Device and method using sterilization or washing liquid

Abstract

To guarantee a sterilization or a washing function without having to increase pressure resistance, in a device and a method for sterilizing or washing a filling machine.SOLUTION: The device comprises: a temperature control part configured to allow heating of the liquid used for sterilizing or washing the filling machine; a circulation path configured to enable the liquid to circulate between the temperature control part and the filling machine; a pumping part that pumps the liquid in the circulation path; and a control part that generates a command. In a process where a temperature of the liquid rises while the circulation path is in a sealed state, the control part gives the command to the pumping part based on an internal pressure in a portion of the filling machine to decrease a flow rate of the liquid.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present disclosure relates to an apparatus and method for sterilizing or cleaning a filling machine by supplying a liquid for sterilization or cleaning that is to be heated to the filling machine.

Background Art

[0002] For example, a aseptic filling machine for filling a product liquid such as a beverage into a container is provided with a sterilization and cleaning device for stationary sterilization and stationary cleaning of the inside of a filling tank and a filling valve (for example, Patent Document 1). When the production of a product is finished, the discharge part of the filling valve is closed by a lid member, and a predetermined path is set including the inside of the filling tank and the filling valve. When performing stationary cleaning and stationary sterilization of the filling machine using a liquid such as water or a chemical, the sterilization and cleaning device supplies the liquid to the predetermined path for a predetermined time while monitoring at least the temperature of the liquid. Note that stationary cleaning and stationary sterilization may be performed sequentially, or may be performed in parallel and simultaneously.

[0003] The sterilization and cleaning device includes a heat exchanger, a pump, a valve, and a measuring instrument for measuring the temperature, concentration, and flow rate of the liquid. The high-temperature liquid heated to the temperature required for cleaning and sterilization by heat exchange with steam by the heat exchanger is supplied to the filling machine, fills the inside of the filling tank, and then returns from the filling machine to the sterilization and cleaning device through the return path. The high-temperature liquid is circulated through a closed circuit between the sterilization and cleaning device and the filling machine.

Prior Art Documents

Patent Documents

[0004]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0005] In order to enhance the sterilization and cleaning capabilities, the liquid used for stationary sterilization or stationary cleaning is heated to a temperature well above, for example, 100°C. To prevent the liquid from boiling and to stably pump the liquid by a pump, the circulation path including a filling tank and a filling valve is made airtight before the liquid is heated by closing the air release valve.

[0006] When the liquid circulating in the airtight state is heated, the internal pressure of the circulation path increases as the temperature of the liquid rises. Therefore, if the internal pressure of, for example, the filling tank may exceed the pressure resistance, the sterilization and cleaning device cannot be operated. In that case, since it is necessary to adopt members with higher pressure resistance specifications, the filling machine becomes larger and the equipment cost increases. An object of the present invention is to provide an apparatus and a method for sterilizing or cleaning a filling machine, which do not require increasing the pressure resistance and ensure the sterilization or cleaning ability.

Means for Solving the Problems

[0007] The apparatus according to the present disclosure includes a temperature control unit configured to be able to heat the liquid used for sterilizing or cleaning the filling machine, a circulation path configured to be able to circulate the liquid between the temperature control unit and the filling machine, a pumping unit for pumping the liquid in the circulation path, and a control unit for generating a command, During the process in which the liquid is heated while the circulation path is airtight, the control unit gives a command to the pumping unit to reduce the flow rate of the liquid based on the internal pressure in a part of the filling machine.

[0008] Further, the present disclosure is a method for sterilizing or cleaning a filling machine using a heated liquid, including a step of pumping the liquid used for sterilization or cleaning by a pumping unit and circulating the liquid through an airtight circulation path between a temperature control unit configured to be able to heat the liquid and the filling machine, and a temperature raising step of raising the temperature of the liquid by the temperature control unit while circulating the liquid, In the temperature raising step, Based on the internal pressure in a part of the filling machine, a command is given to the pumping unit to reduce the flow rate of the liquid.

Advantages of the Invention

[0009] The present disclosure heats the liquid while circulating it in a sealed state, and based on the internal pressure in a part of the filling machine during the temperature rise process of the liquid, a command is given to the pumping unit to reduce the flow rate of the liquid. As a result, the internal pressure of the circulation path can be suppressed with respect to the pressure resistance. According to the present disclosure, while ensuring the sterilization ability or cleaning ability corresponding to the heating temperature of the liquid, an increase in internal pressure during the temperature rise process of the liquid can be suppressed, and the internal pressure of the circulation path can be suppressed lower than the pressure resistance. Since it is not necessary to increase the pressure resistance of the circulation path, enlargement of the equipment can be avoided and the equipment cost can be suppressed.

Brief Description of the Drawings

[0010]

Figure 1

Figure 2

Figure 3

Figure 4

Figure 5

Figure 6

Figure 7

Figure 8

Figure 9

Figure 10

Figure 11

Figure 12

Figure 13

Mode for Carrying Out the Invention

[0011] Hereinafter, an embodiment will be described with reference to the accompanying drawings. [First Embodiment] [Outline Configuration] FIG. 1 shows a sterilizing and cleaning device 1 and a filling machine 2. The filling machine 2 constitutes a production line for products such as beverage products, and fills a product liquid into a container (not shown) in a sterile state. The filling machine 2 fills the product liquid stored in the filling tank 20 into the container by means of a filling valve 21.

[0012] During non-production of the product, the sterilizing and cleaning device 1 uses a liquid L (FIG. 2) as a cleaning medium or a sterilizing medium to clean and sterilize the inside of the filling tank 20, the filling valve 21, and the piping. The liquid L corresponds to, for example, water or a chemical such as an aqueous solution of sodium hydroxide. The cleanliness of the water and the type of chemical are selected according to the type of the product liquid and the use of the liquid L. Examples of the use of the liquid L include rinsing, raising the temperature of the piping etc. before cleaning, sterilization, and cleaning of oil and fat components.

[0013] According to the sterilization and cleaning device 1, it is possible to perform in-place cleaning (CIP; Cleaning In Place) and in-place sterilization (SIP; Sterilization In Place) of the filling machine 2. It is also possible to perform in-place cleaning and sterilization (CSIP; Cleaning Sterilization In Place) in which CIP and SIP are performed in parallel and simultaneously.

[0014] 〔Configuration of Filling Machine〕 The configuration of the filling machine 2 will be described. The filling machine 2 is, for example, a rotary filling machine, and includes a plurality of filling valves 21 provided on a rotating body (not shown), and a filling tank 20 that stores the product liquid and supplies the product liquid to each filling valve 21 through a pipe (not shown). The filling tank 20 may be provided on the rotating body and rotate around the shaft portion of the rotating body, or may be fixed to a base separated from the rotating body. While rotating the rotating body of the filling machine 2, in-place cleaning and in-place sterilization can be performed.

[0015] During in-place cleaning and sterilization, the inside of the filling tank 20 is entirely filled with the liquid L used for cleaning and sterilization. On the other hand, during product production, a gas phase region 20A exists above the liquid level 20B inside the filling tank 20. The inside of the filling tank 20 is preferably pressurized to a pressure higher than atmospheric pressure by introducing an inert gas such as nitrogen gas, or by introducing carbon dioxide gas when the product liquid contains carbon dioxide gas. For this pressurization, for example, an N 2 supply source or a CO 2 supply source is connected to the gas introduction pipe 22 provided in the filling tank 20. Also, a compressed air supply source is connected to the gas introduction pipe 22 to drain water for rinsing or the like from the filling tank 20 and the pipes.

