Three dimensional laminating and shaping apparatus and three dimensional laminating and shaping method

The described apparatus and method improve the quality of three-dimensional structures by strategically controlling beam irradiation to enhance melting and bonding in additive manufacturing processes.

JP2026000764AActive Publication Date: 2026-01-06JEOL LTD
View PDF 6 Cites 0 Cited by

Patent Information

Application Number
JP2024098284
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2024-06-18
Publication Date
2026-01-06
Estimated Expiration
2044-06-18

AI Technical Summary

Technical Problem

Existing three-dimensional additive manufacturing devices face challenges in improving the quality of the three-dimensional structures they produce.

Method used

A three-dimensional additive manufacturing apparatus and method that includes a stage, a beam emission unit, a beam deflection unit, and a control unit, which controls the beam to irradiate adjacent solidification points before and after irradiating the next point, allowing for improved bonding and structural quality.

Benefits of technology

The method enhances the quality of the three-dimensional structures by ensuring efficient melting and bonding of powder material layers, resulting in improved structural integrity.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure 2026000764000001_ABST
    Figure 2026000764000001_ABST
Patent Text Reader

Abstract

To provide a three dimensional lamination shaping apparatus and a three dimensional lamination shaping method capable of improving the quality of a three dimensional structure to be shaped.SOLUTION: A beam emitting unit of the three dimensional laminating and shaping apparatus emits a beam toward a powder layer spread on a stage. The beam deflector deflects the beam emitted from the beam emitter. The control unit controls the beam deflection unit. A point to be irradiated with the beam next in the powder layer is defined as a next irradiation point, and a point that has been irradiated with the beam and solidified is defined as a solidification point. The control part controls the beam deflection part to irradiate at least one solidification point adjacent to the next irradiation point with the beam after irradiating the next irradiation point with the beam, or to irradiate at least one solidification point adjacent to the next irradiation point with the beam before the next irradiation point is solidified after irradiating the next irradiation point with the beam.SELECTED DRAWING: Figure 3
Need to check novelty before this filing date? Find Prior Art

Description

[Technical Field]

[0001] The present invention relates to a three-dimensional additive manufacturing apparatus and a three-dimensional additive manufacturing method. [Background technology]

[0002] In recent years, three-dimensional additive manufacturing (3D AM) devices have become known that build three-dimensional objects by stacking layers of solidified powder material. The 3D AM device irradiates a beam onto powder material spread on a stage, melting and solidifying the powder material.

[0003] Patent Document 1 describes a three-dimensional additive manufacturing device. The three-dimensional additive manufacturing device described in Patent Document 1 divides a manufacturing area of ​​powder material into multiple lines, scans each line in turn with a beam, and melts the powder material line by line. Furthermore, between the end of beam scanning of the Mth line (M is a natural number) and the start of beam scanning of the M+1th line, a dummy scan is performed in which the beam scans without melting the powder material. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Publication No. 2022-144439 Summary of the Invention [Problem to be solved by the invention]

[0005] Incidentally, it is desirable for three-dimensional additive manufacturing devices to improve the quality of the three-dimensional structures they manufacture.

[0006] In consideration of the above problems, an object of the present invention is to provide a three-dimensional additive manufacturing device and a three-dimensional additive manufacturing method that can improve the quality of the three-dimensional structure to be manufactured. [Means for solving the problem]

[0007] In order to solve the above problems and achieve the object of the present invention, a three-dimensional additive manufacturing apparatus embodying one aspect of the present invention includes a stage, a beam emission unit, a beam deflection unit, and a control unit. A powder layer made of powder material is spread on the stage. The beam emission unit emits a beam toward the powder layer spread on the stage. The beam deflection unit deflects the beam emitted from the beam emission unit. The control unit controls the beam deflection unit. A point on the powder layer to be irradiated with the beam next is defined as a next irradiation point, and a point that has been irradiated with the beam and solidified is defined as a solidification point. The control unit controls the beam deflection unit to irradiate the beam onto at least one solidification point adjacent to the next irradiation point, and then irradiate the beam onto the next irradiation point, or to irradiate the beam onto at least one solidification point adjacent to the next irradiation point after irradiating the next irradiation point with the beam and before the next irradiation point solidifies.

[0008] A three-dimensional additive manufacturing method embodying one aspect of the present invention includes an activation step and a main irradiation step. The point on the powder layer spread on the stage to be next irradiated with the beam is defined as the next irradiation point, and the point that has already been irradiated with the beam and solidified is defined as the solidification point. In the activation step, the control unit controls the beam deflection unit to irradiate the beam to at least one solidification point adjacent to the next irradiation point. In the main irradiation step, the control unit controls the beam deflection unit to irradiate the beam to the next irradiation point. The activation step is performed at least either before or after the main irradiation step. [Effects of the Invention]

[0009] According to the three-dimensional additive manufacturing device and three-dimensional additive manufacturing method configured as described above, the quality of the three-dimensional structure to be manufactured can be improved. [Brief explanation of the drawings]

[0010] [Figure 1] 1 is a schematic configuration diagram showing a three-dimensional additive manufacturing apparatus according to an embodiment. FIG. [Figure 2] FIG. 2 is a block diagram showing a functional configuration of a beam position control unit of the three-dimensional additive manufacturing apparatus according to one embodiment. [Figure 3]FIG. 2 is a diagram illustrating a first irradiation pattern showing a first example of a beam irradiation procedure of the three-dimensional additive manufacturing apparatus according to one embodiment. [Figure 4] FIG. 10 is a diagram illustrating a second irradiation pattern showing a second example of the beam irradiation procedure of the three-dimensional additive manufacturing apparatus according to one embodiment. [Figure 5] FIG. 10 is a diagram illustrating a third irradiation pattern showing a third example of the beam irradiation procedure of the three-dimensional additive manufacturing apparatus according to one embodiment. [Figure 6] FIG. 10 is a diagram illustrating a fourth irradiation pattern showing a fourth example of the beam irradiation procedure of the three-dimensional additive manufacturing apparatus according to one embodiment. [Figure 7] FIG. 10 is a diagram illustrating a fifth irradiation pattern showing a fifth example of a beam irradiation procedure of the three-dimensional additive manufacturing apparatus according to one embodiment. [Figure 8] FIG. 10 is a diagram illustrating a sixth irradiation pattern showing a sixth example of a beam irradiation procedure of the three-dimensional additive manufacturing apparatus according to one embodiment. [Figure 9] FIG. 10 is a diagram illustrating a seventh irradiation pattern showing a seventh example of a beam irradiation procedure of the three-dimensional additive manufacturing apparatus according to one embodiment. [Figure 10] FIG. 10 is a diagram illustrating an eighth irradiation pattern showing an eighth example of the beam irradiation procedure of the three-dimensional additive manufacturing apparatus according to one embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0011] Hereinafter, one embodiment of a three-dimensional additive manufacturing device and a three-dimensional additive manufacturing method of the present invention will be described with reference to Figures 1 to 10. Note that common members in the figures are given the same reference numerals.

