Surge tank unit

Abstract

To provide a surge tank unit which can stably adjust a flow rate.SOLUTION: A surge tank unit (1) has: a first tank (101) for temporarily storing a treatment liquid from a previous process device (2); a second tank (102) for temporarily storing the treatment liquid from the previous process device; an introduction flow channel (11) which is configured to be connectable to the previous process device, and is connected to the first tank and the second tank; an introduction valve (14) which is connected to the introduction flow channel and passes the treatment liquid from the previous process device when introducing the treatment liquid into the first tank or the second tank; an introduction control device (17a) for controlling the operation of the introduction valve so as to prevent the treatment liquid from being introduced into the second tank when introducing it into the first tank, and to prevent the treatment liquid from being introduced into the first tank when introducing it into the second tank; a third tank (103) for temporarily storing the treatment liquid from the first tank and the second tank; and a lead-out flow channel (13) which is configured to be connectable to a subsequent process device (3) and is connected to the third tank.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present invention relates to a surge tank unit.

Background Art

[0002] In production equipment used for continuous production of functional chemical products, a device that performs specific process treatment on a treatment liquid that is a raw material of the product (hereinafter referred to as a "pre-process device") and a device that performs the next process treatment (hereinafter referred to as a "post-process device") are connected with a surge tank that adjusts the flow rate of the treatment liquid between the two devices (for example, Non-Patent Document 1).

[0003] The surge tank unit disclosed in Non-Patent Document 1 (hereinafter referred to as a "parallel three-tank type surge tank unit") temporarily stores the treatment liquid sent from the pre-process device in three surge tanks arranged in parallel and sends the treatment liquid to the post-process device at a predetermined flow rate. Therefore, the parallel three-tank type surge tank unit continuously sends the treatment liquid from the pre-process device to the post-process device at a stable flow rate.

[0004] In the parallel three-tank type surge tank unit, the treatment liquid sent from the pre-process device is sequentially stored in each surge tank and sequentially sent from each surge tank to the post-process device. At this time, the treatment liquid is sent through the pipes connected between each surge tank and the post-process device. If the design of each pipe (for example, diameter, length, etc.) is different, the state of the treatment liquid sent from each pipe to the post-process device (for example, flow rate, temperature, concentration, etc.) may be different. Therefore, in order to make the state of the treatment liquid sent through each pipe the same, the design of each pipe is made the same.

[0005] However, there are limitations on the space where the surge tank unit is arranged in the production equipment, and the degree of freedom in arranging each surge tank in the same space is small. Therefore, the distance between each surge tank and the post-process device may be different. When the design of each pipe is different, in order to make the state of the treatment liquid sent through each pipe the same, control for each pipe (for example, flow rate adjustment) is required.

Prior Art Documents

Non-Patent Documents

[0006]

Non-Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0007] An object of the present invention is to provide a surge tank unit that enables stable flow rate adjustment.

Means for Solving the Problems

[0008] The surge tank unit according to the present invention is connected between a pre-process device that performs pre-process on a processing liquid and a post-process device that performs post-process on the processing liquid on which the pre-process has been performed, and temporarily stores the processing liquid fed from the pre-process device and feeds the stored processing liquid to the post-process device. The surge tank unit includes a first tank that temporarily stores the processing liquid fed from the pre-process device, a second tank that temporarily stores the processing liquid fed from the pre-process device, an introduction flow path configured to be connectable to the pre-process device and connected to the first tank and the second tank, an introduction valve connected to the introduction flow path and through which the processing liquid fed from the pre-process device passes when introduced into the first tank or the second tank, and an introduction control device that controls the operation of the introduction valve so that when the processing liquid is introduced into the first tank, the processing liquid is not introduced into the second tank, and when the processing liquid is introduced into the second tank, the processing liquid is not introduced into the first tank. The surge tank unit further includes a third tank that temporarily stores the processing liquid fed from each of the first tank and the second tank, and a discharge flow path configured to be connectable to the post-process device and connected to the third tank.

Effects of the Invention

[0009] The present invention enables stable flow rate adjustment.

Brief Description of the Drawings

[0010]

Figure 1

Figure 2

Figure 3

Figure 4

Figure 5

Figure 6

Figure 7

Figure 8

Figure 9

Embodiments for Carrying Out the Invention

[0011] Embodiments of the surge tank unit (hereinafter referred to as "this unit") according to the present invention will be described below with reference to the drawings.

[0012] This unit is a surge tank unit connected between a pre-process device and a post-process device. The pre-process device is a device that performs a predetermined process on a processing liquid. The post-process device is a device that performs the next process on the processing liquid on which the pre-process has been performed. This unit temporarily stores the processing liquid sent from the pre-process device. This unit sends the stored processing liquid to the post-process device.

[0013] The "processing liquid" is, for example, a raw material of a functional chemical product. The processing liquid is either only a liquid or a combination of a liquid and a solid (slurry solution).

[0014] In the following description, the "upstream side" is the upstream side in the flow of the processing liquid. The "downstream side" is the downstream side in the flow of the processing liquid.

[0015] ● Embodiment (1) of this unit ● ● Configuration (1) of this unit The configuration of this device will be described below.

[0016] FIG. 1 is a schematic diagram showing an embodiment of this unit.

[0017] This unit 1 is connected to a pre-process device 2, a post-process device 3, and an analysis device 4. This unit 1 includes a first tank 101, a second tank 102, a third tank 103, an introduction flow path 11, a first liquid feed flow path 121, a second liquid feed flow path 122, a derivation flow path 13, an introduction valve 14, a first liquid feed device 151, a second liquid feed device 152, a third liquid feed device 153, a first liquid level gauge 161, a second liquid level gauge 162, a third liquid level gauge 163, and a control device 17.

[0018] The pre-treatment device 2 performs pre-treatment on the processing liquid W. The pre-treatment device 2 is connected upstream of this unit 1.

[0019] The pre-treatment is a treatment performed on the processing liquid W. The pre-treatment is, for example, extraction washing.

[0020] Note that the pre-treatment in the present invention does not have to be extraction washing. That is, for example, the pre-treatment in the present invention may be concentration.

[0021] The post-treatment device 3 performs post-treatment on the processing liquid W on which the pre-treatment has been performed. The post-treatment device 3 is connected downstream of this unit 1.

[0022] The post-treatment is a treatment performed on the processing liquid W on which the pre-treatment has been performed. The post-treatment is, for example, concentration.

[0023] Note that the post-treatment in the present invention does not have to be concentration. That is, for example, the post-treatment in the present invention may be crystallization.

[0024] The first tank 101 temporarily stores the processing liquid W sent from the pre-treatment device 2.

[0025] The second tank 102 temporarily stores the processing liquid W sent from the pre-treatment device 2. The volume of the second tank 102 is the same as the volume of the first tank 101.

[0026] Note that the volume of the first tank in the present invention does not have to be the same as the volume of the second tank in the present invention. That is, for example, the volume of the first tank in the present invention may be different from the volume of the second tank.

[0027] The third tank 103 temporarily stores the processing liquid W sent from each of the first tank 101 and the second tank 102. The volume of the third tank 103 is larger than the volume of the first tank 101 and the volume of the second tank 102.

[0028] The introduction flow path 11 is a pipe through which the processing liquid W flows. The introduction flow path 11 is disposed between the previous process device 2 and the first tank 101. The introduction flow path 11 is disposed between the previous process device 2 and the second tank 102. The introduction valve 14 is disposed in the middle of the introduction flow path 11. The processing liquid W fed from the previous process device 2 flows through the introduction flow path 11 and passes through the introduction valve 14. The processing liquid W that has passed through the introduction valve 14 is introduced into the first tank 101 or the second tank 102.

[0029] The first liquid feeding flow path 121 is a pipe through which the processing liquid W flows. The first liquid feeding flow path 121 is disposed between the first tank 101 and the third tank 103. The first liquid feeding device 151 is disposed in the middle of the first liquid feeding flow path 121. The processing liquid W stored in the first tank 101 is fed by the first liquid feeding device 151 through the first liquid feeding flow path 121 to the third tank 103.

[0030] The second liquid feeding flow path 122 is a pipe through which the processing liquid W flows. The second liquid feeding flow path 122 is disposed between the second tank 102 and the third tank 103. The second liquid feeding device 152 is disposed in the middle of the second liquid feeding flow path 122. The processing liquid W stored in the second tank 102 is fed by the second liquid feeding device 152 through the second liquid feeding flow path 122 to the third tank 103. The first liquid feeding flow path 121 is connected to the third tank 103 independently of the second liquid feeding flow path 122.

