Information processing apparatus, substrate processing apparatus, method for manufacturing articles, and information processing method

Abstract

The present invention provides an information processing device that can estimate the amount of outgassing generated from a tube in a substrate processing device. [Solution] The information processing apparatus according to the present invention is characterized by performing an estimation step of estimating the amount of outgass generated in a pipe that guides a gas supplied from a supply source within a substrate processing apparatus to a predetermined space, and which is guided to the predetermined space by the gas, based on the flow rate of the gas.

Description

[Technical Field]

[0001] The present invention relates to an information processing apparatus, a substrate processing apparatus, a method for manufacturing an article, and an information processing method that can estimate the amount of outgassing occurring in a predetermined space. [Background technology]

[0002] Conventionally, in substrate processing equipment such as exposure systems, it is known that outgassing generated from pipes that supply clean air to improve cleanliness may reduce the cleanliness of the substrate. Patent Document 1 discloses an exposure apparatus that suppresses the diffusion of outgassing generated from a tube by housing the tube in a negative pressure suction space formed inside the case body. [Prior art documents] [Patent Documents]

[0003] [Patent Document 1] Japanese Patent Publication No. 2009-170504 [Overview of the project] [Problems that the invention aims to solve]

[0004] On the other hand, obtaining and evaluating the amount of outgassing generated from the tubes in a substrate processing device is important for improving cleanliness. Therefore, the present invention aims to provide an information processing device that can estimate the amount of outgassing generated from a tube in a substrate processing device. [Means for solving the problem]

[0005] The information processing apparatus according to the present invention is characterized by performing an estimation step of estimating the amount of outgass generated in a pipe that guides a gas supplied from a supply source within a substrate processing apparatus to a predetermined space, and which is guided to the predetermined space by the gas, based on the flow rate of the gas. [Effects of the Invention]

[0006] According to the present invention, it is possible to provide an information processing device that can estimate the amount of outgassing generated from a tube in a substrate processing device. [Brief explanation of the drawing]

[0007] [Figure 1] Schematic diagram of the first device. [Figure 2] A schematic cross-sectional view of a cylindrical model used in the information processing device according to the first embodiment. [Figure 3] A diagram illustrating an example of the dependence of the outgassing concentration measured in a predetermined space in the first apparatus on the flow rate of air flowing through a predetermined tube and the length of the predetermined tube. [Figure 4] Schematic diagram of the second device. [Figure 5] This figure shows an example of the time dependence of the amount of outgassing in a chemical filter estimated by the information processing device according to the second embodiment. [Figure 6] A diagram illustrating the configuration of an exposure apparatus equipped with an information processing device according to the first or second embodiment. [Modes for carrying out the invention]

[0008] The information processing device according to this embodiment will be described in detail below with reference to the attached drawings. Note that the drawings shown below may be drawn to a different scale than the actual dimensions in order to facilitate understanding of this embodiment.

[0009] [First Embodiment] In recent years, the use of components made of resin materials has increased in exposure equipment to improve its functionality.

[0010] On the other hand, it is known that components made of resin materials are prone to contamination due to outgassing. Furthermore, since exposure equipment requires a clean environment, outgassing evaluation is necessary.

[0011] Conventionally, an exposure apparatus including outgas detection means for detecting outgas has been proposed. Conventionally, instead of providing outgas detection means, an exposure apparatus has been proposed that determines whether there is a risk of generating an amount of the outgas that damages the optical system by measuring a predetermined physical quantity having a correlation with the amount of outgas.

[0012] On the other hand, in an exposure apparatus, in order to maintain a clean environment in a predetermined space, for example, clean air is supplied from a tube formed of a resin material having excellent workability to the predetermined space. And when clean air flows through the tube formed of the resin material, outgas is generated and mixed into the clean air, so that the outgas also reaches the predetermined space together with the clean air.

[0013] Therefore, in order to maintain a clean environment in a predetermined space, it is necessary to evaluate the amount of outgas reaching the predetermined space from the tube. On the other hand, since all of the above conventional exposure apparatuses evaluate the outgas generated from the photosensitive agent film formed on the substrate, it is difficult to evaluate the amount of outgas reaching the predetermined space from such a tube.

