Glass with high solarization resistance

Abstract

To provide a glass which can be produced in a platinum crucible or a platinum bath and has excellent imaging quality and high solarization resistance.SOLUTION: Glass comprising the following components in the stated proportions (in% by weight): SiO250 to 80; B2O32. 0 to 30; Al2O30 to 5.0; CaO0 to 10; BaO0 to 10; Li2O0 to 5.0; Na2O0 to 20; K2O0 to 25; Σ R2O5. 0 to 30;> 0 to 1.0. SO3.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to glasses that have high resistance to solarization at high beam power densities in the blue spectral region. The invention also relates to the use of said glasses in or as beam guiding elements, in particular in imaging systems, for example in projectors or in material processing, as well as to beam guiding elements and imaging systems comprising the glasses of the invention. [Background technology]

[0002] Currently, light sources for projectors are evolving from xenon to laser phosphors and pure RGB laser sources, with constantly increasing luminous flux and power density. Current projectors with light sources can provide, for example, luminous flux of up to 75,000 lumens and power density of 50 W / cm². 2 As the luminous flux and power density increase, solarization effects can occur that adversely affect sharpness or color stability.

[0003] The optical system of a projector usually consists of a large volume of prism assemblies and projection lenses. In particular, the prism assemblies are exposed to high power densities. Therefore, the demands on optical glass are constantly increasing.

[0004] Traditional xenon-based projectors have a maximum luminous flux of up to 45,000 lumens. However, modern laser-based projectors have a luminous flux of up to 75,000 lumens and a power of 50 W / cm. 2 Area power densities of up to 10 ...

[0005] Projector systems often consist of complex prism assemblies that route individual color channels to DLP chips and mix the signals for image generation. Optical path lengths can exceed 100–200 mm. Each optical absorption within the prism assembly results in temperature gradients and thermal lensing effects. An additional effect that becomes increasingly important as projector luminous flux increases is the solarization effect in the glass. Absorption-induced generation of absorbing species in the prism glass can result in a wavelength-dependent decrease in transmittance, which can also result in a shift in the color spectrum because the generated species may have absorption maxima in specific ranges rather than being uniformly absorbed across the entire visible spectrum.

[0006] It is known that fining can minimize the number of bubbles. In the prior art, borosilicate glasses for beam guide elements were often refined using Sn / Cl. However, this can lead to significant incorporation of Pt, especially ionic Pt, into the glass, especially when produced in platinum crucibles, platinum baths, or ceramic baths containing platinum components, which also reduces the solarization resistance of the glass. Summary of the Invention [Problem to be solved by the invention]

[0007] It is therefore an object of the present invention to provide a glass having excellent imaging quality and high solarization resistance that can be produced in a platinum crucible or platinum bath. [Means for solving the problem]

[0008] Brief description of the invention The above-mentioned problem is solved by the subject matter of the present invention.

[0009] In a first aspect, the present invention relates to a glass comprising the following components in the stated proportions (% by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 0~25 ΣR2O 5.0~30 SO3>0~1.0.

[0010] In a second aspect, the present invention relates to a glass comprising the following components in the stated proportions (% by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 0~25 ΣR2O 5.0~30 Here, the glass contains Pt in a proportion of up to 3.0 ppm (by mass).

[0011] In a third aspect, the present invention relates to a glass comprising the following components in the stated proportions (% by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 0~25 ΣR2O 5.0~30 Here, the density of bubbles with a diameter of at least 100 μm is 3 There are less than 5.0 bubbles per square inch.

[0012] In a fourth aspect, the present invention relates to a glass comprising the following components in the stated proportions (% by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 0~25 ΣR2O 5.0~30 Here, the glass has an internal transmittance greater than 0.99 at a wavelength of 400 nm and a sample thickness of 25 mm.

[0013] In a fifth aspect, the present invention relates to a glass comprising the following components in the stated proportions (% by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 0~25 ΣR2O 5.0~30 Here, the power density compared to Ext0 (436 nm) is 345 W / cm 2 The additional extinction Ext1(436 nm) at 436 nm for a 100 mm thick sample after irradiation with laser light at a wavelength of 455 nm for 72 hours is at most 0.01 / cm, where Ext0(436 nm) is the extinction at 436 nm for a 100 mm thick sample without corresponding irradiation.

[0014] In a sixth aspect, the present invention provides a method for producing a glass of the present invention, comprising the steps of: melting the glass raw materials; cooling the glass obtained, in particular to obtain the glass of the invention; The present invention relates to a method comprising:

[0015] In a seventh aspect, the present invention relates to a beamguiding element comprising or consisting of the glass of the present invention.

[0016] In an eighth aspect, the present invention provides a method for producing a composition comprising: a) Wavelength λ in the spectral range 380nm to 490nm B at least one laser source B having b) Beam-guiding element of the present invention wherein the laser source B has an output of 10 W / cm at least at one point of the beam guiding element. 2 The present invention relates to an imaging system suitable for producing an average areal power density of greater than 1000 W / m.

[0017] In a ninth aspect, the present invention relates to the use of the glass of the present invention in a projector or in material processing. [Brief explanation of the drawings]

[0018] [Figure 1] Figure 1 shows a photograph of the glass sample in diffuse transmitted light. DETAILED DESCRIPTION OF THE INVENTION

[0019] Detailed Description of the Invention This disclosure relates to all aspects of the invention unless otherwise stated. In particular, the embodiments disclosed herein relate to all aspects of the invention unless otherwise stated.

[0020] Glass Composition The descriptions in this disclosure of glass compositions refer to analytical compositions unless otherwise specified. In this application, descriptions of glass compositions are given in mass % unless otherwise specified.

[0021] In some embodiments, the glass contains 52.5 to 77.5 wt% SiO2, e.g., 55 to 75 wt%, or 57.5 to 72.5 wt% SiO2. The SiO2 content may be, for example, at least 52.5 wt%, at least 55 wt%, or at least 57.5 wt% SiO2. The SiO2 content may be, for example, up to 77.5 wt%, up to 75 wt%, or up to 72.5 wt% SiO2.

[0022] The glass of the invention may in particular be a borosilicate glass.

[0023] In some embodiments, the glass contains 5.0 to 25 wt. % B2O3, e.g., 7.5 to 20 wt. % or 9.0 to 19 wt. The B2O3 content can be, for example, at least 5.0 wt. %, at least 7.5 wt. %, or at least 9.0 wt. The B2O3 content can be, for example, up to 25 wt. %, up to 20 wt. %, or up to 19 wt. %.

[0024] In some embodiments, the glass contains 0-17.5% by weight NaO, e.g., 0-15% by weight, or 0-12.5% ​​by weight. In particular embodiments, the glass contains at least 2.0%, at least 5.0%, or even at least 8.0% by weight NaO. The NaO content can be, for example, up to 17.5%, up to 15%, or up to 12.5% ​​by weight.

[0025] In some embodiments, the glass contains 0 to 25% by weight of K2O, e.g., 1.0 to 25% by weight, 2.0 to 24% by weight, 4.0 to 23% by weight, or 6.0 to 22% by weight. The K2O content can be, for example, at least 1.0% by weight, at least 2.0% by weight, at least 4.0% by weight, or at least 6.0% by weight. The K2O content can be, for example, up to 24% by weight, up to 23% by weight, or up to 22% by weight.

