Heating element and electronic atomizer

Abstract

The heating element (100) includes a vertically long base (10) and a heating film (20) including at least two sub-heating films (21) provided on the base (10) and sequentially arranged along the vertical direction of the base (10), in which the initial heating power per unit area of ​​the sub-heating film (21) located at the apex of each of the sub-heating films (21) is greater than the initial heating power per unit area of ​​each of the other sub-heating films (21), and the heating power change rate of the sub-heating film (21) located at the apex and having the largest initial heating power per unit area is smaller than the heating power change rate of each of the other sub-heating films (21). In this way, in the initial stage of suction, the aerosol is quickly formed by roasting in the high-temperature region at the apex, and then the heating temperatures of each region are gradually made closer to each other, so that the entire aerosol-generating substrate is roasted evenly and sufficiently to prevent burning due to excessive temperature, and the aerosol-generating substrate is effectively roasted and utilized, improving the user experience.

Description

[Technical field]

[0001] TECHNICAL FIELD This application relates to the field of atomization technology, and in particular to heating elements and electronic atomization devices. [Background technology]

[0002] Aerosol is a colloidal dispersion system formed when small particles of solid or liquid are dispersed and suspended in a gas medium. For example, aerosol can be generated by heating aerosol-generating substrates such as herbs or ointments using an electronic atomizer, and can be applied in various fields to deliver inhalable aerosol to users, replacing conventional product forms and inhalation methods.

[0003] Generally, electronic atomizers usually use a heating element to heat an aerosol-generating substrate, which is a substrate material capable of generating an aerosol when heated. However, the heating element in the prior art has a defect of slow aerosol formation speed, and in order to improve the aerosol formation speed, some embodiments make the high-temperature area of ​​the heating element close to the inhalation part of the user's mouth. However, since the position and volume of the high-temperature area are constant, the aerosol-generating substrate roasted at this point is prone to burning, which affects the texture. In other embodiments, in order to improve the aerosol formation speed, the aerosol-generating substrate can be provided with a lot of heating energy in the initial heating stage to improve the aerosol formation speed, but the initial heating energy is large and the carbonization speed of the aerosol-generating substrate is too fast, which reduces the effective number of inhalations, and the aerosol-generating substrate cannot be effectively roasted and used.

[0004] Therefore, the heating elements in the related art are prone to causing localized scorching when increasing the rate of aerosol formation, or are unable to effectively heat and utilize the aerosol-generating substrate, affecting the user's experience. Summary of the Invention

[0005] In view of this, there is a need to provide a heating element and electronic atomization device that can increase the rate of aerosol formation, avoid localized scorching, and effectively heat and utilize the aerosol-generating substrate, thereby improving the user experience.

[0006] A heating element comprising: a base having an elongated structure and including a bottom end and an apex end opposite the bottom end; a heating film provided on the base and including at least two sub-heating films sequentially arranged along the longitudinal direction of the base; A heating element in which the initial heating power per unit area of ​​the sub-heating film located at the apex end among each of the sub-heating films is greater than the initial heating power per unit area of ​​each of the other sub-heating films, and the heating power change rate of the sub-heating film located at the apex end and having the largest initial heating power per unit area is smaller than the heating power change rate of each of the other sub-heating films.

[0007] In the above heating element, the initial heating power per unit area of ​​the sub-heating film located at the apex is the maximum, and a high temperature region is formed at the apex at the beginning of suction, thereby improving the aerosol formation speed. The sub-heating film with the maximum initial heating power has the smallest heating power change rate, while the other sub-heating films have a large heating power change rate. After a certain period of current flow, the heating power change rate of the sub-heating film at the apex is small, while the heating power change rate of the sub-heating film at the bottom is large. This allows the heating power of the sub-heating film at the apex and the sub-heating film at the bottom to gradually approach each other, and the heating power of the sub-heating film at the bottom exceeds the heating power of the sub-heating film at the apex. Furthermore, the sub-heating film at the bottom rises in temperature quickly until it approaches the temperature of the sub-heating film at the apex, and the entire heating film can be heated uniformly in the longitudinal direction.

[0008] In this way, at least two sub-heating films of the heating film can uniformly heat and atomize the entire aerosol-generating substrate, and prevent a certain area from being burned due to a local temperature being too high. In addition, in the early stage of heating, there is no need to provide a large heating energy to the entire aerosol-generating substrate, and the overall carbonization speed of the aerosol-generating substrate is prevented from being too fast, which reduces the effective number of suctions, and the aerosol-generating substrate can be fully roasted for use. That is, in the early stage of suction, the apical high-temperature region is quickly roasted to form an aerosol, and then the heating temperatures of each area are gradually brought closer to each other, so that the entire aerosol-generating substrate can be roasted uniformly and fully, and prevent a certain area from being burned due to a local temperature being too high for a long period of time, and the aerosol-generating substrate can be effectively roasted for use, improving the user experience.

[0009] In any embodiment, along the direction from the bottom end to the top end, the initial heating power per unit area of ​​each of the sub-heating films gradually increases, and the heating power change rate of each of the sub-heating films gradually decreases.

[0010] In any embodiment, each of the sub-heating films is a thermistor, and the at least two sub-heating films are connected in series with each other; Along the direction from the bottom end to the top end, the initial resistance per unit area of ​​each of the sub-heating films connected in series with each other gradually increases, and the rate of change in resistance of each of the sub-heating films gradually decreases.

[0011] In any embodiment, each of the sub-heating films is a thermistor, and the at least two sub-heating films are connected in parallel with each other; Along the direction from the bottom end to the top end, the initial resistance per unit area of ​​each of the sub-heating films connected in parallel to each other gradually decreases, and the rate of change in resistance of each of the sub-heating films gradually decreases.

[0012] In either embodiment, all the sub-heating films are made of a material having a positive temperature coefficient of resistance, or all the sub-heating films are made of a material having a negative temperature coefficient of resistance.