[0031] Note that the first liquid feeding flow path in the present invention may not be connected to the third tank independently of the second liquid feeding flow path in the present invention. That is, for example, a flow path mutually connected between the first liquid feeding flow path and the second liquid feeding flow path in the present invention may be connected to the third tank.

[0032] The derivation flow path 13 is a pipe through which the processing liquid W flows. The derivation flow path 13 is disposed between the third tank 103 and the subsequent process device 3. The third liquid feeding device 153 is disposed in the middle of the derivation flow path 13. The processing liquid W stored in the third tank 103 is fed by the third liquid feeding device 153 through the derivation flow path 13 to the subsequent process device 3.

[0033] The introduction valve 14 opens and closes. When the introduction valve 14 is open, the processing liquid W fed from the previous process device 2 passes through the introduction valve 14 and is introduced into the first tank 101 or the second tank 102. The operation (e.g., opening and closing operation) of the introduction valve 14 is controlled by the control device 17. The introduction valve 14 includes a first introduction valve 14a and a second introduction valve 14b.

[0034] The first introduction valve 14a opens and closes. When the first introduction valve 14a is open, the processing liquid W fed from the previous process device 2 passes through the first introduction valve 14a and is introduced into the first tank 101. The operation (e.g., opening and closing operation) of the first introduction valve 14a is controlled by the control device 17. The first introduction valve 14a is an example of the introduction valve in the present invention.

[0035] The second introduction valve 14b opens and closes. When the second introduction valve 14b is open, the processing liquid W fed from the previous process device 2 passes through the second introduction valve 14b and is introduced into the second tank 102. The operation (e.g., opening and closing operation) of the second introduction valve 14b is controlled by the control device 17. The first introduction valve 14a is configured independently of the second introduction valve 14b. The second introduction valve 14b is an example of the introduction valve in the present invention.

[0036] Note that the first introduction valve does not necessarily have to be configured independently of the second introduction valve. That is, for example, the introduction valve in the present invention may be a three-way valve formed of the same member (integrated) of the first introduction valve and the second introduction valve.

[0037] The first liquid feeding device 151 feeds the processing liquid W stored in the first tank 101 to the third tank 103. The operation of the first liquid feeding device 151 is controlled by the control device 17. The first liquid feeding device 151 includes a first liquid feeding valve 151a and a first liquid feeding pump 151b.

[0038] Note that the first liquid feeding device in the present invention does not necessarily have to include either the first liquid feeding valve or the first liquid feeding pump. That is, for example, the first liquid feeding device in the present invention may include only the first liquid feeding pump.

[0039] The first liquid supply valve 151a opens and closes. When the first liquid supply valve 151a opens, the processing liquid W stored in the first tank 101 passes through the first liquid supply valve 151a. The operation of the first liquid supply valve 151a (for example, the opening and closing operation) is controlled by the control device 17. The first liquid supply valve 151a is an example of the first liquid supply device in the present invention.

[0040] The first liquid supply pump 151b sucks the processing liquid W that has passed through the first liquid supply valve 151a from the upstream side (the first tank 101 side). The first liquid supply pump 151b discharges the sucked processing liquid W to the downstream side (the third tank 103 side). That is, the first liquid supply pump 151b sends the processing liquid W stored in the first tank 101 to the third tank 103. The operation of the first liquid supply pump 151b (for example, the suction operation and the discharge operation) is controlled by the control device 17. The first liquid supply pump 151b is an example of the first liquid supply device in the present invention.

[0041] The second liquid supply device 152 sends the processing liquid W stored in the second tank 102 to the third tank 103. The operation of the second liquid supply device 152 is controlled by the control device 17. The second liquid supply device 152 includes a second liquid supply valve 152a and a second liquid supply pump 152b.

[0042] Note that the second liquid supply device in the present invention may not include either the second liquid supply valve or the second liquid supply pump. That is, for example, the second liquid supply device in the present invention may include only the second liquid supply pump.

[0043] The second liquid supply valve 152a opens and closes. When the second liquid supply valve 152a opens, the processing liquid W stored in the second tank 102 passes through the second liquid supply valve 152a. The operation of the second liquid supply valve 152a (for example, the opening and closing operation) is controlled by the control device 17. The second liquid supply valve 152a is an example of the second liquid supply device in the present invention.

[0044] The second liquid delivery pump 152b sucks the processing liquid W that has passed through the second liquid delivery valve 152a from the upstream side (the first tank 101 side). The second liquid delivery pump 152b discharges the sucked processing liquid W to the downstream side (the third tank 103 side). That is, the second liquid delivery pump 152b delivers the processing liquid W stored in the second tank 102 to the third tank 103. The operation of the second liquid delivery pump 152b (for example, the suction operation, the discharge operation) is controlled by the control device 17. The second liquid delivery pump 152b is an example of the second liquid delivery device in the present invention.

[0045] The third liquid delivery device 153 delivers the processing liquid W stored in the third tank 103 to the post-process device 3. The operation of the third liquid delivery device 153 is controlled by the control device 17. The third liquid delivery device 153 includes a third liquid delivery valve 153a and a third liquid delivery pump 153b. The liquid delivery speed of the first liquid delivery device 151 and the liquid delivery speed of the second liquid delivery device 152 are faster than the liquid delivery speed of the third liquid delivery device 153.

[0046] Note that the third liquid delivery device in the present invention may not include either one of the third liquid delivery valve and the third liquid delivery pump. That is, for example, the third liquid delivery device in the present invention may include only the third liquid delivery pump.

[0047] The third liquid delivery valve 153a opens and closes. When the third liquid delivery valve 153a opens, the processing liquid W stored in the third tank 103 passes through the third liquid delivery valve 153a. The operation of the third liquid delivery valve 153a (for example, the opening and closing operation) is controlled by the control device 17. The third liquid delivery valve 153a is an example of the third liquid delivery device in the present invention.

[0048] The third liquid feed pump 153b sucks the processing liquid W that has passed through the third liquid feed valve 153a from the upstream side (the side of the third tank 103). The third liquid feed pump 153b discharges the sucked processing liquid W to the downstream side (the side of the post-process device 3). That is, the third liquid feed pump 153b feeds the processing liquid W stored in the third tank 103 to the post-process device 3. The operation of the third liquid feed pump 153b (for example, the suction operation, the discharge operation) is controlled by the control device 17. The third liquid feed pump 153b is an example of the third liquid feed device in the present invention.

[0049] The first liquid level gauge 161 detects the amount of the processing liquid W stored in the first tank 101 (hereinafter referred to as "the first storage amount"). The result of the detection by the first liquid level gauge 161 is transmitted to the control device 17.

[0050] The second liquid level gauge 162 detects the amount of the processing liquid W stored in the second tank 102 (hereinafter referred to as "the second storage amount"). The result of the detection by the second liquid level gauge 162 is transmitted to the control device 17.

[0051] The third liquid level gauge 163 detects the amount of the processing liquid W stored in the third tank 103 (hereinafter referred to as "the third storage amount"). The result of the detection by the third liquid level gauge 163 is transmitted to the control device 17.

[0052] The analyzer 4 analyzes the state of the processing liquid W (for example, composition, structure, concentration, temperature, etc.). The analyzer 4 transmits the result of the analysis (for example, that the state of the processing liquid W is normal) to the control device 17. The operation of the analyzer 4 is controlled by the control device 17. The analyzer 4 includes a first analysis introduction flow path 411, a second analysis introduction flow path 412, a first analysis introduction valve 421, a second analysis introduction valve 422, and an analysis unit 43.

[0053] The first analysis introduction flow path 411 is a pipe through which the processing liquid W flows. The first analysis introduction flow path 411 is arranged between the first tank 101 and the analysis unit 43. The first analysis introduction valve 421 is arranged in the middle of the first analysis introduction flow path 411. The processing liquid W stored in the first tank 101 flows through the first analysis introduction flow path 411 and passes through the first analysis introduction valve 421. The processing liquid W that has passed through the first analysis introduction valve 421 is introduced into the analysis unit 43.

