Decontamination system for treating exhaust gas of a vacuum processing system

Abstract

An abatement system (104) for treating the exhaust gas of a vacuum processing system (100), the abatement system (104) comprising: an inlet manifold (200) having a single fluid inlet (224) for receiving an exhaust gas stream from the vacuum processing system (102) and a plurality of fluid outlets (226) coupled to the fluid inlet (224); and a plurality of abatement devices (202) arranged to receive the exhaust gas stream from the inlet manifold (200) during use, each of the plurality of abatement devices (202) being connected to a respective fluid outlet (226) of the inlet manifold (200).

Description

Technical Field

[0001] The present invention relates to a decontamination system and method for treating exhaust gas of a vacuum processing system.

Background Art

[0002] Vacuum transfer and decontamination systems are used in various and different technical fields such as, for example, semiconductor manufacturing. Generally, in the system, a vacuum transfer device is used to pump a gas (e.g., a gas from an industrial process) from a specific location, and a decontamination device is used to decontaminate (e.g., destroy or discard) the generated unwanted substances.

[0003] Generally, a decontamination device includes a burner configured to receive a process gas and remove unwanted substances therefrom by burning the process gas in a fuel and oxygen mixture.

Summary of the Invention

Means for Solving the Problems

[0004] In one aspect, a decontamination system for treating exhaust gas of a vacuum processing system is provided. The decontamination system includes an inlet manifold having a single fluid inlet (e.g., only a single fluid inlet) for receiving an exhaust gas stream from the vacuum processing system and a plurality of fluid outlets connected to the fluid inlet; and a plurality of decontamination devices arranged to receive the exhaust gas stream from the inlet manifold during use. Each decontamination device of the plurality of decontamination devices is connected to a respective fluid outlet of the inlet manifold. Each decontamination device of the plurality of decontamination devices includes a plasma decontamination device for generating plasma to decompose components of the exhaust gas stream.

[0005] The decontamination devices among the plurality of decontamination devices can be substantially identical to each other.

[0006] Each of the plurality of pest control devices can be configured to convert components of the exhaust gas stream into liquid-soluble components at near atmospheric pressure.

[0007] The inlet manifold can include a central inlet pipe that defines a single fluid inlet of the inlet manifold. The inlet manifold can include a plurality of outlet pipes that extend radially from the central inlet pipe, with each outlet pipe defining one of the respective fluid outlets of the inlet manifold. The plurality of outlet pipes can extend radially from the central inlet pipe at respective positions around the outer periphery of the central inlet pipe and at substantially the same axial position along the central inlet pipe. The outlet pipes of the inlet manifold can be substantially identical to each other.

[0008] The inlet manifold can have rotational symmetry of two or more orders.

[0009] The pest control system can further include a plurality of filter devices, with each filter device of the plurality of filter devices being connected to an outlet of one of the respective plurality of pest control devices.

[0010] The pest control system can further include a plurality of first flexible pipe sections, with each first flexible pipe section of the plurality of first flexible pipe sections being connected between a respective fluid outlet of the inlet manifold and a pest control device connected thereto.

[0011] The pest control system can further include an outlet manifold arranged to receive gas flows output from a plurality of pest control devices during use. The outlet manifold can include a single fluid outlet for discharging gas from the pest control system and a plurality of fluid inlets connected to the single fluid outlet. Each pest control device of the plurality of pest control devices can be connected to a respective fluid inlet of the outlet manifold. The pest control system can further include a catch pot filter provided at the single fluid outlet. The pest control system can further include a plurality of second flexible pipe portions, and each second flexible pipe portion of the plurality of second flexible pipe portions is connected between a respective fluid inlet of the outlet manifold and the pest control device connected thereto. The outlet manifold can include a central outlet pipe defining the single fluid outlet of the outlet manifold and a plurality of inlet pipes extending radially from the central outlet pipe, and each inlet pipe defines one of the respective fluid inlets of the outlet manifold. The plurality of inlet pipes can extend radially from the central outlet pipe at respective positions around the outer periphery of the central outlet pipe and at substantially the same axial position along the central outlet pipe. The inlet pipes of the outlet manifold can be substantially identical to each other. The outlet manifold can have rotational symmetry of two or more times.