[0013] In any embodiment, of the at least two sub-heating films, a portion of the sub-heating film located at the bottom end is made of a positive temperature coefficient material, and of the at least two sub-heating films, another portion of the sub-heating film located at the top end is made of a negative temperature coefficient material.

[0014] In any embodiment, the heating element further includes a first electrode layer and a second electrode layer provided on the substrate, the first electrode layer and the second electrode layer respectively contacting two sub-heating films at the front and rear ends of the at least two sub-heating films.

[0015] In any one of the embodiments, the heating element further includes an infrared emitting layer, the infrared emitting layer being provided on the base and being laminated with the heating film; The projection of the infrared radiation layer onto the plane on which the heating film is located covers all of the sub-heating films.

[0016] In either embodiment, the substrate is configured as a central heating structure, the outer periphery of the substrate forms the storage area, and the heating film and the infrared radiation layer are laminated on the outer surface of the substrate in sequence from the inside to the outside.

[0017] In any of the embodiments, the base is configured as a pin body, the heat generating film and the infrared radiation layer are both provided extending along the circumferential direction of the pin body, and the at least two sub-heat generating films of the heat generating film are arranged along the axial direction of the pin body, or The base is configured as a sheet body, and the heating film and the infrared radiation layer are laminated in order from the inside to the outside on one of the front and back sides of the sheet body, and the infrared radiation layer is laminated on the other of the front and back sides of the sheet body.

[0018] In any embodiment, the substrate is configured as a peripheral heating structure, with an interior of the substrate forming a containment site; The heat generating film is applied to the outer peripheral surface of the base, and the infrared emitting layer is formed between the heat generating film and the base, or on the inner peripheral surface of the base facing the storage location inside the base.

[0019] In any of the embodiments, the substrate is a transparent substrate, and the infrared emitting layer is laminated between the heating film and the substrate, or The substrate is a non-transparent substrate, and the infrared emitting layer is applied to the inner peripheral surface of the substrate. An electronic atomization device, comprising the heating element described above.

[0020] In order to more clearly describe the technical means in the embodiments of the present application or the prior art, the following will briefly introduce drawings that need to be used in the description of the embodiments or the prior art. Obviously, the drawings in the following description are only embodiments of the present application, and those skilled in the art can also obtain other drawings based on the disclosed drawings without requiring creative efforts. [Brief description of the drawings]

[0021] [Figure 1] FIG. 2 is a schematic diagram showing a cross-sectional configuration of a heating member according to an embodiment of the present application. [Diagram 2] FIG. 2 is a schematic diagram showing the configuration of a base body and an electric heating film layer of the heating member shown in FIG. [Diagram 3] FIG. 3 is a development view of the electric heating film layer shown in FIG. 2. [Figure 4] FIG. 11 is a schematic diagram showing a cross-sectional configuration of a heating member according to another embodiment. [Diagram 5] FIG. 11 is a schematic diagram showing a cross-sectional configuration of a heating member according to another embodiment. [Figure 6] FIG. 11 is a schematic diagram showing a cross-sectional configuration of a heating member according to another embodiment. [Figure 7] FIG. 11 is a schematic diagram showing a cross-sectional configuration of a heating member according to another embodiment. [Figure 8] FIG. 11 is a schematic diagram showing a cross-sectional configuration of a heating member according to another embodiment. [Figure 9] FIG. 11 is a schematic diagram showing a cross-sectional configuration of a heating member according to another embodiment. [Figure 10] FIG. 10 is a schematic diagram showing the configuration of the heating element and the electric heating film layer shown in FIG. 8 or FIG. 9. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0022] In order to make the above objects, features and advantages of the present application more clear, the following detailed description will be given of specific embodiments of the present application in conjunction with the drawings. In order to fully understand the present application, various specific details will be described in the following description. However, the present application can be implemented in various forms other than those described herein, and those skilled in the art can make similar improvements without violating the content of the present application, so the present application is not limited to the specific embodiments disclosed below.

[0023] In the description of the present application, it should be understood that the orientations or positional relationships indicated by terms such as "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. are based on the orientations or positional relationships shown in the drawings, and are intended only to facilitate and simplify the description of the present application, and are not intended to indicate or imply that such devices or elements necessarily have a specific orientation or must be constructed and operated in a specific orientation, and should not be construed as limitations on the present application.

[0024] It should be noted that the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or suggesting relative importance or implying the number of technical features depicted. Thus, a feature qualified as "first" or "second" can include at least one of the feature, either explicitly or implicitly. In the description of this application, unless otherwise clearly and specifically limited, "plurality" means at least two, e.g., two, three, etc.

[0025] In this application, unless otherwise clearly specified or limited, the terms "attached," "coupled," "connected," "fixed," etc. should be understood in a broad sense, and may refer to, for example, a fixed connection, a detachable connection, or an integral connection, a mechanical connection, an electrical connection, a direct connection, an indirect connection via an intermediate, an internal communication between two elements, or an interactive relationship between two elements. Unless otherwise clearly limited, a person skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.

[0026] In this application, unless otherwise expressly specified or limited, a first feature being "above" or "below" a second feature means that the first feature and the second feature may be in direct contact with each other, or that the first feature and the second feature may be in indirect contact with each other via an intermediary. And a first feature being "above," "above," and "on" a second feature means that the first feature may be directly above or diagonally above the second feature, or simply that the horizontal height of the first feature is higher than that of the second feature. And a first feature being "below," "below," and "below" a second feature means that the first feature may be directly below or diagonally below the second feature, or simply that the horizontal height of the first feature is lower than that of the second feature.

[0027] It should be noted that when an element is said to be "fixed" or "mounted" to another element, the element may be directly on the other element or there may be intervening elements. When an element is considered to be "connected" to another element, the element may be directly connected to the other element or there may be intervening elements. As used herein, "vertical," "horizontal," "up," "down," "left," "right," and similar terms are for illustrative purposes only and do not represent the only embodiments.

