Shallow Equipment Front-End Module with Robot

Abstract

A shallow EFEM is provided using one or more robot arms that have no rotational joints other than the robot arm shoulder. In some embodiments, the robot arm may pick and place wafers from and into a FOUP or load lock by coupling translational movement of the robot arm base with rotation of the robot arm relative to the robot arm base. In some other such embodiments, the robot arm(s) used may be telescoping arms, and translational movement of the robot arm base and rotation of the robot arm relative to the robot arm base may be decoupled.

Description

[Background technology]

[0001] [Related Applications] A PCT application is being filed contemporaneously herewith as a part of this application. Each application identified in the contemporaneously filed PCT application to which this application claims benefit or priority is hereby incorporated by reference in its entirety for all purposes.

[0002] [Shallow-type shallow equipment front-end module with robot] A semiconductor processing tool typically features multiple semiconductor processing chambers aligned around a vacuum transfer module. Wafers may be provided to the semiconductor processing tool via a Front-Opening Unified Pod (FOUP). A FOUP is a container configured to store multiple (e.g., 25) semiconductor wafers in a stacked arrangement so that the semiconductor wafers can be transported as a group between semiconductor processing tools.

[0003] The FOUP may be delivered to one or more load ports aligned along the wall of the equipment, typically referred to as an Equipment Front End Module (EFEM). Each load port may include a platform configured to mount and receive a FOUP, and may also include a FOUP door opening mechanism configured to engage a removable FOUP door from the FOUP and remove the FOUP, thereby allowing wafers within the FOUP to be accessed by one or more wafer handling robots mounted within the EFEM.

[0004] The EFEM typically acts as a semi-controlled environment by which wafers may be handed off from the FOUP to a loadlock that leads to a vacuum transfer module (VTM) that is connected to one or more semiconductor processing chambers. The loadlock(s) may each function as an airlock capable of housing one or more of the wafers, but the atmosphere in the loadlocks and around the wafer(s) is either pumped down to a pressure that is at or near equilibrium with the subatmospheric pressure in the VTM, or pumped up from the subatmospheric VTM pressure to the pressure in the EFEM.

[0005] As mentioned above, the EFEM may include one or more robots that may be used to transfer wafers between each FOUP and the loadlock(s). The robot(s) may be located inside the EFEM, which may be a relatively open space where forced air may flow, for example from top to bottom, to reduce the chance of particulates being transferred from the FOUP to the loadlock as the wafers pass therethrough.

[0006] Discussed herein is a new EFEM concept that improves upon existing EFEM designs. Summary of the Invention

[0007] The details of one or more embodiments of the subject matter described herein are set forth in the accompanying drawings and the description below. Other features, aspects, and advantages will become apparent from the description, drawings, and claims.

[0008] In some embodiments, an apparatus may be provided that includes an Equipment Front End Module housing for handling semiconductor wafers having a nominal diameter of D. The EFEM housing may have a first wall defining a bolt plane for a load port, and a second wall opposite the first wall defining a load lock plane. The bolt plane and the load lock plane may be spaced apart by a first distance greater than D and less than 1.75D. The apparatus may further include a first robot arm base disposed within the EFEM housing, and a first robot arm supported by and coupled to the first robot arm base such that the first robot arm is rotatable about a first axis relative to the first robot arm base. The first axis may be disposed within 40%-60% of the first distance from the bolt plane and within 40%-60% of the first distance from the load lock plane. The apparatus may further include a first linear translation system configured to move the first robot arm base along a second axis parallel to the bolt plane.

[0009] In some embodiments, the first distance may be greater than D and less than 1.65D. In some further such embodiments, the first distance may be greater than D and less than 1.6D.

[0010] In some embodiments, the apparatus may further comprise a plurality of load ports arranged in a linear array along an outer surface of the first wall, each load port having a corresponding interface configured to receive and position a corresponding FOUP on that load port such that a wafer in that FOUP is nominally centered over a corresponding target location on that load port. Two load ports furthest from each other of the plurality of load ports may have corresponding target locations spaced apart by a distance X, and a first linear translation system may be configured to translate the first robot arm base along a second axis a second distance that is at least X.

[0011] In some embodiments, the first robot arm may include a first robot arm link terminating in a first end effector configured to support a wafer, and the first robot arm link and the first end effector may be rotatably fixed relative to one another and may rotate as a single structure when the first robot arm link is rotated relative to the first robot arm base.

[0012] In some such embodiments, a tip of the first end effector furthest from the first axis may be a third distance from the first axis, the third distance being greater than 1.3D. In some such embodiments, the third distance may be greater than 1.4D. In some further such embodiments, the third distance may be greater than 1.6D.

[0013] In some embodiments, the first robot arm link and the first end effector may be fixed in both rotation and translation relative to one another.

[0014] In some embodiments, the first linear translation system may be configured to translate the first robot arm base along the second axis a distance of at least X + D. In some such embodiments, the EFEM housing may have opposing end walls spanning between the first and second walls, a first extension region of the EFEM housing may be supported by a bracket between one of the end walls and a load port closest to the one of the end walls, and the first extension region may have a length along the second axis that is at least D.

[0015] In some embodiments, the apparatus may further include a second robot arm base mounted within the EFEM enclosure, and a second robot arm supported by and coupled to the second robot arm base for rotation about an axis of rotation relative to the first robot arm base. The axis of rotation may be located within 40%-60% of the first distance from the bolt plane and within 40%-60% of the first distance from the load lock plane. The first linear translation system may be further configured to move the second robot arm base along the second axis.

[0016] In some such embodiments, the EFEM housing may have opposing end walls spanning between the first and second walls, a first extension region of the EFEM housing may be supported by a bracket between one of the end walls and a load port closest to the one of the end walls, a second extension region of the EFEM housing may be supported by a bracket between the other end wall and a load port closest to the other end wall, and the first and second extension regions may each have a length along the second axis that is at least D.

[0017] In some embodiments, the apparatus may further include one or more alcoves located in the first wall or the second wall. Each of the alcoves may have an interior surface facing the interior of the EFEM housing and at least as far from a reference plane that is coincident with the first axis and parallel to the load lock plane as an end of the first robot arm furthest from the first axis is away from the first axis. Each of the alcoves may be formed to be large enough that an end of the first robot arm furthest from the first axis can be inserted into the alcove without contacting a wall defining the alcove when the first robot arm is extended such that the end of the first robot arm furthest from the first axis is also furthest from the first wall.

[0018] In some such embodiments, the second wall may include one or more loadlock openings, at least one of the one or more alcoves may be mounted to the second wall and located above or below the loadlock openings, the first robot arm base may include a vertical lift mechanism configured to translate the first robot arm along a vertical axis between at least a first vertical position and a second vertical position, the first robot arm may be positioned such that, in the first vertical position, an end of the first robot arm furthest from the first axis is at a height within a first height range spanned by at least one of the one or more loadlock openings, and the first robot arm may be positioned such that, in the second vertical position, an end of the first robot arm furthest from the first axis is at a height within a second height range occupied by at least one of the one or more alcoves.

[0019] In some embodiments, the second wall may include one or more load lock openings, and at least one of the one or more alcoves may be disposed in the second wall and located on at least one side of the load lock openings.

[0020] In some embodiments, the apparatus may further comprise a controller having one or more processors and one or more memory devices, the one or more memory devices storing computer-executable instructions that cause the one or more processors to: a) cause the first linear translation system to move the first robot arm base a first amount along a second axis during a first time interval when the first robot arm is in a first rotational position relative to the first robot arm base, and b) cause the first linear translation system to move the first robot arm base a second amount during a second time interval along the second axis while simultaneously rotating the first robot arm relatively from the first rotational position relative to the first robot arm base to a second rotational position relative to the first robot arm base. In the first rotational position relative to the first robot arm base, the first robot arm may be entirely between the load lock plane and the bolt plane, and in the second rotational position relative to the first robot arm base, the first robot arm may extend through the bolt plane.

[0021] In some such embodiments, the first robot arm may be configured to support the wafer during wafer transfer operations within the EFEM enclosure such that a centerpoint of the wafer is located above and centered on a wafer target position defined for the first robot arm, and the one or more memory devices may store further computer-executable instructions that cause the one or more processors to cause the first robot arm base to be in a first horizontal position at the start of a second time interval and to rotate the first robot arm relative to the first robot arm base at a position that is a function of the first horizontal position from the first rotational position relative to the first robot arm base during most or all of the second time interval.

number

[0022] In some embodiments, a first robotic arm may include a first portion, a second portion, and a third portion, the third portion may be rotatably connected to the first robotic arm base, the first portion may include an end effector, and the first portion may be configured to translate relative to the second portion and the second portion may be configured to translate relative to the third portion such that the first robotic arm is transitionable between an extended state and a retracted state in response to receiving one or more control signals.

[0023] In some such embodiments, the first portion, the second portion, and the third portion may each have a length less than or equal to D. In some additional or alternative such embodiments, the first robotic arm may be configured such that the first portion moves relative to the second portion at the same time that the second portion moves relative to the third portion.

[0024] In some such embodiments, the first portion may be connected to the third portion by one or more pairs of belt portions, each of which may pass over a corresponding pulley rotatably mounted on the second portion.

[0025] In some embodiments, the apparatus may further comprise a second linear translation system configured to translate the second portion relative to the first portion.

[0026] In some embodiments, the first robot arm may include a first robot arm link configured to be rotatable about a first axis relative to the first robot arm base, and the first robot arm may further include a second robot arm link rotatably connected to the first robot arm link such that it is rotatable relative to the first robot arm link, and the first robot arm may be configured such that the second robot arm link is rotatable relative to the first robot arm link independent of rotation of the first robot arm link relative to the first robot arm base.

[0027] In some embodiments, a second robot arm link may be configured to rotate about an elbow axis relative to the first robot arm link, the second robot arm link may include a first end effector configured to support a wafer such that the wafer is centered at a target location fixed relative to the first end effector, and a first distance between the target location and the elbow axis may be greater than a second distance between the elbow axis and the first axis. In some such embodiments, the second distance may be less than D.

