Fluoride Ion Cleaning System

Abstract

A fluoride ion cleaning system is provided. The system includes a retort including an interior sized to accommodate at least one component therein. The at least one component has a target area defined thereon. The system also includes a gas distribution system. The gas distribution system includes a manifold configured to provide a reactant gas into the interior, a flow modulator configured to agitate the reactant gas in the interior, and at least one nozzle in fluid communication with the flow modulator. The at least one nozzle is adapted to define an agitated flow of the reactant gas at the target area of ​​the at least one component.

Description

[Technical Field]

[0001] FIELD OF THE DISCLOSURE The present disclosure relates generally to repair operations on gas turbine components, and more particularly to systems and methods for improving fluoride ion cleaning of gas turbine components.

[0002] Components of aviation and power generation turbines, such as blades, shrouds, and vanes, are often formed from superalloy materials, including, but not limited to, nickel-based, cobalt-based, and iron-nickel-based superalloy materials. During operation, turbine components are exposed to high-pressure and high-temperature environments, which can cause the formation of complex, chemically stable thermal oxides. These oxides include, but are not limited to, oxides of aluminum, titanium, chromium, and combinations thereof. Turbines are periodically overhauled to extend their service life or improve performance. During these overhauls, turbine components may undergo various repair operations, including welding or brazing. The presence of chemically stable thermal oxides reduces the ability of superalloys to be welded or brazed. Therefore, removal of these oxides by cleaning turbine components before repair is important to successfully complete an overhaul.

[0003] At least some known high-temperature, reactive-atmosphere batch cleaning processes affect the cleaning of chemically stable oxides from turbine components. Processes that typically rely on the high reactivity of fluoride ions for cleaning are collectively known as "fluoride ion cleaning" (FIC) processes. Current embodiments of FIC processes include a single-volume chamber, or a single-volume chamber with a distribution manifold, designed to provide uniform heating and working fluid distribution and exchange. As gas turbine components continue to increase in size and alloys produce increasingly stubborn oxides, FIC cycles have become increasingly difficult and time-consuming to perform.

[0004] At least some known embodiments of FIC processes, such as dynamic FIC cleaning processes, allow the working fluid to flow during operation. Other known FIC processes, such as pulsed FIC processes, operate between alternating pressure and flow conditions to facilitate improved cleaning cycle effectiveness. Additionally, at least some known FIC processes operate with increased hydrogen fluoride (HF) flow rates to facilitate more aggressive oxide cleaning.

[0005] As gas turbine components continue to increase in size and alloys develop increasingly stubborn oxides, FIC cycles are becoming increasingly difficult and time-consuming to perform. Further complicating long, high-concentration cleaning cycles is that undamaged areas on the component, which do not require cleaning for downstream processing, are subjected to the same cleaning actions (including increased pressure, flow, and gas concentration conditions) as damaged areas. Therefore, the use of such processes can be limited and may be a function of component size, gas supply size, and outlet / scrubber flow capacity. [Prior art documents] [Patent documents]

[0006] [Patent Document 1] International Publication No. 2007003615 Summary of the Invention

[0007] One aspect is a fluoride ion cleaning system. The system includes a retort including an interior sized to accommodate at least one component therein. The at least one component has a target area defined thereon. The system also includes a gas distribution system. The gas distribution system includes a manifold configured to provide a reactant gas into the interior, a flow modulator configured to agitate the reactant gas in the interior, and at least one nozzle in fluid communication with the flow modulator. The at least one nozzle is adapted to define an agitated flow of the reactant gas at the target area of ​​the at least one component.

[0008] Another aspect is a fluoride ion cleaning system. The system includes a retort including an interior sized to accommodate at least one component therein. The at least one component has a target area defined thereon. The system also includes a gas distribution system. The gas distribution system includes a manifold configured to provide a reactant gas into the interior, a flow modulator configured to selectively draw the reactant gas from the interior to define an agitated flow of the reactant gas in the interior, and at least one nozzle in fluid communication with the flow modulator. The at least one nozzle is adapted to define an agitated flow of the reactant gas at the target area of ​​the at least one component.