[0054] The second analysis introduction flow path 412 is a pipe through which the processing liquid W flows. The second analysis introduction flow path 412 is arranged between the second tank 102 and the analysis unit 43. The second analysis introduction valve 422 is arranged in the middle of the second analysis introduction flow path 412. The processing liquid W stored in the second tank 102 flows through the second analysis introduction flow path 412 and passes through the second analysis introduction valve 422. The processing liquid W that has passed through the second analysis introduction valve 422 is introduced into the analysis unit 43.

[0055] The first analysis introduction valve 421 opens and closes. When the first analysis introduction valve 421 is open, the processing liquid W stored in the first tank 101 passes through the first analysis introduction valve 421 and is introduced into the analysis unit 43. The operation (for example, the opening and closing operation) of the first analysis introduction valve 421 is controlled by the control device 17.

[0056] The second analysis introduction valve 422 opens and closes. When the second analysis introduction valve 422 is open, the processing liquid W stored in the second tank 102 passes through the second analysis introduction valve 422 and is introduced into the analysis unit 43. The operation (for example, the opening and closing operation) of the second analysis introduction valve 422 is controlled by the control device 17.

[0057] The analysis unit 43 analyzes the state of the processing liquid W. The analysis unit 43 provides (transmits) the result of the analysis to the control device 17. The analysis unit 43 is, for example, a high performance liquid chromatograph (HPLC).

[0058] The control device 17 controls the operations of the introduction valve 14, the first liquid feeding device 151, the second liquid feeding device 152, the third liquid feeding device 153, and the analysis device 4. The control device 17 receives the detection results from the first liquid level gauge 161, the second liquid level gauge 162, and the third liquid level gauge 163 (hereinafter collectively referred to as "each liquid level gauge"). The control device 17 receives the analysis result from the analysis device 4. The control device 17 includes an introduction control device 17a, a first liquid feeding control device 17b, a second liquid feeding control device 17c, and a third liquid feeding control device 17d.

[0059] ● Control by the introduction control device Based on the detection results from each liquid level gauge, the introduction control device 17a controls the operation of the introduction valve 14.

[0060] Specifically, when each liquid level gauge detects that the processing liquid W is not stored in any of the first tank 101, the second tank 102, and the third tank 103 (hereinafter collectively referred to as "each tank"), the introduction control device 17a controls the operation of the introduction valve 14 so that the processing liquid W sent from the previous process device 2 passes through the introduction valve 14 and is introduced into either the first tank 101 or the second tank 102.

[0061] When the first liquid level gauge 161 detects a predetermined first storage amount (for example, 90% or more of the detection upper limit), the introduction control device 17a controls the operation of the first introduction valve 14a so that the processing liquid W sent from the previous process device 2 does not pass through the first introduction valve 14a and is not introduced into the first tank 101.

[0062] When the operation of the first introduction valve 14a is controlled so that the processing liquid W sent from the previous process device 2 does not pass through the first introduction valve 14a and is not introduced into the first tank 101, the introduction control device 17a controls the operation of the second introduction valve 14b so that the processing liquid W sent from the previous process device 2 passes through the second introduction valve 14b and is introduced into the second tank 102. In other words, when the processing liquid W sent from the previous process device 2 passes through the second introduction valve 14b and is introduced into the second tank 102, the introduction control device 17a controls the operation of the introduction valve 14 so that the processing liquid W sent from the previous process device 2 does not pass through the introduction valve 14 and is not introduced into the first tank 101.

[0063] When the second liquid level gauge 162 detects a predetermined second storage amount (for example, 90% or more of the detection upper limit), the introduction control device 17a controls the operation of the second introduction valve 14b so that the processing liquid W sent from the previous process device 2 does not pass through the second introduction valve 14b and is not introduced into the second tank 102.

[0064] When the operation of the second introduction valve 14b is controlled so that the processing liquid W sent from the previous process device 2 does not pass through the second introduction valve 14b and is not introduced into the second tank 102, the introduction control device 17a controls the operation of the first introduction valve 14a so that the processing liquid W sent from the previous process device 2 passes through the first introduction valve 14a and is introduced into the first tank 101. In other words, when the processing liquid W sent from the previous process device 2 passes through the first introduction valve 14a and is introduced into the first tank 101, the introduction control device 17a controls the operation of the introduction valve 14 so that the processing liquid W sent from the previous process device 2 does not pass through the second introduction valve 14 and is not introduced into the second tank 102. That is, the processing liquid W sent from the previous process device 2 passes through the introduction valve 14 and is alternately introduced into the first tank 101 and the second tank 102.

[0065] ● Control by the first liquid feeding control device The first liquid feeding control device 17b controls the operation of the first analysis introduction valve 421.

[0066] Specifically, when the operation of the introduction valve 14 is controlled so that the treatment liquid W fed from the previous process device 2 does not pass through the introduction valve 14 and is not introduced into the first tank 101, the first liquid feeding control device 17b controls the operation of the first analysis introduction valve 421 so that the treatment liquid W stored in the first tank 101 passes through the first analysis introduction valve 421 and is introduced into the analysis unit 43.

[0067] When a predetermined amount of the treatment liquid W stored in the first tank 101 passes through the first analysis introduction valve 421 and is introduced into the analysis unit 43, the first liquid feeding control device 17b controls the operation of the first analysis introduction valve 421 so that the remaining treatment liquid W stored in the first tank 101 does not pass through the first analysis introduction valve 421 and is not introduced into the analysis unit 43.

[0068] The first liquid feeding control device 17b controls the operation of the first liquid feeding device 151 based on the result of the analysis by the analyzer 4.

[0069] Specifically, when the result of the analysis by the analyzer 4 that analyzes the treatment liquid W stored in the first tank 101 is normal, the first liquid feeding control device 17b controls the operation of the first liquid feeding device 151 so that the treatment liquid W stored in the first tank 101 is fed to the third tank 103.

[0070] When the treatment liquid W stored in the first tank 101 is being fed to the third tank 103, the second liquid feeding control device 17c controls the operation of the second control device 152 so that the treatment liquid W stored in the second tank 102 is not fed to the third tank 103. In other words, when the treatment liquid W stored in the second tank 102 is not being fed to the third tank 103, the first liquid feeding control device 17b controls the operation of the first liquid feeding device 151 so that the treatment liquid W stored in the first tank 101 is fed to the third tank 103.

[0071] When the first introduction valve 14a is opened, the first liquid feeding control device 151 controls the operation of the first liquid feeding device 151 so that the treatment liquid W stored in the first tank 101 is not fed to the third tank 103.

[0072] ● Control by the second liquid feeding control device The second liquid feeding control device 17c controls the operation of the second analysis introduction valve 422.

[0073] Specifically, when the operation of the introduction valve 14 is controlled so that the processing liquid W fed from the pre-process device 2 does not pass through the introduction valve 14 and is not introduced into the second tank 102, the second liquid feeding control device 17c controls the operation of the second analysis introduction valve 422 so that the processing liquid W stored in the second tank 102 passes through the second analysis introduction valve 422 and is introduced into the analysis unit 43.

[0074] When a predetermined amount of the processing liquid W stored in the second tank 102 is introduced into the analysis unit 43, the second liquid feeding control device 17c controls the operation of the second analysis introduction valve 422 so that the remaining processing liquid W stored in the second tank 102 does not pass through the second analysis introduction valve 422 and is not introduced into the analysis unit 43.

[0075] The second liquid feeding control device 17c controls the operation of the second liquid feeding device 152 based on the result of the analysis by the analyzer 4.

[0076] Specifically, when the result of the analysis by the analyzer 4 that analyzes the processing liquid W stored in the second tank 102 is normal, the second liquid feeding control device 17c controls the operation of the second liquid feeding device 152 so that the processing liquid W stored in the second tank 102 is fed to the third tank 103.

[0077] When the processing liquid W stored in the second tank 102 is being fed to the third tank 103, the first liquid feeding control device 17b controls the operation of the first control device 151 so that the processing liquid W stored in the first tank 101 is not fed to the third tank 103. In other words, when the processing liquid W stored in the first tank 101 is not being fed to the third tank 103, the second liquid feeding control device 17c controls the operation of the second liquid feeding device 152 so that the processing liquid W stored in the second tank 102 is fed to the third tank 103.

[0078] When the second introduction valve 14b opens, the second liquid feed control device 152 controls the operation of the second liquid feed device 152 so that the treatment liquid W stored in the second tank 102 is not fed to the third tank 103.