[0028] Referring to Figures 1 to 3, in one embodiment of the present application, a heating element 100 is provided for heating and atomizing an aerosol-generating substrate, and the formed aerosol can be inhaled into the mouth of a user and used for inhalation by the user.

[0029] The heating element 100 includes a base 10 and a heating film 20. The base 10 has a vertically long structure and includes a bottom end and a top end opposite to the bottom end. The base 10 is used to place an aerosol-generating substrate. The heating film 20 is provided on the base 10 and includes at least two sub-heating films 21 arranged in sequence along the vertical direction B of the base 10. Among the sub-heating films 21, the initial heating power per unit area of ​​the sub-heating film 21 located at the top end is larger than the initial heating power per unit area of ​​each of the other sub-heating films 21, that is, the initial heating power of the sub-heating film 21 located at the top end is larger and the initial heating power of the sub-heating film 21 located at the bottom end is smaller. In this way, the sub-heating film 21 located at the top end heats up quickly and has a relatively high initial temperature, while the sub-heating film 21 located at the bottom end heats up slowly and has a relatively low initial temperature. The sub-heating film 21 with a higher initial temperature at its apex is closer to the position where the user inhales, and forms an aerosol faster when the user inhales, improving the texture of the user's first several inhalations.

[0030] In addition, the heating power change rate of the sub-heating film 21 located at the apex end and having the maximum initial heating power per unit area is smaller than the heating power change rates of the other sub-heating films 21. In other words, the initial heating power per unit area of ​​the sub-heating film 21 located at the apex end is the maximum, and a high-temperature region is formed at the apex end at the beginning of suction, thereby improving the aerosol formation rate. The sub-heating film 21 with the largest initial heating power has the smallest rate of change in heating power, while the other sub-heating films 21 have large rates of change in heating power. After a certain period of current has been applied, the amount of change in heating power of the top-end sub-heating film 21 is small while the amount of change in heating power of the bottom-end sub-heating film 21 is large. As a result, the heating power of the top-end sub-heating film 21 and the bottom-end sub-heating film 21 can be gradually made to approach each other, and eventually the heating power of the bottom-end sub-heating film 21 will exceed the heating power of the top-end sub-heating film 21. Furthermore, the bottom-end sub-heating film 21 will quickly rise in temperature until it approaches the temperature of the top-end sub-heating film 21, and the entire heating film 20 will be able to generate heat uniformly in the vertical direction.

[0031] In this way, at least two sub-heating films 21 of the heating film 20 can uniformly heat and atomize the entire aerosol-generating substrate, and prevent a certain area from being burned due to a local temperature being too high. In addition, in the early stage of heating, there is no need to provide a large heating energy to the entire aerosol-generating substrate, and the carbonization speed of the entire aerosol-generating substrate is prevented from being too fast, which reduces the effective number of suctions, and the aerosol-generating substrate can be fully roasted for use. That is, in the early stage of suction, the apical high-temperature region is quickly roasted to form an aerosol, and then the heating temperatures of each area are gradually brought closer to each other, so that the entire aerosol-generating substrate can be uniformly and fully roasted, and the temperature of a certain area can be prevented from being burned due to a long period of time due to a local temperature being too high, and the aerosol-generating substrate can be effectively roasted for use, improving the user experience.

[0032] The heating power change rate is a vector, and may be a positive or negative value, for example, the heating power change rate of the top sub-heating film 21 is a negative value and the heating power change rate of the bottom sub-heating film 21 is a positive value, the heating power of the bottom sub-heating film 21 gradually increases and the power of the top sub-heating film 21 gradually decreases, and after a certain time, the heating power of the bottom sub-heating film 21 conversely exceeds the heating power of the top sub-heating film 21. Also, for example, the heating power change rates of the top sub-heating film 21 and the bottom sub-heating film 21 are both positive values, and the heating power change rate of the top sub-heating film 21 is small, the increase is small, and after a certain time, the heating power of the bottom sub-heating film 21 conversely exceeds the heating power of the top sub-heating film 21. Furthermore, for example, the rates of change in resistance of the sub-heating film 21 at the top end and the sub-heating film 21 at the bottom end are both negative values, and the rate of change in the heating power of the sub-heating film 21 at the top end is small (small in negative value, large in absolute value); in other words, the absolute value by which the heating power of the sub-heating film 21 at the top end decreases is large, and after a certain time has passed, the heating power of the sub-heating film 21 at the bottom end conversely exceeds the heating power of the sub-heating film 21 at the top end.

[0033] Furthermore, along the direction from the bottom end to the top end, the initial heating power per unit area of ​​each sub-heating film 21 gradually increases, and the heating power change rate of each sub-heating film 21 gradually decreases. That is, the sub-heating film 21 located at the bottom end has a small initial heating power but a large heating power change rate, and the sub-heating film 21 located downstream of the suction airflow is closer to the position where the user inhales, has a large initial heating power, forms aerosol quickly, but has a small heating power change rate. In this way, through dynamic adjustment for a certain period of time, the sub-heating film 21 with a small initial heating power heats up quickly, and the sub-heating film 21 with a large initial heating power heats up slowly, and finally the heating temperatures of the sub-heating films 21 at the top and bottom ends approach each other, the temperature difference between each sub-heating film 21 becomes small, and the heating temperature of the entire heating film 20 becomes uniform.

[0034] Alternatively, the final temperature difference between each sub-heating film 21 is 0 to 5 degrees, i.e., the final heating temperature of each sub-heating film 21 is the same, or the final temperature difference between each sub-heating film 21 is small, thereby uniformly heating the entire aerosol-generating substrate.