[0009] Yet another aspect is a fluoride ion cleaning system. The system includes a retort including an interior sized to accommodate at least one component therein. The at least one component has a target area defined thereon. The system also includes a gas distribution system. The gas distribution system includes a manifold configured to provide a reactant gas into the interior, a flow modulator configured to selectively provide additional reactant gas into the interior to define an agitated flow of the reactant gas therein, and at least one nozzle in fluid communication with the flow modulator. The at least one nozzle is adapted to define an agitated flow of the reactant gas at the target area of ​​the at least one component. [Brief explanation of the drawings]

[0010] [Figure 1] FIG. 1 is a schematic diagram of an exemplary fluoride ion cleaning system. [Figure 2] FIG. 1 is a schematic diagram of an alternative fluoride ion cleaning system. [Figure 3] 3 illustrates an exemplary flow modulator that can be used with the system shown in FIGS. 1 and 2. [Figure 4] 3 illustrates an alternative flow modulator that can be used with the system shown in FIGS. 1 and 2. DETAILED DESCRIPTION OF THE INVENTION

[0011]

[0003] Embodiments described herein relate to systems and methods for improving fluoride ion cleaning of, for example, gas turbine components. The system includes a retort having an internal working chamber into which a reactant gas is distributed. A gas distribution system associated with the retort includes a manifold that distributes the reactant gas within the working chamber and one or more devices that allow for the extraction of the reactant gas from the working chamber or the supply of additional reactant gas to the working chamber. The extraction or additional supply of the reactant gas is defined by a pulse rate that defines an agitated flow of the reactant gas at a selected region within the working chamber. For example, a nozzle in fluid communication with a flow modulator may be positioned closer to a target region of the component being cleaned, with a pressure differential created by the flow modulator defining a cleaning pulse. Thus, defining an agitated flow of the reactant gas at a selected region within the working chamber facilitates shorter cycle times and improved cleaning quality for fluoride ion cleaning of turbine components, thus facilitating cleaning of more difficult to clean superalloy parts.

[0012] Fluoride ion cleaning (FIC) processes disclosed herein include a hydrogen-enhanced mixed gas FIC process (hereinafter referred to as "H-FIC") that removes oxides from surfaces and cracks in articles. The H-FIC process can be used to clean metal articles such as, but not limited to, superalloy aviation and power generation turbine vanes, shrouds, blades, and similar elements (hereinafter "turbine components").

[0013] Unless otherwise specified, terms expressing approximation, such as "generally," "substantially," and "about," used herein indicate that the modified term may be applied only to an approximate degree, as recognized by those skilled in the art, rather than to an absolute or complete degree. Thus, values ​​modified with terms such as "about," "approximately," and "substantially" are not limited to the exact value specified. In at least some cases, terms expressing approximation may correspond to the precision of the instrument used to measure the value. Furthermore, unless otherwise specified, terms such as "first," "second," and the like are used herein merely as labels and are not intended to impose any ordering, positioning, or hierarchical requirements on the items they refer to. Furthermore, for example, a reference to a "second" item does not require or exclude the presence of, for example, a "first" or lower-numbered item, or a "third" or higher-numbered item.

[0014] 1 is a schematic diagram of an exemplary FIC system 100, such as an H-FIC system. However, other H-FIC system configurations are within the scope of this disclosure. The FIC system 100 includes a retort 102 (also known as a "reaction chamber") having an interior 104 sized to accommodate at least one component 118 therein. The retort 102 is formed from a material that is compatible with the FIC cleaning atmosphere. For example, but not limited to, the retort 102 can be formed from a nickel-based, iron-based, or cobalt-based alloy.