[0026] In some embodiments, the total proportion of alkali metal oxides (RO) in the glass ranges from 5.0 to 30% by weight, e.g., from 10 to 25% by weight, or from 15 to 22% by weight. The proportion of RO may be, for example, at least 5.0% by weight, at least 10% by weight, or at least 15% by weight. The proportion of RO may be, for example, up to 30% by weight, up to 25% by weight, or up to 22% by weight. The glass preferably contains no further alkali metal oxides other than NaO and / or KO.

[0027] In some embodiments, the glass contains 0-5 wt. % CaO, e.g., 0-2 wt. % or 0-1 wt. % CaO. In particular embodiments, the glass contains at least 0.1 wt. % or at least 0.2 wt. % CaO. The CaO content can be, for example, up to 5.0 wt. %, up to 2.0 wt. %, or up to 1.0 wt. %.

[0028] In some embodiments, the glass contains 0-5 wt. % BaO, e.g., 0-3.5 wt. % or 0-2 wt. % BaO. In particular embodiments, the glass contains at least 0.1 wt. % BaO. The BaO content can be, for example, up to 5.0 wt. %, up to 3.5 wt. %, or up to 2.0 wt. % BaO.

[0029] In some embodiments, the glass contains 0-2 wt. % TiO2, e.g., 0-1 wt. % or 0-0.5 wt. % TiO2. In certain embodiments, the glass contains at least 0.1 wt. % TiO2. The TiO2 content can be, for example, up to 2.0 wt. %, up to 1.0 wt. %, up to 0.5 wt. %, up to 0.2 wt. %, up to 0.1 wt. %, or up to 0.05 wt. In some embodiments, the glass is TiO2-free.

[0030] In some embodiments, the glass contains SO3, especially in a proportion of >0-1.0 wt%, e.g., 0.01-0.75 wt%, 0.02-0.50 wt%, 0.05-0.40 wt%, 0.10-0.30 wt%, or 0.15-0.25 wt%. In some embodiments, the proportion of SO3 is greater than 0 wt%, e.g., at least 0.01 wt%, at least 0.02 wt%, at least 0.03 wt%, at least 0.04 wt%, at least 0.05 wt%, at least 0.06 wt%, at least 0.07 wt%, at least 0.08 wt%, at least 0.09 wt%, at least 0.10 wt%, at least 0.12 wt%, at least 0.15 wt%, at least 0.20 wt%, or at least 0.25 wt%. In some embodiments, the proportion of SO3 is at most 1.0 wt%, e.g., at most 0.75 wt%, at most 0.50 wt%, at most 0.40 wt%, at most 0.30 wt%, at most 0.20 wt%, at most 0.15 wt%, or at most 0.10 wt%.

[0031] SO3 has been found to be an advantageous fining agent, in particular capable of reducing platinum corrosion with comparable or even improved fining action compared to other fining agents, which is also accompanied by improved solarization resistance.

[0032] In this disclosure, unless otherwise stated, the percentage of SO3 refers to the total sulfur content, which can be determined in accordance with DIN 51085:2022-09 (Test methods for oxide raw and base materials - Determination of total sulfur content (version B)).

[0033] In some embodiments, the proportion of SnO2 is at most 0.10% by weight, e.g., at most 0.08%, at most 0.07%, at most 0.05%, at most 0.04%, at most 0.03%, at most 0.02%, or at most 0.01% by weight. In some embodiments, the glass is SnO2-free.

[0034] In some embodiments, the Cl content is at most 0.10% by weight, e.g., at most 0.08%, at most 0.07%, at most 0.05%, at most 0.04%, at most 0.03%, at most 0.02%, or at most 0.01% by weight. In some embodiments, the glass is Cl-free.

[0035] In some embodiments, the percentage of F is at most 0.10% by weight, e.g., at most 0.08%, at most 0.07%, at most 0.05%, at most 0.04%, at most 0.03%, at most 0.02%, or at most 0.01% by weight. In some embodiments, the glass is F-free.

[0036] In some embodiments, the percentage of CeO2 is at most 0.10% by weight, e.g., at most 0.08%, at most 0.07%, at most 0.05%, at most 0.04%, at most 0.03%, at most 0.02%, or at most 0.01% by weight. In some embodiments, the glass is CeO2-free.

[0037] In some embodiments, the proportion of Sb2O3 is at most 0.10% by weight, e.g., at most 0.08%, at most 0.07%, at most 0.05%, at most 0.04%, at most 0.03%, at most 0.02%, or at most 0.01% by weight. In some embodiments, the glass is Sb2O3-free.

[0038] In some embodiments, the percentage of As2O3 is at most 0.10% by weight, e.g., at most 0.08%, at most 0.07%, at most 0.05%, at most 0.04%, at most 0.03%, at most 0.02%, or at most 0.01% by weight. In some embodiments, the glass is As2O3-free.

[0039] In some embodiments, the total proportion of SnO2 and Sb2O3 is at most 0.25% by weight, e.g., at most 0.15%, at most 0.10%, at most 0.08%, at most 0.07%, at most 0.05%, at most 0.04%, at most 0.03%, at most 0.02%, or at most 0.01% by weight. In some embodiments, the glass is free of SnO2 and Sb2O3.

[0040] In some embodiments, the total proportion of SnO2, Cl, F, CeO2, Sb2O3, and As2O3 is at most 0.25% by weight, e.g., at most 0.15%, at most 0.10%, at most 0.08%, at most 0.07%, at most 0.05%, at most 0.04%, at most 0.03%, at most 0.02%, or at most 0.01% by weight. In some embodiments, the glass is SnO2-free.

[0041] In some embodiments, the glass contains less than 0.3 wt. % of the component AlO, e.g., at most 0.2 wt. %, at most 0.1 wt. %, or at most 0.05 wt. %. 3、 It is particularly preferred to contain at least one or each of Li2O, MgO, ZnO, SrO, ZrO2, La2O3, P2O5 and As2O3, or even to be free of at least one or all of these components.

[0042] In this disclosure, when a glass is described as being "free" of a certain component or as not containing a particular component, it means that this component may only be present in the glass as an impurity. This means that it is not added in an essential amount. Amounts of less than 100 ppm (by weight), less than 75 ppm (by weight), less than 50 ppm (by weight), less than 25 ppm (by weight), and especially less than 10 ppm (by weight) are considered to be insubstantial amounts.

[0043] In a preferred embodiment, the glass comprises the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 0~25 ΣR2O 5.0~30.

[0044] In a preferred embodiment, the glass comprises the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 1.0~25 ΣR2O 5.0~30.

[0045] In a preferred embodiment, the glass comprises the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 0~25 ΣR2O 5.0~30 SO3>0~1.0.

[0046] In a preferred embodiment, the glass comprises the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 1.0~25 ΣR2O 5.0~30 SO3>0~1.0.

[0047] Particularly preferred glasses of the present invention comprise the following components in the stated proportions (% by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 Li2O 0~5.0 Na2O 0~20 K2O 0~25 MgO 0~5.0 CaO 0-10 BaO 0-10 ZnO 0~5.0 SrO 0~5.0 TiO20~5.0 ZrO20~5.0 La2O30~5.0 P2O50~5.0 ΣR2O 5.0~30 SO3>0~1.0.

[0048] Particularly preferred glasses of the present invention comprise the following components in the stated proportions (% by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 Li2O 0~5.0 Na2O 0~20 K2O 1.0~25 MgO 0~5.0 CaO 0-10 BaO 0-10 ZnO 0~5.0 SrO 0~5.0 TiO20~5.0 ZrO20~5.0 La2O30~5.0 P2O50~5.0 ΣR2O 5.0~30 SO3>0~1.0.