[0035] In some embodiments, at least two sub-heating films 21 are connected in series with each other, and the initial resistance per unit area of ​​each of the sub-heating films 21 connected in series with each other gradually increases along the direction from the bottom end to the top end. In the whole heating circuit, when a plurality of sub-heating films 21 are connected in series with each other, the larger the resistance of each sub-heating film 21, the larger the heating power, and there is a direct proportional relationship between the two. Therefore, the sub-heating film 21 at the bottom end has a small initial resistance, a low initial heating power, and a low initial heating temperature, while the sub-heating film 21 at the top end has a large initial resistance, a large initial heating power, and a high initial heating temperature, thereby quickly forming an aerosol that flows to the position where the user inhales. Alternatively, two adjacent sub-heating films 21 of the heating film 20 are connected in series with each other by edge lamination, or adjacent sub-heating films 21 of the heating film 20 are connected in series by applying a conductive material.

[0036] And each sub-heating film 21 is a thermistor. Along the direction from the bottom end to the top end, the rate of change of the resistance of each sub-heating film 21 gradually decreases. That is, as the temperature of itself changes, the resistance value of each sub-heating film 21 changes accordingly. Furthermore, the rate of change of the resistance of the sub-heating film 21 located at the bottom end is large, that is, the sub-heating film 21 at the bottom end can increase the resistance quickly and further increase the heating temperature quickly. On the other hand, the rate of change of the resistance of the sub-heating film 21 located at the top end is small, that is, the sub-heating film 21 at the top end increases the resistance at a slow speed and further increases the heating temperature slowly. In this way, after a certain period of time, the heating temperature of the sub-heating film 21 at the bottom end can catch up with the heating temperature of the sub-heating film 21 at the top end. By making the final heating temperatures between every two adjacent sub-heating films 21 approach each other, the entire aerosol-forming substrate can be heated uniformly.

[0037] Specifically, taking the example that the number of sub-heating films 21 is two, the initial resistances of the two sub-heating films 21 are R1 and R2 respectively, the resistance temperature coefficients of the two sub-heating films 21 are TCR1 and TCR2 respectively, and TCR1≠TCR2. Among them, the rate of change of the resistance of one sub-heating film 21 is R1*TCR1, and the rate of change of the resistance of the other sub-heating film 21 is R2*TCR2. At the initial stage of suction, R1>R2 and R1*TCR1<R2*TCR2. After a certain period of time, the resistance of R2 increases until it becomes larger than R1, and further the heating power of R2 becomes larger, the heating of R2 becomes larger, and it can quickly increase the temperature until it approaches the temperature of R1. In this way, the temperature difference between the two can be reduced. For example, the heating temperatures of both finally reach a predetermined temperature.

[0038] As can be understood, under the same control conditions of total power and / or total resistance, the time difference between the two sub-heating films 21 rising to a predetermined temperature can be adjusted by adjusting the magnitude of the difference between R1 and R2 and the difference between R1*TCR1 and R2*TCR2, the larger the difference between R1 and R2, the larger the time difference between the two sub-heating films 21 rising to a predetermined temperature, and the smaller the difference between R1*TCR1 and R2*TCR2, the larger the time difference between the two sub-heating films 21 rising to a predetermined temperature. This allows the design of heating elements 100 suitable for aerosol generating substrates of different sizes.

[0039] Specifically, in one embodiment, all the sub-heating films 21 are made of a material with a positive temperature coefficient of resistance, that is, the resistance and heating power of each sub-heating film 21 gradually increase with increasing temperature, and the sub-heating film 21 located at the top has a small change rate of resistance and a small increase in heating power, while the sub-heating film 21 located at the bottom has a large increase rate of resistance and a large increase in heating power. In this way, the heating power and temperature between the two films with a large difference in initial heating power can be gradually made closer. Alternatively, the material of each sub-heating film 21 is a mixture of metal Ag and glass or a silver-palladium alloy, which is a material with a positive temperature coefficient, and is adjusted to an appropriate TCR (temperature coefficient of resistance) and resistivity by the ratio of the components.

[0040] Specifically, in another embodiment, all the sub-heating films 21 are made of a negative resistance coefficient material, that is, the resistance of each sub-heating film 21 gradually decreases with increasing temperature, and the heating power gradually decreases, and the sub-heating film 21 located at the top end has a small rate of change in resistance, a large absolute value of the decrease in resistance value per unit time, and a large absolute value of the decrease in heating power, while the sub-heating film 21 located at the bottom end has a large rate of decrease in resistance, a small absolute value of the decrease in resistance value per unit time, and a small absolute value of the decrease in heating power. In this way, in the region with a high initial temperature, the heating power decreases by a large absolute value, and in the region with a low initial temperature, the heating power decreases by a small absolute value, and the heating power of the region with a low initial temperature is greater than that of the region with a high initial temperature, and further, the region with a low initial temperature can increase the heating temperature at a high speed, and the final heating temperature between the two regions with a large difference in initial heating temperature can gradually approach each other.

[0041] Alternatively, each sub-heating film 21 is formed by processes such as sufficient mixing, molding, and sintering of two or more metal oxides of manganese, copper, silicon, cobalt, iron, nickel, and zinc, or each sub-heating film 21 is a non-oxide material such as silicon carbide, tin selenide, or tantalum nitride, which is a negative temperature coefficient material, and the TCR and resistivity can be adjusted to an appropriate value by adjusting the ratio of components, sintering atmosphere, sintering temperature, and structural state.

[0042] Specifically, in yet another embodiment, among the at least two sub-heating films 21, a part of the sub-heating film 21 located at the bottom end is made of a positive temperature coefficient material, and among the at least two sub-heating films 21, another part of the sub-heating film 21 located at the top end is made of a negative temperature coefficient material. The rate of change in resistance of the positive temperature coefficient material is greater than the rate of change in resistance of the negative temperature coefficient material, that is, the resistance of the sub-heating film 21 at the bottom end gradually increases, and the resistance of the sub-heating film 21 at the top end gradually decreases, until the resistance of the sub-heating film 21 at the bottom end becomes greater than the resistance of the sub-heating film 21 at the top end. At this time, the heating power of the sub-heating film 21 at the bottom end is large, and the temperature of the sub-heating film 21 at the bottom end can be raised quickly until it approaches the temperature of the sub-heating film 21 at the top end. In this way, the final temperature difference between the adjacent sub-heating films 21 can be reduced, and the aerosol-generating substrate can be uniformly heated and roasted.