[0012] The pest control system can further include a plurality of valve pairs. Each valve pair can include a first shut-off valve positioned upstream of one of the plurality of pest control devices and a second shut-off valve positioned downstream of each pest control device. The pest control system can further include a plurality of purge gas inlet ports for receiving purge gas. The pest control system can further include a plurality of purge gas outlet ports for outputting purge gas. Each purge gas inlet port can be disposed between the valves of a respective valve pair. Each purge gas outlet port can be disposed between the valves of a respective valve pair. The purge gas outlet port can be downstream of the purge gas inlet port.

[0013] In a further aspect, a method for treating the exhaust gas of a vacuum processing system is provided. The method includes receiving an exhaust gas stream from the vacuum processing system at a single fluid inlet of an inlet manifold; outputting each respective portion of the exhaust gas stream at each of a plurality of fluid outlets of the inlet manifold; receiving each respective portion of the exhaust gas stream from a respective fluid outlet of the inlet manifold at each of a plurality of abatement devices; and treating each respective received portion of the exhaust gas stream by each of the plurality of abatement devices. Each abatement device of the plurality of abatement devices comprises a plasma abatement device, and the treating step includes generating a plasma to decompose components of the exhaust gas stream.

Brief Description of the Drawings

[0014]

Figure 1

Figure 2a

Figure 2b

Figure 3

Figure 4

Modes for Carrying Out the Invention

[0015] FIG. 1 is a schematic diagram of a vacuum processing system 100 (not to scale). In this embodiment, the vacuum processing system is semiconductor manufacturing equipment.

[0016] The vacuum processing system 100 includes a semiconductor processing tool 102, an abatement system 104, and a vacuum pump 106.

[0017] The semiconductor processing tool 102 includes a plurality of process chambers 108 where semiconductor wafers each undergo respective processes. Examples of such processes include, but are not limited to, chemical vapor deposition, physical vapor deposition, implant, etching, lithography processes, and the like.

[0018] The semiconductor processing tool 102 is connected to the abatement system 104 via a foreline system 110. The foreline system 110 is a piping system for transporting fluid from the plurality of process chambers 108 to the abatement system 104.

[0019] The vacuum pump 106 is configured to pump fluid (i.e., process gas) from the process chambers 108 of the semiconductor processing tool 102 to the abatement system 104 via the foreline system 110. The vacuum pump 106 is further configured to pump fluid from the abatement system 104 via an outlet line 112.

[0020] The abatement system 104 is configured to abate undesirable substances present in the fluid received from the process chambers 108 of the semiconductor processing tool 102.

[0021] FIG. 2a is a schematic view showing a perspective view of the abatement system 104 (not to scale).

[0022] FIG. 2b is a schematic view showing a perspective view of the abatement system connected to an inlet pipe (i.e., foreline 110) and an outlet pipe (i.e., outlet line 112) (not to scale).

[0023] FIG. 3 is a schematic view looking down on the abatement system 104 (not to scale).

[0024] In this embodiment, the pest control system 104 includes an inlet manifold 200, a plurality of pest control devices 202, a plurality of filter devices 204, a plurality of flexible pipe sections 206a-b (including a plurality of first flexible pipe sections 206a and a plurality of second flexible pipe sections 206b), a plurality of isolation valves 208a-b (including a plurality of first isolation valves 208a and a plurality of second isolation valves 208b), a plurality of shut-off valves 210, a plurality of purge gas ports 212, and an outlet manifold 214.

[0025] The inlet manifold 200 includes a central inlet pipe 220 and a plurality of outlet pipes 222. In this embodiment, there are four outlet pipes 222.

[0026] The central inlet pipe 220 defines a fluid inlet 224 of the inlet manifold 200. Specifically, one of the ends of the central inlet pipe 220 is open, and the open end defines the fluid inlet 224 of the inlet manifold 200. The central inlet pipe 220 is closed at the end opposite to the open end. The fluid inlet 224 of the inlet manifold 200 is arranged to receive the exhaust gas flow from the semiconductor processing tool 102. The receipt of this process gas is indicated by solid arrows and reference numeral 221 in FIGS. 2a and 2b. Specifically, in this embodiment, the fluid inlet 224 is attached to the outlet of the foreline system 110.