[0028] In some embodiments, the distance between the first axis and the portion or portions of the first robot arm link that are furthest from the first axis may be less than or equal to D. [Brief description of the drawings]

[0029] In the following description, reference will be made to the following figures, each of which is not intended to be limiting in scope and is provided merely to facilitate the following description:

[0030] [Figure 1A] FIG. 1A illustrates an exemplary embodiment of a shallow EFEM during one stage of operation. [Figure 1B] FIG. 1B illustrates an exemplary embodiment of a shallow EFEM during one stage of operation. [Figure 1C] FIG. 1C illustrates an exemplary embodiment of a shallow EFEM during one stage of operation. [Figure 1D] FIG. 1D illustrates an exemplary embodiment of a shallow EFEM during one stage of operation. [Figure 1E] FIG. 1E illustrates an exemplary embodiment of a shallow EFEM during one stage of operation. [Figure 1F] FIG. 1F illustrates an exemplary embodiment of a shallow EFEM during one stage of operation. [Figure 1G] FIG. 1G illustrates an exemplary embodiment of a shallow EFEM during one stage of operation. [Figure 1H]FIG. 1H illustrates an exemplary embodiment of a shallow EFEM during one stage of operation. [Figure 1I] FIG. 1I illustrates an exemplary embodiment of a shallow EFEM during one stage of operation. [Figure 1J] FIG. 1J illustrates an exemplary embodiment of a shallow EFEM during one stage of operation. [Figure 1K] FIG. 1K illustrates an exemplary embodiment of a shallow EFEM during one stage of operation.

[0031] [Diagram 2] FIG. 2 shows an exemplary embodiment of a shallow EFEM with an alcove for temporarily placing a wafer during a Y-turn operation, at one stage of operation. [Diagram 3] FIG. 3 illustrates an exemplary embodiment of a shallow EFEM with an alcove for temporarily placing a wafer during a Y-turn operation, at one stage of operation.

[0032] [Figure 4] FIG. 4 shows another exemplary embodiment of a shallow EFEM having an alcove for temporarily placing the wafer during the Y-turn operation.

[0033] [Figure 5A] FIG. 5A shows an example embodiment of a shallow EFEM with an expansion area to accommodate a wider range of movement of the robot arm base during one phase of operation. [Figure 5B] FIG. 5B illustrates an example embodiment of a shallow EFEM with an expansion area to accommodate a wider range of movement of the robot arm base during one phase of operation. [Figure 5C] FIG. 5C illustrates an example embodiment of a shallow EFEM with an expansion area to accommodate a wider range of movement of the robot arm base during one phase of operation. [Figure 5D] FIG. 5D shows an example embodiment of a shallow EFEM with an expansion area to accommodate a wider range of movement of the robot arm base during one phase of operation. [Figure 5E] FIG. 5E illustrates an example embodiment of a shallow EFEM with an expansion area to accommodate a wider range of movement of the robot arm base during one phase of operation. [Figure 5F] FIG. 5F shows an example embodiment of a shallow EFEM with an expansion area to accommodate a wider range of movement of the robot arm base during one phase of operation.

[0034] [Figure 6] FIG. 6 is a diagram of an exemplary embodiment of a shallow EFEM with two independently controllable robotic arms.

[0035] [Figure 7A] FIG. 7A illustrates another exemplary embodiment of a shallow EFEM during one stage of operation. [Figure 7B] FIG. 7B illustrates another exemplary embodiment of a shallow EFEM during one stage of operation. [Figure 7C] FIG. 7C illustrates another exemplary embodiment of a shallow EFEM during one stage of operation. [Figure 7D] FIG. 7D illustrates another exemplary embodiment of a shallow EFEM during one stage of operation. [Figure 7E] FIG. 7E illustrates another exemplary embodiment of a shallow EFEM during one stage of operation. [Figure 7F] FIG. 7F illustrates another exemplary embodiment of a shallow EFEM during one stage of operation. [Figure 7G] FIG. 7G illustrates another exemplary embodiment of a shallow EFEM during one stage of operation. [Figure 7H] FIG. 7H illustrates another exemplary embodiment of a shallow EFEM during one stage of operation.

[0036] [Figure 8] FIG. 8 is a side view of an exemplary multi-link robotic arm.

[0037] [Figure 9]FIG. 9 illustrates an exemplary telescoping robot arm in a retracted state.

[0038] [Figure 10] FIG. 10 illustrates the example telescoping robot arm of FIG. 9 in an extended state.

[0039] [Figure 11] FIG. 11 illustrates the example telescoping robot arm of FIG. 9 in a disassembled state.

[0040] [Figure 12A] FIG. 12A shows an exemplary embodiment of a shallow EFEM with an extendable robotic arm in one stage of operation. [Figure 12B] FIG. 12B illustrates an exemplary embodiment of a shallow EFEM with an extendable robotic arm in one stage of operation. [Figure 12C] FIG. 12C illustrates an exemplary embodiment of a shallow EFEM with an extendable robotic arm in one stage of operation. [Figure 12D] FIG. 12D shows an exemplary embodiment of a shallow EFEM with an extendable robotic arm in one stage of operation. [Figure 12E] FIG. 12E illustrates an exemplary embodiment of a shallow EFEM with an extendable robotic arm in one stage of operation. [Figure 12F] FIG. 12F shows an exemplary embodiment of a shallow EFEM with an extendable robotic arm in one stage of operation. [Figure 12G] FIG. 12G shows an exemplary embodiment of a shallow EFEM with an extendable robotic arm in one stage of operation. [Figure 12H] FIG. 12H shows an exemplary embodiment of a shallow EFEM with an extendable robotic arm in one stage of operation.

[0041] [Figure 13] FIG. 13 illustrates various perspective views of an exemplary embodiment of a robotic arm base and an extendable robotic arm.

[0042] [Figure 14] FIG. 14 is a side view of an exemplary embodiment of a shallow EFEM.

[0043] The above figures are provided to facilitate understanding of the concepts discussed in this disclosure and are intended to illustrate some embodiments that are within the scope of this disclosure, but are not intended to be limiting. Even embodiments that are consistent with this disclosure but are not shown are considered to be within the scope of this disclosure. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0044] Semiconductor processing tools are typically very large tools. Each such semiconductor processing tool has an associated footprint that determines the floor space (both total area and shape) that the semiconductor processing tool requires to be installed in a semiconductor processing manufacturing plant, or foundry. Because foundries are very expensive, companies that operate foundries have an interest in maximizing the number of semiconductor processor tools that can be housed within the foundry, since such maximization increases the efficiency of the foundry and increases the return on investment for the foundry operator. Reducing the footprint of a given semiconductor processing tool allows, for a fixed number of such semiconductor processing tools, more such semiconductor processing tools to be fitted within a given area than would be possible with a larger footprint.

[0045] Discussed herein are EFEMs that may have shallower depth and / or less complex robotic mechanisms than existing EFEMs, thereby reducing the footprint of the semiconductor processing tool of which it is a part and / or reducing the cost and complexity of the EFEM.

[0046] The EFEMs discussed herein feature a generally elongated rectangular EFEM housing that may have two opposing long walls. A series of load port openings may be located along one of the opposing long walls, and one or more load lock openings may be located along the other opposing long wall. As will be readily apparent, the opposing long walls must be spaced apart by a minimum of the diameter of the wafers the EFEM is designed to handle (e.g., 300 mm) to allow wafers to be transported horizontally within the EFEM.

[0047] However, SEMI (Semiconductors Equipment and Material International) standards, for example, require even more spacing. For example, SEMI standards define a "BOLTS interface" (also known in the industry as the "bolt plane"), which is the surface of the EFEM housing to which the load port attaches. Load ports are designed to have a common interface with the EFEM, allowing different load ports to be attached interchangeably to a given EFEM. This common interface is typically a flat surface on the exterior of the EFEM with a specific pattern of threaded holes located around a large rectangular opening to interface with bolts that can be threaded through similarly located holes on the load port. The rectangular opening is sized to provide enough clearance to allow the FOUP door to be removed from the FOUP and slid down without further obstructing any part of the FOUP, thereby allowing wafers to be removed from or placed into the FOUP. SEMI standards specify that load ports may utilize space in the bolt plane up to a depth of 4 inches to accommodate the hardware and mechanism movements required for the FOUP door opening mechanism. Therefore, when determining the minimum spacing between opposing long walls of an EFEM, a minimum of 4 inches depth (clearance zone) must be added to the wafer diameter.

[0048] Also, the long wall in which the loadlock(s) are installed may have areas that may provide clearance zones for the loadlock hardware (e.g., loadlock door opening mechanisms, active wafer centering (AWC) sensors, or other equipment). For example, the loadlock may have a narrow horizontal slot opening through which the wafer may pass. Such an opening may be sealed by an exterior door that may be pressed against the surface of the loadlock that is flush with the interior surface of the long wall in which the loadlock is installed (or that is generally closest to the interior of the EFEM housing). The door may be supported by a rocker / translation system that pivots or translates the door horizontally inward (towards the interior of the EFEM housing) a small amount, for example, sufficient to ensure that there is no contact between the door and the loadlock, and then translates downward, thereby allowing unimpeded access to the loadlock through the slot / opening. Also, such door mechanisms, if used, may require additional clearance space. For example, an additional 2 inches of depth may be required in some cases in the EFEM housing to accommodate such hardware.

[0049] Also, sufficient clearance must exist to allow the robot arm(s) located within the EFEM to rotate, typically at least 180°, without any portion of the robot arm(s) or the wafer supported thereby entering a clearance zone that may exist adjacent each long wall. This can be particularly problematic with some articulated robot arms, where the arm links and joints extend beyond the edge of the wafer, thereby extending the depth of the zone in which the robot arm and wafer may move along the length of the EFEM during a wafer pass-through motion. Of course, the robot arm and wafer may traverse out of that zone and into the clearance zone when the wafer is actually placed in or removed from the FOUP or load lock.

[0050] The inventors have realized that EFEMs can be produced that have a minimum or near-minimum depth (depth being the distance between the bolt plane and the loadlock plane, i.e., the plane defined by the major surface of the loadlock that is generally closest to the interior of the EFEM. Such a surface is typically flush or nearly flush with the interior-facing surface of the EFEM enclosure of the wall to which the loadlock is attached). Such an EFEM can have, for example, a depth equal to the diameter of the wafer, a SEMI-mandated 4 inch clearance zone, any clearance zones required to accommodate loadlock door hardware, if required, and any desired tolerance gaps. For example, for 300 mm wafers, such an EFEM may have a depth in the range of 18.5 inches or less, which can be on the order of 25% shallower than an EFEM that does not utilize such an arrangement. This can result in a reduction in the overall footprint of a semiconductor processing tool that utilizes such an EFEM, as compared to a comparable semiconductor processing tool that does not utilize such an EFEM. This allows an increased number of such semiconductor processing tools to be housed within a given area, potentially increasing the throughput of the fab and allowing for more efficient use of fab floor space.

[0051] Although exemplary shallow EFEMs having a variety of different types of robotic arms are discussed herein, it will be understood that, generally speaking, each type of robotic arm may be substituted for another in the various examples discussed herein, unless such a substitution proves impractical for obvious reasons.