[0016] The filling tank 20 is provided with a pressure sensor 23 capable of detecting the pressure in the gas phase region 20A. It is also preferable that the filling tank 20 is provided with a liquid level sensor 24 for detecting the liquid level and a temperature sensor 25 for detecting the temperature of the stored liquid.

[0017] The filling tank 20 is arranged above the position of the filling valve 21. The product liquid stored in the filling tank 20 is supplied from the filling tank 20 to the filling valve 21 by its own weight and the internal pressure of the filling tank 20. The filling valve 21 discharges a specified amount of product liquid to the product by driving a valve body (not shown) using, for example, compressed air. It is preferable that a temperature sensor 26 is provided in the filling valve 21.

[0018] The filling machine 2 is provided with a valve device 30 for supplying the product liquid, water, chemicals, etc. used for cleaning and sterilization to the filling tank 20. The sterilization and cleaning device 1 also cleans and sterilizes the inside of the valve device 30 provided in the filling machine 2. The control unit 15 of the sterilization and cleaning device 1 can control the switching state of the valves of the valve device 30.

[0019] The valve device 30 is composed of a single or a plurality of members (not shown). The member may be a rotary joint. It is preferable that a control valve 27 capable of adjusting the flow rate is provided between the valve device 30 and the filling tank 20.

[0020] As shown in an example of the configuration in FIG. 1, the valve device 30 includes a first valve block 31 and a second valve block 32. The valve blocks 31 and 32 may be all or part of the regions of the members. The first valve block 31 is connected to the filling tank 20 via the second valve block 32. During product manufacturing, the port 321 of the second valve block 32 is open, and the product liquid is supplied to the filling tank 20 through this port 321. The port 321 is connected to a product liquid tank (not shown).

[0021] 〔Configuration of the sterilization and cleaning device〕 Referring to FIG. 2, the configuration of the sterilization and cleaning device 1 will be described. FIG. 2 shows the state during stationary cleaning or stationary sterilization with the same configuration as FIG. 1. The sterilization and cleaning device 1 includes a balance tank 11 that stores a liquid L used for cleaning and sterilization, a pump 12 as a liquid-feeding unit that pumps the liquid L, a heat exchanger 13 as a temperature control unit configured to heat the liquid L, a circulation path C configured to circulate the liquid L, and a control unit 15 that generates commands.

[0022] The balance tank 11 stores the liquid L supplied through an introduction pipe 111 from a supply source of the liquid L (not shown). Inside the balance tank 11, a gas phase region 11A exists above the liquid level 11B during product manufacturing and during stationary cleaning and sterilization. The balance tank 11 is provided with a valve 11V that can be switched between a state where the inside of the balance tank 11 is open to the atmosphere and a state where it is blocked from the atmosphere and sealed.

[0023] Although detailed illustration is omitted, the pump 12 includes a pump body that includes a member capable of rotational movement or reciprocating movement, and a motor that drives the pump body. The pump 12 inhales and discharges the liquid L by the rotational movement or reciprocating movement of the member. The pump 12 of the present embodiment is disposed between the balance tank 11 and the heat exchanger 13 in the circulation path C, and pumps the liquid L from the heat exchanger 13 toward the filling machine 2.

[0024] The pump 12 of the present embodiment is configured such that the flow rate (discharge flow rate) of the discharged liquid L is variable by adjusting the operating speed such as the rotational speed of the member. Along with the change in the discharge flow rate, the pressure (discharge pressure) of the liquid L discharged from the pump 12 also changes. For example, by giving a command from the control unit 15 to the drive circuit of the motor of the pump 12 and increasing the frequency of the drive current applied to the motor, or the duty ratio, etc., the discharge flow rate and discharge pressure of the liquid L discharged from the pump 12 can be increased.

[0025] Alternatively, the pump 12 may be a variable displacement type, and for example, the discharge flow rate and discharge pressure may be configured to be variable by adjusting the swash plate angle or the like. As a liquid-feeding unit for feeding the liquid L, a fixed-displacement pump and a flow rate adjustment valve (not shown) capable of adjusting the flow rate of the liquid L discharged from the pump can also be used. In this case, the flow rate of the liquid L discharged from the liquid-feeding unit can be adjusted by performing flow rate adjustment based on a command from the control unit 15 to the flow rate adjustment valve.

[0026] The heat exchanger 13 heats or cools the first fluid by heat-exchanging the first fluid flowing through the first flow path 131 and the second fluid as a heat medium or a refrigerant flowing through the second flow path 132. For example, when the liquid L flows through the first flow path 131 and the steam V supplied from a steam source (not shown) flows through the second flow path 132, the liquid L is heated. By increasing the flow rate of the steam V, the temperature of the liquid L can be raised to a higher temperature.

[0027] The sterilization and cleaning apparatus 1 of the present embodiment secures the required sterilization ability by raising the temperature of the liquid L to a temperature sufficiently exceeding 100°C, for example, 120°C or higher (130°C as an example) during steady sterilization. Therefore, during stationary sterilization, in order to prevent the boiling of the liquid L and stably feed the liquid by the pump 12, the circulation path C is sealed by closing the valve 11V and valves (not shown) of the discharge unit D.

[0028] In order to adjust the temperature of the liquid L by adjusting the flow rate of the steam V, it is preferable to detect the temperature of the liquid L flowing into the heat exchanger 13 by the temperature sensor 13A and detect the temperature of the liquid L flowing out of the heat exchanger 13 by the temperature sensor 13B.

[0029] The circulation path C includes a forward path C1 through which the liquid L travels from the balance tank 11 to the filling tank 20 of the filling machine 2 via the pump 12, the heat exchanger 13, and the valve device 30, and a return path C2 through which the liquid L supplied to the filling machine 2 by the forward path C1 is returned from the filling valve 21 to the balance tank 11.

[0030] By the operation of the filling machine 2 for switching from product manufacturing to stationary cleaning and sterilization, the discharge port of the filling valve 21 is blocked by a member (not shown), and the internal flow path of the filling valve 21 communicates with the return path C2 by switching a flow path (not shown) provided in the filling valve 21. At the same time, by a command given from the control unit 15 to the valve device 30, the opening / closing state of the valve of the valve device 30 is switched to a state in which the liquid L passes through the valve device 30 from the heat exchanger 13 toward the filling tank 20. Then, the circulation path C is configured to enable the circulation of the liquid L between the sterilization and cleaning device 1 and the filling machine 2.

[0031] In the present embodiment, the liquid L is pumped through the circulation path C by a pump 12 disposed only in the forward path C1 in the circulation path C. The liquid L discharged from the pump 12 and passing through the inside of the filling machine 2 is sucked into the pump 12 via the return path C2 and the balance tank 11. Since no member with a large resistance such as the heat exchanger 13 is disposed in the return path C2, the return path C2 has a smaller pressure loss than the forward path C1.

[0032] Also, near the end of the return path C2, a discharge part D for discharging the liquid L used for purposes such as rinsing is provided. On the filling machine 2 side of the discharge part D in the return path C2, a temperature sensor 16, a concentration meter 17, and a flow meter 18 for measuring and detecting the temperature, concentration, and flow rate of the liquid L, respectively, are provided. A pressure sensor 19 may be provided at this location. The concentration meter 17 needs to be provided at least near the discharge part D of the circulation path C in order to judge the end of replacement during rinsing based on the concentration of the liquid L. The flow meter 18 is provided downstream of the filling machine 2, so that a flow rate sufficient to sufficiently clean the inside of the filling machine 2 can be ensured based on the flow rate of the liquid L.