[0027] Each of the outlet pipes 222 extends radially from the central inlet pipe 220. Each of the outlet pipes 222 extends radially from the central inlet pipe 220 in respective directions perpendicular to the central axis 225 of the central inlet pipe 220. Each outlet pipe 222 defines a respective fluid outlet 226 of the inlet manifold 200. Specifically, each outlet pipe 222 includes a first end connected to the central inlet pipe 220 and a second end opposite to the first end. Each outlet pipe 222 has a first opening at its first end and a second opening at its second end. The second opening of the outlet pipe is the fluid outlet 226 of the inlet manifold 200.

[0028] Each outlet pipe 222 extends from the central inlet pipe 220 at respective positions around the outer periphery of the central inlet pipe 200. The outlet pipes 222 extend from the central inlet pipe 220 at substantially the same axial position along the length of the central inlet pipe 220. In other words, the axial positions along the length of the central inlet pipe 220 of the first ends of the outlet pipes 222 are substantially the same as each other, but their circumferential positions around the outer periphery of the central inlet pipe 220 are different.

[0029] In this embodiment, in the preferred orientation for operation as approximately shown in FIGS. 2a and 2b, the central inlet pipe 220 of the inlet manifold 200 is in a substantially vertical direction. The central inlet pipe 220 is arranged to receive the flow of process gas moving in a substantially vertically downward direction 221. Also, the outlet pipes 222 extend substantially horizontally radially outward from the central inlet pipe 220. The outlet pipes 222 bend downwardly (i.e., so that they are directed substantially vertically downward) near their second ends.

[0030] In this embodiment, the outlet pipes 222 of the inlet manifold 200 are substantially identical to each other. The outlet pipes 222 have substantially the same diameter as each other. The outlet pipes 222 have substantially the same length as each other. Thus, as shown in the schematic view of FIG. 3, when viewed from above, the fluid outlets 226 of the second ends of the outlet pipes 222 are positioned around a circle 300 centered on the central axis 225 of the central inlet pipe 220.

[0031] In this embodiment, the inlet manifold has two-fold rotational symmetry about the central axis 225 of the central inlet pipe 220.

[0032] The decontamination device 202 is arranged to receive the exhaust gas flow from the inlet manifold 200 during use. Each decontamination device 200 is connected to a respective fluid outlet 226 of the inlet manifold 200, that is, each decontamination device 202 is connected to the second end of a respective outlet pipe 222. More specifically, in this embodiment, each decontamination device 202 is connected to a respective fluid outlet 226 via one of each of the first flexible pipe portions 206a and one of each of the first shut-off valves 208a. Each first flexible pipe portion 206a is connected between a respective first shut-off valve 208a and a respective decontamination device 202. The first flexible pipe portion 206a comprises a bellows or bellows-like pipe portion. Each first shut-off valve 208a is connected between a respective fluid outlet 226 and a respective first flexible pipe portion 206a. Accordingly, the first shut-off valve 208a is positioned upstream of each decontamination device 202.

[0033] Each of the first shut-off valves 208a is configured to control the flow of fluid (e.g., gas) therethrough. For example, the first shut-off valve 208a can be closed completely to block or impede the flow of gas therethrough. Similarly, the first shut-off valve 208a can be opened fully so as not to restrict the flow of gas therethrough.

[0034] Preferably, the decontamination devices 202 are substantially identical to each other. The decontamination device 202 is configured to decontaminate, i.e., perform a decontamination process on, the received exhaust gas flow. For example, the decontamination device 202 can be configured to convert the components of the received exhaust gas flow into liquid-soluble components at near atmospheric pressure. Each decontamination device 202 is a plasma decontamination device for generating plasma to decompose the components of the exhaust gas flow. For example, the decontamination device 202 can be a Litmas (trademark) Remote Plasma Source (RPS) device. The decontamination device 202 can be configured to decompose fluorine compounds in the exhaust gas flow.

[0035] The filter device 204 is arranged to receive, in use, the gas stream decomposed from the decontamination device 202. Each filter device 204 is connected to the outlet of its respective decontamination device 202. The filter device 204 is configured to filter particulate matter from the decomposed gas stream received from the decontamination device 202.

[0036] The filter device 204 is arranged to output, in use, the filtered gas stream to the outlet manifold 214. Preferably, the filter devices 204 are substantially identical to each other.

[0037] The outlet manifold 214 comprises a central outlet pipe 230 and a plurality of inlet pipes 232. In this embodiment, there are four inlet pipes 232.