[0079] ● Control by the third liquid feed control device Based on the detection result by the third liquid level gauge 163, the third liquid feed control device 17d controls the operation of the third liquid feed device 153.

[0080] Specifically, when the third liquid level gauge 163 detects a predetermined third storage amount (for example, less than 5% of the detection upper limit), the third liquid feed control device 17d controls the operation of the third liquid feed device 153 so that the treatment liquid W stored in the third tank 103 is not fed to the post-process device 3.

[0081] When the third liquid level gauge 163 detects a predetermined third storage amount (for example, 5% or more of the detection upper limit), the third liquid feed control device 17d controls the operation of the third liquid feed device 153 so that the treatment liquid W stored in the third tank 103 is fed to the post-process device 3.

[0082] ● Operation of this unit (1) The operation of this unit will be described below.

[0083] Figure 2-8 is a schematic diagram showing the operation of this unit and the flow of the treatment liquid in time series.

[0084] In Figure 2-8, among the introduction flow path 11, the first liquid feed flow path 121, the second liquid feed flow path 122, the derivation flow path 13, the first analysis introduction flow path 411, and the second analysis introduction flow path 412 (hereinafter collectively referred to as "each flow path"), the pipe through which the treatment liquid W flows is shown by a thick line. On the other hand, the pipe through which the treatment liquid W does not flow is shown by a thin line.

[0085] In Figure 2-8, among the first introduction valve 14a, the second introduction valve 14b, the first liquid feed valve 151a, the second liquid feed valve 152a, the first analysis introduction valve 421, and the second analysis introduction valve 422 (hereinafter collectively referred to as "each valve"), the open valve is shown in white. On the other hand, the closed valve is shown in black.

[0086] In Fig. 2-8, the directions of the rise and fall of the liquid level of the treatment liquid W stored in each tank are indicated by arrows.

[0087] In Fig. 2-8, the illustrations of the previous process device 2 and the subsequent process device 3 are omitted for convenience of explanation. In the following description, Fig. 1 is referred to as appropriate.

[0088] Fig. 2 is a schematic diagram showing the operation of this unit 1 when the treatment liquid W is introduced from the previous process device 2 into the first tank 101 through the first introduction valve 14a.

[0089] At the start of the operation of this unit 1 shown in the figure, the treatment liquid W is not stored in any of the tanks. Also, each valve is closed.

[0090] First, each liquid level gauge detects that the treatment liquid W is not stored in any of the tanks.

[0091] Next, the results of the detection by each liquid level gauge are transmitted to the control device 17.

[0092] Next, the introduction control device 17a controls the operation of the introduction valve 14 so that the treatment liquid W sent from the previous process device 2 is introduced only into the first tank 101.

[0093] Next, the first introduction valve 14a opens.

[0094] Next, the treatment liquid W sent from the previous process device 2 passes through the first introduction valve 14a and is introduced into the first tank 101.

[0095] Next, the first tank 101 stores the introduced treatment liquid W.

[0096] Thus, when each liquid level gauge detects that the processing liquid W is not stored in any of the tanks, the processing liquid W sent from the previous process device 2 passes through the first introduction valve 14a and is introduced into the first tank 101.

[0097] FIG. 3 is a schematic diagram showing the operation of this unit 1 when the processing liquid W is introduced from the previous process device 2 into the second tank 102 through the second introduction valve 14b.

[0098] First, the first liquid level gauge 161 detects a predetermined first storage amount (for example, 90% or more of the detection upper limit).

[0099] Next, the result of the detection by the first liquid level gauge 161 is transmitted to the control device 17.

[0100] Next, the introduction control device 17a controls the operation of the introduction valve 14 so that the processing liquid W sent from the previous process device 2 does not pass through the introduction valve 14 and is not introduced into the first tank 101.

[0101] Next, the first introduction valve 14a closes.

[0102] Next, the processing liquid W sent from the previous process device 2 does not pass through the first introduction valve 14a and is not introduced into the first tank 101.

[0103] Next, the first liquid feed control device 17b controls the operation of the first analysis introduction valve 421 so that the processing liquid W stored in the first tank 101 is introduced into the analysis unit 43.

[0104] Next, the first analysis introduction valve 421 opens.

[0105] Next, the processing liquid W stored in the first tank 101 passes through the first analysis introduction valve 421 and is introduced into the analysis unit 43.

[0106] Next, the introduction control device 17a controls the operation of the introduction valve 14 so that the processing liquid W sent from the previous process device 2 is introduced into the second tank 102.

[0107] Next, the second introduction valve 14b opens.

[0108] Next, the treatment liquid W sent from the previous process device 2 passes through the second introduction valve 14b and is introduced into the second tank 102.

[0109] Next, the second tank 102 stores the introduced treatment liquid W.

[0110] In this way, when the first liquid level gauge 161 detects a predetermined first storage amount, the treatment liquid W sent from the previous process device 2 does not pass through the first introduction valve 14a and is not introduced into the first tank 101. Also, when the treatment liquid W sent from the previous process device 2 does not pass through the first introduction valve 14a and is not introduced into the first tank 101, the treatment liquid W sent from the previous process device 2 passes through the second introduction valve 14b and is introduced into the second tank 102. Further, the analysis unit 43 analyzes the state of the treatment liquid W stored in the first tank 101.

[0111] FIG. 4 is a schematic diagram showing the operation when the first liquid feeding device 151 of the present unit 1 feeds the treatment liquid W stored in the first tank 101 to the third tank 103.

[0112] First, the first liquid feeding control device 17b controls the operation of the first analysis introduction valve 421 so that the remaining treatment liquid W stored in the first tank 101 does not pass through the first analysis introduction valve 421 and is not introduced into the analysis unit 43.

[0113] Next, the first analysis introduction valve 421 closes.

[0114] Next, the analysis unit 43 analyzes the state of the treatment liquid W that was stored in the first tank 101.

[0115] Next, the analysis unit 43 transmits the analysis result including that the state of the analyzed treatment liquid W is normal to the control device 17.

[0116] Next, the first liquid feeding control device 17b controls the operation of the first liquid feeding device 151 so that the remaining processing liquid W stored in the first tank 101 is fed to the third tank 103.

[0117] Next, the first liquid feeding valve 151a opens.

[0118] Next, the first liquid feeding pump 151b sucks the processing liquid W that has passed through the first liquid feeding valve 151a from the upstream side (the first tank 101 side).

[0119] Next, the first liquid feeding pump 151b discharges the sucked processing liquid W to the downstream side (the third tank 103 side). That is, the first liquid feeding device 151 feeds the processing liquid W stored in the first tank 101 to the third tank 103.

[0120] Next, the third tank 103 stores the processing liquid W.

[0121] In this way, when the state of the processing liquid analyzed by the analysis unit 43 is normal, the first liquid feeding device 151 feeds the processing liquid W stored in the first tank 101 to the third tank 103. Also, similar to FIG. 3, the second tank 102 continues to store the processing liquid W.

[0122] FIG. 5 is a schematic diagram showing the operation when the third liquid feeding device 153 of the present unit 1 feeds the processing liquid W stored in the third tank 103 to the post-process device 3.

[0123] First, similar to FIG. 4, the first liquid feeding device 151 feeds the processing liquid W stored in the first tank 101 to the third tank 103.

[0124] Next, the third liquid level gauge 163 detects a predetermined third storage amount (for example, 5% or more of the detection upper limit).

[0125] Next, the result of the detection by the third liquid level gauge 163 is transmitted to the control device 17.

[0126] Next, the third liquid feeding control device 17d controls the operation of the third liquid feeding device 153 so that the processing liquid W stored in the third tank 103 is fed to the post-process device 3.

[0127] Next, the third liquid feeding valve 153a opens.

[0128] Next, the third liquid feeding pump 153b sucks the processing liquid W that has passed through the third liquid feeding valve 153a from the upstream side (the third tank 103 side).

[0129] Next, the third liquid feeding pump 153b discharges the sucked processing liquid W to the downstream side (the post-process device 3 side). That is, the third liquid feeding device 153 feeds the processing liquid W stored in the third tank 103 to the post-process device 3.

[0130] Thus, when the third liquid level gauge 163 detects a predetermined third storage amount, the third liquid feeding device 153 feeds the processing liquid W stored in the third tank 103 to the post-process device 3. Also, similar to FIGS. 3 and 4, the second tank 102 continues to store the processing liquid W.