[0015] The gas distribution system 105 of the FIC system 100 includes a reactant gas source 106, a manifold 108, and at least one nozzle 110. The reactant gas source 106 supplies the reactant gas to the interior 104, where it is discharged from the manifold 108 and / or the nozzle 110. For example, a support rack assembly 112 provides fluid communication between the source 106 and the manifold 108, a supply conduit 114 provides fluid communication between the source 106 and the nozzle 110, the support rack assembly 112 may be disposed in the interior 104 of the retort 102, and the supply conduit 114 may be disposed within the support rack assembly 112. The support rack assembly 112 includes one or more platforms 116 adapted to support at least one component 118 to be cleaned thereon. The platform 116 may be defined by a grate or perforations that allow the reactant gas to pass through and contact the component 118. For example, the manifold 108 is configured to provide and distribute reactant gases through a plurality of apertures 120 defined therein into the interior 104. The reactant gases exhausted from the retort 102 are directed to a scrubber 122.

[0016] Any number of nozzles 110 may be included in the interior 104 that enables the FIC system 100 to function as described herein. For example, at least one nozzle 110 may be associated with each component 118 disposed in the interior 104. The number of nozzles 110 disposed relative to and associated with each component 118 may be based on the size or quantity of target areas 124 defined thereon. In one embodiment, the at least one target area 124 is a damaged area, although the FIC system 100 is not limited to use solely with damaged areas of the component 118. For example, multiple nozzles 110 may be disposed relative to each component 118 to enhance the cleaning capabilities of the FIC system 100.

[0017] 1 , each nozzle 110 is defined by an opening 126 in a housing 128 that at least partially contains a respective component 118. The housing at least partially contains the component 118 to define a localized volume of reactant gas, which may be more susceptible to pressure fluctuations (i.e., pulses) generated to facilitate enhanced cleaning of the component 118. In one example, the housing 128 also includes an opening 130 that allows reactant gas exhausted from the manifold 108 to enter the housing 128. Thus, the component 118 may be oriented within the housing 128 to position the target region 124 closer to the respective nozzle 110 than an undamaged region thereof.

[0018] 2, the nozzle 110 is defined by a flexible tube 132 in fluid communication with the supply conduit 114 and a nozzle head 134 coupled to the flexible tube 132. The flexible tube 132 is fabricated from a material that allows the nozzle head 134 to be positioned and held in nearly any orientation relative to the component 118. Thus, the nozzle 110 is movable relative to the manifold 108 within the interior 104 to position the nozzle head 134 closer to the target area 124 of the component 118 than to an undamaged area thereof.

[0019] The pressure fluctuations can be generated by supplying additional reactant gas to the housing 128 or by selectively withdrawing reactant gas from within the housing 128, as described in more detail below. In an exemplary embodiment, such pressure fluctuations are generated by a flow modulator 136 coupled in fluid communication between the retort 102 and the source of reactant gas 106. In one embodiment, the flow modulator 136 can be configured or sized and shaped for insertion into the retort 102. The generation of the pressure fluctuations can be controlled to define a pulse rate of the reactant gas discharged from or selectively extracted by the nozzle 110. For example, the pulse rate can be within a range defined between about 10 pulses / minute and about 240 pulses / minute. In one embodiment, a Pfeifenton resonator and / or any other type of “whistle” type resonator that enables the system 100 to operate (including, but not limited to, a “coach or pea whistle” type resonator, or a corrugated tube type resonator) is used. In such an embodiment, a whistle-type resonator can be used to provide hyperdynamic pulsation at a pulse rate of about 30 Hz to about 300 Hz. The pulse rate therefore defines an agitated flow of reactant gas that facilitates improved cleaning efficiency of the FIC system 100. As used herein, the term agitated as applied to the flow of reactant gas is used to describe a flow modulator 136 having at least one flow circuit with a faster dynamic flow response compared to that of the retort 102 itself.

[0020] The gas distribution system 105 may include any number of flow modulators 136 that enable the FIC system 100 to function as described herein. For example, a single flow modulator 136 may be fluidly coupled to multiple nozzles 110 to define substantially similar pulsation rates for the multiple nozzles 110. Alternatively, a different flow modulator 136 may be fluidly coupled to each nozzle 110 to define a different pulsation rate for each respective nozzle 110.