[0052] In one robot arm type discussed herein, the robot arm is a single-link robot arm, e.g., having a rigid arm terminating in an end effector configured to support a wafer. Such a robot arm may have no revolute joints other than a single revolute joint at the end of the robot arm that allows the robot arm to rotate relative to a base that supports the robot arm (thereby allowing the robot arm to rotate about a single axis of rotation). Such a single-link robot arm may have an adjustment mechanism that allows a small amount of rotation to occur between portions of the robot arm, e.g., to fine-tune the position of the end effector relative to the rest of the robot arm, but it will be understood that such an adjustment mechanism does not constitute a "rotary joint" for purposes of this disclosure. In other words, a revolute joint should be understood to refer to a rotational interface between two components that allows gross relative angular motion between the two components (e.g., on the order of tens or hundreds of degrees of relative rotation) while the robot arm is in use (e.g., during use to move a wafer). For example, each component of a single-link robot arm would be configured to be immobile relative to one another during normal operational use of such a robot arm. However, it will be understood that such components may still move a small amount relative to one another, for example, due to the effects of gravity and flexing of the arms themselves, but it will be understood that such movement is minor and does not negate the otherwise immobility of the arms.

[0053] Another type of robotic arm discussed herein is a multi-link robotic arm, e.g., having two or more links connected to each other through intervening revolute joints.

[0054] A third type of robot arm discussed herein is a telescoping robot arm. Unlike a single-link robot arm, in which the end effector is maintained at a fixed distance from the center of rotation of the arm, a telescoping robot arm may have two or more portions configured to translate relative to each other, thereby allowing the portion of the robot arm that has the end effector to move radially inward or outward relative to the center of rotation of the robot arm.

[0055] Other types of robot arms may also be used in the shallow EFEMs discussed herein. It will be understood that the present disclosure extends to the use of such robot arms in shallow EFEMs. However, the three robot arm types described above may provide different levels of wafer placement accuracy and / or cheaper robot mechanisms due to the absence or fewer number of rotational joints along the length of the robot arm. A single-link robot arm may provide the cheapest robot arm solution and provide the highest wafer placement accuracy in some embodiments due to the fact that it has only two kinematic interfaces (a rotatable shoulder joint and a translatable robot arm base) that support movement (and are therefore potential sources of positional variation). Removing all other kinematic interfaces in such a robot arm minimizes potential sources of misalignment in the robot arm and reduces possible misalignments. A multi-link robot arm with two links and an elbow joint would of course have more degrees of freedom, but may also have some additional flexibility in the range of movement, allowing such an arm to navigate around obstacles more reliably.

[0056] Several examples of shallow EFEM systems are discussed below, most featuring a single-link robot arm. However, it will be understood that each embodiment described below may be implemented using a different type of robot arm than that used in the particular example discussed, if desired. For example, a single-link robot arm may be used in place of a telescoping robot arm and / or a multi-link robot arm, or vice versa. Also, it will be understood that various dimensional relationships discussed with respect to one embodiment below are equally applicable to the other embodiments below, unless clearly incompatible (e.g., the relationship between the diameter of a wafer and the length of a single-link robot arm would not necessarily be applicable to a telescoping robot arm, as the two robot arms operate in completely different ways and a single-link robot arm structure would not exist in a telescoping robot arm scenario).

[0057] Various embodiments of the shallow EFEM are discussed below with reference to the figures.

[0058] 1A-1K show schematics of a shallow EFEM according to the present disclosure. Each element in FIG. 1A-1K is identical, but is shown at various stages of operation. As can be seen, the EFEM includes an EFEM housing 102, which typically includes four walls, including a first wall 116 and a second wall 118 that define the long horizontal axis of the EFEM. Two end walls (without callouts, but spanning between the first wall 116 and the second wall 118) may also be included in the four walls. The EFEM housing 102 may also include a ceiling, which is typically provided by a fan filter unit configured to push air down into the EFEM housing 102 and through vents in the floor of the EFEM housing 102.

[0059] The EFEM enclosure 102 shown in FIGS. 1A-1K features four load ports 104 spaced apart in a linear array along the exterior surface of the first wall 116. Each of the load ports 104 is interfaced to the EFEM enclosure 102 at a bolt plane 124 as previously described herein. Each load port 104 may have a corresponding interface configured to receive and place a FOUP on that load port. FOUPs are typically transported throughout a fab using an automated material handling system (AMHS) that includes a network of elevated tracks and automated conveyors suspended from the tracks. The automated conveyors include a hoist system that allows the FOUP 106 to be lowered onto the load port 104 and lifted from the load port 104 so that the FOUP 106 can be moved between the load port and a semiconductor processing tool. An interface on a load port for receiving a FOUP 106 has features that direct the FOUP 106 to a particular position relative to the load port, such that when the FOUP 106 is lowered onto the load port, for example, a wafer contained within (or placed within) that FOUP 106 is nominally centered over a corresponding target location 170 on that load port. The target locations 170 of the two endmost load ports may be spaced apart from each other by a distance X. It will be appreciated that the EFEM enclosure 102 may also be interfaced with fewer or more load ports 104, for example, two load ports 104, three load ports 104, five load ports 104, or six load ports 104.

[0060] The grey shaded zone "A" indicates the area within the EFEM enclosure 102 designated as a clearance zone to accommodate the presence and operation of the FOUP door 107 opening mechanism.

[0061] The illustrated EFEM enclosure 102 is also connected to two load locks 108 interfaced with a second wall 118 of the EFEM enclosure 102. As can be seen, the load locks 108 each have a major surface that faces the interior of the EFEM enclosure 102. This surface may generally be flush or nearly flush with the interior surface of the second wall 118 and may define a load lock plane 126. The dark grey shaded zone "C" indicates an area within the EFEM enclosure 102 that is designated as a clearance zone to accommodate the presence and operation of the load lock door 109. It will be understood that fewer or more load locks 108 may be used, e.g., one load lock, three load locks, four load locks, etc. In some cases, a single housing load lock housing may include multiple load locks 108.

[0062] Also located between the first wall 116 and the second wall 118 is a robot passageway "B", which is an area of ​​the EFEM enclosure 102 reserved for use by the first robot arm 110. As shown in this example, the first robot arm 110 is a single-link robot arm having a first robot arm link 162 rotatably coupled to a first robot arm base 160 about a first axis 130. The first robot arm link 162 may terminate in an end effector 164, which may be, for example, a blade-type end effector, that may be used to support the semiconductor wafer 112 during wafer transfer operations within the EFEM enclosure 102. The end effector 164 may be fixed to rotate and translate relative to the first robot arm link 162, such that, for example, when the first robot arm 110 is rotated about the first axis 130, the end effector 164 and the first robot arm link 162 rotate together as a unit or single structure, and the length of the first robot arm 110 cannot be actively changed during operation. As will be understood, the term "fixed," when used herein to refer to the relationship between two parts, components, or structures, may include structures that are immovably positioned relative to one another, and may also include structures that are adjustable relative to one another, but do not move relative to one another during normal operation. For example, the end effector may have alignment features that allow adjustment / adjustment of the position of the end effector relative to the arm to which it is attached. Once adjusted or adjusted, the end effector does not move relative to the arm and is considered to be "fixed" relative to the arm. "Fixed" may be used to refer to structures that are immobile relative to one another, but may still move a small amount relative to one another through elastic deflection.

[0063] The end effector may be configured to support the wafer 112 such that the wafer 112 is nominally centered at a fixed wafer target position 168 relative to the end effector 164. The wafer target position 168, in this view, is actually directly above a target position 170 for the leftmost load port 104. This is due to the fact that the position that the first robot arm 110 is in is the position that it will be in when transferring the wafer 112 to or retrieving the wafer 112 from the leftmost FOUP 106.

[0064] The first robot arm base 160 may be supported by a first linear translation system 156, which may include, in this example, a pair of first linear guides 180 (e.g., rails), as shown in FIGS. 1A-1K. The first linear guides 180 engage bearings or rollers on the first robot arm base 160 to allow the first robot arm base 160 to translate along the second axis 132, e.g., in a direction parallel to the bolt plane 124 and / or the load lock plane 126. The first robot arm base 160, which may have a nut (not shown) fixed relative to the first robot arm base 160 and through which the first drive screw 184 may be threaded, may be translated along the first linear guides 180 by rotating a first drive screw 184 coupled to a first drive motor 188. This may allow the first robot arm base 160 to be repositioned within the EFEM housing 102. Generally speaking, the first linear translation system 156 may be configured to translate the first robot arm base 160 along the second axis 132 a second distance equal to or greater than the distance X. In some embodiments, the first linear translation system 156 may be configured to translate the first robot arm base 160 along the second axis 132 a second distance equal to or greater than the distance X minus the distance between the target location 170 of one of the two most end load ports and the target location 170 of the closest load port 104. In such embodiments, the first robot arm base 160 may be moved to a position where the first axis 130 is equidistant from the target location 170 of either the two leftmost load ports 104 or the two rightmost load ports 104 to access FOUPs 106 located on each of the most end load ports 104. In such an arrangement, the first robot arm 110 may be positioned to extend along an oblique angle relative to the second axis 132, for example, to reach into the FOUPs 106 located in each of the endmost load ports 104.

[0065] The bolt plane 124 and the load lock plane 126 may be separated from each other by a first distance that is greater than the nominal diameter D of the wafer 112 but less than 1.75D. In some embodiments, the first distance may be less than 1.65D or less than 1.6D. The smaller the first distance, the shallower the depth of the EFEM housing 102 may be.

[0066] The first axis 130 of the first robot arm 110 may be located within 40%-60% of the first distance from the load lock plane 126 and within 40%-60% of the first distance from the bolt plane 124. For example, it is typically centered between the bolt plane 124 and the load lock plane 126. In some embodiments, the more the first axis 130 is centered between the bolt plane 124 and the load lock plane 126, the shallower the depth of the EFEM housing 102 may be. In some embodiments, the first axis 130 of the first robot arm 110 may be located within 45%-55% of the first distance from the load lock plane 126 and within 45%-55% of the first distance from the bolt plane 124, and in some further embodiments, the first axis 130 of the first robot arm 110 may be located within 48%-52% of the first distance from the load lock plane 126 and within 48%-52% of the first distance from the bolt plane 124. In some embodiments, the first axis 130 of the first robot arm 110 may be located midway between the load lock plane 126 and the bolt plane 124 .