[0049] In some embodiments, the weight percentage of Pt ranges from 0.1 to 3.0 ppm, e.g., 0.5 to 2.5 ppm, or 0.75 to 1.75 ppm. In some embodiments, the weight percentage of Pt is at most 3.0 ppm, e.g., at most 2.5 ppm, or at most 1.75 ppm, or at most 1.0 ppm. In some embodiments, the weight percentage of Pt is at least 0.1 ppm, at least 0.5 ppm, or at least 0.75 ppm.

[0050] When Pt percentage or Pt content, or platinum percentage or platinum content is referred to in this disclosure, unless otherwise stated, it means the total platinum content, i.e., the total percentage of metallic Pt and ionic Pt.

[0051] LA-ICP-MS (Laser Ablation Inductively Coupled Plasma Mass Spectrometry) was used to determine the platinum content, but platinum content can also be determined wet chemically using methods common in the glass industry.

[0052] LA-ICP / MS is a direct solid-state method in which material is removed from the sample surface using a focused laser beam (UP213, ESL, λ = 213 nm) and transported as a solid aerosol using an inert gas (helium) to an ICP-MS (NexION 300X, Perkin Elmer). Here, evaporation, molecular dissociation, atomization, and ionization of the analytes occur at temperatures between 6000 and 8000 °C. The generated ions are subsequently separated and detected according to their mass-to-charge ratio in the high vacuum of a mass spectrometer.

[0053] For the investigation of the sample, four ablations were carried out, each with a crater diameter of 100 μm, over a depth of approximately 40 μm.

[0054] During LA-ICP-MS analysis, the amount of analyte platinum (Pt 195), the internal standard (silicon Si 28 The intensity ratio to the intensity of the IR component was measured.

[0055] Quantification of the intensity ratios of the measured samples was performed against calibrations using various matrix-matched solid standards (in-house prepared standards).

[0056] internal quality The glasses of the present invention are characterized by a high internal quality that leads to excellent imaging quality. In particular, the glasses of the present invention have a very low number of bubbles or no bubbles at all.

[0057] The number of bubbles is determined optically using a photograph of the sample in diffuse transmitted light. In such a photograph, the bubbles appear as dark, round or oval inclusions against a light background (Figure 1). The resolution of the photograph is typically about 4 μm. The lens used for photographing the sample is typically a 150 mm 2.8 EX DG OS HSM APO Macro with a maximum magnification of 1:1.0. This means that an object with a size of 1 mm corresponds to 1 mm on the sensor. The sensor is typically a Nikon D7100 sensor. The pixel size of the Nikon D7100 sensor is 15.21 μm. 2 , or about 4 μm x 4 μm. The resolution is therefore about 4 μm.

[0058] The evaluation is 40-50cm. 3 The evaluation is carried out using an evaluation volume of 100 μm. Bubbles with a diameter of at least 100 μm are counted. This means in particular the Ferret diameter along the maximum extent of the bubble in the observation plane. The evaluation can be carried out software-based, for example using ImageJ or equivalent software.

[0059] The bubble density is determined as the quotient of the number of bubbles and the estimated volume. In some embodiments, the density of bubbles having a diameter of at least 100 μm is determined by the number of bubbles per cm of glass. 3 0 to <5.0 bubbles per e.g. 1cm 3 0-4.0 bubbles per 1cm 30-3.0 bubbles per 1cm 3 0.1-2.0 bubbles per 1cm 3 0.2-1.5 bubbles per inch, or 1 cm 3 In some embodiments, the density of bubbles having a diameter of at least 100 μm is in the range of 0.5 to 1.0 bubbles per cm. 3 At least 0.1 bubbles per 1cm 3 At least 0.2 bubbles per 1cm 3 In some embodiments, the density of bubbles having a diameter of at least 100 μm is at least 0.5 bubbles per cm. 3 Maximum 5.0 bubbles per e.g. 1cm 3 Maximum 4.0 bubbles per 1cm 3 Maximum 3.0 bubbles per 1cm 3 Maximum 2.0 bubbles per 1cm 3 Maximum 1.5 bubbles per 1cm 3 Maximum 1.0 bubbles per 1cm 3 Maximum 0.5 bubbles per 1cm 3 Maximum 0.2 bubbles per 1cm 3 In some embodiments, the density of bubbles having a diameter of at least 100 μm is further increased to a maximum of 0.1 bubbles per cm of glass. 3 Thus, in such an embodiment, the glass is free of bubbles having a diameter of at least 100 μm.

[0060] Transmittance In some embodiments, the glass has an internal transmittance of greater than 0.990, e.g., at least 0.991, at least 0.992, at least 0.993, at least 0.994, or at least 0.995, at a wavelength of 400 nm and a sample thickness of 25 mm. In some embodiments, the glass has an internal transmittance of at most 0.999, e.g., at most 0.998, at most 0.997, or at most 0.996, at a wavelength of 400 nm and a sample thickness of 25 mm.

[0061] In some embodiments, the glass has an internal transmittance greater than 0.990, e.g., at least 0.991, at least 0.992, at least 0.993, at least 0.994, or at least 0.995, over the entire wavelength range of 380 nm to 780 nm and at a sample thickness of 25 mm. In some embodiments, the glass has an internal transmittance of at most 0.999, e.g., at most 0.998, at most 0.997, or at most 0.996, over the entire wavelength range of 380 nm to 780 nm and at a sample thickness of 25 mm.

[0062] Solarization resistance The glasses of the invention have in particular good resistance to solarization.

[0063] In some embodiments, a power density of 345 W / cm compared to Ext0 (436 nm) 2 The additional extinction Ext1(436 nm) at a wavelength of 436 nm of a sample having a thickness of 100 mm after irradiation with laser light having a wavelength of 455 nm for 72 hours at 1000 nm is at least 0.0001 / cm and / or at most 0.01 / cm, where Ext0(436 nm) is the extinction at a wavelength of 436 nm of a sample having a thickness of 100 mm without corresponding irradiation.

[0064] In some embodiments, a power density of 345 W / cm compared to Ext0 (546 nm) 2 The additional extinction Ext1(546 nm) at a wavelength of 546 nm of a sample having a thickness of 100 mm after irradiation with laser light having a wavelength of 455 nm for 72 hours at 1000 nm is at least 0.0001 / cm and / or at most 0.01 / cm, where Ext0(546 nm) is the extinction at a wavelength of 546 nm of a sample having a thickness of 100 mm without corresponding irradiation.

[0065] In some embodiments, a power density of 345 W / cm compared to Ext0 (644 nm) 2The additional extinction Ext1(644 nm) at a wavelength of 644 nm of a sample having a thickness of 100 mm after irradiation with laser light having a wavelength of 455 nm for 72 hours at 1000 nm is at least 0.0001 / cm and / or at most 0.01 / cm, where Ext0(644 nm) is the extinction at a wavelength of 644 nm of a sample having a thickness of 100 mm without corresponding irradiation.