[0021] FIG. 3 illustrates an exemplary flow modulator 136 that can be used with FIC system 100 (shown in FIGS. 1 and 2). In the exemplary embodiment, flow modulator 136 is a venturi nozzle 138 having a first high-pressure section 140, a second high-pressure section 142, and a low-pressure section 144 extending therebetween. Venturi nozzle 138 is shaped to define a reduced pressure relative to interior 104 of retort 102 (shown in FIGS. 1 and 2). That is, the change in volume of sections 140, 142, and 144 facilitates defining a reduced or decreased pressure at the inlet of low-pressure section 144, as described in more detail below. The pressure differential defined between interior 104 and low-pressure section 144 thus permits selective drawing of reactant gases from interior 104 and agitation of the reactant gases proximate nozzle 110 (shown in FIGS. 1 and 2) that is fluidly coupled to venturi nozzle 138.

[0022] In one example, the first high-pressure section 140 includes a first inlet 146, the low-pressure section 144 includes a second inlet 148, and the second high-pressure section 142 includes an outlet 150. The first inlet 146 receives reactant gas from a reactant gas source 106 (shown in FIGS. 1 and 2 ), the outlet 150 discharges the reactant gas toward a manifold 108 (shown in FIGS. 1 and 2 ), and the second inlet 148 is in fluid communication with one or more of the nozzles 110. Thus, a pressure differential defined between the interior 104 and the second inlet 148 defines the above-described agitated flow of reactant gas in a passive and efficient manner. In such an embodiment, the FIC system 100 can include a response accumulator 152 (shown in FIGS. 1 and 2 ) coupled downstream of the outlet 150. The accumulator 152 selectively varies the response times of the gas distribution manifolds relative to one another.

[0023] FIG. 4 illustrates an alternative flow modulator 136 that can be used with the FIC system 100 (shown in FIGS. 1 and 2 ). In the exemplary embodiment, the flow modulator 136 is a flow tap device 154 configured to selectively provide additional reactant gas to the interior 104. The flow tap device 154 includes a gas supply channel 156, a dynamic flow tap 158, and a flow orifice 160. The dynamic flow tap 158 includes an inlet 162 and an outlet 164. The inlet 162 is positioned to selectively extract the reactant gas channeled through the gas supply channel 156. The outlet 164 is coupled in fluid communication with one or more of the nozzles 110 (shown in FIGS. 1 and 2 ). Thus, the reactant gas extracted by the inlet 162 may be discharged from the nozzle 110 as additional reactant gas that defines the agitated flow of reactant gas described above.

[0024] In an exemplary embodiment, the pulse can be generated from a gas supply system or a vacuum exhaust system. During use, the control of the reactant gas flow is turned on and remains on for a time sufficient to establish a predetermined differential flow, thereby generating a pulse in the nozzle 110. In an exemplary embodiment, a proportional control valve is used to control the flow, but any other control valve, including an on / off valve, can be used to enable the FIC system 100 to function as described herein. The total mass flow rate is much less than the amount required to generate a significant "pulse" throughout the retort volume. In such an embodiment, the device is connected to a supply gas. In an embodiment using a vacuum system, the device is coupled to the exhaust of the retort, again creating a higher differential / local flow rate adjacent to the target area of ​​the component compared to the rest of the retort volume. In an exemplary embodiment, a stable flow through the venturi can be established in approximately 30 seconds.

[0025] In the illustrated example, flow orifice 160 is positioned downstream of inlet 162 of dynamic flow tap 158. Flow orifice 160 defines an opening 166 that restricts the flow of reactant gas channeled through gas supply channel 156. Thus, flow orifice 160 is sized to maintain pressurization of reactant gas provided to manifold 108, which may be based on the amount of reactant gas extracted by inlet 162.

