Apparatus and method for partial plating of chains

Abstract

This system automatically applies electroless plating to individual raw chain links used in a chain connection, without causing discoloration to the connected plated chain. [Solution] A partial chain plating apparatus 10 is provided, comprising a polishing machine 14 for barrel polishing the raw chain links 3 to be plated, a plating tank 16 for electroless plating, a water washing tank 18 for cleaning, and an oil tank 22 for baking, all arranged side by side, the apparatus further comprising a holder 24 for holding the chain in a hanging position after folding it in half so that the raw chain links are at the lowest end, a traverse device 26 for moving the holder horizontally, a lifting device 28 for changing the height of the holder, a fan 32 for blowing air toward the chain hanging from the holder, and a control device for controlling the operation of at least the traverse device and the lifting device.

Description

Technical Field

[0001] The present invention relates to a partial plating apparatus and a partial plating method for a chain, and more particularly to a partial plating apparatus and a partial plating method for partially electroless plating a chain link used for connection without causing discoloration or the like of the connected plated chain.

Background Art

[0002] A windmill used for wind power generation mainly consists of blades, a hub, a nacelle, and a tower. In some large windmills, the nacelle is installed at a height of 80 meters or more from the ground. Inside the nacelle, a speed increaser, a generator, blade pitch control equipment, yaw control equipment, etc. are housed. Inside the nacelle, a long hoist electric chain block is provided to transport necessary goods in the tower for inspection and maintenance of these devices, and the length of the chain can reach 100 meters.

[0003] Storing a long chain only for such a long hoist chain block is not preferable in terms of securing inventory space and improving inventory turnover rate. On the other hand, if a long chain is produced after receiving an order, there is a problem that the delivery date will be delayed when the order quantity is large. Therefore, if a 50-meter chain, for example, stocked for a general hoist chain block can be connected as needed to form a long chain, it is convenient to save inventory space, improve inventory turnover rate, and provide a long chain of the required length with a short delivery date.

[0004] The connection of the chain for this purpose is performed in the following manner. First, the lower half of the C-shaped chain link (raw chain link) before welding is clamped and fixed with a vise in its longitudinal direction, and the upper half is slightly opened by twisting it using a dedicated tool. Then, the link at the end of two plated chains is inserted there, and then the twisting is restored. Then, the chain is connected by welding and joining the opposing ends of the chain link used for connection.

[0005] The welded chain links are then subjected to quenching and tempering to improve hardness, tensile strength, wear resistance, fatigue strength, and overall toughness. After that, the chain links are electroless plated, and then further baked to increase surface hardness, improve adhesion, and remove hydrogen embrittlement. By connecting these plated chains, a long chain can be formed.

[0006] However, when attempting to wet-plate the raw chain links used for connection by partially immersing them in the plating solution, a problem arose: the high-temperature steam from the plating solution caused the plated chain near the liquid surface to oxidize and turn black. Wet plating methods for chains include electroless plating and electroplating.

[0007] A common partial plating method is described in Patent Document 1, for example, which involves forming a resist film on the surface of an article to which a plating film is not to be formed, roughening the surface of the article that is not covered by the resist film using a surface roughening solution, and then performing a plating treatment on the article. [Prior art documents] [Patent Documents]

[0008] [Patent Document 1] Japanese Patent Publication No. 2000-204480 [Overview of the project] [Problems that the invention aims to solve]

[0009] In the partial plating method of the invention described in Patent Document 1, there are no pre-plated areas, so the aforementioned discoloration problem is not considered. However, similarly with the chain described above, discoloration of the pre-plated areas can be avoided by covering only the parts to be plated with a resist film so that they come into contact with the plating solution. However, in reality, complete coating is difficult with chains due to the complexity of their shape caused by linking, and such a method could not completely eliminate uneven plating or discoloration. Furthermore, there was the problem of the extra effort required to remove the resist film after plating.

[0010] The present invention was made to solve the above problems, and its objective is to provide an apparatus and method for partially electroless plating chain links used in connection without causing discoloration of the connected plated chain. [Means for solving the problem]

[0011] [1] In order to solve the above problems, the present invention provides a chain partial plating apparatus comprising a polishing machine for polishing a raw chain link to be plated, which is made by connecting two plated chains, a plating tank for electroless plating, a water washing tank for cleaning, and an oil tank for baking, all arranged side by side, the apparatus comprising: a holder for holding the chain in a hanging state folded in half so that the raw chain link is at the lowest end; a traverse device for moving the holder horizontally; a lifting device for changing the height of the holder; a fan for blowing air toward the chain hanging from the holder; and a control device for controlling the operation of at least the traverse device and the lifting device.