[0012] [3D additive manufacturing equipment] First, the configuration of a three-dimensional additive manufacturing apparatus according to one embodiment will be described with reference to FIG. FIG. 1 is an explanatory diagram schematically illustrating a three-dimensional additive manufacturing apparatus according to one embodiment.

[0013] The 3D additive manufacturing apparatus 1 shown in Fig. 1 is an apparatus that irradiates a powder material with an electron beam to melt the powder material, and then stacks images of the solidified powder material to form a three-dimensional object. As shown in Fig. 1, the 3D additive manufacturing apparatus 1 includes an electron gun 2 that emits an electron beam L1, a lens 4, a powder material storage chamber 5, a stage 6, a powder stacking arm 7, and a beam deflection unit 10. The electron gun 2 corresponds to the beam emission unit of the present invention.

[0014] The electron gun 2, deflection amplifier 3, lens 4, powder material storage 5, stage 6, and powder deposition arm 7 are arranged in a fabrication chamber (not shown). A vacuum pump is connected to the fabrication chamber. The vacuum pump removes gas from the interior of the fabrication chamber, thereby evacuating the interior space of the fabrication chamber.

[0015] The electron gun 2 includes an emitter 21, an extraction electrode 22, and an acceleration electrode 23. The emitter 21 and the acceleration electrode 23 are connected to an acceleration power supply 24. The extraction electrode 22 is connected to an extraction potential generator (not shown). The extraction potential generator applies an extraction potential to the extraction electrode 22. When the extraction potential is applied, the extraction electrode 22 extracts electrons from the emitter 21.

[0016] The acceleration electrode 23 generates an electron beam L1 by accelerating the electrons extracted from the emitter 21 using an acceleration potential applied by an acceleration power supply 24. The acceleration electrode 23 directs the generated electron beam L1 toward the lens 4 and the deflection amplifier 3.

[0017] A deflection amplifier 3 (to be described later) of the beam deflection unit 10 is disposed between the electron gun 2 and the stage 6. The detailed configuration of the beam deflection unit 10 will be described later with reference to FIG.

[0018] The lens 4 is disposed between the deflection amplifier 3 and the electron gun 2. The lens 4 focuses the electron beam L1 emitted from the electron gun 2 by electromagnetic action. The lens 4 then forms an image of the focal point of the electron beam L1 on the stage 6.

[0019] The stage 6 is formed in a substantially flat plate shape. The stage 6 is supported by a driving device (not shown) so as to be movable in the vertical direction. A powder material M1 is supplied to one side of the stage 6 from a powder material storage 5. Examples of the powder material M1 include metals such as titanium, aluminum, and iron, as well as solid materials such as ceramics and organic resins.

[0020] In addition, a powder deposition arm 7 is disposed near the stage 6. The powder deposition arm 7 is supported by a movement mechanism (not shown) so as to be movable horizontally on one surface of the stage 6. As the powder deposition arm 7 moves horizontally on one surface of the stage 6, the powder material M1 is spread over one surface of the stage 6 to a predetermined height (for example, the diameter of one grain of the powder material M1).

[0021] The electron beam L1 is irradiated onto a layer (powder layer) of powder material M1 spread on the stage 6, causing the powder material M1 to melt and then solidify. After the powder material M1 has melted and solidified, the stage 6 is lowered vertically by one layer by a driving device (not shown). Then, the powder material storage 5 supplies new powder material M1, and the powder layering arm 7 spreads the powder material M1 to a predetermined height.

[0022] [Beam deflection section] Next, the configuration of the beam deflection unit 10 will be described with reference to FIG. FIG. 2 is a block diagram showing the functional configuration of the beam deflection unit 10. As shown in FIG.

[0023] 2, the beam deflection unit 10 has a deflection amplifier 3 and a coordinate conversion correction circuit 8. The deflection amplifier 3 is disposed between the electron gun 2 and the stage 6. The deflection amplifier 3 deflects the electron beam L1 emitted from the electron gun 2 to a predetermined position on the stage 6.

[0024] The coordinate conversion correction circuit 8 controls the operation of the deflection amplifier 3. The coordinate conversion correction circuit 8 is connected to a control device 30. The control device 30 can be, for example, a PC (personal computer). The control device 30 transmits a position command signal and an irradiation time command signal to the coordinate conversion correction circuit 8. The position command signal is a signal indicating a coordinate position that indicates the irradiation position of the electron beam L1. The irradiation time command signal is a signal that indicates the irradiation time of the electron beam L1.

[0025] The coordinate conversion correction circuit 8 generates an amplifier control signal corresponding to the commanded coordinate position and irradiation time based on the received position command signal and irradiation time command signal. The coordinate conversion correction circuit 8 operates the deflection amplifier 3 based on the generated amplifier control signal. As a result, the deflection amplifier 3 deflects the electron beam L1 emitted from the electron gun 2 to the commanded coordinate position of the stage 6.

[0026] [First beam pattern] Next, a first irradiation pattern showing a first example of the beam irradiation procedure performed by the control device 30 will be described with reference to FIG. FIG. 3 is a diagram illustrating a first irradiation pattern showing a procedure for irradiating a beam.

[0027] The points irradiated with the electron beam L1 shown in Fig. 3 are aligned in a first direction X parallel to the horizontal direction and a second direction Y parallel to the horizontal direction and substantially perpendicular to the first direction X. In Fig. 3, the first direction X is the left-right direction, and the second direction Y is the up-down direction. Note that the points irradiated with the electron beam L1 are not limited to being aligned along two directions that intersect substantially perpendicularly, and may be aligned along two directions that intersect at any angle, for example.

[0028] Hereinafter, a point before being irradiated with the electron beam L1 is referred to as an "unirradiated point." In the first irradiation pattern, the electron beam L1 is irradiated sequentially from left to right onto unirradiated points lined up along the first direction X. As shown in FIG. 3, unirradiated points are lined up along the first direction X above and below the row of unirradiated points irradiated with the electron beam L1.