[0038] The central outlet pipe 230 defines the fluid outlet 234 of the outlet manifold 214. Specifically, one end of the central outlet pipe 230 is open, and its open end defines the fluid outlet 234 of the outlet manifold 214. In this embodiment, the fluid outlet 234 of the outlet manifold 214 is at the top or uppermost end of the central outlet pipe 230. The central outlet pipe 230 is closed at the end opposite the open end. The central outlet pipe 230 of the outlet manifold 214 is arranged to receive the gas stream from the plurality of inlet pipes 232 and output this gas stream to the vacuum pump 106. Specifically, in this embodiment, the fluid outlet 234 is attached to the inlet of the outlet line 112. The output of this gas is shown by the solid arrow and reference numeral 231 in Figure 2b.

[0039] Each of the inlet pipes 232 extends radially from the central outlet pipe 230. Each of the inlet pipes 232 extends radially from the central outlet pipe 230 in respective directions perpendicular to the central axis 235 of the central outlet pipe 230. Each inlet pipe 232 defines a respective fluid inlet 236 of the outlet manifold 214. Specifically, each inlet pipe 232 includes a first end connected to the central outlet pipe 230 and a second end opposite the first end. Each inlet pipe 232 includes a first opening at its first end and a second opening at its second end. The second opening of the inlet pipe 232 is the fluid inlet 236 of the outlet manifold 214.

[0040] Each inlet pipe 232 extends from the central outlet pipe 230 at respective positions around the outer periphery of the central outlet pipe 230. The inlet pipes 232 extend from the central outlet pipe 230 at substantially the same axial position along the length of the central outlet pipe 230. In other words, the axial positions of the inlet pipes 232 along the length of the central outlet pipe 230 at the first ends are substantially the same as each other, but their circumferential positions around the outer periphery of the central outlet pipe 230 are different.

[0041] In this embodiment, in the preferred orientation for operation, which is approximately shown in FIGS. 2a and 2b, the central outlet pipe 230 of the outlet manifold 214 is in a substantially vertical direction. The central outlet pipe 230 is arranged to output the gas flow in a substantially vertically upward direction. Also, the inlet pipes 232 extend radially from the central outlet pipe 230 in a substantially horizontal direction. The inlet pipes 232 bend upwardly (i.e., so that they are directed substantially vertically upward) near their second ends.

[0042] In this embodiment, the inlet pipes 232 of the outlet manifold 214 are substantially identical to each other. The inlet pipes 232 have substantially the same diameter as each other. The inlet pipes 232 have substantially the same length as each other.

[0043] In this embodiment, the outlet manifold 214 has two-fold rotational symmetry about the central axis 235 of the central outlet pipe 230.

[0044] The outlet manifold 214 can have substantially the same shape and size as the inlet manifold 200.

[0045] Conveniently, the central outlet pipe 230 is arranged to output the gas flow in a substantially vertically upward direction, and a catch pot filter tends to be created at the lower end (closed end) of the central outlet pipe 230. Nevertheless, in other embodiments, the central outlet pipe 230 can be arranged to output the gas flow in a different direction, for example, a substantially vertically downward direction (e.g., the lower end of the central outlet pipe 230 may be open and the upper end of the central outlet pipe 230 may be closed).

[0046] The filter device 204 is arranged to output the filtered gas flow to the outlet manifold 214 during use. Each filter device 204 is connected to a respective fluid inlet 236 of the outlet manifold 214, that is, each filter device 204 is connected to the second end of a respective inlet pipe 232. More specifically, in this embodiment, each filter device 204 is connected to a respective fluid inlet 236 via one of each of the second flexible pipe portions 206b and one of each of the second shut-off valves 208b. Each second flexible pipe portion 206b is connected between a respective filter device 204 and a respective second shut-off valve 208b. The first flexible pipe portion 206a comprises a bellows or bellows-like pipe portion. Each second shut-off valve 208b is connected between a respective second flexible pipe portion 206b and the second end of a respective inlet pipe 232. Accordingly, the second shut-off valve 208b is positioned downstream of a respective decontamination device 202.

[0047] Each of the second partition valves 208b is configured to control the flow of fluid (e.g., gas) therethrough. For example, the second partition valve 208b can be fully closed to block or impede the gas flow therethrough. Similarly, the second partition valve 208b can be fully opened so as not to restrict the gas flow therethrough.