[0043] Alternatively, the material of some of the sub-heating films 21 is a mixture of metal Ag and glass or a silver-palladium alloy, which is a positive temperature coefficient material, and the TCR (temperature coefficient of resistance) and resistivity can be adjusted appropriately by adjusting the ratio of the components. Furthermore, optionally, other sub-heating films 21 are formed by processes such as sufficient mixing, molding, and sintering of two or more metal oxides of manganese, copper, silicon, cobalt, iron, nickel, and zinc, or each sub-heating film 21 is a non-oxide material such as silicon carbide, tin selenide, or tantalum nitride, which is a negative temperature coefficient material, and the TCR and resistivity can be adjusted appropriately by adjusting the ratio of the components, the sintering atmosphere, the sintering temperature, and the structural state.

[0044] In some other embodiments, at least two sub-heating films 21 are connected in parallel with each other, and the initial resistance of each sub-heating film 21 connected in parallel with each other along the direction from the bottom end to the top end is gradually reduced. In the whole heating circuit, when multiple sub-heating films 21 are connected in parallel with each other, the larger the resistance of each sub-heating film 21, the smaller the heating power, and there is an inverse proportional relationship between the two. Therefore, the sub-heating film 21 at the bottom end has a large initial resistance, a low initial heating power, and a low initial heating temperature, while the sub-heating film 21 at the top end has a small initial resistance, a large heating power, and a high initial heating temperature, thereby quickly forming an aerosol that flows to the position where the user inhales. Optionally, two adjacent sub-heating films 21 of the heating film 20 are connected in parallel by applying a conductive material.

[0045] Each sub-heating film 21 is a thermistor. The rate of change in resistance of each sub-heating film 21 gradually decreases along the direction from the bottom end to the top end. That is, the resistance value of each sub-heating film 21 changes accordingly as its own temperature changes. Furthermore, the rate of change in resistance of the sub-heating film 21 located at the bottom end is large, that is, the downstream sub-heating film 21 can increase the resistance quickly and can increase the heat generation temperature quickly, while the rate of change in resistance of the sub-heating film 21 located at the top end is small, that is, the sub-heating film 21 at the top end increases the resistance slowly and increases the heat generation temperature slowly. In this way, after a certain time has passed, the heat generation temperature of the sub-heating film 21 at the bottom end can catch up with the heat generation temperature of the sub-heating film 21 at the top end, and the final heat generation temperatures between the two adjacent sub-heating films 21 can be made close to each other, so that the entire aerosol-generating substrate can be heated uniformly.

[0046] Specifically, taking the example that the number of the sub-heating films 21 is two, the initial resistances of the two sub-heating films 21 are R1 and R2 respectively, the temperature coefficients of resistance of the two sub-heating films 21 are TCR1 and TCR2 respectively, and TCR1≠TCR2. The rate of change of the resistance of one of the sub-heating films 21 is R1*TCR1, and the rate of change of the resistance of the other sub-heating film 21 is R2*TCR2. At the initial stage of suction, R1<R2, and R1*TCR1<R2*TCR2. That is, the resistance of R2 decreases rapidly, and the heating power increases rapidly. The heating of R2 is large until the heating power of R1 becomes smaller than that of R2, and the temperature can rise rapidly until it approaches the temperature of R1. In this way, the temperature difference between the two can be reduced. For example, the heating temperatures of both finally reach a predetermined temperature.

[0047] As can be understood, under the control conditions of the same total power and / or total resistance, by adjusting the magnitude of the difference between R1 and R2 and the difference between R1*TCR1 and R2*TCR2, the time difference for the two sub-heating films 21 to heat up and reach a predetermined temperature can be adjusted. The larger the difference between R1 and R2, the larger the time difference for the two sub-heating films 21 to heat up and reach a predetermined temperature. The smaller the difference between R1*TCR1 and R2*TCR2, the larger the time difference for the two sub-heating films 21 to heat up and reach a predetermined temperature. Thereby, the heating element 100 suitable for aerosol generation substrates of different dimensions can be designed.

[0048] Specifically, in one embodiment, all the sub-heating films 21 are all positive temperature coefficient of resistance materials. That is, for each sub-heating film 21, as the temperature increases, the resistance gradually increases, and the heating power gradually decreases. The sub-heating film 21 located at the bottom end has a small rate of change of resistance and a small decrease in heating power, and the sub-heating film 21 located at the top end has a large rate of increase of resistance and a large decrease in heating power. In this way, the heating power and temperature between the two with a large difference in initial heating power can be gradually approximated.

[0049] Alternatively, the material of each sub-heating film 21 is a mixture of metal Ag and glass or a silver-palladium alloy, which is a positive temperature coefficient material and is adjusted to an appropriate TCR (temperature coefficient of resistance) and resistivity by adjusting the ratio of the components.

[0050] Specifically, in another embodiment, all the sub-heating films 21 are made of a negative resistance coefficient material, that is, the resistance of each sub-heating film 21 gradually decreases and the heating power gradually increases as the temperature increases, and the sub-heating film 21 located at the bottom end has a small rate of change in resistance, a large amount of decrease in the resistance value of the sub-heating film 21 per unit time, and a large absolute value of increase in heating power, while the sub-heating film 21 located at the top end has a large rate of decrease in resistance, a small amount of decrease in the resistance value of the sub-heating film 21 per unit time, and a small absolute value of increase in heating power. In this way, the heating power increases at a small absolute value in the region with a high initial temperature, and increases at a large absolute value in the region with a low initial temperature, and the heating power in the region with a low initial temperature is greater than the heating power in the region with a high initial temperature, so that the heating temperature can be increased at an even faster rate, and the final heating temperature between the two regions with a large difference in initial heating temperature can be gradually approached.