[0029] The control device 30 controls the beam deflection unit 10 to irradiate the electron beam L1 to positions according to the first irradiation pattern. The first irradiation pattern irradiates the electron beam L1 to unirradiated points arranged along the first direction X in order from the left.

[0030] In the first irradiation pattern, the beam deflection unit 10 first irradiates an arbitrary unirradiated point 1 with the electron beam L1 (Step 1). Hereinafter, the point irradiated with the electron beam L1 will be referred to as the "irradiated point." Also, the unirradiated point to be next irradiated with the electron beam L1 will be referred to as the "next irradiation point." The irradiation point 1 melts and becomes liquefied by being irradiated with the electron beam L1.

[0031] Next, the beam deflection unit 10 irradiates the electron beam L1 to an unirradiated point n (not shown) that is at least not adjacent to the irradiation point 1 (step 2). The irradiation point n melts and becomes liquefied when irradiated with the electron beam L1. On the other hand, the irradiation point 1 solidifies and becomes solidified. Hereinafter, the solidified point will be referred to as the "solidified point."

[0032] The reason why the beam deflection unit 10 irradiates the electron beam L1 onto the point n is to allow time for the irradiation point 1 to become the solidified point 1. Therefore, the beam deflection unit 10 may irradiate the electron beam L1 onto a plurality of points that are at least not adjacent to the irradiation point 1, before the irradiation point 1 becomes the solidified point 1. In this case, the plurality of points are set at positions that are not adjacent to each other and are separated from each other.

[0033] In the first irradiation pattern, the unirradiated point located to the right of the solidified point 1 is designated as the next irradiation point 2. Next, before irradiating the next irradiation point 2 with the electron beam L1, the beam deflection unit 10 irradiates the solidified point 1 adjacent to the next irradiation point 2 with the electron beam L1 (step 3). This causes the solidified point 1 to become active. Hereinafter, a point in an active state will be referred to as an "active point." The process of irradiating the electron beam to the solidified point to activate it corresponds to the activation process according to the present invention.

[0034] The activated state is a state in which a solidified material is heated by the electron beam L1. The activated material may be in a molten liquefied state, or may remain in a solidified state. By making the solidified point 1 adjacent to the irradiation point 2 the activated point 1, the irradiation point 2 irradiated with the electron beam L1 is more likely to be heated.

[0035] Next, the beam deflection unit 10 irradiates the next irradiation point 2 with the electron beam L1 (step 4). The irradiation point 2 melts and becomes liquefied due to the irradiation of the electron beam L1. At this time, the active point 1, which is in an active state, does not hinder the melting of the irradiation point 2. This allows the irradiation point 2 to melt appropriately. Furthermore, the active point 1 is more strongly bonded to the irradiation point 2 than to the solidified point 1. As a result, the quality of the three-dimensional structure to be formed can be improved.

[0036] Next, the beam deflection unit 10 irradiates the electron beam L1 to an unirradiated point m (not shown) that is at least located away from the irradiation point 2 and is not adjacent to the irradiation point 2 (step 5). The irradiation point m melts and becomes liquefied when irradiated with the electron beam L1. Meanwhile, the active point 1 and the irradiation point 2 solidify and become solidified points 1 and 2.

[0037] Next, the beam deflection unit 10 irradiates the electron beam L1 to the next irradiation point 3 located to the right of the solidified point 2, before irradiating the electron beam L1 to the next irradiation point 3 (step 6). As a result, the solidified point 2 becomes active.

[0038] Thereafter, the beam deflection unit 10 irradiates the electron beam L1 onto the next irradiation point 3. In this way, from step 5 onwards, the next irradiation point is shifted one step to the right, and irradiation of the electron beam L1 is repeated in the same manner as steps 2 to 4.

[0039] [Second beam pattern] Next, a second irradiation pattern showing a second example of the beam irradiation procedure performed by the control device 30 will be described with reference to FIG. FIG. 4 is a diagram illustrating a second irradiation pattern showing a second example of the beam irradiation procedure.

[0040] The points to be irradiated with the electron beam L1 shown in FIG. 4 are aligned in the first direction X and the second direction Y. The control device 30 controls the beam deflection unit 10 to irradiate the electron beam L1 at positions according to the second irradiation pattern. In the second irradiation pattern, the electron beam L1 is irradiated sequentially from left to right onto non-irradiated points aligned along the first direction X. As shown in FIG. 4, below the row of non-irradiated points to be irradiated with the electron beam L1, other non-irradiated points are aligned along the first direction X. Above the row of non-irradiated points to be irradiated with the electron beam L1, solidification points are aligned along the first direction X.

[0041] In the second irradiation pattern, the beam deflection unit 10 first irradiates an arbitrary non-irradiated point 1 with the electron beam L1 (Step 1). The points adjacent to the non-irradiated point 1 in the upper row are solidified points. When the irradiation point 1 is irradiated with the electron beam L1, it melts and becomes liquefied.

[0042] Next, the beam deflection unit 10 irradiates the electron beam L1 to an unirradiated point n (not shown) that is at least not adjacent to the irradiation point 1 (step 2). The irradiation point n melts and becomes liquefied by being irradiated with the electron beam L1. On the other hand, the irradiation point 1 solidifies and becomes a solidified point 1.

[0043] In the second irradiation pattern, the unirradiated point located to the right of the solidified point 1 is designated as the next irradiation point 3. Next, before irradiating the next irradiation point 3 with the electron beam L1, the beam deflection unit 10 irradiates the electron beam L1 to the solidified point 2 adjacent to the next irradiation point 3 and located above the next irradiation point 3. Furthermore, the beam deflection unit 10 irradiates the electron beam L1 to the solidified point 1 adjacent to the next irradiation point 3 and located to the left of the next irradiation point 3 (step 3). As a result, the solidified point 1 and the solidified point 2 become the active point 1 and the active point 2.

[0044] Solidified point 2 solidified earlier than solidified point 1. In the second irradiation pattern, the electron beam L1 is irradiated to the solidified points in order of their solidification, starting with the oldest. This reduces the time required to turn multiple solidified points into active points, allowing for efficient formation of active points.

[0045] Next, the beam deflection unit 10 irradiates the next irradiation point 3 with the electron beam L1 (step 4). The irradiation point 3 melts and becomes liquefied due to the irradiation of the electron beam L1. At this time, the active points 1 and 2, which are in an active state, do not hinder the melting of the irradiation point 3. This allows the irradiation point 3 to melt appropriately. Furthermore, the active points 1 and 2 are more strongly bonded to the irradiation point 3 than the solidified points 1 and 2. As a result, the quality of the three-dimensional structure to be formed can be improved.