[0048] Each of the shut-off valves 210 is configured to control the flow of fluid (e.g., gas) therethrough. For example, the shut-off valve 210 can be fully closed to block or impede the gas flow therethrough. Similarly, the shut-off valve 210 can be fully opened so as not to restrict the gas flow therethrough. Each of the shut-off valves 210 is disposed along the respective inlet pipe 232 of the outlet manifold 214.

[0049] The purge gas port 212 is configured to receive a supply of purge gas. The purge gas can be any suitable purge gas such as, but not limited to, nitrogen. Each purge gas port 212 is disposed between the respective first partition valve 208a and the first flexible pipe portion 206a connected downstream thereof.

[0050] FIG. 4 is a process flow chart showing some of the steps of a method 400 for processing the exhaust gas of the process chamber 108 of the semiconductor processing tool 102.

[0051] It should be noted that the specific process steps shown in the flowchart of FIG. 4 and described below can be omitted, or such process steps can be executed in an order different from the order shown in FIG. 4 and presented below. Further, although all process steps are shown as individual temporally consecutive steps for convenience and ease of understanding, some of the process steps can actually be executed simultaneously or at least to some extent temporally overlapped.

[0052] In step s402, the vacuum pump 106 pumps the process gas from the process chamber 108 through the foreline system 110 to the abatement system 104.

[0053] In step s404, the fluid inlet 224 of the central inlet pipe 220 of the inlet manifold 200 receives the process gas pumped from the foreline system 110, i.e., the gas flow, as indicated by the arrow 221 in FIGS. 2a and 2b.

[0054] In step s406, the inlet manifold 200 divides the received gas flow, and each part of the exhaust gas flow is conveyed along each outlet pipe 222 of the inlet manifold 200.

[0055] Advantageously, at least partially, the outlet pipes 222 are substantially identical and are arranged at the same axial position along the central inlet pipe 220, so that the gas flows along the outlet pipes 222 are substantially identical. For example, the gas flow rate and volume along the outlet pipes 222 are approximately the same for each outlet pipe 222.

[0056] In step s408, the inlet manifold 200 outputs each exhaust gas flow at each of the plurality of fluid outlets 226.

[0057] In step s410, each exhaust gas flow sequentially passes through each respective first shut-off valve 208a and each respective first flexible pipe portion 206a and proceeds to the inlet of each abatement device 202.

[0058] In step s412, each of the abatement devices 202 processes, i.e., abates, each exhaust gas flow it receives.

[0059] The abatement device 202 generates plasma and uses the generated plasma to decompose the exhaust gas flow into various components. In other words, the exhaust gas flow can be burned using the plasma.

[0060] In some embodiments, the decontamination device 202 receives a reagent material in which the exhaust gas stream is mixed. The reagent material tends to prevent or interfere with the recombination of the components in which the exhaust gas stream is decomposed. Any suitable type of reagent material can be used.

[0061] In step s414, the decontamination device 202 outputs the decomposed gas stream to the filter device 204.

[0062] In step s416, the filter device 204 filters particulate matter from the received decomposed gas stream.

[0063] In step s418, the filter device 202 outputs each filtered gas stream.

[0064] In step s420, each filtered gas stream sequentially passes through each second flexible pipe portion 206b and each second shut-off valve 208b and proceeds to the fluid inlet 236 of each inlet pipe 232 of the outlet manifold 214.

[0065] In step s422, each filtered gas stream is conveyed along each inlet pipe 232 to the inlet central outlet pipe 230.

[0066] In step s424, the filtered gas streams are mixed at the central outlet pipe 230 of the outlet manifold 200, thereby providing a mixed gas stream.

[0067] In step s426, the mixed gas stream can be filtered by an additional filter provided within the central outlet pipe 230, thereby removing some or all of the remaining particulate matter therefrom.

[0068] In step s428, the vacuum pump 106 pumps the mixed gas stream from the outlet manifold 214 through the fluid outlet 234. The mixed gas stream is pumped out of the decontamination system 104 through the outlet line 112.

[0069] Accordingly, method 400 is provided.

[0070] Advantageously, the above-described decontamination system enables connecting a plurality of decontamination devices (e.g., near-atmospheric pressure RPS) to a single vacuum pump inlet. The parallel arrangement of the decontamination devices along the arms oriented in parallel and perpendicular directions tends to minimize or at least reduce the installation area of the decontamination system in, for example, a horizontal plane.