[0014] Therefore, an object of the present embodiment is to provide an information processing apparatus capable of estimating the amount of outgas reaching a predetermined space from a tube in an exposure apparatus. FIG. 1 shows a schematic diagram of a first apparatus 50. The first apparatus 50 is, for example, a substrate processing apparatus for processing a substrate. Specifically, as the substrate processing apparatus, an exposure apparatus that exposes the substrate so as to transfer a pattern drawn on a master plate to the substrate, a coating apparatus that applies a photosensitive material on the substrate and performs a pre-exposure heat treatment, and a developing apparatus that develops the photosensitive material on the substrate on which the pattern has been transferred are included.

[0015] As shown in Figure 1, the first device 50 is equipped with an air supply source 1 (supply source) that supplies air (gas). Furthermore, the first apparatus 50 is formed by at least one tube 4 (pipe), and the air supplied from the air supply source 1 is routed through n spaces 21, ..., 2 n Each (air consumption destination) is equipped with a piping system 3 that leads to it. If the first apparatus 50 is an exposure apparatus, for example, spaces 21 to 2 n One of these is a storage space within the lens barrel that houses the projection optical system that guides the exposure light that has passed through the original plate onto the substrate.

[0016] The air supply source 1 is located in the space 21 to 2 in the piping system 3. n The system is configured to adjust the pressure of the air supplied to each of the n corresponding systems, and to supply the air to each tube 4 at a predetermined pressure. The air supplied from air source 1 may include, for example, dry air or nitrogen gas. Then, in tube 4 to which air is supplied, outgassing is released from the inner wall surface toward the air.

[0017] In other words, as air flows through tube 4, outgassing is continuously released from the inner wall surface of tube 4 toward the air, increasing the amount of outgassing that mixes with the air flowing through tube 4.

[0018] The outgassing that has increased and mixed into the air is then carried by the air into space 21 to 2 n To be led there. This outgassing includes, for example, water vapor and organic compounds.

[0019] Space 21-2 n The increase in the amount of outgassing that results from this is a cause of contamination, therefore, space 21 to 2 n An evaluation of the amount of outgassing in this case is necessary. Therefore, in the information processing device according to the first embodiment, an outgassing amount estimation model is used, with the flow rate of air flowing through each tube 4 and the material forming each tube 4 as parameters, in space 21 to 2 n The amount of outgassing is estimated (estimation step, first calculation step).

[0020] Specifically, an outgassing amount estimation model is created using a cylindrical model 11 as shown in Figure 2 to estimate the amount of outgassing that occurs in a predetermined space 2 when air is guided into a predetermined space 2 by a predetermined tube 4. In the cylindrical model 11, a predetermined amount of outgassing G is released into the interior of the cylinder 14 from a unit area of ​​the inner wall surface 15 of the cylinder 14 per unit time, and an airflow 12 is generated along the axial direction of the cylinder 14.

[0021] Then, an outgassing rate estimation model is created using the advection equation for the cylindrical model 11 shown by equation (1) below.

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[0022] In equation (1), t is time and C is the concentration of outgassing G. Also in equation (1), d is the amount of outgassing G generated per unit time from a unit area of ​​the inner wall surface 15 of the cylinder 14, and can be determined from the material such as the resin material that forms the predetermined tube 4. Furthermore, in equation (1), u, v, and w represent the air flow velocities in the r direction (radial direction), θ direction (circumferential direction), and z direction (axial direction) of the cylinder 14, respectively. Furthermore, the above unit area for the amount of outgassing G generated, d, can also be considered as the surface area of ​​the inner wall surface 15 per unit length in the axial direction z.

[0023] In the cylindrical model 11, the outgassing concentration C does not depend on the circumferential coordinate θ (position), and is therefore expressed as a function C(t,r,z) of time t, radial coordinate r, and axial coordinate z. In the cylindrical model 11, the air forms a laminar flow, so the axial flow velocity w of the air depends on the radial coordinate r, while the radial flow velocity u of the air is 0.

[0024] Furthermore, the amount of outgassing G generated per unit time from a unit area of ​​the inner wall surface 15 of the cylinder 14 is expressed as a predetermined function d(C) that depends on the concentration C of outgassing G mixed in the air, such that it decreases as the concentration C increases. Based on the above, in cylindrical model 11, equation (1) can be rewritten as equation (2) below.

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[0025] Here, assuming that the concentration C of outgassing G can be expressed as a function C(t,z) of time t and axial coordinate z by averaging in the r direction, equation (2) can be rewritten as equation (3) below.