[0066] Ext1(436 nm), Ext1(546 nm), and / or Ext1(644 nm) can range, for example, from 0.0001 / cm to 0.01 / cm, from 0.001 to 0.009 / cm, or from 0.003 / cm to 0.008 / cm. In some embodiments, Ext1(436 nm), Ext1(546 nm), and / or Ext1(644 nm) is at least 0.0001 / cm, at least 0.001 / cm, or at least 0.003 / cm. In some embodiments, Ext1(436 nm), Ext1(546 nm), and / or Ext1(644 nm) is at most 0.01 / cm, at most 0.009 / cm, or at most 0.008 / cm.

[0067] In some embodiments, the glass has a quality factor F(436 nm)=S(436 nm)×(Ext0(436 nm)+Ext1(436 nm)) / k, where F(436 nm)<15 ppm / W.

[0068] The quality factor F takes into account various factors that lead to the reduction of imaging errors, including wavelength-dependent and wavenumber-dependent factors. The quality factor F(436 nm) at a wavelength of 436 nm is representative of the behavior of glass in the spectral range from 380 nm to 490 nm. This range is also representative of the behavior of glass in the entire visible spectral range.

[0069] The behavior of glass at wavelengths outside the 380-490 nm range can sometimes contribute, albeit only to a small extent, to imaging errors. The quality factor F(436 nm) is generally sufficient to describe the quality of the glass. However, in certain cases, it may be reasonable to take into account, in addition to the behavior of the glass at 436 nm, its behavior at 546 nm, which represents the wavelength range >490 nm to 585 nm, and / or its behavior at 644 nm, which represents the wavelength range >585 nm to 750 nm. In some embodiments, the glass has a quality factor F(546 nm) = S(546 nm) x (Ext0(546 nm) + Ext1(546 nm)) / k, where F(546 nm) < 12 ppm / W, and / or a quality factor F(644 nm) = S(644 nm) x (Ext0(644 nm) + Ext1(644 nm)) / k, where F(644 nm) < 10 ppm / W.

[0070] The behavior of the glass at 436 nm, 546 nm, and 644 nm allows the determination of a quality factor, F(RGB). In some embodiments, the glass has a quality factor, F(RGB) = F(436 nm) + F(546 nm) + F(644 nm) = S(436 nm) x (Ext0(436 nm) + Ext1(436 nm)) / k + S(546 nm) x (Ext0(546 nm) + Ext1(546 nm)) / k + S(644 nm) x (Ext0(644 nm) + Ext1(644 nm)) / k, where F(RGB) < 40 ppm / W.

[0071] The quality factor F takes into account the temperature coefficient S(λ), the uninduced extinction Ext0(λ), the induced extinction Ext1(λ), ​​and the thermal conductivity k of the glass. The temperature coefficient, the uninduced extinction, and the induced extinction are wavelength-dependent magnitudes. Thermal conductivity is wavelength-independent. The uninduced extinction Ext0(λ) can serve as a measure of the extinction in the delivery state or before intended use. The induced extinction Ext1(λ) can serve as a measure of the extinction that may be induced by proper operation.

[0072] In some embodiments, F(436 nm)<15 ppm / W is true. In some embodiments, F(436 nm) is at most 14.5 ppm / W, at most 14 ppm / W, at most 13.5 ppm / W, at most 13 ppm / W, at most 12.5 ppm / W, at most 12 ppm / W, at most 11.5 ppm / W, at most 11 ppm / W, at most 10.5 ppm / W, at most 10 ppm / W, at most 9.5 ppm / W, at most 9 ppm / W, at most 8.5 ppm / W, at most 8 ppm / W, at most 7.5 ppm / W, at most 7 ppm / W, at most 6.5 ppm / W, at most 6 ppm / W, at most 5.5 ppm / W, at most 5 ppm / W, at most 4.5 ppm / W, at most 4 ppm / W, at most 3.5 ppm / W, or at most 3 ppm / W. In some embodiments, F(436 nm) is at least 0.1 ppm / W, at least 0.5 ppm / W, at least 1 ppm / W, or at least 2 ppm / W.

[0073] In some embodiments, F(546 nm)<12 ppm / W is true. In some embodiments, F(546 nm) is at most 11.5 ppm / W, at most 11 ppm / W, at most 10.5 ppm / W, at most 10 ppm / W, at most 9.5 ppm / W, at most 9 ppm / W, at most 8.5 ppm / W, at most 8 ppm / W, at most 7.5 ppm / W, at most 7 ppm / W, at most 6.5 ppm / W, at most 6 ppm / W, at most 5.5 ppm / W, at most 5 ppm / W, at most 4.5 ppm / W, at most 4 ppm / W, at most 3.5 ppm / W, at most 3 ppm / W, at most 2.5 ppm / W, or at most 2 ppm / W. In some embodiments, F(546 nm) is at least 0.001 ppm / W, at least 0.005 ppm / W, at least 0.01 ppm / W, at least 0.02 ppm / W, at least 0.1 ppm / W, at least 0.5 ppm / W, or at least 1 ppm / W.

[0074] In some embodiments, F(644 nm)<10 ppm / W is true. In some embodiments, F(644 nm) is at most 9.5 ppm / W, at most 9 ppm / W, at most 8.5 ppm / W, at most 8 ppm / W, at most 7.5 ppm / W, at most 7 ppm / W, at most 6.5 ppm / W, at most 6 ppm / W, at most 5.5 ppm / W, at most 5 ppm / W, at most 4.5 ppm / W, at most 4 ppm / W, at most 3.5 ppm / W, at most 3 ppm / W, at most 2.75 ppm / W, at most 2.5 ppm / W, at most 2.25 ppm / W, at most 2 ppm / W, at most 1.75 ppm / W, at most 1.5 ppm / W, at most 1.25 ppm / W, or at most 1 ppm / W. In some embodiments, F(546 nm) is at least 0.001 ppm / W, at least 0.005 ppm / W, at least 0.01 ppm / W, or at least 0.02 ppm / W, at least 0.1 ppm / W, at least 0.5 ppm / W, or at least 0.75 ppm / W.

[0075] In some embodiments, the glass has a quality factor F(RGB)=F(436 nm)+F(546 nm)+F(644 nm)=S(436 nm)×(Ext0(436 nm)+Ext1(436 nm)) / k+S(546 nm)×(Ext0(546 nm)+Ext1(546 nm)) / k+S(644 nm)×(Ext0(644 nm)+Ext1(644 nm)) / k, where F(RGB)<40 ppm / W. In some embodiments, F(RGB) is at most 38.5 ppm / W, at most 37 ppm / W, at most 35.5 ppm / W, at most 34 ppm / W, at most 32.5 ppm / W, at most 31 ppm / W, at most 29.5 ppm / W, at most 28 ppm / W, at most 26.5 ppm / W, at most 25 ppm / W, at most 23.5 ppm / W, at most 22 ppm / W, at most 20.5 ppm / W, at most 19 ppm / W, at most 17.5 ppm / W, at most 16 ppm / W, at most 14.5 ppm / W, at most 13 ppm / W, at most 11.5 ppm / W, at most 10 ppm / W, at most 9 ppm / W, at most 8 ppm / W, at most 7 ppm / W, or at most 6 ppm / W. In some embodiments, F(RGB) is at least 0.5 ppm / W, at least 1 ppm / W, at least 2 ppm / W, or at least 5 ppm / W.

[0076] The wavelength-dependent temperature coefficient S(λ) is a decisive factor for the quality factor F. The temperature coefficient describes the relative change in the optical path s = (n-1) × d with temperature T, where n is the refractive index and d is the sample thickness. S = 1 / s × ds / dT. Since d = d(T) and n = n(T), S = 1 / s × (dn / dT × d + (n-1)dd / dT). Therefore, S = 1 / (n-1) × dn / dT + 1 / d × dd / dT = 1 / (n-1) × dn / dT + CTE, where CTE is the mean linear thermal expansion coefficient.