[0046] Next, the beam deflection unit 10 irradiates the electron beam L1 to an unirradiated point m (not shown) that is at least located away from the irradiation point 3 and is not adjacent to the irradiation point 3 (step 5). The irradiation point m melts and becomes liquefied when irradiated with the electron beam L1. Meanwhile, the active point 1, the active point 2, and the irradiation point 3 solidify and become the solidified point 1, the solidified point 2, and the solidified point 3.

[0047] In the second irradiation pattern, the unirradiated point located to the right of the solidified point 3 is set as the next irradiation point 5. Next, before irradiating the next irradiation point 5 with the electron beam L1, the beam deflection unit 10 irradiates the electron beam L1 to the solidified point 4 adjacent to the next irradiation point 5 and located above the next irradiation point 5. The beam deflection unit 10 also irradiates the electron beam L1 to the solidified point 3 adjacent to the next irradiation point 5 and located to the left of the next irradiation point 5 (step 6). As a result, the solidified points 3 and 4 become the active points 3 and 4.

[0048] Thereafter, the beam deflection unit 10 irradiates the electron beam L1 onto the next irradiation point 5. In this way, from step 5 onwards, the next irradiation point is shifted one step to the right, and irradiation of the electron beam L1 is repeated in the same manner as steps 2 to 4.

[0049] In step 1 of the second irradiation pattern, the beam deflection unit 10 may irradiate the electron beam L1 to a solidified point located above the non-irradiated point 1 before irradiating the non-irradiated point 1 with the electron beam L1. In this case, the solidified point located above the non-irradiated point 1 becomes an active point and does not hinder the melting of the irradiation point 1. As a result, the irradiation point 1 can be melted appropriately.

[0050] [Third beam pattern] Next, a third irradiation pattern showing a third example of the beam irradiation procedure performed by the control device 30 will be described with reference to FIG. FIG. 5 is a diagram illustrating a third irradiation pattern showing a third example of the beam irradiation procedure.

[0051] The points to be irradiated with the electron beam L1 shown in FIG. 5 are aligned in the first direction X and the second direction Y. The control device 30 controls the beam deflection unit 10 to irradiate the electron beam L1 at positions according to the third irradiation pattern. In the third irradiation pattern, the electron beam L1 is irradiated sequentially from left to right onto non-irradiated points aligned along the first direction X. As shown in FIG. 5, solidification points are aligned along the first direction X above and below the row of non-irradiated points to be irradiated with the electron beam L1.

[0052] In the third irradiation pattern, the beam deflection unit 10 first irradiates an arbitrary non-irradiated point 1 with the electron beam L1 (Step 1). The points adjacent to the non-irradiated point 1 in the upper and lower rows are solidified points. The irradiation point 1 is irradiated with the electron beam L1, and is thereby melted and liquefied.

[0053] Next, the beam deflection unit 10 irradiates the electron beam L1 to an unirradiated point n (not shown) that is at least not adjacent to the irradiation point 1 (step 2). The irradiation point n melts and becomes liquefied by being irradiated with the electron beam L1. On the other hand, the irradiation point 1 solidifies and becomes a solidified point 1.

[0054] In the third irradiation pattern, the unirradiated point located to the right of the solidified point 1 is designated as the next irradiation point 4. Next, before irradiating the next irradiation point 4 with the electron beam L1, the beam deflection unit 10 irradiates the electron beam L1 to the solidified point 2 adjacent to the next irradiation point 4 and located above the next irradiation point 4. The beam deflection unit 10 also irradiates the electron beam L1 to the solidified point 3 adjacent to the next irradiation point 4 and located below the next irradiation point 4. Furthermore, the beam deflection unit 10 irradiates the electron beam L1 to the solidified point 1 adjacent to the next irradiation point 4 and located to the left of the next irradiation point 4 (Step 3). As a result, the solidified points 1 to 3 become active points 1 to 3.

[0055] Solidification point 2 solidified earlier than solidification point 1 and solidification point 3. Furthermore, solidification point 3 solidified earlier than solidification point 1. In the third irradiation pattern, the electron beam L1 is irradiated to the solidification points in order of oldest to newest. This reduces the time required to turn multiple solidification points into active points, allowing for efficient formation of active points.

[0056] Next, the beam deflection unit 10 irradiates the next irradiation point 4 with the electron beam L1 (step 4). The irradiation point 4 melts and becomes liquefied due to the irradiation of the electron beam L1. At this time, the active points 1 to 3, which are in an active state, do not hinder the melting of the irradiation point 4. This allows the irradiation point 4 to melt appropriately. Furthermore, the active points 1 to 3 are more strongly bonded to the irradiation point 4 than the solidified points 1 to 3. As a result, the quality of the three-dimensional structure to be formed can be improved.

[0057] Next, the beam deflection unit 10 irradiates the electron beam L1 to an unirradiated point m (not shown) that is at least located away from the irradiation point 4 and is not adjacent to it (step 5). The irradiation point m is melted and liquefied by the irradiation of the electron beam L1. Meanwhile, the active points 1 to 3 and the irradiation point 4 are solidified and become solidified points 1 to 4.

[0058] In the third irradiation pattern, the unirradiated point located to the right of the solidified point 4 is designated as the next irradiation point 7. Next, before irradiating the next irradiation point 7 with the electron beam L1, the beam deflection unit 10 irradiates the electron beam L1 to the solidified point 5 adjacent to the next irradiation point 7 and located above the next irradiation point 7. The beam deflection unit 10 also irradiates the electron beam L1 to the solidified point 6 adjacent to the next irradiation point 7 and located below the next irradiation point 7. Furthermore, the beam deflection unit 10 irradiates the electron beam L1 to the solidified point 4 adjacent to the next irradiation point 7 and located to the left of the next irradiation point 7 (step 6). As a result, the solidified points 4 to 6 become active points 4 to 6.

[0059] Thereafter, the beam deflection unit 10 irradiates the electron beam L1 onto the next irradiation point 7. In this way, from step 5 onwards, the next irradiation point is shifted one step to the right, and irradiation of the electron beam L1 is repeated in the same manner as steps 2 to 4.

[0060] In step 1 of the third irradiation pattern, the beam deflection unit 10 may irradiate the electron beam L1 to the solidified points located above and below the non-irradiated point 1 before irradiating the non-irradiated point 1 with the electron beam L1. In this case, the two solidified points located above and below the non-irradiated point 1 become active points 2 and do not hinder the melting of the irradiated point 1. As a result, the irradiated point 1 can be melted appropriately.