[0067] The first robot arm 110 may have a length (measured relative to the first axis 130) selected to be long enough so that the first linear translation system 156 positions the first axis 130 in front of that FOUP 106 and the tip(s) of the end effector 164 furthest from the first axis 130 extend at least beyond the target position 170 of each FOUP 106 when the first robot arm 110 is extended into that FOUP 106. For example, the tip(s) of the end effector 164 furthest from the first axis 130 may be a third distance from the first axis 130. The third distance may be, for example, greater than 1.3D, greater than 1.4D, greater than 1.5D, greater than 1.6D, greater than 1.7D, or greater than 1.8D.

[0068] 1A-1K may also include a controller including one or more processors and one or more memory devices that may store computer-executable instructions to control the one or more processors to operate, for example, first linear translation system 156 and / or a motor in first robotic arm base 160 that controls rotation of first robotic arm 110 about first axis 130.

[0069] Due to the compactness of the EFEM housing 102, the controller may be configured to coordinate the translational movement of the first robot arm base 160 by the first linear translation system 156 with the rotational movement of the first robot arm 110 about the first axis 130. For example, with respect to the embodiment of Figures 1A-1K, the first robot arm base 160 may be translated to the right from a pointed position while simultaneously rotating the first robot arm 110 clockwise. Such rotational movement typically follows the function:

number

[0070] Using the movements as described above, the wafer 112, when supported by the end effector 164, may be moved in a straight line from the FOUP 106 in which the wafer 112 is located in a direction perpendicular to the second axis 132 while the first robot arm base 160 moves along the second axis 132. The movements described above provide a system in which the wafer 112 only travels along a straight line, e.g., along or perpendicular to the second axis 132. However, it will be appreciated that the controller may control the movements of the first robot arm 110 and the first robot arm base 160 to cause the wafer 112 to follow a more efficient, smoother path. An example would be a curved path after exiting the FOUP 106 or load lock 108, thereby "cutting" the sharp bends that an orthogonal travel path may have. Such a curved path may be more efficient in terms of maximizing wafer transfer speeds due to a shorter overall passing distance. Such a curved path may also avoid abrupt changes in acceleration direction, thus reducing the risk of wafer slippage. In FIG. 1A, the thick solid line starting at the center of the second FOUP 106 from the left and ending at the loadlock 108 on the right represents one such curved movement path of a wafer carried by the first robot arm 110. This path is nominally straight / perpendicular to the second axis 132 (the rotational movement of the first robot arm 110 will therefore follow the above function) at least until the wafer center crosses the bolt plane, at which point the wafer center may follow a curved or arcuate path until it reaches a midpoint between the bolt plane 124 and the loadlock plane 126. At this stage, the wafer center may again follow a nominally straight path, but this time a path parallel to the second axis 132. The first robot arm base 160 may then be reversed in direction and the first robot arm rotated towards the loadlock 108, thereby following another curved path. As the wafer center point crosses the loadlock plane, the movement of the wafer may be made to follow a straight line perpendicular to the second axis 132 until the wafer is properly positioned within the loadlock. Such movement may also be reversed to effect wafer transfer in the opposite direction.

[0071] In this or a similar manner, the coordinated movement of the first robot arm base 160 and the first robot arm 110 can move the wafer 112 to a position entirely within the wafer passageway "B" so that the wafer can be moved between multiple positions within the EFEM enclosure 102 along the second axis 132. Similar movements can then be performed in reverse to place the wafer 112 into any other FOUP 106 or into any load lock 108. For example, FIGS. 1A-1F show the movement of the first robot arm 110 and the first robot arm base 160 during the transfer of the wafer 112 from the leftmost FOUP 106 to the leftmost load lock 108.

[0072] In some cases, such as when the wafer 112 is to be placed in the rightmost FOUP 106, the first robot arm 110 must first reverse direction. For example, instead of extending to the left of the first robot arm base 160, the first robot arm 110 must be extended to the right of the first robot arm base 160. This is because the EFEM housing 102 in this example is not long enough to allow the first robot arm base 160 to move to the right of the rightmost FOUP 106 as required to position the wafer 112 in the rightmost FOUP 106 while the first robot arm 110 is extended to the left of the first robot arm base 160.

[0073] For example, to so reverse the orientation of the first robot arm 110 from the configuration shown in FIGS. 1A-1K, the controller may move the first robot arm base 160 to the right while rotating the first robot arm 110 clockwise until the wafer 112 is fully within the wafer passageway "B", as shown in FIGS. 1A-1C. The controller may then continue to move the first robot arm base 160 to the right, for example, until the wafer 112 is positioned directly in front of the entrance to one of the middle two FOUPs 106 or one of the two load locks 108, as shown in FIG. 1D. The first robot arm base 160 may then be reversed in direction, for example, to the left, while the first robot arm 110 is rotated from its centered position within the wafer passageway, thereby moving the wafer 112 in a direction perpendicular to the second axis 132 while the first robot arm base 160 moves along the second axis 132, as shown in FIGS. 1E and 1F. The controller may continue to move the first robot arm base #B 60 to the left after the first robot arm 110 has extended itself as far into the FOUP 106 or load lock 108 as possible (this approach may require that there is no wafer at the destination in the FOUP 106 or load lock 108). The controller may also rotate the first robot arm 110 in a counterclockwise direction in parallel with such movement, as shown in Figures 1G and 1H. This simultaneous movement of the first robot arm base 160 and rotation of the first robot arm 110 thus serves to move the wafer 112 and the first robot arm 110 back into the wafer passageway. However, by now reversing the direction of the first robot arm 110 (to face right), the first robot arm 110 can be used to place the wafer 112 into the rightmost FOUP 106, as shown in Figures 1I-1K.Thus, the single-link first robot arm 110 may be used to pick or place a wafer in any of the FOUPs 106, but the first robot arm 110 may need to make a "Y" turn for some picking or placing operations depending on which FOUP is being picked from or placed into. The first robot arm 110 may also undergo such direction reversals when it is not carrying a wafer 112.

[0074] In the EFEM enclosure 102 of Figures 1A-1K, the EFEM enclosure 102 is designed so as not to protrude beyond the ends of the outermost load ports 104, thereby presenting the most compact EFEM structure possible in terms of footprint. However, such compactness creates the need for the first robot arm 110 to reverse its extension direction by performing the Y-turn operation described above to use one of the FOUPs 106 or load locks 108 as a temporary "put-down" location for the end effector 164 of the first robot arm 110 (and wafer 112, if present). This may not be the most desirable behavior for such a system, since such a "put-down" location may not always be available. For example, a wafer may be present at such a location, preventing such a location from being used in such a manner.

[0075] Alternative designs for such an EFEM housing may include a separate alcove(s) that may be located in the first wall 116 and / or the second wall 118 and that may be used as a "place" spot for the end effector 164 (and the wafer 112 it supports, if present) during a Y-turn. Figures 2 and 3, as well as Figure 4, show an exemplary EFEM housing 202 including a first wall 216 and an opposing second wall 218. In Figures 2-4, the top of the EFEM housing 202 (and other components shown) are shown in a transparent, dashed line representation to allow the interior of the EFEM housing 202 to be seen.

[0076] Attached to the first wall 216 are four load ports 204, each of which may support a FOUP 206 that may be placed thereon. Similar to the EFEM housing 102, the EFEM housing 202 also includes therein a first robot arm 210 supported by a first robot arm base 260. The first robot arm 210 having a first robot arm link 262 with an end effector (not visible, see similar first robot arm link 162) is rotatably attached to a turret 294, which may extend from a top of the first robot arm base 260 and may be movable along a vertical axis relative to the first robot arm base 260 by operation of a second linear translation system (not shown here, but discussed later in this disclosure) mounted within the first robot arm base. The turret 294 may house a rotary drive motor that may be controlled to rotate the first robot arm 210 about a first axis 230 relative to the first robot arm base 260.

[0077] As seen in FIGS. 2 and 3, the second wall 218 of the EFEM housing 202 includes two loadlock openings 220, each of which leads to a corresponding loadlock 208. For the most part, these features are generally similar to the corresponding elements described above with respect to FIGS. 1A-1K. However, the embodiment of FIGS. 2 and 3 also includes an alcove 242 located above the loadlock opening 220. The alcove may alternatively be located below the loadlock opening 220 if desired. In either case, the alcove 242 provides a temporary "rest" spot for the first robot arm 210, and the wafer if supported thereby, during the Y-turn, so that the Y-turn may be accomplished without the need to move the first robot arm 210 (and the wafer, if present) to one of each loadlock 208 or each FOUP 206 during the Y-turn. The vertical translation of the turret 294 may be utilized to move the first robot arm along a vertical axis between at least a first vertical position and a second vertical position. In the first vertical position, the end of the first robot arm 210 furthest from the first axis 230 may be at a height that falls within a first height range spanned by at least one of the load lock openings 220, thereby allowing the first robot arm 210 to be inserted into the load lock 208. In the second vertical position, the end of the first robot arm 210 furthest from the first axis 230 may be at a height that falls within a second height range occupied by the alcove 242. FIG. 2 illustrates the first robot arm 210 in the first vertical position, and FIG. 3 illustrates the first robot arm 210 in the second vertical position.2 and 3, if the orientation of the first robot arm 210 needs to be reversed, the controller of the EFEM as shown in FIG. 2 and FIG. 3 may control the vertical drive mechanism in the first robot arm base 260 to raise the turret 294 so that the first robot arm 210 is in a second vertical position, at which point the first robot arm base 260 and the first robot arm 210 may translate and rotate, respectively, to insert and remove the first robot arm 210 into and from the alcove, allowing the first robot arm base 260 to pass in front of the alcove 242, thereby switching which side of the first robot arm 210 is located on the first robot arm base 260. Once the orientation of the first robot arm 210 has been reversed, the vertical drive mechanism may again be actuated to lower the turret 294 so that the first robot arm 210 is in the first vertical position. This allows the first robotic arm 210 to pick and / or place wafers in the FOUP 206 and / or load lock 208 .

[0078] 4 shows a similar embodiment, except that the alcove 242 is located to the side of the load lock 208, e.g., on the left side (right side or both are possible). It will be observed that the EFEM housing 202 in FIG. 4 is slightly longer on the left side. This provides extra clearance to allow the first robot arm base 260 to move far enough to the left that the first robot arm 210 can move into or out of the alcove 242 from either direction while supporting a wafer (not shown), thereby allowing the orientation of the first robot arm 210 to be reversed as needed.