[0033] As the concentration meter 17, a conductivity meter is typically used based on the correlation between the conductivity of the liquid L as an aqueous solution containing a chemical component contributing to sterilization or cleaning and the concentration of the chemical. Here, since there is also a correlation between the conductivity of the liquid L and the temperature, the control unit 15 measures the concentration of the liquid L in a timely manner in the process of stationary cleaning and sterilization as described later, and adjusts the concentration of the liquid L to the target concentration. The sterilization and cleaning apparatus 1 preferably includes a concentration adjustment unit 17C configured to be able to adjust the concentration of the liquid L by adding or diluting the chemical component. The concentration adjustment unit 17C is connected so that the stock solution of the chemical or water can be introduced into the path through which the liquid L flows. The concentration adjustment unit 17C may be connected to the balance tank 11 as shown in FIG. 1, for example, or may be connected to the pipe between the balance tank 11 and the pump 12.

[0034] 〔Establishment conditions for stationary cleaning and sterilization〕 In the present embodiment, the stationary cleaning and stationary sterilization are established, for example, when the following physical quantities all satisfy the following requirements. The following establishment conditions are applicable when stationary sterilization is started after the completion of stationary cleaning, etc., when stationary cleaning and stationary sterilization are performed separately and sequentially with a time shift, and are also applicable when stationary cleaning and sterilization (CSIP) are performed in parallel and simultaneously.

[0035] (Establishment conditions CC for stationary cleaning) Temperature of the liquid L: T 1 Above (for example, 80 °C or higher) Concentration of the liquid L: M 1 Above (for example, volume concentration 3% or higher) Flow rate of the liquid L: Q 1 Above Time satisfying all of the above three requirements: t 1 (For example, 10 minutes) When water is used as the liquid L, the concentration requirement is excluded from the establishment conditions.

[0036] (Establishment conditions SC for stationary sterilization) Temperature of the liquid L: T 2 Above (for example, 130 °C) Time t that satisfies the above requirements 2 (For example, for 30 minutes)

[0037] From the establishment conditions of the stationary cleaning and sterilization of this embodiment, during stationary sterilization (SIP) or during stationary cleaning and sterilization (CSIP) performed in parallel with stationary cleaning and stationary sterilization, the liquid L is heated to a temperature T exceeding 100°C 2 In this case, prior to the temperature rise of the liquid L, the circulation path C is set to a closed circuit state. Then, due to the volume increase accompanying the temperature rise of the liquid L and the increase in the saturated vapor pressure in the balance tank 11, the liquid L in the circulation path C is pressurized to a pressure higher than the atmospheric pressure, so that boiling of the liquid in the circulation path C can be avoided

[0038] [An example of the control of stationary cleaning and sterilization (CSIP)] Referring to FIGS. 3 to 10, an example of the procedure of CSIP using a chemical agent as the liquid L will be described FIG. 3 corresponds to the step of circulating the chemical agent in CSIP and corresponds to FIGS. 5 to 7 in terms of the circuit diagram of the liquid delivery. In FIGS. 6 and 7, the closed valve 11V is shown in black The temperature T shown in FIG. 3 is detected by temperature sensors 13A, 13B, 16, 25, and 26. The flow rate Q is measured by the flow meter 18. The pressure P (internal pressure) inside the filling tank 20 is measured by the pressure sensor 23 of the filling tank 20 The sterilization condition SC indicates the integrated time measured up to the sterilization time t 2 The cleaning condition CC indicates the integrated time measured up to the cleaning time t 1 up to the integrated time measured

[0039] Typically, prior to the use of the chemical agent, as shown in FIG. 4, a rinsing step is performed using water W at room temperature or heated (for example, about 60°C). In the rinsing step, while supplying water W from a source (not shown) of water W to the balance tank 11 through the introduction pipe 111 for a predetermined rinsing time, the pump 12 is driven to pump the water W while the discharge part D is open

[0040] When the rinsing process (Figure 4) is completed, as shown in Figure 5, the inside of the pipe is replaced from water W to liquid L (chemical), and liquid L is circulated. At the start of this chemical circulation process, while supplying liquid L to the balance tank 11, a command for a constant rotational speed is given to the motor of the pump 12 to drive it at a constant discharge flow rate and discharge pressure (liquid feeding start step S01 in Figure 3). Then, for a predetermined time until the replacement from water W to liquid L is completed, water W is pushed out by liquid L and discharged from the discharge part D. After that, the supply of liquid L to the balance tank 11 is stopped, and liquid L spread throughout the entire circulation path C is circulated at a constant flow rate Q (circulation start step S02 in Figure 3, Figure 6). The flow rate Q is the flow rate Q of the cleaning conditions CC 1 That's all.

[0041] Simultaneously with the start of the circulation of liquid L, or before or after the start of the circulation, the valves 11V of the balance tank and the valve of the discharge part D are closed according to the command of the control unit 15 to make the circulation path C in a sealed state (sealing step S03). Furthermore, as shown in Figure 6, by supplying steam V to the second flow path 132 of the heat exchanger 13, the temperature increase of liquid L is started (first temperature increase start step S04). In order to prevent the boiling of liquid L and pressurize liquid L, it is preferable to make the circulation path C in a sealed state while liquid L is still at room temperature as much as possible without a large delay in the start of the temperature increase. Also, in order to suppress the influence on the temperature control of liquid L, it is preferable to make the circulation path C in a sealed state while liquid L is still at room temperature as much as possible.

[0042] When liquid L is heated in the sealed circulation path C, the pressure inside the circulation path C, including the pressure P inside the filling tank 20, increases. When the temperature T of liquid L reaches the temperature T of the cleaning conditions CC 1 the control unit 15 stabilizes the liquid temperature at the temperature T 1 or higher by adjusting the flow rate of steam V. The control unit 15 determines that the concentration M of liquid L is the concentration M of the cleaning conditions CC 1 or higher, the temperature T of liquid L is the temperature T of the cleaning conditions CC 1 or higher, and the flow rate Q of liquid L is the flow rate Q of the cleaning conditions CC 1If it is determined that the above conditions are met, the measurement of the cleaning time t 1 is started (cleaning time measurement start step S05).

[0043] The measurement and adjustment of the concentration of the liquid L containing the chemical component are performed by the control unit 15 when the temperature of the liquid L is 100 °C or lower. Here, from the start of the temperature increase of the liquid L (step S04), while measuring the concentration of the liquid L with the concentration meter 17, the concentration adjustment of the liquid L is started by the concentration adjustment unit 17C to which a command is given by the control unit 15 (concentration adjustment step Sa). Then, prior to reaching a temperature exceeding 100 °C due to the temperature increase of the liquid L, at the start of the temperature increase (step S06) toward the temperature T 2 during stationary sterilization, the adjustment of the concentration is completed by adjusting the concentration of the liquid L to the target concentration M 1 (concentration adjustment end step Sb). The start of the measurement of the cleaning time t 1 is performed after the completion of the concentration adjustment. Note that 100 °C exists between the temperature T 1 and the temperature T 2 .

