A front panel for an image display device, comprising an anti-glare anti-reflection member bonded to a resin plate or a glass plate, the anti-glare anti-reflection member being the anti-glare anti-reflection member described in [1] above, and the anti-glare anti-reflection member being arranged so that the surface on the low refractive index layer side faces away from the resin plate or the glass plate. [4] An image display device comprising the anti-glare anti-reflection member according to [1] above, arranged on a display element with the low refractive index layer side facing away from the display element, and the anti-glare anti-reflection member arranged on a surface. [5] A method for selecting an antiglare and antireflection member, comprising the following steps (1) and (2): (1) A step of measuring the film thickness difference Δd of the low refractive index layer within any 2 mm×2 mm area of ​​an antiglare and antireflection member having an antiglare layer and a low refractive index layer on a substrate, and calculating the average Δd. (2) A step of selecting, as an antiglare and antireflection member, those which satisfy the judgment criterion that the average Δd is 7.0 nm or more and 40.0 nm or less. Effect of the Invention

[0010] The antiglare antireflection member of the present disclosure, and the polarizing plate, front plate, and image display device including the same can suppress coloring when viewed from an oblique direction, and can further suppress bright spots from being locally visible. Furthermore, the selection method for antiglare antireflection members of the present disclosure can stably select antiglare antireflection members that can suppress coloring when viewed from an oblique direction, and can further suppress bright spots from being locally visible. [Brief description of the drawings]

[0011] [Figure 1] 1 is a cross-sectional view illustrating an embodiment of an antiglare antireflection member according to the present disclosure. [Diagram 2] 5A to 5C are diagrams for explaining a process in which a difference in thickness of a low refractive index layer occurs. [Diagram 3] FIG. 13 is a diagram for explaining measurement points of a height profile when calculating Δd. [Figure 4] FIG. 2 is a schematic cross-sectional view of a measuring device for the erosion rate of a substrate. [Diagram 5] FIG. 1 is an image diagram showing a state in which a substrate is abraded by a test liquid containing pure water and spherical silica sprayed from a spray part. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0012] The antiglare and antireflection member of the present disclosure will be described in detail below. In this specification, the expression "AA to BB" as a numerical range means "not less than AA and not more than BB."

[0013] [Anti-glare and anti-reflective materials] The antiglare antireflection member of the present disclosure is an antiglare antireflection member having an antiglare layer and a low refractive index layer on a substrate, and when the difference in film thickness of the low refractive index layer within any 2 mm x 2 mm area of ​​the antiglare antireflection member is defined as Δd, the average Δd is 7.0 nm or more and 40.0 nm or less.

[0014] Fig. 1 is a cross-sectional view for explaining an embodiment of an antiglare antireflection member according to the present disclosure. The antiglare antireflection member 1000 in Fig. 1 has an antiglare layer 200 and a low refractive index layer 300, in this order, on a substrate 100. The antiglare layer 200 has a binder resin 210 and particles 220.

[0015] In the antiglare and antireflection member of Fig. 1, the film thickness of the low refractive index layer 300 is not uniform. Specifically, the film thickness of the low refractive index layer on the convex portions of the antiglare layer 200 is thin, whereas the film thickness of the low refractive index layer on the flat portions of the antiglare layer 200 is thick. That is, the low refractive index layer of Fig. 1 has a predetermined film thickness difference Δd.

[0016] It is believed that the difference in thickness Δd of the low refractive index layer occurs in the process of FIGS. 2(a) to 2(c). 2(a), when the coating liquid for the low refractive index layer is applied onto the antiglare layer 200, the wet film thickness of the low refractive index layer on the convex portions of the antiglare layer 200 and the wet film thickness of the low refractive index layer on the flat portions of the antiglare layer 200 are uniform. In this state, Δd is approximately 0. The wet film thickness is the film thickness in a state in which the solvent, which is a component other than the solid content, is included. 2(b), of the coating liquid for low refractive index layer applied onto antiglare layer 200, a part of the coating liquid for low refractive index layer present on the convex parts of antiglare layer 200 flows down to the flat parts of antiglare layer 200 before and during drying. As a result, the wet film thickness of the low refractive index layer on the convex parts of antiglare layer 200 becomes thinner than the wet film thickness of the low refractive index layer on the flat parts of antiglare layer 200. Next, from the state of Fig. 2(b), the coating liquid for the low refractive index layer is dried, and the binder resin is cured as necessary to form a low refractive index layer, resulting in the state of Fig. 2(c). In Fig. 2(c), the dry film thickness of the low refractive index layer on the convex parts of the antiglare layer 200 is thinner than the dry film thickness of the low refractive index layer on the flat parts of the antiglare layer 200. In this way, the film thickness difference Δd of the low refractive index layer is formed. In this specification, the film thickness difference Δd of the low refractive index layer means the film thickness difference of the low refractive index layer when the antiglare antireflection member is completed. For example, when the low refractive index layer is formed by the wet method as described above, the film thickness difference of the low refractive index layer in the completed state of the antiglare antireflection member in which the coating liquid for the low refractive index layer is dried and further cured as necessary is Δd.

[0017] The thickness difference Δd of the low refractive index layer can be adjusted by the surface shape of the antiglare layer and the leveling property of the low refractive index layer. There are several means for making it easier to bring the average Δd into the range of the present disclosure. These means will be described later.

[0018] <Base material> The substrate serves as a support for the antiglare layer and the low refractive index layer. The substrate is preferably one having high light transmittance, specifically, the substrate is preferably one having a total light transmittance of 90% or more according to JIS K7361-1:1997. The substrate preferably has a low haze. Specifically, the substrate preferably has a haze of 3.0% or less, more preferably 2.0% or less, according to JIS K7136:2000.

[0019] Examples of the substrate include plastic and glass. The substrate is preferably made of plastic because it is lightweight and easy to manufacture. Hereinafter, the plastic substrate may be referred to as a plastic film. The glass plate as the substrate includes so-called "Ultra Thin Glass." Ultra Thin Glass is sold by, for example, Samsung Electronics and Nippon Electric Glass Co., Ltd.

[0020] The plastic film can be formed from one or more resins selected from various resins such as polyolefin resins such as polyethylene and polypropylene, vinyl resins such as polyvinyl chloride, polyvinylidene chloride, polyvinyl alcohol, ethylene-vinyl acetate copolymer, and ethylene-vinyl alcohol copolymer, polyester resins such as polyethylene terephthalate, polyethylene naphthalate, and polybutylene terephthalate, acrylic resins such as polymethyl (meth)acrylate and polyethyl (meth)acrylate, styrene resins such as polystyrene, polyamide resins such as nylon 6 or nylon 66, cellulose resins such as triacetyl cellulose, polycarbonate resins, polyimide resins, polyamideimide resins, aramid resins, and cycloolefin resins obtained from cycloolefins such as norbornene and dicyclopentadiene. The plastic film is preferably a stretched plastic film, more preferably a biaxially stretched plastic film, in order to improve mechanical strength. Among plastic films, polyester films are preferred, and among these, biaxially oriented polyester films having good mechanical strength are preferred, and among these, biaxially oriented polyethylene terephthalate films are preferred. In order to suppress optical anisotropy, the plastic film such as the biaxially stretched polyester film preferably has an in-plane retardation of 1600 nm or less, more preferably 1400 nm or less, more preferably 1200 nm or less, and even more preferably 1000 nm or less. The in-plane retardation is expressed by the following formula (1), where nx is the refractive index in the slow axis direction, which is the direction in which the refractive index of the plastic film is greatest, ny is the refractive index in the fast axis direction, which is the direction perpendicular to the slow axis direction, and T [nm] is the thickness of the plastic film. In-plane phase difference (Re)=(nx-ny)×T[nm] (1) The in-plane retardation of 1600 nm or less means that the difference between nx and ny is small. By reducing the difference between nx and ny, the difference in reflectance between the slow axis direction and the fast axis direction of the plastic film can be reduced, so that the deterioration of appearance depending on the observation direction can be more easily suppressed. The appearance can include bright spots and whitening.

[0021] In addition, in order to reduce the in-plane retardation of a plastic film such as a biaxially stretched polyester film, nx-ny is preferably 0.040 or less, more preferably 0.035 or less, and even more preferably 0.030 or less. As a method for making nx-ny of a biaxially stretched polyester film within the above range, for example, a method of stretching the film in the longitudinal direction and the transverse direction at approximately the same magnification can be mentioned.

[0022] The thickness of the plastic film is preferably 5 μm or more, more preferably 20 μm or more, and even more preferably 30 μm or more in order to suppress warping. Also, the thickness of the plastic film is preferably 300 μm or less, more preferably 200 μm or less, even more preferably 150 μm or less, and even more preferably 90 μm or less in order to reduce the thickness. The plastic film may be a plate-like film having a thickness of more than 500 μm. In addition, when flexibility is required, such as for foldable applications, the thickness of the plastic film is preferably 10 μm to 40 μm. In addition, when glass is used in the component to which the antiglare antireflection member is attached, the thickness of the plastic film is preferably 40 μm to 100 μm to prevent the glass from scattering. The thickness of the glass substrate is preferably 5 μm or more, more preferably 10 μm or more, and even more preferably 30 μm or more in order to improve strength. Also, the thickness of the glass substrate is preferably 300 μm or less, more preferably 200 μm or less, even more preferably 150 μm or less, and even more preferably 90 μm or less in order to reduce the thickness. When flexibility is required, such as for foldable applications, the thickness of the glass substrate is preferably 10 μm or more and 40 μm or less, and more preferably 20 μm or more and 40 μm or less.

[0023] In order to improve the mechanical strength of the substrate, the tensile modulus is preferably 3.5 GPa or more, more preferably 4.0 GPa or more. The upper limit of the tensile modulus of the substrate is not particularly limited, but is preferably 5.5 GPa or less, more preferably 4.5 GPa or less. In this specification, the tensile modulus of the substrate refers to the tensile modulus of JIS K 7127: 1999. The measurement sample for the tensile modulus is 150 mm long and 10 mm wide. The pulling speed is 50 mm / min, and the chuck distance is 100 mm. Preferred ranges for the tensile modulus of the substrate include 3.5 GPa or more and 5.5 GPa or less, 3.5 GPa or more and 4.5 GPa or less, 4.0 GPa or more and 5.5 GPa or less, and 4.0 GPa or more and 4.5 GPa or less.

[0024] The base material has a water vapor permeability of 200 g / m2 or higher to suppress deformation of components inside the image display device. 2 / day or less, and 100 g / m 2 The lower limit of the water vapor permeability of the substrate is not particularly limited, but is preferably 5 g / m 2 / day or more is preferable, and 10g / m 2 / day or more is more preferable. In this specification, the water vapor permeability means the water vapor permeability according to JIS K7129-2:2019. The temperature and relative humidity conditions when measuring the water vapor permeability are 40°C and 90%. In addition, before measuring the water vapor permeability, the measurement sample is exposed to an atmosphere with a temperature of 23°C ± 5°C and a relative humidity of 40% to 65% for 30 minutes or more. The water vapor permeability can be measured, for example, by a water vapor permeability measuring device manufactured by MOCON (product name: PERMATRAN). The preferred range of water vapor permeability of the substrate is 5 g / m 2 / day or more 200g / m 2 / day or less, 5g / m 2 / day or more 100g / m 2 / day or less, 10g / m 2 / day or more 200g / m 2 / day or less, 10g / m 2 / day or more 100g / m 2 / day etc.

[0025] <Erosion rate> The average erosion rate of the plastic film substrate from the surface to a depth of 20 μm is defined as E 0-20 When we define E 0-20 It is preferable that the surface roughness is 1.4 μm / g or more.

[0026] In this specification, E 0-20 is measured under the following measurement conditions. <Measurement conditions> A test liquid obtained by mixing pure water, a dispersion liquid, and spherical silica having an average particle size of 4.2 μm within ±8% at a mass ratio of 968:2:30 is stored in a container. The test liquid in the container is sent to a nozzle. Compressed air is sent into the nozzle to accelerate the test liquid in the nozzle, and a predetermined amount of the test liquid is sprayed perpendicularly to the plastic film from the injection hole at the tip of the nozzle, causing the spherical silica in the test liquid to collide with the plastic film. The cross-sectional shape of the nozzle is a square of 1 mm x 1 mm, and the distance between the injection hole and the plastic film is 4 mm. In addition, the flow rate of the test liquid and the compressed air supplied to the nozzle, the pressure of the compressed air, and the pressure of the test liquid in the nozzle are predetermined values ​​adjusted by calibration described later. After a predetermined amount of the test liquid has been sprayed, the spraying of the test liquid is temporarily stopped. After the spraying of the test liquid is temporarily stopped, a cross-sectional profile is measured at the point on the plastic film where the spherical silica in the test liquid collided. The operation of three steps, which constitute one cycle, namely, a step of spraying a predetermined amount of the test liquid from the spray nozzle, a step of temporarily stopping the spraying of the test liquid after spraying the predetermined amount of the test liquid, and a step of measuring the cross-sectional profile after temporarily stopping the spraying of the test liquid, is carried out until the depth of the cross-sectional profile exceeds 20 μm. Then, in each cycle until the depth of the cross-sectional profile reaches 20 μm, the erosion rate (μm / g) of the plastic film is calculated by dividing the depth (μm) of the cross-sectional profile progressed in each cycle by the amount (g) of the test liquid sprayed in each cycle. The erosion rates of the plastic film in each cycle until the depth of the cross-sectional profile reaches 20 μm are averaged to obtain the E 0-20 Calculate.

[0027] <Calibration> The test liquid is placed in the container. The test liquid in the container is sent to the nozzle. Compressed air is sent into the nozzle to accelerate the test liquid in the nozzle, and an arbitrary amount of the test liquid is sprayed perpendicularly from the nozzle hole at the tip of the nozzle onto an acrylic plate with a thickness of 2 mm, causing the spherical silica in the test liquid to collide with the acrylic plate. The cross-sectional shape of the nozzle is a square of 1 mm x 1 mm, and the distance between the nozzle hole and the acrylic plate is 4 mm. After a given amount of the test liquid is sprayed, the spraying of the test liquid is stopped temporarily. After the spraying of the test liquid is stopped temporarily, a cross-sectional profile is measured at the point on the acrylic plate where the spherical silica in the test liquid collided. The erosion rate (μm / g) of the acrylic plate is calculated by dividing the depth (μm) of the cross-sectional profile by the arbitrary amount (g) mentioned above. The erosion rate of the acrylic plate is set to a pass condition of within ±5% of the standard value of 1.88 (μm / g), and the flow rates of the test liquid and the compressed air, the pressure of the compressed air, and the pressure of the test liquid in the nozzle are adjusted and calibrated so that the erosion rate of the acrylic plate is within this range.

[0028] The measurement conditions for the erosion rate and the technical significance of the erosion rate calculated under the above measurement conditions will be explained below with reference to Fig. 4. An example of an erosion rate measuring device as shown in Fig. 4 is the MSE test device manufactured by Palmeso Co., Ltd., product number "MSE-A203".

[0029] In the measurement conditions for the erosion rate of the present disclosure, first, a test liquid obtained by mixing pure water, a dispersant, and spherical silica having an average particle size of 4.2 μm within ±8% at a mass ratio of 968:2:30 is placed in a container (11). It is preferable to stir the test liquid in the container (11). The pure water may be any general-purpose pure water, which generally has a resistivity of 0.1 MΩ·cm or more and 15 MΩ·cm or less. The dispersant is not particularly limited as long as it can disperse spherical silica. An example of the dispersant is "Demol N" manufactured by Wako Pure Chemical Industries, Ltd. "The average particle size is within ±8% of 4.2 μm as the standard" means, in other words, that the average particle size is 3.864 μm or more and 4.536 μm or less. In addition, in the measurement conditions of the erosion rate in this specification, the "average particle size of spherical silica" is measured as the volume average value d50 in particle size distribution measurement by laser light diffraction method, and means the so-called "median size". In the particle size distribution measurement, the spherical silica preferably has a particle size width with a frequency of 50 within ±10% of 4.2 μm when the frequency of the particle size with the maximum frequency is normalized to 100. The "particle size width with a frequency of 50" is expressed as "XY (μm)" when "X is a particle size with a frequency of 50 and located in the positive direction of the particle size with a frequency of 100" and "Y is a particle size with a frequency of 50 and located in the negative direction of the particle size with a frequency of 100". In this specification, the "particle size width with a frequency of 50" may be referred to as the "full width at half maximum of the particle size distribution".