[0131] FIG. 6 is a schematic diagram showing the operation when the processing liquid W is introduced from the pre-process device 2 into the first tank 101 through the first introduction valve 14a of the present unit 1 and the third liquid feeding device 153 feeds the processing liquid W stored in the third tank 103 to the post-process device 3.

[0132] First, the second liquid level gauge 162 detects a predetermined second storage amount (for example, 90% or more of the detection upper limit).

[0133] Next, the result of the detection by the second liquid level gauge 162 is transmitted to the control device 17.

[0134] Next, the introduction control device 17a controls the operation of the introduction valve 14 so that the processing liquid W fed from the pre-process device 2 does not pass through the introduction valve 14 and is not introduced into the second tank 102.

[0135] Next, the second introduction valve 14b closes.

[0136] Next, the processing liquid W sent from the previous process device 2 does not pass through the second introduction valve 14b and is not introduced into the second tank 102.

[0137] Next, the second liquid feeding control device 17c controls the operation of the second analysis introduction valve 422 so that the processing liquid W stored in the second tank 102 is introduced into the analysis unit 43.

[0138] Next, the second analysis introduction valve 422 opens.

[0139] Next, the processing liquid W stored in the second tank 102 passes through the second analysis introduction valve 422 and is introduced into the analysis unit 43.

[0140] Next, the first liquid feeding control device 151 controls the operation of the first liquid feeding device 151 so that the processing liquid W stored in the first tank 101 is not fed to the third tank 103.

[0141] Next, the first liquid feeding valve 151a closes.

[0142] Next, the first liquid feeding pump 151b stops the suction operation and the discharge operation. That is, the first liquid feeding device 151 does not feed the processing liquid W stored in the first tank 101 to the third tank 103 (stops the liquid feeding).

[0143] Next, the introduction control device 17a controls the operation of the introduction valve 14 so that the processing liquid W sent from the previous process device 2 is introduced into the first tank 101.

[0144] Next, the first introduction valve 14a opens.

[0145] Next, the processing liquid W sent from the previous process device 2 passes through the first introduction valve 14a and is introduced into the first tank 101.

[0146] Next, the first tank 101 stores the processing liquid W.

[0147] Thus, when the second liquid level gauge 162 detects a predetermined second storage amount, the processing liquid W fed from the previous process device 2 does not pass through the second introduction valve 14b and is not introduced into the second tank 102. Further, when the processing liquid W fed from the previous process device 2 does not pass through the second introduction valve 14b and is not introduced into the second tank 102, the processing liquid W fed from the previous process device 2 passes through the first introduction valve 14a and is introduced into the first tank 101. Furthermore, the analysis unit 43 analyzes the state of the processing liquid W stored in the second tank 102. Moreover, as in FIG. 5, as long as the third liquid level gauge 163 detects a predetermined third storage amount, the third liquid feeding device 153 continues to feed the processing liquid W stored in the third tank 103 to the subsequent process device 3.

[0148] FIG. 7 is a schematic diagram showing the operation when the second liquid feeding device of the present unit 1 feeds the processing liquid W stored in the second tank to the third tank 103 and the third liquid feeding device 153 feeds the processing liquid W stored in the third tank 103 to the subsequent process device 3.

[0149] This figure is different from FIG. 6 in that the processing liquid W stored in the second tank 102 is fed to the third tank 103.

[0150] First, the second liquid feeding control device 17c controls the operation of the second analysis introduction valve 422 so that the remaining processing liquid W stored in the second tank 102 does not pass through the second analysis introduction valve 422 and is not introduced into the analysis unit 43.

[0151] Next, the second analysis introduction valve 422 closes.

[0152] Next, the analysis unit 43 analyzes the state of the processing liquid W that was stored in the second tank 102.

[0153] Next, the analysis unit 43 transmits the result of the analysis, including that the state of the analyzed processing liquid W is normal, to the control device 17.

[0154] Next, the second liquid-feeding control device 17c controls the operation of the second liquid-feeding device 152 so that the remaining processing liquid W stored in the second tank 102 is fed to the third tank 103.

[0155] Next, the second liquid-feeding valve 152a opens.

[0156] Next, the second liquid-feeding pump 152b sucks the processing liquid W that has passed through the second liquid-feeding valve 152a from the upstream side (the second tank 102 side).

[0157] Next, the second liquid-feeding pump 152b discharges the sucked processing liquid W to the downstream side (the third tank 103 side). That is, the second liquid-feeding device 152 feeds the processing liquid W stored in the second tank 102 to the third tank 103.

[0158] Thus, when the state of the processing liquid W analyzed by the analysis unit 43 is normal, the second liquid-feeding device 152 feeds the processing liquid W stored in the second tank 102 to the third tank 103. Also, similar to FIG. 6, the first tank 101 continues to store the processing liquid W. Further, similar to FIGS. 5 and 6, as long as the third liquid level gauge 163 detects a predetermined third storage amount, the third liquid-feeding device 153 continues to feed the processing liquid W stored in the third tank 103 to the post-process device 3.

[0159] FIG. 8 is a schematic diagram showing the operation when the processing liquid W is introduced from the pre-process device 2 into the first tank 101 through the second introduction valve 14b of the present unit 1 and the third liquid-feeding device 153 feeds the processing liquid W stored in the third tank 103 to the post-process device 3.

[0160] First, the first liquid level gauge 161 detects a predetermined first storage amount (for example, 90% or more of the detection upper limit).

[0161] Next, the result of the detection by the first liquid level gauge 161 is transmitted to the control device 17.

[0162] Next, the introduction control device 17a controls the operation of the introduction valve 14 so that the processing liquid W fed from the previous process device 2 does not pass through the introduction valve 14 and is not introduced into the first tank 101.

[0163] Next, the first introduction valve 14a closes.

[0164] Next, the processing liquid W fed from the previous process device 2 does not pass through the first introduction valve 14a and is not introduced into the first tank 101.

[0165] Next, the first liquid feed control device 17b controls the operation of the first analysis introduction valve 421 so that the processing liquid W stored in the first tank 101 is introduced into the analysis unit 43.

[0166] Next, the first analysis introduction valve 421 opens.

[0167] Next, the processing liquid W stored in the first tank 101 passes through the first analysis introduction valve 421 and is introduced into the analysis unit 43.

[0168] Next, the second liquid feed control device 152 controls the operation of the second liquid feed device 152 so that the processing liquid W stored in the second tank 102 is not fed to the third tank 103.

[0169] Next, the second liquid feed valve 152a closes.

[0170] Next, the second liquid feed pump 152b stops the suction operation and the discharge operation. That is, the second liquid feed device 152 does not feed the processing liquid W stored in the second tank 102 to the third tank 103 (stops the liquid feed).

[0171] Next, the introduction control device 17a controls the operation of the introduction valve 14 so that the processing liquid W fed from the previous process device 2 is introduced into the second tank 102.

[0172] Next, the second introduction valve 14b opens.

[0173] Next, the processing liquid W fed from the previous process device 2 passes through the second introduction valve 14b and is introduced into the second tank 102.

[0174] Next, the second tank 102 stores the processing liquid W.

[0175] In this way, when the first liquid level gauge 161 detects a predetermined first storage amount, the processing liquid W fed from the previous process device 2 does not pass through the first introduction valve 14a and is not introduced into the first tank 101. Also, when the processing liquid W fed from the previous process device 2 does not pass through the first introduction valve 14a and is not introduced into the first tank 101, the processing liquid W fed from the previous process device 2 passes through the second introduction valve 14b and is introduced into the second tank 102. Further, the analysis unit 43 analyzes the state of the processing liquid W stored in the first tank 101. Furthermore, similar to FIGS. 5-7, as long as the third liquid level gauge 163 detects a predetermined third storage amount, the third liquid feeding device 153 continues to feed the processing liquid W stored in the third tank 103 to the subsequent process device 3.

[0176] Next, the operation of this unit 1 shifts to the operation shown in FIG. 5. Thereafter, this unit 1 repeats the operations shown in FIGS. 5-8.