[0044] The control unit 15 can measure the concentration M based on the data showing the correlation between the conductivity and the concentration indicated by the concentration meter 17 provided in the temperature region of 100 °C or lower. The conductivity correlates not only with the concentration M of the liquid L but also with the temperature T of the liquid L. If the measurement and adjustment of the concentration M are performed using the concentration meter 17 in a temperature region exceeding 100 °C, since the concentration has to be derived from the conductivity indicated by the concentration meter 17 using the data provided in the temperature region of 100 °C or lower, as a result of performing the concentration adjustment based on the conductivity indicated by the concentration meter 17, which is higher than the conductivity corresponding to the temperature region of the data, the actual concentration M of the liquid L becomes lower than the target concentration M 1 . Therefore, as described above, prior to reaching a temperature exceeding 100 °C due to the temperature increase of the liquid L, the adjustment of the concentration is completed by adjusting the concentration M of the liquid L to the target concentration M 1 (step Sb), and after the completion of the adjustment of the concentration M (step Sb), in the example shown in FIG. 3, simultaneously with Sb, the cleaning time t 1Start the timing (step S05). By doing so, it is possible to reliably clean the inside of the filling machine 2 while avoiding cleaning failures. When the temperature T is 100 °C or in the vicinity thereof, for example, 85 - 95 °C, it is preferable that the concentration M is adjusted to the target concentration M 1 If the concentration M is at or above the target concentration M 1 at that time, it can be said that the concentration requirement is satisfied even if the temperature T exceeds 100 °C.

[0045] In the example shown in FIG. 3, since stationary sterilization is performed in combination with stationary cleaning, when the timing of the cleaning time t 1 starts, the temperature rise starts toward the temperature T 2 which is the temperature requirement for stationary sterilization (second temperature rise start step S06). As the liquid L further rises in temperature, the pressure inside the circulation path C including the filling tank 20 further increases.

[0046] Here, the pressure increase from the pressure (atmospheric pressure) in the gas phase region 11A of the balance tank 11 before sealing to the saturated vapor pressure in the balance tank 11 increased by the temperature rise of the liquid L in the sealed state is applied to the inside of the circulation path C. Then, in the temperature rise process HP of the liquid L, the pressure P inside the filling tank 20 increases significantly compared to the pressure inside the balance tank 11. The reason is that, unlike the balance tank 11, there is no compressible gas phase region 20A inside the filling tank 20 during stationary cleaning and sterilization, and the pipe pressure loss from the outlet of the filling tank 20 to the balance tank 11 and the pressure corresponding to the internal pressure of the balance tank 11 are applied to the filling tank 20. When the pressure in the balance tank 11 increases due to P, the internal pressure of the filling tank 20 approaches the pressure resistance. If the circulation path C is sealed, even if the temperature T 2 is less than 100 °C, the residual pressure and the increase in the pressure in the balance tank 11 due to the temperature rise cause the pressure P inside the filling tank 20 to increase. The higher the temperature T of the liquid L, the greater the pressure P increases.

[0047] Therefore, in the temperature rise process HP in which the liquid L rises in temperature, the control unit 15 takes into account the pressure resistance of the filling tank 20 and a preset upper limit value P1 When the pressure P reaches [a certain value], a command is given to the pump 12 to reduce the flow rate Q of the liquid L, so as to control the pressure P not to exceed the pressure resistance. When the flow rate Q decreases, the pressure P in the filling tank 20 decreases, and when the flow rate Q increases, the pressure P in the filling tank 20 increases.

[0048] In order to reduce the flow rate Q, a command to reduce the discharge flow rate is given from the control unit 15 to the pump 12 (flow rate reduction step S07). Note that the command to reduce the discharge flow rate corresponds to the command to reduce the discharge pressure. For example, the control unit 15 gives a command to reduce the drive frequency of the motor of the pump 12 by a predetermined frequency (for example, several Hz). After giving a command to the pump 12, the control unit 15 may use a timer to keep the inside of the circulation path C in a balanced state as much as possible without giving the next command for a predetermined time (for example, from several seconds to about 20 seconds). Although not shown in FIG. 3, when the flow rate Q decreases, the rate of increase in the temperature T slightly decreases. Through this, the rate of increase in the pressure P in the filling tank 20 slightly decreases.

[0049] Although the pressure P decreases due to the decrease in the flow rate Q, since the temperature T of the liquid L is rising, the pressure P rises again. Therefore, when the pressure P reaches the upper limit value P 1 the control unit 15 gives a command to the pump 12 to reduce the discharge flow rate and discharge pressure so as to further reduce the flow rate Q. This is repeated several times until the liquid L reaches the temperatures T 2 and T 3 By gradually reducing the flow rate Q step by step, the pressure P in the filling tank 20 can be kept lower than the pressure resistance.

[0050] In order to suppress the influence on the temperature control of the liquid L, it is preferable to avoid a sudden change in the flow rate Q. However, it is not necessarily required to reduce the flow rate Q step by step, and it is also possible to gradually and steplessly reduce the flow rate Q while the control unit 15 monitors the pressure P and the temperature T.

[0051] By reducing the flow rate Q, the flow rate Q becomes the required flow rate Q of the cleaning condition CC 1falls below, or the temperature T of the liquid L is less than the required temperature T 1 , the timing of the cleaning time t 1 is interrupted (cleaning time timing interruption step S08). The remaining time of the cleaning time t 1 is timed after the flow rate Q is restored.

[0052] When the temperature T of the liquid L reaches the temperature T of the stationary sterilization condition SC 2 , the control unit 15 maintains the temperature T at T 2 or higher (for example, T 3 ), and starts the timing of the sterilization time t 2 (sterilization time timing start step S09). Here, since the higher the temperature T of the liquid L, the higher the sterilization time efficiency, by raising the temperature of the liquid L to T 3 and performing sterilization, the sterilization time t 2 can be shortened. The temperature increase process HP in which the liquid L is heated by the heat exchanger 13 and the temperature of the liquid L rises (the step of raising the temperature of the liquid L) corresponds to the period from the first temperature increase start step S04 until the liquid L reaches the target temperature (here, the temperature T 2 ). When the temperature T of the liquid L is maintained at T 2 or higher and the sterilization time t 2 elapses, the stationary sterilization condition SC is established (sterilization condition establishment step S10).

[0053] Since the sterilization process ends as described above, as shown in FIG. 7, by supplying a refrigerant R such as cold water to the second flow path 132 of the heat exchanger 13, the cooling of the liquid L is started (cooling start step S11). In order to promote the cooling of the liquid L to the necessary extent, while lowering the temperature T of the liquid L, and within the limit that the pressure P of the filling tank 20 does not exceed the pressure resistance, the flow rate Q may be increased stepwise, for example, in the same manner as the above-described flow rate reduction step S07 (flow rate increase step S12).

[0054] In order to suppress the influence on the temperature control of the liquid L, it is preferable that the circulation path C is kept in a sealed state throughout the cooling process CP of the liquid L by the heat exchanger 13.

[0055] The flow rate Q reaches the required flow rate Q of the cleaning condition CC 1 and the temperature T reaches the temperature T of the cleaning condition CC 1 and the concentration M measured at a liquid temperature of 100 °C or lower is the concentration M of the cleaning condition CC 1 When it is above, resume the timing of the interrupted cleaning time t 1 (Cleaning time timing resume step S13). The temperature T at this time may be, for example, less than 100 °C and about 90 °C. When the remaining time of the cleaning time t 1 elapses, the integrated measured time reaches the cleaning time t 1 so that the cleaning condition CC is satisfied (cleaning condition satisfaction step S14). In the example shown in FIG. 3, the chemical circulation process ends when the cleaning condition CC is satisfied (chemical circulation process end step S15). By timing the cleaning time t 1 in parallel with the cooling of the liquid L, the non-production time can be shortened. However, when the flow rate Q reaches the required flow rate Q of the cleaning condition CC in the cooling process CP 1 and the temperature T is close to the temperature T of the cleaning condition CC 1 as shown in FIG. 3, interrupt the cooling of the liquid L and keep the temperature T at the temperature T 1 or higher while resuming the timing of the cleaning time t 1 would be appropriate.