[0012] [2] Preferably, in the invention described in [1] above, a liquid level sensor is further provided for detecting the height of at least one liquid level in the polishing machine, the plating tank, the washing tank, or the oil tank, and the control device controls the lifting device based on information from the liquid level sensor to change the height of the holding part.

[0013] [3] The present invention also provides a method for partially plating a chain, comprising: a holding step of folding a chain in half so that the raw chain link to be plated, which connects two plated chains, is at the lowest end, and holding it with a holder while it hangs down; and a plating step of lowering the holder so that the raw chain link is immersed in the plating solution in the plating tank for a time required to deposit a plating film of the necessary thickness, and gradually lowering the holder before discoloration due to the effects of steam begins to occur in the portion of the plated chain near the liquid surface of the plating solution.

[0014] [4] In the invention described in [3] above, it is preferable that during the plating stage, air is blown out by a fan in order to blow away the vapor near the surface of the plating liquid into the plating tank.

[0015] [5] Furthermore, in the invention described in [3] or [4] above, it is preferable that in the plating stage, the holder is lowered in stages or at a constant speed so that the length of the part in which the chain is immersed is minimized.

[0016] [6] Furthermore, it is preferable that the invention described in [3] or [4] above includes, before the plating step, a polishing step in which the holder is moved and a predetermined number of links at the lower end of the hanging chain are immersed in liquid in a polishing machine to perform a polishing treatment; after the plating step, a cleaning step in which the holder is moved and the plated chain links are immersed in water in a water washing tank to perform a cleaning treatment of the plating solution; and a baking step in which the holder is moved and the cleaned chain links are immersed in oil in an oil tank to perform a baking treatment. [Effects of the Invention]

[0017] According to the present invention, the raw chain links used for connecting the chains can be partially electroless plated without causing discoloration to the connected plated chains. [Brief explanation of the drawing]

[0018] [Figure 1] This is a schematic diagram showing an example of the configuration of the chain partial plating apparatus in this embodiment. [Figure 2] This is a perspective view showing a holder for a chain that is suspended from the moving platform of a traverse device. [Modes for carrying out the invention]

[0019] The present invention will be described in more detail below. In this invention, the term "plating treatment" refers to electroless plating. However, the present invention is not limited to the following embodiments and can be implemented with various modifications within the scope of its gist. Furthermore, the drawings used are for illustrative purposes only, and the arrangement and configuration of each device can be modified within the scope of its gist.

[0020] The present invention aims to partially plate two plated chains by connecting them using a raw chain link (a chain link that has only been bent and has not undergone heat treatment or plating), welding the opposing ends of the raw chain link together, and then heat-treating the raw chain link by quenching and tempering to partially plate the connected chain (meaning the two plated chains and the raw chain link connecting them). In the state after welding, only the raw chain link used for connection remains unplated. Although heat is transferred to the plated chain connected by the raw chain link during welding and quenching, verification has confirmed that there is no thermal impact on the plated chain (especially the adjacent link).

[0021] In order to electroplate this unplated chain link, when the chain connected to the electroplating solution is partially immersed in the heated electroplating solution, there is a problem that black discoloration occurs on the electroplated chain directly above the liquid level of the electroplating solution. This discoloration is caused by the steam of the electroplating solution oxidizing the plating on the electroplated chain. As a method of avoiding the discoloration of the electroplated chain, it is conceivable to cover the electroplated chain with a resist film so that only the part to be plated is in contact with the electroplating solution. However, in practice, it is difficult to achieve complete coverage, and it also takes time to remove the resist film after electroplating.

[0022] The present invention provides a chain partial plating apparatus and a partial plating method for performing partial plating mainly on an unplated raw chain link by a simple method without discoloring the electroplated chain. Hereinafter, first, the chain partial plating apparatus will be described, and then the partial plating method using the apparatus will be described.