[0071] The use of near-atmospheric pressure RPS tends to enable a wide range of options for gas scrubbing techniques after the vacuum pump. The RPS technology is effective for the decomposition of fluorine compounds, but conventionally, at any point in time, for example, in a conventional installation equipped with only a single RPS device mounted on a single vacuum treatment pump, the amount of gas that can be processed tends to be limited. The above-described decontamination system connects a plurality of near-atmospheric pressure RPS to a single vacuum pump and enables processing a higher gas flow. This ability to process a higher gas flow tends to facilitate connecting a single vacuum pump to a plurality of processing chambers as described above.

[0072] The above-described decontamination system tends to result in, for example, public charges, reduction of the installation area of the system, maintainability, and / or performance.

[0073] The above-described pest control system preferably provides a single inlet manifold having only a single fluid inlet. The inlet manifold branches out into a plurality of equal distribution pipes, which tend to supply an equal gas flow to each RPS unit. An equal flow across each RPS unit tends to ensure that each RPS unit does not exceed a maximum flow rate threshold. For example, each RPS unit can handle a maximum process flow of 3 slm. Thus, the system described above tends to be able to handle a process flow of 12 slm (max) assuming that each RPS unit is handling 3 slm (max). Uneven flow rates through the system can result in some RPS units exceeding the 3 slm limit and other units not being fully utilized. RPS units that exceed the 3 slm limit may not react to all of the gas present, potentially resulting in a reduction in the downstream DRE. An equal flow rate across each RPS unit tends to address this issue.

[0074] Each RPS pipe leg can advantageously include isolation valves (e.g., pneumatic isolation valves) upstream and downstream. Each pipe leg can advantageously include a shut-off valve (e.g., manual). Each pipe leg can advantageously include a purge facility (e.g., nitrogen purge facility). The isolation valves and / or purge facilities often provide safe and isolated shut-off and maintenance of the abatement device even while other abatement devices continue to process process gas. For example, the first and second isolation valves respectively upstream and downstream of a given abatement device can be closed. Thus, process gas can be blocked from traveling through a given abatement unit in both the upstream and downstream directions. Thereafter, a purge gas, e.g., nitrogen, can flow through a given abatement unit to remove potentially dangerous process gas therefrom. Thereafter, a given abatement unit (and any devices connected thereto, e.g., associated filter devices) can be separated or disconnected from the abatement system. Advantageously, this can be done while the remaining abatement units are still operating. Thereafter, maintenance, servicing, repair, or replacement can be performed on a given abatement unit, and then the abatement unit can be reinstalled in the abatement system. Thereafter, the first and second isolation valves can be opened again to restart the replaced abatement unit.

[0075] Maintenance of the abatement device and filter can utilize the nitrogen purge function. Nitrogen can be introduced at an inlet purge port located slightly downstream / below valve 208A and output at an outlet purge port located slightly upstream / above valve 208B. The ability to pre-exhaust the unit being maintained using the port upstream / above valve 208B tends to enable performing a leak test function on the abatement device and filter. Also, the ability to pre-exhaust the unit being maintained through the port upstream / above valve 208B tends to enable returning the maintained abatement device and filter to an operating state while the process vacuum is continuously maintained by other operating abatement devices.

[0076] In some cases, fine particles may be generated downstream of the RPS unit and may spread or exist beyond the downstream filter. In the event of causing leakage of the downstream valve, a shut-off valve (e.g., manual) conveniently backs up the downstream automatic valve.

[0077] The flexible pipe portion that can be in a bellows-like structure conveniently tends to provide vibration insulation upstream and / or downstream of the decontamination device. The flexible pipe portion can further provide or facilitate the filtration of fine particles. Further, the flexible pipe portion conveniently tends to facilitate the removal and reinstallation of the decontamination device, for example, for maintenance, servicing, repair or replacement.

[0078] The outlet manifold tends to return all pipe legs to a single outlet and enable a single outlet connection to a large (e.g., catch pot) filter and a process pump.

[0079] Since the inlets to the decontamination devices are equally spaced from the central inlet pipe of the inlet manifold, an even flow distribution through each decontamination device is tended to be ensured.