[0077] The CTE is preferably determined as described in DIN 51045-1:2005-08 and DIN ISO 7991 1998-02. A glass sample of defined length is prepared, and the relative change in length (ΔL / L) per temperature interval (ΔT) is measured using a dilatometer. To calculate the temperature coefficient S(λ), the average thermal expansion coefficient in the temperature interval from -30°C to +70°C is preferably used. A low thermal expansion coefficient (CTE(-30 / 70)) is advantageous, especially in the temperature interval from -30°C to 70°C. In some embodiments, the CTE(-30 / 70) ranges from 3.0 to 14.0 ppm / K, particularly from 4.0 to 10.0 ppm / K, 4.5 to 9.5 ppm / K, 5.0 to 8.0 ppm / K, and / or 5.5 to 7.5 ppm / K, such as from 5.6 to 7.3 ppm / K, or from 5.7 to 7.2 ppm / K.

[0078] Determination of dn / dT can be done using a prism spectrometer (with the entire prism) inside a temperature chamber. Measurement in a configuration where the total deviation angle is minimal is preferred, since then the refractive index can be calculated using only the deviation angle and the known prism angle.

[0079] However, the determination of dn / dT is particularly preferably carried out using the half-prism method. For this, the sample is placed in a temperature-controlled sample chamber in the form of a half-prism. The prism is illuminated with light of various wavelengths, and the respective deviation angles are determined. The temperature in the chamber is then varied. This results in the refractive index as a function of wavelength and temperature. To calculate the temperature coefficient S(λ), the average dn / dT over the temperature range +20°C to +40°C is preferably used. In order to keep the degree of thermal lensing as low as possible, it is advantageous if the change in refractive index (dn / dT) with temperature is as small as possible, especially within the temperature range 20°C to 40°C. In some embodiments, the average dn / dT at wavelengths of 436 nm, 546 nm, and / or 644 nm in the temperature range of 20°C to 40°C is in the range of 0.1 to 8.0 ppm / K, particularly 0.2 to 7.0 ppm / K, 0.3 to 6.0 ppm / K, and / or 0.4 to 5.0 ppm / K, wherein the above description relates to the absolute value (amount) of the average dn / dT.

[0080] Since the induced absorption band is accompanied by a temperature rise inside the glass, if the refractive index and geometric path change with temperature, wavefront delay and undesired imaging errors will result. Therefore, it is preferable that the change in the optical path with temperature (temperature coefficient S) is small. In this way, imaging errors can be minimized even when induced absorption bands occur.

[0081] In some embodiments, S(436nm) is at most 50 ppm / K, at most 30 ppm / K, at most 25 ppm / K, at most 20 ppm / K, at most 15 ppm / K, or at most 10 ppm / K. In some embodiments, S(436nm) is at least 0.1 ppm / K, at least 0.5 ppm / K, at least 1 ppm / K, or at least 2 ppm / K.

[0082] In some embodiments, S(546nm) is at most 50 ppm / K, at most 30 ppm / K, at most 25 ppm / K, at most 20 ppm / K, at most 15 ppm / K, or at most 10 ppm / K. In some embodiments, S(546nm) is at least 0.1 ppm / K, at least 0.5 ppm / K, at least 1 ppm / K, or at least 2 ppm / K.

[0083] In some embodiments, S(644nm) is at most 50 ppm / K, at most 30 ppm / K, at most 25 ppm / K, at most 20 ppm / K, at most 15 ppm / K, or at most 10 ppm / K. In some embodiments, S(644nm) is at least 0.1 ppm / K, at least 0.5 ppm / K, at least 1 ppm / K, or at least 2 ppm / K.

[0084] In some embodiments, S(436 nm), S(546 nm), and S(644 nm) are at most 50 ppm / K, at most 30 ppm / K, at most 25 ppm / K, at most 20 ppm / K, at most 15 ppm / K, or at most 10 ppm / K. In some embodiments, S(436 nm), S(546 nm), and S(644 nm) are at least 0.1 ppm / K, at least 0.5 ppm / K, at least 1 ppm / K, or at least 2 ppm / K.

[0085] Glass Articles and Uses The present invention also relates to glass articles, in particular beam-guiding elements, which comprise or consist of the glass of the present invention.

[0086] The present invention provides a) Wavelength λ in the spectral range 380nm to 490nm B at least one laser source B having b) Beam-guiding elements comprising or consisting of the glass of the invention wherein the laser source B has an output of 10 W / cm at least at one point of the beam guiding element. 2The present invention also relates to an imaging system as described above, which is suitable for producing an average areal power density of greater than

[0087] The present invention provides a) Wavelength λ in the spectral range 380nm to 490nm B at least one laser source B having a wavelength λ in the spectral range from 490 nm to 585 nm; G and at least one laser light source G having a wavelength λ in the spectral range from 585 nm to 750 nm. R at least one laser source R having b) Beam-guiding elements wherein the laser source B, the laser source G, and the laser source R each have an intensity of 10 W / cm at least at one point of the beam guiding element. 2 and wherein the beam-guiding element consists of or comprises the glass according to the invention.

[0088] The invention also relates to the use of the imaging system, the beam guide element and / or the glass according to the invention, in particular in a projector or in material processing.

[0089] The invention also relates to a projector, in particular a DLP projector, comprising an imaging system, beam guiding element and / or glass according to the invention.

[0090] Manufacturing method The present invention also relates to a method for producing glass or glass articles according to the invention, said method comprising in particular the following steps: melting the glass raw materials; cooling the resulting glass or glass article to obtain the glass or glass article of the present invention. Includes.

[0091] In some embodiments, the method includes fining the glass melt.

[0092] Preferred Embodiments In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 0~25 ΣR2O 5.0~30 SO3>0~1.0.

[0093] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 1.0~25 ΣR2O 5.0~30 SO3>0~1.0.

[0094] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 0~25 ΣR2O 5.0~30 SO3>0~1.0 Here, the glass contains Pt in a proportion of up to 3.0 ppm (by mass).

[0095] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 1.0~25 ΣR2O 5.0~30 SO3>0~1.0 Here, the glass contains Pt in a proportion of up to 3.0 ppm (by mass).

[0096] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 0~25 ΣR2O 5.0~30 SO3>0~1.0 Here, the density of bubbles with a diameter of at least 100 μm is 3 There are less than 5.0 bubbles per square inch.

[0097] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 1.0~25 ΣR2O 5.0~30 SO3>0~1.0 Here, the density of bubbles with a diameter of at least 100 μm is 3 There are less than 5.0 bubbles per square inch.

[0098] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 0~25 ΣR2O 5.0~30 SO3>0~1.0 Here, the glass has an internal transmittance greater than 0.99 at a wavelength of 400 nm and a sample thickness of 25 mm.

[0099] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 1.0~25 ΣR2O 5.0~30 SO3>0~1.0 Here, the glass has an internal transmittance greater than 0.99 at a wavelength of 400 nm and a sample thickness of 25 mm.