[0079] The alcoves 242 may have interior surfaces that define a space large enough to accommodate both the first robot arm 210 and a wafer supported thereby at the first robot arm's 210 full extension length in a direction perpendicular to a second axis (not shown, but the long axis of the EFEM housing 202) without contact between the wafer and the first robot arm 210 and the alcove 242. For example, each alcove 242 may have an interior surface facing the first wall 216 that is at least as far from a reference plane that is coincident with the first axis 230 and parallel to a loadlock plane defined by the loadlock 208 (see previous discussion of the loadlock plane in FIGS. 1A-1K) as the end of the first robot arm 210 furthest from the first axis 230 is away from the first axis 230. Additionally, the alcove 242 may be formed large enough so that when the first robotic arm 210 is extended, as described above, the end of the first robotic arm 210 furthest from the first axis 230 can be inserted into the alcove 242 without contacting the wall 246 that defines the alcove 242, so that the end of the first robotic arm 210 furthest from the first axis 230 is also furthest from the first wall 216.

[0080] It should be noted that in embodiments in which the alcoves 242 are located on the first wall 216, such alcoves 242 may not generally be located above or below the load port 204. The space below the load port 204 is not available to accommodate an alcove since it is occupied by the FOUP door opening mechanism, and the space above the load port 204 is reserved as a pass-through for a FOUP 206 that is lowered onto the load port 204 by an overhead transport system or vertically lifted from the load port 204. Thus, in embodiments in which the alcove(s) 242 are located on the first wall 216, such alcoves 242 may be located to the left or right of the load port 204, or between the load ports 204. For example, rather than being equally spaced apart, such load ports 204 may be spaced apart with some load ports farther apart than others, thereby leaving a gap large enough to accommodate the alcove(s) between two adjacent load ports.

[0081] In the previously described embodiments, the EFEM housing does not extend beyond either of the endmost load ports, or extends only about half the wafer diameter. In such embodiments, the first robot arm may need to make a Y-turn to reach some pick and / or place locations, as described above. However, other embodiments may feature an EFEM housing that extends beyond the outermost load port or load ports far enough, for example, that the first robot base can advance into the extension region far enough to rotate the first robot arm to be inserted into a FOUP supported by the load port closest to it. Such an EFEM configuration allows the first robot arm to access all load locks and / or FOUPs without having to reverse the first robot arm's direction along the translational axis of the first robot arm base.

[0082] 5A-5F are diagrams of an EFEM enclosure 502 at various stages of operation. The EFEM enclosure 502 is interfaced with a series of load ports 504 located along its first wall 516, similar to previous examples discussed herein. Two load locks 508 are interfaced to a second wall 518 opposite the first wall. A first robot arm 510 may be rotatably coupled to a turret 594 of a first robot arm base 560. The first robot arm 510 may have a first robot arm link 562 that may be used to support a wafer 512. A rotational drive in the turret 594 may be controllable to rotate the first robot arm 510 about a first axis 530 relative to the first robot arm base 560. A vertical translation system (not shown) in the first robot arm base 560 may be configured to raise or lower the turret 594, thereby allowing the height of the first robot arm 510 to be adjusted. A first linear translation system (not shown, but see first linear translation system 156 discussed above) may be controlled to translate first robot arm base 560 along a second axis 532 within the EFEM housing 502.

[0083] The EFEM housing 502 in this example features an extension region 503 that extends the EFEM housing 502 beyond the left-most load port 504. The first linear translation system may extend into the extension region 503 such that the first robot arm base 560 may be translated into the extension region 503 to allow the first robot arm 510 to access any of the FOUPs 506 without having to flip the side of the first robot arm base 560 that the first robot arm 510 extends onto. The extension region 503 may, in some embodiments, extend beyond the edge of the nearest load port 540 by at least a wafer diameter D (as will be described below with respect to FIG. 6 , where multiple extension regions are included in the EFEM housing, each such extension region may extend along the second axis beyond its nearest load port by a distance of at least a wafer diameter D).

[0084] 5A-5C, the end of the first robot arm 510 supporting the wafer 512 may be moved from the leftmost FOUP 506 into the wafer pass-through path (see FIG. 1A) by moving the first robot arm base 560 to the left and rotating the first robot arm 510 counterclockwise about the first axis 530. It will be appreciated that a reversal of such movement may also be used to insert the first robot arm 510 into the leftmost FOUP 506, for example, to arrive at the configuration shown in FIG. 5A.

[0085] It will be appreciated that the first robot arm 510 may retrieve a wafer 512 from any of the FOUPs 506 in a similar manner. For example, the first robot arm 510 may be moved to the right (starting from the configuration shown in FIG. 5C) to position its end effector in front of any one of the FOUPs 506, and the first robot arm 510 is then rotated clockwise during a further rightward movement, thereby inserting the first robot arm 510 into the desired FOUP 506.

[0086] A similar movement may be made on the other side of the EFEM enclosure 502 to pick or place a wafer from or into a loadlock 508, as shown in FIGS. 5D-5F. For example, in FIG. 5D, the first robot arm base 560 has moved to the right along the second axis 532 such that the wafer 512 is directly in front of the loadlock opening 520 leading to the right loadlock 508. In FIG. 5E, the first robot arm base 560 has been moved further to the right while simultaneously rotating the first robot arm 510 counterclockwise, thereby moving the wafer 512 into the right loadlock 508. In FIG. 5F, the first robot arm base 560 has been moved further to the right such that the first robot arm 510 has been extended as far as possible into the right loadlock 508.

[0087] In embodiments such as those shown in FIGS. 5A-5F, the first linear translation system may be configured to provide the first robot arm base 560 with a linear travel distance of at least X+D. That is, the travel distance provided by the first linear translation system may be at least the distance between the target locations of the two outermost FOUPs 506 plus the diameter of the wafer. Such a configuration allows the first robot arm base 560 room to move far enough to the left to position the wafer 512 relative to the leftmost FOUP so that the first robot arm 510, and the wafer 512 supported thereby, can be transferred into that leftmost FOUP 506 when the first robot arm base 560 is moved to the right while the first robot arm 510 is rotated towards the FOUP 506.

[0088] In the embodiments discussed herein, a robot arm such as the first robot arm 510 may also be translated vertically up or down a short distance, for example, when picking or placing a wafer from or into the FOUP 506 and / or load lock 508, by actuating a vertical translation system in the first robot arm base. For example, a FOUP typically includes a number (e.g., 25) of ledges extending inwardly from the outer wall of the FOUP. Such ledges may be sized such that, when a wafer placed in the FOUP is viewed from above, the wafer may be positioned to overlap the ledge immediately below it. The overlapped area of ​​the wafer may thus rest on the ledge(s) immediately below the wafer, thereby allowing the wafer to be supported within the FOUP. The load lock may also have an internal ledge or ledges or other structures (e.g., pins) mounted thereon onto which a wafer may be lowered during a deposit operation or lifted off during a pick operation. In some embodiments, the load lock 508 may include a lift pin mechanism that may lift a wafer off of or onto the first robot arm 510 without requiring vertical movement of the first robot arm 510.

[0089] It will also be understood that while the embodiment of Figures 5A-5F describes a particular left-right characteristic, e.g., having the extension area 503 to the left of the EFEM housing 502 in the figures, other embodiments are contemplated in which the left-right characteristic is reversed, e.g., having the extension area 503 to the right of the EFEM housing 502. Thus, mirror images of what is shown in Figures 5 through 5F are also within the scope of the present disclosure. Similarly, this will be understood to apply to other embodiments discussed herein that exhibit a "left-right characteristic," e.g., left / right asymmetry.

[0090] The movements of the first robot arm in the above-described embodiments may generally be divided into two different types of movements. In a first type of movement, the first robot arm base may be moved along a second axis in a first rotational position, thereby causing the first robot arm to lie completely between the bolt plane and the load lock plane, and in some embodiments completely within the wafer pass-through path. In some such movements, the first robot arm may remain stationary relative to the first robot arm base. In a second type of movement, the first robot arm base may be translated along a second axis, while the first robot arm is simultaneously rotated about the first axis from the first rotational position to a second rotational position in which the first robot arm extends through the bolt plane or through the load lock plane.

[0091] A further embodiment of the EFEM enclosure with the extension region of FIG. 5A is shown in FIG. 6. In FIG. 6, an EFEM enclosure 602 is shown including extension regions 603a and 603b. The EFEM enclosure 602 may have a first wall 616 defining a bolt plane 624 interfaced with a number of load ports 604 that may be configured to support a number of FOUPs 606. A removable FOUP door 607 may provide access to the interior of the FOUP 606. The EFEM enclosure 602 may also include a second wall 618 interfaced with one or more load locks 608. The load locks may be sealed with a load lock door 609, which may be opened during loading or unloading of wafers.

[0092] Such an arrangement allows two robot arms, e.g., a first robot arm 610a and a second robot arm 610b, to be housed within the EFEM housing 602. A first linear translation system 656 may be provided and may feature a first linear guide 680 that may support both a first robot arm base 660a and a second robot arm base 660b such that both robot arm bases can translate horizontally along the first linear guide 680. The first linear translation system 656 may include a first drive screw 684a and a second linear screw 664b, which may be independently driven by corresponding first and second drive motors 688a and 688b, respectively.

[0093] The first robotic arm 610a may be supported by a first robotic arm base 660a and may be caused to translate along a first linear guide 680 by actuation of a first drive screw 684a by a first drive motor 688a. The second robotic arm 610b may similarly be supported by a second robotic arm base 660b and may be caused to translate along a first linear guide 680 by actuation of a second drive screw 684b by a second drive motor 688b. The first drive screw 684a may be configured to engage a threaded nut that is part of the first robotic arm base 660a but not the second robotic arm base 660b, and the second drive screw 684b may be configured to engage a threaded nut that is part of the second robotic arm base 660b but not the first robotic arm base 660a. Thus, the first and second drive screws 684a, 684b may be used to advance the first and second robot arm bases 660a, 660b separately and independently along the second axis 632. This allows, for example, the first robot arm 610a to pick or place a wafer 612 from both load locks 608 and all but the rightmost FOUP 606, and the second robot arm 610b to pick or place a wafer 612 from both load locks 608 and all but the leftmost FOUP 606. For example, either the first robot arm 610a or the second robot arm 610b may be positioned as shown by the dotted outline of the robot arm to pick or place a wafer 612 from the second-to-the-left FOUP 606. Such an arrangement may provide a higher throughput than that available with other EFEMs previously described herein, since two wafers 612 may be transferred simultaneously by two robotic arms.

[0094] As mentioned previously, shallow EFEMs may also include multi-link robot arms. Such arms are more complex than single-link robot arms, but may be used to similar effect, providing an increased range of motion that allows such robot arms to navigate within the EFEM more efficiently.