[0177] ●Summary (1) According to the embodiments described above, the present unit 1 is connected between a pre-process device 2 that performs pre-process on the processing liquid W and a post-process device 3 that performs post-process on the processing liquid W on which the pre-process has been performed. The present unit 1 includes a first tank 101 that temporarily stores the processing liquid W fed from the pre-process device 2, a second tank 102 that temporarily stores the processing liquid W fed from the pre-process device 2, a third tank 103 that temporarily stores the processing liquid W fed from each of the first tank 101 and the second tank 102, and a derivation flow path 13 disposed between the post-process device 3 and the third tank 103. The processing liquid W fed from the pre-process device 2 always passes through the introduction valve 14 and is alternately introduced into the first tank 101 and the second tank 102. The third liquid feeding device 153 continuously feeds the processing liquid W stored in the third tank 103 to the post-process device 3. As a result, the present unit 1 can perform stable flow rate adjustment in continuous production.

[0178] Also, according to the embodiments described above, the present unit 1 is connected to an analysis device 4 that analyzes the processing liquid. The present unit 1 includes a first liquid feeding device 151 that feeds the processing liquid W stored in the first tank 101 to the third tank 103, a second liquid feeding device 152 that feeds the processing liquid W stored in the second tank 102 to the third tank 103, a first liquid feeding control device 17b that controls the operation of the first liquid feeding device 151, and a second liquid feeding control device 17c that controls the operation of the second liquid feeding device 152. The first liquid feeding device 151 and the second liquid feeding device 152 are controlled based on the result of analysis by the analysis device 4. As a result, the present unit 1 can continuously feed only the processing liquid W with normal state among the processing liquid W fed from the pre-process device 2 to the post-process device 3 in continuous production.

[0179] Furthermore, in the embodiments described above, the analysis device 4 was connected to the present unit 1. However, the analysis device in the present invention may not be connected to the present unit according to the present invention. That is, for example, the analysis device in the present invention may be provided in the present unit.

[0180] Furthermore, in the embodiments described above, the processing liquid W stored in the first tank 101 was introduced into the analysis unit 43 through the first analysis introduction valve 421. The processing liquid W stored in the second tank 102 was introduced into the analysis unit 43 through the second analysis introduction valve 422. However, the processing liquid in the present invention is not limited to being introduced into the analysis unit through the first analysis introduction valve or the second analysis introduction valve. That is, for example, the processing liquid stored in the first tank or the second tank in the present invention is manually collected by the user of this unit, that is, the person who wants to enable stable flow rate adjustment using this unit in continuous production. The collected processing liquid is introduced into the analysis unit by the user. In this case, the analyzer in the present invention may not include the first analysis introduction flow path, the second analysis introduction flow path, the first analysis introduction valve, and the second analysis introduction valve.

[0181] Furthermore, according to the embodiments described above, the volume of the third tank 103 is larger than the volume of the first tank 101 and the volume of the second tank 102. The liquid feeding speed of the first liquid feeding device 151 and the liquid feeding speed of the second liquid feeding device 152 are faster than the liquid feeding speed of the third liquid feeding device 153. As a result, even when neither the first liquid feeding device 151 nor the second liquid feeding device 152 feeds the processing liquid W to the third tank 103 in continuous production, the unit 1 can continuously feed the processing liquid W to the subsequent process device 3.

[0182] Furthermore, the volume of the third tank in the present invention may not be larger than the volume of the first tank and the volume of the second tank in the present invention. That is, for example, the volume of the third tank in the present invention may be the same as the volume of the first tank and the volume of the second tank.

[0183] Furthermore, the liquid feeding speed of the first liquid feeding device and the liquid feeding speed of the second liquid feeding device in the present invention may not be faster than the liquid feeding speed of the third liquid feeding device in the present invention. That is, for example, the liquid feeding speed of the first liquid feeding device and the liquid feeding speed of the second liquid feeding device in the present invention may be the same as the liquid feeding speed of the third liquid feeding device in the present invention.

[0184] ● Embodiment (2) of this unit ● Another embodiment of this unit described below (hereinafter referred to as "Second Embodiment") will be described centering on the differences from the embodiment of this unit described above (hereinafter referred to as "First Embodiment"). For convenience of explanation, the same members as those in the First Embodiment and the members having common functions are given the same reference numerals as those in the First Embodiment, and detailed descriptions thereof are omitted.

[0185] The Second Embodiment is different from the First Embodiment in that the concentration adjustment is performed between the pre-process (for example, concentration) and the post-process (for example, crystallization).

[0186] The Second Embodiment is different from the First Embodiment in that this unit includes a first mass flowmeter, a second mass flowmeter, and a stirring device, and is connected to a solvent introduction device.

[0187] The Second Embodiment is different from the First Embodiment in that a solvent is introduced into a third tank in which the processing liquid is stored.

[0188] The "solvent" is a liquid capable of diluting the processing liquid.

[0189] ● Configuration of this unit (2) FIG. 9 is a schematic diagram showing a second embodiment of this unit.

[0190] This unit 1A is connected to a pre-process device 2, a post-process device 3, an analysis device 4, and a solvent introduction device (not shown). This unit 1A includes a first tank 101, a second tank 102, a third tank 103, an introduction flow path 11, a first liquid feed flow path 121, a second liquid feed flow path 122, a derivation flow path 13, an introduction valve 14, a first liquid feed device 151, a second liquid feed device 152, a third liquid feed device 153, a first liquid level gauge 161, a second liquid level gauge 162, a third liquid level gauge 163, a control device 17A, a first mass flowmeter 181, a second mass flowmeter 182, and a stirring device 19.

[0191] The first mass flow meter 181 measures the specific gravity of the processing liquid W flowing through the first liquid supply channel 121. The first mass flow meter 181 is arranged in the middle of the first liquid supply channel 121. The result of the measurement by the first mass flow meter 181 is transmitted to the control device 17A.

[0192] The second mass flow meter 182 measures the specific gravity of the processing liquid W flowing through the second liquid supply channel 122. The second mass flow meter 182 is arranged in the middle of the second liquid supply channel 122. The result of the measurement by the second mass flow meter 182 is transmitted to the control device 17A. The first mass flow meter 181 is configured independently of the second mass flow meter 182.

[0193] Note that the first mass flow meter in the present invention does not necessarily have to be configured independently of the second mass flow meter in the present invention. That is, for example, when a part of the first liquid supply channel in the present invention and a part of the second liquid supply channel in the present invention form one channel (are integrated), the first mass flow meter in the present invention and the second mass flow meter in the present invention may be one mass flow meter.

[0194] The solvent introduction device introduces the solvent into the third tank 103. The operation of the solvent introduction device is controlled by the control device 17A. The solvent introduction device is connected to the third tank 103. The solvent introduction device includes a solvent introduction channel 51.

[0195] The solvent introduction channel 51 is a pipe through which the solvent flows. The solvent introduction channel 51 is connected to the third tank 103. The solvent flowing through the solvent introduction channel 51 is introduced into the third tank 103.

[0196] The solvent (not shown) is a liquid that can dilute the processing liquid W. The solvent is introduced into the third tank 103 by the solvent introduction device based on the result of the measurement by the first mass flow meter 181 or the second mass flow meter 182.

[0197] The stirring device 19 stirs the treatment liquid W stored in the third tank 103. When a solvent is introduced into the third tank 103, the stirring device 19 stirs the treatment liquid W stored in the third tank 103 and the solvent introduced into the third tank 103. The stirring device 19 equalizes the concentration of the treatment liquid W stored in the third tank 103. The operation of the stirring device 19 is controlled by the control device 17A.

[0198] Note that this unit may not be provided with a stirring device.

[0199] The control device 17A controls the operations of the introduction valve 14, the first liquid feeding device 151, the second liquid feeding device 152, the third liquid feeding device 153, the analysis device 4, the solvent introduction device, and the stirring device 19. The control device 17A receives the results of measurements by the first mass flowmeter 181 and the second mass flowmeter 182 (hereinafter referred to as "each mass flowmeter"). The control device 17A controls the operation of the solvent introduction device based on the results of measurements by each mass flowmeter. Specifically, when each mass flowmeter measures a predetermined specific gravity that requires dilution of the treatment liquid, the control device 17A controls the operation of the solvent introduction device so that a predetermined amount of solvent is introduced into the third tank 103.

[0200] ● Operation of this unit (2) The operation of this unit in the second embodiment is described below. Some of the operations in the following description overlap with the operations of the unit 1 (the first embodiment of this unit) shown in FIG. 7.