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[0026] Then, by solving equation (3), we can derive the function C(t,z) (derivation process). Furthermore, as shown below, the amount of outgassing G guided into a predetermined space 2 is measured by flowing air through a predetermined tube 4 under various conditions.

[0027] This makes it possible to create an outgassing amount estimation model that estimates the amount of outgassing G guided into a predetermined space 2 by the predetermined tube 4. Specifically, an outgassing amount estimation model can be created by measuring the amount of outgassing G guided into a predetermined space 2 using a plurality of predetermined tubes 4 having various and different lengths, or by using air flowing through the predetermined tubes 4 at various flow rates. The flow rate of air flowing through the designated tube 4 may be measured using a flow meter or other measuring means, determined by performing a predetermined calculation, or estimated by measuring a predetermined physical quantity.

[0028] Figure 3(a) shows an example of the dependence of the amount of outgassing G measured in a unit volume of a predetermined space 2, i.e., the concentration C of outgassing G measured in the predetermined space 2 (measurement result), on the flow rate of air flowing through a predetermined tube 4. Figure 3(b) also shows an example of the dependence of the amount of outgassing G measured in a unit volume of a predetermined space 2, i.e., the concentration C of outgassing G measured in the predetermined space 2 (measurement result), on the length of a predetermined tube 4 through which air flows.

[0029] Then, the coefficients of the function C(t,z) are determined by fitting the dependence shown in Figure 3(a) and Figure 3(b) respectively to the function C(t,z) derived by solving equation (3), using the amount of outgassing G d and the flow velocity w in the axial direction z as parameters. This makes it possible to create an outgassing amount estimation model for estimating the amount of outgassing G that is guided into a predetermined space 2 by a predetermined tube 4.

[0030] Furthermore, if it is possible to measure the concentration C of the outgass G guided into a predetermined space 2 by flowing air through a predetermined tube 4, an outgassing amount estimation model may be created using the function C(t,r,z) derived by solving equation (2). In this case, the amount of outgassing G guided into a predetermined space 2 by flowing air through a predetermined tube 4 can be estimated with even greater accuracy.

[0031] Furthermore, the outgassing rate estimation models derived from equations (1), (2), and (3) do not take into account the diffusion of outgassing G within a given tube 4. Therefore, instead of equations (1), (2), and (3), an outgassing amount estimation model that takes into account the diffusion of outgassing G in a given tube 4 may be created from the advection-diffusion equations in the cylindrical model 11 shown by the following equations (4), (5), and (6).

[0032]

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[0033] In equations (4) to (6), D is the diffusion coefficient of outgassing G within a predetermined tube 4, and can be determined from the material, such as the resin material, that forms the predetermined tube 4. Furthermore, by using the outgassing volume estimation model derived from equation (4), equation (5), or equation (6), the amount of outgassing G guided into a predetermined space 2 by flowing air through a predetermined tube 4 can be estimated with even greater accuracy.

[0034] Furthermore, when creating an outgassing rate estimation model, the temperature and pressure of the air flowing through a given tube 4 may be incorporated as parameters in the advection equations shown by equations (1) to (3) and the advection-diffusion equations shown by equations (4) to (6). Specifically, for example, the axial flow velocity w of air and the diffusion coefficient D of outgassing G can be expressed as a function of the temperature and pressure inside a given tube 4. In that case, the amount of outgass G guided into a predetermined space 2 can be estimated with even greater accuracy by flowing air through a predetermined tube 4 using the created outgassing volume estimation model.

[0035] In creating such an outgassing volume estimation model, the amount of outgassing G guided into a predetermined space 2 is measured by flowing air of various temperatures and pressures through a predetermined tube 4, as described above. The temperature and pressure of the air flowing through the designated tube 4 may be measured using measuring means such as a thermometer or pressure gauge, or they may be determined by performing a predetermined calculation.

[0036] As described above, the information processing device according to this embodiment estimates the amount of outgassing G generated in the tube 4 that guides the air supplied from the air supply source 1 within the first device 50 to a predetermined space 2, and that is guided into the predetermined space 2 by the air, based on the flow rate of the air. This allows the flow rate of air in the tube 4 to be adjusted by comparing the amount of outgassing G (threshold) that is permissible in the predetermined space 2 within the first device 50 with the estimated amount of outgassing G.