[0095] 7A-7H illustrate an embodiment of a shallow EFEM having a multi-link robot arm at various stages of operation in the position and configuration such a robot arm would be in, for example, transferring a wafer from the leftmost FOUP 706 to the left load lock 708. Elements illustrated in FIGS. 7A-7H are often the same as similarly appearing elements in FIGS. 1A-1K. Such elements in FIGS. 7A-7H have the same last two digits of the callout as in FIGS. 1A-1K, and it will be understood that the description provided above with reference to FIGS. 1A-1K is equally applicable to the corresponding elements in FIGS. 7A-7H unless otherwise indicated. Individual or repeated descriptions of such elements are avoided herein for the sake of brevity.

[0096] As seen in FIGS. 7A-7H, the first robot arm 710 includes a first robot arm link 762 and a second robot arm link 763 terminating in a first end effector. The first robot arm link 762 may be rotatably coupled to the first robot arm base 760 at one end such that the first robot arm link 762 is rotatable about a first axis 730 relative to the first robot arm base 760. The second robot arm link 763 may be rotatably coupled to the first robot arm link 762 at an end opposite the first end effector such that the second robot arm link 763 is rotatable about an elbow axis relative to the first robot arm link 762. The first robot arm 710 may be configured such that rotation of the first robot arm link 762 relative to the base 760 and rotation of the second robot arm link 763 relative to the first robot arm link 762 can occur independently.

[0097] Such an arrangement may allow the first robot arm 710 to more effectively navigate, potentially avoiding, corners, such as those associated with the entrance to the loadport 704 / FOUP 706 and / or loadlock 708. For example, as seen in FIG. 7G, when the first robot arm 710 reaches into one of the loadlocks 708, the single-link robot arm (see FIG. 1E) may be very close (depending on the particular layout of the EFEM) to, or potentially interfering with, other hardware that is inside, attached to, or part of the EFEM 702.

[0098] In FIG. 1E, for example, it can be seen that the first robot arm 110 is extremely close to the front right corner of the left load lock 108 (and if there was hardware present in the clearance zone "C" between the two load locks 108, even less clearance would exist between that hardware and the first robot arm 110).

[0099] 7G, however, the first robot arm 710 is controlled to bend between the first robot arm link 762 and the second robot arm link 763 to provide additional clearance between the first robot arm link 762 and the front right corner of the leftmost load lock 708. This may help ensure that no collision occurs between the first robot arm 710 and, for example, the second wall 718, the load lock 708, or equipment in clearance zone "C".

[0100] It should be noted that the first robot arm 710 may generally be used in a manner similar to the first robot arm 110 for retrieving or placing a wafer 712. In situations where the first robot arm 710 is rotated away from a position where the target position 768 is centered on the second axis 732, the first robot arm 710 may in some such cases be controlled to rotate the second robot arm link 763 relative to the first robot arm link 762 prior to or simultaneously with (and in the same direction as) the rotation of the first robot arm link 762 relative to the first robot arm base 760. This allows the initial rotational movement of the first end effector to be of approximately smaller radius, thereby navigating a more constrained motion path.

[0101] FIG. 8 is a side view of an exemplary multi-link robot arm. In FIG. 8, a first robot arm 810 is supported by a first robot arm base 860 that includes an arm rotation motor 872 and an elbow rotation motor 873. The arm rotation motor 872 may have a rotational output coupled to a first robot arm link 862 such that when the arm rotation motor 872 is actuated to rotate its rotational output, the first robot arm link 862 also rotates about a first axis 830. The elbow rotation motor 873 may similarly have a rotational output coupled to a pulley 871a, which may be mounted on the end of a shaft that supports the first robot arm link and that passes through and is coaxial with a tube coupled to the rotational output of the arm rotation motor 872. Pulley 871a may be kinematically coupled to pulley 871b via a belt 871. Both pulleys 871a and 871b may be rotatably mounted relative to the first robot arm link 862 such that when either pulley 871a or 871b is rotated relative to the first robot arm link 862, the other of pulleys 871a and 871b also rotates relative to the first robot arm link 862. Thus, if there is relative rotation between the rotational output of the arm rotation motor 872 and the rotational output of the elbow rotation motor 873, this will cause the second robot arm link 863 to rotate relative to the first robot arm link 862 about the elbow axis 831. If there is no relative rotation between the rotational output of the arm rotation motor 872 and the rotational output of the elbow rotation motor 873 (i.e. they are both stationary or rotating in the same direction at the same speed), this will cause the second robot arm link 863 to rotate with the first robot arm link 862, but there will be no relative rotation between them.

[0102] In other embodiments, the elbow rotation motor 873 may instead be located within the first robot arm link 862 or the second robot arm link 862, thereby avoiding the potential need for a belt 871 or similar motion transmission system.

[0103] It should be noted that a multi-link arm used in a shallow EFEM as described herein may be constrained to a particular subset of such multi-link arms. An example is an arm in which a robot arm link to which an end effector is attached has a first distance between an axis of rotation of a revolute joint supporting that robot arm link and a target position of the end effector at which a wafer is centered, the first distance being greater than a second distance between the axes of rotation of the revolute joints at both ends of the robot arm link supporting that end effector arm link relative to a first robot arm base. In some such embodiments, for example, the first distance is at least twice the second distance. In some such embodiments, the second distance may be constrained to be less than the distance between a plane parallel to the first axis (along which the first robot arm base 860 is configured to translate) and parallel and coincident with the first axis 830 and the first wall 816 or the second wall 818 that is closest to the first axis 830. In some such embodiments where the multi-link arm is a two-link arm (as shown in FIG. 8), the second distance may be constrained to be less than one-half the diameter of the wafer, e.g., one-half the diameter of the wafer minus the amount that link extends beyond the elbow axis 831. Thus, for example, in the context of FIG. 7, such a robot arm link may be able to rotate a full 360° without swinging outside of robot passage path "B" (or only swinging minimally outside of robot passage path "B", but at the same time without hitting a wall of the EFEM in front of each load port 804 or load lock 808).

[0104] As mentioned above, some shallow EFEMs may utilize a telescopic robot arm instead of the single-link rigid robot arm or multi-link robot arm described above. The telescopic robot arm used may be capable of transitioning between a retracted state and an extended state. In some cases, the telescopic robot arm may include three or more sections configured to translate relative to one another and each sized to be no longer than the diameter of the wafer that such robot arm is configured to carry. Such a telescopic robot arm may, for example, allow the entire telescopic robot arm (when in a retracted state) to fit within the same motion envelope (as viewed from above) that is provided for the movement of the wafer carried thereby. In other words, if there is a motion envelope wide enough for a wafer to pass through, that same motion envelope will typically be wide enough for the telescopic robot to pass through when in a retracted state.

[0105] 9-11 are various views of an exemplary telescoping robotic arm, however, other approaches to telescoping robotic arms may also be used and the disclosure is not intended to be limited to only specific examples. For example, the telescoping robotic arm shown uses a pulley / belt system to allow a single drive motor to drive the extension and retraction of the telescoping sections of the telescoping robotic arm. However, another approach may be to provide separate drive motors for each telescoping section or to use rack and pinion gears instead of pulleys and belts.

[0106] Figure 9 shows the telescopic robotic arm 974 in a contracted state, and Figure 10 shows the telescopic robotic arm 974 in an extended state. Figure 11 shows the telescopic robotic arm 974 in an exploded state.

[0107] As can be seen, the telescoping robotic arm 974 has a first portion 976 including a first end effector 964, a second portion 977, and a third portion 978. The second portion 977 may include a second linear guide 982 that may engage with a mating feature on the first portion 976 such that the first portion 976 and the second portion 977 can translate relative to one another along the extension axis. The third portion 978 may similarly include a third linear guide 983 that may engage with a mating feature on the second portion 977 such that the second portion 977 and the third portion 978 can translate relative to one another along the extension axis. As will be appreciated, the third portion 978 may be fixedly attached to a rotational interface (e.g., a turret) to rotate the first portion 976, the second portion 977, and the third portion 978 as a unit about a rotational axis.

[0108] The telescopic robotic arm 974 may also include a second drive motor 990 that may be configured to rotate the first drive screw 984, for example, about an axis of rotation that may also function as the extension axis. The second drive motor 990 may be fixedly mounted relative to the third portion 978, and the first drive screw 984 may be threaded into a nut that is fixedly mounted (at least with respect to movement along the extension axis) relative to the second portion 977. Thus, when the second drive motor 990 rotates the first drive screw 984, the second portion 977 may be translated relative to the third portion 978, for example, along the extension axis. This allows the second portion 977 to transition from a position relative to the third portion 978 in the extended state to a position relative to the third portion 978 in the retracted state.

[0109] As perhaps most clearly shown in FIG. 11, the second portion 977 may also include a number of pulleys 981 rotatably mounted relative to the second portion 977. For example, in the illustrated example, the second portion 977 has two longitudinal members that extend along a direction parallel to the extension axis and are joined by a cross member that contains a nut that engages with the first drive screw 984. Each of the two longitudinal members may have a pulley 981 located at an opposite end. The first portion 976 and the third portion 978 may also have anchor points 985. The anchor points 985 on the first portion 976 may be connected to the anchor points 985 on the third portion 978 by a belt 979, for example a thin flexible steel belt (or braided steel cable). For example, the ends of each pair of anchor points 985 facing in the same direction on either side of the telescopic robot arm 974 may be connected together by a corresponding belt 979. In some embodiments, the belts 979 on either side of the telescoping robotic arm 974 may be provided as, for example, a single belt 979 each pinned in the middle to one of the anchor points 985 .

[0110] The belts 979 may each be wrapped around one of the pulleys 981 so that as the second portion 977 is stretched outwardly from the third portion 978, the pulley 981 at the end of the second portion 977 holds the outermost belts 979 in tension. Because the ends of the outermost belts 979 are fixedly secured at one end to an anchor point 985 that is fixedly attached to the third portion 978, the tensioned outermost belts 979 are drawn over the pulleys 981 that support them, thereby pulling the first portion 976 towards the end of the second portion 977 that is furthest from the third portion 978. In retraction, the same process may occur, but in reverse, using the innermost belt 979. With such an arrangement, the telescoping robot arm 974 has sufficient reach to transition a wafer between the two wafer locations 912 shown in Figures 9 and 10 (e.g., a distance sufficient to move the wafer from the EFEM into / out of a FOUP or load lock), while being relatively thin (e.g., at least a portion of the first portion 976 and second portion 977 is thin enough to pass through, for example, a slit valve used to seal a load lock, or between wafers loaded into a FOUP (such wafers are typically spaced vertically apart by 10 mm center-to-center).

[0111] It will be appreciated that other similar telescoping arm designs may also be used, e.g., four section, five section, etc., using similar actuation mechanisms.

[0112] 12A-12H show an exemplary EFEM in which a telescoping robotic arm 974 is used.