[0061] [4th beam pattern] Next, a fourth irradiation pattern showing a fourth example of the beam irradiation procedure performed by the control device 30 will be described with reference to FIG. FIG. 6 is a diagram illustrating a fourth irradiation pattern showing a fourth example of the beam irradiation procedure.

[0062] The points to be irradiated with the electron beam L1 shown in FIG. 6 are aligned in the first direction X and the second direction Y. The control device 30 controls the beam deflection unit 10 to irradiate the electron beam L1 at positions according to the fourth irradiation pattern. In the fourth irradiation pattern, the electron beam L1 is irradiated sequentially from left to right onto non-irradiated points aligned along the first direction X. As shown in FIG. 6, below the row of non-irradiated points to be irradiated with the electron beam L1, other non-irradiated points are aligned along the first direction X. Above the row of non-irradiated points to be irradiated with the electron beam L1, solidification points are aligned along the first direction X.

[0063] In the fourth irradiation pattern, the beam deflection unit 10 first irradiates an arbitrary non-irradiated point 1 with the electron beam L1 (step 1). The points adjacent to the non-irradiated point 1 in the upper row are solidified points. When the irradiation point 1 is irradiated with the electron beam L1, it melts and becomes liquefied.

[0064] Next, the beam deflection unit 10 irradiates the electron beam L1 to an unirradiated point n (not shown) that is at least not adjacent to the irradiation point 1 (step 2). The irradiation point n melts and becomes liquefied by being irradiated with the electron beam L1. On the other hand, the irradiation point 1 solidifies and becomes a solidified point 1.

[0065] In the fourth irradiation pattern, the unirradiated point located to the right of the solidified point 1 is set as the next irradiation point 3. Next, before irradiating the next irradiation point 3 with the electron beam L1, the beam deflection unit 10 irradiates the solidified point 2 adjacent to and located above the next irradiation point 3 with the electron beam L1 (step 3). As a result, the solidified point 2 becomes the activated point 2.

[0066] Next, the beam deflection unit 10 irradiates the next irradiation point 3 with the electron beam L1 (step 4). The irradiation point 3 melts and becomes liquefied due to the irradiation of the electron beam L1. At this time, the active point 2, which is in an active state, does not hinder the melting of the irradiation point 3. This allows the irradiation point 3 to melt appropriately. Furthermore, the active point 2 is more strongly bonded to the irradiation point 3 than the solidified point 2. As a result, the quality of the three-dimensional structure to be formed can be improved.

[0067] Next, the beam deflection unit 10 irradiates the electron beam L1 to an unirradiated point m (not shown) that is at least located away from the irradiation point 3 and is not adjacent to the irradiation point 3 (step 5). The irradiation point m melts and becomes liquefied when irradiated with the electron beam L1. Meanwhile, the active point 2 and the irradiation point 3 solidify and become solidified points 2 and 3.

[0068] In the fourth irradiation pattern, the unirradiated point located to the right of the solidified point 3 is set as the next irradiation point 5. Next, before irradiating the next irradiation point 5 with the electron beam L1, the beam deflection unit 10 irradiates the electron beam L1 to the solidified point 4 adjacent to and located above the next irradiation point 5 (step 6). As a result, the solidified point 4 becomes the activated point 4.

[0069] Thereafter, the beam deflection unit 10 irradiates the electron beam L1 onto the next irradiation point 5. In this way, from step 5 onwards, the next irradiation point is shifted one step to the right, and irradiation of the electron beam L1 is repeated in the same manner as steps 2 to 4.

[0070] In step 1 of the fourth irradiation pattern, the beam deflection unit 10 may irradiate the electron beam L1 to a solidified point located above the non-irradiated point 1 before irradiating the non-irradiated point 1 with the electron beam L1. In this case, the solidified point located above the non-irradiated point 1 becomes an active point and does not hinder the melting of the irradiation point 1. As a result, the irradiation point 1 can be melted appropriately.

[0071] [5th ​​beam pattern] Next, a fifth irradiation pattern showing a fifth example of the beam irradiation procedure performed by the control device 30 will be described with reference to FIG. FIG. 7 is a diagram illustrating a fifth irradiation pattern showing a fifth example of a beam irradiation procedure.

[0072] The points to be irradiated with the electron beam L1 shown in FIG. 7 are aligned in the first direction X and the second direction Y. The control device 30 controls the beam deflection unit 10 to irradiate the electron beam L1 at positions according to the fifth irradiation pattern. In the fifth irradiation pattern, the electron beam L1 is irradiated sequentially from left to right onto non-irradiated points aligned along the first direction X. As shown in FIG. 7, solidification points are aligned along the first direction X above and below the row of non-irradiated points to be irradiated with the electron beam L1.

[0073] In the fifth irradiation pattern, the beam deflection unit 10 first irradiates an arbitrary non-irradiated point 1 with the electron beam L1 (step 1). The points adjacent to the non-irradiated point 1 in the upper and lower rows are solidified points. The irradiation point 1 is irradiated with the electron beam L1, and is thereby melted and liquefied.

[0074] Next, the beam deflection unit 10 irradiates the electron beam L1 to an unirradiated point n (not shown) that is at least not adjacent to the irradiation point 1 (step 2). The irradiation point n melts and becomes liquefied by being irradiated with the electron beam L1. On the other hand, the irradiation point 1 solidifies and becomes a solidified point 1.

[0075] In the fifth irradiation pattern, the unirradiated point located to the right of solidified point 1 is set as the next irradiation point 4. Next, before irradiating the next irradiation point 4 with the electron beam L1, the beam deflection unit 10 irradiates the electron beam L1 to the solidified point 2 adjacent to the next irradiation point 4 and located above the next irradiation point 4. Furthermore, the beam deflection unit 10 irradiates the electron beam L1 to the solidified point 3 adjacent to the next irradiation point 4 and located below the next irradiation point 4 (step 3). As a result, the solidified point 2 and the solidified point 3 become the active point 2 and the active point 3.

[0076] Solidified point 2 solidified earlier than solidified point 3. In the fifth irradiation pattern, the electron beam L1 is irradiated to the solidified points in order of their solidification time. This reduces the time required to turn multiple solidified points into active points, allowing for efficient formation of active points.