[0023] [Configuration Outline of Partial Plating Apparatus] Fig. 1 schematically shows the configuration of the partial plating apparatus of this embodiment. In this partial plating apparatus 10, a height confirmation table 12 serving as an origin stage, a polishing machine 14 for magnetic barrel polishing, a plating tank 16 filled with a plating solution, a water washing tank 18 filled with water for washing the plating solution and the like, and an oil tank 22 filled with oil for baking treatment are arranged side by side in this order in close proximity. Further, above these, a holder 24 for holding the chain 1 is arranged, a traversing device 26 for horizontally moving the holder 24, a lifting device 28 for integrally lifting and lowering the holder 24 and the traversing device 26, a fan 32 for blowing air toward the liquid level of the plating tank 16, and a control device (not shown) for controlling the operations of the traversing device 26, the lifting device 28 and the fan 32 are provided. Furthermore, on the lower side of the holder 24, a liquid level sensor 34 is provided so that its relative position does not change even when the holder 24 moves, that is, it moves together with the holder 24. This liquid level sensor 34 is for measuring the distance from the liquid levels of the polishing machine 14, the plating tank 16, the water washing tank 18 and the oil tank 22 that come below the moved holder 24.

[0024] The height confirmation table 12 is a horizontal pedestal for confirming that the length of the chain 1 hanging from the holder 24 is constant at the initial position of the apparatus, and is for confirming whether the lowermost end of the hanging chain 1, that is, the raw chain link 3 to be plated (see Fig. 2), slightly touches the pedestal. The length of the hanging chain 1 only needs to be sufficient for subsequent processes, and for example, about 50 cm to 1 m is preferable.

[0025] The polishing machine 14 is a generally commercially available barrel polishing machine, and a container with an open top is filled with magnetic media and a polishing liquid (water) to about half the height of the container at an appropriate ratio. Stainless steel needle-shaped media are used as this magnetic media. For example, in the case of the chain 1 with a wire diameter of 4 mm, it has been confirmed by experiments that a mixture of needle-shaped media with diameters of φ1.0 mm and φ1.2 mm is suitable. This is because the media has a certain mass, resulting in high polishing ability, and by entangling, it can also enter the linking part of the chain 1 to remove scale. Note that it is not only difficult to perform shot blasting locally and automatically on the chain 1, but also inappropriate because the device becomes large if it is sealed to prevent the media from scattering. Also, pickling is not appropriate because there is a risk of generating hydrogen embrittlement in the adjacent plated chain 5.

[0026] The plating tank 16 is generally commercially available, and a container with an open top is filled with a plating solution to about 80% of its height. The plating tank 16 is integrally equipped with a heating device for maintaining the temperature of the plating solution at a desired temperature (for example, about 75 to 85 °C) and a stirrer that rotates a stirrer for stirring the plating solution at the bottom of the plating tank 16 by magnetic force.

[0027] The water washing tank 18 is generally commercially available, and a container with an open top is filled with a cleaning solution (pure water) to about 80% of its height. The temperature of the cleaning solution in the plating tank 16 is at room temperature. Also, a stirrer for stirring the cleaning solution is integrally provided.

[0028] The oil tank 22 is a commercially available product, and is a container with an open top filled with silicone oil to about 80% of its height. The oil tank 22 is equipped with a heating device to maintain the temperature of the silicone oil at a desired temperature (for example, about 180°C) and a stirrer to agitate the silicone oil.

[0029] Figure 2 shows the holder 24 with the chain 1 hanging down. The holder 24 is a jig that allows the chain 1 to be held in a hanging position after being folded in half so that the raw chain link 3 to be plated is at the lowest end. It consists of a rectangular resin plate with a round hole 35 for the chain 1 to pass through, and projection pins 37 for securing the chain 1 are provided on its upper surface. In this embodiment, two round holes 35 are formed in close proximity, and two projection pins 37 are provided on each (a total of four). This makes it possible to plate two hanging chains 1 simultaneously. To fine-tune the length of the hanging chain, the projection pins 37 may be slid and fixed in the direction of the round hole 35 on a sliding base.

[0030] The traverse device 26 moves the holder 24 horizontally. The holder 24, which is fixed on a movable platform 41 attached to a horizontal rail 39, is slowly slid horizontally using the power of a motor. The holder 24 can be placed and fixed on this movable platform 41, and it does not come into contact with the chain 1 hanging down from the holder 24. The operation of the motor is determined by sequence control by a control device.