[0113] As seen in the figure, the EFEM includes an EFEM housing 902 having a first wall 916 and a second wall 918. The first wall 916 may have a number of load ports 904 interfaced therewith (e.g., attached to a bolt plane (not shown) defined by the first wall 916). Each load port 904 may be configured to receive and place a FOUP 906. The second wall 918 may have one or more load locks 908 interfaced therewith, which may be accessible via a load lock opening 920.

[0114] The EFEM housing 902 may further include a first robot arm base 960 that rotatably supports a first robot arm 910, in this example a telescopic robot arm 974. The first robot arm base 960 may include, for example, a turret 994 that may house a rotational drive that may be controlled to rotate the first robot arm 910 about a first axis 930 relative to the first robot arm base 960. The first robot arm base 960 may be supported by a first linear translation system (not shown, but see earlier examples herein) configured to controllably move the first robot arm base 960 along a second axis 932. To this extent, the system illustrated in Figures 12A-12H is generally similar to the embodiment of Figures 1A-1K, for example.

[0115] As previously mentioned, the telescoping robot arm 974 used as the first robot arm 910 can transition between an extended state and a retracted state. In the extended state, the first portion 976 reaches into one of the FOUPs 906 that is far enough away to pick or place a wafer 912 therefrom or therein, or into one of the load locks 908 that is far enough away to pick or place a wafer 912 therefrom or therein. In the retracted state, the first robot arm 910, when positioned immediately in front of at least one of the FOUPs 906 or load locks 908, can be rotated at least 90 degrees to align the extension axis with the second axis 932 without the first robot arm 910 or the wafer 912 supported thereby colliding with any components or structures within the EFEM housing 902.

[0116] For example, as seen in FIG. 12A, the first robot arm 910 is in an extended state with a wafer 912 located in the leftmost FOUP 906. In FIG. 12B, the first and second portions 976, 977 of the first robot arm 910 have been transitioned to a retracted state, and in FIGS. 12C-12D, the first robot arm 910 has been rotated 90°. In FIG. 12E, the first robot arm base 960 has been translated to the right along the second axis 932 to be located in front of the left load lock 908. In FIGS. 12F and 12G, the first robot arm 910 has been rotated an additional 90° such that the extension axis is aligned perpendicular to the second axis 932. In FIG. 12H, the first robot arm 910 has been transitioned to an extended state, which introduces the wafer 912 into the left load lock 908. It will be apparent that similar movements may be used to access or deliver wafers 912 located in either the load locks 908 or FOUPs 906 shown in Figures 12A-12H.

[0117] As will be understood, the position of the first axis in the embodiments of FIGS. 12A to 12H may be installed in the same manner as the installation position of the first axis in the other embodiments described above. Further, the first robot arm base 960 may be provided with a vertical lift mechanism capable of raising and lowering the turret 994 as necessary, whereby the first robot arm 910 can be moved between different heights so as to be able to pick up wafers from different levels in, for example, the FOUP 906.

[0118] FIG. 13 is various views of the telescopic robot arm of FIGS. 12A to 12H. What can be seen in FIG. 13 is the first robot arm base 960, which has a turret 994 protruding therefrom. The turret 994 supports a telescopic robot arm 974 including a first portion 976, a second portion 977, and a third portion 978. The third portion 978 is attached to the turret 994, so that when the turret 994 rotates, extends, or contracts with respect to the first robot arm base 960, the third portion 978, the second portion 977, and the first portion 976 rotate, extend, or contract together therewith.

[0119] The first portion 976 includes an end effector 964 configured to support the wafer 912. As described above, the telescopic robot arm 974 may be configured to extend or contract along the extension axis 934 (which may also be referred to as the third axis in this specification).

[0120] As will be understood, the telescopic arm shown in FIG. 13 is merely an example of such a mechanism, and in other embodiments, other types of telescopic arm mechanisms may be used, which are also considered to be within the scope of the present disclosure.

[0121] FIG. 14 is a side view of an exemplary EFEM housing according to the present disclosure. The illustrated embodiment features a non-telescopic first robot arm, but it will be understood that the same configuration may be used for a telescopic first robot arm. It will also be understood that the above-described embodiments may also feature a similar such system.

[0122] 14 shows an EFEM enclosure 1402 having a first wall 1416 and an opposing second wall 1418. Abutting against the first wall 1416 are multiple load ports 1404 (only one is visible). Each load port may support a FOUP 1406 and may have a mechanism that allows a FOUP door 1407 supported by the load port and moved downwardly from the FOUP 1406 so as to unobstruct access to the interior of the FOUP 1406 by a first robotic arm 110 mounted inside the EFEM enclosure 1402.

[0123] The second wall 1418 may interface with one or more load locks 1408. Each load lock 1408 may have a corresponding load lock door 1409 that may be moved between an open position and a closed position to seal the load lock 1408 from the EFEM housing 1402 or to allow a first robot arm 1410 access to the interior of the load lock 1408 in a manner similar to the FOUP door 1407.

[0124] The EFEM housing 1402 may also include a fan filter unit 1401 that may be mounted on top of the EFEM housing 1402. The fan filter unit 1401 may include a blower fan that may be controlled to direct a flow of forced air down through the EFEM housing 1402. The fan filter unit 1401 may also have one or more filters that may filter the air pushed through the EFEM housing 1402 to reduce or prevent particulate contamination.

[0125] As can be seen in the figure, the first robotic arm 1410 may be connected to a turret 1494 that protrudes from a first robotic arm base 1460. The first robotic arm base 1460 may have a vertical lift mechanism 1492 therein (e.g., a motor that rotates a linear screw drive to turn and drive the turret 1494 up or down relative to the first robotic arm base 1460). The vertical lift mechanism 1492 may be connected to an arm rotation motor 1472. The arm rotation motor 1472 may in turn have a rotation output that is connected to the turret 1494 such that when the rotation output of the arm rotation motor 1472 is rotated, the turret 1494 (and the first robotic arm connected thereto) is also rotated.

[0126] The first robotic arm base 1460 may be supported within the EFEM housing 1402 by a first linear guide 1480. A first drive screw 1484 may pass through a nut fixedly attached to the first robotic arm base 1460, such that when the first drive screw 1484 is rotated, for example through a rotational input delivered by a first drive motor 1488, the first robotic arm base 1460 is caused to traverse along the first linear guide 1480.

[0127] This general structure, or other structures that may provide similar functionality, may be used in any of the embodiments described above to allow wafers 1412 to be moved between FOUP 1406 and load lock 1408.

[0128] Control of the shallow EFEM (e.g., operation of the robot arm(s) that may be located therein and its various door opening mechanisms, etc.) may be facilitated by use of a controller that may be included as part of a semiconductor processing tool having the shallow EFEM or may be part of the shallow EFEM itself. The above-described systems may be integrated with electronics for controlling operation of the system before and after processing of a semiconductor wafer or substrate. This electronics may be referred to as a "controller" that may control various parts or subparts of the system(s). The controller may be programmed to control any of the processes disclosed herein, including operation of valves or doors, retrieving or placing wafers from or into a FOUP, retrieving or placing wafers from or into a loadlock, rotating the robot arm relative to a base supporting the robot arm, translating the robot arm base, moving the robot arm vertically, etc., depending on the processing requirements and / or type of system.

[0129] Broadly speaking, a controller may be defined as electronic equipment having various integrated circuits, logic, memory, and / or software that, for example, receive instructions, issue instructions, control operations, enable cleaning operations, enable end-point metrology, and the like. Integrated circuits may include chips in the form of firmware that store program instructions, digital signal processors (DSPs), chips defined as application specific integrated circuits (ASICs), and / or one or more microprocessors or microcontrollers that execute the program instructions (e.g., software). Program instructions may be instructions communicated to the controller in the form of various personalized settings (or program files) that define operational parameters for performing a particular wafer transfer operation within the shallow EFEM. The operational parameters may, in some examples, define a travel path designed to carry a wafer between two locations provided by the shallow EFEM.

[0130] The controller, in some embodiments, may be part of or coupled to a computer that is integrated with, coupled to, or otherwise networked to the system, or a combination thereof. For example, the controller may be all or part of a host computer system in the "cloud" or at a fab that allows remote access of wafer processing. The computer may allow remote access to the system to monitor the current progress of a manufacturing operation, review the history of past manufacturing operations, review trends or performance criteria from multiple manufacturing operations, modify parameters of a current process, set processing steps following a current process, or initiate a new process. In some examples, a remote computer (e.g., a server) may provide process recipes to the system over a network, which may include a local network or the Internet. The remote computer may include a user interface that allows input or programming of parameters and / or settings, which are then communicated from the remote computer to the system. In some examples, the controller receives instructions in the form of data that defines parameters for each processing step that is performed during one or more operations. It should be understood that the parameters may be specific to the type of process being performed or the type of tool that the controller is configured to interface with or control. Thus, as discussed above, the controller may be distributed, such as by including one or more separate controllers networked together and working toward a common purpose, such as the processes and controls described herein. An example of a controller distributed for such a purpose includes one or more integrated circuits on the chamber that communicate with one or more integrated circuits located remotely (e.g., at the platform level or as part of a remote computer) combined to control wafer transfer operations in a shallow EFEM.

[0131] Without being limited thereto, exemplary systems to which the load lock(s) of a shallow EFEM may be connected, either directly or through an intervening vacuum transfer module, may include plasma etch chambers or modules, deposition chambers or modules, spin rinse chambers or modules, metal plating chambers or modules, clean chambers or modules, bevel edge etch chambers or modules, physical vapor deposition (PVD) chambers or modules, chemical vapor deposition (CVD) chambers or modules, atomic layer deposition (ALD) chambers or modules, atomic layer etch (ALE) chambers or modules, ion implantation chambers or modules, track chambers or modules, and any other semiconductor processing system that may be associated with or used in the manufacturing and / or production of semiconductor wafers.

[0132] As described above, depending on the process step or steps being performed by the tool, the controller may communicate with one or more other tool circuits or modules, other tool parts, cluster tools, other tool interfaces, adjacent tools, nearby tools, tools installed throughout the factory, a main computer, other controllers, or one or more of the tools used in material transport to transport containers of wafers (e.g., FOUPs) in and out of tool locations and / or load ports within a semiconductor production factory.

[0133] In this disclosure and claims, the use of ordinal designations, e.g., (a), (b), (c)... or (1), (2), (3)..., etc., should be understood as not conveying a particular order or sequence, unless such order or sequence is expressly indicated. For example, where there are three steps labeled (i), (ii), and (iii), it should be understood that these steps may be performed in any order (including simultaneously, unless contraindicated), unless otherwise indicated. For example, if step (ii) involves the handling of an element created in step (i), step (ii) may be considered to occur at some point after step (i). Similarly, if step (i) involves the handling of an element created in step (ii), it should be understood that the opposite is true. It should also be understood that the use of the ordinal designation "first" herein, e.g., "first item," should not be construed as implying, implicitly or inherently, that there is necessarily a "second" instance, e.g., "second item."