[0077] Next, the beam deflection unit 10 irradiates the next irradiation point 4 with the electron beam L1 (step 4). The irradiation point 4 melts and becomes liquefied due to the irradiation of the electron beam L1. At this time, the active points 2 and 3, which are in an active state, do not hinder the melting of the irradiation point 4. Furthermore, the active points 2 and 3 are more strongly bonded to the irradiation point 4 than the solidified points 2 and 3. This allows the irradiation point 4 to be melted appropriately. As a result, the quality of the three-dimensional structure to be formed can be improved.

[0078] Next, the beam deflection unit 10 irradiates the electron beam L1 to an unirradiated point m (not shown) that is at least located away from the irradiation point 4 and is not adjacent to it (step 5). The irradiation point m is melted and liquefied by the irradiation of the electron beam L1. Meanwhile, the active points 2-3 and the irradiation point 4 are solidified and become solidified points 2-4.

[0079] In the fifth irradiation pattern, the unirradiated point located to the right of the solidified point 4 is set as the next irradiation point 7. Next, before irradiating the next irradiation point 7 with the electron beam L1, the beam deflection unit 10 irradiates the electron beam L1 to the solidified point 5 adjacent to the next irradiation point 7 and located above the next irradiation point 7. Furthermore, the beam deflection unit 10 irradiates the electron beam L1 to the solidified point 6 adjacent to the next irradiation point 7 and located below the next irradiation point 7 (step 6). As a result, the solidified points 5-6 become active points 5-6.

[0080] Thereafter, the beam deflection unit 10 irradiates the electron beam L1 onto the next irradiation point 7. In this way, from step 5 onwards, the next irradiation point is shifted one step to the right, and irradiation of the electron beam L1 is repeated in the same manner as steps 2 to 4.

[0081] In step 1 of the fifth irradiation pattern, the beam deflection unit 10 may irradiate the electron beam L1 to the solidified points located above and below the non-irradiated point 1 before irradiating the non-irradiated point 1 with the electron beam L1. In this case, the two solidified points located above and below the non-irradiated point 1 become active points 2 and do not hinder the melting of the irradiation point 1. As a result, the irradiation point 1 can be melted appropriately.

[0082] [6th beam pattern] Next, a sixth irradiation pattern showing a sixth example of the beam irradiation procedure performed by the control device 30 will be described with reference to FIG. FIG. 8 is a diagram illustrating a sixth irradiation pattern showing a sixth example of the beam irradiation procedure.

[0083] The points to be irradiated with the electron beam L1 shown in Fig. 8 are aligned in the first direction X and the second direction Y. The control device 30 controls the beam deflection unit 10 to irradiate the electron beam L1 at positions according to the sixth irradiation pattern. In the sixth irradiation pattern, the electron beam L1 is irradiated sequentially from left to right onto a plurality of unirradiated points that form two rows adjacent to each other in the second direction Y. The plurality of unirradiated points in each row are aligned along the first direction X.

[0084] In the sixth irradiation pattern, the beam deflection unit 10 first irradiates an arbitrary unirradiated point 1 with the electron beam L1 (step 1). The irradiation point 1 is irradiated with the electron beam L1, and is thereby melted and liquefied.

[0085] Next, the beam deflection unit 10 irradiates the electron beam L1 to an unirradiated point n (not shown) that is at least not adjacent to the irradiation point 1 (step 2). The irradiation point n is melted and liquefied by the irradiation of the electron beam L1. Meanwhile, the irradiation point 1 becomes a solidified point 1.

[0086] Next, the beam deflection unit 10 irradiates the electron beam L1 onto the unirradiated point 2 adjacent to the solidified point 1. The unirradiated point 2 is located to the right of the unirradiated point above the solidified point 1. In other words, the unirradiated point 2 is adjacent to the solidified point 1 in a diagonal direction. The irradiation point 2 melts and becomes liquefied due to the irradiation of the electron beam L1. Next, the beam deflection unit 10 irradiates the electron beam L1 onto the solidified point 1 (step 3). As a result, the solidified point 1 becomes an activated point 1.

[0087] Next, the beam deflection unit 10 irradiates the electron beam L1 to the liquefied irradiation point 2 and the unirradiated point 3 adjacent to the activated point 1 (step 4). That is, before irradiating the next irradiation point 3 with the electron beam L1, the beam deflection unit 10 irradiates the solidified point 1 adjacent to the next irradiation point 3 and located to the left of the next irradiation point 3 with the electron beam L1.

[0088] The irradiation point 3 melts and becomes liquefied when irradiated with the electron beam L1. At this time, the active point 1, which is in an active state, and the liquefied irradiation point 2 do not hinder the melting of the irradiation point 3. This allows the irradiation point 3 to melt appropriately. In addition, the active point 1 is more strongly bonded to the irradiation point 3 than the solidified point 1. As a result, the quality of the three-dimensional structure to be formed can be improved.

[0089] Next, the beam deflection unit 10 irradiates the electron beam L1 to an unirradiated point m (not shown) that is at least located away from the irradiation point 3 and is not adjacent to the irradiation point 3 (step 5). The irradiation point m is melted and liquefied by the irradiation of the electron beam L1. Meanwhile, the active point 1, the irradiation point 2, and the irradiation point 3 are solidified and become solidified points 1 to 3.

[0090] Next, the beam deflection unit 10 irradiates the electron beam L1 onto the unirradiated point 4 located to the right of the solidified point 2. The irradiation point 4 is melted and liquefied by the irradiation of the electron beam L1. Next, the beam deflection unit 10 irradiates the electron beam L1 onto the solidified point 3 (step 6). As a result, the solidified point 3 becomes an activated point 3.

[0091] Thereafter, the beam deflection unit 10 irradiates the electron beam L1 to the unirradiated point 5 located to the right of the active point 3. In this way, from step 5 onwards, the next irradiation point is shifted alternately between the upper and lower rows and also shifted one row at a time to the right, and irradiation of the electron beam L1 is repeated in the same manner as steps 2 to 4.

[0092] [7th beam pattern] Next, a seventh irradiation pattern showing a seventh example of the beam irradiation procedure performed by the control device 30 will be described with reference to FIG. FIG. 9 is a diagram illustrating a seventh irradiation pattern showing a seventh example of a beam irradiation procedure.

[0093] The points to be irradiated with the electron beam L1 shown in FIG. 9 are aligned in the first direction X and the second direction Y. The control device 30 controls the beam deflection unit 10 to irradiate the electron beam L1 at positions according to the seventh irradiation pattern. In the seventh irradiation pattern, the electron beam L1 is irradiated sequentially from left to right onto a plurality of unirradiated points that form three columns aligned in the second direction Y. The plurality of unirradiated points in each column are aligned along the first direction X.