[0031] The lifting device 28 raises and lowers the holder 24, which is fixed to the mobile platform 41 along with the rail 39 of the traverse device 26, while maintaining a horizontal position. It is an actuator that uses electric cylinders (electric jacks) that support the left and right sides of the rail 39. The required stroke of the electric cylinder is determined by the height difference to be raised or lowered, but is approximately 40 cm. The operation of the electric cylinder is determined by sequence control by the control device.

[0032] The fan 32 blows air towards the chain 1 hanging from the holder 24, more precisely towards the chain 1 near the surface of the plating solution, to blow away high-temperature water vapor that does not accumulate just above the surface of the plating solution. The direction of the fan 32 is fixed, but its ON / OFF state is determined by sequence control by the control device.

[0033] The liquid level sensor 34 is a radar-type sensor that non-contactually measures the distance to the liquid surface of the polishing machine 14, plating tank 16, washing tank 18, and oil tank 22 located below the moved holder 24, and is mounted facing downwards on the moving platform 41 of the traversing device 26. The information on the distance to the liquid surface measured by the liquid level sensor 34 is transmitted to the control device.

[0034] As described above, the control device sequentially controls the operation of the traversing device 26, the lifting device 28, and the fan 32. The control device also adjusts the lifting height of the lifting device 28 based on information from the liquid level sensor 34 so that the chain 1 hanging from the holder 24 is submerged below the liquid level by a desired length. Such height adjustment is necessary because the liquid level is not constant due to evaporation of the liquid, fluctuations in the liquid level due to agitation, and variations in liquid addition and adjustment.

[0035] [Partial Plating Method] Next, a method for partially plating the chain 1 using the partial plating apparatus 10 of this embodiment described above will be explained. As a preliminary step, two plated chains 5 are connected using raw chain links 3, and the opposing ends of the raw chain links 3 are welded together to prepare a chain 1 that has been quenched and tempered. The portion of the chain 1 to be immersed in the plating solution is spray-degreased with a commercially available parts cleaner as needed to remove dirt and oil.

[0036] (Holding stage) At the initial position of the partial plating device 10, the operator places and secures the holder 24 on the moving platform 41 of the traverse device 26. Then, the chain 1 is folded in half without twisting so that the raw chain link 3 to be plated, which connects two plated chains 5, is at the bottom, and is allowed to hang down through the round hole 35 of the holder 24. In this state, the raw chain link 3 to be plated has its longitudinal direction horizontal, while the other hanging chains 1 have their longitudinal direction vertical. The chain 1 is then hooked onto the projection pin 37 on the upper surface of the holder 24 so that the lowest end of the hanging chain 1, i.e., the raw chain link 3 to be plated, is just touching the height confirmation platform 12. The length of the chain 1 hanging from the holder 24 is set to, for example, 50 cm. This completes the preparation for automatic plating.

[0037] (Polishing stage) The control device is programmed to automatically perform the steps from this step onward, and the subsequent operation of each device is performed without human intervention. First, the lifting device 28 raises the holder 24 by 1 cm from its initial position, and then the traversing device 26 moves the holder 24 horizontally onto the polishing machine 14. In this state, the liquid level sensor 34 measures the distance to the liquid surface of the polishing solution and transmits this information to the control device. Upon receiving the information, the control device calculates the downward distance of the lifting device 28 to immerse the raw chain link 3 to be plated and the five adjacent links on the left and right (11 links in total) in the polishing solution, and lowers the lifting device 28 by that distance. It is preferable that when these 11 links are immersed, the raw chain link 3 to be plated is lightly in contact with the bottom surface of the container of the polishing machine 14. This is to make it easier to create gaps at the linking points between the raw chain link 3 to be plated and the links on the left and right. The polishing machine 14 operates continuously, and the immersed chain 1 is polished by magnetic media for 90 minutes. In particular, the raw chain link 3 at the very bottom of chain 1, which is to be plated, is thoroughly polished due to its frequent contact with the magnetic media, thereby removing scale and activating its surface. It is also possible to connect the polishing machine 14 to a control device and automatically turn it on and off.