[0201] First, the second liquid feeding device 152 feeds the treatment liquid W stored in the second tank 102 to the third tank 103. That is, the treatment liquid W stored in the second tank 102 flows through the second liquid feeding channel 122.

[0202] Next, the second mass flowmeter 182 measures the specific gravity of the treatment liquid W flowing through the second liquid feeding channel 122.

[0203] Next, the result of the measurement by the second mass flowmeter 182, which includes the necessity of diluting the processing liquid W flowing through the second liquid supply channel 122, is transmitted to the control device 17A.

[0204] Next, the control device 17A controls the operation of the solvent introduction device so that a predetermined amount of solvent is introduced into the third tank 103.

[0205] Next, the solvent introduction device introduces a predetermined amount of solvent into the third tank 103.

[0206] Next, the control device 17A controls the operation of the stirring device 19.

[0207] Next, the stirring device 19 stirs the processing liquid W stored in the third tank 103 and the solvent introduced into the third tank 103.

[0208] Next, the third liquid supply device 153 supplies the processing liquid W stirred in the third tank 103 to the post-process device 3.

[0209] Thus, when it is necessary to dilute the processing liquid W flowing through the second liquid supply channel 122, the solvent is introduced into the third tank 103 by the solvent introduction device. The stirring device 19 stirs the processing liquid W stored in the third tank 103 and the solvent introduced into the third tank 103. The processing liquid W fed from the second tank 102 to the third tank 103 is diluted.

[0210] Note that when the solvent in the present invention is introduced into the third tank, it is not limited to when it is necessary to dilute the processing liquid flowing through the second liquid supply channel. That is, for example, when it is necessary to dilute the processing liquid flowing through the first liquid supply channel, the solvent may be introduced into the third tank 103 by the solvent introduction device. In this case, the processing liquid fed from the first tank to the third tank is diluted.

[0211] ●Summary (2) According to the embodiments described above, this unit 1A is connected to a solvent introduction device. This unit 1A includes a first mass flowmeter 181 that measures the specific gravity of the processing liquid W flowing through the first liquid delivery channel 121, and a second mass flowmeter 182 that measures the specific gravity of the processing liquid W flowing through the second liquid delivery channel 122. The solvent is introduced into the third tank 103 by the solvent introduction device. The third liquid delivery device 153 continuously delivers the diluted processing liquid W stored in the third tank 103 to the subsequent process device 3. As a result, this unit 1A realizes stable flow rate adjustment and stable concentration adjustment in continuous production.

[0212] In addition, in the embodiments described above, the solvent was introduced into the third tank 103 by the solvent introduction device. However, the solvent in the present invention is not limited to being introduced into the third tank 103 by the solvent introduction device. That is, for example, the first mass flowmeter and the second mass flowmeter in the present invention may provide the measurement results to the user, such as by displaying them on the displays of the first mass flowmeter and the second mass flowmeter. Based on the provided measurement results, the user introduces the solvent into the third tank. In other words, the solvent is introduced by the user based on the measurement results. In this case, this unit according to the present invention does not necessarily need to be connected to the solvent introduction device.

[0213] ●Other Embodiments of This Unit● In the embodiments described above, the number of tanks connected to the downstream side of the introduction channel 11 was two, namely the first tank 101 and the second tank 102. However, in this unit, the number of tanks connected to the downstream side of the introduction channel is not limited to two. That is, for example, the number of tanks connected to the downstream side of the introduction channel may be three or more.

[0214] Also, in the embodiments described above, the processing liquid W fed from the previous process device 2 always passed through the introduction valve 14 and was alternately introduced into the first tank 101 and the second tank 102. However, the processing liquid fed from the previous process device may not always be introduced into the first tank or the second tank through the introduction valve in the present invention.

[0215] Furthermore, in the embodiments described above, this unit (1, 1A) included each liquid level gauge. However, this unit according to the present invention may not include each liquid level gauge. In this case, the introduction control device, the first liquid feeding control device, and the second liquid feeding control device in the present invention do not control the operations of the introduction valve, the first liquid feeding device, or the second liquid feeding device based on the detection results by each liquid level gauge. That is, for example, the introduction control device, the first liquid feeding control device, and the second liquid feeding control device in the present invention may control the operations of the introduction valve, the first liquid feeding device, or the second liquid feeding device based on the passage of time during which the processing liquid is stored in the first tank, the second tank, or the third tank.

[0216] Furthermore, in the embodiments described above, when the first introduction valve 14a is opened, the first liquid feeding control device 151 controls the operation of the first liquid feeding device 151 so that the processing liquid W stored in the first tank 101 is not fed to the third tank 103. However, the first liquid feeding control device in the present invention is not limited to the case where the first introduction valve is opened when controlling the operation of the first liquid feeding device so that the processing liquid stored in the first tank is not fed to the third tank. That is, for example, when the third liquid level gauge detects a predetermined third storage amount (for example, 90% or more of the detection upper limit), the first liquid feeding control device in the present invention may control the operation of the first liquid feeding device so that the processing liquid stored in the first tank is not fed to the third tank. When the first liquid level gauge detects a predetermined first storage amount (for example, less than 5% of the detection upper limit), the first liquid feeding control device in the present invention may control the operation of the first liquid feeding device so that the processing liquid stored in the first tank is not fed to the third tank. In this case, this unit can prevent the processing liquid from being excessively fed to the third tank.

[0217] Furthermore, in the embodiments described above, when the second introduction valve 14b is opened, the second liquid feeding control device 152 controls the operation of the second liquid feeding device 152 so that the processing liquid W stored in the second tank 102 is not fed to the third tank 103. However, the second liquid feeding control device in the present invention is not limited to the case where the second introduction valve is opened when controlling the operation of the second liquid feeding device so that the processing liquid stored in the second tank is not fed to the third tank. That is, for example, when the third liquid level gauge detects a predetermined third storage amount (for example, 90% or more of the detection upper limit), the second liquid feeding control device in the present invention may control the operation of the second liquid feeding device so that the processing liquid stored in the second tank is not fed to the third tank. When the second liquid level gauge detects a predetermined second storage amount (for example, less than 5% of the detection upper limit), the second liquid feeding control device in the present invention may control the operation of the second liquid feeding device so that the processing liquid stored in the second tank is not fed to the third tank. In this case, this unit can prevent the processing liquid from being excessively fed to the third tank.

[0218] Furthermore, in the embodiments described above, the analyzer 4 transmitted the analysis results to the control devices (17, 17A). However, the analyzer in the present invention only needs to be configured to be able to provide the analysis results to the first liquid feeding control device and the second liquid feeding control device in the present invention, and the means for providing the analysis results does not have to be transmission.

[0219] Furthermore, in the embodiments described above, the control devices (17, 17A) received the detection results from each liquid level gauge. However, the first liquid feeding control device and the second liquid feeding control device in the present invention only need to be configured to be able to receive the analysis results from the analyzer, and the means for receiving the analysis results does not have to be reception. That is, for example, the analyzer in the present invention may display the analysis results on the display of the analyzer and provide them to the user. In this case, the user may input the provided analysis results into the displays of the first liquid feeding control device and the second liquid feeding control device in the present invention and provide them to the first liquid feeding control device and the second liquid feeding control device. In other words, the analyzer may provide the analysis results to the first liquid feeding control device and the second liquid feeding control device via the user. The first liquid feeding control device and the second liquid feeding control device may obtain the analysis results from the analyzer via the user.

[0220] ●Features of this unit● The features of this unit described so far are summarized below.