[0026] The invention described herein benefits from a different control scheme for the reactant gas and / or retort exhaust streams compared to at least some control schemes used with at least some known FIC systems. More specifically, in at least some known systems, retort temperature, pressure, and gas flow set points are established, and a control scheme is used to ramp to these set points with desired gas concentrations for a given period of time and stabilize at these set points. Unlike known systems, however, the present invention utilizes known control schemes to arrive at a starting point where a "hyperdynamic pulse" enabler is used, but establishes a different control regime: either establishing a flow for a fixed time, adding or evacuating a predetermined mass, achieving a specific flow rate in an "agitator" for a specified time, or obtaining a predetermined valve position for a specified time. More generally, control schemes that seek a stable equilibrium are suspended to enable a "hyperdynamic" control scheme. After the "hyperdynamic" phase of control, the control system then attempts to achieve a pre-set set point or moves to a different target set point using known control. As a "secondary" control scheme, the control scheme monitors and limits pressure and flow to stay within safe operating limits.

[0027] In one embodiment, switching between different control schemes is directed by protocol control. For example, in one embodiment, switching is based on a monitored parameter, such as a continuously monitored safety-critical parameter. In such an embodiment, if the monitored safety-critical parameter is exceeded, the system is returned to the first "standard control scheme." In another example, switching is based on a predetermined parameter being met. For example, in such an embodiment, if the desired "hyperdynamic" cycle is completed, the system is returned to normal control parameters.

[0028] Embodiments described herein relate to systems and methods for improving fluoride ion cleaning of gas turbine components. The gas distribution system includes a manifold that distributes reactant gas within a working chamber and one or more devices that allow for the extraction of reactant gas from the working chamber or the supply of additional reactant gas to the working chamber. The extraction or additional supply of reactant gas is defined by a pulse rate that defines an agitated flow of reactant gas at selected regions within the working chamber. Defining an agitated flow of reactant gas at selected regions within the working chamber facilitates reduced cycle times and improved cleaning quality for fluoride ion cleaning of thick-walled, advanced, and therefore superalloy, components, which are more challenging to clean. Furthermore, the nozzles can be retrofitted to existing FIC systems without requiring changes to the retort and / or existing reactant gas supply assembly equipment. Furthermore, the embodiments described herein enable higher frequency FIC cleaning pulses compared to known FIC systems.

[0029] The foregoing description is intended to be illustrative only, and those skilled in the art will recognize that changes may be made to the described embodiments without departing from the scope of the invention disclosed. Modifications that are within the scope of the invention will be apparent to those of skill in the art upon review of this disclosure, and such modifications are intended to fall within the scope of the appended claims.

[0030] Further aspects of the present disclosure are provided by the subject matter of the following sections.

[0031] A fluoride ion cleaning system includes a retort and a gas distribution system. The retort includes an interior sized to accommodate at least one component therein, the at least one component having a target area defined thereon. The gas distribution system includes a manifold, a flow modulator, and at least one nozzle. The manifold is configured to provide a reactant gas into the interior; the flow modulator is configured to agitate the reactant gas in the interior; and the at least one nozzle is in fluid communication with the flow modulator, the at least one nozzle being adapted to define an agitated flow of the reactant gas at the target area of ​​the at least one component.

[0032] The system of any preceding clause, wherein the flow modulator selectively draws reactant gas from the interior to create a pressure differential that defines an agitated flow of the reactant gas.

[0033] The system of any preceding clause, wherein the flow modulator selectively provides additional reactant gas therein to create a pressure differential that defines an agitated flow of the reactant gas.

[0034] The system of any preceding clause, wherein the gas distribution system further comprises a housing at least partially enclosing the at least one component, and wherein the at least one nozzle is in fluid communication with the housing to define an agitated flow within the interior of the housing.

[0035] The system of any preceding clause, wherein the manifold is stationary within the interior and the at least one nozzle is movable within the interior relative to the manifold.

[0036] The system of any preceding clause, wherein the at least one nozzle includes a first nozzle disposed on the first component and at least one second nozzle disposed on the second component, and the flow modulator is configured to define agitated flows of each reactant gas with the first and second nozzles at different pulsation rates.

[0037] The system of any preceding clause, wherein the flow modulator is adapted to define the agitated flow at a pulse rate defined within a range of about 10 pulses / minute to about 240 pulses / minute.