[0056] After that, as shown in FIG. 8, it is possible to shift to the step of rinsing the chemical with the sterile water W1. In this sterile water rinsing step, sterile water W1 is supplied from the port 311 of the first valve block 31 to the pipe of the forward path C1, and the liquid L is pushed by the sterile water W1 and discharged from the discharge part D. Thereby, the section from the first valve block 31 to the discharge part D is replaced from the liquid L to the sterile water W1. The supply and discharge of the sterile water W1 can be performed for a predetermined time necessary to sufficiently rinse the chemical.

[0057] Next, as in the water draining process shown in Fig. 9, sterile air (sterile compressed air) is introduced into the filling tank 20 through the gas introduction pipe 22, and the inside of the filling tank 20 is pressurized to remove the sterile water W1 from the inside of the forward path C1 and the return path C2. The sterile air pushes the sterile water W1 from the filling tank 20 toward the discharge part D of the return path C2 and discharges it from the discharge part D, and also pushes the sterile water W1 from the filling tank 20 toward the discharge part 312 of the first valve block 31 of the forward path C1 and discharges it from the discharge part 312. When the water draining is completed, the valves of the discharge part 312 and the discharge part D are closed respectively to maintain the sterile state.

[0058] After that, as shown in Fig. 10, the supply of the product liquid to the filling machine 2 is started through the port 321 of the second valve block 32, and the manufacturing process is entered. At this time, the liquid L existing in the section between the valve 313 of the first valve block 31 and the balance tank 11 is discharged from the discharge part D by a rinsing process (not shown). In the rinsing process, the liquid L is pushed out from the discharge part D by the water supplied to the balance tank 11 through the introduction pipe 111. Thus, a series of processes related to the in-place cleaning and sterilization (CSIP) are completed.

[0059] 〔An example of the control of in-place cleaning (CIP)〕 When only in-place cleaning is performed without performing in-place sterilization at the same time, for example, after performing the rinsing process (Fig. 4), after the replacement from water W to liquid L (Fig. 5), the liquid L is circulated through the circulation path C while being heated to the temperature T 1 above (Fig. 6). The liquid L may be water as well as not limited to the chemical agent. Here, when the temperature T 1 is less than 100°C, it is not necessarily required to seal the circulation path C, so the balance tank 11 may be opened to the atmosphere by the valve 11V. Also, if the circulation path C is not sealed, it is not necessary to give a command to the pump 12 to reduce the flow rate Q of the liquid L during the temperature rising process HP, and the flow rate Q can be maintained constant throughout the temperature rising process HP. When the temperature T of the liquid L is the temperature T of the cleaning condition CC 1is reached and the flow rate Q reaches the flow rate Q of the cleaning condition CC 1 in the state where it has reached, the cleaning time t 1 When the timing over the time period (the cleaning condition CC is satisfied) ends, the liquid L is cooled to a predetermined temperature (Fig. 7). When using a chemical, rinsing is performed (Fig. 8), otherwise, it proceeds directly to draining (Fig. 9) and shifts to product manufacturing.

[0060] In the case of stationary cleaning, even when the temperature T exceeds 100 °C 1 when heating the liquid L, prior to the temperature rise of the liquid L, the circulation path C is made airtight, and in the temperature rise process HP, the flow rate Q may be decreased by giving a command to the pump 12 based on the pressure P. Also, even when the temperature T 1 is less than 100 °C, when making the circulation path C airtight, the flow rate Q may be decreased based on the pressure P in the temperature rise process HP. When the flow rate Q is decreased and the flow rate Q is below the required flow rate Q 1 as in the above steps S08 and S12, it involves interruption and resumption of the timing of the cleaning time t 1 .

[0061] [An example of the control of stationary sterilization (SIP)] When performing only stationary sterilization without performing it simultaneously with stationary cleaning, for example, after performing the rinsing step (Fig. 4), through the replacement from water W to the liquid L (Fig. 5), the liquid L is circulated through the circulation path C while heating it to a temperature T 2 or higher (Fig. 6). The liquid L is not limited to a chemical and may be water. The temperature T 2 If it exceeds 100 °C, prior to the temperature rise of the liquid L, the circulation path C is made airtight. Note that the circulation path C may be made airtight even when the temperature T 2 is less than 100 °C. When the circulation path C is made airtight, in the process HP where the liquid L is heated, similar to the above step S07, the pressure P of the filling tank 20 is prevented from exceeding the upper limit value P 1 by giving a command to the pump 12 to lower the discharge flow rate and discharge pressure, the flow rate Q of the liquid L is decreased. When the temperature T of the liquid L reaches the temperature T of the sterilization condition SC2 in the state where it has reached, the sterilization time t 2 When the timing over (sterilization condition SC is satisfied) is completed for, the liquid L is cooled to a predetermined temperature (FIG. 7). At this time, by increasing the flow rate Q within the limit that the pressure P does not exceed the pressure resistance, cooling can be promoted and the cooling step can be ended earlier. When a chemical is used as the liquid L, rinsing is performed (FIG. 8), and if not, directly proceed to draining (FIG. 9) and shift to product manufacturing.

[0062] The temperature T of the sterilization condition SC 2 When is less than 100°C, the liquid L can be heated with the circulation path C not being sealed. In this case, it is not necessary to decrease the flow rate Q in the heating process HP.

[0063] 〔Effect according to the first embodiment〕 In the first embodiment described above, while heating the liquid L while circulating it in a sealed state, in the heating process HP in which the liquid L is heated, a command is given to the pump 12 based on the pressure P of the filling tank 20 to decrease the flow rate Q of the liquid L. By doing so, while ensuring a sterilization ability corresponding to a liquid temperature high enough to sufficiently exceed 100°C using the pressurized liquid, the internal pressure of the circulation path C including the filling tank 20 can be suppressed lower than the pressure resistance. If, for example, a tank with a thick wall is adopted for the filling tank 20 in order to increase the pressure resistance of the circulation path C, the equipment becomes larger and the equipment cost increases. According to this embodiment, it is not necessary to increase the pressure resistance of the circulation path C, and by the control of giving a command to the pump 12 based on the pressure P of the filling tank 20, an excessive increase in the internal pressure of the circulation path C due to heating the liquid L to a high temperature can be avoided. When applying the sterilization and cleaning device 1 of this embodiment to the existing filling machine 2, only the addition of control to the control unit 15 is sufficient, and it is not necessary to change the existing device configuration, and a troublesome operation such as replacing the filling tank 20 with a tank having a high pressure resistance does not occur.

[0064] Furthermore, in this embodiment, even when the flow rate Q decreased based on the pressure P deviates from the required flow rate Q 1 in the cooling process CP, the flow rate Q is the required flow rate Q1 After recovery until, measure the remaining time of the washing time t 1 By this control, the sterilization washing apparatus 1 conforming to the washing conditions CC can be provided.