[0030] An example of spherical silica having an average particle size within ±8% of 4.2 μm is model number "MSE-BS-5-3" specified by Palmeso Co., Ltd. An example of spherical silica corresponding to model number "MSE-BS-5-3" specified by Palmeso Co., Ltd. is product number "BS5-3" of Potters-Ballotini Co., Ltd.

[0031] The test liquid in the container is sent to the nozzle (51). The test liquid can be sent to the nozzle, for example, through a test liquid pipe (21). A flow meter (31) for measuring the flow rate of the test liquid is preferably disposed between the container (11) and the nozzle (51). The flow rate of the test liquid is the value adjusted by the above calibration. In FIG. 4, the nozzle (51) is disposed in a housing (52) that constitutes the ejection part (50).

[0032] Compressed air is fed into the nozzle (51). The compressed air is fed to the nozzle, for example, through a compressed air pipe (22). In the nozzle, the position to which the compressed air is fed is preferably upstream of the position to which the test liquid is fed. The upstream side refers to the side farther from the nozzle injection hole. It is preferable that a flow meter (32) for measuring the flow rate of the compressed air and a pressure meter (42) for measuring the pressure of the compressed air are disposed before the compressed air reaches the nozzle (51). The compressed air can be supplied by an air compressor (not shown) or the like. The flow rate and pressure of the compressed air are adjusted by the above calibration.

[0033] When compressed air is sent into the nozzle (51), the test liquid is accelerated while being mixed by the compressed air. The accelerated test liquid is then sprayed from the nozzle hole at the tip of the nozzle (51) and collides perpendicularly against the plastic film (70). The plastic film is abraded mainly by the spherical silica particles in the test liquid. A pressure gauge (41) for measuring the pressure of the test liquid in the nozzle is preferably disposed in the nozzle (51). The pressure gauge (41) is preferably located downstream of the position where the compressed air is fed and the position where the test liquid is fed. The pressure of the test liquid in the nozzle (51) is adjusted by the above calibration.

[0034] The test liquid sprayed from the spray hole at the tip of the nozzle (51) is mixed with air and sprayed in the form of a mist. This makes it possible to reduce the impact pressure of the spherical silica particles against the plastic film. This makes it possible to minimize the amount of wear on the plastic film caused by a single spherical silica particle. FIG. 5 is an image of the state in which the plastic film (70) is abraded by the test liquid containing pure water (A1) and spherical silica (A2) sprayed from the spray section (50). In FIG. 5, the symbol A3 indicates air, and the symbol A4 indicates the abraded plastic film. In addition, since the test liquid contains water, which has excellent cooling effect, deformation and deterioration of the plastic film caused by heat during collision can be substantially eliminated. That is, abnormal wear of the plastic film can be substantially eliminated. Water also plays a role in cleaning the surface of the worn plastic film and realizing stable wear. Water also plays a role in accelerating the spherical silica particles and controlling the fluid of the test liquid. In addition, because a huge number of spherical silica particles collide with the plastic film, the effects of subtle differences in the physical properties of individual spherical silica particles can be eliminated. Furthermore, the measurement conditions disclosed herein are the flow rate of the test liquid supplied to the nozzle, the flow rate of the compressed air supplied to the nozzle, the pressure of the compressed air supplied to the nozzle, and the pressure of the test liquid in the nozzle, adjusted by the above calibration, and the cross-sectional shape of the nozzle is specified to be a 1 mm x 1 mm square, and the distance between the injection hole and the plastic film is specified to be 4 mm, thereby specifying the factors that affect the amount of wear of the plastic film. Note that the above distance is the distance indicated by "d" in Figure 4, and means the vertical distance between the injection hole at the tip of the nozzle and the plastic film. From the above, it can be said that the measurement conditions disclosed herein are measurement conditions that can form statistically stable wear marks on a plastic film.

[0035] The plastic film (70) may be attached to a sample mounting stage (81) of the measuring device (500). It is preferable to prepare a laminate by laminating the plastic film to a support (82) such as a stainless steel plate, and then attach the laminate to the sample mounting stage (81).

[0036] The test liquid sprayed onto the plastic film (70) is preferably collected in a receiver (12) and returned to the container (11) through a return pipe (23).

[0037] The measurement conditions disclosed herein require that after a predetermined amount of test liquid has been sprayed, spraying of the test liquid is stopped temporarily, and that after spraying of the test liquid is stopped temporarily, the cross-sectional profile of the point on the plastic film where the spherical silica in the test liquid collided is measured. The cross-sectional profile refers to the cross-sectional shape of the plastic film abraded by the test liquid. The plastic film is abraded mainly by the spherical silica particles in the test liquid. The cross-sectional profile can be measured by a cross-sectional profile acquisition unit (60) such as a stylus-type surface profile measurement device or a laser interference-type surface profile measurement device. The cross-sectional profile acquisition unit (60) is usually disposed at a position away from the plastic film (70) when the test liquid is sprayed. For this reason, it is preferable that at least one of the plastic film (70) and the cross-sectional profile acquisition unit (60) is movable. The MSE tester model number "MSE-A203" from Palmeso Co., Ltd. uses a stylus to measure cross-sectional profiles.

[0038] Furthermore, under the measurement conditions disclosed herein, one cycle of three steps, namely, a step of spraying a predetermined amount of test liquid from an injection port, a step of temporarily stopping the spraying of the test liquid after spraying the predetermined amount of test liquid, and a step of temporarily stopping the spraying of the test liquid and then measuring the cross-sectional profile, is performed until the depth of the cross-sectional profile exceeds 20 μm. By carrying out the above operations, the erosion rate of the plastic film in each cycle can be measured, and further, the variation in the erosion rate of the plastic film can be calculated. The above cycle may be continued even after the depth of the cross-sectional profile exceeds 20 μm, but is preferably terminated when the depth of the cross-sectional profile exceeds 20 μm. The reason for the measurement being "from the surface of the plastic film to a depth of 20 μm" is that the physical properties of a plastic film tend to be more stable toward the inside, while being more variable near the surface.

[0039] In this specification, the erosion rate of each cycle can be expressed by the following [Formula 1]. Erosion rate in each cycle (μm / g) = Depth of cross-sectional profile progressed in each cycle (μm) / Amount of test liquid sprayed in each cycle (g) [Equation 1]

[0040] In formula 1, "depth (μm) of the cross-sectional profile progressed in each cycle" means a value represented by "yx" when the depth of the cross-sectional profile in the nth cycle is defined as x (μm) and the depth of the cross-sectional profile in the (n+1)th cycle is defined as y (μm). For the first cycle, the depth (μm) of the cross-sectional profile in the first cycle corresponds to "depth (μm) of the cross-sectional profile progressed in each cycle." In this specification, the depth of the cross-sectional profile in the nth cycle means the depth of the deepest position of the cross-sectional profile in the nth cycle, where n is an integer of 1 or more.

[0041] In formula 1, the "amount of test liquid sprayed in each cycle (g)" is, in principle, a "fixed amount," but slight variations from cycle to cycle are acceptable. The amount of test liquid sprayed in each cycle is not particularly limited, but the lower limit is preferably 0.5 g or more, more preferably 1.0 g or more, and the upper limit is preferably 3.0 g or less, more preferably 2.0 g or less.

[0042] Under the measurement conditions of the present disclosure, the erosion rate (μm / g) is calculated for each cycle up to a cross-sectional profile depth of 20 μm. The erosion rates for each cycle up to a cross-sectional profile depth of 20 μm are then averaged to obtain E 0-20 Calculate. The above cycles are carried out until the depth of the cross-sectional profile exceeds 20 μm. The data for the cycles in which the depth of the cross-sectional profile exceeds 20 μm is 0-20 This will result in the data being excluded from the calculation.

[0043] Generally, the softer the plastic film, the more easily it is scratched, and the harder the film, the less likely it is to be scratched. The present inventors have considered using values ​​obtained by evaluation including the depth direction using a pico-denter, such as Martens hardness, indentation hardness, and elastic recovery work load, as indicators of pencil hardness. However, the above-mentioned parameters such as Martens hardness, indentation hardness, and elastic recovery work load could not be used as indicators of pencil hardness. In addition, the strength of plastic films tends to increase when they are stretched. Specifically, uniaxially stretched plastic films tend to have better pencil hardness than unstretched plastic films, and biaxially stretched plastic films tend to have better pencil hardness than uniaxially stretched plastic films. However, even biaxially stretched plastic films sometimes have insufficient pencil hardness. The present inventors have investigated the erosion rate as an index of the pencil hardness of a plastic film. As described above, a softer plastic film is more easily scratched, and a harder plastic film is less easily scratched, so it would seem that a smaller erosion rate would lead to a better pencil hardness. However, the present inventors have found that the erosion rate E 0-20 The inventors have found that the pencil hardness of a plastic film can be improved by increasing the erosion ratio to 1.4 μm / g or more. The inventors have also found that the erosion ratio of a plastic film is greater in a biaxially oriented plastic film than in a uniaxially oriented plastic film, and that the pencil hardness of a biaxially oriented plastic film can be determined by the erosion ratio.

[0044] The reason why the erosion rate of a plastic film correlates with the pencil hardness is believed to be as follows. As described above, in the measurement conditions of the present disclosure, the test liquid containing water and spherical silica is mixed with air and sprayed in the form of mist.Therefore, the impact pressure of spherical silica particles against plastic film is kept low.Therefore, when the plastic film is soft, the stress when spherical silica collides with the plastic film is easily dispersed, so the plastic film is less likely to be worn, and the erosion rate is considered to be low.On the other hand, when the plastic film is hard, the stress when spherical silica collides with the plastic film is not easily dispersed, so the plastic film is easily worn, and the erosion rate is considered to be high. In addition, the difference in the erosion rate in the biaxially stretched plastic film is considered to be caused by the difference in the degree of stretching of the molecular chain and the difference in the degree of molecular orientation. For example, in the biaxially stretched plastic film, the molecules are stretched in the plane in principle, but there may be molecules that are not sufficiently stretched locally in the plane. In this way, if the proportion of molecules that are not sufficiently stretched locally in the plane increases, the biaxially stretched plastic film becomes locally soft and the erosion rate is considered to decrease. In addition, even if the biaxially stretched plastic film has the same in-plane retardation, it is considered to show different erosion rates due to the difference in the local molecular orientation.

[0045] Plastic film E 0-20 In order to obtain a good pencil hardness, the surface roughness is preferably 1.4 μm / g or more. E 0-20 is preferably 1.6 μm / g or more, more preferably 1.8 μm / g or more, even more preferably 1.9 μm / g or more, and even more preferably 2.0 μm / g or more. E 0-20In order to make the plastic film less likely to crack, the surface roughness is preferably 3.0 μm / g or less, more preferably 2.5 μm / g or less, and even more preferably 2.2 μm / g or less. E 0-20 Preferred numerical ranges of the embodiment are, for example, 1.4 μm / g or more and 3.0 μm / g or less, 1.4 μm / g or more and 2.5 μm / g or less, 1.4 μm / g or more and 2.2 μm / g or less, 1.6 μm / g or more and 3.0 μm / g or less, 1.6 μm / g or more and 2.5 μm / g or less, 1.6 μm / g or more and 2.2 μm / g or less, 1.8 μm / g or more and 3.0 μm / g or less, 1. Examples of the polymerizable compound include 8 μm / g or more and 2.5 μm / g or less, 1.8 μm / g or more and 2.2 μm / g or less, 1.9 μm / g or more and 3.0 μm / g or less, 1.9 μm / g or more and 2.5 μm / g or less, 1.9 μm / g or more and 2.2 μm / g or less, 2.0 μm / g or more and 3.0 μm / g or less, 2.0 μm / g or more and 2.5 μm / g or less, and 2.0 μm / g or more and 2.2 μm / g or less.

[0046] In addition, by setting the erosion rate of the plastic film within the above range, when stress is applied to the antiglare antireflection member of the present disclosure, the stress applied to the low refractive index layer is easily alleviated. Therefore, by setting the erosion rate of the plastic film within the above range, it is possible to easily suppress the cracking of the outer shell layer of the hollow particles in the low refractive index layer. Since the antiglare antireflection member of the present disclosure has a predetermined film thickness difference in the low refractive index layer, the relationship of "density of hollow particles per unit area of ​​the low refractive index layer on the convex part of the antiglare layer < density of hollow particles per unit area of ​​the low refractive index layer on the flat part of the antiglare layer" is likely to be satisfied. Therefore, setting the erosion rate of the plastic film within the above range is preferable in terms of suppressing the cracking of the outer shell of the hollow particles in the low refractive index layer on the flat part of the antiglare layer. Examples of cases where stress is applied to an antiglare antireflection member include cases where the antiglare antireflection member is curved or folded. For example, when an antiglare antireflection member is applied to a curved image display device or a foldable image display device, the antiglare antireflection member may be curved or folded. As described above, by setting the erosion rate of the plastic film within the above range and suppressing cracking of the outer shell layer of the hollow particles in the low refractive index layer, coloring when viewed from an oblique direction can be further suppressed, and further, it is possible to more easily suppress the visibility of localized bright spots.

[0047] Before measuring the above-mentioned erosion rate, the above-mentioned calibration is carried out. For example, the calibration can be performed as follows.

[0048] <Calibration> The test liquid is placed in the container. The test liquid in the container is sent to the nozzle. Compressed air is sent into the nozzle to accelerate the test liquid in the nozzle, and an arbitrary amount of the test liquid is sprayed perpendicularly from the nozzle hole at the tip of the nozzle onto an acrylic plate with a thickness of 2 mm, causing the spherical silica in the test liquid to collide with the acrylic plate. The cross-sectional shape of the nozzle is a square of 1 mm x 1 mm, and the distance between the nozzle hole and the acrylic plate is 4 mm. After a given amount of the test liquid is sprayed, the spraying of the test liquid is stopped temporarily. After the spraying of the test liquid is stopped temporarily, a cross-sectional profile is measured at the point on the acrylic plate where the spherical silica in the test liquid collided. The erosion rate (μm / g) of the acrylic plate is calculated by dividing the depth (μm) of the cross-sectional profile by the arbitrary amount (g) mentioned above. The erosion rate of the acrylic plate is set to a pass condition of within ±5% of the standard value of 1.88 (μm / g), and the flow rates of the test liquid and the compressed air, the pressure of the compressed air, and the pressure of the test liquid in the nozzle are adjusted and calibrated so that the erosion rate of the acrylic plate is within this range.

[0049] The test liquid used for calibration shall be the same as the test liquid used under the measurement conditions to be carried out later. In addition, the measuring device used for the calibration shall be the same as the test liquid used in the measurement conditions to be carried out later. The difference between the calibration and the measurement conditions to be carried out later is, for example, that the calibration uses a 2 mm thick acrylic plate as a standard sample, whereas the measurement conditions use a plastic film as the sample.

[0050] The 2 mm thick acrylic plate serving as the standard sample is preferably a polymethyl methacrylate plate. In addition, when the average erosion rate of the acrylic plate measured under the following measurement condition A is defined as AcE, the 2 mm thick acrylic plate serving as the standard sample is preferably one having AcE of 1.786 μm / g or more and 1.974 μm / g or less. In addition, an example of the spherical silica under the following measurement condition A is the model number "MSE-BS-5-3" designated by Palmeso Co., Ltd. An example of the spherical silica corresponding to the model number "MSE-BS-5-3" designated by Palmeso Co., Ltd. is the product number "BS5-3" of Potters-Ballotini Co., Ltd. <Measurement condition A> A test liquid obtained by mixing pure water, a dispersant, and spherical silica with an average particle size of 4.2 μm within ±8% at a mass ratio of 968:2:30 is placed in a container. The test liquid in the container is sent to a nozzle. Compressed air is sent into the nozzle to accelerate the test liquid in the nozzle, and a predetermined amount of the test liquid is sprayed perpendicularly to the acrylic plate from the injection hole at the tip of the nozzle, causing the spherical silica in the test liquid to collide with the acrylic plate. The cross-sectional shape of the nozzle is a square of 1 mm x 1 mm, and the distance between the injection hole and the acrylic plate is 4 mm. In addition, the flow rates of the test liquid and the compressed air supplied to the nozzle, the pressure of the compressed air, and the pressure of the test liquid in the nozzle are as follows: flow rate of test liquid is 100 ml / min or more and 150 ml / min or less, flow rate of compressed air is 4.96 L / min or more and 7.44 L / min or less, pressure of compressed air is 0.184 MPa or more and 0.277 MPa or less, and pressure of test liquid in the nozzle is 0.169 MPa or more and 0.254 MPa or less. After 4 g of the test liquid was sprayed, the spraying of the test liquid was temporarily stopped. After the spraying of the test liquid is temporarily stopped, a cross-sectional profile is measured at the point on the acrylic plate where the spherical silica in the test liquid collided. Then, the erosion rate AcE of the acrylic plate is calculated by dividing the depth (μm) of the cross-sectional profile by the amount of the test liquid sprayed, 4 g. The unit of AcE is “μm / g”.