[0038] (Pre-cleaning stage / to be performed as needed) After magnetic barrel polishing is complete, chain 1 is lifted from the polishing machine 14 by the operation of the lifting device 28 and traversing device 26 controlled by the control device and moved onto the washing tank 18. In this state, the liquid level sensor 34 measures the distance to the liquid level and transmits this information to the control device. Upon receiving this information, the control device calculates the downward distance of the lifting device 28 to immerse the raw chain link 3 to be plated and the six adjacent links on the left and right (13 links in total) in water, and lowers the lifting device 28 by that distance. The immersed chain does not touch the bottom of the washing tank 18. The water used as the cleaning solution is at room temperature but is agitated by a stirrer, and washing is performed here for 5 minutes. It is also possible to automatically turn the stirrer ON / OFF by the control device.

[0039] (Plating stage) After the rinsing is complete, the chain 1 is lifted out of the water in the rinsing tank 18 by the operation of the lifting device 28 and the traversing device 26 controlled by the control device and moved onto the plating tank 16. The plating tank 16 is filled with plating solution kept at 85°C and is being agitated. In this state, the liquid level sensor 34 measures the distance to the liquid surface and transmits this information to the control device. Upon receiving the information, the control device calculates the downward distance of the lifting device 28 to immerse the raw chain link 3 to be plated and the adjacent left and right links (a total of 3 links) in the plating solution, and lowers the lifting device 28 by that distance. The chain 1 is dry before immersion. Simultaneously with the lowering, the control device turns on the fan 32, which starts blowing air towards the plating solution surface. After immersing these 3 links for 16 minutes (first immersion), the control device lowers the lifting device 28 to immerse the raw chain link 3 to be plated and the adjacent left and right links (a total of 7 links) in the plating solution for 16 minutes (second immersion). Subsequently, the lifting device 28 is lowered further to immerse the raw chain link 3 to be plated and the five adjacent links to the left and right (11 links in total) in the plating solution for 16 minutes (third immersion). At this time, the immersed chain does not come into contact with the bottom of the plating tank 16. The reason for setting each immersion to 16 minutes (48 minutes in total) is that discoloration due to the effects of steam is most likely to occur in the part of the chain 1 directly above the plating solution surface, but experiments have confirmed that discoloration does not occur in this part if the steam is blown away by the fan 32. Also, 48 minutes is the time required to deposit a plating film of the required thickness on the raw chain link 3. The reason for finally immersing a total of 11 links is that depositing further plating on the plated chain 5 adjacent to the raw chain link 3 would increase the consumption of the plating solution, so the length of the immersed portion is kept to a minimum. It is also possible to automatically turn the heating and stirring of the plating tank 16 ON / OFF by the control device.

[0040] The newly formed plating thickness is 6.5 μm for the raw chain link 3 to be plated and the two adjacent links on the left and right (3 links total), 4.3 μm for the two links to the left and right of the raw chain link 3 (4 links total), and 2.1 μm for the four links to the left and right of the raw chain link 3 (4 links total). Alternatively, instead of a stepwise immersion such as a second and third immersion, the lifting device 28 may be slowly lowered over the same amount of time. On the other hand, immersing the raw chain link 3 to be plated and the five adjacent links on the left and right (11 links total) first and then gradually removing them from the plating solution is undesirable because dripping of the plating solution may cause partial discoloration of the plated chain 5.

[0041] (Washing stage) The plated chain 1 is lifted out of the plating tank 16 by the operation of the lifting device 28 and traversing device 26 controlled by the control device and moved back onto the washing tank 18. In this state, the liquid level sensor 34 measures the distance to the liquid level and transmits this information to the control device. Upon receiving the information, the control device calculates the downward distance of the lifting device 28 to immerse the raw chain link 3 to be plated and the six adjacent links on the left and right (13 links in total) in water, and lowers the lifting device 28 by that distance. The immersed chain does not touch the bottom of the washing tank 18. Washing is performed here for 5 minutes.

[0042] (Baking stage) After the washing is complete, the chain 1 is lifted out of the washing tank 18 by the operation of the lifting device 28 and the traversing device 26, which are controlled by the control device, and moved onto the oil tank 22. The oil tank 22 is filled with silicone oil kept at 180°C and is being agitated. In this state, the liquid level sensor 34 measures the distance to the liquid level and transmits this information to the control device. Upon receiving the information, the control device calculates the downward distance of the lifting device 28 to immerse the raw chain link 3 to be plated and the six adjacent links on the left and right (13 links in total) in the silicone oil, and lowers the lifting device 28 by that distance. The baking process is completed by heating in the silicone oil for 30 minutes. It is also possible to automatically turn the heating and agitation of the oil tank 22 on and off by the control device.