[0065] [Second Embodiment] Next, with reference to FIGS. 11 and 12, a second embodiment of the present disclosure will be described. Hereinafter, the description will focus on matters different from the first embodiment. The same reference numerals are assigned to the same components as those in the first embodiment. The configuration of the second embodiment is the same as that of the first embodiment unless otherwise noted, and the operations and effects obtained from the configuration are also the same as those of the first embodiment. Therefore, for the same matters, repeated description will be avoided, and the operations and effects described in the first embodiment will be cited.

[0066] The sterilization washing apparatus 4 according to the second embodiment, as shown in FIG. 11, is different from the sterilization washing apparatus 1 of the above-described first embodiment in that it includes two pumps 121 and 122. The pumps 121 and 122 may each be configured in the same manner as the pump 12 of the first embodiment. However, since the same flow rate Q 1 is realized by the two pumps 121 and 122, it suffices if the pumps 121 and 122 each have a lower capacity than the pump 12 of the first embodiment.

[0067] The first pump 121 as the first pumping unit pumps the liquid L from the heat exchanger 13 toward the filling machine 2. The first pump 121 can be disposed at the same position as the pump 12 of the first embodiment.

[0068] The second pump 122 as the second pumping unit pumps the liquid L from the filling machine 2 toward the heat exchanger 13. The second pump 122 is disposed in the return path C2 into which the liquid L flows from the filling valve 21. When the second pump 122 sucks the liquid L discharged from the first pump 121 and whose pressure has dropped due to the resistance of piping or the like, it discharges the liquid L at a pressure higher than the suction pressure. The return path C2 has a smaller pressure loss than the forward path C1 where the heat exchanger 13 is arranged. Therefore, it suffices if the second pump 122 has a capacity lower than that of the first pump 121.

[0069] In the second embodiment, by operating the first pump 121 arranged in the forward path C1 and the second pump 122 arranged in the return path C2, unlike the first embodiment, the internal pressure of the filling tank 20 can be suppressed with respect to the pressure resistance without reducing the flow rate Q. Only by the pump 12 arranged in the forward path C1 as in the first embodiment, the necessary flow rate Q 1 When circulating the liquid L in a sealed state at the above constant flow rate Q, if the maximum pressure (pressure P of the filling tank 20) in the circulation path C exceeds the pressure resistance during the heating process HP, the flow rate Q has to be reduced with respect to the necessary flow rate Q1. On the other hand, in the second embodiment, the same flow rate Q as in the first embodiment is achieved by two pumps 121 and 122. For example, the discharge pressures p 1 , p 2 are given to the pumps 121 and 122 respectively. Therefore, the discharge pressure p 1 of the first pump 121 is smaller than the discharge pressure of the pump 12 when pumping the liquid by one pump 12 in the first embodiment. Then, the force pushing the liquid L from the first pump 121 toward the filling tank 20 is smaller than the force pushing the liquid L from the pump 12 in the first embodiment toward the filling tank 20. Therefore, the pressure P of the filling tank 20 decreases compared to the first embodiment. Moreover, since the liquid L is sucked from the downstream side of the filling tank 20 by the second pump 122, the pressure P of the filling tank 20 also decreases compared to the first embodiment.

[0070] From the above, by providing the first pump 121 and the second pump 122, the necessary flow rate Q during the heating process HP of the liquid L 1is ensured, and the locations where the pressure in the circulation path C is relatively high are dispersed to the discharge part of the first pump 121, the inside of the filling tank 20, and the discharge part of the second pump 122. Therefore, even if the internal pressure of the circulation path C increases during the heating process HP, it will not become an excessive pressure, and the internal pressure of the circulation path C can be suppressed with respect to the pressure resistance. Therefore, similar to the first embodiment, while ensuring the sterilization ability corresponding to a liquid temperature high enough to sufficiently exceed 100°C using the pressurized liquid, the internal pressure of the circulation path C including the filling tank 20 can be suppressed lower than the pressure resistance. By suppressing the internal pressure of the circulation path C, it is not necessary to increase the pressure resistance of the circulation path C, so it is possible to avoid an increase in the size of the equipment and suppress the equipment cost.

[0071] In addition to including the first pump 121 and the second pump 122, for example, by performing the following control, the pressure P of the filling tank 20 can be more sufficiently suppressed with respect to the pressure resistance. FIG. 12 shows an example of the control of the stationary cleaning and stationary sterilization being performed in parallel, that is, the stationary cleaning and sterilization (CSIP), according to the configuration of the second embodiment. After the rinsing step, the supply of the liquid L is started (liquid feeding start step S01 in FIG. 12), and after the replacement from water to the liquid L, the circulation of the liquid L is started by forming the circulation path C (circulation start step S02 in FIG. 12). At this time, the control unit 15 gives a constant rotational speed to the motor of the first pump 121 and also gives a constant rotational speed to the motor of the second pump 122, so that the first pump 121 and the second pump 122 can be driven at a constant discharge flow rate and discharge pressure, respectively. At this time, the flow meter 18 measures the flow rate Q of the cleaning condition CC 1 The above flow rate Q is measured.

[0072] Furthermore, by closing the valve 11V and the valve of the discharge part D, the circulation path C is made airtight (sealing step S03), and by supplying the steam V to the second flow path 132 of the heat exchanger 13, the heating of the liquid L is started (first heating start step S04).

[0073] The temperature T of the liquid L is the temperature T of the cleaning condition CC 1is reached, and the concentration M, temperature T, and flow rate Q of the liquid L satisfy the requirements of the concentration M 1 , temperature T 1 , and flow rate Q 1 respectively, the control unit 15 starts the timing of the cleaning time t 1 (cleaning timing start step S05).

[0074] The measurement and adjustment of the concentration of the liquid L are performed at a temperature of 100°C or lower of the liquid L in the same manner as in the first embodiment in order to avoid cleaning failure (concentration adjustment step Sa). And prior to reaching a temperature exceeding 100°C due to the temperature rise of the liquid L, the concentration adjustment is completed by adjusting the concentration M of the liquid L to the target concentration M 1 .

[0075] When the timing of the cleaning time t 1 is started, the temperature rise toward the temperature T 2 , which is the temperature requirement for stationary sterilization, is started (second temperature rise start step S06). In the second embodiment, in the process of raising the temperature of the liquid L beyond the temperature T 1 of the cleaning condition CC, a command to decrease the discharge pressure p 1 is given to the first pump 121 (first pump discharge pressure decrease step S07-1), and a command to increase the discharge pressure p 2 is given to the second pump 122 (second pump discharge pressure increase step S07-2).

[0076] Then, as the force with which the first pump 121 pushes the liquid L decreases due to the decrease in the pressure p 1 , the pressure P in the filling tank 20 decreases, and the pressure P in the filling tank 20 also decreases due to the increase in the liquid suction amount from the filling tank 20 of the second pump 122 due to the increase in the pressure p 2 . While decreasing the discharge pressure p 1 , the discharge pressure p 2 is increased, so the required flow rate Q 1can be ensured. In order to stably feed the liquid throughout the entire circulation path C, the control unit 15 may give commands to the pumps 121 and 122 while monitoring the pressure P and the flow rate Q. In the heating-up process HP, since the required flow rate Q 1 is ensured, the timing of the cleaning time t 1 is not interrupted. When the flow rate Q is equal to or greater than the required flow rate Q 1 and the concentration M measured at a liquid temperature of 100 °C or lower is equal to or greater than the required concentration M 1 and the temperature T is equal to or greater than the required temperature T 1 in a state where the cleaning time t 1 is reached from the start of timing, the cleaning condition CC is satisfied (cleaning condition satisfaction step S14).