[0134] As used herein, expressions such as "for each / respective <item> of one or more <items>", "for each / respective <item> of one or more <items>" should be understood to encompass both single items and multiple items, i.e., "for each / respective ..." is used in the sense that it is used in programming languages ​​to refer to each item, whatever the collection of items referred to. For example, if the collection of items referred to is a single item, then "each / respective" refers only to that single item (even though dictionary definitions of "each / respective" are often defined as a term that refers to "one and only one of two or more things") and does not mean that there must be at least two of that item. Similarly, the term "set" or "subset" should not, in and of itself, be considered to necessarily encompass multiple items. It will be understood that a set or subset can contain only one member, or multiple members (unless the context suggests otherwise).

[0135] As used herein, the term "between," when used in conjunction with a range of values, is understood to include the beginning and ending values ​​of the range, unless otherwise indicated. For example, between 1 and 5 is understood to include the numbers 2, 3, and 4 as well as the numbers 1, 2, 3, 4, and 5.

[0136] The term "operably connected" should be understood to refer to two components and / or systems being directly or indirectly connected such that, for example, at least one component or system can control the other. For example, a controller may be described as being operably connected to a resistive heating unit, which includes the controller being connected to a sub-controller of the resistive heating unit. The sub-controller is in electrical communication with a repeater that is controllably configured to connect or disconnect the resistive heating unit to a power source, which provides an amount of power capable of powering the resistive heating unit to produce a desired degree of heating. Although the controller itself would likely not be able to directly provide such power to the resistive heating unit due to the currents involved, the controller will still be understood to be operably connected to the resistive heating unit.

[0137] It is understood that the examples and embodiments described herein are for illustrative purposes only, and various modifications or changes may be suggested to those skilled in the art upon consideration thereof. Various details have been omitted for clarity, but various design alternatives may be implemented. Thus, the examples are considered to be illustrative and not restrictive, and the disclosure is not limited to the details shown herein, but may be modified within the scope of the disclosure.

[0138] It should be understood that the above disclosure, while focusing on a particular embodiment or embodiments, is not limited to only the above-mentioned examples, but may also apply to similar variations and mechanisms, and such similar variations and mechanisms are also considered to be within the scope of the present disclosure.

Claims

1. A device, wherein the device is An Equipment Front End Module (EFEM) enclosure for handling semiconductor wafers having a nominal diameter of D, A first wall defining the bolt plane for the load port, and It has a second wall on the opposite side of the first wall that defines the load lock plane, The bolt plane and the load lock plane are separated from each other by a first distance greater than D and less than 1.75D, in an EFEM housing, The first robot arm base installed inside the EFEM housing, A first robot arm, supported by and coupled to the first robot arm base so as to be rotatable about a first axis relative to the first robot arm base, wherein the first axis is positioned within 40% to 60% of the first distance from the bolt plane and within 40% to 60% of the first distance from the load lock plane, A first linear translation system configured to move the first robot arm base along a second axis parallel to the bolt plane, A device equipped with the following features.

2. The apparatus according to claim 1, An apparatus in which the first distance is greater than D and less than 1.65D.

3. The apparatus according to claim 2, An apparatus in which the first distance is greater than D and less than 1.6D.

4. The apparatus according to any one of claims 1 to 3, The first wall further comprises a plurality of load ports arranged in a linear arrangement along the outer surface of the first wall, Each of the load ports has a corresponding interface configured to receive and install a corresponding FOUP on the load port such that the wafer within the FOUP is nominally centered above the corresponding target position on the load port. Of the aforementioned multiple load ports, the two load ports furthest from each other have corresponding target positions separated by a distance X from each other. An apparatus in which the first linear translation system is configured to translate the first robot arm base along the second axis by a second distance of at least X.

5. The apparatus according to claim 4, The first robot arm has a first robot arm link that terminates with a first end effector configured to support a wafer, A device in which the first robot arm link and the first end effector are fixed so as to be rotatable relative to each other, and rotate as a single structure when the first robot arm link is rotated relative to the first robot arm base.

6. The apparatus according to claim 5, A device in which the tip of the first end effector furthest from the first axis is at a third distance from the first axis, and the third distance is greater than 1.3D.

7. The apparatus according to claim 6, wherein the third distance is greater than 1.4D.

8. The apparatus according to claim 7, wherein the third distance is greater than 1.6D.

9. The apparatus according to claim 5, A device in which the first robot arm link and the first end effector are fixed so as to rotate and translate relative to each other.

10. The apparatus according to claim 5, An apparatus in which the first linear translation system is configured to translate the first robot arm base along the second axis by a distance of at least X + D.

11. The apparatus according to claim 10, The aforementioned EFEM housing It has opposing end walls that span between the first wall and the second wall, The first extended region of the EFEM housing is supported by a bracket between one of the end walls and the load port closest to that end wall. The apparatus having a length along the second axis such that the first extended region is at least D.

12. The apparatus according to claim 10, A second robot arm base installed inside the EFEM housing, A second robot arm is supported by the second robot arm base so as to be rotatable about a rotation axis relative to the second robot arm base, and is coupled to the second robot arm base, wherein the rotation axis is positioned within 40% to 60% of the first distance from the bolt plane and within 40% to 60% of the first distance from the load lock plane. A device wherein the first linear translation system is further configured to move the second robot arm base along the second axis.

13. The apparatus according to claim 12, The aforementioned EFEM housing It has opposing end walls that span between the first wall and the second wall, The first extended region of the EFEM housing is supported by a bracket between one of the end walls and the load port closest to that end wall. The second extended region of the EFEM housing is supported by a bracket between the other end wall and the load port closest to the other end wall. An apparatus having a length along the second axis, wherein the first and second extended regions are each at least D.

14. The apparatus according to claim 4, The system further comprises one or more alcoves installed in the first wall or the second wall, Each of the alcoves has an internal surface facing the inside of the EFEM housing, which coincides with the first axis and is far from a reference plane parallel to the load lock plane, to at least the same extent that the end of the first robot arm furthest from the first axis is farther from the first axis. An apparatus in which each of the alcoves is formed to be large enough that, when the first robot arm is extended such that the end of the first robot arm furthest from the first axis is also furthest from the first wall, the end of the first robot arm furthest from the first axis can be inserted into the alcove without contacting the wall defining the alcove.

15. The apparatus according to claim 14, The second wall includes one or more load lock openings, At least one of the one or more alcoves is installed in the second wall and is located above or below the load lock opening, The first robot arm base includes a vertical lift mechanism configured to translate the first robot arm along a vertical axis between at least a first vertical position and a second vertical position. The first robot arm is positioned such that, in a first vertical position, the end of the first robot arm furthest from the first axis is at a height within a first height range that is extended by at least one of the one or more load lock openings. The apparatus wherein the first robot arm is positioned such that, at the second vertical position, the end of the first robot arm furthest from the first axis is at a height within a second height range occupied by at least one of the one or more alcoves.

16. The apparatus according to claim 14, The second wall includes one or more load lock openings, An apparatus wherein at least one of the one or more alcoves is installed in the second wall and is located on at least one side of the load lock opening.

17. The apparatus according to any one of claims 1 to 3, The controller further comprises one or more processors and one or more memory devices, The one or more memory devices store computer executable instructions, and the one or more processors execute the computer executable instructions. a) The first linear translation system moves the first robot arm base by a first amount along the second axis during a first time interval when the first robot arm is in a first rotational position relative to the first robot arm base. b) The first linear translation system moves the first robot arm base along the second axis by a second amount during a second time interval, and simultaneously rotates the first robot arm relative to the first robot arm base from a first rotational position relative to the first robot arm base to a second rotational position relative to the first robot arm base. The first robot arm is completely between the load lock plane and the bolt plane at the first rotational position relative to the first robot arm base. The apparatus wherein the first robot arm extends through the bolt plane at the second rotational position relative to the first robot arm base.

18. The apparatus according to claim 17, The first robot arm is configured to support the wafer during wafer transfer operations within the EFEM housing such that the center point of the wafer is located above a wafer target position defined with respect to the first robot arm and is centered on the wafer target position. The one or more memory devices store further computer-executable instructions, and the one or more processors, by means of the computer-executable instructions, The first robot arm base is positioned at the first horizontal position at the start of the second time interval. During most or all of the second time interval, the first robot arm is moved from the first rotational position relative to the first robot arm base, function [Math 1] A device that rotates to an angular displacement determined according to the formula (wherein δ is the distance from the first axis to the wafer target position, α is the displacement of the first robot arm base from the first horizontal position, and π is the numerical constant pi).

19. The apparatus according to claim 5, The first robot arm includes a first part, a second part, and a third part. The third portion is rotatably connected to the first robot arm base, The first part includes an end effector, A device in which the first robot arm can transition between an extended state and a retracted state in response to receiving one or more control signals, by configuring the first part to translate relative to the second part, and the second part to translate relative to the third part.

20. The apparatus according to claim 19, An apparatus in which the first part, the second part, and the third part each have a length of D or less.

21. The apparatus according to claim 19, A device in which the first robot arm is configured such that the first part moves relative to the second part at the same time as the second part moves relative to the third part.

22. The apparatus according to claim 21, The first portion is connected to the third portion by one or more pairs of belt portions. A device in which each of the aforementioned belt portions passes over a corresponding pulley rotatably mounted on the second portion.

23. The apparatus according to claim 19, The apparatus further comprises a second linear translation system configured to translate the second part relative to the first part.

24. The apparatus according to claim 4, The first robot arm includes a first robot arm link configured to be rotatable about a first axis relative to the first robot arm base, The first robot arm further includes a second robot arm link rotatably connected to the first robot arm link so as to be rotatable relative to the first robot arm link, An apparatus in which the first robot arm is configured such that the second robot arm link is rotatable relative to the first robot arm link, independently of the rotation of the first robot arm link relative to the first robot arm base.

25. The apparatus according to claim 24, The second robot arm link is configured to rotate around the elbow axis relative to the first robot arm link, The second robot arm link includes a first end effector configured to support the wafer so that the wafer is centered at a target position fixed to the first end effector, An apparatus in which the first distance between the target position and the elbow axis is greater than the second distance between the elbow axis and the first axis.

26. The apparatus according to claim 25, wherein the second distance is less than D.

27. The apparatus according to claim 25, An apparatus in which the distance between the first axis and the part or multiple parts of the first robot arm link furthest from the first axis is D or less.

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