[0051] Alternatively, each sub-heating film 21 is formed by processes such as sufficient mixing, molding, and sintering of two or more metal oxides of manganese, copper, silicon, cobalt, iron, nickel, and zinc, or each sub-heating film 21 is a non-oxide material such as silicon carbide, tin selenide, or tantalum nitride, which is a negative temperature coefficient material, and the TCR and resistivity can be adjusted to an appropriate value by adjusting the ratio of components, sintering atmosphere, sintering temperature, and structural state.

[0052] Specifically, in yet another embodiment, among the at least two sub-heating films 21, a part of the sub-heating film 21 located at the bottom end is made of a positive temperature coefficient material, and among the at least two sub-heating films 21, another part of the sub-heating film 21 located at the top end is made of a negative temperature coefficient material. The initial resistance of the bottom end sub-heating film 21 is greater than the initial resistance of the downstream sub-heating film 21, but the rate of change in resistance of the positive temperature coefficient material is greater than the rate of change in resistance of the negative temperature coefficient material, that is, the resistance of the top end sub-heating film 21 gradually increases and the heating power gradually decreases, and the resistance of the bottom end sub-heating film 21 gradually decreases and the heating power gradually increases, until the heating power of the top end sub-heating film 21 becomes smaller than the heating power of the bottom end sub-heating film 21. At this time, the heating power of the bottom end sub-heating film 21 is large, and the temperature of the bottom end sub-heating film 21 can be raised quickly until it approaches the temperature of the top end sub-heating film 21. In this way, the final temperature difference between adjacent sub-heating films 21 can be reduced, and the aerosol-generating substrate can be uniformly heated and scorched.

[0053] Alternatively, the material of some of the sub-heating films 21 is a mixture of metal Ag and glass or a silver-palladium alloy, which is a positive temperature coefficient material, and the TCR (temperature coefficient of resistance) and resistivity can be adjusted appropriately by adjusting the ratio of the components. Furthermore, optionally, other sub-heating films 21 are formed by processes such as sufficient mixing, molding, and sintering of two or more metal oxides of manganese, copper, silicon, cobalt, iron, nickel, and zinc, or each sub-heating film 21 is a non-oxide material such as silicon carbide, tin selenide, or tantalum nitride, which is a negative temperature coefficient material, and the TCR and resistivity can be adjusted appropriately by adjusting the ratio of the components, the sintering atmosphere, the sintering temperature, and the structural state.

[0054] In some embodiments, the heating element 100 further includes a first electrode layer 32 and a second electrode layer 34 provided on the substrate 10, and the first electrode layer 32 and the second electrode layer 34 are respectively in contact with two sub-heating films 21 at the front and rear ends of the at least two heating films 20. In this manner, the first electrode layer 32 and the second electrode layer 34 are provided at the front and rear ends of all the sub-heating films 21, respectively, thereby forming connection terminals for connecting the heating films 20 to the outside, which is convenient for supplying power to the heating films 20. And, all the sub-heating films 21 only require the first electrode layer 32 and the second electrode layer 34 at the front and rear ends, which occupies a small space, does not require additional electrodes, reduces the cost of lead wires and circuits, and is particularly suitable for heating aerosol-generating substrates with small dimensions.

[0055] In some embodiments, the heating element 100 further includes an infrared radiation layer 50, which is provided on the substrate 10 and is stacked with the heating film 20, and the projection of the infrared radiation layer 50 onto the plane on which the heating film 20 is located covers all the sub-heating films 21. That is, the infrared radiation layer 50 has at least two radiation regions corresponding to at least two sub-heating films 21, respectively, and each radiation region can generate different degrees of infrared radiation according to the different heating temperatures of its corresponding sub-heating film 21, thereby realizing heating of the aerosol substrate by region.

[0056] In this way, the aerosol-generating substrate is heated and atomized by infrared radiation, and a roasting method in which the heating element 100 is heated and does not burn can be realized, and the content of harmful substances in the aerosol can be reduced. Meanwhile, the degree of infrared radiation is directly proportional to the heat receiving temperature, and when the heating temperature of the heating film 20 is set for each region, the degree of infrared radiation can be set for each region accordingly. This increases the radiation degree of the infrared radiation region corresponding to the downstream sub-heating film 21, quickly heats the aerosol-generating substrate close to the mouthpiece to form an aerosol, and improves the aerosol formation speed at the initial inhalation. In addition, during the subsequent suction process, the temperatures of each sub-heating film 21 tend to become closer again, and by making the degree of infrared radiation of each region in the infrared radiation layer 50 corresponding to each sub-heating film 21 closer, the degree of radiation of each region in the infrared radiation layer 50 can be made closer, so that the entire aerosol-generating substrate can be uniformly and thoroughly roasted to prevent one region from being burnt due to a high temperature for a long period of time, which would affect the texture, and furthermore, high initial energy can be imparted to the entire aerosol-generating substrate to avoid the carbonization rate being too fast, so that the aerosol-generating substrate can be fully utilized and the number of suctions can be effectively guaranteed.

[0057] In some embodiments, the material of the substrate 10 is a high temperature resistant material such as quartz glass, mica, steel or ceramics, the materials of the first electrode and the second electrode are both high conductivity metallic materials such as silver, gold, copper or alloys containing gold, silver and copper, and the material of the infrared emitting layer 50 is at least one of high infrared emissivity materials such as perovskites, spinels, carbides, silicides, nitrides, oxides and rare earth materials.

[0058] 1 to 5, in some embodiments, the base 10 is configured as a peripheral heating structure, and the inside of the base 10 forms a storage space 11. In the actual use process, the aerosol-generating substrate is disposed in the storage space 11 inside the base 10, so that the base 10 surrounds the aerosol-generating substrate and heats and atomizes the aerosol-generating substrate from the periphery. A heat generating film 20 is applied to the outer peripheral surface of the base 10, and an infrared emitting layer 50 is formed between the heat generating film 20 and the base 10, or on the inner peripheral surface facing the storage space 11 inside the base 10. In this way, after the base 10 is heated by the heat generating film 20 located on the outer peripheral surface, the infrared emitting layer 50 located inside the heat generating film 20 generates infrared radiation to heat and atomize the aerosol-generating substrate provided in the storage space 11 of the base 10, thereby improving the speed at which the aerosol-generating substrate forms an aerosol in the early stage of inhalation, and also uniformly and sufficiently roasts the aerosol-generating substrate in the subsequent inhalation process, improving the user experience.