[0100] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 0~25 ΣR2O 5.0~30 SO3>0~1.0 Here, the power density compared to Ext0 (436 nm) is 345 W / cm 2 The additional extinction Ext1(436 nm) at 436 nm for a 100 mm thick sample after irradiation with laser light at a wavelength of 455 nm for 72 hours is at most 0.01 / cm, where Ext0(436 nm) is the extinction at 436 nm for a 100 mm thick sample without corresponding irradiation.

[0101] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 1.0~25 ΣR2O 5.0~30 SO3>0~1.0 Here, the power density compared to Ext0 (436 nm) is 345 W / cm 2 The additional extinction Ext1(436 nm) at 436 nm for a 100 mm thick sample after irradiation with laser light at a wavelength of 455 nm for 72 hours is at most 0.01 / cm, where Ext0(436 nm) is the extinction at 436 nm for a 100 mm thick sample without corresponding irradiation.

[0102] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 0~25 ΣR2O 5.0~30 SO3>0~1.0 wherein the glass contains Pt in an amount of up to 3.0 ppm (by mass); and Here, the density of bubbles with a diameter of at least 100 μm is 3 There are less than 5.0 bubbles per square inch.

[0103] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 1.0~25 ΣR2O 5.0~30 SO3>0~1.0 wherein the glass contains Pt in an amount of up to 3.0 ppm (by mass); and Here, the density of bubbles with a diameter of at least 100 μm is 3 There are less than 5.0 bubbles per square inch.

[0104] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 0~25 ΣR2O 5.0~30 SO3>0~1.0 wherein the glass contains Pt in an amount of up to 3.0 ppm (by mass); and Here, the glass has an internal transmittance greater than 0.99 at a wavelength of 400 nm and a sample thickness of 25 mm.

[0105] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 1.0~25 ΣR2O 5.0~30 SO3>0~1.0 wherein the glass contains Pt in an amount of up to 3.0 ppm (by mass); and Here, the glass has an internal transmittance greater than 0.99 at a wavelength of 400 nm and a sample thickness of 25 mm.

[0106] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 0~25 ΣR2O 5.0~30 SO3>0~1.0 wherein the glass contains Pt in an amount of up to 3.0 ppm (by mass); and Here, the power density compared to Ext0 (436 nm) is 345 W / cm 2 The additional extinction Ext1(436 nm) at 436 nm for a 100 mm thick sample after irradiation with laser light at a wavelength of 455 nm for 72 hours is at most 0.01 / cm, where Ext0(436 nm) is the extinction at 436 nm for a 100 mm thick sample without corresponding irradiation.

[0107] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 1.0~25 ΣR2O 5.0~30 SO3>0~1.0 wherein the glass contains Pt in an amount of up to 3.0 ppm (by mass); and Here, the power density compared to Ext0 (436 nm) is 345 W / cm 2 The additional extinction Ext1(436 nm) at 436 nm for a 100 mm thick sample after irradiation with laser light at a wavelength of 455 nm for 72 hours is at most 0.01 / cm, where Ext0(436 nm) is the extinction at 436 nm for a 100 mm thick sample without corresponding irradiation.

[0108] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 0~25 ΣR2O 5.0~30 SO3>0~1.0 Here, the density of bubbles with a diameter of at least 100 μm is 3 less than 5.0 bubbles per Here, the glass has an internal transmittance greater than 0.99 at a wavelength of 400 nm and a sample thickness of 25 mm.

[0109] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 1.0~25 ΣR2O 5.0~30 SO3>0~1.0 Here, the density of bubbles with a diameter of at least 100 μm is 3 less than 5.0 bubbles per Here, the glass has an internal transmittance greater than 0.99 at a wavelength of 400 nm and a sample thickness of 25 mm.

[0110] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 0~25 ΣR2O 5.0~30 SO3>0~1.0 Here, the density of bubbles with a diameter of at least 100 μm is 3 less than 5.0 bubbles per Here, the power density compared to Ext0 (436 nm) is 345 W / cm 2 The additional extinction Ext1(436 nm) at 436 nm for a 100 mm thick sample after irradiation with laser light at a wavelength of 455 nm for 72 hours is at most 0.01 / cm, where Ext0(436 nm) is the extinction at 436 nm for a 100 mm thick sample without corresponding irradiation.

[0111] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 1.0~25 ΣR2O 5.0~30 SO3>0~1.0 Here, the density of bubbles with a diameter of at least 100 μm is 3 less than 5.0 bubbles per Here, the power density compared to Ext0 (436 nm) is 345 W / cm 2 The additional extinction Ext1(436 nm) at 436 nm for a 100 mm thick sample after irradiation with laser light at a wavelength of 455 nm for 72 hours is at most 0.01 / cm, where Ext0(436 nm) is the extinction at 436 nm for a 100 mm thick sample without corresponding irradiation.

[0112] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 0~25 ΣR2O 5.0~30 SO3>0~1.0 wherein the glass has an internal transmittance greater than 0.99 at a wavelength of 400 nm and a sample thickness of 25 mm; and Here, the power density compared to Ext0 (436 nm) is 345 W / cm 2 The additional extinction Ext1(436 nm) at 436 nm for a 100 mm thick sample after irradiation with laser light at a wavelength of 455 nm for 72 hours is at most 0.01 / cm, where Ext0(436 nm) is the extinction at 436 nm for a 100 mm thick sample without corresponding irradiation.

[0113] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 1.0~25 ΣR2O 5.0~30 SO3>0~1.0 wherein the glass has an internal transmittance greater than 0.99 at a wavelength of 400 nm and a sample thickness of 25 mm; and Here, the power density compared to Ext0 (436 nm) is 345 W / cm 2 The additional extinction Ext1(436 nm) at 436 nm for a 100 mm thick sample after irradiation with laser light at a wavelength of 455 nm for 72 hours is at most 0.01 / cm, where Ext0(436 nm) is the extinction at 436 nm for a 100 mm thick sample without corresponding irradiation.

[0114] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 0~25 ΣR2O 5.0~30 SO3>0~1.0 wherein the glass contains Pt in an amount of up to 3.0 ppm (by mass); Here, the density of bubbles with a diameter of at least 100 μm is 3 less than 5.0 bubbles per Here, the glass has an internal transmittance greater than 0.99 at a wavelength of 400 nm and a sample thickness of 25 mm.

[0115] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 1.0~25 ΣR2O 5.0~30 SO3>0~1.0 wherein the glass contains Pt in an amount of up to 3.0 ppm (by mass); Here, the density of bubbles with a diameter of at least 100 μm is 3 less than 5.0 bubbles per Here, the glass has an internal transmittance greater than 0.99 at a wavelength of 400 nm and a sample thickness of 25 mm.

[0116] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 0~25 ΣR2O 5.0~30 SO3>0~1.0 wherein the glass contains Pt in an amount of up to 3.0 ppm (by mass); Here, the density of bubbles with a diameter of at least 100 μm is 3 less than 5.0 bubbles per Here, the power density compared to Ext0 (436 nm) is 345 W / cm 2 The additional extinction Ext1(436 nm) at 436 nm for a 100 mm thick sample after irradiation with laser light at a wavelength of 455 nm for 72 hours is at most 0.01 / cm, where Ext0(436 nm) is the extinction at 436 nm for a 100 mm thick sample without corresponding irradiation.