[0043] Incidentally, in the normal production of chains, baking after continuous plating is performed using an air heating method, with large furnace equipment used for heating for approximately 150 minutes. Since it is desirable that localized heating in partial plating be simple and quick, the present invention adopts a liquid heating method. Various studies were conducted on the baking oil, and it was decided to use silicone oil, which is suitable for the baking conditions and has high chemical stability (non-hazardous material, high flash point, difficult to decompose by heating, high thermal conductivity, and high viscosity). By using silicone oil, it became possible to perform a necessary and sufficient baking treatment by heating at 180°C for 30 minutes.

[0044] Finally, the chain 1, having completed the baking process, is lifted out of the oil tank 22 by the operation of the lifting device 28, which is controlled by the control device. This completes the series of automated partial plating processes, and the worker removes the chain 1 from the holder 24 to finish the work.

[0045] It goes without saying that the above invention can automate not only all of the above steps, but also only a part of them. The present invention is not limited to chains for electric chain hoists but can be broadly applied to other chains, and can also be applied to electroless partial plating of nickel, copper, gold, etc.

[0046] <Regarding the effects of the invention> According to the present invention, the chain links used for connecting the connected plated chains can be partially, automatically, and easily electroless plated without causing discoloration or other damage to the connected plated chains, and without compromising quality. Therefore, it is not necessary to stock long chains; existing chains can be connected and partially plated as needed to create a long chain. The present invention can also be applied when connecting and reusing leftover chain lengths that would otherwise be discarded because they do not meet the required length. [Explanation of Symbols]

[0047] 1...Chain, 3...Raw chain link, 5...Plated chain, 10...Partial plating device, 12...Height check stand, 14...Grinding machine, 16...Plating tank, 18...Washing tank, 22...Oil tank, 24...Holder, 26...Traversing device, 28...Lifting device, 32...Fan, 34...Liquid level sensor, 35...Round hole, 37...Protruding pin, 39...Rail, 41...Mobile stand

Claims

1. A partial chain plating apparatus comprising a polishing machine for polishing a raw chain link to be plated, which is formed by connecting two plated chains, a plating tank for electroless plating, a water rinsing tank for cleaning, and an oil tank for baking, all arranged side by side, A holder that holds the chain in a hanging position after folding it in half so that the raw chain link is at the lowest end, A traversing device for moving the holder in the horizontal direction, A lifting device for changing the height of the holder, A fan that blows air towards the chain hanging from the aforementioned holder, The system includes at least a control device that controls the operation of the traversing device and the lifting device, A chain partial plating apparatus characterized by the following:

2. The polishing machine, the plating tank, the washing tank, or the oil tank further comprises a liquid level sensor for detecting the height of at least one liquid level in the oil tank, The chain partial plating apparatus according to claim 1, characterized in that the control device controls the lifting device based on information from the liquid level sensor to change the height of the holding portion.

3. The holding stage involves folding the chain in half so that the raw chain link to be plated, which is connected to two plated chains, is at the lowest end, and holding it with a holder while it hangs down. The plating step includes lowering the holder to immerse the raw chain link in the plating solution in the plating tank for a time required to deposit a plating film of the necessary thickness, and gradually lowering the holder before discoloration due to the effects of vapor begins to occur in the portion of the plated chain near the liquid surface of the plating solution, A method for partially plating a chain, characterized by the features described above.

4. During the plating stage, a fan is used to blow air away vapor near the surface of the plating solution into the plating tank. The method for partially plating a chain according to feature 3.

5. In the plating stage, the holder is lowered in stages or at a constant speed so that the length of the part of the chain that is immersed is minimized. The method for partially plating a chain according to feature 3 or 4.

6. Prior to the plating step, the holder is moved and a predetermined number of links at the lower end of the hanging chain are immersed in the liquid inside the polishing machine to perform a polishing process. The process includes, after the plating step, a cleaning step in which the holder is moved and the plated chain link is immersed in water in a washing tank to clean the plating solution, and a baking step in which the holder is moved and the cleaned chain link is immersed in oil in an oil tank to perform a baking process. The method for partially plating a chain according to feature 3 or 4.

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