[0094] In the seventh irradiation pattern, the beam deflection unit 10 first irradiates an arbitrary non-irradiated point 1 with the electron beam L1 (step 1). The non-irradiated point 1 is located in the middle row of three rows of non-irradiated points. When the irradiation point 1 is irradiated with the electron beam L1, it melts and becomes liquefied.

[0095] Next, the beam deflection unit 10 irradiates the electron beam L1 to an unirradiated point n (not shown) that is at least not adjacent to the irradiation point 1 (step 2). The irradiation point n is melted and liquefied by the irradiation of the electron beam L1. Meanwhile, the irradiation point 1 becomes a solidified point 1.

[0096] Next, the beam deflection unit 10 irradiates the electron beam L1 to the unirradiated point 2 adjacent to the solidified point 1. The unirradiated point 2 is located to the right of the unirradiated point above the solidified point 1. In other words, the unirradiated point 2 is adjacent to the solidified point 1 in the diagonal direction. When the irradiation point 2 is irradiated with the electron beam L1, it melts and becomes liquefied.

[0097] Next, the beam deflection unit 10 irradiates the electron beam L1 onto the unirradiated point 3 adjacent to the solidified point 1. The unirradiated point 2 is located to the right of the unirradiated point below the solidified point 1. In other words, the unirradiated point 3 is adjacent to the solidified point 1 in a diagonal direction. The irradiation point 3 melts and becomes liquefied due to the irradiation of the electron beam L1. The beam deflection unit 10 then irradiates the electron beam L1 onto the solidified point 1 (step 3). As a result, the solidified point 1 becomes an activated point 1.

[0098] Next, the beam deflection unit 10 irradiates the electron beam L1 to the liquefied irradiation points 2 and 3 and the unirradiated point 4 adjacent to the activated point 1 (step 4). That is, before irradiating the next irradiation point 4 with the electron beam L1, the beam deflection unit 10 irradiates the solidified point 1 adjacent to the next irradiation point 4 and located to the left of the next irradiation point 4 with the electron beam L1.

[0099] Irradiation point 4 melts and becomes liquefied due to irradiation with electron beam L1. At this time, active point 1, which is in an active state, and irradiation points 2 and 3, which are in a liquefied state, do not hinder the melting of irradiation point 4. This allows irradiation point 4 to melt appropriately. In addition, active point 1 is more strongly bonded to irradiation point 3 than to solidified point 1. As a result, the quality of the three-dimensional structure to be formed can be improved.

[0100] Next, the beam deflection unit 10 irradiates the electron beam L1 to an unirradiated point m (not shown) that is at least located away from the irradiation point 4 and is not adjacent to it (step 5). The irradiation point m is melted and liquefied by the irradiation of the electron beam L1. Meanwhile, the active point 1 and irradiation points 2 to 4 are solidified and become solidified points 1 to 4.

[0101] Next, the beam deflection unit 10 irradiates the electron beam L1 onto the unirradiated point 5 located to the right of the solidified point 2. Irradiation of the electron beam L1 causes the irradiated point 5 to melt and become liquefied. The beam deflection unit 10 also irradiates the electron beam L1 onto the unirradiated point 6 located to the right of the solidified point 3. Irradiation of the electron beam L1 causes the irradiated point 6 to melt and become liquefied. The beam deflection unit 10 then irradiates the electron beam L1 onto the solidified point 4 (step 6). As a result, the solidified point 4 becomes an activated point 4.

[0102] Thereafter, the beam deflection unit 10 irradiates the electron beam L1 to the unirradiated point 7 located to the right of the active point 4. In this way, from step 5 onwards, the next irradiation point is shifted alternately through the rows in the order of top, bottom and middle, and also shifted one row at a time to the right, and irradiation of the electron beam L1 is repeated in the same manner as steps 2 to 4.

[0103] [8th beam pattern] Next, an eighth irradiation pattern showing an eighth example of the beam irradiation procedure performed by the control device 30 will be described with reference to FIG. FIG. 10 is a diagram illustrating an eighth irradiation pattern showing an eighth example of the beam irradiation procedure.

[0104] The points to be irradiated with the electron beam L1 shown in FIG. 10 are aligned in the first direction X and the second direction Y. The control device 30 controls the beam deflection unit 10 to irradiate the electron beam L1 at positions according to the eighth irradiation pattern. In the eighth irradiation pattern, the electron beam L1 is irradiated sequentially from the top row among the multiple rows aligned in the second direction Y. The multiple rows aligned in the second direction Y are, from top to bottom, the first row, the second row, the third row, and the fourth row. The multiple unirradiated points in each row are aligned along the first direction X.

[0105] In the eighth irradiation pattern, the beam deflection unit 10 first irradiates the electron beam L1 onto the unirradiated point 1 located at the left end of the first horizontal row. Next, the beam deflection unit 10 irradiates the electron beam L1 onto the unirradiated point 2 located at a distance that is not adjacent to the irradiation point 1. Seven unirradiated points are lined up between the unirradiated point 2 and the unirradiated point 1. Next, the beam deflection unit 10 irradiates the electron beam L1 onto the unirradiated point 3 located at a distance that is not adjacent to the irradiation point 2. Seven unirradiated points are lined up between the unirradiated point 3 and the unirradiated point 2.

[0106] The beam deflection unit 10 irradiates the non-irradiated points with the electron beam L1 in the order of the numbers shown in Fig. 10. The irradiated points are gradually cooled and become solidified points. For example, when the non-irradiated point 30 is irradiated with the electron beam L1, the irradiated point 21 becomes solidified point 1. On the other hand, the irradiated points 22 to 29 are in the process of changing from a liquefied state to a solidified state.

[0107] For example, before irradiating the non-irradiated point 30 (next irradiation point 30) with the electron beam L1, the beam deflection unit 10 irradiates the solidified point 10 adjacent to the non-irradiated point 30 with the electron beam L1. As a result, the solidified point 10 becomes an active point 10. Thereafter, the beam deflection unit 10 irradiates the non-irradiated point 30 with the electron beam L1. At this time, the active point 10 and the irradiation point 27 in a liquefied state do not hinder the melting of the irradiation point 30. This allows the irradiation point 30 to be melted appropriately. Furthermore, the active point 10 is more strongly bonded to the irradiation point 30 than the solidified point 10. As a result, the quality of the three-dimensional structure to be formed can be improved.