[0117] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 1.0~25 ΣR2O 5.0~30 SO3>0~1.0 wherein the glass contains Pt in an amount of up to 3.0 ppm (by mass); Here, the density of bubbles with a diameter of at least 100 μm is 3 less than 5.0 bubbles per Here, the power density compared to Ext0 (436 nm) is 345 W / cm 2 The additional extinction Ext1(436 nm) at 436 nm for a 100 mm thick sample after irradiation with laser light at a wavelength of 455 nm for 72 hours is at most 0.01 / cm, where Ext0(436 nm) is the extinction at 436 nm for a 100 mm thick sample without corresponding irradiation.

[0118] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 0~25 ΣR2O 5.0~30 SO3>0~1.0 wherein the glass contains Pt in an amount of up to 3.0 ppm (by mass); wherein the glass has an internal transmittance greater than 0.99 at a wavelength of 400 nm and a sample thickness of 25 mm; and Here, the power density compared to Ext0 (436 nm) is 345 W / cm 2 The additional extinction Ext1(436 nm) at 436 nm for a 100 mm thick sample after irradiation with laser light at a wavelength of 455 nm for 72 hours is at most 0.01 / cm, where Ext0(436 nm) is the extinction at 436 nm for a 100 mm thick sample without corresponding irradiation.

[0119] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 1.0~25 ΣR2O 5.0~30 SO3>0~1.0 wherein the glass contains Pt in an amount of up to 3.0 ppm (by mass); wherein the glass has an internal transmittance greater than 0.99 at a wavelength of 400 nm and a sample thickness of 25 mm; and Here, the power density compared to Ext0 (436 nm) is 345 W / cm 2 The additional extinction Ext1(436 nm) at 436 nm for a 100 mm thick sample after irradiation with laser light at a wavelength of 455 nm for 72 hours is at most 0.01 / cm, where Ext0(436 nm) is the extinction at 436 nm for a 100 mm thick sample without corresponding irradiation.

[0120] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 0~25 ΣR2O 5.0~30 SO3>0~1.0 Here, the density of bubbles with a diameter of at least 100 μm is 3 Less than 5.0 bubbles per wherein the glass has an internal transmittance greater than 0.99 at a wavelength of 400 nm and a sample thickness of 25 mm; and Here, the power density compared to Ext0 (436 nm) is 345 W / cm 2The additional extinction Ext1(436 nm) at 436 nm for a 100 mm thick sample after irradiation with laser light at a wavelength of 455 nm for 72 hours is at most 0.01 / cm, where Ext0(436 nm) is the extinction at 436 nm for a 100 mm thick sample without corresponding irradiation.

[0121] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 1.0~25 ΣR2O 5.0~30 SO3>0~1.0 Here, the density of bubbles with a diameter of at least 100 μm is 3 Less than 5.0 bubbles per wherein the glass has an internal transmittance greater than 0.99 at a wavelength of 400 nm and a sample thickness of 25 mm; and Here, the power density compared to Ext0 (436 nm) is 345 W / cm 2 The additional extinction Ext1(436 nm) at 436 nm for a 100 mm thick sample after irradiation with laser light at a wavelength of 455 nm for 72 hours is at most 0.01 / cm, where Ext0(436 nm) is the extinction at 436 nm for a 100 mm thick sample without corresponding irradiation.

[0122] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 0~25 ΣR2O 5.0~30 SO3>0~1.0 wherein the glass contains Pt in an amount of up to 3.0 ppm (by mass); Here, the density of bubbles with a diameter of at least 100 μm is 3 Less than 5.0 bubbles per wherein the glass has an internal transmittance greater than 0.99 at a wavelength of 400 nm and a sample thickness of 25 mm; and Here, the power density compared to Ext0 (436 nm) is 345 W / cm 2 The additional extinction Ext1(436 nm) at 436 nm for a 100 mm thick sample after irradiation with laser light at a wavelength of 455 nm for 72 hours is at most 0.01 / cm, where Ext0(436 nm) is the extinction at 436 nm for a 100 mm thick sample without corresponding irradiation.

[0123] In some embodiments, the present invention relates to glasses comprising the following components in the stated proportions (by weight): SiO250~80 B2O32.0~30 Al2O30~5.0 CaO 0-10 BaO 0-10 Li2O 0~5.0 Na2O 0~20 K2O 1.0~25 ΣR2O 5.0~30 SO3>0~1.0 wherein the glass contains Pt in an amount of up to 3.0 ppm (by mass); Here, the density of bubbles with a diameter of at least 100 μm is 3 Less than 5.0 bubbles per wherein the glass has an internal transmittance greater than 0.99 at a wavelength of 400 nm and a sample thickness of 25 mm; and Here, the power density compared to Ext0 (436 nm) is 345 W / cm 2 The additional extinction Ext1(436 nm) at 436 nm for a 100 mm thick sample after irradiation with laser light at a wavelength of 455 nm for 72 hours is at most 0.01 / cm, where Ext0(436 nm) is the extinction at 436 nm for a 100 mm thick sample without corresponding irradiation.

[0124] DESCRIPTION OF THE DRAWINGS Figure 1 is a photograph of a glass sample in diffuse transmitted light. The bubbles appear as dark circular or oval inclusions against a light background. The lens used for the photograph in Figure 1 was a 150mm 2.8 EX DG OS HSM APO Macro with a maximum magnification of 1:1.0. This means that an object with a size of 1mm corresponds to 1mm on the sensor. The pixel size of the Nikon D7100 sensor used is 15.21µm 2 , or about 4 μm x 4 μm. The resolution is therefore about 4 μm. [Example]

[0125] The compositions of some glasses are given in Table 1 below (% by weight), which differ only with respect to the fining agents and their proportions.

[0126] [Table 1]

[0127] Table 1 shows the composition from the analysis. Analysis of the glass composition was carried out using X-ray fluorescence analysis (DIN 51001:2003-08: Test methods for oxide raw and base materials - Basic procedures for X-ray fluorescence (XRF) analysis), except for the percentage of SO3. The percentage of SO3 was determined using combustion gas analysis (CGA) (DIN 51085:2022-09 (Test methods for oxide raw and base materials - Determination of total sulfur content (version B)).

[0128] The notation "nb" in Table 1 means that the percentage of SO3 could not be determined. In contrast to Comparative Examples A and B, Comparative Example C did use SO3 in the synthetic composition (see Table 2 below). However, SO3 was not identified in the analytical composition. Given the small percentage of SO3 in the synthetic composition of Comparative Example C, it is likely that much of the SO3 evaporated, resulting in a value below the detection limit in the corresponding analytical composition.

[0129] Examples 1-4 and Comparative Example C were refined using SO3. Comparative Examples A and B were refined using Sn / Cl. The proportions of the fining agent SO3 in the synthetic compositions of Examples 1-4 and Comparative Example C are shown in Table 2 below (mass %).

[0130] [Table 2]

[0131] The difference in the percentage of fining agent between the synthetic and analytical compositions is due to evaporation.

[0132] 1. Number of bubbles The glass was produced by melting the mixture of glass raw materials at 1280°C for 2 hours, followed by fining at 1500°C for 20 minutes.

[0133] The bubble count was determined optically using photographs of the samples in diffuse transmitted light: bubbles with a diameter of at least 100 μm (Ferret diameter along the maximum extent of the bubble in the observation plane) were counted.

[0134] a) Comparison of SO3 fining and Sn / Cl fining Samples essentially corresponding to Example 1 and Comparative Examples A and B were investigated. These are hereinafter referred to as Example 1' or Comparative Examples A' and B'. The synthetic composition of Example 1' is the same as that of Example 1. The synthetic composition of Comparative Example A' is the same as that of Comparative Example A. The synthetic composition of Comparative Example B' is almost the same as that of Comparative Example B. The only difference was that the synthetic composition of Comparative Example B' contained 0.25% by weight of Cl, while the proportion of Cl in the synthetic composition of Comparative Example B was only 0.20% by weight.