[0051] In the calibration, the erosion rate of the acrylic plate is set to be within a range of ±5% of the standard value of 1.88 (μm / g), and the flow rates of the test liquid and the compressed air, the pressure of the compressed air, and the pressure of the test liquid in the nozzle are adjusted so that the erosion rate of the acrylic plate is within this range. In addition, "the erosion rate is ±5% with 1.88 (μm / g) as the standard" means, in other words, that the erosion rate is 1.786 (μm / g) or more and 1.974 (μm / g) or less.

[0052] <σ 0-20 / E 0-20 > The plastic film is calculated from the erosion rate from the surface of the plastic film to a depth of 20 μm, and the variation in the erosion rate is σ 0-20 When we define 0-20 / E 0-20 It is preferable that the ratio is 0.100 or less. In this specification, σ 0-20 can be calculated from the erosion rate of each cycle up to a depth of 20 μm in the cross-sectional profile under the above measurement conditions.

[0053] σ 0-20 / E 0-20 indicates the coefficient of variation of the erosion rate, and σ 0-20 / E 0-20 A small value of σ means that the erosion rate is less likely to vary in the thickness direction of the plastic film. 0-20 / E 0-20 By making the ratio 0.100 or less, the erosion rate in the thickness direction is stabilized, and it is easier to obtain a good pencil hardness. Furthermore, if there are areas of locally weak strength in the plastic film, when stress is applied to the antiglare antireflection member, physical changes such as deformation are likely to occur due to the weak areas. As a result, scratches and cracks may occur in the low refractive index layer. 0-20 / E 0-20 Setting the ratio to 0.100 or less is preferable in that defects caused by areas with locally weak strength can be easily suppressed.

[0054] σ 0-20 / E 0-20 The upper limit is more preferably 0.080 or less, even more preferably 0.070 or less, even more preferably 0.060 or less, and even more preferably 0.055 or less. σ 0-20 / E 0-20 The smaller the value of σ, the more homogeneous the film quality in the thickness direction of the plastic film. When the film quality in the thickness direction of the plastic film is homogeneous, stress tends to propagate more easily in the thickness direction. For this reason, σ 0-20 / E 0-20 is preferably 0.020 or more, and more preferably 0.035 or more.

[0055] σ 0-20 / E 0-20 Preferred embodiments of the numerical range include, for example, 0.020 or more and 0.100 or less, 0.020 or more and 0.080 or less, 0.020 or more and 0.070 or less, 0.020 or more and 0.060 or less, 0.020 or more and 0.055 or less, 0.035 or more and 0.100 or less, 0.035 or more and 0.080 or less, 0.035 or more and 0.070 or less, 0.035 or more and 0.060 or less, and 0.035 or more and 0.055 or less.

[0056] In order to set the erosion rate of the plastic film within the above range, it is preferable to stretch the molecules uniformly within the plane of the plastic film. The plastic film can be produced, for example, by general-purpose sequential biaxial stretching. In sequential biaxial stretching in the machine direction, the erosion rate tends to decrease when the stretching time is shortened, and to increase when the stretching time is lengthened. This is thought to be because, when the stretching time is short, the molecules are not easily stretched uniformly within the plane of the plastic film, whereas, when the stretching time is long, the molecules are easily stretched uniformly within the plane of the plastic film. That is, E 0-20 In order to make the stretching time 1.4 μm / g or more, it is preferable to extend the stretching time. Furthermore, by lengthening the stretching time while appropriately increasing the stretching ratio so that the physical properties do not vary, it is possible to further increase the E 0-20 It is possible to easily achieve a particle size of 1.4 μm / g or more.

[0057] The substrate may be one that has been subjected to a general-purpose chemical treatment and a general-purpose physical treatment for the purpose of improving adhesion to the antiglare layer, etc. Furthermore, a primer layer may be formed between the substrate and the antiglare layer for the purpose of improving adhesion, etc.

[0058] <Anti-glare layer> The antiglare layer is a layer having an uneven surface. The antiglare layer can be formed, for example, by (A) a method using an embossing roll or an embossing film, (B) an etching treatment, (C) molding with a mold, (D) formation of a coating film by coating, etc. Among these methods, when emphasis is placed on obtaining a stable surface shape, (C) molding with a mold is preferred, and when emphasis is placed on productivity and compatibility with a wide variety of products, (D) formation of a coating film by coating is preferred.

[0059] The antiglare layer may be formed only from a resin, but preferably contains a binder resin and particles.

[0060] <Binder resin> The binder resin preferably contains a cured product of a curable resin composition. Examples of the cured product of the curable resin composition include a cured product of a heat-curable resin composition and a cured product of an ionizing radiation-curable resin composition, and the cured product of the ionizing radiation-curable resin composition is preferred in order to improve mechanical strength.

[0061] The thermosetting resin composition is a composition that contains at least a thermosetting resin, and is a resin composition that is cured by heating. Examples of the thermosetting resin include acrylic resin, urethane resin, phenol resin, urea melamine resin, epoxy resin, unsaturated polyester resin, silicone resin, etc. In the thermosetting resin composition, a curing agent is added to the curable resin as required.

[0062] The ionizing radiation curable resin composition is a composition containing a compound having an ionizing radiation curable functional group. In this specification, the "compound having an ionizing radiation curable functional group" is also referred to as the "ionizing radiation curable compound." Ionizing radiation refers to electromagnetic waves or charged particle beams that have an energy quantum capable of polymerizing or crosslinking molecules. Usually, ultraviolet rays or electron beams are used, but other types of radiation, such as electromagnetic waves such as X-rays and gamma rays, and charged particle beams such as alpha rays and ion beams, can also be used.

[0063] Examples of the ionizing radiation curable functional group include ethylenically unsaturated bond groups such as (meth)acryloyl group, vinyl group, allyl group, etc., as well as epoxy group, oxetanyl group, etc. As the ionizing radiation curable compound, a compound having an ethylenically unsaturated bond group is preferred, a compound having two or more ethylenically unsaturated bond groups is more preferred, and among these, a polyfunctional (meth)acrylate compound having two or more ethylenically unsaturated bond groups is even more preferred.

[0064] As the polyfunctional (meth)acrylate compound, either a monomer or an oligomer can be used, but an oligomer is preferred. That is, the antiglare layer preferably contains a cured product of a polyfunctional (meth)acrylate oligomer. The cured product of the polyfunctional (meth)acrylate oligomer can improve the surface hardness of the antiglare antireflection member, while suppressing excessive curing shrinkage of the antiglare layer, and can suppress the elevation difference of the unevenness of the antiglare layer from becoming excessive. Therefore, by including a cured product of a polyfunctional (meth)acrylate oligomer in the antiglare layer, the average Δd can be easily set to 40.0 nm or less. The proportion of the cured product of the polyfunctional (meth)acrylate oligomer to the total binder resin in the antiglare layer is preferably 60% by mass or more, more preferably 80% by mass or more, even more preferably 90% by mass or more, and even more preferably 100% by mass. The antiglare layer may contain a binder resin other than the cured product of the polyfunctional (meth)acrylate oligomer, as long as the effect of the present disclosure is not impaired.

[0065] The polyfunctional (meth)acrylate oligomer preferably has a weight average molecular weight of 500 or more and 5,000 or less, and more preferably 1,000 or more and 3,000 or less. By making the weight-average molecular weight of the oligomer 500 or more, it is possible to suppress the formation of large unevenness caused by excessive cure shrinkage of the antiglare layer, and it is easy to make the average Δd 40.0 nm or less. In addition, if the weight-average molecular weight of the oligomer is too large, the leveling property of the antiglare layer decreases, and the convex parts of the antiglare layer tend to become steep. Therefore, by making the weight-average molecular weight of the oligomer 5000 or less, it is also easy to make the average Δd 40.0 nm or less. In this specification, the weight average molecular weight means a polystyrene equivalent value measured by gel permeation chromatography. Preferred ranges of the weight average molecular weight of the polyfunctional (meth)acrylate oligomer include 500 or more and 5,000 or less, 500 or more and 3,000 or less, 1,000 or more and 5,000 or less, and 1,000 or more and 3,000 or less.

[0066] Among the polyfunctional (meth)acrylate compounds, examples of bifunctional (meth)acrylate monomers include ethylene glycol di(meth)acrylate, bisphenol A tetraethoxydiacrylate, bisphenol A tetrapropoxydiacrylate, and 1,6-hexanediol diacrylate. Examples of trifunctional or higher (meth)acrylate monomers include trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol hexa(meth)acrylate, dipentaerythritol tetra(meth)acrylate, and isocyanuric acid-modified tri(meth)acrylate. The (meth)acrylate monomer may have a part of its molecular skeleton modified, and may be modified with ethylene oxide, propylene oxide, caprolactone, isocyanuric acid, alkyl, cyclic alkyl, aromatic, bisphenol, or the like.

[0067] Examples of the polyfunctional (meth)acrylate oligomer include (meth)acrylate polymers such as urethane (meth)acrylate, epoxy (meth)acrylate, polyester (meth)acrylate, and polyether (meth)acrylate. The urethane (meth)acrylate can be obtained, for example, by reacting a polyhydric alcohol and an organic diisocyanate with a hydroxy (meth)acrylate.

[0068] Furthermore, for the purpose of adjusting the viscosity of the coating solution for the antiglare layer, a monofunctional (meth)acrylate may be added as an ionizing radiation curable compound. Examples of the monofunctional (meth)acrylate include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, butyl (meth)acrylate, pentyl (meth)acrylate, hexyl (meth)acrylate, cyclohexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, lauryl (meth)acrylate, stearyl (meth)acrylate, and isobornyl (meth)acrylate. The above ionizing radiation curable compounds can be used alone or in combination of two or more. In addition to the ionizing radiation curable compound, the coating liquid for the antiglare layer may contain a polymer to adjust the viscosity. For example, the polymer may have a weight average molecular weight of more than 5,000 and not more than 200,000.

[0069] When the ionizing radiation curable compound is an ultraviolet ray curable compound, the ionizing radiation curable composition preferably contains additives such as a photopolymerization initiator and a photopolymerization accelerator. The photopolymerization initiator may be one or more selected from acetophenone, benzophenone, α-hydroxyalkylphenone, Michler's ketone, benzoin, benzil dimethyl ketal, benzoyl benzoate, α-acyloxime ester, anthraquinone, halogenoketone, thioxanthone, etc. Among these, α-hydroxyalkylphenone, which is less prone to yellowing, is preferred. The photopolymerization accelerator can reduce polymerization inhibition caused by air during curing and increase the curing speed, and examples of the accelerator include one or more types selected from p-dimethylaminobenzoic acid isoamyl ester, p-dimethylaminobenzoic acid ethyl ester, etc.

[0070] "particle" The average particle size of the particles is preferably 0.5 μm or more and 5.0 μm or less, more preferably 1.0 μm or more and 4.0 μm or less, and even more preferably 1.0 μm or more and 3.0 μm or less. In this specification, when simply written as "particle", it means a single particulate material capable of forming unevenness on the surface of the anti-glare layer, and an aggregate of particulate materials. In other words, when simply written as "particle" in this specification, it does not mean so-called primary particles with a particle diameter of 0.1 μm or less. An example of "a single particulate material capable of forming unevenness on the surface of the anti-glare layer" is organic particles. An example of "an aggregate of particulate materials capable of forming unevenness on the surface of the anti-glare layer" is an "aggregate formed by aggregation of inorganic fine particles", or "aggregate formed by aggregation of inorganic fine particles around an organic particle as a nucleus". By making the average particle size of the particles 0.5 μm or more, it is possible to easily obtain good antiglare properties. On the other hand, particles having an average particle size of more than 0.1 μm and less than 0.5 μm may form aggregates that cause excessive antiglare properties and haze. If the average particle size of the particles is too large, the uneven shape of the antiglare layer tends to be steep, and the low refractive index layer in a wet state formed on the convex parts of the antiglare layer tends to flow into the flat parts of the antiglare layer, so the average Δd tends to be large. Therefore, by making the average particle size of the particles 5.0 μm or less, the average Δd can be easily made 40.0 nm or less. In addition, if the average particle size of the particles is too large, the influence of the refractive index of the particles themselves becomes large, and haze due to scattering is likely to occur. Examples of inorganic fine particles forming the aggregates include silica, alumina, zirconia, and titania, and silica is preferred. Examples of silica include fumed silica and solid silica. The primary particle size of the inorganic fine particles forming the aggregates is preferably 1 nm or more and 100 nm or less, more preferably 1 nm or more and 50 nm or less.

[0071] Preferred ranges for the average particle size of the particles include 0.5 μm or more and 5.0 μm or less, 0.5 μm or more and 4.0 μm or less, 0.5 μm or more and 3.0 μm or less, 1.0 μm or more and 5.0 μm or less, 1.0 μm or more and 4.0 μm or less, and 1.0 μm or more and 3.0 μm or less. In a relatively large image display device of 50 inches or more, clear colors and image quality may be important, and low anti-glare properties that blur the contours of objects may be required. In the above-mentioned case, the average particle size of the particles is preferably 1.0 μm or more and 4.0 μm or less.

[0072] The average particle size of the particles can be calculated, for example, by the following steps (A1) to (A3). (A1) The antiglare film is subjected to a transmission observation image taken with an optical microscope, preferably at a magnification of 500 to 2000 times. (A2) Randomly extract 10 particles from the observed image, and calculate the particle diameter of each particle. The particle diameter is measured as the distance between two parallel lines that is the maximum distance between the two lines when the cross section of the particle is sandwiched between the two lines. (A3) The same procedure is carried out five times on a separate observation image of the same sample, and the value obtained from the number average of the particle diameters of a total of 50 particles is regarded as the average particle diameter of the particles. The primary particle size of the inorganic fine particles forming the aggregates can be measured in accordance with the measurement methods (B1) to (B3) for hollow silica particles and non-hollow silica particles described below.

[0073] The particles preferably have a coefficient of variation of particle size of 13% or less, more preferably 12% or less, and even more preferably 11% or less. By setting the coefficient of variation of the particle size to 13% or less, it is possible to prevent the uneven shape of the antiglare layer from becoming steep, and it is possible to easily set the average Δd to 40.0 nm or less. The coefficient of variation of the particle size can be obtained, for example, from the standard deviation calculated from the 50 particles used in calculating the average particle sizes of (A1) to (A3) above and the average particle size, according to the following formula: Coefficient of variation (%) = (standard deviation / average particle size) x 100

[0074] The particles may be either organic or inorganic, with organic particles being preferred for ease of dispersion control. In addition, the particles may be a mixture of two or more types of particles made of different materials or having different average particle sizes. Examples of organic particles include particles made of polymethyl methacrylate, polyacrylic-styrene copolymer, melamine resin, polycarbonate, polystyrene, polyvinyl chloride, benzoguanamine-melamine-formaldehyde condensate, silicone, fluorine-based resin, polyester-based resin, and the like. Examples of inorganic particles include particles made of silica, alumina, zirconia, titania, and the like.

[0075] The particle shape may be spherical, elliptical, irregular, etc., but spherical particles are preferred. Spherical particles can prevent the unevenness of the antiglare layer from becoming sharp, and can easily make the average Δd 40.0 nm or less.