[0077] According to the drive control of the pumps 121 and 122 in the heating-up process HP of the second embodiment, the inside of the filling tank 20 can be maintained at a pressure P 1 that is sufficiently lower than the upper limit value P. The decrease in the discharge pressure p 1 and the increase in the discharge pressure p 2 can be performed step by step while stabilizing the pressure P and the flow rate Q within a range of predetermined values on the premise that the pressure P does not exceed the upper limit value P 1 and the flow rate Q is equal to or greater than the required flow rate Q 1 . For example, based on a command from the control unit 15, the drive frequency of each motor of the pumps 121 and 122 may be changed by several Hz. Note that the discharge pressures p 1 , p 2 can also be changed steplessly.

[0078] When the temperature T of the liquid L reaches the temperature T 2 of the stationary sterilization condition SC, the timing of the sterilization time t 2 is started (sterilization time timing start step S09). After that, when the sterilization time t 2 elapses while the temperature T of the liquid L is maintained at or above the temperature T 2 , the stationary sterilization condition SC is satisfied (sterilization condition satisfaction step S10). In the example shown in FIG. 12, there is a cleaning condition satisfaction step S14 between the sterilization time measurement start step S09 and the sterilization condition satisfaction step S10, but this is not always the case. Depending on the cleaning time t 1 and so on, the cleaning condition satisfaction step S14 may exist, for example, between the sterilization condition satisfaction step S10 and the chemical circulation process end step S15.

[0079] When the sterilization conditions are satisfied, cooling of the liquid L is started (cooling start step S11). At this time, while reducing the temperature T of the liquid L, for example, contrary to the temperature rising process HP, the discharge pressure p of the first pump 121 1 is increased, and the discharge pressure p of the second pump 122 2 is decreased. When the temperature of the liquid L is cooled to a predetermined temperature T by the heat exchanger 13 4 the chemical circulation process is terminated (chemical circulation process end step S15). In the second embodiment, since the required flow rate Q during the temperature rising process HP 1 is ensured, the measurement of the cleaning time t 1 is not interrupted, and it is not necessary to accumulate the shortage time of the cleaning time t 1 after the sterilization process. Accordingly, the chemical circulation process ends earlier compared to when the chemical circulation process ends (S15) in the control shown in FIG. 3.

[0080] Thereafter, as in the first embodiment, through the steps shown in FIGS. 8 to 10, a series of processes related to stationary cleaning and sterilization (CSIP) are completed.

[0081] The sterilization and cleaning apparatus 4 of the second embodiment can perform stationary cleaning that is not performed simultaneously with stationary sterilization. The procedure for stationary cleaning (CIP) is basically the same as that of the first embodiment.

[0082] The sterilization and cleaning apparatus 4 of the second embodiment can perform stationary sterilization that is not performed simultaneously with stationary cleaning. The procedure for stationary sterilization (SIP) is basically the same as that of the first embodiment.

[0083] As described above, since the second embodiment includes two pumps 121 and 122, it is possible to suppress an increase in the internal pressure of the filling tank 20 during the heating process HP as compared with the first embodiment. Therefore, for both stationary cleaning and stationary sterilization, it is not always necessary to give commands to the pumps 121 and 122 to reduce the flow rate Q during the heating process HP.

[0084] 〔Modification of the Second Embodiment〕 As shown in FIG. 13, by giving a command to change only the discharge pressure of the second pump 122 by the control unit 15 during the heating process HP, the discharge pressure p of the first pump 121 1 can be kept constant while increasing the discharge pressure p of the second pump 122 2 . Even in this case, compared with the case of feeding the liquid only by the pump 12 of the first embodiment, the force with which the first pump 121 pushes the liquid L decreases, and the amount of liquid suction from the filling tank 20 by the second pump 122 increases. Therefore, the inside of the filling tank 20 can be kept at a low pressure P with respect to the upper limit value P 1 . Note that, if the discharge pressure p 1 is kept constant and the discharge pressure p 2 is increased, the flow rate Q gradually increases. Furthermore, although not shown, by the control unit 15, while keeping the discharge pressure p 2 of the second pump 122 constant, by decreasing the discharge pressure p 1 of the first pump 121, also due to the decrease in the force with which the first pump 121 pushes the liquid L and the suction of the liquid L from the filling tank 20 by the second pump 122, the inside of the filling tank 20 can be kept at a low pressure P with respect to the upper limit value P 1 .

[0085] In addition to the above, it is possible to select and choose the configurations described in the above embodiments, or to appropriately change them to other configurations. A plurality of pumps 12 as pressure feeding units may be arranged in series in the forward path C1 of the circulation path C of the first embodiment. For example, the pumps 12 are arranged between the balance tank 11 and the heat exchanger 13, and between the heat exchanger 13 and the valve device 30, respectively. Further, a plurality of first pumps 121 as a first pumping unit may be arranged in the forward path C1 of the circulation path C of the second embodiment, and a plurality of second pumps as a second pumping unit may be arranged in the return path C2. For example, the first pumps 121 are respectively arranged between the balance tank 11 and the heat exchanger 13, and between the heat exchanger 13 and the valve device 30. For example, the second pumps 122 are respectively arranged at positions near the filling machine 2 and near the balance tank 11 in the return path C2. Furthermore, the sterilization and cleaning device of the present disclosure only needs to have a function of performing at least one of sterilization and cleaning of the filling machine 2. That is, the device of the present disclosure using the liquid L for sterilization or cleaning includes a cleaning device that exclusively cleans the filling machine 2 using the liquid L, and a sterilization device that exclusively sterilizes the filling machine 2 using the liquid L. The same applies to the method of the present disclosure using the liquid L for sterilization or cleaning.

[0086] [Appendix] From the above disclosure, the following configurations can be understood. [1] A temperature control unit configured to be able to heat the liquid used for sterilization or cleaning of the filling machine, A circulation path configured to be able to circulate the liquid between the temperature control unit and the filling machine, A pumping unit for pumping the liquid in the circulation path, A control unit for generating a command, and in the process of the liquid heating up in a state where the circulation path is sealed, the control unit gives the command to the pumping unit based on the internal pressure in a part of the filling machine to reduce the flow rate of the liquid. Device.

[0087] [2] The temperature control unit is configured to be able to cool the liquid in addition to heating the liquid, in the process of the liquid heating up, after starting the timing of a predetermined cleaning time, the control unit interrupts the timing as the flow rate decreases, and resumes the timing in the process of the liquid being cooled by the temperature control unit. The device according to item [1].

[0088] 〔3〕The temperature control unit raises the temperature of the liquid to a temperature exceeding 100°C. The apparatus according to item 〔1〕or 〔2〕.

[0089] 〔4〕A liquid storage tank for supplying the liquid to the temperature control unit, and a filling tank as part of the filling machine, are provided. A gas phase region exists inside the liquid storage tank. The apparatus according to any one of items 〔1〕to 〔3〕.