[0037] In this embodiment, the information processing device derives, for example, a function C(t,z) that represents the dependence of the outgassing G concentration C on time t and the coordinate z in the axial direction, based on the cylindrical model 11, but is not limited to this. In other words, for example, a table may be created showing the values ​​of the outgassing concentration C for each value of the axial air velocity w at a predetermined coordinate z0 in the axial direction corresponding to a predetermined space 2.

[0038] [Second Embodiment] Figure 4 shows a schematic diagram of the second apparatus 60. As shown in Figure 4, the second apparatus 60 includes an air supply source 1 that supplies air, and n spaces 21, ..., 2 from which the air supplied from the air supply source 1 is distributed. n Each is equipped with a piping system 3 to guide it. In the second device 60, the piping system 3 is formed by at least one tube 4, and a flow meter 5 is provided to measure the flow rate of air flowing through each tube 4.

[0039] In the second device 60, a chemical filter 6 (outgas reduction member) for reducing outgas mixed in the air is provided. Regarding the members identical to those in the first device 50 in the second device 60, the same reference numerals are given and the description thereof is omitted.

[0040] In the tube 4 to which air is supplied from the air supply source 1, outgas is continuously released from the inner wall surface 15 toward the air, so that the amount of the outgas mixed in the air flowing in the tube 4 increases. Then, the outgas mixed while increasing in the air is led by the air to the spaces 21 to 2 n Therein.

[0041] At this time, the flow rate of the air supplied into the predetermined tube 4 is measured by a flow meter 5 provided between the predetermined tube 4 and the predetermined space corresponding to the predetermined tube 4 among the spaces 21 to 2 n Therein. Further, as the air flowing through the predetermined tube 4 passes through the chemical filter 6 provided between the predetermined tube 4 and the predetermined space, the outgas contained in the air is reduced before reaching the predetermined space.

[0042] As described above, in the second device 60, chemical filters 6 are provided on the upstream sides of the spaces 21 to 2 n respectively to supply clean air to the spaces 21 to 2 n respectively, while the chemical filter 6 has a lifespan. Specifically, when the adsorption amount of outgas by the adsorbent increases inside the chemical filter 6, the adsorption performance by the adsorbent deteriorates.

[0043] Therefore, the chemical filter 6 that has adsorbed outgas exceeding a predetermined amount needs to be replaced. Conventionally, the chemical filter 6 is replaced after a predetermined period of time has elapsed, or the amount of outgass mixed in the air that has passed through the chemical filter 6 is detected using a gas detector, and the filter is replaced when the amount exceeds a predetermined amount.

[0044] Therefore, in the information processing device according to the second embodiment, the flow rate of air flowing through a predetermined tube 4, measured by the flow meter 5, is input to an outgassing amount estimation model for the predetermined tube 4, which is created in the same manner as the information processing device according to the first embodiment. This allows for the estimation of the remaining lifespan of the chemical filter 6 by real-time estimating the amount of outgass mixed in the air that reaches the chemical filter 6 by flowing through the predetermined tube 4.

[0045] Figure 5 shows an example of the dependence of the amount of outgassing I in the chemical filter 6 on time t, as estimated by the information processing device according to this embodiment. The amount of outgassed material I in the chemical filter 6 is obtained by accumulating the estimated amount of outgassed material mixed in the air reaching the chemical filter 6 at each time point.

[0046] Furthermore, Figure 5 shows the maximum amount of outgassing I corresponding to the predetermined amount in the chemical filter 6. max This is also shown. In other words, the amount of outgassed material I in the chemical filter 6 is the maximum amount of outgassed material I max At time t0, when the condition is reached, the chemical filter 6 should be replaced.

[0047] In other words, in the information processing device according to this embodiment, the maximum amount of outgassing I in the chemical filter 6 at a predetermined time max The adsorption capacity of the chemical filter 6 can be calculated from the difference between this and the accumulated amount I. In other words, in the information processing device according to this embodiment, the remaining lifespan of the chemical filter 6 can be estimated by dividing the above difference by the amount of outgassing accumulated per unit time in the chemical filter 6.