[0076] The particle content is preferably 0.1 parts by mass or more and 7.5 parts by mass or less, more preferably 0.8 parts by mass or more and 6.0 parts by mass or less, and even more preferably 1.0 parts by mass or more and 5.0 parts by mass or less, relative to 100 parts by mass of the binder resin. By setting the particle content to 0.6 parts by mass or more, it is possible to easily improve the antiglare properties, and by setting the particle content to 7.5 parts by mass or less, it is possible to prevent the unevenness of the antiglare layer from becoming steep due to excessive particle aggregation, and it is possible to easily set the average Δd to 40.0 nm or less. Preferred ranges for the particle content per 100 parts by mass of binder resin include 0.1 parts by mass or more and 7.5 parts by mass or less, 0.1 parts by mass or more and 6.0 parts by mass or less, 0.1 parts by mass or more and 5.0 parts by mass or less, 0.8 parts by mass or more and 7.5 parts by mass or less, 0.8 parts by mass or more and 6.0 parts by mass or less, 0.8 parts by mass or more and 5.0 parts by mass or less, 1.0 parts by mass or more and 7.5 parts by mass or less, 1.0 parts by mass or more and 6.0 parts by mass or less, and 1.0 parts by mass or more and 5.0 parts by mass or less.

[0077] The average thickness of the antiglare layer is preferably from 1 μm to 10 μm, more preferably from 3 μm to 8 μm, and even more preferably from 4 μm to 6 μm. Preferred ranges of the average film thickness of the antiglare layer include 1 μm or more and 10 μm or less, 1 μm or more and 8 μm or less, 1 μm or more and 6 μm or less, 3 μm or more and 10 μm or less, 3 μm or more and 8 μm or less, 3 μm or more and 6 μm or less, 4 μm or more and 10 μm or less, 4 μm or more and 8 μm or less, and 4 μm or more and 6 μm or less.

[0078] The average film thickness of each layer constituting the antiglare and antireflection member, such as the antiglare layer and the low refractive index layer, can be calculated by averaging the thicknesses of 20 arbitrary points selected from a cross-sectional photograph of the antiglare and antireflection member taken by a "scanning transmission electron microscope (STEM)". However, the 20 points should be selected so that they are not biased. The acceleration voltage and magnification of the STEM may be set according to the layer to be measured. For example, in the case of an antiglare layer, the acceleration voltage of the STEM is preferably 10 kV to 30 kV, and the magnification of the STEM is preferably 1000 to 7000.

[0079] When the thickness of the antiglare layer is defined as T and the average particle size of the particles is defined as D, D / T is preferably 0.20 or more and 0.80 or less, more preferably 0.30 or more and 0.70 or less, and even more preferably 0.40 or more and 0.60 or less. By setting D / T in the above range, it is possible to generate appropriate unevenness between the areas having particles and the areas not having particles. The unevenness of the antiglare layer is generated, for example, by the difference in the amount of shrinkage of the binder resin between the areas having particles and the areas not having particles. This is because the areas not having particles tend to become recessed because they have a larger amount of shrinkage than the areas having particles. Preferred ranges of D / T include 0.20 or more and 0.80 or less, 0.20 or more and 0.70 or less, 0.20 or more and 0.60 or less, 0.30 or more and 0.80 or less, 0.30 or more and 0.70 or less, 0.30 or more and 0.60 or less, 0.40 or more and 0.80 or less, 0.40 or more and 0.70 or less, and 0.40 or more and 0.60 or less.

[0080] The antiglare layer may contain a leveling agent such as a fluorine-based leveling agent, a silicone-based leveling agent, or a fluorine silicone-based leveling agent. The content of the leveling agent is preferably 0.01 parts by mass or more and 0.20 parts by mass or less, more preferably 0.02 parts by mass or more and 0.10 parts by mass or less, and even more preferably 0.03 parts by mass or more and 0.07 parts by mass or less, relative to 100 parts by mass of the binder resin. Preferred ranges for the content of the leveling agent relative to 100 parts by mass of the binder resin include 0.01 parts by mass or more and 0.20 parts by mass or less, 0.01 parts by mass or more and 0.10 parts by mass or less, 0.01 parts by mass or more and 0.07 parts by mass or less, 0.02 parts by mass or more and 0.20 parts by mass or less, 0.02 parts by mass or more and 0.10 parts by mass or less, 0.02 parts by mass or more and 0.07 parts by mass or less, 0.03 parts by mass or more and 0.20 parts by mass or less, 0.03 parts by mass or more and 0.10 parts by mass or less, and 0.03 parts by mass or more and 0.07 parts by mass or less.

[0081] The antiglare layer may contain other additives within the scope of not impairing the effects of the present disclosure. Examples of the additives include an ultraviolet absorber, an antioxidant, and a light stabilizer.

[0082] The refractive index of the antiglare layer is preferably from 1.48 to 1.62, more preferably from 1.50 to 1.54, and even more preferably from 1.52 to 1.53. By setting the refractive index of the antiglare layer in the above range and the refractive index of the low refractive index layer in the range described below, coloring when viewed from an oblique direction can be easily suppressed and the luminous reflectance Y value can be easily reduced. Preferred ranges of the refractive index of the antiglare layer include 1.48 or more and 1.62 or less, 1.48 or more and 1.54 or less, 1.48 or more and 1.53 or less, 1.50 or more and 1.62 or less, 1.50 or more and 1.54 or less, 1.50 or more and 1.53 or less, 1.52 or more and 1.62 or less, 1.52 or more and 1.54 or less, and 1.52 or more and 1.53 or less.

[0083] "solvent" A solvent is usually used in the coating solution for the antiglare layer in order to adjust the viscosity and to make each component soluble or dispersible. Examples of the solvent include ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, etc.; ethers such as dioxane and tetrahydrofuran, etc.; aliphatic hydrocarbons such as hexane, etc.; alicyclic hydrocarbons such as cyclohexane, etc.; aromatic hydrocarbons such as toluene and xylene, etc.; halogenated carbons such as dichloromethane and dichloroethane, etc.; esters such as methyl acetate, ethyl acetate, butyl acetate, etc.; alcohols such as isopropanol, butanol, cyclohexanol, etc.; cellosolves such as methyl cellosolve and ethyl cellosolve, glycol ethers such as propylene glycol monomethyl ether acetate, etc.; cellosolve acetates, sulfoxides such as dimethyl sulfoxide, etc.; amides such as dimethylformamide, dimethylacetamide, etc.; and mixtures of these may also be used.

[0084] If the time required for drying the solvent in the coating liquid for the antiglare layer is too long, the particles may be excessively aggregated, and the average Δd may become large. If the time required for drying the solvent in the coating liquid for the antiglare layer is too short, the particles may not be sufficiently aggregated, and the average Δd may become small. For this reason, it is preferable to use a mixture of a solvent having a high evaporation rate and a solvent having a low evaporation rate in the coating liquid for the antiglare layer. In this specification, a solvent having a fast evaporation rate means a solvent having an evaporation rate of 120 or more when the evaporation rate of butyl acetate is taken as 100. In addition, in this specification, a solvent having a slow evaporation rate means a solvent having an evaporation rate of less than 120 when the evaporation rate of butyl acetate is taken as 100.

[0085] Among the solvents for the coating liquid for the antiglare layer, the solvent having a high evaporation rate preferably has an evaporation rate of 150 or more and 500 or less, more preferably 250 or more and 450 or less, and even more preferably 300 or more and 400 or less. Examples of the solvent having a high evaporation rate include methyl isobutyl ketone with an evaporation rate of 160 and methyl ethyl ketone with an evaporation rate of 370. Among the solvents for the coating liquid for the antiglare layer, the solvent having a slow evaporation rate preferably has an evaporation rate of 15 or more and 110 or less, more preferably 30 or more and 100 or less, and even more preferably 50 or more and 95 or less. Examples of the solvent having a slow evaporation rate include cyclopentanone with an evaporation rate of 90, propylene glycol monomethyl ether acetate with an evaporation rate of 44, propylene glycol monomethyl ether propionate with an evaporation rate of 19, and cyclohexanone with an evaporation rate of 32.

[0086] In the solvents of the coating liquid for the antiglare layer, the mass ratio of the solvent having a fast evaporation rate to the solvent having a slow evaporation rate is preferably 50 / 50 to 90 / 10, and more preferably 60 / 40 to 80 / 20. In addition, the content of the solvent in the coating liquid for the antiglare layer is preferably adjusted so that the solids concentration is 30% by mass or more and 70% by mass or less, and more preferably 40% by mass or more and 60% by mass or less.

[0087] In addition, when the coating liquid for forming the antiglare layer is applied and dried, it is preferable to control the drying conditions. Drying conditions can be controlled, for example, by the drying temperature, drying time, and wind speed in the dryer. The drying temperature is preferably 50°C to 120°C, more preferably 60°C to 100°C, and even more preferably 70°C to 90°C. The drying time is preferably 10 seconds to 50 seconds, and more preferably 20 seconds to 40 seconds. The drying wind speed is preferably 0.2 m / s to 50 m / s, more preferably 0.5 m / s to 30 m / s, and even more preferably 1 m / s to 25 m / s. The direction of the dry air is preferably approximately horizontal to the substrate, and more preferably approximately horizontal to face the transport direction of the substrate. When ionizing radiation is irradiated during the formation of the antiglare layer in order to control the surface shape of the antiglare layer by drying, it is preferable to irradiate the antiglare layer after the coating liquid has been dried.

[0088] <Surface roughness of anti-glare layer> The surface roughness of the antiglare layer is preferably within a predetermined range. For example, the arithmetic mean roughness Ra of the antiglare layer is preferably 0.03 μm or more and 0.20 μm or less, more preferably 0.04 μm or more and 0.09 μm or less, and even more preferably 0.05 μm or more and 0.07 μm or less. The surface roughness of the antiglare layer means the surface roughness in a state where no other layer such as a low refractive index layer is formed on the antiglare layer. The surface roughness of the antiglare layer is taken as the average value measured at 10 locations. Preferred ranges of Ra of the surface of the antiglare layer include 0.03 μm or more and 0.20 μm or less, 0.03 μm or more and 0.09 μm or less, 0.03 μm or more and 0.07 μm or less, 0.04 μm or more and 0.20 μm or less, 0.04 μm or more and 0.09 μm or less, 0.04 μm or more and 0.07 μm or less, 0.05 μm or more and 0.20 μm or less, 0.05 μm or more and 0.09 μm or less, and 0.05 μm or more and 0.07 μm or less.

[0089] In this specification, Ra is an extension of Ra, which is a two-dimensional roughness parameter described in JIS B0601:1994, to three dimensions. When the orthogonal coordinate axes X and Y are placed on the reference plane, the roughness surface is Z(x, y), and the sizes of the reference plane are Lx and Ly, it is calculated by the following formula (1). In the following formula (1), A = Lx × Ly. Also, in this specification, Ra means the value measured with a cut-off value of Ly / 4 (mm). However, let Lx < Ly. Also, when measuring Ra, it is preferable to take Lx and Ly.

[0090]

Equation

[0091] <Low refractive index layer> The low refractive index layer is a layer located on the surface opposite to the base material of the antiglare layer. The low refractive index layer is preferably arranged so as to be the surface of the antiglare and antireflection member.

[0092] The refractive index of the low refractive index layer is preferably from 1.10 to 1.48, more preferably from 1.20 to 1.45, more preferably from 1.26 to 1.40, more preferably from 1.28 to 1.38, and more preferably from 1.30 to 1.32. In this specification, the refractive index refers to the refractive index at a wavelength of 589.3 nm. Preferred ranges of the refractive index of the low refractive index layer are 1.10 or more and 1.48 or less, 1.10 or more and 1.45 or less, 1.10 or more and 1.40 or less, 1.10 or more and 1.38 or less, 1.10 or more and 1.32 or less, 1.20 or more and 1.48 or less, 1.20 or more and 1.45 or less, 1.20 or more and 1.40 or less, 1.20 or more and 1.38 or less, 1.20 or more and 1.32 or less, 1.26 or more and 1.48 or less, 1.26 or more and 1.45 or less, Examples include 1.26 or more and 1.40 or less, 1.26 or more and 1.38 or less, 1.26 or more and 1.32 or less, 1.28 or more and 1.48 or less, 1.28 or more and 1.45 or less, 1.28 or more and 1.40 or less, 1.28 or more and 1.38 or less, 1.28 or more and 1.32 or less, 1.30 or more and 1.48 or less, 1.30 or more and 1.45 or less, 1.30 or more and 1.40 or less, 1.30 or more and 1.38 or less, and 1.30 or more and 1.32 or less.

[0093] The average thickness of the low refractive index layer is preferably 80 nm to 130 nm, more preferably 85 nm to 110 nm, and even more preferably 90 nm to 105 nm. The average thickness of the low refractive index layer is preferably larger than the average particle size of the particles contained in the low refractive index layer, such as hollow particles and non-hollow particles. Preferred ranges of the average film thickness of the low refractive index layer include 80 nm or more and 130 nm or less, 80 nm or more and 110 nm or less, 80 nm or more and 105 nm or less, 85 nm or more and 130 nm or less, 85 nm or more and 110 nm or less, 85 nm or more and 105 nm or less, 90 nm or more and 130 nm or less, 90 nm or more and 110 nm or less, and 90 nm or more and 105 nm or less.

[0094] The antiglare layer and the low refractive index layer may or may not be in contact with each other, but it is preferable that they are in contact with each other. In other words, it is preferable that no other layer such as a high refractive index layer is interposed between the antiglare layer and the low refractive index layer. By adopting the above-mentioned configuration, it is possible to easily suppress coloring when viewed from an oblique direction. When another layer is interposed between the antiglare layer and the low refractive index layer, it is preferable that the refractive index of the other layer is in the suitable range of the refractive index of the antiglare layer described above.

[0095] The method for forming the low refractive index layer can be roughly divided into a wet method and a dry method. The wet method is preferred because it is difficult to provide a difference in the thickness of the low refractive index layer with the dry method. Examples of the wet method include a method of forming the layer by a sol-gel method using a metal alkoxide or the like, a method of forming the layer by coating a resin having a low refractive index such as a fluororesin, and a method of forming the layer by coating a coating liquid for forming a low refractive index layer containing a binder resin composition and low refractive index particles. Among these, it is preferable to form the layer by using a coating liquid for forming a low refractive index layer in which low refractive index particles are contained in a binder resin composition.

[0096] The low refractive index layer preferably contains a binder resin and particles. The particles preferably contain hollow particles and non-hollow particles. That is, the low refractive index layer more preferably contains a binder resin, hollow particles, and non-hollow particles.

[0097] <Hollow and non-hollow particles> The material of the hollow particles and non-hollow particles may be either an inorganic compound such as silica or magnesium fluoride, or an organic compound, but silica is preferred for its low refractive index and strength. Hereinafter, the hollow particles and non-hollow particles will be described mainly with respect to hollow silica particles and non-hollow silica particles.

[0098] Hollow silica particles refer to particles that have an outer shell layer made of silica, the inside of the particle surrounded by the outer shell layer is hollow, and the inside of the cavity contains air. Hollow silica particles are particles that contain air, and the refractive index is reduced in proportion to the occupancy rate of gas compared to the refractive index of silica itself. Non-hollow silica particles are particles that are not hollow like hollow silica particles. Non-hollow silica particles are, for example, solid silica particles. The shape of the hollow silica particles and non-hollow silica particles is not particularly limited, and may be a perfect sphere, a spheroid, or a nearly spherical shape such as a polyhedron that can approximate a sphere, etc. Among these, in consideration of scratch resistance, a perfect sphere, a spheroid, or a nearly spherical shape is preferable.

[0099] Since hollow silica particles contain air inside, they play a role in lowering the refractive index of the entire low refractive index layer. By using hollow silica particles with a large particle size and a high ratio of air, the refractive index of the low refractive index layer can be further lowered. On the other hand, hollow silica particles tend to have poor mechanical strength. In particular, when hollow silica particles with a large particle size and a high ratio of air are used, the scratch resistance of the low refractive index layer tends to be easily reduced. The non-hollow silica particles are preferably present on the side of the low refractive index layer opposite to the antiglare layer, and more preferably present dispersedly throughout the low refractive index layer. The presence of the non-hollow silica particles as described above can easily improve the scratch resistance of the low refractive index layer.