[0059] 4 and 5, specifically, in one embodiment, the substrate 10 is a transparent substrate, and the infrared emitting layer 50 is laminated between the heating film 20 and the substrate 10, and the infrared ray emitted by the infrared emitting layer 50 can pass through the substrate 10 and heat and atomize the aerosol-generating substrate contained inside the substrate 10. In this way, the infrared emitting layer 50 quickly receives heat and emits infrared light, thereby further improving the atomization efficiency. Referring to FIG. 4, optionally, the infrared emitting layer 50 is an insulating infrared emitting layer 50. Referring to FIG. 5, more optionally, the infrared emitting layer 50 is a non-insulating layer, and an insulating layer 40 is provided between the infrared emitting layer 50 and the heating film 20 to prevent electrical conduction between the heating film 20 and the infrared emitting layer 50.

[0060] As can be understood, when the substrate 10 is a transparent substrate, the infrared-emitting layer 50 may be provided on the inner peripheral surface of the substrate 10, so that after the heating film 20 on the outer peripheral surface heats the substrate 10, the infrared-emitting layer 50 receives the heat and emits infrared rays, thereby heating and atomizing the aerosol-generating substrate contained within the substrate 10.

[0061] Referring to FIG. 1, specifically, in another embodiment, the substrate 10 is a non-transparent substrate, and infrared rays cannot pass through it. An infrared-emitting layer 50 is applied to the inner surface of the substrate 10 facing the storage location 11. After the heating film 20 on the outer surface heats the substrate 10, the infrared-emitting layer 50 receives the heat and emits infrared rays, thereby heating and atomizing the aerosol-generating substrate contained in the substrate 10.

[0062] 6 to 10, in some embodiments, the base 10 is configured as a central heating structure, and the heat generating film 20 and the infrared emitting layer 50 are laminated on the outer surface of the base 10 in order from the inside to the outside. In use, an aerosol-generating substrate is inserted into the outer periphery of the base 10, and when the heat generating film 20 and the infrared emitting layer 50 on the outer periphery of the base 10 are operated, the aerosol-generating substrate is heated and atomized from the inside of the aerosol-generating substrate.

[0063] 6-7, specifically, in one embodiment, the base 10 is configured as a pin body, the heating film 20 and the infrared radiation layer 50 are both provided extending along the circumferential direction of the pin body, and at least two sub-heating films 21 of the heating film 20 are sequentially arranged along the axial direction of the pin body. In this way, the heating film 20 and the infrared radiation layer 50 are sequentially provided on the outer circumferential surface of the pin body from the inside to the outside, and the infrared radiation layer 50 generates infrared radiation to the outside after the heating film 20 at the bottom generates heat, and heats and roasts the aerosol-generating substrate fitted on the outer periphery of the pin body, thereby quickly forming an aerosol in the early stage of inhalation, and roasting the entire aerosol-generating substrate uniformly and sufficiently in the later stage, improving the user's usage experience.

[0064] 6, optionally, the base 10 is an insulator, and the heating film 20 is directly formed on the base 10. Referring to Fig. 7, further optionally, the base 10 is a conductor, and an insulating layer 40 is provided between the base 10 and the heating film 20 to prevent electrical conduction between the heating film 20 and the base 10.

[0065] Furthermore, a protective layer 60 is applied to the outside of the infrared emitting layer 50, and serves as the outermost layer to protect the film layer structure on the outer surface of the substrate 10.

[0066] 8 to 10, specifically, in another embodiment, the base 10 is configured as a sheet body, and the heat generating film 20 and the infrared emitting layer 50 are laminated in order from the inside to the outside on one of the front and back sides of the sheet body, and the infrared emitting layer 50 is laminated on the other of the front and back sides of the sheet body. When the base 10 is configured as a sheet body, the heat generating film 20 is formed on only one side of the sheet body, and the other side of the sheet body uniformly generates heat by the action of thermal conduction, and the infrared emitting layers 50 applied to both the front and back sides of the sheet body both receive heat and radiate infrared rays to the outside, thereby heating the aerosol-generating substrates located on both the front and back sides of the sheet body.

[0067] Specifically, the base 10 is a material with high thermal conductivity such as stainless steel or ceramics, and when one side of the sheet body receives heat, the other side also quickly rises in temperature and generates heat. Referring to Fig. 8, optionally, the base 10 is an insulator, and the heating film 20 is directly formed on the base 10. Referring to Fig. 9, optionally, the base 10 is a conductor, and insulating layers 40, which are located in the innermost layers, are applied to both the front and back sides of the base 10 to prevent electrical conduction between the heating film 20 and the base 10.

[0068] Furthermore, a protective layer 60 is applied to the outside of the infrared emitting layer 50, so that the protective layer 60 serves as the outermost layer and protects each film layer structure on the outer surface of the base 10. Specifically, the infrared emitting layer 50 is an insulating infrared emitting layer.

[0069] As shown in Fig. 10, in some embodiments, the heating film 20 may be in a U-shaped structure, with the open end 22 of the U-shaped structure located at the bottom end a1 of the substrate 10 and the closed end 23 of the U-shaped structure located at the top end a2 of the substrate 10. The electric heating film layer 20 includes one child heating film 21 located at the closed end of the U-shaped structure and another child heating film 21 located at the open end of the U-shaped structure. Of course, in other embodiments, the electric heating film layer 20 may adopt other shapes, such as covering the entire surface of the substrate 10, and is not limited here.