[0080] The above-described decontamination system conveniently tends to enable maintenance access to a plurality of decontamination devices. The decontamination devices can be replaced even while other units remain in operation. The above-described decontamination system conveniently tends to enable or facilitate the use of downstream wet scrubber technology that enables future gas recovery strategies.

[0081] The above-described decontamination system conveniently utilizes a plasma unit that is operable to separate a very stable bond (such as CF4) and recombine the separated compound using a reagent gas into another compound that is more easily discarded after a vacuum pump (e.g., CF4 decomposed with a hydrogen reagent may generate HF). Conveniently, using a plasma unit tends to enable a gas decontamination unit equipped with a water washing means (i.e., wet scrubber) that eliminates the need for methane combustion.

[0082] In the above embodiment, the vacuum processing system includes a single semiconductor processing tool. However, in other embodiments, the vacuum processing system includes a different number of semiconductor processing tools and / or other processing tools.

[0083] In the above embodiment, the semiconductor processing tool includes four process chambers. However, in other embodiments, the processing tool can include a different number of process chambers other than four.

[0084] In the above embodiment, the vacuum processing system includes a single decontamination system. However, in other embodiments, the vacuum processing system includes a plurality of decontamination systems.

[0085] In the above embodiment, the vacuum processing system includes a single vacuum pump. However, in other embodiments, the vacuum processing system includes a plurality of vacuum pumps.

[0086] In the above embodiment, the inlet manifold of the decontamination system includes four outlet pipes. The decontamination system further includes four decontamination devices, each coupled to a respective outlet pipe of the inlet manifold. However, in other embodiments, the inlet manifold includes a different number of outlet pipes (e.g., 2, 3, 5, 6, 7, or 8 outlet pipes), each of which can be connected to a respective decontamination device. Accordingly, the decontamination system can include a different number of decontamination devices other than four.

[0087] In the above embodiment, the decontamination system includes a plurality (specifically, four) of filter devices. However, in other embodiments, the decontamination system includes a different number of filter devices other than four. In some embodiments, one or more (e.g., all) of the filter devices can be omitted.

[0088] In the above-described embodiment, the outlet manifold of the pest control system includes four inlet pipes. However, in other embodiments, the outlet manifold includes a different number of inlet pipes (e.g., 2, 3, 5, 6, 7, or 8 inlet pipes). Each inlet pipe can be connected to a respective pest control device.

[0089] In the above-described embodiment, the pest control system includes respective pairs of shut-off valves on each pest control leg. However, in other embodiments, the pest control system includes a different number of shut-off valves than those described above, and / or one or more shut-off valves may occupy positions different from those described above along the piping of the system. In some embodiments, the shut-off valves can be omitted.

[0090] In the above-described embodiment, the pest control system includes flexible pipe portions on each pest control leg. However, in other embodiments, the pest control system includes a different number of flexible pipe portions than those described above, and / or one or more flexible pipe portions may occupy positions different from those described above along the piping of the system. In some embodiments, the flexible pipe portions can be omitted.

[0091] In the above-described embodiment, the pest control system includes shut-off valves on each pest control leg. However, in other embodiments, the pest control system includes a different number of shut-off valves than those described above, and / or one or more shut-off valves may occupy positions different from those described above along the piping of the system. In some embodiments, the shut-off valves can be omitted.

[0092] In the above-described embodiment, the inlet manifold has rotational symmetry of two about the central axis of the central inlet pipe. However, in other embodiments, the inlet manifold has rotational symmetry of three or more about the central axis of the central inlet pipe. In some embodiments, the inlet manifold does not have rotational symmetry.

[0093] In the above-described embodiment, the outlet manifold has rotational symmetry of two-fold about the central axis of the central outlet pipe. However, in other embodiments, the outlet manifold has rotational symmetry of three-fold or more about the central axis of the central outlet pipe. In some embodiments, the outlet manifold does not have rotational symmetry.

[0094] In some embodiments, heat insulation and / or cooling means (e.g., water cooling) can be provided around one or two or more (e.g., all) of the decontamination devices and / or one or two or more (e.g., all) of the filters.