[0048] In the information processing device according to this embodiment, when creating an outgassing amount estimation model for a predetermined tube 4, the advection equations shown by equations (1) to (3) above may be used, or the advection-diffusion equations shown by equations (4) to (6) may be used. Furthermore, when creating an outgassing rate estimation model, the temperature and pressure of the air flowing through a given tube 4 may be incorporated as parameters in the advection equations shown by equations (1) to (3) and the advection-diffusion equations shown by equations (4) to (6).

[0049] In that case, the amount of outgass that is guided into a predetermined space 2 can be estimated with even greater accuracy by flowing air through a predetermined tube 4 using the created outgassing volume estimation model. The temperature and pressure of the air flowing through the designated tube 4 can be measured using measuring means such as a thermometer or pressure gauge.

[0050] As described above, the information processing device according to this embodiment estimates the amount of outgassing G generated in the tube 4 that guides the air supplied from the air supply source 1 within the second device 60 to a predetermined space 2, and that is guided into the predetermined space 2 by the air, based on the flow rate of the air. This makes it possible to estimate the remaining lifespan of the chemical filter 6 that adsorbs outgassing introduced into a predetermined space 2.

[0051] [Synthesis equipment] Figure 6 shows a configuration diagram of an exposure apparatus 900 equipped with an information processing device according to the first or second embodiment.

[0052] The exposure apparatus 900 includes a control unit 100, a measuring unit 200, a lamp lighting device 401, an illumination optical system 402, a slit 403, an imaging optical system 404, a mask stage 405 (original plate stage), a projection optical system 406, and a substrate stage 407. The control unit 100 controls the operation of each of the above-mentioned components. The control unit 100 also has the function of an information processing device according to the first or second embodiment, which estimates the amount of outgass generated in a tube (not shown) that guides air into a predetermined space and is guided into the predetermined space by the air, based on the flow rate of the air. The measuring unit 200 measures, for example, the flow rate of air in a tube (not shown) that guides air into a predetermined space.

[0053] The lamp lighting device 401 is a light source that emits ultraviolet light, such as a high-pressure mercury lamp. The illumination optical system 402 includes a first folding mirror 501, a first condenser lens 502, a fly-eye lens 503, a second condenser lens 504, and a second folding mirror 505. The mask stage 405 is a mask stage that holds the mask O and can be driven in the Y direction as shown in Figure 6.

[0054] The projection optical system 406 is a projection optical system for projecting an image of a pattern drawn on a mask O onto a substrate P coated with a photosensitive material. The exposure apparatus 900 uses a projection optical system 406 based on an Offner type optical system. In the Offner-type optical system, the mask O is illuminated in an arc shape to ensure a good image area. Furthermore, the irradiation shape of the exposure light reaching the substrate P is also arc-shaped. Light transmitted through the mask O is reflected in the following order: trapezoidal mirror 601, concave mirror 602, convex mirror 603, concave mirror 602, and trapezoidal mirror 601, before reaching the substrate P, where the pattern on the mask O is transferred onto the substrate P.

[0055] The substrate stage 407 is a wafer stage that holds the substrate P, and exposure of the substrate P is performed by driving it in the Y direction in synchronization with the mask stage 405. The substrate stage 407 can be driven in the X direction as well as the Y direction. When exposing multiple panels on the substrate P, the substrate stage 407 is driven in both the X and Y directions to perform the exposure.

[0056] The exposure light emitted from the lamp lighting device 401 passes through the illumination optical system 402, the slit 403, and the imaging optical system 404, and then illuminates the mask O placed on the mask stage 405. The exposure light that has passed through the mask O then passes through the projection optical system 406 and irradiates the substrate P placed on the substrate stage 407, thereby exposing the exposure area on the substrate P. This allows the pattern drawn on the mask O to be projected onto the substrate surface of the substrate P, thereby transferring the pattern to the substrate P.

[0057] [Method of manufacturing articles] The method for manufacturing articles according to this embodiment is suitable, for example, for manufacturing articles such as microdevices such as semiconductor devices and elements having a microstructure. The method for manufacturing an article according to this embodiment includes the step of forming a latent image pattern on a photosensitive agent coated on a substrate using the exposure apparatus 900 described above (a step of exposing the substrate, a step of processing the substrate).

[0058] Furthermore, the method for manufacturing an article according to this embodiment includes a developing step (processing step) for developing the substrate on which the latent image pattern was formed in the exposure step. Furthermore, the method for manufacturing an article according to this embodiment includes other well-known manufacturing steps (such as oxidation, film formation, vapor deposition, doping, planarization, etching, photosensitive material removal, dicing, bonding, and packaging) performed on the substrate developed in the developing step.