[0100] It is preferable to set the average particle size of the hollow silica particles and the average particle size of the non-hollow silica particles so that the hollow silica particles are close to each other and further so that the non-hollow particles can enter between the hollow silica particles. Specifically, the ratio of the average particle size of non-hollow silica particles to the average particle size of hollow silica particles is preferably 0.29 or less, more preferably 0.27 or less.By making the average particle size of non-hollow silica particles / the average particle size of hollow silica particles within the above range, hollow silica particles and non-hollow silica particles can be easily uniformly dispersed in the thickness direction of the low refractive index layer, and scratch resistance can be easily improved.The ratio of the average particle sizes is preferably 0.05 or more, more preferably 0.15 or more. Preferred ranges for the ratio of average particle sizes include 0.05 or more and 0.29 or less, 0.05 or more and 0.27 or less, 0.15 or more and 0.29 or less, and 0.15 or more and 0.27 or less.

[0101] Considering optical properties and mechanical strength, the average particle size of the hollow silica particles is preferably 20 nm or more and 100 nm or less, more preferably 30 nm or more and 90 nm or less, and even more preferably 40 nm or more and 80 nm or less. Preferred ranges for the average particle size of the hollow silica particles include 20 nm or more and 100 nm or less, 20 nm or more and 90 nm or less, 20 nm or more and 80 nm or less, 30 nm or more and 100 nm or less, 30 nm or more and 90 nm or less, 30 nm or more and 80 nm or less, 40 nm or more and 100 nm or less, 40 nm or more and 90 nm or less, and 40 nm or more and 80 nm or less. In consideration of dispersibility while preventing aggregation of non-hollow silica particles, the average particle size of non-hollow silica particles is preferably 0.5 nm or more and smaller than that of hollow silica particles. The average particle size of non-hollow silica particles is preferably 0.5 nm or more and 20 nm or less, more preferably 5 nm or more and 20 nm or less.

[0102] The average particle size of the hollow silica particles and the non-hollow silica particles can be calculated, for example, by the following steps (B1) to (B3). (B1) A cross section of the antiglare and antireflection member containing particles is imaged by a TEM or STEM. The acceleration voltage of the TEM or STEM is preferably 10 kV to 30 kV, and the magnification is preferably 50,000 to 300,000. (B2) Randomly extract 10 particles from the observed image, and calculate the particle diameter of each particle. The particle diameter is measured as the distance between two parallel lines that is the maximum distance between the two lines when the cross section of the particle is sandwiched between the two lines. (B3) The same procedure is carried out five times on a separate observation image of the same sample, and the value obtained from the number average of a total of 50 particles is regarded as the average particle size of the particles.

[0103] The surfaces of the hollow silica particles and non-hollow silica particles are preferably coated with a silane coupling agent, preferably one having a (meth)acryloyl group or an epoxy group. By subjecting the silica particles to surface treatment with a silane coupling agent, the affinity between the silica particles and the binder resin is improved, and the silica particles are less likely to aggregate. Therefore, the silica particles are more likely to be dispersed uniformly. In addition, by improving the affinity between the silica particles and the binder resin with a silane coupling agent, the resistance of the wet low refractive index layer formed on the convex portion of the antiglare layer when it flows down to the flat portion of the antiglare layer is increased, and the average Δd can be easily suppressed from becoming excessively large.

[0104] The higher the content of hollow silica particles, the higher the filling rate of hollow silica particles in the binder resin, and the lower the refractive index of the low refractive index layer. Also, the higher the content of hollow silica particles, the higher the viscosity of the coating solution for the low refractive index layer, and the higher the resistance when the wet low refractive index layer formed on the convex part of the antiglare layer flows down to the flat part side of the antiglare layer, making it easier to suppress the average Δd from becoming excessively large. Therefore, the content of hollow silica particles is preferably 100 parts by mass or more, more preferably 130 parts by mass or more, relative to 100 parts by mass of the binder resin. On the other hand, if the content of hollow silica particles is too high, the mechanical strength of the low refractive index layer, such as scratch resistance, tends to decrease.In addition, if the content of hollow silica particles is too high, the viscosity of the coating solution for low refractive index layer tends to increase too much, and the average Δd tends to become too small.For this reason, the content of hollow silica particles is preferably 300 parts by mass or less, more preferably 200 parts by mass or less, relative to 100 parts by mass of binder resin. Preferred ranges of the content of the hollow silica particles relative to 100 parts by mass of the binder resin include 100 parts by mass or more and 300 parts by mass or less, 100 parts by mass or more and 200 parts by mass or less, 130 parts by mass or more and 300 parts by mass or less, and 130 parts by mass or more and 200 parts by mass or less.

[0105] When the content of non-hollow silica particles is low, the presence of non-hollow silica particles on the surface of the low refractive index layer may not affect the hardness increase. In addition, the higher the content of non-hollow silica particles, the higher the viscosity of the coating solution for the low refractive index layer, and the resistance when the wet low refractive index layer formed on the convex part of the anti-glare layer flows down to the flat part side of the anti-glare layer increases, making it easier to suppress the average of Δd from becoming excessively large. In addition, the higher the content of non-hollow silica particles, the smaller the effect of shrinkage unevenness due to polymerization of the binder resin, making it easier to adjust the average of Δd. For this reason, the content of non-hollow silica particles is preferably 50 parts by mass or more, more preferably 60 parts by mass or more, relative to 100 parts by mass of the binder resin. On the other hand, if the content of the non-hollow silica particles is too high, the viscosity of the coating liquid for the low refractive index layer tends to increase too much, and the average Δd tends to become too small. Therefore, the content of the non-hollow silica particles is preferably 150 parts by mass or less, more preferably 100 parts by mass or less, relative to 100 parts by mass of the binder resin. Preferred ranges of the content of the non-hollow silica particles relative to 100 parts by mass of the binder resin include 50 parts by mass or more and 150 parts by mass or less, 50 parts by mass or more and 100 parts by mass or less, 60 parts by mass or more and 150 parts by mass or less, and 60 parts by mass or more and 100 parts by mass or less.

[0106] <Binder resin> The binder resin of the low refractive index layer preferably contains a cured product of a curable resin composition. Examples of the cured product of the curable resin composition include a cured product of a heat-curable resin composition and a cured product of an ionizing radiation-curable resin composition, and the cured product of an ionizing radiation-curable resin composition is preferred to improve mechanical strength.

[0107] The thermosetting resin composition and ionizing radiation curable resin composition of the low refractive index layer may be the same as those exemplified for the antiglare layer. Among them, the ionizing radiation curable resin composition is preferred. That is, the binder resin of the low refractive index layer preferably contains a cured product of the ionizing radiation curable resin composition.

[0108] The ionizing radiation curable resin composition of the low refractive index layer is preferably a polyfunctional (meth)acrylate compound, and more preferably a polyfunctional (meth)acrylate oligomer. That is, the binder resin of the low refractive index layer preferably contains a cured product of a polyfunctional (meth)acrylate oligomer. The cured product of the polyfunctional (meth)acrylate oligomer can improve the surface hardness of the antiglare antireflection member while suppressing excessive curing shrinkage of the low refractive index layer and making it easy to adjust the average Δd. In addition, the polyfunctional (meth)acrylate oligomer can appropriately increase the viscosity of the coating liquid for the low refractive index layer, making it easy to suppress the average Δd from becoming excessively large. The proportion of the cured product of the polyfunctional (meth)acrylate oligomer to the total binder resin in the antiglare layer is preferably 60% by mass or more, more preferably 80% by mass or more, even more preferably 90% by mass or more, and even more preferably 100% by mass. The low refractive index layer may contain a binder resin other than the cured product of the polyfunctional (meth)acrylate oligomer, as long as the effects of the present disclosure are not impaired.

[0109] Examples of the polyfunctional (meth)acrylate oligomer include (meth)acrylate polymers such as urethane (meth)acrylate, epoxy (meth)acrylate, polyester (meth)acrylate, and polyether (meth)acrylate. The oligomer of the polyfunctional (meth)acrylate compound preferably has a weight average molecular weight of 500 or more and 5,000 or less, and more preferably 1,000 or more and 3,000 or less. By setting the weight-average molecular weight of the oligomer to 500 or more, excessive cure shrinkage of the low refractive index layer can be suppressed, and the average Δd can be easily adjusted. In addition, by setting the weight-average molecular weight of the oligomer to the above range, the viscosity of the coating liquid for the low refractive index layer can be easily adjusted to a range that is neither too low nor too high, and the average Δd can be easily set to 7.0 nm or more and 40.0 nm or less. Preferred ranges of the weight average molecular weight of the oligomer of the polyfunctional (meth)acrylate compound include 500 or more and 5,000 or less, 500 or more and 3,000 or less, 1,000 or more and 5,000 or less, and 1,000 or more and 3,000 or less.

[0110] The binder resin of the low refractive index layer preferably contains the same components as the binder resin of the antiglare layer. The above-mentioned configuration increases the affinity between the antiglare layer and the low refractive index layer, and increases the resistance when the wet low refractive index layer formed on the convex parts of the antiglare layer flows down to the flat part side of the antiglare layer, making it easier to suppress the average Δd from becoming excessively large. The ratio of the same component as the binder resin of the antiglare layer to the total amount of the binder resin of the low refractive index layer is preferably 30 mass % or more, more preferably 50 mass % or more, even more preferably 70 mass % or more, and even more preferably 90 mass % or more.

[0111] The low refractive index layer may contain a leveling agent such as a fluorine-based leveling agent, a silicone-based leveling agent, or a fluorine silicone-based leveling agent. The content of the leveling agent is preferably 0.1 parts by mass or more and 10 parts by mass or less, more preferably 0.2 parts by mass or more and 5 parts by mass or less, and even more preferably 0.3 parts by mass or more and 3 parts by mass or less, relative to 100 parts by mass of the binder resin. Preferred ranges for the content of the leveling agent relative to 100 parts by mass of the binder resin include 0.1 parts by mass or more and 10 parts by mass or less, 0.1 parts by mass or more and 5 parts by mass or less, 0.1 parts by mass or more and 3 parts by mass or less, 0.2 parts by mass or more and 10 parts by mass or less, 0.2 parts by mass or more and 5 parts by mass or less, 0.2 parts by mass or more and 3 parts by mass or less, 0.3 parts by mass or more and 10 parts by mass or less, 0.3 parts by mass or more and 5 parts by mass or less, and 0.3 parts by mass or more and 3 parts by mass or less. When the ionizing radiation curable compound forming the binder resin of the low refractive index layer is an ultraviolet ray curable compound, the ionizing radiation curable composition preferably contains additives such as a photopolymerization initiator and a photopolymerization accelerator. The photopolymerization initiator may be one or more selected from acetophenone, benzophenone, α-hydroxyalkylphenone, Michler's ketone, benzoin, benzil dimethyl ketal, benzoyl benzoate, α-acyloxime ester, anthraquinone, halogenoketone, thioxanthone, etc. Among these, α-hydroxyalkylphenone is preferred. The photopolymerization accelerator can reduce polymerization inhibition caused by air during curing and increase the curing speed, and examples of the accelerator include one or more types selected from p-dimethylaminobenzoic acid isoamyl ester, p-dimethylaminobenzoic acid ethyl ester, etc.

[0112] The low refractive index layer may contain other additives within the range that does not impair the effects of the present disclosure. Examples of the additives include an ultraviolet absorber, an antioxidant, and a light stabilizer.

[0113] "solvent" A solvent is usually used in the coating liquid for the low refractive index layer in order to adjust the viscosity and to make each component soluble or dispersible. Examples of the solvent for the coating liquid for the low refractive index layer include the same solvents as those exemplified for the coating liquid for the antiglare layer.

[0114] If the time required for drying the solvent in the coating liquid for the low refractive index layer is too long, the wet low refractive index layer formed on the convex parts of the antiglare layer may flow down excessively to the flat part side of the antiglare layer, and the average Δd may become too large. If the time required for drying the solvent in the coating liquid for the low refractive index layer is too short, the amount of the wet low refractive index layer formed on the convex parts of the antiglare layer that flows down to the flat part side of the antiglare layer may be insufficient, and the average Δd may become too small. For this reason, it is preferable to use a mixture of a solvent with a high evaporation rate and a solvent with a low evaporation rate in the coating liquid for the low refractive index layer.

[0115] In the solvent of the coating liquid for the low refractive index layer, the solvent having a high evaporation rate preferably has an evaporation rate of 125 or more and 300 or less, more preferably 130 or more and 250 or less, and even more preferably 140 or more and 200 or less. An example of a solvent having a high evaporation rate is methyl isobutyl ketone, which has an evaporation rate of 160. In the solvent of the coating liquid for the low refractive index layer, the solvent having a slow evaporation rate preferably has an evaporation rate of 20 to 90, more preferably 25 to 80, and even more preferably 30 to 60. An example of a solvent having a slow evaporation rate is propylene glycol monomethyl ether acetate, which has an evaporation rate of 44.

[0116] In the solvents of the coating liquid for the low refractive index layer, the mass ratio of the solvent having a fast evaporation rate to the solvent having a slow evaporation rate is preferably 50 / 50 to 90 / 10, and more preferably 60 / 40 to 80 / 20. In addition, the content of the solvent in the coating liquid for the low refractive index layer is preferably adjusted so that the solids concentration is 1% by mass or more and 10% by mass or less, and more preferably 3% by mass or more and 7% by mass or less.

[0117] In addition, when the coating liquid for the low refractive index layer is applied and dried, it is preferable to control the drying conditions. Drying conditions can be controlled, for example, by the drying temperature, drying time, and wind speed in the dryer. The drying temperature is preferably 40°C to 100°C, more preferably 45°C to 80°C, and even more preferably 50°C to 70°C. The drying time is preferably 10 seconds to 50 seconds, and more preferably 20 seconds to 40 seconds. The drying wind speed is preferably 0.2 m / s to 50 m / s, more preferably 0.5 m / s to 30 m / s, and even more preferably 1 m / s to 25 m / s. In addition, the direction of the dry air is preferably approximately parallel to the substrate, and more preferably approximately parallel to the substrate transport direction. On the other hand, when the direction of the dry air is perpendicular to the substrate, the low refractive index layer in a wet state formed on the convex portion of the antiglare layer tends to flow down to the flat portion of the antiglare layer excessively, and the average Δd tends to become too large. When ionizing radiation is applied during the formation of the low refractive index layer, it is preferable to apply the radiation after drying the coating liquid in order to ensure the fluidity of the low refractive index layer in a wet state.

[0118] Furthermore, in order to facilitate setting the average Δd to 7.0 nm or more and 40.0 nm or less, it is preferable to have a process of heating from the substrate side after the formation of the antiglare layer on the substrate is completed and before the formation of the low refractive index layer is completed. If the drying time of the solvent contained in the low refractive index layer in a wet state is too long, the average Δd may become too large. The drying speed of the solvent can be adjusted by the type of solvent and drying conditions. However, in consideration of the environmental load, adhesion to the antiglare layer, solubility of the binder resin of the low refractive index layer, etc., the type of solvent may be limited. In addition, in consideration of the heat resistance of the substrate, etc., the drying conditions may be limited. For this reason, it is preferable to adjust the drying time by means other than the type of solvent and drying conditions. Other means include the above-mentioned step of heating from the substrate side. With the above step, the temperature of the antiglare layer surface on which the coating liquid for the low refractive index layer is applied increases, so that the drying time of the coating liquid for the low refractive index layer can be shortened. Examples of the means of heating from the substrate side include a means of heating rolls such as a conveying roll and a pressure roll. In this case, the substrate temperature is preferably 30°C or more and 55°C or less, more preferably 35°C or more and 50°C or less. In addition, it is preferable that the substrate temperature is in the above range at the time of coating the coating liquid for the low refractive index layer. In addition, it is preferable that the substrate temperature and the temperature of the drying air have a relationship of "substrate temperature < drying air temperature".