Explanation of Reference Numerals

[0095] 100 Vacuum processing system 102 Semiconductor processing tool 104 Decontamination system 106 Vacuum pump 108 Processing chamber 110 Foreline system 112 Outlet line 200 Inlet manifold 202 Decontamination device 204 Filter device 206a First flexible pipe portion 206b Second flexible pipe portion 208a First shut-off valve 208b Second shut-off valve 210 Shut-off valve 212 Purge gas port 214 Outlet manifold 220 Central inlet pipe 221 Process gas input flow direction 222 Outlet pipe 224 Fluid inlet 225 Central axis 226 Fluid outlet 230 Central outlet pipe 231 Process gas output flow direction 232 Inlet pipe 234 Fluid outlet 235 Central axis 236 Fluid inlet 300 Circle 400 Method s402 - s428 Method steps

Claims

1. A pollution control system for treating exhaust gas from a vacuum processing system, It is an inlet manifold, A single fluid inlet for receiving the exhaust gas flow from the vacuum processing system, Multiple fluid outlets connected to the fluid inlet, An inlet manifold equipped with, Multiple abatement devices are arranged to receive the exhaust gas flow from the inlet manifold when in use, Equipped with, Each of the aforementioned plurality of abatement devices is connected to the respective fluid outlet of the inlet manifold, A pollution control system comprising a plurality of pollution control devices, each of which is equipped with a plasma pollution control device for generating plasma to decompose the components of the exhaust gas flow.

2. The pollution control system according to claim 1, wherein the pollution control devices of the plurality of pollution control devices are substantially identical to one another.

3. The pollution control system according to claim 1 or 2, wherein each of the plurality of pollution control devices is configured to convert the components of the exhaust gas flow into liquid-soluble components at near-atmospheric pressure.

4. The aforementioned inlet manifold is, A central inlet pipe defining the single fluid inlet of the inlet manifold, A plurality of outlet pipes extending radially from the central inlet pipe, each outlet pipe defining one of the fluid outlets of the inlet manifold, The pollution control system according to claim 1, comprising:

5. The pollution control system according to claim 4, wherein the plurality of outlet pipes extend radially from the central inlet pipe at their respective positions around the outer circumference of the central inlet pipe and at substantially the same axial position along the central inlet pipe.

6. The pollution control system according to claim 4, wherein the outlet pipes of the inlet manifold are substantially identical to each other.

7. The abatement system according to claim 1, wherein the inlet manifold has two or more rotational symmetries.

8. The abatement system according to claim 1, further comprising a plurality of filter devices, wherein each of the plurality of filter devices is connected to one outlet of each of the plurality of abatement devices.

9. The pollution control system according to claim 1, further comprising a plurality of first flexible pipe sections, each of the plurality of first flexible pipe sections being connected between the respective fluid outlets of the inlet manifold and the pollution control device connected thereto.

10. The abatement system further comprises an outlet manifold arranged to receive the gas flow output from the plurality of abatement devices during use, and the outlet manifold is A single fluid outlet for discharging gas from the aforementioned pollution control system, Multiple fluid inlets connected to the single fluid outlet, Equipped with, The pollution control system according to claim 1, wherein each of the plurality of pollution control devices is connected to the respective fluid inlet of the outlet manifold.

11. The abatement system according to claim 10, further comprising a catch pot filter provided at the single fluid outlet.

12. The pollution control system according to claim 10, further comprising a plurality of second flexible pipe sections, each of the plurality of second flexible pipe sections being connected between the respective fluid inlet of the outlet manifold and the pollution control device connected thereto.

13. The aforementioned decontamination system further comprises a plurality of gate valve pairs, each gate valve pair is A first gate valve positioned upstream of one of the aforementioned multiple pollution control devices, A second gate valve positioned downstream of each of the aforementioned pollution control devices, A pollution control system according to any one of claims 1, comprising:

14. The abatement system according to claim 13, further comprising a plurality of purge gas ports for receiving purge gas, each purge gas port being located between the gate valves of each pair of gate valves.

15. A method for treating exhaust gas from a vacuum processing system, The steps include receiving the exhaust gas flow from the vacuum processing system at a single fluid inlet of the inlet manifold, The steps include outputting each portion of the exhaust gas flow at each of the multiple fluid outlets of the inlet manifold, In each of the multiple pollution control devices, the steps include receiving each portion of the exhaust gas flow from each fluid outlet of the inlet manifold, The steps include processing the respective portions of the exhaust gas flow received by each of the plurality of pollution control devices, Includes, A method wherein each of the plurality of abating devices comprises a plasma abating device, and the processing step includes the step of generating plasma to decompose the components of the exhaust gas flow.

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