[0038] The system of any preceding clause, wherein the flow modulator is adapted to define the agitated flow at a pulse rate defined within a range of about 30 Hz to about 300 Hz.

[0039] The system of any preceding clause, wherein the flow modulator comprises a first opening in fluid communication with the at least one nozzle and a second opening in fluid communication with the manifold.

[0040] The system of any preceding clause, wherein the flow modulator is coupled to a whistle-type resonator device.

[0041] The fluoride ion cleaning system includes a retort and a gas distribution system. The retort includes an interior sized to accommodate at least one component therein, the at least one component having a target area defined thereon. The gas distribution system includes a manifold configured to provide a reactant gas into the interior; a flow modulator configured to selectively withdraw the reactant gas from the interior to define an agitated flow of the reactant gas in the interior; and at least one nozzle in fluid communication with the flow modulator, the at least one nozzle adapted to define the agitated flow of the reactant gas at the target area of ​​the at least one component.

[0042] 10. The system of any preceding clause, wherein the flow modulator comprises a venturi nozzle having a high-pressure section and a low-pressure section in fluid communication with the at least one nozzle, wherein a pressure differential between the interior and the low-pressure section defines the agitated flow.

[0043] 10. The system of any preceding clause, wherein the venturi nozzle comprises a first inlet in fluid communication with the supply of reactant gas, a second inlet in fluid communication with the at least one nozzle, and an outlet in fluid communication with the manifold.

[0044] The system of any preceding clause, wherein the gas distribution system further comprises a housing at least partially enclosing the at least one component, and wherein the at least one nozzle is in fluid communication with the housing to define an agitated flow within the interior of the housing.

[0045] The system of any preceding clause, wherein the manifold is stationary within the interior and the at least one nozzle is movable within the interior relative to the manifold.

[0046] The system of any preceding clause, wherein the at least one nozzle includes a first nozzle disposed on the first component and at least one second nozzle disposed on the second component, and the flow modulator is configured to define agitated flows of each reactant gas with the first and second nozzles at different pulsation rates.

[0047] The fluoride ion cleaning system includes a retort and a gas distribution system. The retort includes an interior sized to accommodate at least one component therein, the at least one component having a target area defined thereon. The gas distribution system includes a manifold configured to provide a reactant gas into the interior; a flow modulator configured to selectively provide additional reactant gas into the interior to define an agitated flow of the reactant gas into the interior; and at least one nozzle in fluid communication with the flow modulator, the at least one nozzle adapted to define the agitated flow of the reactant gas at the target area of ​​the at least one component.

[0048] 10. The system of any preceding clause, wherein the gas distribution system further comprises a gas supply channel configured to supply the reactant gas to the manifold, and wherein the flow modulator comprises a dynamic flow tap configured to extract additional reactant gas from the gas supply channel.

[0049] The system of any preceding clause, wherein the gas distribution system further comprises a housing at least partially enclosing the at least one component, and wherein the at least one nozzle is in fluid communication with the housing to define an agitated flow within the interior of the housing.

[0050] The system of any preceding clause, wherein the manifold is stationary within the interior and the at least one nozzle is movable within the interior relative to the manifold.

[0051] The system of any preceding clause, wherein the at least one nozzle includes a first nozzle disposed on the first component and at least one second nozzle disposed on the second component, and the flow modulator is configured to define agitated flows of each reactant gas with the first and second nozzles at different pulsation rates.

[0052] A gas turbine engine component is cleaned using the process described in any of the preceding paragraphs, wherein the gas turbine engine component is sized for insertion into the interior of the retort, and the target area of ​​the gas turbine engine is substantially as clean as the remainder of the gas turbine engine component.

[0053] Exemplary embodiments of fluoride ion cleaning systems are described above in detail. The systems and methods described herein are not limited to the specific embodiments described herein; rather, method steps can be utilized independently and separately from other steps described herein. For example, the methods described herein are not limited to practice in cleaning gas turbine engine components as described herein. Rather, exemplary embodiments can be implemented and utilized in connection with any application where improved cleaning using fluoride ions is desired.