[0059] The method for manufacturing articles according to this embodiment is advantageous compared to conventional methods in at least one of the following aspects: performance, quality, productivity, and production cost.

[0060] This embodiment includes the following configurations and methods. (Configuration 1) An information processing apparatus characterized by performing an estimation step of estimating the amount of outgass generated in a pipe that guides a gas supplied from a supply source to a predetermined space within a substrate processing apparatus, and which is guided to the predetermined space by the gas, based on the gas flow rate. (Configuration 2) The information processing device according to Configuration 1, characterized in that the estimation process includes a first calculation step of calculating the amount of outgassing by inputting the gas flow rate into a function that represents the dependence of the outgassing concentration in the pipe on time and axial position. (Configuration 3) The information processing apparatus according to Configuration 2, characterized in that the first calculation step includes a step of determining the amount of outgassing generated per unit time from the material forming the pipe and the unit area of ​​the inner wall surface of the pipe. (Configuration 4) The coefficient of the function includes the flow rate of the gas and the amount of outgassing generated per unit time from a unit area of ​​the inner wall surface of the pipe, and further includes at least one of the diffusion coefficient of outgassing in the pipe, the temperature inside the pipe, and the pressure inside the pipe, as described in Configuration 2 or 3. (Configuration 5) The information processing device according to any one of Configurations 1 to 4, characterized in that the information processing device performs a derivation step of deriving a function that represents the dependence of the outgassing concentration in the pipe on time and axial position. (Configuration 6) The information processing apparatus according to Configuration 5, characterized in that the derivation step includes a step of deriving a function by solving one of the advection equation and the advection-diffusion equation for the concentration of outgassing in the pipe. (Configuration 7) The coefficient of the function includes the flow rate of the gas and the amount of outgassing generated per unit time from a unit area of ​​the inner wall surface of the pipe, and further includes at least one of the diffusion coefficient of outgassing in the pipe, the temperature inside the pipe, and the pressure inside the pipe, as described in Configuration 5 or 6. (Configuration 8) The information processing apparatus according to any one of Configurations 5 to 7, characterized in that the derivation step includes a step of determining the coefficients of a function by fitting the measurement results of the amount of outgassing when a gas is introduced into a predetermined space at multiple flow rates by a pipe to a function. (Configuration 9) The information processing apparatus according to any one of Configurations 5 to 8, characterized in that the derivation step includes a step of determining the coefficients of a function by fitting the measurement results of the amount of outgassing when a gas is introduced into a predetermined space by each of a plurality of pipes having different lengths to a function. (Configuration 10) The substrate processing apparatus is provided with an outgassing reduction member that reduces outgassing guided by a tube, and the estimation step includes a step of estimating the remaining life of the outgassing reduction member based on the estimated amount of outgassing, as described in any one of Configurations 1 to 9. (Configuration 11) A substrate processing apparatus for processing a substrate, characterized by comprising a pipe that guides a gas supplied from a supply source into a predetermined space, and an information processing apparatus according to any one of Configurations 1 to 10. (Configuration 12) The substrate processing apparatus according to Configuration 11, characterized in that the tube is a tube formed of a resin material. (Configuration 13) A substrate processing apparatus according to configuration 11 or 12, characterized by comprising a measuring unit for measuring the flow rate of gas inside a pipe. (Configuration 14) A substrate processing apparatus according to any one of Configurations 11 to 13, characterized by comprising an outgassing reduction member that reduces outgassing guided by a pipe. (Configuration 15) The information processing apparatus according to Configuration 14, characterized in that the outgassing reduction member is a filter that adsorbs outgassing. (Configuration 16) The substrate processing apparatus is an exposure apparatus that projects an image of the pattern of a master plate onto a substrate and exposes the substrate, and the predetermined space is a storage space within a lens barrel that houses a projection optical system that guides the exposure light that has passed through the master plate onto the substrate, as described in any one of Configurations 11 to 15. (Method 1) A method for manufacturing an article, comprising the step of processing a substrate using a substrate processing apparatus described in any one of the configurations 11 to 16, and characterized by manufacturing an article from the processed substrate. (Method 2) An information processing method characterized by including an estimation step of estimating the amount of outgass generated in a pipe that guides a gas supplied from a supply source to a predetermined space within a substrate processing apparatus, and which is guided to the predetermined space by the gas, based on the flow rate of the gas. [Explanation of Symbols]