[0119] <Film thickness difference> In the antiglare antireflection member of the present disclosure, when the thickness difference of the low refractive index layer in any 2 mm x 2 mm area of ​​the antiglare antireflection member is defined as Δd, the average of Δd must be 7.0 nm or more and 40.0 nm or less. As described above, Δd means the thickness difference of the low refractive index layer in the completed state of the antiglare antireflection member. The technical meaning of the average Δd will be explained below.

[0120] Usually, the low refractive index layer is designed to have a low reflectance in the front direction at a wavelength of 550 nm, where human visual sensitivity is high. However, in the oblique direction, the distance of light passing through the low refractive index layer increases, and the thickness of the layer increases substantially. Therefore, a normal low refractive index layer designed to have a low reflectance in the front direction at a wavelength of 550 nm cannot reduce the reflectance in the oblique direction. In particular, a low refractive index layer with a normal design has an extremely high reflectance of light in the red wavelength range, which has a long wavelength. Therefore, a low refractive index layer with a normal design cannot suppress coloring when viewed from an oblique direction. In the present disclosure, by providing a film thickness difference to the low refractive index layer with an average Δd of 7.0 nm or more, it is possible to suppress the effect of a substantial increase in the film thickness of the low refractive index layer in an oblique direction and suppress coloring when viewed from an oblique direction. It is important to consider it not as the film thickness of a micro region, but as the average film thickness of a macro region larger than a size that can be distinguished by humans. The average film thickness of a macro region larger than a size that can be distinguished by humans can suppress the increase rate in the oblique direction by setting the average Δd to 7.0 nm or more. Therefore, by setting the average Δd to 7.0 nm or more, coloring when viewed from an oblique direction can be suppressed. The average Δd is preferably 10.0 nm or more, more preferably 15.0 nm or more, and even more preferably 20.0 nm or more. However, if the average of Δd is too large, the reflectance varies locally, and the bright spots are visually recognized. In the present disclosure, the average of Δd is set to 40.0 nm or less to suppress the film thickness difference of the low refractive index layer, thereby suppressing the bright spots from being visually recognized. The average of Δd is preferably 35.0 nm or less, more preferably 33.0 nm or less, and even more preferably 30.0 nm or less. Preferred ranges of the average of Δd include 7.0 nm or more and 35.0 nm or less, 7.0 nm or more and 33.0 nm or less, 7.0 nm or more and 30.0 nm or less, 10.0 nm or more and 40.0 nm or less, 10.0 nm or more and 35.0 nm or less, 10.0 nm or more and 33.0 nm or less, 10.0 nm or more and 30.0 nm or less, 15.0 nm or more and 40.0 nm or less, 15.0 nm or more and 35.0 nm or less, 15.0 nm or more and 33.0 nm or less, 15.0 nm or more and 30.0 nm or less, 20.0 nm or more and 40.0 nm or less, 20.0 nm or more and 35.0 nm or less, 20.0 nm or more and 33.0 nm or less, and 20.0 nm or more and 30.0 nm or less. The measurement area for Δd was set to 2 mm×2 mm because it is a range that is unlikely to extend beyond the reflectance measurement spot, and is a size that can be easily distinguished by a human. In the embodiment described later, the size of the measurement spot for reflectance is 50.2 mm at an incident angle of 5 degrees. 2 The size of the measurement spot with an incident angle of 60 degrees is 100.0 mm 2 The size of the measurement spot changes depending on the angle because the measurement is performed by projecting light that has passed through a mask of a specific size onto a tilted sample. In the examples described below, a mask measuring 5 mm x 10 mm is used as the mask.

[0121] The difference in thickness of the low refractive index layer within an arbitrary 2 mm×2 mm region, Δd, can be measured, for example, as shown in the following z1 to z10. (z1) An antiglare antireflection member is cut to a width of 2 mm to prepare a rectangular sample A1. Hereinafter, the 2 mm width direction of sample A1 is referred to as the short side direction, and the direction perpendicular to the short side direction is referred to as the long side direction. Note that, taking into consideration that the vicinity of the cut surface of sample A1 may be rough, it is acceptable to sample with some margin in the short side direction. In other words, if the area to be observed is 2 mm, the short side direction of sample A1 may be 3 mm to 4 mm. Alternatively, a laminate may be prepared by bonding the substrate side surface of the antiglare antireflection member to a plastic plate, and the laminate may be cut as described above to provide sample A1. (z2) The surface profile of the low refractive index layer side of sample A1 is measured using a white light interference surface profile measuring device. The measurement area is a 2 mm x 2 mm area extending 2 mm from the end of the short side direction of sample A1. Note that, considering that the vicinity of the ends of the short and long sides of sample A1 may be rough, the measurement area may be set excluding the vicinity of the ends, or a 3 mm x 3 mm area including the vicinity of the ends may be measured and then a 2 mm x 2 mm area may be selected from that. (z3) Height profiles in the short side direction are obtained at four locations 400 nm, 800 nm, 1200 nm, and 1600 nm away from the end of the short side direction of the region. For example, FIG. 3 is a plan view of sample A1, in which the bold line area indicates a measurement area of ​​2 mm × 2 mm, and the four dashed lines i, ii, iii, and iv correspond to the four short side directions in which the height profile is obtained. (z4) For each of the four height profiles, a peak point, which is the highest point in the height profile, and a lowest point in the height profile are identified, and a distance L1 from an end of the long side of sample A1 to the peak point and a distance L2 from an end of the long side of sample A1 to the bottom are identified. In this specification, the "lowest point in the height profile" may be referred to as the "bottom". (z5) Sample A1 is embedded in resin to prepare embedded sample B1. (z6) The embedded sample B1 is cut in a direction parallel to the short side direction of the sample A1 to expose a vertical cross section of the sample A1 at a location 400 nm from the end of the short side direction of the measurement area of ​​the sample A1. (z7) The vertical cross section is observed with a scanning transmission electron microscope, and dmin indicating the film thickness of the low refractive index layer at a position corresponding to the peak point, and dmax indicating the film thickness of the low refractive index layer at a position corresponding to the bottom are calculated. (z8) From the difference between dmax and dmin, di, which indicates the film thickness difference at a point 400 nm away from the end of the measurement area in the short side direction, is calculated. (z9) The embedded sample B1 is cut in a direction parallel to the short side direction of the sample A1, and vertical cross sections of the sample A1 at positions 800 nm, 1200 nm, and 1600 nm from the end of the short side direction of the measurement area of ​​the sample A1 are exposed, and the same operations as those of z7 to z8 are performed. By this operation, d-ii, d-iii, and d-iv, which indicate the film thickness differences at positions 800 nm, 1200 nm, and 1600 nm from the end of the short side direction of the measurement area, are calculated. (z10)di, d-ii, d-iii and d-iv are averaged to calculate Δd, which indicates the film thickness difference of the low refractive index layer within any 2 mm×2 mm region.

[0122] The embedded sample can be obtained, for example, by placing a rectangular sample in a silicon embedding plate, pouring in embedding resin, hardening the embedding resin, and then removing the cut sample and the embedding resin that encases it from the silicon embedding plate. In the case of the epoxy resin manufactured by Struers given below as an example, the aforementioned hardening step is preferably carried out by leaving it at room temperature for 12 hours to harden. The silicone embedding plate may be, for example, one manufactured by Dosaka EM Co., Ltd. The silicone embedding plate may also be called a silicone capsule. The epoxy resin used for embedding may be, for example, a mixture of "Epofix" manufactured by Struers Co., Ltd. and "Epofix Hardener" manufactured by the same company in a ratio of 10:1.2.

[0123] The embedded samples are preferably cut with a diamond knife. An example of an apparatus for cutting an embedded sample is the product name "Ultramicrotome EM UC7" manufactured by Leica Microsystems.

[0124] The "average Δd" can be calculated by calculating Δd, which indicates the film thickness difference of the low refractive index layer within a 2 mm×2 mm area at 10 points on the antiglare antireflection member, and averaging the Δd at the 10 points. Of the 10 locations of Δd, the number of locations where the absolute value of Δd is in the range of 7.0 nm or more and 40.0 nm or less is preferably 8 or more, more preferably 9 or more, and even more preferably 10.

[0125] <Physical Properties> The antiglare and antireflection component preferably has a luminous reflectance Y value of 3.0% or less, more preferably 2.0% or less, and even more preferably 1.5% or less, measured at a light incidence angle of 5 degrees from the side having the low refractive index layer. In addition, the antiglare antireflection member of the present disclosure has a limit to the reflectance because the low refractive index layer has a different thickness, and therefore the lower limit of the luminous reflectance Y value is preferably 0.5% or more, more preferably 0.8% or more, and even more preferably 1.0% or more. In this specification, the luminous reflectance Y value refers to the luminous reflectance Y value of the CIE1931 standard color system. The luminous reflectance Y value can be calculated using a spectrophotometer. An example of a spectrophotometer is the product name "UV-3600plus" manufactured by Shimadzu Corporation. When measuring the luminous reflectance, it is preferable to attach a black plate to the back surface of the substrate. The luminous reflectance Y value, total light transmittance and haze are the average values ​​measured at 10 points.

[0126] The antiglare and antireflection member preferably has a total light transmittance according to JIS K7361-1:1997 of 50% or more, more preferably 80% or more, and even more preferably 90% or more. The total light transmittance and the haze described later are measured with the light incident surface facing the substrate. The total light transmittance and the haze described later can be measured, for example, with a haze meter (product number: HM-150) manufactured by Murakami Color Research Laboratory.

[0127] For applications requiring transparency, the antiglare antireflection member preferably has a haze in accordance with JIS K7136:2000 of 0.3% or more and 10% or less, more preferably 0.4% or more and 7% or less, even more preferably 0.5% or more and 5% or less, and even more preferably 0.6% or more and 2.2% or less. Furthermore, for applications requiring higher antiglare properties, the antiglare and antireflection member preferably has a haze of 1% or more and 90% or less, more preferably 10% or more and 85% or less, and even more preferably 20% or more and 80% or less.

[0128] The surface of the antiglare antireflection member on the low refractive index layer side preferably has an arithmetic mean roughness Ra of 0.01 μm to 0.18 μm, more preferably 0.02 μm to 0.08 μm, and even more preferably 0.03 μm to 0.07 μm. The surface roughness of the low refractive index layer side is the average value of measurements taken at 10 points. Preferred ranges of Ra on the surface on the low refractive index layer side include 0.01 μm or more and 0.18 μm or less, 0.01 μm or more and 0.08 μm or less, 0.01 μm or more and 0.07 μm or less, 0.02 μm or more and 0.18 μm or less, 0.02 μm or more and 0.08 μm or less, 0.02 μm or more and 0.07 μm or less, 0.03 μm or more and 0.18 μm or less, 0.03 μm or more and 0.08 μm or less, and 0.03 μm or more and 0.07 μm or less.

[0129] In this specification, when various physical properties such as film thickness, optical properties, and surface roughness are measured, the values ​​are measured at a temperature of 23±5°C and a relative humidity of 40% to 65%, unless otherwise specified. Furthermore, before starting each measurement and evaluation, the target sample is exposed to the above atmosphere for 30 minutes or more before the measurement and evaluation.

[0130] <Size, shape, etc.> The antiglare antireflection member may be in the form of a sheet cut to a predetermined size, or in the form of a roll obtained by winding a long sheet into a roll. The size of the sheet is not particularly limited, but the maximum diameter is about 2 inches to 500 inches. The "maximum diameter" refers to the maximum length when any two points on the antiglare antireflection member are connected. For example, when the antiglare antireflection member is rectangular, the diagonal line of the rectangle is the maximum diameter. Also, when the antiglare antireflection member is circular, the diameter of the circle is the maximum diameter. The width and length of the roll are not particularly limited, but generally, the width is 500 to 8000 mm, and the length is 100 to 10000 m. The antiglare antireflection member in the form of a roll can be cut into sheets according to the size of an image display device or the like. When cutting, it is preferable to remove the ends of the roll, which have unstable physical properties. The shape of the sheet is not particularly limited, and may be, for example, a polygon such as a triangle, a rectangle, or a pentagon, a circle, or a random, indefinite shape. More specifically, when the antiglare antireflection member is rectangular, the aspect ratio is not particularly limited as long as it does not cause any problems as a display screen. For example, the aspect ratio may be 1:1, 4:3, 16:10, 16:9, 2:1, 5:4, 11:8, etc.

[0131] [Selection method for anti-glare and anti-reflection materials] The method for selecting antiglare and antireflection members according to the present disclosure includes the following steps (1) and (2). (1) A step of measuring the film thickness difference Δd of the low refractive index layer within any 2 mm×2 mm area of ​​an antiglare and antireflection member having an antiglare layer and a low refractive index layer on a substrate, and calculating the average Δd. (2) A step of selecting, as an antiglare and antireflection member, those which satisfy the judgment criterion that the average Δd is 7.0 nm or more and 40.0 nm or less.

[0132] It is preferable that the selection method for antiglare and antireflection members further includes, as an additional judgment condition, one or more selected from the above-mentioned preferred embodiments of the antiglare and antireflection members of the present disclosure. An additional judgment condition is, for example, that the haze according to JIS K7136:2000 is 0.3% or more and 10% or less.

[0133] According to the selection method for antiglare antireflection members disclosed herein, it is possible to stably select antiglare antireflection members that can suppress discoloration when viewed from an oblique direction and further suppress the visibility of localized bright spots.

[0134] [Polarizing plate] The polarizing plate of the present disclosure has a polarizer, a first transparent protective plate arranged on one side of the polarizer, and a second transparent protective plate arranged on the other side of the polarizer, wherein at least one of the first transparent protective plate and the second transparent protective plate is the anti-glare anti-reflection member of the present disclosure described above, and the anti-glare anti-reflection member is arranged so that the surface on the low refractive index layer side faces the opposite side to the polarizer.

[0135] <Polarizer> Examples of polarizers include sheet-type polarizers such as polyvinyl alcohol films, polyvinyl formal films, polyvinyl acetal films, and saponified ethylene-vinyl acetate copolymer films dyed with iodine or the like and stretched, wire-grid-type polarizers made of a large number of metal wires arranged in parallel, coating-type polarizers coated with lyotropic liquid crystal or a dichroic guest-host material, and multilayer thin-film-type polarizers. These polarizers may be reflective polarizers that have the function of reflecting polarized components that are not transmitted.

[0136] <Transparent protection plate> A first transparent protective plate is disposed on one side of the polarizer, and a second transparent protective plate is disposed on the other side of the polarizer. At least one of the first transparent protective plate and the second transparent protective plate is the antiglare antireflection member of the present disclosure described above.

[0137] Examples of the first transparent protective plate and the second transparent protective plate other than the antiglare antireflection member include plastic films and glass. Examples of the plastic film include polyester films, polycarbonate films, cycloolefin polymer films, and acrylic films, and stretched films thereof are preferred in order to improve mechanical strength. Examples of the glass include alkali glass, nitride glass, soda-lime glass, borosilicate glass, and lead glass. In addition, it is preferable that the glass as the transparent protective plate for protecting the polarizer is also used as another member of the image display device. For example, it is preferable that the glass substrate of the liquid crystal display element is also used as the transparent protective plate for protecting the polarizer. The polarizer and the transparent protective plate are preferably attached to each other via an adhesive, which may be a general-purpose adhesive, and is preferably a PVA-based adhesive.

[0138] In the polarizing plate of the present disclosure, both the first transparent protective plate and the second transparent protective plate may be the antiglare film of the present disclosure described above, but it is preferable that one of the first transparent protective plate and the second transparent protective plate is the antiglare film of the present disclosure described above. In addition, when the polarizing plate of the present disclosure is used as a polarizing plate arranged on the light exit surface side of a display element, it is preferable that the transparent protective plate on the light exit surface side of the polarizer is the antiglare film of the present disclosure described above. On the other hand, when the polarizing plate of the present disclosure is used as a polarizing plate arranged on the opposite side to the light exit surface of a display element, it is preferable that the transparent protective plate on the opposite side to the light exit surface of the polarizer is the antiglare film of the present disclosure described above.

[0139] [Face plate for image display device] The front panel for an image display device according to the present disclosure is formed by laminating an anti-glare anti-reflection member onto a resin plate or a glass plate, the anti-glare anti-reflection member being the anti-glare anti-reflection member according to the present disclosure described above, and the anti-glare anti-reflection member is arranged so that the surface on the low refractive index layer side faces the opposite side to the resin plate or the glass plate.