[0070] In any embodiment of the present application, the substrate 10 is configured as a central heating structure or a peripheral heating structure, and the infrared radiation layer 50 is provided at an appropriate position according to the different structure of the substrate 10, so that the substrate 10 is designed as an infrared heating body having a significant infrared radiation heating effect, thereby improving the heating efficiency of the heating element 100. In addition, the infrared radiation layer 50 may be an insulating layer 40 or a non-insulating layer. When the infrared radiation layer 50 is a non-insulating layer, the insulating layer 40 is added between the infrared radiation layer 50 and the heating film 20 to prevent the heating element 100 from being conductive and leaking electricity.

[0071] In one embodiment of the present application, an electronic atomization device is further provided, which includes the above-mentioned heating element 100, and the electronic atomization device can quickly form an aerosol-generating substrate at the beginning of inhalation, improving the texture of the first few inhalations of the user. In addition, in the subsequent inhalation process, the aerosol-generating substrate can be uniformly and sufficiently heated and atomized, preventing the aerosol-generating substrate from being burned due to a local temperature being too high for a long period of time, and preventing the heating energy provided to the entire aerosol-generating substrate from being too large at the beginning of inhalation, thereby improving the carbonization speed of the aerosol-generating substrate, and thoroughly roasting the aerosol-generating substrate to effectively guarantee the number of inhalations.

[0072] Each technical feature of the above-mentioned embodiments can be combined in any combination, and for the sake of brevity, a description has not been given of all possible combinations of each technical feature in the above-mentioned embodiments, but these combinations of technical features should be considered to be within the scope described in this specification unless there is a contradiction.

[0073] The above examples merely show some embodiments of the present application, and although the description is relatively specific and detailed, it should not be understood as limiting the scope of the claims. Those skilled in the art can make various modifications and improvements without departing from the concept of the present application, all of which belong to the scope of protection of the present application. Therefore, the scope of protection of the present application is subject to the scope of the accompanying claims. [Explanation of symbols]

[0074] 100 heating element, 10 base, 11 housing portion, 20 heating film, 21 sub-heating film, 32 first electrode layer, 34 second electrode layer, 40 insulating layer, 50 infrared radiation layer, 60 protective layer.

Claims

1. A heating element comprising: a base having an elongated structure and including a bottom end and an apex end opposite the bottom end; a heating film provided on the base and including at least two sub-heating films sequentially arranged along the longitudinal direction of the base; Among the sub-heating films, an initial heating power per unit area of ​​the sub-heating film located at the apex end is larger than the initial heating power per unit area of ​​each of the other sub-heating films, and a heating power change rate of the sub-heating film located at the apex end and having the largest initial heating power per unit area is smaller than the heating power change rate of each of the other sub-heating films. A heating element comprising:

2. Along the direction from the bottom end to the top end, the initial heating power per unit area of ​​each of the sub-heating films gradually increases, and the heating power change rate of each of the sub-heating films gradually decreases.

2. The heating element of claim 1.

3. Each of the sub-heating films is a thermistor, and the at least two sub-heating films are connected in series with each other; Along the direction from the bottom end to the top end, the initial resistance per unit area of ​​each of the sub-heating films connected in series with each other gradually increases, and the rate of change in resistance of each of the sub-heating films gradually decreases.

3. The heating element according to claim 2.

4. Each of the sub-heating films is a thermistor, and the at least two sub-heating films are connected in parallel with each other; Along the direction from the bottom end to the top end, the initial resistance per unit area of ​​each of the sub-heating films connected in parallel to each other gradually decreases, and the rate of change in resistance of each of the sub-heating films gradually decreases.

3. The heating element according to claim 2.

5. All of the sub-heating films are made of a material having a positive temperature coefficient of resistance, or all of the sub-heating films are made of a material having a negative temperature coefficient of resistance.

5. A heating element according to claim 3 or 4.

6. Among the at least two sub-heating films, a part of the sub-heating films located at the bottom end is made of a material having a positive temperature coefficient, and among the at least two sub-heating films, another part of the sub-heating films located at the top end is made of a material having a negative temperature coefficient.

5. A heating element according to claim 3 or 4.

7. The heating element further includes a first electrode layer and a second electrode layer provided on the base, the first electrode layer and the second electrode layer being in contact with two sub-heating films at both ends of the at least two sub-heating films, respectively.

5. A heating element according to claim 3 or 4.

8. The heating element further includes an infrared emitting layer, the infrared emitting layer being provided on the base and being laminated with the heat generating film; A projection of the infrared radiation layer onto a plane on which the heating film is located covers all of the sub-heating films. A heating element according to any one of the preceding claims.

9. The substrate is configured as a central heating structure, and the heat generating film and the infrared emitting layer are laminated on the outer surface of the substrate in order from the inside to the outside.

9. A heating element as claimed in claim 8.

10. The base is configured as a pin body, the heat generating film and the infrared radiation layer are both provided extending along the circumferential direction of the pin body, and the at least two sub-heat generating films of the heat generating film are arranged along the axial direction of the pin body, or the base is configured as a sheet body, the heat generating film and the infrared radiation layer are laminated in order from the inside to the outside on one of the front and back surfaces of the sheet body, and the infrared radiation layer is laminated on the other of the front and back surfaces of the sheet body; 9. A heating element as claimed in claim 8.

11. the substrate is configured as a peripheral heating structure, the interior of the substrate forming a containment location; the heat generating film is applied to an outer peripheral surface of the base, and the infrared radiation layer is formed between the heat generating film and the base, or on an inner peripheral surface of the base facing the storage location inside the base; 9. A heating element as claimed in claim 8.

12. The substrate is a transparent substrate, and the infrared emitting layer is laminated between the heating film and the substrate, or The substrate is a non-transparent substrate, and the infrared emitting layer is applied to the inner peripheral surface of the substrate.

12. A heating element according to claim 11.

13. An electronic atomization device, comprising: A heating element comprising: An electronic atomization device characterized by:

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