[0054] Although specific features of various embodiments of the invention may be shown in some drawings and not in others, this is for convenience only. Moreover, references to "one embodiment" in the above description are not intended to be interpreted as excluding the existence of additional embodiments that also incorporate the recited features. In accordance with the principles of the invention, any feature of a drawing may be referenced and / or claimed in combination with any feature of any other drawing.

[0055] While the invention has been described in terms of various specific embodiments, those skilled in the art will recognize that the invention can be practiced with modification within the spirit and scope of the claims. [Explanation of symbols]

[0056] 100 FIC System 102 Retort 104 Internal 105 Gas Distribution System 106 Source 108 Manifold 110 nozzle 112 Support rack assembly 114 Supply Conduit 116 Platform 118 Components 120 aperture 122 Scrubba 124 Target Area 126 Opening 128 Housing 130 Opening 132 Flexible Tube 134 Nozzle Head 136 Flow Modulator 138 Venturi nozzle 140 First High-Pressure Section 142 Second High-Pressure Section 144 Low Pressure Section 146 First Entrance 148 Second Entrance 150 Exit 152 Response Accumulator 154 Flow Tap Device 156 Gas supply channel 158 Dynamic Flow Tap 160 Flow Orifice 162 Entrance 164 Exit 166 Opening

Claims

1. a retort (102) having an interior (104) sized to receive at least one component (118) therein, said at least one component (118) having a target area (124) defined thereon; A gas distribution system (105) comprising: a manifold (108) configured to provide a reactant gas into the interior (104); a flow modulator (136) configured to agitate the reactant gas in the interior (104); and at least one nozzle (110) in fluid communication with said flow modulator (136), said at least one nozzle (110) adapted to define an agitated flow of reactant gas at said target region (124) of said at least one component (118); a gas distribution system (105) comprising:

1. A fluoride ion cleaning system (100) comprising:

2. The system of any preceding claim, wherein the flow modulator selectively draws the reactant gas from the interior to create a pressure differential that defines an agitated flow of the reactant gas.

3. 2. The system of claim 1, wherein the flow modulator selectively provides additional reactant gas to the interior to create a pressure differential that defines an agitated flow of the reactant gas.

4. 2. The system (100) of claim 1, wherein the gas distribution system (105) further comprises a housing (128) at least partially enclosing the at least one component (118), and the at least one nozzle (110) is in fluid communication with the housing (128) to define the agitated flow within an interior (104) of the housing (128).

5. 2. The system of claim 1, wherein the manifold is stationary within the interior and the at least one nozzle is movable within the interior relative to the manifold.

6. 2. The system of claim 1, wherein the at least one nozzle comprises a first nozzle disposed on a first component and at least one second nozzle disposed on a second component, and the flow modulator is configured to define agitated flows of respective reactant gases with the first and second nozzles at different pulsation rates.

7. 10. The system of claim 1, wherein the flow modulator is adapted to define the agitated flow at a pulse rate defined within a range of about 10 pulses / minute to about 240 pulses / minute.

8. The system (100) of any preceding claim, wherein the flow modulator (136) is adapted to define the agitated flow at a pulse rate defined within a range of about 30 hz to about 300 hz.

9. 2. The system of claim 1, wherein the flow modulator comprises a first opening in fluid communication with the at least one nozzle and a second opening in fluid communication with the manifold.

10. The system (100) of claim 1, wherein the flow modulator (136) is coupled to a whistle-type resonator device.

11. a retort (102) having an interior (104) sized to receive at least one component (118) therein, said at least one component (118) having a target area (124) defined thereon; A gas distribution system (105) comprising: a manifold (108) configured to provide a reactant gas into the interior (104); a flow modulator (136) configured to selectively draw the reactant gas from the interior (104) to define an agitated flow of the reactant gas within the interior (104); and at least one nozzle (110) in fluid communication with the flow modulator (136), the at least one nozzle (110) adapted to define an agitated flow of the reactant gas at the target region (124) of the at least one component (118); a gas distribution system (105) comprising:

1. A fluoride ion cleaning system (100) comprising:

12. 12. The system of claim 11, wherein the flow modulator comprises a venturi nozzle having a high-pressure section and a low-pressure section in fluid communication with the at least one nozzle, and wherein a pressure differential between the interior and the low-pressure section defines the agitated flow.