[0140] The face plate for an image display device is preferably arranged so that the surface to which the antiglare and antireflection member is attached faces the front side. In other words, the face plate for an image display device is preferably arranged so that the surface to which the antiglare and antireflection member is attached faces the opposite side to the display element.

[0141] As the resin plate or glass plate, a resin plate or glass plate that is generally used as a front plate of an image display device can be used.

[0142] The thickness of the resin plate or glass plate is preferably 10 μm or more in order to increase the strength. The upper limit of the thickness of the resin plate or glass plate is usually 5000 μm or less, but in recent years, because thinner image display devices are preferred, the upper limit is preferably 1000 μm or less, more preferably 500 μm or less, and even more preferably 100 μm or less. The glass plate includes so-called "Ultra Thin Glass". Ultra Thin Glass is sold by, for example, Samsung Electronics and Nippon Electric Glass Co., Ltd.

[0143] [Image display device] The image display device of the present disclosure is configured by arranging the anti-glare anti-reflection member of the present disclosure described above on a display element so that the surface of the low refractive index layer faces away from the display element, and by arranging the anti-glare anti-reflection member on the surface.

[0144] Examples of the display element include EL display elements such as a liquid crystal display element, an organic EL display element, and an inorganic EL display element, a plasma display element, and further include LED display elements such as a micro LED display element and a mini LED. These display elements may have a touch panel function inside the display element. Examples of the liquid crystal display system of the liquid crystal display element include the IPS system, VA system, multi-domain system, OCB system, STN system, and TSTN system. When the display element is a liquid crystal display element, a backlight is required. The backlight is disposed on the opposite side of the liquid crystal display element from the side having the anti-glare film. Examples of the backlight include a backlight using quantum dots and a backlight using white light emitting diodes. The image display device may be a foldable image display device or a rollable image display device. The image display device may have a curved surface. The image display device may also be an image display device with a touch panel. EXAMPLES

[0145] The present disclosure will be specifically described below with reference to examples and comparative examples. Note that the present disclosure is not limited to the embodiments described in the examples.

[0146] 1. Evaluation and measurement The following measurements and evaluations were carried out on the antiglare and antireflection members obtained in the Examples and Comparative Examples. The results are shown in Table 2. Unless otherwise specified, the atmosphere during each measurement and evaluation was a temperature of 23±5°C and a relative humidity of 40% to 65%, and the target sample was exposed to the atmosphere for 30 minutes or more before each measurement and evaluation.

[0147] 1-1.Average of Δd Ten strip-shaped samples A1 were prepared by cutting the antiglare antireflection member to a size of just over 2 mm x 10 mm. Next, following the description of steps z2 to z10 in the main text of the specification, Δd, which indicates the difference in film thickness of the low refractive index layer within an area of ​​2 mm x 2 mm, was calculated for each of the ten samples A1, and the average value of these was taken as the average Δd. The results are shown in Table 2. Table 2 also shows the average film thickness at the peak points and the average film thickness at the bottom for the ten samples A1. In Table 2, "peak" indicates the average film thickness at the peak points, and "bottom" indicates the average film thickness at the bottom.

[0148] The surface shape in step z2 was measured using a white light interference microscope (New View 6300, Zygo Corporation) under the following conditions. The measurements were performed using the Microscope Application of MetroPro ver8.1.5, and the analysis was performed using the Microscope Application and Advanced Texture Application of MetroPro ver8.1.5. <Measurement conditions> Objective lens: ×2.5 Image Zoom:×2 [Measurement Controls] Acquisition Mode:Scan Camera Mode: 992×992 50Hz Subtract Sys Err:Off AGC:On Phase Res:High Connection Order:Location Discon Action: Filter Min Mod(%): 0.001 Min Area Size:7 Remove Fringes:On Number of Averages: 0 FDA Noise Threshold: 10 Scan Length: 15um bipolar Extended Scan Length: 1000 μm FDA Res: High Camera resolution (interval per point): 2.215μm Measurement area: 2175.3μm × 2175.3μm [Surface Map Controls] Removed: None Sphere Radius: 0nm Trim: 0 Trim Mode: All Data Fill: On Data Fill Max: 500 Filter: Off FilterType: Gauss Spline Filter Low Wavelen: 1100μm Filter High Wavelen: 200μm Filter Low Freq: 0.90909 1 / mm Filter High Freq: 5.00000 1 / mm

[0149] For cutting the embedded sample in process z7, the product named "Ultra Microtome EM UC7" manufactured by Leica Microsystems was used. The knife used was the product number "ULTRA 45°" of DiATOME, and the mesh used was the collodion film - attached mesh "Product number: 150 mesh Cu" of Nisshin EM.

[0150] For the scanning transmission electron microscope (STEM) in process z8, the product number "SU - 8000" manufactured by Hitachi High - Tech was used, and the observation conditions of the STEM were as follows. <Observation conditions of STEM> · Detector: TE · Acceleration voltage: 30kV · Emission: 10μA · Probe current: Normal Condenser lens 1:5.0

[0151] 1-2. Luminous reflectance Y value (reflectance) A black plate (Kuraray Co., Ltd., product name: COMOGLAS DFA2CG 502K (black) series, thickness 2 mm) was attached to the substrate side of the antiglare antireflection member of the Examples and Comparative Examples via a 25 μm thick transparent adhesive layer (Panac Corporation, product name: Panaclean PD-S1). The size of the sample was 5 cm × 5 cm. When the direction perpendicular to the surface of the low refractive index layer of the anti-glare anti-reflection component is defined as 0 degrees, light was incident on the sample from a direction of 5 degrees, and the luminous reflectance Y value was measured as the reflectance of the sample based on the specularly reflected light of the incident light. The reflectance was measured using a spectral reflectance meter (manufactured by JASCO Corporation, product name: V-7100) under conditions of a viewing angle of 2 degrees, C light source, and a wavelength range of 380 nm to 780 nm. The reflectance was then calculated as the visual reflectance Y value, which is calculated using software (JASCO Spectrum Manager Ver2.0) that converts the value into the brightness perceived by the human eye. Measurements were taken at 10 locations within the sample, and the average value of the 10 locations was used as the reflectance of each Example and Comparative Example. A mask measuring 5 mm x 10 mm was used during measurement. For this reason, the size of the measurement spot for reflectance at an incident angle of 5 degrees was 50.2 mm. 2 A reflectance of 1.5% or less was rated as "A," and a reflectance of more than 1.5% but less than 2.0 was rated as "B."

[0152] 1-3. Diagonal coloring The sample prepared in 1-2 was irradiated with light from a direction of 60 degrees using the same spectral reflectance measuring device as in 1-2, and the wavelength spectral reflectance of the sample in the wavelength range of 380 nm to 780 nm was measured based on the specular reflected light of the incident light. The measurement conditions were a viewing angle of 2 degrees and a C light source. A mask measuring 5 mm x 10 mm was used during the measurement. Therefore, the measurement spot size for reflectance at an incident angle of 60 degrees was 100.0 mm. 2 It is. When the minimum value of the spectral reflectance in the above wavelength range was defined as the bottom reflectance, the "reflectance at the red central wavelength (700 nm) / bottom reflectance," "reflectance at the green central wavelength (550 nm) / bottom reflectance," and "reflectance at the blue central wavelength (450 nm) / bottom reflectance" were each calculated, and the total value of these was then calculated. The closer the total value is to 3, the more the coloring in the diagonal direction is suppressed. A total value of 3.530 or less is the pass level, anything over 3.530 is rated "C", anything over 3.500 but less than 3.530 is rated "B", and anything less than 3.500 is rated "A".

[0153] 1-4. Bright spot The sample prepared in 1-2 was placed on a horizontal table with the low refractive index layer side facing upward, and the presence or absence of bright spots was visually evaluated from various angles where the reflected light of the fluorescent lamp as lighting was observed in a bright room environment. The bright room environment conditions were such that the illuminance on the low refractive index layer of the sample was 500 lux or more and 1000 lux or less. A Hf32 type straight tube three-wavelength neutral white fluorescent lamp was used as the lighting. The lighting position was 2 m above the horizontal table in the vertical direction. The evaluation was performed from a linear distance of about 50 cm above the sample. Furthermore, in the bright room environment, the presence or absence of bright spots was visually evaluated from various angles with the sample held in the hand and the distance between the sample and the face being 20 cm or more and 30 cm or less. A total of 20 subjects, 5 in each age group from their 20s to 50s, rated the bright spots on the following scale: 3 points for those that were not bothersome, 2 points for those that were neither bothersome nor bothersome, and 1 point for those that were bothersome. The average scores of the 20 subjects were calculated and ranked according to the following criteria. <Evaluation criteria> A: Average score of 2.5 or higher B: Average score is 2.0 or more but less than 2.5 C: Average score is less than 2.0

[0154] 1-5. Anti-glare property (AG) The sample prepared in 1-2 was placed on a horizontal table with the low refractive index layer side facing upward. In a bright room environment, a total of 20 subjects, 5 subjects in each age group from their 20s to 50s, visually evaluated whether the anti-glare properties were obtained to the extent that the subjects themselves were not bothered by the reflection, by visual observation from a linear distance of about 50 cm above the sample. The bright room environment conditions were such that the illuminance on the low refractive index layer of the sample was 500 lux or more and 1000 lux or less. For lighting, a Hf32-type straight tube three-wavelength daylight white fluorescent lamp was used. The lighting position was 2 m above the horizontal table in the vertical direction. In addition, a sample having the same configuration as the sample prepared in 1-2 but enlarged to A4 size was prepared. The A4-sized sample was used to evaluate the anti-glare properties in the same manner as above. The anti-glare properties were evaluated according to the following criteria. <Evaluation criteria> A: More than 14 people answered "good" B: 7 to 13 people answered "good" C: 6 or fewer people answered good

[0155] 1-6. Total light transmittance (Tt) and haze (Hz) The total light transmittance as defined in JIS K7361-1:1997 and the haze as defined in JIS K7136:2000 of the antiglare and antireflection members of the examples and comparative examples were measured using a haze meter (HM-150, manufactured by Murakami Color Research Laboratory). The light incident surface was the substrate side. For total light transmittance, 90% or more was rated "A" and less than 90% was rated "B." Haze was rated as "A" for 2.2% or less, "B" for between 2.2% and 5.0%, and "C" for over 5.0%.

[0156] 1-7. Tensile modulus and water vapor permeability of substrate The tensile modulus and water vapor permeability of the substrate were measured according to the description in the specification. Regarding the tensile modulus, substrates with a modulus of 3.5 GPa or more were rated as "A", and substrates with a modulus of 2.5 GPa or more and less than 3.5 GPa were rated as "B". Regarding the water vapor permeability, 2 / day or less is designated as "A", and 100g / m 2 / day or more was rated as "B".

[0157] 2. Synthesis of compound A (urethane acrylate oligomer) After introducing air gas into a reaction vessel equipped with a stirrer, a thermometer, a cooling tube, and a nitrogen gas inlet tube, 10.0 parts by mass of 1,3-butanediol, 10.0 parts by mass of 1,4-butanediol, 0.1 parts by mass of p-methoxyphenol, 0.1 parts by mass of dibutyltin dilaurate, and 100.0 parts by mass of methyl ethyl ketone were charged and heated to 50°C under a nitrogen flow while stirring. Meanwhile, 50.3 parts by mass of isophorone diisocyanate was charged into a dropping vessel and uniformly dropped into the reaction vessel over 1 hour. At that time, the reaction vessel temperature was kept at 50±3°C. After keeping the temperature for 1 hour with stirring, 0.1 parts by mass of p-methoxyphenol and 0.1 parts by mass of dibutyltin dilaurate were further added, and the temperature was raised to 60°C under a nitrogen flow while stirring. Thereafter, 176.0 parts by mass of a mixture of pentaerythritol triacrylate and pentaerythritol tetraacrylate in a mass ratio of 80 / 20 that had been placed in a dropping vessel was uniformly dropped into the reaction vessel over a period of 1 hour with stirring. After the dropwise addition was completed, the dropping container was washed with 120.0 parts by mass of methyl ethyl ketone, and the washed solution was directly poured into the reaction container. After further stirring and keeping warm for 2 hours, the temperature was raised to 75°C. Then, stirring and keeping were continued at 75±3°C until the peak derived from isocyanate in the infrared absorption spectrum disappeared. The peak derived from isocyanate disappeared in about 4 to 6 hours. After confirming the disappearance of this peak, the temperature was lowered to 60°C, 7.0 parts by mass of methanol was added, and the mixture was kept warm at 60±3°C for 30 minutes. Then, 120.8 parts by mass of methyl ethyl ketone was added, and a transparent resin solution was obtained. Finally, the solvent was removed using an evaporator, and a urethane acrylate oligomer, which is compound A, was obtained. The weight average molecular weight of the obtained compound A was 2000.

[0158] 3. Preparation of Coating Solution (1) Coating solution 1 for antiglare layer Per 100 parts by mass of the resin solid content of compound A, 5 parts by mass of a photopolymerization initiator (manufactured by IGM Resins BV, product name "ESACURE 1"), 1 part by mass of particles 1 (acrylic beads, average particle size 2.0 μm, coefficient of variation 10.4%, refractive index 1.535), and 1 part by mass of a leveling agent (manufactured by DIC, product name "F-568", solid content 5% by mass) were mixed. This mixture was diluted with a mixed solvent of methyl ethyl ketone and cyclopentanone in a mass ratio of 70 / 30 so that the solid content concentration became 50% by mass, to prepare coating solution 1 for antiglare layer.

[0159] (2) Coating solution 2 for antiglare layer Coating solution 2 for antiglare layer was prepared in the same manner as in (1), except that the content of particles 1 per 100 parts by mass of the resin solid content of compound A was changed to 3 parts by mass.

[0160] (3) Coating solution 3 for antiglare layer Coating solution 3 for antiglare layer was prepared in the same manner as in (1), except that particle 1 was changed to particle 2 (acrylic beads, average particle diameter 3.0 μm, coefficient of variation 9.8%, refractive index 1.535) and the content of particle 2 per 100 parts by mass of resin solid content of compound A was changed to 3 parts by mass.

[0161] (4) Coating solution 4 for antiglare layer Coating solution 4 for antiglare layer was prepared in the same manner as in (1), except that particle 1 was changed to particle 2 (acrylic beads, average particle diameter 3.0 μm, coefficient of variation 9.8%, refractive index 1.535) and the content of particle 2 per 100 parts by mass of resin solid content of compound A was changed to 5 parts by mass.

[0162] (5) Coating solution 5 for antiglare layer Coating solution 5 for antiglare layer was prepared in the same manner as in (1), except that particle 1 was changed to particle 3 (acrylic beads, average particle diameter 3.5 μm, coefficient of variation 10.7%, refractive index 1.535) and the content of particle 2 per 100 parts by mass of the resin solid content of compound A was changed to 5 parts by mass.

[0163] (6) Coating solution 6 for antiglare layer Coating solution 6 for antiglare layer was prepared in the same manner as in (1), except that particle 1 was changed to particle 2 (acrylic beads, average particle diameter 3.0 μm, coefficient of variation 9.8%, refractive index 1.535) and the content of particle 2 per 100 parts by mass of resin solid content of compound A was changed to 4 parts by mass.

[0164] (7) Coating solution 7 for antiglare layer Coating solution 7 for antiglare layer was prepared in the same manner as in (1), except that particle 1 was changed to particle 2 (acrylic beads, average particle diameter 3.0 μm, coefficient of variation 9.8%, refractive index 1.535) and the content of particle 2 per 100 parts by mass of resin solid content of compound A was changed to 2 parts by mass.

[0165] (8) Coating solution 1 for low refractive index layer Per 1 part by mass of resin solid content of compound (A), 0.1 parts by mass of photopolymerization initiator (manufactured by IGM Resins BV, trade name "Omnirad127"), 1.6 parts by mass of hollow silica particles (average particle size 60 nm, refractive index 1.212), 0.7 parts by mass of solid silica particles (average particle size 15 nm), and 0.01 parts by mass of leveling agent (manufactured by Shin-Etsu Silicone, trade name "X-22-164E") were mixed. This mixture was diluted with a mixed solvent of methyl isobutyl ketone and propylene glycol monomethyl ether acetate in a mass ratio of 70 / 30 so that the solid content concentration was 5% by mass, to prepare coating solution 1 for low refractive index layer.