[0061] 1. Air supply source (supply source) 21, 22, ..., 2 n space 4 tubes 12. Air (gas) 50. First apparatus (substrate processing apparatus) 100 Control Unit (Information Processing Device) G Outgass

Claims

1. An information processing apparatus characterized by performing an estimation step of estimating the amount of outgass generated in a pipe that guides a gas supplied from a supply source within a substrate processing apparatus to a predetermined space, and which is guided into the predetermined space by the gas, based on the flow rate of the gas.

2. The information processing apparatus according to claim 1, wherein the estimation step includes a first calculation step of calculating the amount of outgass by inputting the flow rate of the gas into a function that represents the dependence of the concentration of the outgass in the pipe on time and axial position.

3. The information processing apparatus according to claim 2, characterized in that the first calculation step includes a step of determining the amount of outgassing generated per unit time from a unit area of ​​the inner wall surface of the pipe using the material forming the pipe.

4. The information processing apparatus according to claim 2, characterized in that the coefficient of the function includes the flow rate of the gas and the amount of outgassing generated per unit time from a unit area of ​​the inner wall surface of the pipe, and further includes at least one of the diffusion coefficient of the outgassing in the pipe, the temperature in the pipe, and the pressure in the pipe.

5. The information processing device according to claim 1, characterized in that it performs a derivation step of deriving a function that represents the dependence of the outgassing concentration in the pipe on time and axial position.

6. The information processing apparatus according to claim 5, characterized in that the derivation step includes a step of deriving the function by solving one of the advection equation and the advection-diffusion equation for the concentration of the outgass in the pipe.

7. The information processing apparatus according to claim 5, characterized in that the coefficient of the function includes the flow rate of the gas and the amount of outgassing generated per unit time from a unit area of ​​the inner wall surface of the pipe, and further includes at least one of the diffusion coefficient of the outgassing in the pipe, the temperature inside the pipe, and the pressure inside the pipe.

8. The information processing apparatus according to claim 5, characterized in that the derivation step includes a step of determining the coefficient of the function by fitting the measurement result of the amount of outgass when the gas is introduced into the predetermined space by the pipe at each of a plurality of flow rates with the function.

9. The information processing apparatus according to claim 5, characterized in that the derivation step includes a step of determining the coefficient of the function by fitting the measurement result of the amount of outgass when the gas is introduced into the predetermined space by each of a plurality of pipes having different lengths to the function.

10. The substrate processing apparatus is provided with an outgassing reduction member that reduces the outgassing guided by the tube, The information processing apparatus according to claim 1, characterized in that the estimation step includes a step of estimating the remaining lifespan of the outgassing reduction member based on the estimated amount of outgassing.

11. A substrate processing apparatus for processing substrates, A pipe that guides the gas supplied from the source into a designated space, An information processing device according to any one of claims 1 to 10, A substrate processing apparatus characterized by comprising:

12. The substrate processing apparatus according to claim 11, characterized in that the tube is a tube formed of a resin material.

13. The substrate processing apparatus according to claim 11, further comprising a measuring unit for measuring the flow rate of the gas inside the pipe.

14. The substrate processing apparatus according to claim 11, further comprising an outgassing reducing member for reducing the outgassing guided by the pipe.

15. The information processing apparatus according to claim 14, characterized in that the outgassing reduction member is a filter that adsorbs the outgassing.

16. The substrate processing apparatus is an exposure apparatus that projects an image of the pattern of the master plate onto the substrate and exposes the substrate. The substrate processing apparatus according to claim 11, characterized in that the predetermined space is a storage space within a lens barrel that houses a projection optical system that guides exposure light that has passed through the original plate to the substrate.

17. The process includes processing a substrate using the substrate processing apparatus described in claim 11, A method for manufacturing an article, characterized by manufacturing an article from the processed substrate.

18. An information processing method characterized by including an estimation step of estimating the amount of outgass generated in a pipe that guides a gas supplied from a supply source within a substrate processing apparatus to a predetermined space, and which is guided into the predetermined space by the gas, based on the flow rate of the gas.

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