[0221] This unit is a surge tank unit (for example, this unit 1) that is connected between a pre-process device (for example, pre-process device 2) that performs a pre-process (for example, concentration) on a processing liquid (for example, processing liquid W) and a post-process device (for example, post-process device 3) that performs a post-process (for example, crystallization) on the processing liquid on which the pre-process has been performed, temporarily stores the processing liquid fed from the pre-process device, and feeds the stored processing liquid to the post-process device. A first tank (for example, the first tank 101) that temporarily stores the processing liquid sent from the previous process device, A second tank (for example, the second tank 102) that temporarily stores the processing liquid sent from the previous process device, An introduction flow path (for example, the introduction flow path 11) that is configured to be connectable to the previous process device and is connected to the first tank and the second tank, An introduction valve (for example, the first introduction valve 14) that is connected to the introduction flow path and through which the processing liquid sent from the previous process device passes when being introduced into the first tank or the second tank, An introduction control device (for example, the introduction device 17a) that controls the operation of the introduction valve so that when the processing liquid is introduced into the first tank, the processing liquid is not introduced into the second tank, and when the processing liquid is introduced into the second tank, the processing liquid is not introduced into the first tank, A third tank (for example, the third tank 103) that temporarily stores the processing liquid sent from each of the first tank and the second tank, A discharge flow path (for example, the discharge flow path 13) that is configured to be connectable to the subsequent process device and is connected to the third tank, characterized by comprising

[0222] This unit A first liquid feeding flow path (for example, the first liquid feeding flow path 121) that is connected to the first tank and the third tank, A second liquid feeding flow path (for example, the second liquid feeding flow path 122) that is connected to the second tank and the third tank, A first liquid feeding device (for example, the first liquid feeding device 151) that is connected to the first liquid feeding flow path and feeds the processing liquid stored in the first tank to the third tank, A second liquid feeding device (for example, the second liquid feeding device 152) that is connected to the second liquid feeding flow path and feeds the processing liquid stored in the second tank to the third tank, A first liquid feeding control device (for example, the first liquid feeding control device 17b) that controls the operation of the first liquid feeding device, ​A second liquid-feeding control device (for example, the second liquid-feeding control device 17c) that controls the operation of the second liquid-feeding device; and has When the second liquid-feeding device is not feeding the processing liquid, the first liquid-feeding control device causes the first liquid-feeding device to feed the processing liquid, When the first liquid-feeding device is not feeding the processing liquid, the second liquid-feeding control device causes the second liquid-feeding device to feed the processing liquid. It may be such.

[0223] In this unit, The first liquid-feeding control device and the second liquid-feeding control device are configured to be able to receive the analysis results of an analysis device (for example, the analysis device 4) that analyzes the processing liquid stored in the first tank and the processing liquid stored in the second tank, Based on the analysis results of the processing liquid stored in the first tank by the analysis device, the first liquid-feeding control device controls the operation of the first liquid-feeding device, Based on the analysis results of the processing liquid stored in the second tank by the analysis device, the second liquid-feeding control device controls the operation of the second liquid-feeding device. It may be such.

[0224] This unit is connected to the first liquid-feeding flow path and has a first mass flow meter (for example, the first mass flow meter 181) that measures the specific gravity of the processing liquid flowing through the first liquid-feeding flow path, is connected to the second liquid-feeding flow path and has a second mass flow meter (for example, the second mass flow meter 182) that measures the specific gravity of the processing liquid flowing through the second liquid-feeding flow path, and has It may be such.

[0225] In this unit, the third tank is connected to a solvent introduction device that introduces a solvent capable of diluting the processing liquid into the third tank, The solvent is introduced into the third tank based on the measurement results of the first mass flowmeter or the second mass flowmeter. It may be such.

[0226] This unit is connected to the derivation flow path and is configured to be able to send the treatment liquid stored in the third tank to the post-process device (for example, the third liquid sending device 153). It has The volume of the third tank is larger than the volume of the first tank and the volume of the second tank. The liquid sending speed of the first liquid sending device and the liquid sending speed of the second liquid sending device are faster than the liquid sending speed of the third liquid sending device. It may be such.

[0227] In this unit, The volume of the first tank is the same as the volume of the second tank. It may be such.

[0228] This unit has a third liquid sending control device (for example, the third liquid sending control device 17d) that controls the operation of the third liquid sending device. It has When the treatment liquid stored in the third tank reaches a predetermined amount (for example, 5% or more of the detection upper limit of the third liquid level gauge 163), the third liquid sending control device causes the third liquid sending device to send the treatment liquid. It may be such.

Explanation of Signs

[0229] 1 Surge tank unit 101 First tank 102 Second tank 103 Third tank 11 Introduction flow path 121 First liquid sending flow path 122 Second liquid sending flow path 13 Derivation flow path 14a First introduction valve 14b Second introduction valve 151 First liquid delivery device 151a First liquid delivery valve 151b First liquid delivery pump 152 Second liquid delivery device 152a Second liquid delivery valve 152b Second liquid delivery pump 153 Third liquid delivery device 153a Third liquid delivery valve 153b Third liquid delivery pump 161 First liquid level gauge 162 Second liquid level gauge 163 Third liquid level gauge 17 Control device 17a Introduction control device 17b First liquid delivery control device 17c Second liquid delivery control device 17d Third liquid delivery control device 181 First mass flowmeter 182 Second mass flowmeter 19 Stirring device 2 Pre-process device 3 Post-process device 4 Analyzer 411 First analysis introduction flow path 412 Second analysis introduction flow path 421 First analysis introduction valve 422 Second analysis introduction valve 43 Analysis section 51 Solvent introduction flow path W Processing liquid

Claims

1. A surge tank unit connected between a pre-process device that executes a pre-process on a processing liquid and a post-process device that executes a post-process on the processing liquid after the pre-process is executed, temporarily stores the processing liquid fed from the pre-process device, and feeds the stored processing liquid to the post-process device, comprising: a first tank that temporarily stores the processing liquid fed from the pre-process device; a second tank that temporarily stores the processing liquid fed from the pre-process device; an introduction flow path configured to be connectable to the pre-process device and connected to the first tank and the second tank; an introduction valve connected to the introduction flow path and through which the processing liquid fed from the pre-process device passes when introduced into the first tank or the second tank; an introduction control device that controls the operation of the introduction valve so that when the processing liquid is introduced into the first tank, the processing liquid is not introduced into the second tank, and when the processing liquid is introduced into the second tank, the processing liquid is not introduced into the first tank; a third tank that temporarily stores the processing liquid fed from each of the first tank and the second tank; a derivation flow path configured to be connectable to the post-process device and connected to the third tank; characterized by comprising: a surge tank unit.

2. a first liquid feeding flow path connected to the first tank and the third tank; a second liquid feeding flow path connected to the second tank and the third tank; a first liquid feeding device connected to the first liquid feeding flow path and feeding the processing liquid stored in the first tank to the third tank; a second liquid feeding device connected to the second liquid feeding flow path and feeding the processing liquid stored in the second tank to the third tank; a first liquid feeding control device that controls the operation of the first liquid feeding device; a second liquid feeding control device that controls the operation of the second liquid feeding device; characterized by comprising: the first liquid feeding control device causes the first liquid feeding device to feed the processing liquid when the second liquid feeding device is not feeding the processing liquid; the second liquid feeding control device causes the second liquid feeding device to feed the processing liquid when the first liquid feeding device is not feeding the processing liquid; the surge tank unit according to Claim 1.

3. the first liquid feeding control device and the second liquid feeding control device are: configured to be able to receive the analysis result of an analyzer that analyzes the processing liquid stored in the first tank and the processing liquid stored in the second tank, the first liquid feeding control device controls the operation of the first liquid feeding device based on the analysis result of the processing liquid stored in the first tank by the analyzer, the second liquid feeding control device controls the operation of the second liquid feeding device based on the analysis result of the processing liquid stored in the second tank by the analyzer, The surge tank unit according to claim 2.

4. a first mass flow meter connected to the first liquid feeding flow path and measuring the specific gravity of the processing liquid flowing through the first liquid feeding flow path; a second mass flow meter connected to the second liquid feeding flow path and measuring the specific gravity of the processing liquid flowing through the second liquid feeding flow path; characterized by comprising The surge tank unit according to claim 2.

5. the third tank is connected to a solvent introduction device that introduces a solvent capable of diluting the processing liquid into the third tank, the solvent is introduced into the third tank based on the measurement result of the first mass flow meter or the second mass flow meter, The surge tank unit according to claim 4.

6. a third liquid feeding device connected to the derivation flow path and configured to be able to feed the processing liquid stored in the third tank to the post-process device, characterized by comprising the volume of the third tank is larger than the volume of the first tank and the volume of the second tank, the liquid feeding speed of the first liquid feeding device and the liquid feeding speed of the second liquid feeding device are faster than the liquid feeding speed of the third liquid feeding device, The surge tank unit according to claim 2.

7. the volume of the first tank is the same as the volume of the second tank, The surge tank unit according to claim 6.

8. a third liquid feeding control device that controls the operation of the third liquid feeding device, characterized by comprising when the processing liquid stored in the third tank reaches a predetermined amount, the third liquid feeding control device causes the third liquid feeding device to feed the processing liquid, The surge tank unit according to claim 7.

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