[0166] (9) Coating solution 2 for low refractive index layer A coating solution 2 for a low refractive index layer was prepared in the same manner as in (8), except that the mixed solvent was changed to a mixed solvent of methyl isobutyl ketone and propylene glycol monomethyl ether propionate in a mass ratio of 70 / 30.

[0167] (10) Coating solution 3 for low refractive index layer Coating solution 3 for low refractive index layer was prepared in the same manner as in (8), except that the mixed solvent was changed to a mixed solvent of methyl ethyl ketone and propylene glycol monomethyl ether acetate in a mass ratio of 70 / 30.

[0168] (11) Coating solution 4 for low refractive index layer Per 1 part by mass of pentaerythritol triacrylate, 0.1 parts by mass of photopolymerization initiator (manufactured by IGM Resins BV, trade name "Omnirad127"), 1.6 parts by mass of hollow silica particles (average particle size 60 nm, refractive index 1.212), 0.7 parts by mass of solid silica particles (average particle size 15 nm), and 0.01 parts by mass of leveling agent (manufactured by Shin-Etsu Silicone, trade name "X-22-164E") were mixed. This mixture was diluted with a mixed solvent of methyl isobutyl ketone and propylene glycol monomethyl ether acetate in a mass ratio of 70 / 30 so that the solid content concentration was 5% by mass, to prepare coating solution 4 for low refractive index layer. (Coating solution 4 for low refractive index layer corresponds to coating solution 1 for low refractive index layer in which compound A was changed to pentaerythritol triacrylate.)

[0169] 4. Preparation and Fabrication of Polyester Film [Polyester film 1 (substrate used in Example 7)] 1 kg of PET (melting point 258°C, absorption center wavelength: 320 nm) and 0.1 kg of ultraviolet absorber (2,2'-(1,4-phenylene)bis(4H-3,1-benzoxazinon-4-one) were melt-mixed at 280°C in a kneader to produce pellets containing the ultraviolet absorber. The pellets and PET with a melting point of 258°C were fed into a single-screw extruder and melt-kneaded at 280°C, extruded from a T-die, and cast onto a cast drum with a surface temperature controlled at 25°C to obtain a casting film. The amount of ultraviolet absorber in the casting film was 1 part by mass per 100 parts by mass of PET. The obtained casting film was heated with a group of rolls set at 95°C, and then stretched 3.6 times in the machine direction while being heated from both sides of the film with a radiation heater so that the film temperature at the 180 mm point of the 480 mm stretching section was 103°C, and then cooled once. In Example 1, the time it takes for the casting film to pass through the stretching section in the machine direction is 0.192 seconds. The stretching section starts with stretching roll A and ends with stretching roll B, and each of stretching rolls A and B has two nip rolls. Next, both sides of this uniaxially stretched film were subjected to a corona discharge treatment in air to set the wetting tension of the base film to 55 mN / m, and the corona discharge-treated surfaces of both sides of the film were in-line coated with "a lubricity layer coating solution containing a polyester resin with a glass transition temperature of 18°C, a polyester resin with a glass transition temperature of 82°C, and silica particles with an average particle size of 100 nm" to form a lubricity layer. Next, the uniaxially stretched film was introduced into a tenter, preheated with hot air at 95°C, and then stretched 4.9 times in the film width direction at a temperature of 105°C in the first stage and 140°C in the second stage. Here, when the transverse stretching section was divided into two, the film was stretched in two stages so that the stretch amount of the film at the midpoint of the transverse stretching section was 80% of the stretch amount at the end of the transverse stretching section. The above-mentioned "stretch amount" means the difference between the film width at the measurement point and the film width before stretching. The transversely stretched film was heat-treated in the tenter stepwise with hot air at a heat treatment temperature of 180°C to 245°C, followed by 1% relaxation treatment in the width direction under the same temperature conditions, and further quenched to 100°C, followed by 1% relaxation treatment in the width direction, and then wound up to obtain a polyester film 1 having a thickness of 40 μm. According to the description in the specification, E of polyester film 1 0-20 The E of polyester film 1 was measured. 0-20 was 2.05 μm / g.

[0170] [Polyester film 2 (substrate used in Example 8)] A polyester film 2 having a thickness of 40 μm was obtained in the same manner as polyester film 1, except that the stretching section in the machine direction was changed from 480 mm to 460 mm and the stretching ratio in the width direction was changed from 4.9 times to 5.1 times. Note that the time it takes for the casting film in polyester film 2 to pass through the stretching section in the machine direction is 0.184 seconds. According to the description in the specification, E of polyester film 2 0-20 The E of polyester film 2 was measured. 0-20 was 1.89 μm / g.

[0171] [Polyester film 3 (substrate used in Example 9)] A polyester film 3 having a thickness of 40 μm was obtained in the same manner as polyester film 1, except that the stretching section in the machine direction was changed from 480 mm to 450 mm and the stretching ratio in the width direction was changed from 4.9 times to 5.3 times. Note that the time that the casting film passes through the stretching section in the machine direction in polyester film 3 is 0.180 seconds. According to the description in the specification, E of polyester film 3 0-20 The E of polyester film 3 was measured. 0-20 was 1.67 μm / g.

[0172] [Polyester film 4 (substrate used in Example 12)] As the polyester film 4, a commercially available biaxially stretched polyester film (Toyobo Co., Ltd., product name "Cosmoshine A4360", thickness: 50 μm) was prepared. According to the description in the specification, E of polyester film 4 0-20 The E of polyester film 4 was measured. 0-20 was 0.97 μm / g.

[0173] 5. Preparation of anti-glare and anti-reflection materials [Example 1] Substrate (triacetyl cellulose film with a thickness of 80 μm, in-plane phase difference: 2 nm, tensile modulus: 4.3 GPa, water vapor permeability: 487 g / m 2 / day), antiglare layer coating solution 1 was applied to the 2 After drying at 80°C for 30 seconds, the product was exposed to UV light at 100mJ / cm 2 The antiglare layer was formed with a dry thickness of 5 μm by irradiating the substrate with light. The direction of the dry air was approximately horizontal to the substrate conveying direction and opposite to the substrate conveying direction. The speed of the dry air was 30 m / s. The substrate conveying speed was 20 m / min. Next, the coating solution 1 for the low refractive index layer was applied onto the antiglare layer so that the wet mass was 2 g / m 2 After drying at 60°C for 30 seconds, the product was exposed to UV light at 200mJ / cm 2A low refractive index layer having an average thickness of 100 nm was formed by irradiating the substrate with light, thereby obtaining an antiglare and antireflection member of Example 1. The direction of the dry air was approximately parallel to the transport direction of the substrate and opposed to the transport direction of the substrate. The wind speed of the dry air was 25 m / s. In addition, between forming the antiglare layer and applying the coating liquid for the low refractive index layer, the substrate side was heated, and the substrate temperature was 40°C at the time when the coating liquid 1 for the low refractive index layer was applied onto the antiglare layer.

[0174] [Examples 2 to 6] Antiglare and antireflection members of Examples 2 to 6 were obtained in the same manner as in Example 1, except that the following coating liquid for an antiglare layer was used as the coating liquid for an antiglare layer. Coating solution for antiglare layer of Example 2: Coating solution for antiglare layer 2 Coating solution for antiglare layer of Example 3: Coating solution 3 for antiglare layer Coating solution for antiglare layer of Example 4: Coating solution for antiglare layer 4 Coating solution for antiglare layer of Example 5: Coating solution 6 for antiglare layer Coating solution for antiglare layer of Example 6: Coating solution 7 for antiglare layer

[0175] [Examples 7 to 12] Antiglare and antireflection members of Examples 7 to 12 were obtained in the same manner as in Example 3, except that the substrate was changed to the following substrate. Substrate of Example 7: Polyester film 1 (in-plane retardation: 502 nm, tensile modulus: 4.8 GPa, water vapor permeability: 58 g / m 2 / day, thickness: 40μm, E 0-20 :2.05μm / g, pencil hardness: F (5 times / 5 times)) Substrate of Example 8: Polyester film 2 (in-plane retardation: 982 nm, tensile modulus: 4.8 GPa, water vapor permeability: 55 g / m 2 / day, thickness: 40μm, E 0-20 :1.89μm / g, pencil hardness: F (5 times / 5 times)) Substrate of Example 9: Polyester film 3 (in-plane retardation: 1597 nm, tensile modulus: 4.9 GPa, water vapor permeability: 57 g / m 2 / day, thickness: 40μm, E 0-20:1.67μm / g, pencil hardness: F (4 times / 5 times)) Substrate of Example 10: Acrylic film having a thickness of 40 μm (in-plane phase difference: 3 nm, tensile modulus: 2.6 GPa, water vapor permeability: 85 g / m 2 / day, thickness: 40μm) Substrate of Example 11: Cycloolefin film having a thickness of 47 μm (in-plane retardation: 99 nm, tensile modulus: 3.0 GPa, water vapor permeability: 38 g / m 2 / day, thickness: 47μm) Substrate of Example 12: Polyester film 4 (in-plane retardation: 1899 nm, tensile modulus: 4.8 GPa, water vapor permeability: 55 g / m 2 / day, thickness: 50μm, E 0-20 :0.97μm / g, pencil hardness: 3B (5 times / 5 times))

[0176] <Pencil hardness> Polyester films 1 to 4, which are the substrates of Examples 7 to 9 and 12, were heated for 10 minutes at 100° C. A pencil hardness test was carried out on the heated polyester films. The pencil hardness test was conducted based on the pencil hardness test specified in JIS K5600-5-4:1999, but the load, speed, and evaluation conditions were changed from those specified in the JIS. Specifically, the load was 100g and the speed was 3mm / s. After applying the load to the polyester film sample, the test piece was heated again at 100°C for 10 minutes before visually evaluating the scratches. The heated sample was then visually evaluated for scratches. The evaluation criteria for passing were that the sample was not damaged three or more times out of five evaluations. For example, if the sample was not damaged three or more times out of five times with a hardness of 2B, the hardness of 2B was considered to be passing, and the test proceeded to the next hardness. In the explanation of the substrates of Examples 7 to 9 and 12 above, the pencil hardness of each sample is shown, and the number of evaluations in which the sample was not scratched out of five evaluations is also shown. When using a pencil hardness of F, the pass level is one in which no scratches are observed three or more times out of five evaluations.

[0177] [Comparative Example 1] An antiglare and antireflection member of Comparative Example 1 was obtained in the same manner as in Example 1, except that Coating Liquid 1 for Antiglare Layer was changed to Coating Liquid 5 for Antiglare Layer.

[0178] [Comparative Example 2] An antiglare antireflection member of Comparative Example 2 was obtained in the same manner as in Example 1, except that coating liquid 1 for antiglare layer was changed to coating liquid 4 for antiglare layer, and coating liquid 1 for low refractive index layer was changed to coating liquid 2 for low refractive index layer.

[0179] [Comparative Example 3] An antiglare and antireflection member of Comparative Example 3 was obtained in the same manner as in Example 1, except that Coating Liquid 1 for Low Refractive Index Layer was changed to Coating Liquid 3 for Low Refractive Index Layer.

[0180] [Comparative Example 4] An antiglare antireflection member of Comparative Example 4 was obtained in the same manner as in Example 1, except that coating liquid 1 for antiglare layer was changed to coating liquid 4 for antiglare layer, and coating liquid 1 for low refractive index layer was changed to coating liquid 4 for low refractive index layer.

[0181] [Comparative Example 5] An antiglare antireflection member of Comparative Example 5 was obtained in the same manner as in Example 1, except that heating was not performed from the substrate side between the formation of the antiglare layer and the application of the coating liquid for the low refractive index layer, and the substrate temperature at the time of applying the coating liquid 1 for the low refractive index layer onto the antiglare layer was changed to 20°C.

[0182] [Comparative Example 6] An antiglare antireflection member of Comparative Example 6 was obtained in the same manner as in Example 3, except that the direction of the drying air when drying the coating liquid for the low refractive index layer was changed to a direction perpendicular to the substrate and the air speed was changed to 10 m / s.

[0183] Some of the materials and production conditions for Examples 1 to 12 and Comparative Examples 1 to 6 are shown in Table 1.

[0184] [Table 1]

[0185] In Table 1, "PETA" means pentaerythritol triacrylate, "MIBK" means methyl isobutyl ketone, "PGM-A" means propylene glycol monomethyl ether acetate, and "PGM-P" means propylene glycol monomethyl ether propionate.

[0186] [Table 2]

[0187] From Tables 1 and 2, it can be seen that the antiglare and antireflection components of the examples in which the average Δd is 7.0 nm or more and 40.0 nm or less can suppress coloring when viewed from an oblique direction and can also suppress the visibility of localized bright spots. The overall evaluation in Table 2 is based on the following criteria. AA: All ratings are A or above. There is one A:B rating, and all other ratings are A or above. B: There are two B ratings, and all other ratings are A or above. C: At least one C grade or three or more B grades. [Explanation of symbols]

[0188] 100: Base material 200: Anti-glare layer 210: Binder resin 220: Particle 300: Low refractive index layer 1000: Anti-glare and anti-reflective materials 2000: Sample A1 11: Container 12: Receptor 21: Test liquid piping 22: Compressed air piping 23: Return piping 31, 32: Flowmeter 41, 42: Pressure gauge 50: Injection part 51: Nozzle 52: Cabinet 60: Cross-sectional profile acquisition section 70: Plastic film 81: Sample mounting stand 82:Support 100: Erosion rate measuring device ⇒ code 500 A1: Water A2: Spherical silica A3: Air A4: Worn plastic film

Claims

1. An antiglare antireflection member having an antiglare layer and a low refractive index layer on a substrate, wherein the in-plane retardation of the substrate is 2 nm or more and 1899 nm or less, and when the film thickness difference of the low refractive index layer within an arbitrary 2 mm × 2 mm region of the antiglare antireflection member is defined as Δd, the average of Δd is 7.0 nm or more and 40.0 nm or less. The antiglare antireflection member.

2. The antiglare antireflection member according to claim 1, wherein the antiglare layer contains a binder resin and particles.

3. The antiglare antireflection member according to claim 1 or 2, wherein the low refractive index layer contains a binder resin, hollow particles, and non-hollow particles.

4. The antiglare antireflection member according to claim 3, wherein the hollow particles are hollow silica particles and the non-hollow particles are non-hollow silica particles.

5. The antiglare antireflection member according to any one of claims 1 to 4, wherein the average film thickness of the low refractive index layer is 80 nm or more and 120 nm or less.

6. The antiglare antireflection member according to any one of claims 1 to 5, wherein the antiglare layer and the low refractive index layer are in contact with each other.

7. The antiglare antireflection member according to any one of claims 1 to 6, wherein the visual reflectance Y value measured at a light incident angle of 5 degrees from the side having the low refractive index layer is 3% or less.

8. The antiglare antireflection member according to any one of claims 1 to 7, wherein the haze of JIS K7136:2000 is 0.3% or more and 10% or less.

9. The antiglare antireflection member according to any one of claims 1 to 8, wherein the substrate is a plastic film.

10. A polarizing plate having a polarizer, a first transparent protective plate disposed on one side of the polarizer, and a second transparent protective plate disposed on the other side of the polarizer, wherein at least one of the first transparent protective plate and the second transparent protective plate is the antiglare antireflection member according to any one of claims 1 to 9, and the antiglare antireflection member is disposed such that the surface on the low refractive index layer side faces away from the polarizer. The polarizing plate.

11. A surface plate for an image display device formed by laminating an antiglare antireflection member on a resin plate or a glass plate, wherein the antiglare antireflection member is the antiglare antireflection member according to any one of claims 1 to 9, and the antiglare antireflection member is disposed such that the surface on the low refractive index layer side faces away from the resin plate or the glass plate. The surface plate for an image display device.

12. An image display device, wherein the surface on the low refractive index layer side of the antiglare antireflection member according to any one of claims 1 to 9 is disposed so as to face the side opposite to the display element, and the antiglare antireflection member is disposed on the surface.