13. 13. The system of claim 12, wherein the venturi nozzle comprises a first inlet in fluid communication with a supply of reactant gas, a second inlet in fluid communication with the at least one nozzle, and an outlet in fluid communication with the manifold.

14. 12. The system (100) of claim 11, wherein the gas distribution system (105) further comprises a housing (128) at least partially enclosing the at least one component (118), and the at least one nozzle (110) is in fluid communication with the housing (128) to define the agitated flow within an interior (104) of the housing (128).

15. 12. The system (100) of claim 11, wherein the manifold (108) is stationary within the interior (104) and the at least one nozzle (110) is movable within the interior (104) relative to the manifold (108).

16. 12. The system of claim 11, wherein the at least one nozzle includes a first nozzle disposed on a first component and a second nozzle disposed on a second component, and the flow modulator is configured to define agitated flows of respective reactant gases with the first and second nozzles at different pulsation rates.

17. a retort (102) having an interior (104) sized to receive at least one component (118) therein, said at least one component (118) having a target area (124) defined thereon; A gas distribution system (105) comprising: a manifold (108) configured to provide a reactant gas into the interior (104); a flow modulator (136) configured to selectively provide additional reactant gas to the interior (104) to define an agitated flow of reactant gas within the interior (104); and at least one nozzle (110) in fluid communication with the flow modulator (136), the at least one nozzle (110) adapted to define an agitated flow of the reactant gas at the target region (124) of the at least one component (118); a gas distribution system (105) comprising:

1. A fluoride ion cleaning system (100) comprising:

18. 20. The system of claim 17, wherein the gas distribution system further comprises a gas supply channel configured to supply the reactant gas to the manifold, and the flow modulator comprises a dynamic flow tap configured to extract the additional reactant gas from the gas supply channel.

19. 18. The system (100) of claim 17, wherein the gas distribution system (105) further comprises a housing (128) at least partially enclosing the at least one component (118), and the at least one nozzle (110) is in fluid communication with the housing (128) to define the agitated flow within an interior (104) of the housing (128).

20. 18. The system (100) of claim 17, wherein the manifold (108) is stationary within the interior (104) and the at least one nozzle (110) is movable within the interior (104) relative to the manifold (108).

21. 18. The system of claim 17, wherein the at least one nozzle includes a first nozzle disposed on a first component and a second nozzle disposed on a second component, and the flow modulator is configured to define agitated flows of respective reactant gases with the first and second nozzles at different pulsation rates.

22. 20. A gas turbine engine component (118) cleaned using the process of claim 17, wherein the gas turbine engine component is sized for insertion into the interior (104) of the retort (102) and the target area (124) of the gas turbine engine is substantially as clean as the remainder of the gas turbine engine component.

23. a retort (102) having an interior (104) sized to receive at least one component (118) therein, said at least one component (118) having a target area (124) defined thereon; a first control scheme in which set points for at least retort (102) temperature, pressure, and gas flow in said interior (104) are established and configured to stabilize operation in said interior (104) based on the predetermined set points; a second control scheme configured to establish a flow through a flow modulator (136) configured to agitate the reactant gas in the interior (104), wherein at least one predetermined flow is established in the modulator (136) for a predetermined time, a predetermined mass is exhausted from the modulator (136), a predetermined valve position is obtained, a predetermined valve opening ratio is achieved, and a specific flow rate in the modulator (136) is established in the modulator (136); and 1. A fluoride ion cleaning system (100) comprising:

24. and a control protocol for switching between the first control scheme and the second control scheme, the protocol comprising: switching between the first and second control schemes based on monitored parameters; and switching between the first control scheme and the second control scheme based on predetermined parameters.

24. The cleaning system of claim 23, comprising at least one of:

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