[0108] For example, the beam deflection unit 10 irradiates the solidified points 19 and 22 with the electron beam L1 before irradiating the unirradiated point 39 (next irradiation point 39) with the electron beam L1. As a result, the solidified points 19 and 22 become active points 19 and 22. Thereafter, the beam deflection unit 10 irradiates the unirradiated point 39 with the electron beam L1. At this time, the active points 19 and 22 and the irradiation point 37 in a liquefied state do not hinder the melting of the irradiation point 39. This allows the irradiation point 39 to be melted appropriately. Furthermore, the active points 19 and 22 are more strongly bonded to the irradiation point 39 than the solidified points 19 and 22. As a result, the quality of the three-dimensional structure to be formed can be improved.

[0109] The above describes embodiments of the present invention. However, the present invention is not limited to the above-described embodiments, and various modifications are possible within the scope of the invention as defined in the claims. For example, the above-described embodiments are intended to provide a detailed and easy-to-understand description of the present invention, and the present invention is not necessarily limited to those including all of the described configurations. Furthermore, it is possible to replace part of the configuration of one embodiment with the configuration of another embodiment, or to add the configuration of another embodiment to the configuration of one embodiment. Furthermore, it is possible to add, delete, or replace part of the configuration of each embodiment with other configurations.

[0110] In the first to eighth irradiation patterns according to the above-described embodiment, before irradiating the next irradiation point with the electron beam L1, at least one solidified point adjacent to the next irradiation point is irradiated with the electron beam L1 to turn the solidified point into an activated point. However, as an electron beam irradiation pattern according to the present invention, the next irradiation point may be irradiated with the electron beam, and then at least one solidified point adjacent to the next irradiation point may be irradiated with the electron beam L1 before the next irradiation point is solidified. In this case, the solidified point irradiated with the electron beam L1 becomes activated, thereby strengthening the bond state of the material compared to when the solidified point is not irradiated with the electron beam L1. As a result, the quality of the three-dimensional structure to be formed can be improved.

[0111] Furthermore, the electron beam irradiation pattern according to the present invention may be such that the electron beam is first irradiated to a part of the solidified points adjacent to the next irradiation point (for example, a first solidified point), then the electron beam is irradiated to the next irradiation point, and then the electron beam is irradiated to another part of the solidified points adjacent to the next irradiation point (for example, a second solidified point). In this case, too, the next irradiation point can be melted appropriately, and the quality of the three-dimensional structure to be formed can be improved.

[0112] The first to eighth irradiation patterns according to the above-described embodiment have been described by taking as an example points adjacent to the next irradiation point those adjacent in the first direction X and the second direction Y. However, points adjacent to the next irradiation point according to the present invention may also include points adjacent in a direction inclined with respect to the first direction X and the second direction Y.

[0113] In the first to eighth irradiation patterns according to the above-described embodiment, the electron beam L1 is irradiated to the non-irradiated points in order along the first direction X. However, in the irradiation pattern according to the present invention, the electron beam L1 may be irradiated to the non-irradiated points in order along the second direction Y.

[0114] In the above-described embodiment, the electron gun 2 that emits the electron beam L1 is used as the beam emitter, but the present invention is not limited to this. For example, the beam emitter of the present invention may be an irradiation gun that emits a laser beam. In this case, the laser beam may be irradiated onto unirradiated points of the powder material M1 to melt and solidify it. [Explanation of symbols]

[0115] REFERENCE SIGNS LIST 1...3D additive manufacturing device, 2...electron gun (beam emission section), 3...deflection amplifier, 4...lens, 5...powder material storage, 6...stage, 7...powder deposition arm, 8...coordinate conversion correction circuit, 10...beam deflection section, 21...emitter, 22...extraction electrode, 23...acceleration electrode, 24...acceleration power supply, 30...control section, L1...electron beam, M1...powder material

Claims

1. a stage on which a powder layer made of powder material is spread; a beam emission unit that emits a beam toward the powder layer spread on the stage; a beam deflection unit that deflects the beam emitted from the beam emission unit; a control unit that controls the beam deflection unit, When a point in the powder layer to be next irradiated with the beam is defined as a next irradiation point and a point that has already been irradiated with the beam and solidified is defined as a solidification point, the control unit controls the beam deflection unit to irradiate the beam onto at least one of the solidification points adjacent to the next irradiation point and then irradiate the beam onto the next irradiation point, or to irradiate the beam onto at least one of the solidification points adjacent to the next irradiation point and then solidify the next irradiation point before the next irradiation point is solidified. 3D additive manufacturing equipment.

2. When there are two or more solidification points, the control unit controls the beam to be irradiated to the solidification points other than the newest solidification point. The three-dimensional additive manufacturing apparatus according to claim 1 .

3. The control unit controls the beam to be irradiated onto two of the solidification points sandwiching the next irradiation point. The three-dimensional additive manufacturing apparatus according to claim 1 .

4. When the beam is irradiated to two or more of the solidification points, the control unit controls the beam to be irradiated in the order of oldest solidification. The three-dimensional additive manufacturing apparatus according to claim 1 .

5. When a point adjacent to an irradiation point on the powder layer where the beam has been irradiated is set as the next irradiation point, the control unit controls the beam to be irradiated to at least a point that is not adjacent to the irradiation point during a waiting time until the irradiation point becomes the solidification point. The three-dimensional additive manufacturing apparatus according to claim 1 .

6. The control unit causes the beam to be irradiated onto a first solidification point adjacent to the next irradiation point, and then causes the beam to be irradiated onto the next irradiation point, and before the next irradiation point is solidified, causes the beam to be irradiated onto a second solidification point adjacent to the next irradiation point, which is different from the first solidification point. The three-dimensional additive manufacturing apparatus according to claim 1 .

7. When the point on the powder layer spread on the stage to be irradiated with the beam next is defined as the next irradiation point, and the point that has already been irradiated with the beam and solidified is defined as the solidification point, an activation step in which the control unit controls the beam deflection unit to irradiate the beam onto at least one of the solidification points adjacent to the next irradiation point; a main irradiation step in which the control unit controls the beam deflection unit to irradiate the beam onto the next irradiation point, The activation step is carried out at least either before or after the main irradiation step. Three-dimensional additive manufacturing method.

Citation Information

Patent Citations

  • Modified addition production

    JP2018130961A

  • Production device and production method

    JP2021031719A

  • Three-dimensional lamination molding device and three-dimensional lamination molding method

    JP2022144439A

  • Method and device for additive production of at least one component layer of a component, and storage medium

    US20200198010A1

  • Additive manufacturing method with controlled solidification and corresponding device

    US20200376556A1