[0090] 〔5〕A concentration meter for measuring the concentration of the liquid containing a chemical component contributing to the sterilization or the cleaning, and a concentration adjustment unit configured to be able to adjust the concentration by adding or diluting the chemical component, are provided. When the temperature of the liquid is 100°C or less, the concentration is adjusted by the concentration adjustment unit while measuring the concentration by the concentration meter, and prior to reaching a temperature exceeding 100°C due to the temperature rise of the liquid, the adjustment of the concentration is terminated by adjusting the concentration to a predetermined concentration. After the completion of the adjustment of the concentration in the temperature rise process of the liquid, the timing of a predetermined cleaning time is started. The apparatus according to any one of items 〔1〕to 〔4〕.

[0091] 〔6〕A method for sterilizing or cleaning a filling machine using a heated liquid, comprising a step of pumping the liquid used for the sterilization or the cleaning by a pumping unit and circulating the liquid through a sealed circulation path between the temperature control unit configured to be able to heat the liquid and the filling machine, and a temperature rise step of raising the temperature of the liquid by the temperature control unit while circulating the liquid. In the temperature rise step, a method of giving a command to the pumping unit to reduce the flow rate of the liquid based on the internal pressure in a part of the filling machine.

[0092] 〔7〕In the temperature rising step, a step of starting the timing of a predetermined cleaning time, a step of interrupting the timing as the flow rate decreases, and a step of resuming the timing during the process in which the liquid is cooled by the temperature control unit, comprising the method according to item [6]. The method according to item [6].

[0093] 〔8〕Following the temperature rising of the liquid, a cooling step of cooling the liquid by the temperature control unit is provided. In the cooling step, a command is given to the pumping unit to increase the flow rate of the liquid, The method according to item [7].

[0094] 〔9〕When the temperature of the liquid is 100 °C or lower, a concentration adjustment step of adjusting the concentration by adding or diluting the chemical component while measuring the concentration of the liquid containing the chemical component contributing to the sterilization or the cleaning, a step of ending the concentration adjustment by adjusting the concentration to a predetermined concentration prior to the liquid reaching a temperature exceeding 100 °C due to the temperature rising of the liquid, and a step of starting the timing of a predetermined cleaning time after the end of the concentration adjustment during the temperature rising process of the liquid, comprising the method according to any one of items [6] to [8]. The method according to any one of items [6] to [8].

Explanation of Signs

[0095] 1,4 Sterilization and Cleaning Device 2 Filling Machine 11 Balance Tank (Liquid Storage Tank) 11A Gas Phase Region 11B Liquid Surface 11V Valve 12 Pump (Pumping Unit) 13 Heat Exchanger (Temperature Control Unit) 13A, 13B Temperature Sensors 15 Control Unit 16 Temperature Sensor 17 Concentration Meter 17C Concentration Adjustment Unit 18 Flowmeter 19 Pressure sensor 20 Filling tank 20A Gas phase region 20B Liquid level 21 Filling valve 22 Gas introduction pipe 23 Pressure sensor 24 Liquid level sensor 25 Temperature sensor 26 Temperature sensor 27 Control valve 30 Valve device 31 First valve block 32 Second valve block 111 Introduction pipe 121 First pump (first pumping section) 122 Second pump (second pumping section) 131 First flow path 132 Second flow path 311 Port 312 Discharge section 313 Valve 321 Port C Circulation path C1 Forward path C2 Return path CP Cooling process D Discharge section HP Heating-up process L Liquid P Pressure P 1 Upper limit value Q Flow rate Q 1 Required flow rate p 1 ,p 2 Discharge pressure R Refrigerant S01 Liquid feeding start step S02 Circulation start step S03 Sealing step S04 First heating-up start step S05 Cleaning timing start step S06 Second heating-up start step S07 Flow rate reduction step S07-1 First Pump Discharge Pressure Reduction Step S07-2 Second Pump Discharge Pressure Increase Step S08 Cleaning Time Counting Interruption Step S09 Sterilization Time Counting Start Step S10 Sterilization Condition Establishment Step S11 Cooling Start Step S12 Flow Rate Increase Step S13 Cleaning Time Counting Resume Step S14 Cleaning Condition Establishment Step S15 Chemical Circulation Process End Step Sa Concentration Adjustment Step Sb Concentration Adjustment End Step T Temperature T 1 ,T 2 Required Temperature T 3 ,T 4 Temperature t 1 Cleaning Time t 2 Sterilization Time V Steam W Water W1 Sterile Water

Claims

1. A temperature control unit configured to heat a liquid used for sterilization or cleaning of the filling machine; A circulation path configured to be able to circulate the liquid between the temperature adjustment unit and the filling machine; A pumping unit that pumps the liquid in the circulation path; A control unit that generates a command, The control unit, during a process in which the temperature of the liquid increases with the circulation path being sealed, An apparatus for providing the command to the pumping section to reduce the flow rate of the liquid based on an internal pressure in a portion of the filling machine.

2. The temperature adjustment unit is configured to be capable of cooling the liquid in addition to heating the liquid, The control unit starts measuring a predetermined cleaning time during a process in which the temperature of the liquid increases, and then suspends the measuring operation as the flow rate decreases, The device according to claim 1 , wherein the timing is restarted while the liquid is being cooled by the temperature adjustment unit.

3. The temperature control unit heats the liquid to a temperature exceeding 100° C.

2. The apparatus of claim 1.

4. a liquid storage tank that supplies the liquid to the temperature adjustment unit; A filling tank as part of the filling machine, A gas phase region exists inside the liquid storage tank.

2. The apparatus of claim 1.

5. A concentration meter that measures the concentration of the liquid containing a chemical component that contributes to the sterilization or cleaning; A concentration adjusting unit configured to adjust the concentration by adding or diluting the pharmaceutical component; Equipped with When the temperature of the liquid is 100° C. or less, the concentration is adjusted by the concentration adjustment unit while the concentration is being measured by the concentration meter, and the concentration adjustment is terminated when the concentration is adjusted to a predetermined concentration before the temperature of the liquid exceeds 100° C. due to the rise in temperature of the liquid; After the end of the adjustment of the concentration during the temperature rise process of the liquid, a predetermined cleaning time is started to be measured.

2. The apparatus of claim 1.

6. 1. A method for sterilizing or cleaning a filling machine using a heated liquid, comprising: The liquid used for the sterilization or cleaning is pumped by a pumping unit, and the liquid is circulated through a sealed circulation path between a temperature control unit configured to be able to heat the liquid and the filling machine. and A temperature increasing step of increasing the temperature of the liquid by the temperature adjusting unit while circulating the liquid, In the temperature increasing step, The method further comprising: commanding the pumping section to reduce a flow rate of the liquid based on an internal pressure in a portion of the filling machine.

7. In the temperature increasing step, a step of starting to measure a predetermined cleaning time; interrupting the timing as the flow rate decreases; and restarting the timing while the liquid is being cooled by the temperature adjustment unit. The method according to claim 6.

8. A cooling step of cooling the liquid by the temperature adjustment unit following the temperature increase of the liquid, In the cooling step, giving a command to the pumping unit to increase the flow rate of the liquid; The method according to claim 6.

9. a concentration adjusting step of adjusting the concentration of the liquid containing a chemical component contributing to the sterilization or cleaning by adding or diluting the chemical component while measuring the concentration of the liquid containing the chemical component contributing to the sterilization or cleaning when the temperature of the liquid is 100° C. or less; a step of ending the concentration adjustment by adjusting the concentration to a predetermined concentration before the temperature of the liquid reaches a temperature exceeding 100° C.; The method according to claim 6 , further comprising: starting to time a predetermined cleaning time after completion of the adjustment of the concentration during the temperature increase process of the liquid.

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