[0135] The results are summarized in the table below.

[0136] [Table 3]

[0137] The fining of Example 1 according to the invention was better than that of the two comparative examples.

[0138] b) Effect of SO3 content on clarification results Examples 1-4 and Comparative Example C differ with respect to the proportion of SO3 (see above). 3 Different fining results were obtained depending on the proportion of SO3, as indicated by the number of bubbles (≥100 μm) per sieve.

[0139] [Table 4]

[0140] 2. Pt corrosion To avoid Pt corrosion, the glass was melted in a quartz glass crucible. The glass was crushed. The fragments were melted again in a quartz glass crucible and stirred in a rotating corundum tube with a Pt plate at the end for about 7 hours at 1460 °C and 15 revolutions per minute. A new plate was used for each experiment to avoid distorting the results. The plate was 25 × 105 mm. 2 It had an area of ​​.

[0141] Example 5 corresponds to Example 1, except that the proportion of SO3 in Example 5 in the analysis was still significantly higher at 0.24% by weight. In the synthetic composition, the proportion of SO3 was 0.25% by weight. Therefore, the evaporation of SO3 was significantly less in Example 5 than in Example 1.

[0142] The results are summarized in the table below, with the percentage of Pt given in ppm (by mass).

[0143] [Table 5]

[0144] In Example 5 according to the present invention, Pt contamination was reduced compared to Comparative Example A.

[0145] 3. Solarization behavior To determine long-term solarization resistance, a power density of 345 W / cm was used compared to Ext0 (436 nm). 2 The additional absorbance Ext1(436 nm) at a wavelength of 436 nm of a sample having a thickness of 100 mm after irradiation with laser light having a wavelength of 455 nm for 72 hours at 100° C. is determined, where Ext0(436 nm) is the absorbance at a wavelength of 436 nm of a sample having a thickness of 100 mm without corresponding irradiation.

[0146] The example glass samples, each with a sample thickness of 100 mm, were subjected to a power density of 345 W / cm 2 The samples were irradiated with a 455 nm laser beam for 72 hours. To achieve both high power density and homogeneous irradiation of the samples, the samples were polished on all sides and measured in a 4 × 4 mm 2 The laser beam was irradiated at an angle of total internal reflection (TIR) ​​onto the incident surface of 1000 nm. A 55 W laser was used, resulting in a power density of 345 W / cm. 2 The power density in the volume was approximately 331 W / cm. 2 It was.

[0147] The sample size was 100 mm x 4 mm x 4 mm.

[0148] a) Effect of Pt on solarization resistance The investigated samples differed only in their Pt proportion. Both samples were based on the same melt in a Pt-free environment. The melt was divided into two parts. One part was doped with Pt (15 ppm by mass, Comparative Example D), while the other part remained undoped (Example 6).

[0149] The glass compositions of Example 6 and Comparative Example D (except for Pt doping) essentially correspond to the composition of Comparative Example A. In the composite compositions of Example 6 and Comparative Example D, 0.3 wt. % SnO2 and 0.45 wt. % Cl were used.

[0150] The results are summarized in the table below.

[0151] [Table 6]

[0152] Comparison of Example 6 with Comparative Example D shows the adverse effect of Pt on solarization resistance. The low Pt percentage in Example 6 despite the relatively high Cl percentage is due to melting in a Pt-free environment.

[0153] b) Effect of SO3 on solarization resistance To test whether SO3 adversely affects solarization resistance, further SO3-containing samples (Examples 7-9) were investigated. To avoid Pt corrosion, each melting was carried out in a Pt-free environment.

[0154] The glass compositions of Examples 7 to 9 corresponded to those shown in Table 1, except for the fining agents. The following table shows the proportions of fining agents in the composite compositions of Examples 7 to 9. The solarization results (Ext1 (436 nm)) are also summarized in the following table.

[0155] [Table 7]

[0156] The results show that SO3 does not adversely affect solarization resistance. The good solarization resistance of Example 9 despite the relatively high Cl percentage is due to melting in a Pt-free environment.

Claims

1. Glass containing the following components in the indicated proportions (by weight): Yes 2 5p~80 B 2 O 3 2.0~30 Al 2 O 3 0~5.0 CaO 0-10 BaO 0-10 Li 2 O 0~5.0 Na 2 O0~20 K 2 O 0~25 ΣR 2 O 5.0~30 SO 3 >0~1.0。

2. 10. The glass of claim 1, wherein the glass contains up to 3.0 ppm (by weight) of Pt.

3. The density of bubbles having a diameter of at least 100 μm is 3 3. The glass of claim 1 or 2 having less than 5.0 bubbles per glass.

4. 4. The glass of claim 1, wherein the glass has an internal transmission greater than 0.99 at a wavelength of 400 nm and a sample thickness of 25 mm.

5. Ext 0 (436 nm) with a power density of 345 W / cm 2 The additional absorbance Ext at 436 nm of a sample having a thickness of 100 mm after irradiation with laser light at a wavelength of 455 nm for 72 hours at 455 nm. 1 (436 nm) is up to 0.01 / cm, where Ext 0 5. The glass according to claim 1, wherein (436 nm) is the absorbance at a wavelength of 436 nm of a sample having a thickness of 100 mm without corresponding irradiation.

6. The glass has a quality factor F(436 nm)=S(436 nm)×(Ext 0 (436nm)+Ext 1 (436 nm) / k, where S(436 nm) is the temperature coefficient at a wavelength of 436 nm, and Ext 1 (436 nm) is Ext 0 (436 nm) with a power density of 345 W / cm 2 is the additional absorbance at a wavelength of 436 nm of a sample having a thickness of 100 mm after irradiation with laser light having a wavelength of 455 nm at 1000 nm for 72 hours, and Ext 0 6. The glass according to claim 1, wherein F(436 nm) is the absorbance at a wavelength of 436 nm of a sample having a thickness of 100 mm without corresponding irradiation, and k is the thermal conductivity, and wherein F(436 nm)<15 ppm / W.

7. The glass has a quality factor F(RGB)=F(436 nm)+F(546 nm)+F(644 nm)=S(436 nm)×(Ext 0 (436nm)+Ext 1 (436nm)) / k+S(546nm)×(Ext 0 (546nm)+Ext 1 (546nm)) / k+S(644nm)×(Ext 0 (644nm)+Ext 1 7. The glass of claim 1 having a chromatic aberration of 0.05% (644 nm) / k, where F(RGB)<40 ppm / W.

8. K 2 8. The glass according to claim 1, wherein the proportion of O is at least 1.0% by weight.

9. 9. A beam-guiding element comprising or consisting of a glass according to any one of claims 1 to 8.

10. a) wavelength λ in the spectral range 380 nm to 490 nm B at least one laser light source B having b) a beam-guiding element according to claim 9 and wherein the laser source B has an output of 10 W / cm at least at one point of the beam guiding element. 2 The imaging system is suitable for producing an average areal power density greater than

11. 10. Use of a glass according to any one of claims 1 to 8 in a projector or in material processing.

12. 9. A method for producing glass according to any one of claims 1 to 8, comprising the steps of: - melting glass raw materials; cooling the resulting glass The method comprising:

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